JP5964590B2 - 光学材料用活性エネルギー線硬化性組成物、硬化物、および製造方法 - Google Patents
光学材料用活性エネルギー線硬化性組成物、硬化物、および製造方法 Download PDFInfo
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- JP5964590B2 JP5964590B2 JP2012002311A JP2012002311A JP5964590B2 JP 5964590 B2 JP5964590 B2 JP 5964590B2 JP 2012002311 A JP2012002311 A JP 2012002311A JP 2012002311 A JP2012002311 A JP 2012002311A JP 5964590 B2 JP5964590 B2 JP 5964590B2
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- acrylate
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
(A)一般式(1):
−OC(O)C(Ra)=CH2 (1)
(式中、Raは水素原子又は炭素数1〜20の有機基を示す)
で表わされる(メタ)アクリロイル基を1分子あたり少なくとも1個有するリビングラジカル重合により得られるアクリル系重合体および(B)光ラジカル重合開始剤を含有する光学材料用活性エネルギー線硬化性組成物であって、
(C)一般式(2):
Rb−OC(O)C(CH3)=CH2 (2)
(式中、Rbは炭素数6〜20の脂環式脂肪族構造または脂肪族分岐構造である有機基を示す)
で表わされるメタクリル酸エステルモノマーおよび/または(D)エポキシ基を有する化合物を含有し、
(C)成分を含む場合には(C)成分の含有量が(A)成分100重量部に対して1〜70重量部であり、(D)成分を含む場合には(D)成分の含有量が(A)成分100重量部に対して0.1〜30重量部である、光学材料用活性エネルギー線硬化性組成物に関する。
Rb−OC(O)C(CH3)=CH2 (2)
(式中、Rbは炭素数6〜20の脂環式脂肪族構造または脂肪族分岐構造である有機基を示す)
で表わされるメタクリル酸エステルモノマーおよび(D)エポキシ基を有する化合物を共に含有することが好ましい。
RC−{OC(O)C(Ra)=CH2}m (3)
(式中、Rcは炭素数6〜20の有機基、Raは水素原子又は炭素数1〜20の有機基、mは2〜6の整数を示す)
で表わされる(メタ)アクリル酸エステルモノマーを含有することが好ましい。
(A)一般式(1):
−OC(O)C(Ra)=CH2 (1)
(式中、Raは水素原子又は炭素数1〜20の有機基を示す)
で表わされる(メタ)アクリロイル基を1分子あたり少なくとも1個有するリビングラジカル重合により得られるアクリル系重合体および(B)光ラジカル重合開始剤を含有する光学材料用活性エネルギー線硬化性組成物であって、
(C)一般式(2):
Rb−OC(O)C(CH3)=CH2 (2)
(式中、Rbは炭素数6〜20の脂環式脂肪族構造または脂肪族分岐構造である有機基を示す)
で表わされるメタクリル酸エステルモノマーおよび/または(D)エポキシ基を有する化合物を含有し、
(C)成分を含む場合には(C)成分の含有量が(A)成分100重量部に対して1〜70重量部であり、(D)成分を含む場合には(D)成分の含有量が(A)成分100重量部に対して0.1〜30重量部である、光学材料用活性エネルギー線硬化性組成物である。
(C)一般式(2):
Rb−OC(O)C(CH3)=CH2 (2)
(式中、Rbは炭素数6〜20の脂環式脂肪族構造または脂肪族分岐構造である有機基を示す)
で表わされるメタクリル酸エステルモノマーおよび(D)エポキシ基を有する化合物を共に含有することが好ましい。
(A)一般式(1):
−OC(O)C(Ra)=CH2 (1)
(式中、Raは水素原子又は炭素数1〜20の有機基を示す)
で表わされる(メタ)アクリロイル基を1分子あたり少なくとも1個有するリビングラジカル重合により得られるアクリル系重合体である。
本発明で使用するアクリル系重合体(A)は、リビングラジカル重合法により得られるが、原料の入手性、重合体末端への官能基導入の容易さから原子移動ラジカル重合が好ましい。上記リビングラジカル重合法、原子移動ラジカル重合は公知の重合法ではあるが、これら各重合法については、たとえば、特開2005−232419公報や、特開2006−291073公報などの記載を参照できる。
(メタ)アクリロイル基の導入は、公知の方法を利用することができる。例えば、特開2004−203932公報段落[0080]〜[0091]記載の方法が挙げられる。これらの方法の中でも制御がより容易である点から、アクリル系重合体の末端ハロゲン基を、(メタ)アクリロイル基を有する化合物で置換することにより製造されたものであることが好ましい。
M+-OC(O)C(Ra)=CH2 (4)
(式中、Raは水素原子又は炭素数1〜20の有機基を示す)
一般式(4)中のRaの具体例としては、例えば、−H、−CH3、−CH2CH3、−(CH2)nCH3(nは2〜19の整数を表す)、−C6H5、−CH2OH、−CN、等が挙げられ、好ましくは−H、−CH3である。
本発明の(B)成分である光ラジカル開始剤としては、アセトフェノン、プロピオフェノン、ベンゾフェノン、キサントール、フルオレイン、ベンズアルデヒド、アンスラキノン、トリフェニルアミン、カルバゾール、3−メチルアセトフェノン、4−メチルアセトフェノン、3−ペンチルアセトフェノン、2,2−ジエトキシアセトフェノン、4−メトキシアセトフェノン、3−ブロモアセトフェノン、4−アリルアセトフェノン、p−ジアセチルベンゼン、3−メトキシベンゾフェノン、4−メチルベンゾフェノン、4−クロロベンゾフェノン、4,4’−ジメトキシベンゾフェノン、4−クロロ−4’−ベンジルベンゾフェノン、3−クロロキサントーン、3,9−ジクロロキサントーン、3−クロロ−8−ノニルキサントーン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインブチルエーテル、ビス(4−ジメチルアミノフェニル)ケトン、ベンジルメトキシケタール、2−クロロチオキサントーン、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オン、1−ヒドロキシ−シクロヘキシル−フェニル−ケトン、2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン、2−メチル−1−[4−(メチルチオ)フェニル]−2−モルフォリノプロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタノン−1、ジベンゾイル、ビス(4−ジエチルアミノフェニル)ケトン、2,4,6−トリメチルベンゾフェノン、3,3’−ジメチル−4−メトキシベンゾフェノン、2−ベンゾイル安息香酸、2−ベンゾイル安息香酸メチル、ジベンゾスベロン等が挙げられる。
(C)成分とは、
(C)一般式(2):
Rb−OC(O)C(CH3)=CH2 (2)
(式中、Rbは炭素数6〜20の脂環式脂肪族構造または脂肪族分岐構造の有機基を示す)
で表わされるメタクリル酸エステルモノマーである。 Rbは、炭素数6以上であるが、炭素数8以上が好ましく、炭素数12以上がより好ましい。炭素数が6未満の場合、(C)成分が揮発性となり高温時の重量変化が大きくなる傾向がある。一方、炭素数20以下であるが、炭素数18以下が好ましい。炭素数が20より多い場合、(C)成分が高粘度となり組成物の低粘度化効果が低くなる傾向がある。
本発明の(D)エポキシ基を有する化合物としては特に限定されないが、具体例を挙げるならば、グリシジル(メタ)アクリレート、メチルグリシジル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレートグリシジルエーテル、3,4−エポキシシクロヘキシルメチル(メタ)アクリレート、メチルグリシジルエーテル、エチルグリシジルエーテル、プロピルグリシジルエーテル、ブチルグリシジルエーテル、2−エチルヘキシルグリシジルエーテル、デシルグリシジルエーテル、ステアリルグリシジルエーテル、アリルグリシジルエーテル、フェニルグリシジルエーテル、グリシドール、エチレングリコールジグリシジルエーテル、ジエチレングリコールジグリシジルエーテル、トリエチレングリコールジグリシジルエーテル、ポリエチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル、ジプロピレングリコールジグリシジルエーテル、トリプロピレングリコールジグリシジルエーテル、ポリプロピレングリコールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,6−ヘキサンジオールジグリシジルエーテル、グリセリンジグリシジルエーテル、トリメチロールプロパントリグリシジルエーテル、水添ビスフェノールAジグリシジルエーテル、3,4−エポキシシクロヘキセニルメチルー3’,4’−エポキシシクロヘキセンカルボキシレート、1,2−エポキシ−4−ビニルシクロヘキサン、1,2:8,9ジエポキシリモネン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−グリシドキシプロピルメチルジメトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリエトキシシランが挙げられる。
本発明には、以下に示す(E)成分を含んでいても良い。
一般式(3):
RC−{OC(O)C(Ra)=CH2}m (3)
(式中、mは2〜6の整数、Raは水素原子又は炭素数1〜20の有機基、Rcは炭素数6〜20の有機基を示す)
で表わされる(メタ)アクリル酸エステルモノマーである。
CH2=CHC(O)O−(CH2)n−OC(O)CH=CH2
(nは6〜20の整数)
CH2=C(CH3)C(O)O−(CH2)n−OC(O)C(CH3)=CH2
(nは6〜20の整数)
CH2=CHC(O)O−(CH2CH2O)n−OC(O)CH=CH2
(nは3〜10の整数)
CH2=C(CH3)C(O)O−(CH2CH2O)n−OC(O)C(CH3)=CH2
(nは3〜10の整数)
鎖状脂肪族構造を有する(E)成分としては、耐熱性および絶縁性が良い点で、エーテル構造を有さないビニル系単量体が好ましい。エーテル構造を有さないビニル系単量体としては、3−メチル−1,5−ペンタンジオールジ(メタ)アクリレート、1,6−ヘキサンジオールジ(メタ)アクリレート、1,7−へプタンジオールジ(メタ)アクリレート、1,8−オクタンジオールジ(メタ)アクリレート、2−メチル−1,8−オクタンジオールジ(メタ)アクリレート、1,9−ノナンジオールジ(メタ)アクリレート、1,10−デカンジオールジ(メタ)アクリレートなどが挙げられる。
本発明には、以下に示す(F)成分を含んでいても良い。
本発明の活性エネルギー線硬化性組成物は、上記(A)〜(B)成分と、(C)成分および/または(D)成分を含有し、必要により(E)成分および/または(F)成分を含有してなるが、物性を調整するために、さらに各種の添加剤、例えば、重合性のモノマー及び/またはオリゴマー、光硬化性樹脂、空気酸化硬化性物質、開始剤、接着性付与剤、カップリング剤、硬化調整剤、金属石鹸、充填材、微小中空粒子、可塑剤、溶剤、難燃剤、紫外線吸収剤、光安定剤、酸化防止剤、熱安定剤、物性調整剤、ラジカル禁止剤、金属不活性化剤、オゾン劣化防止剤、リン系過酸化物分解剤、滑剤、顔料、発泡剤、界面活性剤、保存安定改良剤、無機フィラー、増粘剤、チクソ性付与剤、導電性付与剤、帯電防止剤、放射線遮断剤、核剤、等を必要に応じて適宜配合してもよい。これらの各種添加剤は、単独で用いてもよく、2種類以上を併用してもよい。
本発明の硬化性組成物は、本発明の効果を損なわない範囲で(A)成分、(C)成分、(D)成分、(E)成分以外の、モノマー及び/またはオリゴマーを添加することができる。ラジカル重合性の基を有する、モノマー及び/又はオリゴマーが硬化性の点から好ましい。
CH2=CHC(O)O−(CH2)n−CH3
(nは5〜19の整数)
CH2=C(CH3)C(O)O−(CH2)n−CH3
(nは5〜19の整数)
CH2=CHC(O)O−(CH2CH2O)n−CH3
(nは3〜9の整数)
CH2=C(CH3)C(O)O−(CH2CH2O)n−CH3
(nは3〜9の整数)
CH2=CHC(O)O−(CH2CH2O)n−CH2CH3
(nは2〜9の整数)
CH2=C(CH3)C(O)O−(CH2CH2O)n−CH2CH3
(nは2〜9の整数)
上記の硬化反応を併用する場合、他のビニル系重合体を添加して硬化させることもできる。他のビニル系重合体としては、(A)成分において、官能基である(メタ)アクリロイル基をアルケニル基、加水分解性シリル基に変えたビニル系重合体を使用できる。これらの官能基の導入方法について以下に示す。
得られたビニル系重合体へのヒドロシリル化反応可能なアルケニル基の導入方法としては、公知の方法を利用することができる。例えば、特開2004−059783公報段落[0042]〜[0086]記載の方法が挙げられる。さらに、好ましい例も同段落中に記載されている。
得られたビニル系重合体への加水分解性シリル基の導入方法としては、公知の方法を利用することができる。例えば、特開2000−191912公報段落[0076]〜[0138]記載の方法が挙げられる。さらに、好ましい例も同段落中に記載されている。
(B)成分の光ラジカル開始剤以外の開始剤として、熱ラジカル開始剤、レッドクス開始剤を使用できる。これら開始剤は単独でも、2種以上を併用しても構わない。
本発明の活性エネルギー線硬化性組成物には、シランカップリング剤や、シランカップリング剤以外の接着性付与剤を添加することができる。接着性付与剤を添加すると、本発明の硬化物が被着体から剥離する危険性をより低減することができる。また、場合によっては接着性向上の為に用いるプライマー処理の簡略化が期待される。
本発明の組成物をそのままフィルムなどの薄膜に成形することも可能であるが、該組成物を有機溶剤に溶解してワニスとすることも可能である。使用できる溶剤は特に限定されるものではなく、具体的に例示すれば、ベンゼン、トルエン、ヘキサン、ヘプタンなどの炭化水素系溶媒、テトラヒドロフラン、1,4−ジオキサン、ジエチルエーテルなどのエーテル系溶媒、アセトン、メチルエチルケトンなどのケトン系溶媒、プロピレングリコールモノメチルエーテルアセテート、エチレングリコールモノメチルエーテルアセテートなどのエステル系溶媒、クロロホルム、塩化メチレン、1,2−ジクロロエタンなどのハロゲン系溶媒を好適に用いることができる。溶媒は2種類以上の混合溶媒として用いることもできる。溶媒としてはトルエン、テトラヒドロフラン、プロピレングリコールモノメチルエーテルアセテートが好ましい。
本発明の組成物には必要に応じて無機フィラーを添加してもよい。無機フィラーを添加すると、組成物の流動性の防止、材料の高強度化に効果がある。無機フィラーとしては光学特性を低下させない微粒子状なものが好ましく、アルミナ、水酸化アルミニウム、溶
融シリカ、結晶性シリカ、超微粉無定型シリカや疎水性超微粉シリカ、タルク、硫酸バリウム等を挙げることができる。
本発明の活性エネルギー線硬化型組成物の調整法としては、特に限定されないが、すべての配合成分を1成分型として調製しても良いし、組成物の貯蔵安定性等を考慮して配合成分を分けて配合しておき、使用前に混合する2成分型として調整しても良い。
本発明の硬化物は、上記、活性エネルギー線硬化性組成物を硬化させて得られるものである。硬化方法としては、特に限定されないが、活性エネルギー線源により光又は電子線を照射して、硬化させることができる。活性エネルギー線源としては特に限定はないが、用いる光ラジカル開始剤の性質に応じて、例えば高圧水銀灯、低圧水銀灯、電子線照射装置、ハロゲンランプ、発光ダイオード、半導体レーザー、メタルハライド等が挙げられる。
本発明の硬化性組成物を成形体として用いる場合の成形方法としては、特に限定されず、一般に使用されている各種の成形方法を用いることができる。例えば、注型成形、圧縮成形、トランフファー成形、射出成形、押し出し成形、回転成形、中空成形、熱成形等が挙げられる。特に自動化、連続化が可能で、生産性に優れるという点から、ロール成形、カレンダー成形、押出し成形、液状射出成形、射出成形によるものが好ましい。
本発明の光学材料用活性エネルギー線硬化性組成物および硬化物は、紫外線、可視光線、赤外線、X線、レーザーなどの光をその材料中に通過させる用途に好適である。
止材、接着剤などである。光センシング機器のレンズ用材料、封止材、接着剤、フィルムなどである。
本発明の活性エネルギー線硬化性組成物を用いた一括封止により、LEDモジュール、太陽電池モジュール、又は、フラットパネルディスプレイモジュールを製造することができる。例えば、LED素子を基板上に配置しておき、硬化性組成物で一括封止してから硬化させることにより、LEDモジュールが得られる。
得られたポリマーおよび配合部の粘度は、JIS K 7117−2円すい−平板システムに準拠し、東機産業製E型粘度計を使用し、測定温度23℃で測定した。
松浪ガラス製、白スライドガラス(型番:S1111、1mm厚さ)の上に、厚さ1mmのシリコーンシートの内側を15×55(mm)切り取ったものを貼り合わせ、その内側に活性エネルギー線硬化性組成物を流し込み、ヘラで余分の組成物を取り除き、紫外線照射により厚さ1mmの硬化物を得た。得られた硬化物を用いて硬化物外観、タックの評価、光線透過率の測定を実施した。
フュージョンUVシステムズ・ジャパン株式会社製、型式LH6、Hバルブを使用し、窒素下、紫外線硬化条件は500mW/cm2、3000mJ/cm2とした。なお紫外線光量計はウシオ電機製、UIT−150、受光センサーのピーク波長が365nmのものを使用した。窒素下での紫外線硬化は、石英ガラスの蓋を備えた密閉可能な箱にサンプルを入れて、酸素濃度5000ppm以下で紫外線硬化した。なお酸素濃度は予め市販の酸素濃度計を箱に入れて測定することにより確認した。
得られた硬化物に反り、収縮がないものを○、反り、収縮があるものを×とした。
得られた硬化物を指触してタックがないものを○、タックがあるものを△、指に付着物があるものを×とした。
日本分光製、紫外可視分光光度計V−560を用いて、スキャンスピード200nm/minの条件で、試験片の光線透過率を測定した。各表に450nmの測定結果を示した。松浪ガラス製、白スライドガラス(型番:S1111、1mm厚さ)を標準試料とした。
光線透過率測定のための試験片を、スガ試験機(株)社製、メタリングウェザーメーター形式M6Tを用いて、構内温度120℃、26時間、放射照度0.53kW/m2、積算放射照度50MJ/m2照射後、光線透過率を測定した。
光線透過率測定のための試験片を、オーブンで150℃500時間保管した後、光線透過率を測定した。
<両末端にアクリロイル基を有するポリ(アクリル酸n−ブチル)の合成例>
臭化第一銅を触媒、ペンタメチルジエチレントリアミンを配位子、ジエチル−2,5−ジブロモアジペートを開始剤、アクリル酸n−ブチルをモノマーとし、(アクリル酸n−ブチル)/(ジエチル−2,5−ジブロモアジペート)モル比を80にして重合し、末端臭素基ポリアクリル酸n−ブチルを得た。
<片末端にアクリロイル基を有するポリ(アクリル酸n−ブチル)の合成例>
臭化第一銅を触媒、ペンタメチルジエチレントリアミンを配位子、α−ブロモ酪酸エチルを開始剤、アクリル酸n−ブチルをモノマーとし、(アクリル酸n−ブチル)/(α−ブロモ酪酸エチル)モル比を40にして重合し、末端臭素基ポリアクリル酸n−ブチルを得た。
<両末端にアクリロイル基を有するポリ(アクリル酸2−エチルヘキシル/アクリル酸n−ブチル)の合成例>
臭化第一銅を触媒、ペンタメチルジエチレントリアミンを配位子、ジエチル−2,5−ジブロモアジペートを開始剤、アクリル酸2−エチルヘキシルおよびアクリル酸n−ブチルをモノマー、モノマー比率(モル比)をアクリル酸2−エチルヘキシル(98)とアクリル酸n−ブチル(2)とし、(アクリル酸2−エチルヘキシル、アクリル酸n−ブチル)/(ジエチル−2,5−ジブロモアジペート)モル比を80にして重合し、末端臭素基ポリ(アクリル酸2−エチルヘキシル/アクリル酸n−ブチル)を得た。
配合方法を説明する。(A)成分である重合体([P1]〜[P3])またはその他の成分であるウレタンアクリレート(E8402)に(F)成分である酸化防止剤を添加し、120℃で2時間加熱混合して溶解した。50℃以下に冷却してから、(C)成分であるメタクリル酸エステルモノマー、(D)成分であるエポキシ基を有する化合物、(E)成分である多官能(メタ)アクリル酸エステルモノマー、(B)成分である光ラジカル重合開始剤を添加し、攪拌脱泡装置((株)シンキー製、ARE−250)で均一にした。なお(B)成分のIRGACURE819はDAROCUR1173に予め加熱溶解したものを使用した。配合量(「重量部」)を表1〜4に示す。なお表中、(B)成分のDAROCUR1173は2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン、IRGACURE819はビス(2,4,6−トリメチルベンゾイル)−フェニルフォスフィンオキサイド、(F)成分のSumilizerGA80は3,9−ビス{2−[3−(3−tert−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ]−1,1−ジメチルエチル}−2,4,8,10−テトラオキサスピロ[5,5]ウンデカン、アデカスタブ1178はトリス(ノニルフェニル)ホスファイト、その他の成分のウレタンアクリレートはダイセルサイテック社製、商品名E8402、2官能、分子量1000である。
エポキシ樹脂はペルノックス社製、商品名ME562/HV562、水添エポキシ化合物と酸無水物が主成分であり、二液タイプの熱硬化樹脂である。等量を均一に混ぜて脱泡した後、110℃3時間、130℃3時間の硬化条件により、紫外線硬化と同様の1mm厚さのサンプルを作製した。
Claims (16)
- (A)一般式(1):
−OC(O)C(Ra)=CH2 (1)
(式中、Raは水素原子又はメチル基を示す)
で表わされる(メタ)アクリロイル基を1分子あたり少なくとも1個有するリビングラジカル重合により得られるアクリル系重合体および(B)光ラジカル重合開始剤を含有する光学材料用活性エネルギー線硬化性組成物であって、
(D)エポキシ基を有する化合物(ただし、ベンゼン環を有する化合物を除く)を含有し、
(D)成分の含有量が(A)成分100重量部に対して0.1〜30重量部である、光学材料用活性エネルギー線硬化性組成物。 - さらに、(C)一般式(2):
Rb−OC(O)C(CH3)=CH2 (2)
(式中、Rbは炭素数6〜20の脂環式脂肪族構造または脂肪族分岐構造である有機基を示す)
で表わされるメタクリル酸エステルモノマーを含有し、(C)成分の含有量が(A)成分100重量部に対して1〜70重量部である請求項1に記載の光学材料用活性エネルギー線硬化性組成物。 - (A)成分の(メタ)アクリロイル基が分子末端にある、請求項1または2に記載の光学材料用活性エネルギー線硬化性組成物。
- (A)成分のビニル系重合体の主鎖が、(メタ)アクリル酸エステルモノマーを主成分とする重合体である請求項1〜3のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- (A)成分のビニル系重合体の主鎖が、アクリル酸エステルモノマーを主成分とする重合体である請求項4に記載の光学材料用活性エネルギー線硬化性組成物。
- (A)成分のビニル系重合体が、原子移動ラジカル重合法により製造されたものである請求項1〜5のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- (A)成分がリビングラジカル重合法により製造された後、酸化剤により処理されたビニル系重合体である請求項1〜6のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- (A)成分の数平均分子量が、3,000〜100,000である請求項1〜7のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- (A)成分のビニル系重合体が、ゲルパーミエーションクロマトグラフィーで測定した重量平均分子量と数平均分子量の比の値が1.8未満である請求項1〜8のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- (E)一般式(3):
RC−{OC(O)C(Ra)=CH2}m (3)
(式中、Rcは炭素数6〜20の有機基、Raは水素原子又はメチル基、mは2〜6の整数を示す)
で表わされる(メタ)アクリル酸エステルモノマーを含有する請求項1〜9のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。 - (A)成分100重量部に対して、(E)成分が1〜25重量部である請求項10に記載の光学材料用活性エネルギー線硬化性組成物。
- (D)成分のエポキシ基を有する化合物が、(メタ)アクリロイル基を1分子あたり少なくとも1個有する請求項1〜11のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- ヒンダードフェノール系、ヒンダードアミン系、リン系の酸化防止剤(F)のうち少なくとも1種を有する請求項1〜12のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- LED封止材、太陽電池封止材、フラットパネルディスプレイ封止材、センサー封止材、レンズに用いられる請求項1〜13のいずれかに記載の光学材料用活性エネルギー線硬化性組成物。
- 請求項1〜14のいずれかに記載の光学材料用活性エネルギー線硬化性組成物より得られた光学材料用硬化物。
- LED素子、太陽電池素子、フラットパネルディスプレイ素子、センサー素子、レンズを基板上に配置した後、請求項1〜14のいずれかに記載の光学材料用活性エネルギー線硬化性組成物を用いて一括封止した後に硬化させる、LEDモジュール、太陽電池モジュール、フラットパネルディスプレイモジュール、センサーモジュール、レンズモジュールの製造方法。
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