JP3878645B2 - 電球組立体、ランプ組立体及び当該電球組立体の起動時間を減少させる方法 - Google Patents
電球組立体、ランプ組立体及び当該電球組立体の起動時間を減少させる方法 Download PDFInfo
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
- H01J61/18—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent
- H01J61/20—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent mercury vapour
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
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- C—CHEMISTRY; METALLURGY
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
- C02F9/20—Portable or detachable small-scale multistage treatment devices, e.g. point of use or laboratory water purification systems
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
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- H05B41/36—Controlling
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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- H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
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- C—CHEMISTRY; METALLURGY
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- C02F2201/32—Details relating to UV-irradiation devices
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- C02F2201/3228—Units having reflectors, e.g. coatings, baffles, plates, mirrors
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/326—Lamp control systems
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0003—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being doped with fluorescent agents
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Description
図6A〜Eを参照すると、フィルター組立体26はフィルターブロック組立体88、ドーム状で円筒形状の外側フィルターハウジング96、入口逆止ボール100、出口逆止ボール102、基体内部スリーブ92、フィルターねじリング94、ブロックガスケット104、及びフィルターハウジング把持器98を含んでいる。フィルターハウジング把持器98はエラストマーでありこの典型的な実施態様ではゴムで作られている。フィルターハウジング把持器98は外側フィルターハウジング96の上側ドーム状端部の上に拡げられかつ摩擦によりこれに取付けられる。フィルターブロック組立体88は底部フィルター端部キャップ106と頂部フィルター端部キャップ108との間に保持された環状カーボンブロック90を有する。フィルターブロック組立体88はまたカーボンブロック90の外周面を取巻くカーボンブランケット110を有している。カーボンブランケット110はカーボンブロック90を半径方向内側に向って通過しようとする大きな粒子をろ過し又は捕捉する作用をするナイロン網で構成されている。スマートチップ112が基体内部スリーブ92の基部に保持されている。スマートチッブ112はフィルター使用に関するパラメータを記録するのに用いられる。電子機器組立体66上のセンサーが誘導により電力を供給しスマートチップ112と通信しフィルター使用の詳細を得るようにする。
図8A〜8Cはランプ組立体24を示す。ランプ組立体24は基体部分組立体72、二次コイル74、底部支持部分組立体76、頂部支持組立体78、一対の石英スリーブ80、UV電球組立体82、凝縮Oリング84、及び一対の共働外枠反射器部分組立体86を含んでいる。
図26A〜26Cは底部覆い組立体60を頂面図、底面図及び分解図で示す。底部覆い組立体60は底部覆い32と、入口及び出口エルボー組立体62及び64と、4個の足パッド582と、スピーカースクリーン584と、電話ジャックカバー586と、一対のC−クリップ588とを含んでいる。C−クリップ588は入口及び出口エルボー組立体62及び64を底部覆い32に固定する。入口及び出口エルボー組立体62及び64は入口エルボー590と出口エルボー592とOリング594とコレット596とアダプター598とから構成されている。
基体ユニット22は次のように組立てられる。内部スリーブ50が取付け具(図示しない)の上側に置かれる。カバー52が内部スリーブ50の底部に超音波溶接され内部スリーブ組立体を形成する。出口カップ組立体56が次に組立てられる。出口カップ58はこれに超音波溶接されたカバー726を有する。上側及び下側軸受704及び706と流れ調整器706とが出口カップ58の底部の通路736の内部に配置される。また、明色パイプカップ712が出口カップ58の開口734に取付けられる。出口カップ組立体56が次に内部スリーブ50の底部の内部に置かれ、フランジ724が中央開口814に近接して内部スリーブ50に溶接され溶接接合部830を形成するようにする。次に入口弁組立体54が図29A〜29Cと図37に示されるように内部スリーブ50の導管818に取付けられる。入口弁ハウジング760、入口スプリング762及び入口逆止ボール764が導管818の下側導管部分820の内部に置かれ、Oリング770が入口弁ハウジング760の上側部分と下側導管部分820との間にシールを形成するようにする。入口カップシール768と入口分枝部766が導管818の頸部分824の内部に置かれ、シールリング780が導管818の内部をシールするようにする。
22 基体ユニット
24 ランプ組立体
26 フィルター組立体
42 レンズ
44 電力プラグ組立体
50 内部スリーブ
58 出口カップ
74 二時コイル
80 石英スリーブ
82 UV電球組立体
86 反射器部分組立体
88 フィルターブロック組立体
90 フィルターブロック
92 基体内部スリーブ
96 フィルタハウジング
Claims (14)
- ランプ組立体に用いられると共に電磁放射線を発生させる電球組立体において、
第一の端部及び第二の端部を有すると共にこれら端部間に延びる中間部分を備える電球であって、電磁放射線を発生するよう励勢されるガスを収容し且つ励勢されていない時に液化される水銀を収容する、電球と、
上記第一の端部に配置される第一のフィラメント及び上記第二の端部に配置される第二のフィラメントと、
上記電球の中間部分のみと接触する凝縮要素とを具備し、
上記凝縮要素は当該電球組立体が励勢されていない時に該凝縮要素に近接した水銀を冷却し凝縮させる、電球組立体。 - 上記電球が少なくとも50重量%濃度のネオンを含有するネオンアルゴンガス混合物を収容する、請求項1に記載の電球組立体。
- 上記電球が少なくとも95重両%濃度のネオンを収容する、請求項2に記載の電球組立体。
- 上記電球が、細長い第一の部分と細長い第二の部分とこれら第一の部分と第二の部分との間に延びる通路とを有するほぼU字形であり、上記第一のフィラメントが第一の部分内に設けられ、第二のフィラメントが第二の部分内に設けられる、請求項3に記載の電球組立体。
- ランプ組立体に用いられると共に電磁放射線を発生する電球組立体(82)において、
第一の端部及び第二の端部を有すると共にこれら端部間に延びる中間部分を備える電球であって、電磁放射線を発生するよう励勢されるガスを収容し且つ励勢されていない時に液化される水銀を収容する、電球と、
上記第一の端部に配置される第一のフィラメント及び上記第二の端部に配置される第二のフィラメントと、
上記電球の中間部分と接触する凝縮要素とを具備し、
上記凝縮要素は当該電球組立体が励勢されていない時に該凝縮要素に近接した水銀を冷却し凝縮させ、
上記凝縮要素は弾性的なOリングである、電球組立体。 - 電球組立体の起動時間を減少させる方法であって、
第一の端部及び第二の端部を有すると共にこれら端部の間に延びる中間部分を有する細長い電球を有する電球組立体であって、上記第一の端部及び第二の端部がそれぞれ第一のフィラメント及び第二のフィラメントを有し且つ上記電球が励起可能なガスと凝縮された水銀とを内部に有する電球組立体を設ける工程と、
上記電球組立体を励起して上記第一のフィラメントと第二のフィラメントとの間に電気アークを発生させて、それによりガスを励起すると共に水銀を蒸発させて電磁放射線を上記電球組立体によって発生させる工程と、
上記電球組立体を非励勢とする工程と、
上記電球の中間部分を冷却すると共に上記第一の端部と第二の端部との間の冷却された中間部分上に水銀を凝縮させる工程とを具備し、
それにより凝縮された水銀が上記第一のフィラメントと上記第二のフィラメントとの間のアーク経路上に捕捉され、これにより後で上記電球組立体を励勢するときの該電球組立体の起動時間を減少させる、電球組立体の起動時間を減少させる方法。 - 上記中間部分を冷却する工程が、上記電球の中間部分から熱を移送する凝縮要素を設ける工程を更に具備する、請求項6に記載の方法。
- 上記凝結要素が比較的冷却された流体を搬送する導管と接触する、請求項7に記載の方法。
- 上記凝縮要素が上記電球と導管との間に緩衝支持体を提供する弾性部材である、請求項8に記載の方法。
- 上記凝縮要素が金属である、請求項6に記載の方法。
- 第一の端部と第二の端部と中間部分とを有するランプ外枠であって、励起されたときに電磁放射線を発生させる物質を収容し、該物質が励起されていない時に凝縮されて液体を形成するランプ外枠と、
上記第一の端部に近接して配置された第一のフィラメントと、
上記第二の端部に近接して配置された第二のフィラメントと、
上記中間部分のみに近接して配置されたヒートシンクとを具備し、
上記ヒートシンクは上記物質が凝縮していない時に実質的に上記物質が上記第一のフィラメント及び第二のフィラメントに近接して凝縮しないようにする、蛍光性ランプ組立体。 - 第一の端部及び第二の端部を有すると共にこれら端部の間に中間部分を備える電球と、
上記電球内に配置される励起可能なガスであって、励勢されているときに蛍光を発すると共に励勢されていないときに凝縮するのに適しているガスと、
上記ガスを励勢するのに適しているフィラメントと、
上記中間部分に係合して実質的に上記中間部分内のみのガスを凝縮させる凝縮要素とを具備する、ランプ組立体。 - 上記電球は、上記ガスが凝縮されている時に該ガスを上記凝縮要素に向かって移動させるように構成される、請求項12に記載のランプ組立体。
- 上記電球は、上記ガスが凝縮されている時に該ガスが上記第一の端部及び第二の端部から離れるように移動させるように構成される、請求項13に記載のランプ組立体。
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Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14009099P | 1999-06-21 | 1999-06-21 | |
US14015999P | 1999-06-21 | 1999-06-21 | |
US09/596,416 US6451202B1 (en) | 1999-06-21 | 2000-06-12 | Point-of-use water treatment system |
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JP2001504856A Division JP2003502153A (ja) | 1999-06-21 | 2000-06-14 | 使用時水処理装置 |
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JP2005134296A Expired - Fee Related JP4358780B2 (ja) | 1999-06-21 | 2005-05-02 | 使用時水処理装置及びuv光線の強度を検知する方法 |
JP2005134281A Expired - Fee Related JP4387979B2 (ja) | 1999-06-21 | 2005-05-02 | ランプ組立体 |
JP2005134288A Expired - Lifetime JP3878645B2 (ja) | 1999-06-21 | 2005-05-02 | 電球組立体、ランプ組立体及び当該電球組立体の起動時間を減少させる方法 |
JP2005134275A Expired - Fee Related JP4261509B2 (ja) | 1999-06-21 | 2005-05-02 | フィルター組立体 |
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JP2001504856A Pending JP2003502153A (ja) | 1999-06-21 | 2000-06-14 | 使用時水処理装置 |
JP2005134296A Expired - Fee Related JP4358780B2 (ja) | 1999-06-21 | 2005-05-02 | 使用時水処理装置及びuv光線の強度を検知する方法 |
JP2005134281A Expired - Fee Related JP4387979B2 (ja) | 1999-06-21 | 2005-05-02 | ランプ組立体 |
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JP (6) | JP2003502153A (ja) |
KR (7) | KR100452528B1 (ja) |
CN (6) | CN1305775C (ja) |
AU (1) | AU5489300A (ja) |
CA (3) | CA2634106C (ja) |
HK (5) | HK1063307A1 (ja) |
TW (1) | TWI250131B (ja) |
WO (1) | WO2000078681A2 (ja) |
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