JP5915350B2 - パワー半導体モジュール - Google Patents
パワー半導体モジュール Download PDFInfo
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- JP5915350B2 JP5915350B2 JP2012095791A JP2012095791A JP5915350B2 JP 5915350 B2 JP5915350 B2 JP 5915350B2 JP 2012095791 A JP2012095791 A JP 2012095791A JP 2012095791 A JP2012095791 A JP 2012095791A JP 5915350 B2 JP5915350 B2 JP 5915350B2
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- 239000004065 semiconductor Substances 0.000 title claims description 107
- 239000003990 capacitor Substances 0.000 claims description 61
- 239000000758 substrate Substances 0.000 claims description 56
- 239000003985 ceramic capacitor Substances 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 239000004020 conductor Substances 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 description 21
- 239000010949 copper Substances 0.000 description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 20
- 238000010586 diagram Methods 0.000 description 13
- 229910000679 solder Inorganic materials 0.000 description 12
- 239000000463 material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000011888 foil Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000017525 heat dissipation Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000016507 interphase Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G2/00—Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
- H01G2/02—Mountings
- H01G2/06—Mountings specially adapted for mounting on a printed-circuit support
- H01G2/065—Mountings specially adapted for mounting on a printed-circuit support for surface mounting, e.g. chip capacitors
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- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/40—Structural combinations of fixed capacitors with other electric elements, the structure mainly consisting of a capacitor, e.g. RC combinations
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- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/19—Manufacturing methods of high density interconnect preforms
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- H01G4/00—Fixed capacitors; Processes of their manufacture
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- H01L25/07—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
- H01L25/072—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
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- Condensed Matter Physics & Semiconductors (AREA)
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- Inverter Devices (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
このパワー半導体モジュール201は、パワー半導体チップ205の主電極が複数のポスト電極211により電気的に接続されるタイプのパワー半導体モジュールで、特許文献1に記載されている。
この電力変換装置は、回路構成としてノイズフィルタ部215と主回路部216、制御回路部217の3つの回路部に大別される。ノイズフィルタ部215は、3相交流電源218と入力端子R,S,Tを介して3本の電力ラインにそれぞれ直列に接続されたリアクトル219と接地コンデンサ220と相間コンデンサ221とからなる。
が回転する。
また、特許請求の範囲の請求項2記載の発明によれば、請求項1に記載の発明において、前記上基板の導電パターンの厚さが3mm以上である構成からなるものとする。
<実施例1>
図1は、この発明の第1実施例のパワー半導体モジュール100の構成図であり、同図(a)は要部平面図、同図(b)は同図(a)の矢印Kの方向から見た要部側面図である。同図(a)は樹脂16内の各部の配置図である。このパワー半導体モジュール100は半導体チップ6の主電極と絶縁性の基材10(プリント基板)の間が複数のポスト電極8により電気的に接続されているタイプである。パワー半導体モジュール100は先行技術として記載したもののように、パワー半導体を用いて電力制御などの用途のために電流のスイッチングなどを行うものである。
つぎに、前記のコンデンサ17として使用したセラミックコンデンサ18の内部構成を説明する。
また、(3)の場合より銅配線9を厚くすることで、熱抵抗Rjbが低減し、熱抵抗Rjcをさらに低減させることができる。以上述べた実施例1によればチップ6表面側から絶縁基板にいたる熱抵抗Rjcを低減することができる。
<実施例2>
図6は、この発明の第2実施例のパワー半導体モジュール200の要部平面図である。図1のパワー半導体モジュール100との違いは、複数のコンデンサ17がパワー半導体チップ6の周りに配置されている点である。このように、複数個配置することでコンデンサ17の容量は大きくなり、スイッチングノイズを一層低減することができる。さらに、コンデンサ17の占有面積を広げることができるので、熱抵抗Rjcをさらに低下させることができる。
2、3 銅板
4 絶縁基板
5 はんだ
6 パワー半導体チップ
6a IGBTチップ
6b FWDチップ
7 はんだ
8 ポスト電極
9 銅配線
10 基材(絶縁性)
11 プリント基板
12 コレクタ側接続端子
13 エミッタ側接続端子
14 出力端子
15 ゲート用接続端子
15a エミッタ信号用端子
16 樹脂
17 コンデンサ
17a コンデンサ下部
18 セラミックコンデンサ
19 誘電体
20 内部電極
21 外部電極
Claims (7)
- 上基板とパワー半導体チップがその上面に搭載された下基板とがあって、前記パワー半導体チップと前記上基板とは導体で接続され、前記パワー半導体チップに並列接続されるコンデンサが、前記パワー半導体チップから0.3mm以上10mm以下の範囲で配置され、かつ前記上基板と前記下基板を縦方向に繋いでおり、前記上基板、前記下基板、前記パワー半導体チップ及び前記コンデンサが、前記下基板の前記半導体チップが搭載された前記上面に対抗する下面が露出するように樹脂で封止され、前記パワー半導体チップの上面から前記導体、前記上基板及び前記コンデンサを経由して前記下基板の下面に至る経路の熱抵抗が0.3℃/W以下であることを特徴とするパワー半導体モジュール。
- 前記上基板の導電パターンの厚さが3mm以上であることを特徴とする請求項1に記載のパワー半導体モジュール。
- 前記コンデンサは並列接続された複数のコンデンサからなることを特徴とする請求項1又は2に記載のパワー半導体モジュール。
- 前記コンデンサの容量が10pFから1μFであることを特徴とする請求項1又は2に記載のパワー半導体モジュール。
- 前記複数のコンデンサの合成容量が10pFから1μFであることを特徴とする請求項3に記載のパワー半導体モジュール。
- 前記上基板が、プリント基板であり、前記下基板が導電パターン付絶縁基板であり、前記導体がポスト電極であり、前記導電パターン付絶縁基板の導電パターンに外部導出端子が接続し、前記導電パターン付絶縁基板の裏面側導電膜と前記外部導出端子の先端部を露出させ全体を樹脂で封止することを特徴とする請求項1乃至5のいずれか一項に記載のパワー半導体モジュール。
- 前記コンデンサがセラミックコンデンサチップであることを特徴とする請求項1乃至6のいずれか一項に記載のパワー半導体モジュール。
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Application Number | Priority Date | Filing Date | Title |
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JP2012095791A JP5915350B2 (ja) | 2012-04-19 | 2012-04-19 | パワー半導体モジュール |
US13/765,853 US8836080B2 (en) | 2012-04-19 | 2013-02-13 | Power semiconductor module |
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JP2012095791A JP5915350B2 (ja) | 2012-04-19 | 2012-04-19 | パワー半導体モジュール |
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JP2013222950A JP2013222950A (ja) | 2013-10-28 |
JP5915350B2 true JP5915350B2 (ja) | 2016-05-11 |
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JP2012095791A Active JP5915350B2 (ja) | 2012-04-19 | 2012-04-19 | パワー半導体モジュール |
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JP (1) | JP5915350B2 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014069363A1 (ja) * | 2012-11-02 | 2014-05-08 | ローム株式会社 | チップコンデンサ、回路アセンブリ、および電子機器 |
DE112014002061T5 (de) * | 2013-10-29 | 2016-01-07 | Fuji Electric Co., Ltd. | Halbleitermodul |
JP6037045B2 (ja) * | 2013-10-29 | 2016-11-30 | 富士電機株式会社 | 半導体モジュール |
US9385111B2 (en) * | 2013-11-22 | 2016-07-05 | Infineon Technologies Austria Ag | Electronic component with electronic chip between redistribution structure and mounting structure |
JP6202195B2 (ja) * | 2014-04-14 | 2017-09-27 | 富士電機株式会社 | 半導体装置 |
JP6123738B2 (ja) * | 2014-06-06 | 2017-05-10 | 富士電機株式会社 | 半導体装置 |
WO2016002077A1 (ja) * | 2014-07-04 | 2016-01-07 | 三菱電機株式会社 | 電力用半導体装置 |
JP6417758B2 (ja) * | 2014-07-07 | 2018-11-07 | 富士電機株式会社 | 半導体装置 |
JP6701641B2 (ja) * | 2015-08-13 | 2020-05-27 | 富士電機株式会社 | 半導体モジュール |
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