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JPS5339858A - Impurity diffusion method - Google Patents

Impurity diffusion method

Info

Publication number
JPS5339858A
JPS5339858A JP11507176A JP11507176A JPS5339858A JP S5339858 A JPS5339858 A JP S5339858A JP 11507176 A JP11507176 A JP 11507176A JP 11507176 A JP11507176 A JP 11507176A JP S5339858 A JPS5339858 A JP S5339858A
Authority
JP
Japan
Prior art keywords
impurity diffusion
diffusion method
inpurity
beforehand
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11507176A
Other languages
Japanese (ja)
Inventor
Sokichi Yamagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11507176A priority Critical patent/JPS5339858A/en
Publication of JPS5339858A publication Critical patent/JPS5339858A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE: To prevent damaging of back and front surfaces owing to inpurity gas by beforehand depositing a thin film on the back of a Si wafer, thereafter diffusing Sb from front surface.
COPYRIGHT: (C)1978,JPO&Japio
JP11507176A 1976-09-24 1976-09-24 Impurity diffusion method Pending JPS5339858A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11507176A JPS5339858A (en) 1976-09-24 1976-09-24 Impurity diffusion method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11507176A JPS5339858A (en) 1976-09-24 1976-09-24 Impurity diffusion method

Publications (1)

Publication Number Publication Date
JPS5339858A true JPS5339858A (en) 1978-04-12

Family

ID=14653448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11507176A Pending JPS5339858A (en) 1976-09-24 1976-09-24 Impurity diffusion method

Country Status (1)

Country Link
JP (1) JPS5339858A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57177521A (en) * 1981-04-25 1982-11-01 Nec Home Electronics Ltd Manufacture of semiconductor device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3494809A (en) * 1967-06-05 1970-02-10 Honeywell Inc Semiconductor processing
JPS4919946A (en) * 1972-06-12 1974-02-21
JPS4985970A (en) * 1972-12-22 1974-08-17

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3494809A (en) * 1967-06-05 1970-02-10 Honeywell Inc Semiconductor processing
JPS4919946A (en) * 1972-06-12 1974-02-21
JPS4985970A (en) * 1972-12-22 1974-08-17

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57177521A (en) * 1981-04-25 1982-11-01 Nec Home Electronics Ltd Manufacture of semiconductor device

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