JP6284188B2 - フッ素系有機化合物の分解方法、及びフッ素系有機化合物の分解装置 - Google Patents
フッ素系有機化合物の分解方法、及びフッ素系有機化合物の分解装置 Download PDFInfo
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- sulfuric acid
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- 229910052731 fluorine Inorganic materials 0.000 title claims description 57
- 239000011737 fluorine Substances 0.000 title claims description 51
- 238000000034 method Methods 0.000 title claims description 38
- -1 fluorine organic compounds Chemical class 0.000 title description 35
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 267
- 150000002894 organic compounds Chemical class 0.000 claims description 78
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 46
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 45
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 44
- 230000001678 irradiating effect Effects 0.000 claims description 15
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical compound OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 125000001153 fluoro group Chemical group F* 0.000 claims description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 238000000354 decomposition reaction Methods 0.000 description 53
- 238000006243 chemical reaction Methods 0.000 description 50
- 239000000243 solution Substances 0.000 description 28
- 238000005868 electrolysis reaction Methods 0.000 description 27
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 22
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 18
- 239000007864 aqueous solution Substances 0.000 description 14
- 229910002092 carbon dioxide Inorganic materials 0.000 description 11
- 239000001569 carbon dioxide Substances 0.000 description 11
- 150000002500 ions Chemical class 0.000 description 10
- JRKICGRDRMAZLK-UHFFFAOYSA-N peroxydisulfuric acid Chemical compound OS(=O)(=O)OOS(O)(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-N 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000013626 chemical specie Substances 0.000 description 6
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 6
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000007800 oxidant agent Substances 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 125000005385 peroxodisulfate group Chemical group 0.000 description 4
- 238000002835 absorbance Methods 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 150000004812 organic fluorine compounds Chemical class 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000004566 IR spectroscopy Methods 0.000 description 2
- 238000005102 attenuated total reflection Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 238000006303 photolysis reaction Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000006862 quantum yield reaction Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- LRMSQVBRUNSOJL-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)F LRMSQVBRUNSOJL-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- WZKSXHQDXQKIQJ-UHFFFAOYSA-N F[C](F)F Chemical compound F[C](F)F WZKSXHQDXQKIQJ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- 238000001032 ion-exclusion chromatography Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 description 1
- 150000004968 peroxymonosulfuric acids Chemical class 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- DAFQZPUISLXFBF-UHFFFAOYSA-N tetraoxathiolane 5,5-dioxide Chemical compound O=S1(=O)OOOO1 DAFQZPUISLXFBF-UHFFFAOYSA-N 0.000 description 1
- WROMPOXWARCANT-UHFFFAOYSA-N tfa trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.OC(=O)C(F)(F)F WROMPOXWARCANT-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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Description
R1C(O)OH (1)
(一般式(1)中、R1は、少なくとも1つのフッ素原子を含むアルキル基である。)
R1C(O)OH (1)
・セル電流:100A
・電流密度:100A/dm2
・硫酸濃度:7.12mol/L(陽極液、陰極液とも同じ)
・陽極液量:300mL
・陰極液量:300mL
・液温度:28℃
・陽極液流量:1L/min
・陰極液流量:1L/min
・隔膜:住友電工ファインポリマー株式会社製、ポアフロン(登録商標)
RfC(O)O−+SO4 −・ → ・Rf+CO2+SO4 2−
CF3O2・+HO2・ → CF3O2H+O2
CF3O2H → CF3O・+・OH
CF3O・+HO2・ → CF3OH+O2
CF3OH → COF2+HF
COF2+H2O → CO2+2HF
まず、ステンレス製の反応容器の内部に、フッ素系有機化合物を含む水溶液と電解硫酸とを入れる。この反応容器は温度調節用の水浴に入っており、容器内で温度調整用の液体を循環させることで、反応容器の内部に存在する反応溶液の温度が10〜30℃(より具体的には25℃)程度に維持される。反応容器の上部にはサファイヤ製の窓があり、反応溶液はこの窓を通して光源から光照射を受けることになる。光源は、紫外・可視光(220nm〜460nm)を発する水銀キセノンランプを発光体として備えるが、波長320nm以下の紫外線を含むものならば発光体は特に限定されない。反応系内はアルゴンガスで満たすことが望ましいが、空気、窒素ガス等の気体で反応系内を満たしてもよい。
上記の電解硫酸20mLにトリフルオロ酢酸(107.1μmol、5.35mM)を添加してから反応容器に入れ、この反応容器の内部を酸素ガスで0.5MPaまで加圧した後、撹拌しながら水銀キセノンランプから紫外及び可視光(220〜460nm)を照射した。このとき、反応容器内の溶液温度を25℃とした。光照射開始から1時間ごとに、反応溶液をイオンクロマトグラフィー及びイオン排除クロマトグラフィーで分析してトリフルオロ酢酸(TFA)及びフッ化物イオン(F−)濃度を算出し、反応容器内の気相をガスクロマトグラフィーで分析して二酸化炭素(CO2)の濃度を求めた。横軸を光照射時間、縦軸を各化学種の濃度としてこれらのデータをプロットした結果を図3に示す。
電解硫酸の存在下で光照射してトリフルオロ酢酸を分解させた際の量子収率を求めるために、光源を254nmの単色光としたこと以外は実施例1と同様の手順で、トリフルオロ酢酸の濃度変化を観察した。その結果、トリフルオロ酢酸の減少速度は8.89×10−8mol/minと算出された。このときの反応溶液に吸収された光量は4.30einstein/minだったので、トリフルオロ酢酸の分解における量子収率は0.21(=8.89×10−8/4.30×10−7)だった。
電解硫酸を用いる代わりに、上記電解硫酸中のペルオキソ二硫酸イオン(S2O8 2−)と同濃度のペルオキソ二硫酸カリウム(K2S2O8)水溶液を用いたこと以外は、実施例1と同様の手順で光照射を行い、時間の経過に伴うトリフルオロ酢酸、フッ化物イオン及び二酸化炭素濃度の変化を求めた。横軸を光照射時間、縦軸を各化学種の濃度としてこれらのデータをプロットした結果を図4に示す。
電解硫酸を用いる代わりに、上記電解硫酸中の過酸化水素(H2O2)と同濃度の過酸化水素水溶液を用いたこと以外は、実施例1と同様の手順で光照射を行った。しかしながら、トリフルオロ酢酸は全く分解されなかった。
Claims (6)
- 分解対象であるフッ素系有機化合物に対して、電解硫酸の存在下で光照射することを特徴とするフッ素系有機化合物の分解方法。
- 前記フッ素系有機化合物が下記一般式(1)で表されるフッ素化カルボン酸である請求項1記載のフッ素系有機化合物の分解方法。
R1C(O)OH (1)
(一般式(1)中、R1は、少なくとも1つのフッ素原子を含むアルキル基である。) - 前記フッ素系有機化合物を含む被処理水に硫酸及び/又は電解硫酸を添加し、この被処理水に浸された陽極と陰極との間に電圧を印加することによって、前記被処理水に含まれる硫酸を前記陽極にて酸化させ電解硫酸とすることを特徴とする請求項1又は2記載のフッ素系有機化合物の分解方法。
- 前記フッ素系有機化合物がパーフルオロカルボン酸である請求項1〜3のいずれか1項記載のフッ素系有機化合物の分解方法。
- 前記パーフルオロカルボン酸がトリフルオロ酢酸である請求項4記載のフッ素系有機化合物の分解方法。
- 硫酸及び分解対象であるフッ素系有機化合物を含む被処理水を収容可能な槽と、前記被処理水が存在したときに、前記被処理水に浸るように設けられ電源に接続可能な陽極及び陰極と、前記被処理水に光を照射するための光照射手段と、を備え、
前記被処理水の存在時に前記陽極及び前記陰極の間に電圧を印加して前記陽極側にて硫酸を酸化させて電解硫酸を生じさせ、この電解硫酸の存在下で前記被処理水に光照射することで前記フッ素系有機化合物を分解させることを特徴とするフッ素系有機化合物の分解装置。
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