JP6950881B2 - 排ガス導入ノズルと水処理装置及び排ガス処理装置 - Google Patents
排ガス導入ノズルと水処理装置及び排ガス処理装置 Download PDFInfo
- Publication number
- JP6950881B2 JP6950881B2 JP2020556333A JP2020556333A JP6950881B2 JP 6950881 B2 JP6950881 B2 JP 6950881B2 JP 2020556333 A JP2020556333 A JP 2020556333A JP 2020556333 A JP2020556333 A JP 2020556333A JP 6950881 B2 JP6950881 B2 JP 6950881B2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- water
- nozzle
- pipe
- water treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 206
- 239000007789 gas Substances 0.000 claims description 263
- 239000011261 inert gas Substances 0.000 claims description 59
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 27
- 238000000197 pyrolysis Methods 0.000 claims description 25
- 239000004065 semiconductor Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 5
- 239000007921 spray Substances 0.000 description 18
- 239000000945 filler Substances 0.000 description 16
- 230000007062 hydrolysis Effects 0.000 description 16
- 238000006460 hydrolysis reaction Methods 0.000 description 16
- 239000000428 dust Substances 0.000 description 15
- 230000002093 peripheral effect Effects 0.000 description 14
- 239000007788 liquid Substances 0.000 description 12
- 239000007795 chemical reaction product Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000005086 pumping Methods 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 238000011049 filling Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
- B01D47/022—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath by using a liquid curtain
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
- B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
- B05B1/044—Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Environmental & Geological Engineering (AREA)
- Biomedical Technology (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
- Nozzles (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2018/041140 WO2020095358A1 (ja) | 2018-11-06 | 2018-11-06 | 排ガス導入ノズルと水処理装置及び排ガス処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2020095358A1 JPWO2020095358A1 (ja) | 2021-02-18 |
| JP6950881B2 true JP6950881B2 (ja) | 2021-10-13 |
Family
ID=70611837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020556333A Active JP6950881B2 (ja) | 2018-11-06 | 2018-11-06 | 排ガス導入ノズルと水処理装置及び排ガス処理装置 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6950881B2 (zh) |
| KR (1) | KR20210057154A (zh) |
| CN (1) | CN113015573A (zh) |
| TW (1) | TWI742424B (zh) |
| WO (1) | WO2020095358A1 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7545317B2 (ja) | 2020-12-21 | 2024-09-04 | 株式会社荏原製作所 | 処理ガス吸入構造および排ガス処理装置 |
| WO2023199410A1 (ja) * | 2022-04-12 | 2023-10-19 | カンケンテクノ株式会社 | 窒素化合物含有排ガスの処理方法及びその装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2767856B2 (ja) * | 1989-02-07 | 1998-06-18 | 三井化学株式会社 | 排ガス処理装置及び排ガスの処理方法 |
| AT397214B (de) * | 1992-03-30 | 1994-02-25 | Chemie Linz Gmbh | Vorrichtung zur abscheidung von melamin |
| JP3016690B2 (ja) | 1994-05-30 | 2000-03-06 | カンケンテクノ株式会社 | 半導体製造排ガス除害方法とその装置 |
| JP3375341B2 (ja) * | 1995-09-08 | 2003-02-10 | 日立造船株式会社 | 排ガス処理方法 |
| JP4067067B2 (ja) * | 1998-06-24 | 2008-03-26 | 株式会社トクヤマ | シラン類含有液の処理装置 |
| JP3476126B2 (ja) * | 1999-03-24 | 2003-12-10 | セイコー化工機株式会社 | 排ガス洗浄装置 |
| JP4174396B2 (ja) * | 2003-09-19 | 2008-10-29 | カンケンテクノ株式会社 | 排ガス導入構造および該構造を用いた排ガス処理装置 |
| US7771514B1 (en) * | 2004-02-03 | 2010-08-10 | Airgard, Inc. | Apparatus and method for providing heated effluent gases to a scrubber |
| TW200829325A (en) * | 2007-01-15 | 2008-07-16 | Kanken Techno Co Ltd | Apparatus and method for processing gas |
| JP2008183563A (ja) * | 2008-05-07 | 2008-08-14 | Anemosu:Kk | 気体中の異種物質の除去装置 |
| CN101592167A (zh) * | 2008-05-26 | 2009-12-02 | 刘伟杰 | 一种多功能蒸汽射流引风机 |
| JP2010144632A (ja) * | 2008-12-19 | 2010-07-01 | Ud Trucks Corp | 排気浄化装置 |
| JP5540035B2 (ja) * | 2012-03-22 | 2014-07-02 | カンケンテクノ株式会社 | ガス処理装置 |
| US9937467B2 (en) * | 2014-10-06 | 2018-04-10 | Kanken Techno Co., Ltd. | Exhaust gas processing device |
| CN104722170A (zh) * | 2015-02-27 | 2015-06-24 | 广东电网有限责任公司电力科学研究院 | 声、雾结合促进pm2.5长大的方法及专用装置 |
| DE102015107015A1 (de) * | 2015-05-05 | 2016-11-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Abgasbehandlungseinrichtung für Abgas einer Kleinfeuerungsanlage und Verfahren zur Behandlung von Abgas einer Kleinfeuerungsanlage |
| CN108619876A (zh) * | 2018-07-09 | 2018-10-09 | 安徽京仪自动化装备技术有限公司 | 一种半导体制程废气中氟化物的净化装置 |
-
2018
- 2018-11-06 CN CN201880099226.8A patent/CN113015573A/zh active Pending
- 2018-11-06 JP JP2020556333A patent/JP6950881B2/ja active Active
- 2018-11-06 WO PCT/JP2018/041140 patent/WO2020095358A1/ja active Application Filing
- 2018-11-06 KR KR1020217011007A patent/KR20210057154A/ko not_active Application Discontinuation
-
2019
- 2019-09-06 TW TW108132194A patent/TWI742424B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI742424B (zh) | 2021-10-11 |
| TW202023675A (zh) | 2020-07-01 |
| JPWO2020095358A1 (ja) | 2021-02-18 |
| KR20210057154A (ko) | 2021-05-20 |
| WO2020095358A1 (ja) | 2020-05-14 |
| CN113015573A (zh) | 2021-06-22 |
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