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JPS5596951A - Negative for photomask - Google Patents

Negative for photomask

Info

Publication number
JPS5596951A
JPS5596951A JP463279A JP463279A JPS5596951A JP S5596951 A JPS5596951 A JP S5596951A JP 463279 A JP463279 A JP 463279A JP 463279 A JP463279 A JP 463279A JP S5596951 A JPS5596951 A JP S5596951A
Authority
JP
Japan
Prior art keywords
light
photomask
negative
transmissive
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP463279A
Other languages
Japanese (ja)
Inventor
Ikuo Iwama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP463279A priority Critical patent/JPS5596951A/en
Publication of JPS5596951A publication Critical patent/JPS5596951A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain the title negative, which is not charged in production of a photomask, by covering both main faces of a light-transmissive substrate with light- transmissive electrically-conductive films electrically connected to each other and by attaching a pattern-forming opaque film to one main face. CONSTITUTION:Preheated light-transmissive substrate 1 is sprayed with a mixed solution of a tin chloride solution and an antimony chloride solution to form light- transmissive electrically-conductive film 6 all over the substrate 1 surface. Next, by vacuum-depositing or sputtering chromium or the like light-untransmissive metal film 2 is formed on one main face to obtain a negative (hard surface plate) for a photomask.
JP463279A 1979-01-17 1979-01-17 Negative for photomask Pending JPS5596951A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP463279A JPS5596951A (en) 1979-01-17 1979-01-17 Negative for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP463279A JPS5596951A (en) 1979-01-17 1979-01-17 Negative for photomask

Publications (1)

Publication Number Publication Date
JPS5596951A true JPS5596951A (en) 1980-07-23

Family

ID=11589381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP463279A Pending JPS5596951A (en) 1979-01-17 1979-01-17 Negative for photomask

Country Status (1)

Country Link
JP (1) JPS5596951A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5739490U (en) * 1980-08-18 1982-03-03
JPS5741638A (en) * 1980-08-25 1982-03-08 Fujitsu Ltd Photomask for electron beam
JPS57173632U (en) * 1981-04-28 1982-11-01
JPS5824143A (en) * 1981-08-06 1983-02-14 Fujitsu Ltd Photomask
JPS5830127A (en) * 1981-08-14 1983-02-22 Toshiba Corp Mask blanks for electron beam exposure
JPS59181330A (en) * 1983-03-31 1984-10-15 Nitto Electric Ind Co Ltd Exposure processing method
JPS6052019A (en) * 1983-08-31 1985-03-23 Fujitsu Ltd Manufacture of semiconductor device
JPS6438638U (en) * 1987-08-31 1989-03-08
JP2015025894A (en) * 2013-07-25 2015-02-05 株式会社エスケーエレクトロニクス Photomask and manufacturing method of photomask
JP2021015295A (en) * 2015-06-17 2021-02-12 Hoya株式会社 Substrate with conductive film, substrate with multilayer reflection film, reflection type mask blank, reflection type mask, and method for manufacturing semiconductor device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018870Y2 (en) * 1980-08-18 1985-06-07 株式会社東芝 Plug-in unit storage device
JPS5739490U (en) * 1980-08-18 1982-03-03
JPS5741638A (en) * 1980-08-25 1982-03-08 Fujitsu Ltd Photomask for electron beam
JPS6262336B2 (en) * 1980-08-25 1987-12-25 Fujitsu Ltd
JPS57173632U (en) * 1981-04-28 1982-11-01
JPS597889Y2 (en) * 1981-04-28 1984-03-10 株式会社遠藤製作所 Tempura scooper
JPS5824143A (en) * 1981-08-06 1983-02-14 Fujitsu Ltd Photomask
JPS5830127A (en) * 1981-08-14 1983-02-22 Toshiba Corp Mask blanks for electron beam exposure
JPS59181330A (en) * 1983-03-31 1984-10-15 Nitto Electric Ind Co Ltd Exposure processing method
JPS6052019A (en) * 1983-08-31 1985-03-23 Fujitsu Ltd Manufacture of semiconductor device
JPS6438638U (en) * 1987-08-31 1989-03-08
JP2015025894A (en) * 2013-07-25 2015-02-05 株式会社エスケーエレクトロニクス Photomask and manufacturing method of photomask
JP2021015295A (en) * 2015-06-17 2021-02-12 Hoya株式会社 Substrate with conductive film, substrate with multilayer reflection film, reflection type mask blank, reflection type mask, and method for manufacturing semiconductor device

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