JPS56148880A - Single longitudinal mode semiconductor laser - Google Patents
Single longitudinal mode semiconductor laserInfo
- Publication number
- JPS56148880A JPS56148880A JP5248880A JP5248880A JPS56148880A JP S56148880 A JPS56148880 A JP S56148880A JP 5248880 A JP5248880 A JP 5248880A JP 5248880 A JP5248880 A JP 5248880A JP S56148880 A JPS56148880 A JP S56148880A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- semiconductor laser
- etching
- thereafter
- longitudinal mode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/125—Distributed Bragg reflector [DBR] lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To enhance the efficiency of a semiconductor laser by employing a lateral mode control configuration in a period configuration part to reduce the effective loss and thus reducing the oscillation threshold value. CONSTITUTION:After a buffer layer 2, a photoconductive wave layer 3, an active later 4, a clad layer 5, and a cap layer 6 are continuously grown on a substrate 1, an active part 10 is retained, both the sides of the part 10 are removed by etching to the layer 4, and the layer 3 is exposed. Thereafter, the first and the second mesa parts 30, 40 are formed using photomasks, and the first and the second period configurations 31, 41 are formed by laser light interference exposure method and etching to form the first and the second feedback reflectors 32, 42. Zinc is so diffused in the part 10 on the extension lines of the mesa parts 30, 40 as to reach the layer 5 in a band shape to form a band-shaped current injection 11. Thereafter, positive and negative electrodes 50, 51 are formed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5248880A JPS56148880A (en) | 1980-04-21 | 1980-04-21 | Single longitudinal mode semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5248880A JPS56148880A (en) | 1980-04-21 | 1980-04-21 | Single longitudinal mode semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56148880A true JPS56148880A (en) | 1981-11-18 |
Family
ID=12916094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5248880A Pending JPS56148880A (en) | 1980-04-21 | 1980-04-21 | Single longitudinal mode semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56148880A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59152682A (en) * | 1983-02-21 | 1984-08-31 | Nippon Telegr & Teleph Corp <Ntt> | Distributed reflection type semiconductor laser |
US5601731A (en) * | 1994-03-09 | 1997-02-11 | Ant Nachrichtentechnik Gmbh | Process for the production of an optoelectronic component having a defined axial variation of the coupling coefficient and a defined axial distribution of the phase shift |
EP2811592A2 (en) | 2013-06-07 | 2014-12-10 | NGK Insulators, Ltd. | External resonator type light emitting system |
WO2015079939A1 (en) | 2013-11-27 | 2015-06-04 | 日本碍子株式会社 | External-resonator-type light emitting device |
WO2015079974A1 (en) | 2013-11-27 | 2015-06-04 | 日本碍子株式会社 | Grating element and external-resonator-type light emitting device |
US9331454B2 (en) | 2013-11-27 | 2016-05-03 | Ngk Insulators, Ltd. | External resonator type light emitting system |
US9979157B2 (en) | 2014-06-13 | 2018-05-22 | Ngk Insulators, Ltd. | External-resonator-type light-emitting device |
US10074962B2 (en) | 2014-05-01 | 2018-09-11 | Ngk Insulators, Ltd. | Grating element and external resonator type light emitting device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS509129A (en) * | 1973-05-30 | 1975-01-30 |
-
1980
- 1980-04-21 JP JP5248880A patent/JPS56148880A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS509129A (en) * | 1973-05-30 | 1975-01-30 |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59152682A (en) * | 1983-02-21 | 1984-08-31 | Nippon Telegr & Teleph Corp <Ntt> | Distributed reflection type semiconductor laser |
US5601731A (en) * | 1994-03-09 | 1997-02-11 | Ant Nachrichtentechnik Gmbh | Process for the production of an optoelectronic component having a defined axial variation of the coupling coefficient and a defined axial distribution of the phase shift |
US9184564B2 (en) | 2013-06-07 | 2015-11-10 | Ngk Insulators, Ltd. | External resonator type light emitting system |
WO2014196553A1 (en) | 2013-06-07 | 2014-12-11 | 日本碍子株式会社 | External resonator-type light emitting device |
EP2811592A2 (en) | 2013-06-07 | 2014-12-10 | NGK Insulators, Ltd. | External resonator type light emitting system |
US9627853B2 (en) | 2013-06-07 | 2017-04-18 | Ngk Insulators, Ltd. | External resonator-type light emitting device |
WO2015079939A1 (en) | 2013-11-27 | 2015-06-04 | 日本碍子株式会社 | External-resonator-type light emitting device |
WO2015079974A1 (en) | 2013-11-27 | 2015-06-04 | 日本碍子株式会社 | Grating element and external-resonator-type light emitting device |
US9331454B2 (en) | 2013-11-27 | 2016-05-03 | Ngk Insulators, Ltd. | External resonator type light emitting system |
US9859684B2 (en) | 2013-11-27 | 2018-01-02 | Ngk Insulators, Ltd. | Grating element and external-resonator-type light emitting device |
US10063034B2 (en) | 2013-11-27 | 2018-08-28 | Ngk Insulators, Ltd. | External resonator-type light emitting device |
US10074962B2 (en) | 2014-05-01 | 2018-09-11 | Ngk Insulators, Ltd. | Grating element and external resonator type light emitting device |
DE112015002094B4 (en) | 2014-05-01 | 2019-08-22 | Ngk Insulators, Ltd. | Light-emitting device of the outer resonator type |
US9979157B2 (en) | 2014-06-13 | 2018-05-22 | Ngk Insulators, Ltd. | External-resonator-type light-emitting device |
US10003175B2 (en) | 2014-06-13 | 2018-06-19 | Ngk Insulators, Ltd. | External-resonator-type light-emitting device |
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