JPS62109449U - - Google Patents
Info
- Publication number
- JPS62109449U JPS62109449U JP19940685U JP19940685U JPS62109449U JP S62109449 U JPS62109449 U JP S62109449U JP 19940685 U JP19940685 U JP 19940685U JP 19940685 U JP19940685 U JP 19940685U JP S62109449 U JPS62109449 U JP S62109449U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- ring
- elastic body
- microwaves
- applies
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000014759 maintenance of location Effects 0.000 claims description 2
- 239000011231 conductive filler Substances 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Landscapes
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図は本考案を使用した装置の断面図、第２
，３図は本考案のそれぞれ異なる実施例を示す詳
細断面図である。
１……電極、２……真空容器、３……ふた、４
……真空保持用Ｏリング、５……弾性体。
Figure 1 is a sectional view of the device using the present invention, Figure 2
, 3 are detailed sectional views showing different embodiments of the present invention. 1... Electrode, 2... Vacuum container, 3... Lid, 4
... O-ring for vacuum retention, 5 ... Elastic body.
Claims (1)
真空容器において、シール部に真空保持用Ｏリン
グと導電性の充填材を含有する弾性体を設けたこ
とを特徴とする半導体製造装置。 1. A semiconductor manufacturing device, characterized in that a vacuum container that applies an electric field by microwaves or high frequencies is provided with an O-ring for vacuum retention and an elastic body containing a conductive filler in a sealing part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985199406U JPH0447959Y2 (en) | 1985-12-27 | 1985-12-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985199406U JPH0447959Y2 (en) | 1985-12-27 | 1985-12-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62109449U true JPS62109449U (en) | 1987-07-13 |
| JPH0447959Y2 JPH0447959Y2 (en) | 1992-11-12 |
Family
ID=31161000
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985199406U Expired JPH0447959Y2 (en) | 1985-12-27 | 1985-12-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0447959Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58199529A (en) * | 1982-05-17 | 1983-11-19 | Hitachi Ltd | Plasma etching device |
| JPS60207338A (en) * | 1984-03-09 | 1985-10-18 | テーガル・コーポレーシヨン | Chuck assembly for plasma reactor |
-
1985
- 1985-12-27 JP JP1985199406U patent/JPH0447959Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58199529A (en) * | 1982-05-17 | 1983-11-19 | Hitachi Ltd | Plasma etching device |
| JPS60207338A (en) * | 1984-03-09 | 1985-10-18 | テーガル・コーポレーシヨン | Chuck assembly for plasma reactor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0447959Y2 (en) | 1992-11-12 |