JPH0299959U - - Google Patents
Info
- Publication number
- JPH0299959U JPH0299959U JP665789U JP665789U JPH0299959U JP H0299959 U JPH0299959 U JP H0299959U JP 665789 U JP665789 U JP 665789U JP 665789 U JP665789 U JP 665789U JP H0299959 U JPH0299959 U JP H0299959U
- Authority
- JP
- Japan
- Prior art keywords
- electrode rod
- vapor
- substrate
- vacuum container
- vapor source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 1
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図は、本考案の一実施例を示す縦断面図、
第２図は、従来のものの例を示す縦断面図である
。
尚、図中１２は蒸発源、１３は電極棒、１４は
絶縁ブツシユ、１５は蒸発電源、１６は回転ギヤ
、１７はピニオン、１８はモータ、１９，２０は
電流導入ブラシ、２１は基板、２２は回転導入端
子、２３は真空容器である。
FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention;
FIG. 2 is a longitudinal sectional view showing an example of a conventional device. In the figure, 12 is an evaporation source, 13 is an electrode rod, 14 is an insulating bush, 15 is an evaporation power source, 16 is a rotating gear, 17 is a pinion, 18 is a motor, 19 and 20 are current introducing brushes, 21 is a substrate, 22 23 is a rotation introduction terminal, and 23 is a vacuum container.
Claims (1)
同蒸気源から発生する蒸気を基板表面に蒸着させ
る真空蒸着装置において、 前記電極棒を前記真空容器に対し回転自在に設
置するとともにその周りに前記基板を固定設置可
能としたことを特徴とする真空蒸着装置。[Claims for Utility Model Registration] Supporting a vapor source via an electrode rod within a vacuum container,
A vacuum evaporation apparatus for depositing vapor generated from the vapor source onto the surface of a substrate, characterized in that the electrode rod is rotatably installed in the vacuum container, and the substrate can be fixedly installed around the electrode rod. Vapor deposition equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP665789U JPH0299959U (en) | 1989-01-24 | 1989-01-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP665789U JPH0299959U (en) | 1989-01-24 | 1989-01-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0299959U true JPH0299959U (en) | 1990-08-09 |
Family
ID=31211008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP665789U Pending JPH0299959U (en) | 1989-01-24 | 1989-01-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0299959U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102421933A (en) * | 2009-05-07 | 2012-04-18 | 韩商Snu精密股份有限公司 | Thin film deposition apparatus and thin film deposition system comprising same |
| JP2012522137A (en) * | 2009-03-31 | 2012-09-20 | エスエヌユー プレシジョン カンパニー リミテッド | Thin film deposition apparatus, thin film deposition method and thin film deposition system |
| JP2013533922A (en) * | 2010-06-10 | 2013-08-29 | エスエヌユー プレシジョン カンパニー リミテッド | Thin film deposition apparatus and thin film deposition system |
-
1989
- 1989-01-24 JP JP665789U patent/JPH0299959U/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012522137A (en) * | 2009-03-31 | 2012-09-20 | エスエヌユー プレシジョン カンパニー リミテッド | Thin film deposition apparatus, thin film deposition method and thin film deposition system |
| CN102421933A (en) * | 2009-05-07 | 2012-04-18 | 韩商Snu精密股份有限公司 | Thin film deposition apparatus and thin film deposition system comprising same |
| JP2012526199A (en) * | 2009-05-07 | 2012-10-25 | エスエヌユー プレシジョン カンパニー リミテッド | Thin film deposition apparatus and thin film deposition system including the same |
| JP2013533922A (en) * | 2010-06-10 | 2013-08-29 | エスエヌユー プレシジョン カンパニー リミテッド | Thin film deposition apparatus and thin film deposition system |
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