JP6638936B2 - 表面被覆切削工具およびその製造方法 - Google Patents
表面被覆切削工具およびその製造方法 Download PDFInfo
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- JP6638936B2 JP6638936B2 JP2016004572A JP2016004572A JP6638936B2 JP 6638936 B2 JP6638936 B2 JP 6638936B2 JP 2016004572 A JP2016004572 A JP 2016004572A JP 2016004572 A JP2016004572 A JP 2016004572A JP 6638936 B2 JP6638936 B2 JP 6638936B2
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- Prior art keywords
- cutting edge
- flank
- tialn layer
- tool
- base material
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- 238000005520 cutting process Methods 0.000 title claims description 187
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 229910010037 TiAlN Inorganic materials 0.000 claims description 120
- 239000000463 material Substances 0.000 claims description 61
- 238000000576 coating method Methods 0.000 claims description 45
- 239000011248 coating agent Substances 0.000 claims description 44
- 239000000758 substrate Substances 0.000 claims description 37
- 238000005229 chemical vapour deposition Methods 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 22
- 238000006243 chemical reaction Methods 0.000 claims description 21
- 239000013078 crystal Substances 0.000 claims description 21
- 229910052719 titanium Inorganic materials 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 10
- 239000002994 raw material Substances 0.000 claims description 9
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- 239000011780 sodium chloride Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 124
- 239000007789 gas Substances 0.000 description 36
- 238000000034 method Methods 0.000 description 30
- 238000005259 measurement Methods 0.000 description 22
- 239000010936 titanium Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 9
- 238000002441 X-ray diffraction Methods 0.000 description 7
- 230000006378 damage Effects 0.000 description 7
- 230000012447 hatching Effects 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 239000002173 cutting fluid Substances 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000011195 cermet Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000012217 deletion Methods 0.000 description 2
- 230000037430 deletion Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002050 diffraction method Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/24—Cross section of the cutting edge
- B23B2200/242—Cross section of the cutting edge bevelled or chamfered
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/24—Cross section of the cutting edge
- B23B2200/245—Cross section of the cutting edge rounded
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/24—Cross section of the cutting edge
- B23B2200/247—Cross section of the cutting edge sharp
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/24—Titanium aluminium nitride
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/04—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by chemical vapour deposition [CVD]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/10—Coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/10—Coatings
- B23B2228/105—Coatings with specified thickness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23C2228/10—Coating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Drilling Tools (AREA)
Description
0.65<XR≦0.9、
0.65<XF≦0.9、
0.4≦XE≦0.7、
XR−XE≧0.2、
およびXF−XE≧0.2を満たす。
最初に本発明の実施態様を列記して説明する。なお、本明細書の結晶学的記載においては、個別面を()で示す。また、本明細書において「A〜B」という形式の表記は、範囲の上限下限(すなわちA以上B以下)を意味しており、Aにおいて単位の記載がなく、Bにおいてのみ単位が記載されている場合、Aの単位とBの単位とは同じである。また本明細書において、「TiAlN」、「TiN」、「TiCN」等の化学式において特に原子比を特定していないものは、各元素の原子比が「1」のみであることを示すものではなく、従来公知の原子比が全て含まれるものとする。
0.65<XR≦0.9、
0.65<XF≦0.9、
0.4≦XE≦0.7、
XR−XE≧0.2、
およびXF−XE≧0.2を満たす。
以下、本発明の一実施形態(以下「本実施形態」と記す)について説明するが、本実施形態はこれらに限定されるものではない。
図1に示されるように、本実施形態の表面被覆切削工具1(以下、単に「工具1」とも記す)は、上面、下面および四つの側面を含む表面を有しており、全体として、上下方向にやや薄い四角柱形状である。また、工具1には、上下面を貫通する貫通孔が形成されており、工具1の4つの側面の境界部分においては、隣り合う側面同士が円弧面で繋がれている。
図2および図3に示されるように、本実施形態の基材2は、すくい面2aと、逃げ面2bとを有する。また、すくい面2aと逃げ面2bとの境界部分が切れ刃2cを成す。「すくい面2aと逃げ面2bとの境界部分」とは、上述の「すくい面11と逃げ面12との境界部分」と同様に、「すくい面2aと逃げ面2bとの境界を成す稜線と、すくい面2aおよび逃げ面2bのうち稜線近傍となる部分と、を併せた部分」を意味する。また「すくい面2aと逃げ面2bのうち稜線近傍となる部分」とは、工具1の切れ刃13の形状がシャープエッジ形状であるか、ホーニング形状であるか、ネガランド形状であるかによって、上述のように定義されることとなる。
本実施形態の被膜3は、TiAlN層を有する限り、他の層を含んでも良いし、含まなくても良い。他の層としては、たとえばTiN層、TiCN層、TiBNO層、TiCNO層、Al2O3層、TiB2層、TiAlN層、TiAlCN層、TiAlON層、TiAlONC層等を挙げることができる。その積層の順も特に限定されない。
本実施形態の被膜3は、TiAlN層を含む。このTiAlN層は、当該被膜3中に1層または2層以上含まれることができる。
回折法 :θ−2θ法
X線源 :Cu−Kα線(1.541862Å)
検出器 :D/Tex Ultra250
管電圧 :45kV
管電流 :200mA
スキャンスピード:20°/分
スキャン範囲 :15〜85°
スリット :2.0mm。
(1)0.65<XR≦0.9;
(2)0.65<XF≦0.9;
(3)0.4≦XE≦0.7;
(4)XR−XE≧0.2;
(5)およびXF−XE≧0.2。
加速電圧 :15kV
プロセスタイム :5
スペクトルレンジ:0〜20keV
チャンネル数 :1K
フレーム数 :150
X線取り出し角度:30°。
回折法:θ−2θ法
X線源:Cu−Kα線(1.541862Å)
検出器:D/Tex Ultra250
管電圧:45kV
管電流:200mA
スキャンスピード:20°/分
スキャン範囲:15〜85°
スリット:2.0mm。
本実施形態の被膜3は、上述のように、他の層を含んでも良い。他の層の例示は上記において列挙したが、たとえば、基材2の表面に接する下地層としては、TiCN層またはTiN層が好適である。この場合、基材2と被膜3との密着性に優れる。また、被膜3の最表面に位置する表面層としては、TiCNO層またはAl2O3層が好適である。この場合、被膜3の耐酸化性がより優れることとなる。
本実施形態の表面被覆切削工具は、反応炉内に配置された基材上に、CVD法によりTiAlN層を形成するTiAlN層形成工程を含む。TiAlN層形成工程は、TiおよびAlを含む第1原料ガスおよびアンモニアを含む第2原料ガスを、基材が配置された反応炉内に供給する第1工程を含む。そして、この第1工程においては、切れ刃領域に対応する基材の表面に到達するAlの量は、すくい面領域に対応する基材の表面に到達するAlの量および逃げ面領域に対応する基材の表面に到達するAlの量の各々よりも少ない。
以下の表1に記載の基材Kおよび基材Lの2種類の基材を準備した。具体的には、表1に記載の配合組成からなる原料粉末を均一に混合し、所定の形状に加圧成形した後、1300〜1500℃で1〜2時間焼結することにより、形状がCNMG120408N−GU(住友電気工業製)(基材K)およびSEET13T3AGSN−G(住友電気工業製)(基材L)の超硬合金製の基材を得た。
上記で得られた各基材に対してその表面に被膜を形成した。具体的には、基材を化学気相蒸着装置の反応炉内にセットすることにより、基材上に化学気相蒸着法により被膜を形成した。
上記の表2および表3の条件により、基材上に被膜を形成することにより、以下の表4に示した試料No.1〜36の表面被覆切削工具を作製した。
TiAlN層の特性評価用として、基材K上に、形成条件a〜oの各方法でTiAlN層を作製し、該TiAlN層の各種特性を評価した。その結果を表5に示す。
以下の表6に記載した実施例および比較例の表面被覆切削工具について、以下の切削条件により逃げ面摩耗量(Vb)が0.20mmとなるまでの切削時間を測定するとともに切れ刃の最終損傷形態を観察した。その結果を表6に示す。切削時間が長いもの程、硬度に優れ、工具寿命が長くなっていることを示す。また、最終損傷形態が「摩耗」であるものは、切れ刃が欠損することなく摩耗したことを意味し、最終損傷形態が「チッピング」であるものは、切れ刃にチッピングが生じたことを意味する。
被削材:FCD600丸棒外周切削
周速:200m/min
送り速度:0.15mm/rev
切込み量:1.0mm
切削液:あり。
以下の表7に記載した実施例および比較例の表面被覆切削工具について、以下の切削条件により、切れ刃が欠損するまでの切削時間を測定した。その結果を表7に示す。切削時間が長いもの程、耐欠損性に優れていることを示す。
被削材:SCM435溝材
周速:200m/min
送り速度:0.20mm/rev
切込み量:1.0mm
切削液:あり。
以下の表8に記載した実施例および比較例の表面被覆切削工具について、以下の切削条件により逃げ面摩耗量(Vb)が0.20mmとなるまでの切削距離を測定するとともに切れ刃の最終損傷形態を観察した。その結果を表8に示す。切削距離が長いもの程、硬度に優れ、工具寿命が長くなっていることを示す。また、最終損傷形態が「欠損」であるものは、切れ刃に欠損が生じたことを意味する。「欠損」とは、「チッピング」が微小な欠けであるのに対し、「欠損」とは切れ刃の生じた大きな欠けを意味する。
被削材:FCD700ブロック材
周速:350m/min
送り速度:0.30mm/rev
切込み量:2.0mm
切削液:あり
カッタ:WGC4160(住友電工ハードメタル株式会社製)。
以下の表9に記載した実施例および比較例の表面被覆切削工具について、以下の切削条件により逃げ面摩耗量(Vb)が0.20mmとなるまでの切削距離を測定するとともに切れ刃の最終損傷形態を観察した。その結果を表9に示す。切削距離が長いもの程、耐欠損性に優れ、工具寿命が長くなっていることを示す。
被削材:S450Cブロック材
周速:160m/min
送り速度:0.30mm/rev
切込み量:2.0mm
切削液:なし
カッタ:WGC4160(住友電工ハードメタル株式会社製)。
2 基材
2a すくい面
2b 逃げ面
2c 切れ刃
3 被膜
11 すくい面
12 逃げ面
13 切れ刃
E 稜線
F,R 仮想平面
EE 仮想稜線
EF,ER 仮想境界線
51 第1配管
52 第2配管
51a〜51c,52a〜52c 貫通孔
53,54 遮蔽板。
Claims (5)
- 表面を有し、前記表面は、すくい面および逃げ面を含み、前記すくい面および前記逃げ面の境界部分が切れ刃を成す表面被覆切削工具であって、
基材と、
前記基材の表面を被覆する被膜と、を備え、
前記被膜は、NaCl型結晶構造のTiAlN層を有し、
前記TiAlN層のうち、前記切れ刃に位置する切れ刃領域の組成をTi1-XEAlXENとし、前記すくい面に位置するすくい面領域の組成をTi1-XRAlXRNとし、かつ前記逃げ面に位置する逃げ面領域の組成をTi1-XFAlXFNとした場合に、
0.65<XR≦0.9、0.65<XF≦0.9、0.4≦XE≦0.7、XR−XE≧0.2、およびXF−XE≧0.2を満たす、表面被覆切削工具。 - 前記TiAlN層において、(111)面の配向性指数TC(111)は、1.0<TC(111)≦4.0を満たす、請求項1に記載の表面被覆切削工具。
- 前記TiAlN層は、1μm以上10μm以下の厚みを有する、請求項1または請求項2に記載の表面被覆切削工具。
- 前記被膜は、3μm以上15μm以下の厚みを有する、請求項1から請求項3のいずれか1項に記載の表面被覆切削工具。
- 請求項1から請求項4のいずれか1項に記載の表面被覆切削工具の製造方法であって、
反応炉内に配置された前記基材上に、CVD法により前記TiAlN層を形成するTiAlN層形成工程を含み、
前記TiAlN層形成工程は、
TiおよびAlを含む第1原料ガスおよびアンモニアを含む第2原料ガスを、前記基材が配置された前記反応炉内に供給する第1工程を含み、
前記第1工程において、
前記切れ刃領域に対応する前記基材の表面に到達する前記Alの量は、前記すくい面領域に対応する基材の表面に到達する前記Alの量および前記逃げ面領域に対応する基材の表面に到達する前記Alの量の各々よりも少なく、
前記第1原料ガスおよび前記第2原料ガスは、それぞれ第1配管の貫通孔および第2配管の貫通孔を介して前記反応炉内に噴出され、
前記基材の前記切れ刃領域に対応する表面と、前記貫通孔から噴出された各ガスとの間に遮蔽板が配置される、表面被覆切削工具の製造方法。
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