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JPH05253879A - Transfer method and device - Google Patents

Transfer method and device

Info

Publication number
JPH05253879A
JPH05253879A JP5792192A JP5792192A JPH05253879A JP H05253879 A JPH05253879 A JP H05253879A JP 5792192 A JP5792192 A JP 5792192A JP 5792192 A JP5792192 A JP 5792192A JP H05253879 A JPH05253879 A JP H05253879A
Authority
JP
Japan
Prior art keywords
suction
fixing means
escape mechanism
wafer
fixing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5792192A
Other languages
Japanese (ja)
Other versions
JP3217110B2 (en
Inventor
Kazuo Shimane
一男 島根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5792192A priority Critical patent/JP3217110B2/en
Publication of JPH05253879A publication Critical patent/JPH05253879A/en
Application granted granted Critical
Publication of JP3217110B2 publication Critical patent/JP3217110B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)

Abstract

PURPOSE:To implement a transfer method and device for reducing the vibration of an object being transferred. CONSTITUTION:In a transfer method using a robot which holds and transfers an object via a relief mechanism for overloads, the relief mechanism 11 is fixed by a fixing means which uses vacuum suction or an electromagnet while an object is being transferred, to reduce the vibration of the object during transfer.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は搬送方法及び搬送装置に
関する。詳しくは、ロボット等で物体を搬送するとき、
過負荷などの検出機能(又はRCCの逃げ機構)により
振動が発生するのを防止する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a carrying method and a carrying device. Specifically, when carrying an object with a robot,
The present invention relates to a method of preventing vibration from being generated by a detection function (or RCC escape mechanism) such as overload.

【0002】近年、半導体装置の製造工程において、ウ
エハ等の物体を移し換える時の搬送装置には、物体にダ
メージを与えない為に、過負荷を検出する機能を持たせ
ている。しかし、その検出機能が搬送中の振動の原因と
なることがあるので、その振動を低減させる必要があ
る。
In recent years, in a semiconductor device manufacturing process, a transfer device for transferring an object such as a wafer has a function of detecting an overload so as not to damage the object. However, since the detection function may cause vibration during transportation, it is necessary to reduce the vibration.

【0003】[0003]

【従来の技術】図7は従来のウエハ搬送用のロボットを
示す図である。この搬送ロボット1は、回転できる垂直
軸2と、該軸に取付けられた伸縮可能なアーム3と、該
アームの先端に取り付けられ、アームと平行な軸Xを中
心軸とする回転、及びアームと直角な軸Zを中心軸とす
る回転ができる搬送物吸着ユニット4とを具備して構成
されており、ウエハ5を樹脂カセット6と石英バスケッ
ト7との間を搬送できるようになっている。
2. Description of the Related Art FIG. 7 is a view showing a conventional wafer transfer robot. This transfer robot 1 includes a rotatable vertical shaft 2, a retractable arm 3 attached to the shaft, a rotation attached to the tip of the arm about an axis X parallel to the arm, and an arm. It is configured to be provided with a transported object suction unit 4 which can rotate about a right-angled axis Z as a central axis, and a wafer 5 can be transported between a resin cassette 6 and a quartz basket 7.

【0004】そして、搬送物吸着ユニット4には、ウエ
ハ5をカセット6又はバスケット7に収容させるとき、
その溝8にあたり、ウエハ5を傷つけたり、発塵の原因
になるなどの問題があるため、過負荷を検出できるよう
になっている。そのため、ウエハ吸着ユニット4には図
8に示すように、ロボットのアームに取付けられる固定
板9とウエハ5を吸着保持する吸着板10との間にばね
11を設けて柔軟性を持たせ、過負荷を逃げると同時に
図示なき光ファイバセンサにより過負荷を検出できるよ
うになっている。
Then, when the wafers 5 are accommodated in the cassette 6 or the basket 7 in the conveyed object suction unit 4,
Since there is a problem that the wafer 5 hits the groove 8 or causes dust generation, an overload can be detected. Therefore, as shown in FIG. 8, the wafer suction unit 4 is provided with a spring 11 between the fixed plate 9 attached to the arm of the robot and the suction plate 10 for sucking and holding the wafer 5, thereby providing flexibility. At the same time when the load is released, an overload can be detected by an optical fiber sensor (not shown).

【0005】[0005]

【発明が解決しようとする課題】上記従来の搬送物吸着
ユニットでは、吸着板10をばね11を介して支持して
いるため、急激な搬送を行うと搬送物に振動が発生す
る。その結果カセット6やバスケット7にウエハを収容
しようとするとき、溝8に当たったり、あるいはウエハ
が吸着板10から離れることがあるため、振動が収まる
まで待機せねばならないという問題があった。
In the above-described conventional article adsorbing unit, since the adsorbing plate 10 is supported by the spring 11, the article is vibrated when it is abruptly conveyed. As a result, when the wafer is to be accommodated in the cassette 6 or the basket 7, the wafer may hit the groove 8 or may be separated from the suction plate 10. Therefore, there is a problem that it is necessary to wait until the vibration is stopped.

【0006】本発明は、搬送中の搬送物の振動を低減さ
せた搬送方法及び搬送装置を実現しようとする。
The present invention is intended to realize a carrying method and a carrying apparatus in which the vibration of a carried object is reduced.

【0007】[0007]

【課題を解決するための手段】本発明の搬送方法に於い
ては、過負荷発生時の逃げ機構を介して被搬送物を支持
して搬送するロボットによる搬送方法において、上記被
搬送物を搬送中は上記逃げ機構11を真空吸着又は電磁
石を用いた固定手段12により固定し、搬送中の被搬送
物の振動を低減させることを特徴とする。
According to another aspect of the present invention, there is provided a robot carrying method for supporting and carrying an object to be conveyed through an escape mechanism when an overload occurs. The inside is characterized in that the escape mechanism 11 is fixed by a fixing means 12 using a vacuum adsorption or an electromagnet to reduce the vibration of the conveyed object during conveyance.

【0008】また、本発明の搬送方法に於いては、被搬
送物支持部に過負荷発生時の逃げ機構を有する搬送装置
において、上記逃げ機構11を真空吸着又は電磁石を用
いて固定する固定手段12を設けて成ることを特徴とす
る。
Further, in the carrying method of the present invention, in the carrying device having the escape mechanism at the time of occurrence of overload in the object supporting portion, the fixing means for fixing the escape mechanism 11 by vacuum suction or electromagnet. It is characterized in that 12 is provided.

【0009】また、それに加えて、上記逃げ機構11を
固定する固定手段12に位置決め機能を持たせたことを
特徴とする。この構成を採ることにより、搬送中の搬送
物の振動を低減させた搬送方法及び搬送装置が得られ
る。
In addition to that, the fixing means 12 for fixing the escape mechanism 11 has a positioning function. By adopting this configuration, it is possible to obtain a carrying method and a carrying apparatus in which the vibration of the carried object is reduced.

【0010】[0010]

【作用】本発明では、図3に示すように、搬送物吸着ユ
ニット4の固定板9に吸着板10を固定できる真空吸引
(又は電磁石)による固定手段12を設けたことによ
り、搬送物(ウエハ5)を搬送中は同図(b) に示すよ
うに固定手段12を作動させて吸着板10を固定でき
る。これにより搬送中の搬送物の振動を低減することが
できる。
According to the present invention, as shown in FIG. 3, the fixing means 12 by vacuum suction (or electromagnet) capable of fixing the suction plate 10 to the fixing plate 9 of the conveyance object suction unit 4 is provided, so that the conveyance object (wafer During the transportation of 5), the suction plate 10 can be fixed by operating the fixing means 12 as shown in FIG. As a result, the vibration of the conveyed product can be reduced.

【0011】[0011]

【実施例】図1及び図2は本発明の搬送装置を示す図で
あり、図1は斜視図、図2は搬送物吸着ユニットを示す
図で、同図(a) は側面図、(b)は(a)図のZ矢視
図である。本実施例は、回転可能な垂直軸2と、該軸に
取り付けられた伸縮可能なアーム3と、アームと平行な
軸を中心軸とする回転、及びアームと直角な軸を中心軸
とする回転ができる搬送物吸着ユニット4を具備してい
ることは図7で説明した従来例と同様であり、異なると
ころは搬送物吸着ユニット4を改良したことである。
1 and 2 are views showing a carrying device of the present invention, FIG. 1 is a perspective view, FIG. 2 is a view showing a carried object suction unit, FIG. 1 (a) is a side view, and FIG. ) Is a Z arrow view of FIG. In this embodiment, a rotatable vertical shaft 2, an extendable arm 3 attached to the shaft, a rotation about an axis parallel to the arm, and a rotation about an axis perpendicular to the arm. It is similar to the conventional example described in FIG. 7 in that it is equipped with the conveyed product adsorption unit 4, and the difference is that the conveyed product adsorption unit 4 is improved.

【0012】即ち、本実施例における搬送物吸着ユニッ
ト4は図2に示すように、アームに取り付けられる固定
板9と、該固定板9にばね(過負荷発生時の逃げ機構)
11を介して取り付けられた吸着板10と、該吸着板1
0を固定板9に固定するための固定手段12からなり、
該固定手段12は吸着板10に対し僅かな距離(逃げ機
構の作用を阻害しない程度の距離)を隔てて真空吸着面
13を対向させたもので、該吸着面13には真空通路1
4を開口させている。
That is, as shown in FIG. 2, the transported object suction unit 4 in this embodiment has a fixed plate 9 attached to an arm and a spring (an escape mechanism when an overload occurs) on the fixed plate 9.
Adsorption plate 10 attached via 11 and the adsorption plate 1
A fixing means 12 for fixing 0 to the fixing plate 9,
The fixing means 12 has a vacuum suction surface 13 opposed to the suction plate 10 with a small distance (a distance that does not hinder the operation of the escape mechanism), and the suction surface 13 has a vacuum passage 1
4 is opened.

【0013】このように構成された本実施例装置を用い
た本発明の搬送方法を図3により説明する。先ず、ウエ
ハをカセットより取り出すときは、図3(a) に示すよ
うに吸着板の真空吸引口15から真空吸引し、ウエハ5
を吸着し、カセットから引き上げる。次いで搬送に移る
前に、図3(b) に示すように固定手段12の真空吸引
口16から真空吸引して真空吸着面13に吸着板10を
吸着し固定する。次いで図3(b) の状態を維持してウ
エハ5をバスケットまで搬送する。ここで、固定手段1
2は吸着板10の吸着を解除し、吸着ユニットは下降し
てウエハ5をバスケットに挿入する。また逆方向も同様
にして搬送する。
The carrying method of the present invention using the apparatus of the present embodiment thus constructed will be described with reference to FIG. First, when the wafer is taken out from the cassette, vacuum suction is performed from the vacuum suction port 15 of the suction plate as shown in FIG.
Adsorb and pull up from the cassette. Then, before moving to conveyance, vacuum suction is performed from the vacuum suction port 16 of the fixing means 12 to suck and fix the suction plate 10 on the vacuum suction surface 13 as shown in FIG. 3B. Next, the wafer 5 is transferred to the basket while maintaining the state of FIG. Here, the fixing means 1
2 releases the suction of the suction plate 10, and the suction unit descends to insert the wafer 5 into the basket. Further, the reverse direction is similarly conveyed.

【0014】このようにウエハを搬送することにより、
ウエハを吸着保持している吸着板10は固定手段12に
よって固定板9に固定されるため搬送中の振動は低減さ
れる。従ってバスケット又はカセットへのウエハ挿入待
機時間が節減でき高速搬送が可能となる。また、ウエハ
のカセット又はバスケットからの取り出し、又は挿入時
は固定手段12の吸着作用を解除するため、ウエハが溝
に当たるような場合の過負荷発生時の逃げ機構の機能を
阻害することはない。
By carrying the wafer in this way,
Since the suction plate 10 holding the wafer by suction is fixed to the fixed plate 9 by the fixing means 12, the vibration during transportation is reduced. Therefore, the waiting time for inserting the wafer into the basket or the cassette can be reduced, and high-speed transfer becomes possible. Further, when the wafer is taken out of the cassette or the basket or inserted, the attracting action of the fixing means 12 is released, so that the function of the escape mechanism at the time of occurrence of an overload when the wafer hits the groove is not hindered.

【0015】なお、上記の固定手段12には位置決め機
能を付与することができる。図4(a) は固定手段12
の真空通路14の開口部に円錐形の窪み17を形成し、
吸着板10には該窪み17に嵌合する突起18を設けた
ものである。そして吸着板10を吸着固定した場合は図
4(b) に示すように円錐状の窪み17と円錐状の突起
18とが嵌合し吸着板10の縦・横方向の位置決めをす
ることができる。
The fixing means 12 can be provided with a positioning function. FIG. 4A shows the fixing means 12
A conical recess 17 is formed in the opening of the vacuum passage 14 of
The suction plate 10 is provided with a protrusion 18 that fits into the recess 17. When the suction plate 10 is fixed by suction, as shown in FIG. 4 (b), the conical recess 17 and the conical projection 18 are fitted to each other, so that the suction plate 10 can be positioned vertically and horizontally. ..

【0016】ここで位置決めは、1つは搬送中の位置決
めで他の1つはカセットなどに入れる直前までこの位置
決めを行っておくと、搬送中のトラブルを低減すること
ができる。(過負荷逃げ機構にばね性をもたせているた
め不定位置になり易い。)また図4の突起18を図5の
如く半球状としても同様な効果が得られる。
[0016] Here, if one of the positioning is carried out during transportation and the other one is carried out until just before being placed in a cassette or the like, troubles during transportation can be reduced. (Because the overload escape mechanism has a spring property, it tends to be in an indefinite position.) Further, the same effect can be obtained by forming the projection 18 in FIG. 4 into a hemispherical shape as shown in FIG.

【0017】図6は本発明の搬送装置の他の実施例にお
ける搬送物吸着ユニットを示す図である。同図において
図2と同一部分は同一符号を付して示した。本実施例は
基本的には図2に示した前実施例と同様であり、異なる
ところは、固定手段12を変更したことである。即ち固
定手段12は前実施例では真空吸引機構を用いたが本実
施例では電磁石19を用いたことである。このように構
成された本実施例は、電磁石19を作動させることによ
り吸着板10を吸引して固定することができる。従っ
て、ウエハの搬送において前実施例と同様な効果が得ら
れる。また、図4,図5と同様な位置決め機構を設ける
ことも可能である。
FIG. 6 is a view showing a conveyed object adsorption unit in another embodiment of the conveying apparatus of the present invention. In the figure, the same parts as those in FIG. 2 are designated by the same reference numerals. This embodiment is basically the same as the previous embodiment shown in FIG. 2, except that the fixing means 12 is changed. That is, the fixing means 12 used the vacuum suction mechanism in the previous embodiment, but used the electromagnet 19 in the present embodiment. In this embodiment configured as described above, the attraction plate 10 can be attracted and fixed by operating the electromagnet 19. Therefore, the same effect as in the previous embodiment can be obtained in the wafer transfer. It is also possible to provide a positioning mechanism similar to that shown in FIGS.

【0018】[0018]

【発明の効果】本発明に依れば、搬送物吸着ユニットの
吸着板を固定する固定手段を設けたことにより、搬送中
の搬送物の振動を低減することができ高速搬送が可能と
なる。また過負荷などの為に取り付け部に柔軟性を持た
せた吸着板の位置決めが可能となる。
According to the present invention, by providing the fixing means for fixing the suction plate of the transported object suction unit, it is possible to reduce the vibration of the transported object during the transportation, and it becomes possible to perform high speed transportation. Further, it is possible to position the suction plate having a flexible mounting portion due to overload or the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の搬送装置の実施例を示す斜視図であ
る。
FIG. 1 is a perspective view showing an embodiment of a carrying device of the present invention.

【図2】本発明の搬送装置の実施例における搬送物吸着
ユニットを示す図で、(a)は側面図、(b)は(a)
図のZ矢視図である。
2A and 2B are views showing a conveyed object suction unit in an example of the conveying apparatus of the present invention, FIG. 2A is a side view, and FIG.
It is a Z arrow line view of a figure.

【図3】本発明の搬送方法を説明するための図である。FIG. 3 is a diagram for explaining a carrying method of the present invention.

【図4】本発明の搬送装置の実施例における固定手段の
位置決め機構を示す図で、(a)は吸着前の状態、
(b)は吸着状態を示す図である。
FIG. 4 is a view showing a positioning mechanism of a fixing means in an embodiment of the carrying device of the present invention, (a) is a state before adsorption,
(B) is a figure which shows an adsorption | suction state.

【図5】本発明の搬送装置の実施例における固定手段の
他の位置決め機構を示す図である。
FIG. 5 is a view showing another positioning mechanism of the fixing means in the embodiment of the carrying device of the present invention.

【図6】本発明の搬送装置の他の実施例における搬送物
吸着ユニットを示す図である。
FIG. 6 is a diagram showing a conveyed product adsorption unit in another embodiment of the conveying device of the present invention.

【図7】従来の搬送装置を示す図である。FIG. 7 is a diagram showing a conventional transport device.

【図8】従来の搬送装置における搬送物吸着ユニットを
示す図で、(a)は側面図、(b)は(a)図のZ矢視
図、(c)は(a)図のc−c線における断面図であ
る。
8A and 8B are views showing a transported object suction unit in a conventional transport device, in which FIG. 8A is a side view, FIG. 8B is a Z arrow view in FIG. 8A, and FIG. 8C is c- in FIG. It is sectional drawing in the c line.

【符号の説明】[Explanation of symbols]

1…ロボット 2…垂直軸 3…アーム 4…搬送物吸着ユニット 9…固定板 10…吸着板 11…ばね(過負荷逃げ機構) 12…固定手段 13…真空吸着面 14…真空通路 15,16…真空吸引口 17…窪み 18…突起 19…電磁石 DESCRIPTION OF SYMBOLS 1 ... Robot 2 ... Vertical axis 3 ... Arm 4 ... Conveyance object adsorption unit 9 ... Fixed plate 10 ... Adsorption plate 11 ... Spring (overload escape mechanism) 12 ... Fixing means 13 ... Vacuum adsorption surface 14 ... Vacuum passages 15, 16 ... Vacuum suction port 17 ... Dent 18 ... Protrusion 19 ... Electromagnet

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 過負荷発生時の逃げ機構を介して被搬送
物を支持して搬送するロボットによる搬送方法におい
て、 上記被搬送物を搬送中は上記逃げ機構(11)を真空吸
着又は電磁石を用いた固定手段(12)により固定し、
搬送中の被搬送物の振動を低減させることを特徴とする
搬送方法。
1. A transfer method by a robot for supporting and transferring an object to be transferred via an escape mechanism when an overload occurs, wherein a vacuum suction or an electromagnet is provided to the escape mechanism (11) during the transfer of the object to be conveyed. Secure with the securing means (12) used,
A conveyance method for reducing vibration of a conveyed object during conveyance.
【請求項2】 被搬送物支持部に過負荷発生時の逃げ機
構を有する搬送装置において、 上記逃げ機構(11)を真空吸着又は電磁石を用いて固
定する固定手段(12)を設けて成ることを特徴とする
搬送装置。
2. A transfer device having an escape mechanism at the time of occurrence of overload in the object support portion, comprising fixing means (12) for fixing the escape mechanism (11) by vacuum suction or electromagnet. A transport device characterized by.
【請求項3】 上記逃げ機構(11)を固定する固定手
段(12)に位置決め機能を持たせたことを特徴とする
請求項2の搬送装置。
3. The transfer device according to claim 2, wherein the fixing means (12) for fixing the escape mechanism (11) has a positioning function.
JP5792192A 1992-03-16 1992-03-16 Transfer device Expired - Fee Related JP3217110B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5792192A JP3217110B2 (en) 1992-03-16 1992-03-16 Transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5792192A JP3217110B2 (en) 1992-03-16 1992-03-16 Transfer device

Publications (2)

Publication Number Publication Date
JPH05253879A true JPH05253879A (en) 1993-10-05
JP3217110B2 JP3217110B2 (en) 2001-10-09

Family

ID=13069470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5792192A Expired - Fee Related JP3217110B2 (en) 1992-03-16 1992-03-16 Transfer device

Country Status (1)

Country Link
JP (1) JP3217110B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001127139A (en) * 1999-09-16 2001-05-11 Applied Materials Inc Multiple handling robot blade for semiconductor treating device
JP2011513887A (en) * 2008-03-13 2011-04-28 ザイラテックス インターナショナル End effector
CN111890383A (en) * 2020-08-11 2020-11-06 江苏昱博自动化设备有限公司 Four-way rotating seat type power-assisted manipulator
WO2021241181A1 (en) * 2020-05-29 2021-12-02 オムロン株式会社 Joint structure for robot

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001127139A (en) * 1999-09-16 2001-05-11 Applied Materials Inc Multiple handling robot blade for semiconductor treating device
JP4596619B2 (en) * 1999-09-16 2010-12-08 アプライド マテリアルズ インコーポレイテッド Substrate processing system, method for transferring substrate in system, robot blade for substrate processing system, and robot for substrate processing system
JP2011513887A (en) * 2008-03-13 2011-04-28 ザイラテックス インターナショナル End effector
WO2021241181A1 (en) * 2020-05-29 2021-12-02 オムロン株式会社 Joint structure for robot
US11865704B2 (en) 2020-05-29 2024-01-09 Omron Corporation Joint structure for robot
CN111890383A (en) * 2020-08-11 2020-11-06 江苏昱博自动化设备有限公司 Four-way rotating seat type power-assisted manipulator

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