JP2024076911A - Non-cyan brass plating bath and plating method - Google Patents
Non-cyan brass plating bath and plating method Download PDFInfo
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- 238000007747 plating Methods 0.000 title claims abstract description 71
- 229910001369 Brass Inorganic materials 0.000 title claims abstract description 33
- 239000010951 brass Substances 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims abstract description 14
- -1 hydroxy acid salt Chemical class 0.000 claims abstract description 45
- 229940091173 hydantoin Drugs 0.000 claims abstract description 22
- 150000003839 salts Chemical class 0.000 claims abstract description 22
- 150000001879 copper Chemical class 0.000 claims abstract description 18
- 150000003751 zinc Chemical class 0.000 claims abstract description 17
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 14
- 150000001868 cobalt Chemical class 0.000 claims abstract description 13
- 150000002696 manganese Chemical class 0.000 claims abstract description 13
- 150000002815 nickel Chemical class 0.000 claims abstract description 13
- 238000009713 electroplating Methods 0.000 claims abstract description 12
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims abstract description 11
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims description 18
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims description 6
- NXQJDVBMMRCKQG-UHFFFAOYSA-N 5-phenylimidazolidine-2,4-dione Chemical compound O=C1NC(=O)NC1C1=CC=CC=C1 NXQJDVBMMRCKQG-UHFFFAOYSA-N 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 9
- 239000010949 copper Substances 0.000 abstract description 9
- 229910052802 copper Inorganic materials 0.000 abstract description 8
- 235000002639 sodium chloride Nutrition 0.000 description 42
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 7
- 239000011701 zinc Substances 0.000 description 7
- 229910052725 zinc Inorganic materials 0.000 description 7
- 150000001469 hydantoins Chemical class 0.000 description 6
- 239000002253 acid Substances 0.000 description 4
- 150000001261 hydroxy acids Chemical group 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910001297 Zn alloy Inorganic materials 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000008139 complexing agent Substances 0.000 description 3
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- RZLVQBNCHSJZPX-UHFFFAOYSA-L zinc sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Zn+2].[O-]S([O-])(=O)=O RZLVQBNCHSJZPX-UHFFFAOYSA-L 0.000 description 3
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- RHYBFKMFHLPQPH-UHFFFAOYSA-N N-methylhydantoin Chemical compound CN1CC(=O)NC1=O RHYBFKMFHLPQPH-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- DTAGFZADSORGNX-UHFFFAOYSA-N [C-]#N.[Zn+2].[Cu+2].[C-]#N.[C-]#N.[C-]#N Chemical compound [C-]#N.[Zn+2].[Cu+2].[C-]#N.[C-]#N.[C-]#N DTAGFZADSORGNX-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 150000001860 citric acid derivatives Chemical class 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(i) oxide Chemical compound [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000004512 die casting Methods 0.000 description 2
- SFXJSNATBHJIDS-UHFFFAOYSA-N disodium;dioxido(oxo)tin;trihydrate Chemical compound O.O.O.[Na+].[Na+].[O-][Sn]([O-])=O SFXJSNATBHJIDS-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000003892 tartrate salts Chemical class 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- RSBRXBZGVHQUJK-UHFFFAOYSA-N 5-ethylimidazolidine-2,4-dione Chemical compound CCC1NC(=O)NC1=O RSBRXBZGVHQUJK-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- OCUCCJIRFHNWBP-IYEMJOQQSA-L Copper gluconate Chemical class [Cu+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O OCUCCJIRFHNWBP-IYEMJOQQSA-L 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 235000011148 calcium chloride Nutrition 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- YYHJVRVDZZTELW-UHFFFAOYSA-J copper(1+) phosphonato phosphate Chemical compound [Cu+].[Cu+].[Cu+].[Cu+].[O-]P([O-])(=O)OP([O-])([O-])=O YYHJVRVDZZTELW-UHFFFAOYSA-J 0.000 description 1
- GDFGBZPSSUEBJH-UHFFFAOYSA-L copper(1+);oxalate Chemical compound [Cu+].[Cu+].[O-]C(=O)C([O-])=O GDFGBZPSSUEBJH-UHFFFAOYSA-L 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229910000336 copper(I) sulfate Inorganic materials 0.000 description 1
- WIVXEZIMDUGYRW-UHFFFAOYSA-L copper(i) sulfate Chemical compound [Cu+].[Cu+].[O-]S([O-])(=O)=O WIVXEZIMDUGYRW-UHFFFAOYSA-L 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000004701 malic acid derivatives Chemical class 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical class [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229940053662 nickel sulfate Drugs 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 229960000314 zinc acetate Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229960001939 zinc chloride Drugs 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229960001296 zinc oxide Drugs 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
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- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
本発明は、非シアン真鍮めっき浴およびめっき方法に関する。 The present invention relates to a non-cyanide brass plating bath and plating method.
シアン化物は、錯化剤として優れていることからめっきにおいて多用されてきたが、生物に有害であり、水質汚染、大気汚染、作業者の健康等に厳重な管理が必要であるため、シアン化物を含有しない弱酸性領域からアルカリ性領域でのめっき液が求められている。 Cyanides have been widely used in plating because they are excellent complexing agents, but they are harmful to living organisms and require strict management to prevent water pollution, air pollution, and worker health, so there is a demand for plating solutions that are cyanide-free and in the weak acid to alkaline range.
非シアン真鍮めっき浴としては、銅と、亜鉛と、金属ポリリン酸とオルトリン酸塩と、を含み、シアン化物を含まない非シアン化物真鍮めっき浴混合物(特許文献1)が知られている。 A known example of a non-cyanide brass plating bath is a non-cyanide brass plating bath mixture (Patent Document 1) that contains copper, zinc, metal polyphosphate, and orthophosphate, and does not contain cyanide.
特許文献1の発明は、銅箔の上に真鍮バリア層を付着させる方法であり、装飾用途として使用するには、光沢、均一性、付き回り性等が不足している。 The invention in Patent Document 1 is a method for depositing a brass barrier layer onto copper foil, but the gloss, uniformity, and coverage are insufficient for use in decorative applications.
また、一般的に、非シアン真鍮めっき浴を用いてめっきすると、どうしても銅に由来する着色(赤味)が避けられないという問題もある。特に、ボタン、ファスナー、ホック、その他の小物部品でのバレルめっきを行うと、低電流密度部分においては赤っぽいめっきが混ざり、均一性、付き回り性不足が顕著に現れるので、装飾用途のめっき浴には使用できない。 In addition, when plating using a non-cyanide brass plating bath, there is generally an unavoidable problem of coloring (reddish) caused by the copper. In particular, when barrel plating buttons, zippers, hooks, and other small parts, reddish plating is mixed in at low current density areas, resulting in a noticeable lack of uniformity and throwing power, making this plating bath unusable for decorative purposes.
本発明者らは、銅に由来する着色(赤味)を抑え、安定した皮膜の均一性、付き回り性が得られる非シアン真鍮めっき浴について、鋭意研究の結果、錯化剤として、ヒドロキシ酸塩とヒダントイン類化合物とを併用すると、前記の課題が解決できることを見出し、本発明を完成したものである。 The inventors of the present invention have conducted extensive research into non-cyanide brass plating baths that suppress copper-derived coloring (redness) and provide stable coating uniformity and throwing power, and have discovered that the above problems can be solved by using a combination of a hydroxy acid salt and a hydantoin compound as a complexing agent, thus completing the present invention.
すなわち本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩またはニッケル塩のいずれかを含むことを特徴とする非シアン真鍮電気めっき浴である。 That is, the present invention is a non-cyanide brass electroplating bath that contains a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, a conductive salt, and either a tin salt, a manganese salt, a cobalt salt, or a nickel salt.
また、本発明は、前記ヒドロキシ酸塩が炭素数2または4のヒドロキシ酸であり、前記ヒダントイン類化合物が、ヒダントイン、アルキルヒダントインまたはフェニルヒダントインであることを特徴とする。 The present invention is also characterized in that the hydroxy acid salt is a hydroxy acid having 2 or 4 carbon atoms, and the hydantoin compound is hydantoin, alkylhydantoin, or phenylhydantoin.
また、本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、およびスズ塩、マンガン塩、コバルト塩またはニッケル塩のいずれかを含む非シアン真鍮電気めっき浴を用いて、被めっき物に真鍮めっきすることを特徴とするめっき方法である。 The present invention also provides a plating method that involves plating an object with brass using a non-cyanide brass electroplating bath that contains a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, and either a tin salt, a manganese salt, a cobalt salt, or a nickel salt.
本発明によれば、ヒドロキシ酸塩およびヒダントイン類化合物に加え、スズ塩、マンガン塩、コバルト塩またはニッケル塩の比率を調整する事によりバレルめっきにおいても安定した均一性、付き回り性が得られる非シアン真鍮めっき浴を提供することができる。 According to the present invention, by adjusting the ratio of tin salts, manganese salts, cobalt salts or nickel salts in addition to hydroxy acid salts and hydantoin compounds, it is possible to provide a non-cyanide brass plating bath that provides stable uniformity and throwing power even in barrel plating.
さらに、本発明の非シアン真鍮めっき浴は、ラック方式だけでなくバレルめっきにおいても安定した均一性、付き回り性が得られるので、装飾用めっき物を製造する際にも好適にめっきを施すことができる。 Furthermore, the non-cyanide brass plating bath of the present invention provides stable uniformity and adhesion not only in rack plating but also in barrel plating, making it suitable for plating when producing decorative plated products.
また、本発明の非シアン真鍮めっき浴は、安定した均一性、付き回り性が得られるので、浴温が40℃程度と低い温度でめっきを施すことができ、めっき皮膜外観の向上だけでなく、作業性の向上という効果も得ることができる。 In addition, the non-cyanide brass plating bath of the present invention provides stable uniformity and throwing power, so plating can be performed at a low bath temperature of about 40°C, which not only improves the appearance of the plating film but also improves workability.
また、めっき浴に電導塩を加えることにより、更に均一性、付き回り性が得られ、電流密度範囲を広げる事ができる。 Additionally, by adding conductive salts to the plating bath, further uniformity and throw can be achieved, and the current density range can be expanded.
本発明は、二価の亜鉛塩、二価の銅塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩またはニッケル塩のいずれかを含むことを特徴とする非シアン真鍮電気めっき浴である。 The present invention is a non-cyanide brass electroplating bath that contains a divalent zinc salt, a divalent copper salt, a hydroxy acid salt, a hydantoin compound, a conductive salt, and either a tin salt, a manganese salt, a cobalt salt, or a nickel salt.
本発明において、ヒドロキシ酸塩、ヒダントイン類化合物は、いずれも錯化剤として用いられる。 In the present invention, both hydroxy acid salts and hydantoin compounds are used as complexing agents.
ヒドロキシ酸塩としては、炭素数2または4のヒドロキシ酸塩があげられ、具体的には
たとえばグルコン酸塩、酒石酸塩、クエン酸塩、リンゴ酸塩などがあげられ、なかでも酒石酸塩、クエン酸塩が好ましい。
Examples of hydroxy acid salts include hydroxy acid salts having 2 or 4 carbon atoms, and specific examples thereof include gluconates, tartrates, citrates, malates, etc., with tartrates and citrates being particularly preferred.
ヒドロキシ酸の塩としては、ヒドロキシ酸のアルカリ金属塩、アルカリ土類金属塩があげられ、たとえばカリウム塩、ナトリウム塩、カルシウム塩などがあげられる。ヒドロキシ酸塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 Examples of salts of hydroxy acids include alkali metal salts and alkaline earth metal salts of hydroxy acids, such as potassium salts, sodium salts, and calcium salts. The above-mentioned hydroxy acid salts may be used alone or in combination of two or more kinds.
ヒドロキシ酸塩は、めっき浴において、50~400g/L含まれることが好ましく、とりわけ100~300g/L含まれることが好ましい。 The hydroxy acid salt is preferably contained in the plating bath at 50 to 400 g/L, and more preferably at 100 to 300 g/L.
ヒダントイン類化合物としては、ヒダントイン、1-メチルヒダントイン、5-エチルヒダントインまたは5,5-ジメチルヒダントインなどのアルキルヒダントイン、5-フェニルヒダントインなどがあげられ、ヒダントイン、アルキルヒダントインが好ましく、とりわけヒダントイン、5,5-ジメチルヒダントインが好ましい。ヒダントイン類化合物は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 Examples of hydantoin compounds include hydantoin, alkyl hydantoins such as 1-methylhydantoin, 5-ethylhydantoin, and 5,5-dimethylhydantoin, and 5-phenylhydantoin. Hydantoin and alkyl hydantoins are preferred, and hydantoin and 5,5-dimethylhydantoin are particularly preferred. The hydantoin compounds may be used alone or in combination of two or more of them.
ヒダントイン類化合物は、めっき浴において、10~150g/L含まれることが好ましく、なかでも10~150g/L含まれることがより好ましい。 Hydantoin compounds are preferably contained in the plating bath at 10 to 150 g/L, and more preferably at 10 to 150 g/L.
本発明のめっき浴においては、ヒドロキシ酸塩とヒダントイン類化合物とは、その重量比率としてヒドロキシ酸塩1重量部に対して、ヒダントイン類化合物が0.15~0.6重量部となるよう用いることが好ましい。 In the plating bath of the present invention, the hydroxy acid salt and the hydantoin compound are preferably used in a weight ratio of 0.15 to 0.6 parts by weight of the hydantoin compound to 1 part by weight of the hydroxy acid salt.
二価の銅塩としては、二価の銅と無機酸もしくは有機酸との塩があげられ、たとえば硫酸第一銅、ピロリン酸第一銅、シュウ酸第一銅、酸化第一銅、塩化第一銅等があげられる。本発明のめっき浴においては、二価の銅の酸化物、塩化物等であっても用いることができる。二価の銅塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 Divalent copper salts include salts of divalent copper with inorganic or organic acids, such as copper (I) sulfate, copper (I) pyrophosphate, copper (I) oxalate, copper (I) oxide, and copper (I) chloride. In the plating bath of the present invention, oxides and chlorides of divalent copper can also be used. The divalent copper salts mentioned above can be used alone or in combination of two or more kinds.
二価の銅塩は、めっき浴において、1~30g/L含まれることが好ましく、なかでも3~15g/L含まれることがより好ましい。 The divalent copper salt is preferably contained in the plating bath at 1 to 30 g/L, and more preferably at 3 to 15 g/L.
二価の亜鉛塩としては二価の亜鉛と無機酸もしくは有機酸との塩があげられ、たとえば
硫酸亜鉛、酢酸亜鉛、水酸化亜鉛、酸化亜鉛、塩化亜鉛等があげられる。本発明のめっき浴においては、二価の亜鉛の酸化物、塩化物等であっても用いることができる。二価の亜鉛塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。
Divalent zinc salts include salts of divalent zinc with inorganic or organic acids, such as zinc sulfate, zinc acetate, zinc hydroxide, zinc oxide, zinc chloride, etc. In the plating bath of the present invention, oxides and chlorides of divalent zinc can also be used. The divalent zinc salts may be used alone or in combination of two or more.
二価の亜鉛塩は、めっき浴において、1~30g/L含まれることが好ましく、なかでも1.5~7.0g/L含まれることがより好ましい。 The divalent zinc salt is preferably contained in the plating bath at 1 to 30 g/L, and more preferably at 1.5 to 7.0 g/L.
真鍮色のめっき皮膜を得るためには、めっき浴中において金属銅と金属亜鉛の重量比率が重要であり、金属銅1重量部に対して金属亜鉛が0.3~0.9重量部の範囲内にあるように、二価の亜鉛塩と二価の銅塩を用いることが好ましい。 To obtain a brass-colored plating film, the weight ratio of metallic copper to metallic zinc in the plating bath is important, and it is preferable to use a divalent zinc salt and a divalent copper salt so that the metallic zinc is in the range of 0.3 to 0.9 parts by weight per 1 part by weight of metallic copper.
本発明においては、めっき浴に、スズ塩、マンガン塩、コバルト塩、ニッケル塩のいずれかを添加することにより、めっき金属が三元合金となり光沢性が上昇する。かかる金属塩としてはスズ、マンガン、コバルト、ニッケルと、アルカリ金属、アルカリ土類金属、無機酸または有機酸との塩があげられ、具体的には、たとえばスズ酸ナトリウム、硫酸マンガン、硫酸コバルト、硫酸ニッケルがあげられる。 In the present invention, by adding any one of tin salts, manganese salts, cobalt salts, and nickel salts to the plating bath, the plating metal becomes a ternary alloy and the gloss is increased. Such metal salts include salts of tin, manganese, cobalt, and nickel with alkali metals, alkaline earth metals, inorganic acids, or organic acids, and specific examples include sodium stannate, manganese sulfate, cobalt sulfate, and nickel sulfate.
前記金属塩は、めっき浴に0.1~2g/L含まれることが好ましい。 The metal salt is preferably contained in the plating bath at 0.1 to 2 g/L.
本発明のめっき浴においては、さらに電導塩を加えることにより、めっき皮膜の均一性、付き回り性が向上し、電流密度範囲も広がるので、より好ましい結果を得ることができる。 In the plating bath of the present invention, by further adding conductive salt, the uniformity and adhesion of the plating film are improved and the current density range is expanded, so more favorable results can be obtained.
電導塩としては、アルカリ金属、アルカリ土類金属またはアンモニアの塩化物が好ましく、具体的には、たとえば塩化カリウム、塩化ナトリウム、塩化カルシウムまたは塩化アンモニウムがあげられる。二価の銅塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 The conductive salt is preferably a chloride of an alkali metal, an alkaline earth metal, or ammonia, and specific examples include potassium chloride, sodium chloride, calcium chloride, and ammonium chloride. The divalent copper salt may be used alone or in combination of two or more of the above.
電導塩は、めっき浴中に5~50g/L含まれることが好ましい。 The conductive salt is preferably contained in the plating bath at 5 to 50 g/L.
本発明の非シアン真鍮めっき浴は、前記の二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを、水に溶解することにより製造することができる。 The non-cyanide brass plating bath of the present invention can be produced by dissolving the above-mentioned divalent copper salt, divalent zinc salt, hydroxy acid salt, hydantoin compound, conductive salt, and any of tin salt, manganese salt, cobalt salt, and nickel salt in water.
本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含む非シアン真鍮電気めっき浴を用いて、被めっき物に真鍮めっきするめっき方法である。 The present invention is a plating method for plating an object with brass using a non-cyanide brass electroplating bath containing a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, a conductive salt, and either a tin salt, a manganese salt, a cobalt salt, or a nickel salt.
めっきは、電気めっきの常法により実施すればよく、たとえば被めっき物を、脱脂、洗浄、酸浸漬、電解脱脂、酸活性などの前処理ののち、ラック方式やバレル方式などの方法によりめっきすることができる。たとえば、浴温30~50℃で、ラック方式によるときは電流0.2~2.0A/dm2、めっき時間0.5~3分間、バレル方式によるときは、電流5~10A/kg、めっき時間5~15分間、回転数4~15回転/分の条件でめっきすることにより、実施することができる。 Plating may be carried out by a conventional method for electroplating, for example, the object to be plated may be subjected to pretreatment such as degreasing, washing, acid immersion, electrolytic degreasing, acid activation, etc., and then plated by a method such as a rack method or a barrel method. For example, plating may be carried out under conditions of a bath temperature of 30 to 50°C, a current of 0.2 to 2.0 A/ dm2 , and a plating time of 0.5 to 3 minutes when using the rack method, and a current of 5 to 10 A/kg, a plating time of 5 to 15 minutes, and a rotation speed of 4 to 15 rpm when using the barrel method.
以下、本発明を実施例によりさらに詳細に説明するが、本発明はかかる実施例により限定されるものではない。 The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples.
実施例1
酒石酸ナトリウムカリウム150.0g/L、ヒダントイン30.0g/L、硫酸銅(II)・5水和物5.0g/L、硫酸亜鉛(II)・7水和物3.0g/L、塩化ナトリウム20.0g/L、スズ酸ナトリウム(IV)・3水和物0.5g/Lを用いてめっき浴10Lを建浴した。
Example 1
A plating bath of 10 L was prepared using 150.0 g/L of potassium sodium tartrate, 30.0 g/L of hydantoin, 5.0 g/L of copper (II) sulfate pentahydrate, 3.0 g/L of zinc (II) sulfate heptahydrate, 20.0 g/L of sodium chloride, and 0.5 g/L of sodium stannate (IV) trihydrate.
銅めっき済みの亜鉛ダイカスト250個(3.2g/個)をアクチベーターCu(商品名:株式会社シミズ製)50.0g/Lを用いてアルカリ電解脱脂し、水洗、酸洗浄、水洗の前処理を行った後、ミニバレル(コンドウ製ミニバレル)中で、以下の条件によりめっきを行った。 250 copper-plated zinc die castings (3.2 g/piece) were electrolytically degreased using 50.0 g/L of Activator Cu (product name: manufactured by Shimizu Corporation), and after pretreatment with water rinsing, acid cleaning, and water rinsing, they were plated in a mini barrel (manufactured by Kondo) under the following conditions.
めっき条件
陽極=カーボン板(100cm×100cm×1cm) 2枚
電流値=7A/Kg、通電時間=10分、浴温=40℃
バレル回転数=毎分6回転
めっき厚=約0.4m
めっき後、速やかにバレルから被めっき物を取り出し、水洗し、遠心乾燥機にて乾燥した。
Plating conditions: Anode = carbon plate (100 cm x 100 cm x 1 cm) x 2 sheets, current value = 7 A/kg, current application time = 10 minutes, bath temperature = 40°C
Barrel rotation speed = 6 revolutions per minute Plating thickness = approx. 0.4m
After plating, the plated object was promptly taken out of the barrel, washed with water, and dried in a centrifugal dryer.
評価方法
色味:
色差計(CM-3500d、コニカミノルタ株式会社製)を用いて、被めっき物平面部分のL値、a値、b値SCI(正反射光込み)を測定(n=10)し、その平均値を、シアン系真鍮めっき物とのΔEとして算出した。数値が低いほどシアン系真鍮色に近い色味であることを示す。
なお、シアン系真鍮めっき物は、以下のめっき条件で、「真鍮ソルト」(商品名、日本化学産業株式会社製)により銅めっき済みの亜鉛ダイカスト250個(3.2g/個)をめっきしたものを用いた。
めっき条件
陽極=真鍮板(100cm×100cm×0.5mm) 2枚
電流値=5A/Kg、通電時間=10分、浴温=40℃
バレル回転数=毎分6回転
Evaluation method Color:
Using a color difference meter (CM-3500d, manufactured by Konica Minolta, Inc.), the L value, a value, b value SCI (including specular reflection) of the flat surface of the plated object were measured (n=10), and the average value was calculated as ΔE from the cyan brass plated object. The lower the value, the closer the color is to the cyan brass color.
The cyanide-based brass plating was performed by plating 250 copper-plated zinc die castings (3.2 g/piece) with "Brass Salt" (product name, manufactured by Nippon Kagaku Sangyo Co., Ltd.) under the following plating conditions.
Plating conditions: Anode = brass plate (100 cm x 100 cm x 0.5 mm) x 2 sheets, current value = 5 A/Kg, current application time = 10 minutes, bath temperature = 40°C
Barrel rotation speed: 6 revolutions per minute
付き回り均一性:
色差計で測定(n=100)し、被めっき物全部のサンプルのL値、a値、b値の平均から個々のL値、a値、b値を用いて平均値からのΔEを算出した。算出したn=100のΔEを用いて標準偏差を計算して、付き回り、均一性を評価した。標準偏差の数値が低い程、付き回り、均一性の良い仕上がりであることを示す。
◎:標準偏差が0.3以下
○:標準偏差が0.3超過~0.7未満
△:標準偏差が0.7以上
Throwing power uniformity:
Measurements were made with a color difference meter (n=100), and ΔE from the average of the L, a, and b values of all samples to be plated was calculated using the individual L, a, and b values. The standard deviation was calculated using the calculated ΔE of n=100 to evaluate throwing power and uniformity. The lower the standard deviation, the better the throwing power and uniformity of the finish.
◎: Standard deviation is 0.3 or less. ○: Standard deviation is between 0.3 and less than 0.7. △: Standard deviation is 0.7 or more.
光沢性:
同様に色差計で測定(n=10)してL値の平均値で評価した。L値平均値の数値が高い程、光沢性の良い仕上がりであることを示す。
◎:L値平均値が83.5以上
○:L値平均値が83.5未満~82.4超過
△:L値平均値が82.4以下
Glossiness:
Similarly, measurements were made using a color difference meter (n=10), and evaluation was performed using the average L value. A higher average L value indicates a more glossy finish.
◎: Average L value is 83.5 or more. ○: Average L value is less than 83.5 to more than 82.4. △: Average L value is 82.4 or less.
実施例2~9
表1および2に示すめっき浴を用いる他は、実施例1と同様にしてめっきを行った。
なお、実施例2~9においては、二価の銅塩として硫酸銅(II)・5水和物5.0g/L、二価の亜鉛塩として硫酸亜鉛(II)・7水和物3.0g/L、電導塩として塩化ナトリウム20.0g/Lをそれぞれめっき浴に配合した。
Examples 2 to 9
Plating was carried out in the same manner as in Example 1, except that the plating baths shown in Tables 1 and 2 were used.
In Examples 2 to 9, the plating bath contained 5.0 g/L of copper(II) sulfate pentahydrate as the divalent copper salt, 3.0 g/L of zinc(II) sulfate heptahydrate as the divalent zinc salt, and 20.0 g/L of sodium chloride as the conductive salt.
比較例1および2
表3に示すめっきを用いる他は、実施例1と同様にしてめっきを行った。
なお、比較例1および2においても、二価の銅塩として硫酸銅(II)・5水和物5.0g/L、二価の亜鉛塩として硫酸亜鉛(II)・7水和物3.0g/L、電導塩として塩化ナトリウム20.0g/Lをそれぞれめっき浴に配合した。
結果は、表1~4に示すとおりである。
Comparative Examples 1 and 2
Plating was carried out in the same manner as in Example 1, except that the plating shown in Table 3 was used.
In Comparative Examples 1 and 2, the plating bath contained 5.0 g/L of copper(II) sulfate pentahydrate as the divalent copper salt, 3.0 g/L of zinc(II) sulfate heptahydrate as the divalent zinc salt, and 20.0 g/L of sodium chloride as the conductive salt.
The results are shown in Tables 1 to 4.
結果および考察
表1~4からわかるように、ヒドロキシ酸、ヒダントイン類化合物および光択剤を配合しためっき浴では、シアン真鍮色基準のΔE値は低く、付き回り・均一性も対比に用いたシアン系真鍮めっきと同様または近い結果が得られているが、比較例では、ΔE値も上昇し、真鍮色より赤味を増し、付き回り、均一性も悪化していることがわかる。
Results and Observations As can be seen from Tables 1 to 4, in the plating baths containing hydroxy acids, hydantoin compounds, and photochromic agents, the ΔE value of the cyan brass color standard was low, and the throwing power and uniformity were similar or close to those of the cyan brass plating used for comparison. However, in the comparative examples, the ΔE value increased, the color became redder than the brass color, and the throwing power and uniformity were also worse.
すなわち本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物および電導塩を含み、さらにスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含むことを特徴とする非シアン銅-亜鉛合金電気めっき浴である。 That is, the present invention relates to a non-cyanide copper-zinc alloy electroplating bath comprising a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound , and a conductive salt, and further comprising any one of a tin salt, a manganese salt, a cobalt salt, and a nickel salt.
また、本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物および電導塩を含み、さらにスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含む非シアン銅-亜鉛合金電気めっき浴を用いて、被めっき物に銅-亜鉛合金めっきすることを特徴とするめっき方法である。 The present invention also relates to a plating method, characterized in that an object to be plated is plated with a copper-zinc alloy using a non-cyanide copper-zinc alloy electroplating bath containing a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, and a conductive salt, and further containing any one of a tin salt, a manganese salt , a cobalt salt, and a nickel salt.
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