JP5024591B2 - コーティング組成物 - Google Patents
コーティング組成物 Download PDFInfo
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- JP5024591B2 JP5024591B2 JP2006090759A JP2006090759A JP5024591B2 JP 5024591 B2 JP5024591 B2 JP 5024591B2 JP 2006090759 A JP2006090759 A JP 2006090759A JP 2006090759 A JP2006090759 A JP 2006090759A JP 5024591 B2 JP5024591 B2 JP 5024591B2
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- 239000008199 coating composition Substances 0.000 title claims description 30
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- 239000000178 monomer Substances 0.000 claims description 66
- 239000010419 fine particle Substances 0.000 claims description 51
- 125000000217 alkyl group Chemical group 0.000 claims description 48
- 239000000377 silicon dioxide Substances 0.000 claims description 42
- 239000004094 surface-active agent Substances 0.000 claims description 26
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 4
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- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
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- 238000010792 warming Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
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- 239000004215 Carbon black (E152) Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 239000004480 active ingredient Substances 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000012986 chain transfer agent Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
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- 238000010528 free radical solution polymerization reaction Methods 0.000 description 3
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
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- 239000002184 metal Substances 0.000 description 3
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- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- CKSAKVMRQYOFBC-UHFFFAOYSA-N 2-cyanopropan-2-yliminourea Chemical compound N#CC(C)(C)N=NC(N)=O CKSAKVMRQYOFBC-UHFFFAOYSA-N 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 2
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
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- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
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- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920000638 styrene acrylonitrile Polymers 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- WAOWQLJJQBDGQC-UHFFFAOYSA-N tetraazanium;tetrafluoride Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[F-].[F-].[F-].[F-] WAOWQLJJQBDGQC-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- UUVZTKMMRCCGHN-OUKQBFOZSA-N triethoxy-[(e)-2-phenylethenyl]silane Chemical compound CCO[Si](OCC)(OCC)\C=C\C1=CC=CC=C1 UUVZTKMMRCCGHN-OUKQBFOZSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- JRSJRHKJPOJTMS-MDZDMXLPSA-N trimethoxy-[(e)-2-phenylethenyl]silane Chemical compound CO[Si](OC)(OC)\C=C\C1=CC=CC=C1 JRSJRHKJPOJTMS-MDZDMXLPSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Description
B−1 : エチレングリコールジ(メタ)アクリレート
B−2 : ジエチレングリコールジ(メタ)アクリレート
B−3 : トリエチレングリコールジ(メタ)アクリレート
B−4 : ポリエチレングリコールジ(メタ)アクリレート(数平均分子量:150〜1000)
B−5 : プロピレングリコールジ(メタ)アクリレート
B−6 : ジプロピレングリコールジ(メタ)アクリレート
B−7 : トリプロピレングリコールジ(メタ)アクリレート
B−8 : ポリプロピレングリコールジ(メタ)アクリレート(数平均分子量:150〜1000)
B−9 : ネオペンチルグリコールジ(メタ)アクリレート
B−10: 1,3−ブタンジオールジ(メタ)アクリレート
B−11: 1,4−ブタンジオールジ(メタ)アクリレート
B−12: 1,6−ヘキサンジオールジ(メタ)アクリレート
B−13: 1,9−ノナンジオールジ(メタ)アクリレート
B−14: ヒドロキシピバリン酸エステルネオペンチルグリコールジ(メタ)アクリレート
B−15: CH2=C(R’)COOCH2C(CH3)2CH2OCOCH2C(CH3)2CH2OCOC(R’)=CH2 (R’は水素原子又はメチル基)
B−16: ビスフェノールAジ(メタ)アクリレート
B−17: トリメチロールプロパントリ(メタ)アクリレート
B−18: ペンタエリスリトールトリ(メタ)アクリレート
B−19: ジペンタエリスリトールヘキサ(メタ)アクリレート
B−20: ペンタエリスリトールテトラ(メタ)アクリレート
B−21: トリメチロールプロパンジ(メタ)アクリレート
B−22: ジペンタエリスリトールモノヒドロキシペンタ(メタ)アクリレート
B−23: CH2=CHCOO(CH2)2(CF2)2(CH2)2OCOCH=CH2
B−24: CH2=C(CH3)COO(CH2)2(CF2)2(CH2)2OCOC(CH3)=CH2
B−25: CH2=CHCOO(CH2)2(CF2)4(CH2)2OCOCH=CH2
B−26: CH2=C(CH3)COO(CH2)2(CF2)8(CH2)2OCOCH=CH2
B−27: CH2=CHCOO(CH2)2(CF(CF3)CF2)4(CH2)2OCOC(CH3)=CH2
B−28: CH2=CHCOO(CH2)2(CF(CF3)CF2)a(CF2)b(CH2)2OCOC(CH3)=CH2(a、bはそれぞれ独立に1〜6の整数)
等が挙げられる。
前記フッ素系界面活性剤(C)は、フッ素化アルキル基(c1)と、ポリオキシアルキレン鎖(c2)とを有し、該ポリオキシアルキレン鎖(c2)がポリオキシプロピレン鎖及び/又はポリオキシブチレン鎖からなるものであることを特徴とする。該フッ素系界面活性剤(C)は本発明のコーティング組成物を塗工する際の塗布性を改善するための必須成分であり、また、該組成物の基材への濡れ性、成膜時のレベリング性を向上させ得るものである。さらに、得られる塗膜表面に防汚性を付与することも出来る。
(i)フッ素化アルキル基含有エチレン性不飽和単量体(x1)と、ポリオキシプロピレン鎖及び/又はポリオキシブチレン鎖を含有するエチレン性不飽和単量体(x2)とを必須成分として共重合して得られる重合型フッ素系界面活性剤、
又は
(ii)フッ素化アルキル基含有化合物(x3)とポリオキシプロピレン鎖及び/又はポリオキシブチレン鎖含有化合物(x4)とのマイケル付加反応により得られるマイケル付加型フッ素系界面活性剤
であることが好ましい。
原料として用いるフッ素化アルキル基含有エチレン性不飽和単量体(x1)としては、原料の入手容易性、及び組成物中の他の成分との相溶性が良好である等の観点から、下記一般式(1)にて表されるフッ素化(メタ)アクリレートを用いることが好ましい。
〔式(1)中、R1は水素原子、メチル基、塩素原子、フッ素原子又はシアノ基であり、Xはフッ素原子を含まない2価の連結基であり、aは0又は1の整数であり、Rfは炭素数1〜20のパーフルオロアルキル基、または−(CF2)6H等の部分フッ素化アルキル基であって、直鎖状、分岐状、または主鎖中に酸素原子が介入したものでも良い。〕
x1−2 :CH2=C(CH3)COOCH2CH2C8F17
x1−3 :CH2=CHCOOCH2CH2C12F25
x1−4 :CH2=CHCOOCH2CH2C6F13
x1−5 :CH2=CHCOOCH2CH2C4F9
x1−6 :CH2=CHCOOCH2CF3
x1−7 :CH2=C(CH3)COOCH2CF(CF3)2
x1−8 :CH2=C(CH3)COOCH2CFHCF3
x1−9 :CH2=CHCOOCH2(CF2)6H
x1−10:CH2=CHCOOCH2CH(OH)CH2C8F17
x1−11:CH2=CHCOOCH2CH2N(C3H7)SO2C8F17
x1−12:CH2=CHCOOCH2CH2N(C2H5)COC7F15
x1−13:CH2=CHCOOC2H4(CF(CF3)OCF2)3C2F5
x1−14:CH2=CHCOOCH2(CF(CF3)OCF2)2C2F5
x2−1:CH2=CHCOO(C3H6O)6H
x2−2:CH2=C(CH3)COO(C3H6O)3H
x2−3:CH2=C(CH3)COO(C3H6O)6H
x2−4:CH2=C(CH3)COO(C3H6O)13H
x2−5:CH2=C(CH3)COO(C3H6O)6CH3
x2−6:CH2=C(CH3)COO(C3H6O)(C4H8O)6H
x3−2:C4F9CH2CH2SH
x3−3:C6F13CH2CH2SH
x3−4:C8F17CH2CH2SH
x3−5:C10F21CH2CH2SH
x3−6:C12F25CH2CH2SH
x3−7:C8F17SO2N(C3H7)CH2CH2OH
x3−8:C4F9SO2N(C2H5)CH2CH2OH
x3−9:C8F17CH2CH2OH
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、フッ素化アルキル基含有単量体(x1−1)50重量部、ポリオキシプロピレン鎖含有マクロモノマー(x2−3)50重量部、そしてメチルイソブチルケトン(以下、MIBKと略す。)233重量部を仕込み、窒素ガス気流中、重合開始剤としてパーブチルO(日本油脂株式会社製)3.0重量部を添加した後、85℃にて8時間反応させ,パーブチルOを0.5重量部加えて105℃まで昇温後さらに6時間ホールドし重合を行った。反応終了後、80℃エバポレーターにて脱溶剤、次いで熱風乾燥機にて乾燥させることにより固形分濃度98%以上の重合体を得た。
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、フッ素化アルキル基含有単量体(x1−1)50重量部、ポリオキシプロピレン鎖含有マクロモノマー(x2−5)50重量部、そしてMIBK 233重量部を仕込み、窒素ガス気流中、重合開始剤としてパーブチルO 3.0重量部を添加した後、85℃にて8時間反応させ,パーブチルOを0.5重量部加えて105℃まで昇温後さらに6時間ホールドし重合を行った。反応終了後、80℃エバポレーターにて脱溶剤、次いで熱風乾燥機にて乾燥させることにより固形分濃度98%以上の重合体を得た。
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、フッ素化アルキル基含有単量体(x1−1)50重量部、ポリオキシブチレン鎖含有マクロモノマー(x2−6)50重量部、そしてMIBK 233重量部を仕込み、窒素ガス気流中、重合開始剤としてパーブチルO 3.0重量部を添加した後、85℃にて8時間反応させ、パーブチルOを0.5重量部加えて105℃まで昇温後さらに6時間ホールドし重合を行った。反応終了後、80℃エバポレーターにて脱溶剤、次いで熱風乾燥機にて乾燥させることにより固形分濃度98%以上の重合体を得た。
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、フッ素化アルキル基含有単量体(x1−4)50重量部、ポリオキシプロピレン鎖含有マクロモノマー(x2−3)50重量部、そしてMIBK 233重量部を仕込み、窒素ガス気流中、重合開始剤としてパーブチルO 3.0重量部を添加した後、85℃にて8時間反応させ、パーブチルOを0.5重量部加えて105℃まで昇温後、さらに6時間ホールドし重合を行った。反応終了後、80℃エバポレーターにて脱溶剤、次いで熱風乾燥機にて乾燥させることにより固形分濃度98%以上の重合体を得た。
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、フッ素化アルキル基含有単量体(x1−5)50重量部、ポリオキシプロピレン鎖含有マクロモノマー(x2−4)50重量部、そしてMIBK 233重量部を仕込み、窒素ガス気流中、重合開始剤としてパーブチルO 3.0重量部を添加した後、85℃にて8時間反応させ、パーブチルOを0.5重量部加えて105℃まで昇温後、さらに6時間ホールドし重合を行った。反応終了後、80℃エバポレーターにて脱溶剤、次いで熱風乾燥機にて乾燥させることにより固形分濃度98%以上の重合体を得た。
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、フッ素化アルキル基含有単量体(x1−1)33重量部、ポリオキシプロピレン鎖含有マクロモノマー(x2−4)33重量部、ジメチルシロキサンマクロモノマー サイラプレーンFM−0721(チッソ株式会社製)33重量部、そしてMIBK 233重量部を仕込み、窒素ガス気流中、重合開始剤としてパーブチルO 3.0重量部を添加した後、85℃にて8時間反応させ,パーブチルOを0.5重量部加えて105℃まで昇温後、さらに6時間ホールドし重合を行った。反応終了後、80℃エバポレーターにて脱溶剤、次いで熱風乾燥機にて乾燥させることにより固形分濃度98%以上の重合体を得た。
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、ポリオキシプロピレンン鎖含有α,β−不飽和化合物(x2−5)33重量部、フッ素化アルキル基含有化合物(x3−1)66重量部、そしてトルエン100重量部を仕込み、触媒としてトリエチルアミン6.6重量部を添加した後、50℃にて4時間反応させた。反応後、50℃エバポレーターにて脱溶剤し、有効成分98%以上の生成物を得た。この生成物をフッ素系界面活性剤(C−7)とした。
撹拌装置、コンデンサ−、温度計を備えたガラスフラスコに、ポリオキシプロピレン鎖含有アルコールとしてメチルプロピレントリグリコール(日本乳化剤株式会社製)33重量部、フッ素化アルキル基含有α,β−不飽和化合物(x1−1)66重量部、そしてトルエン100重量部を仕込み、触媒としてトリエチルアミン6.6重量部を添加した後、50℃にて4時間反応させた。反応後、50℃エバポレーターにて脱溶剤し、有効成分98%以上の生成物を得た。この生成物をフッ素系界面活性剤(C−8)とした。
シリカ微粒子(A)として、オロガノシリカゾルMEK−ST−L(一次粒子径50−60nm、固形分30重量%メチルエチルケトン分散液)を13.3重量部(固形分として4重量部)、重合性単量体(B)として、ペンタエリスリトールトリアクリレート(B−18)を6重量部、フッ素系界面活性剤(C−1)を0.05重量部、光重合開始剤としてイルガキュアI−184(チバスペシャリティズ)を0.5重量部、溶剤としてメチルイソブチルケトン(MIBK)を200.6重量部加え混合攪拌し、固形分濃度5重量%の溶液を得た。
組成物(溶液)外観
2:僅かに白濁している。
1:構成成分が分離している。
4:蛍光灯下で筋状の塗布ムラが認められない。
3:蛍光灯下で筋状の塗布ムラが僅かに認められる。
2:蛍光灯下で筋状の塗布ムラが認められる。
1:蛍光灯下で筋状の塗布ムラが多量に認められる。
4:マジックインキをよくはじき、細かな点状の跡が連続的に認められる。
3:マジックインキをはじき、大きな点状の跡が連続的に認められる。
2:マジックインキをはじくものの、線状の跡が認められる。
1:マジックインキを全くはじかない。
フッ素系界面活性剤としてそれぞれフッ素系界面活性剤(C−2)〜(C−8)を用いた他は実施例1と同様にして硬化物を得た。
それぞれフッ素系界面活性剤(C−1)〜(C−8)を0.2重量部用いた他は、実施例1〜8と同様にして硬化物を得た。
フッ素系界面活性剤を用いなかった他は、実施例1と同様にして硬化物を得た。
以下に示す方法にて得た重合型フッ素系界面活性剤(C’−1)を用いた他は、実施例1と同様にして硬化物を得た。
以下に示す方法にて得たマイケル付加型フッ素系界面活性剤(C’−2)を用いた他は、実施例1と同様にして硬化物を得た。
以下に示す方法にて得た重合型フッ素系界面活性剤(C’−3)を用いる以外は、実施例1と同様にして硬化物を得た。
フッ素系界面活性剤(C’−1)を0.2重量部用いた他は、実施例1と同様にして硬化物を得た。
フッ素系界面活性剤(C’−2)を0.2重量部用いた他は、実施例1と同様にして硬化物を得た。
フッ素系界面活性剤(C’−3)を0.2重量部用いた他は、実施例1と同様にして硬化物を得た。
Claims (3)
- シリカ微粒子(A)、重合性単量体(B)、フッ素化アルキル基(c1)とポリオキシアルキレン鎖(c2)とを有するフッ素系界面活性剤(C)を含有するコーティング組成物であり、フッ素系界面活性剤(C)中のフッ素化アルキル基(c1)が、炭素数1〜20のパーフルオロアルキル基で、ポリオキシアルキレン鎖(c2)が直鎖状又は分岐状でオキシアルキレン鎖の繰返し単位が2以上で、ポリオキシプロピレン鎖単独、ポリオキシブチレン鎖単独、又はポリオキシプロピレン鎖とポリオキシブチレン鎖であることを特徴とするコーティング組成物。
- 重合性単量体(B)が紫外線硬化性多官能単量体である請求項1記載のコーティング組成物。
- シリカ微粒子(A)と重合性単量体(B)の重量割合が、(A)/(B)=25〜400/100である請求項2記載のコーティング組成物。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006090759A JP5024591B2 (ja) | 2006-03-29 | 2006-03-29 | コーティング組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2006090759A JP5024591B2 (ja) | 2006-03-29 | 2006-03-29 | コーティング組成物 |
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JP2009286981A (ja) * | 2008-06-02 | 2009-12-10 | Toppan Printing Co Ltd | ハードコート塗液、ハードコートフィルム、偏光板及び透過型液晶表示装置 |
JP5502300B2 (ja) * | 2008-09-17 | 2014-05-28 | 大日本塗料株式会社 | 塗料組成物 |
JP5473722B2 (ja) * | 2010-03-30 | 2014-04-16 | オリジン電気株式会社 | 指紋跡汚れ防止塗料組成物及びその塗膜 |
JP2011225846A (ja) * | 2010-03-31 | 2011-11-10 | Fujifilm Corp | ハードコート層形成用組成物、光学フィルム、光学フィルムの製造方法、偏光板、及び画像表示装置 |
JP4973966B2 (ja) * | 2010-07-02 | 2012-07-11 | Dic株式会社 | フッ素系界面活性剤、それを用いたコーティング組成物及びレジスト組成物 |
JP5737553B2 (ja) * | 2010-09-17 | 2015-06-17 | Dic株式会社 | フッ素系界面活性剤、それを用いたコーティング組成物及びレジスト組成物 |
US8742022B2 (en) | 2010-12-20 | 2014-06-03 | 3M Innovative Properties Company | Coating compositions comprising non-ionic surfactant exhibiting reduced fingerprint visibility |
US9296904B2 (en) | 2010-12-20 | 2016-03-29 | 3M Innovative Properties Company | Coating compositions comprising non-ionic surfactant exhibiting reduced fingerprint visibility |
EP2861677B1 (en) | 2012-06-19 | 2020-11-11 | 3M Innovative Properties Company | Additive comprising low surface energy group and hydroxyl groups and coating compositions |
JP6218820B2 (ja) | 2012-06-19 | 2017-10-25 | スリーエム イノベイティブ プロパティズ カンパニー | 低い指紋視認性を呈する重合性非イオン性界面活性剤を含むコーティング組成物 |
DE102012109930A1 (de) * | 2012-10-18 | 2014-04-24 | Heraeus Noblelight Gmbh | Strahlereinheit zur Erzeugung ultravioletter Strahlung sowie Verfahren zu deren Herstellung |
KR102241109B1 (ko) * | 2013-03-21 | 2021-04-16 | 디아이씨 가부시끼가이샤 | 소포제, 계면활성제 조성물, 코팅 조성물 및 레지스트 조성물 |
JP6210295B2 (ja) * | 2013-10-23 | 2017-10-11 | Dic株式会社 | 界面活性剤組成物、コーティング組成物及びレジスト組成物 |
JP6198058B2 (ja) * | 2013-12-19 | 2017-09-20 | Dic株式会社 | 界面活性剤組成物、コーティング組成物及びレジスト組成物 |
JP2015231678A (ja) * | 2014-06-09 | 2015-12-24 | 帝人デュポンフィルム株式会社 | 平坦化フィルム |
JP6725864B2 (ja) * | 2015-08-21 | 2020-07-22 | Dic株式会社 | 活性エネルギー線硬化性組成物及びそれを用いたフィルム |
CN114249998B (zh) * | 2020-09-25 | 2024-06-28 | 广东华润涂料有限公司 | 可迈克尔加成固化的组合物、包含该组合物的涂料组合物以及由其制成的涂布制品 |
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US20030083396A1 (en) * | 2001-07-23 | 2003-05-01 | Ylitalo Caroline M. | Ink jet ink compositions |
JP2003221419A (ja) * | 2002-01-31 | 2003-08-05 | Fuji Photo Film Co Ltd | フルオロ脂肪族基含有高分子化合物 |
JP4020803B2 (ja) * | 2003-03-03 | 2007-12-12 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP4474114B2 (ja) * | 2003-05-07 | 2010-06-02 | 富士フイルム株式会社 | フルオロ脂肪族基含有ポリマーを含む組成物、フィルム、偏光板 |
JP4397023B2 (ja) * | 2003-11-14 | 2010-01-13 | 三菱レイヨン株式会社 | 硬化性組成物、および物品 |
JP2005307176A (ja) * | 2004-03-25 | 2005-11-04 | Fuji Photo Film Co Ltd | 微粒子分散物、コーティング組成物、それを用いて形成した光学フィルムおよび反射防止フィルム、並びにそれを用いた偏光板、画像表示装置 |
JP2005349784A (ja) * | 2004-06-14 | 2005-12-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP5010820B2 (ja) * | 2004-09-27 | 2012-08-29 | 富士フイルム株式会社 | 光学フィルム、反射防止フィルム、偏光板およびそれらを用いたディスプレイ装置 |
JP2007254545A (ja) * | 2006-03-22 | 2007-10-04 | Fujifilm Corp | 塗布組成物、光学フィルム、偏光板及びそれらを用いた画像表示装置 |
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