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JPS57161746A - Glass mask - Google Patents

Glass mask

Info

Publication number
JPS57161746A
JPS57161746A JP4668981A JP4668981A JPS57161746A JP S57161746 A JPS57161746 A JP S57161746A JP 4668981 A JP4668981 A JP 4668981A JP 4668981 A JP4668981 A JP 4668981A JP S57161746 A JPS57161746 A JP S57161746A
Authority
JP
Japan
Prior art keywords
chip
positioning
marks
mask
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4668981A
Other languages
Japanese (ja)
Inventor
Hiroshi Harigai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP4668981A priority Critical patent/JPS57161746A/en
Publication of JPS57161746A publication Critical patent/JPS57161746A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a glass mask with high precision by providing >=1 mark for positioning during mask manufacture in a minimum unit having repetitive patterns or at its circumference. CONSTITUTION:When designed chip size is made clear, a group of 5-15 glass masks is provided with hooked marks for positioning at two places in a chip or cross marks for positioning at four corners on scribing lines at pitch conforming with the chip size by using the same exposing machine. When the inside of the chip is designed, a chip mask is written on said glass mask by an optical or electron beam method on the basis of the positioning marks. Consequently, only simple marks are written for the 1st time by using a precise device, and a device having inferior precision is used for the 2nd writting, thereby obtaining masks which has excellent total pitch precision on the whole at low cost.
JP4668981A 1981-03-30 1981-03-30 Glass mask Pending JPS57161746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4668981A JPS57161746A (en) 1981-03-30 1981-03-30 Glass mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4668981A JPS57161746A (en) 1981-03-30 1981-03-30 Glass mask

Publications (1)

Publication Number Publication Date
JPS57161746A true JPS57161746A (en) 1982-10-05

Family

ID=12754340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4668981A Pending JPS57161746A (en) 1981-03-30 1981-03-30 Glass mask

Country Status (1)

Country Link
JP (1) JPS57161746A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166957A (en) * 1983-03-14 1984-09-20 Toshiba Corp Photomask inspecting mark
JPS63291431A (en) * 1987-05-25 1988-11-29 Matsushita Electronics Corp Semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166957A (en) * 1983-03-14 1984-09-20 Toshiba Corp Photomask inspecting mark
JPH0469380B2 (en) * 1983-03-14 1992-11-06 Tokyo Shibaura Electric Co
JPS63291431A (en) * 1987-05-25 1988-11-29 Matsushita Electronics Corp Semiconductor device
JPH0770575B2 (en) * 1987-05-25 1995-07-31 松下電子工業株式会社 Semiconductor device

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