JP7436071B1 - Non-cyanide brass plating bath and plating method - Google Patents
Non-cyanide brass plating bath and plating method Download PDFInfo
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- 238000007747 plating Methods 0.000 title claims abstract description 71
- 238000000034 method Methods 0.000 title claims abstract description 15
- 229910001369 Brass Inorganic materials 0.000 title abstract description 27
- 239000010951 brass Substances 0.000 title abstract description 27
- -1 hydroxy acid salt Chemical class 0.000 claims abstract description 38
- 150000003839 salts Chemical class 0.000 claims abstract description 24
- 229940091173 hydantoin Drugs 0.000 claims abstract description 18
- 150000001879 copper Chemical class 0.000 claims abstract description 16
- 150000003751 zinc Chemical class 0.000 claims abstract description 15
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims abstract description 14
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 12
- 150000002815 nickel Chemical class 0.000 claims abstract description 11
- 150000001868 cobalt Chemical class 0.000 claims abstract description 10
- 150000002696 manganese Chemical class 0.000 claims abstract description 10
- 238000009713 electroplating Methods 0.000 claims abstract description 9
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims abstract description 8
- 150000001469 hydantoins Chemical class 0.000 claims abstract description 7
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 7
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims description 6
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 claims description 5
- NXQJDVBMMRCKQG-UHFFFAOYSA-N 5-phenylimidazolidine-2,4-dione Chemical compound O=C1NC(=O)NC1C1=CC=CC=C1 NXQJDVBMMRCKQG-UHFFFAOYSA-N 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- DTAGFZADSORGNX-UHFFFAOYSA-N [C-]#N.[Zn+2].[Cu+2].[C-]#N.[C-]#N.[C-]#N Chemical compound [C-]#N.[Zn+2].[Cu+2].[C-]#N.[C-]#N.[C-]#N DTAGFZADSORGNX-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 9
- 239000010949 copper Substances 0.000 abstract description 9
- 229910052802 copper Inorganic materials 0.000 abstract description 8
- 238000004040 coloring Methods 0.000 abstract description 3
- 229910017052 cobalt Inorganic materials 0.000 abstract description 2
- 239000010941 cobalt Substances 0.000 abstract description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 abstract description 2
- 229910052718 tin Inorganic materials 0.000 abstract description 2
- 239000011135 tin Substances 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 abstract 1
- 235000002639 sodium chloride Nutrition 0.000 description 41
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 150000001261 hydroxy acids Chemical class 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 150000003841 chloride salts Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000008139 complexing agent Substances 0.000 description 3
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- RZLVQBNCHSJZPX-UHFFFAOYSA-L zinc sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Zn+2].[O-]S([O-])(=O)=O RZLVQBNCHSJZPX-UHFFFAOYSA-L 0.000 description 3
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- RHYBFKMFHLPQPH-UHFFFAOYSA-N N-methylhydantoin Chemical compound CN1CC(=O)NC1=O RHYBFKMFHLPQPH-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 238000004512 die casting Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229940095064 tartrate Drugs 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- 235000014692 zinc oxide Nutrition 0.000 description 2
- RSBRXBZGVHQUJK-UHFFFAOYSA-N 5-ethylimidazolidine-2,4-dione Chemical compound CCC1NC(=O)NC1=O RSBRXBZGVHQUJK-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 235000011148 calcium chloride Nutrition 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229940001468 citrate Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- WIVXEZIMDUGYRW-UHFFFAOYSA-L copper(i) sulfate Chemical compound [Cu+].[Cu+].[O-]S([O-])(=O)=O WIVXEZIMDUGYRW-UHFFFAOYSA-L 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- SFXJSNATBHJIDS-UHFFFAOYSA-N disodium;dioxido(oxo)tin;trihydrate Chemical compound O.O.O.[Na+].[Na+].[O-][Sn]([O-])=O SFXJSNATBHJIDS-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229940050410 gluconate Drugs 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229940049920 malate Drugs 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229940039748 oxalate Drugs 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 229960000314 zinc acetate Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229960001939 zinc chloride Drugs 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229960001296 zinc oxide Drugs 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical class [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
【課題】銅に由来する着色(赤味)を抑え、安定した皮膜の均一性、付き回り性が得られる非シアン真鍮めっき浴およびめっき方法を提供する。【解決手段】二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含む非シアン真鍮電気めっき浴および二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、およびスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含む非シアン真鍮電気めっき浴を用いて、被めっき物に真鍮めっきするめっき方法。【選択図】 なしThe present invention provides a non-cyan brass plating bath and a plating method that suppresses coloring (reddish) derived from copper and provides stable film uniformity and coverage. [Solution] A non-cyanide brass electroplating bath containing a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, a conductive salt and any of a tin salt, a manganese salt, a cobalt salt, or a nickel salt. and non-cyanide brass electroplating baths containing divalent copper salts, divalent zinc salts, hydroxy acid salts, hydantoin compounds, and any of tin, manganese, cobalt, or nickel salts. A plating method for plating brass on plated objects. [Selection diagram] None
Description
本発明は、非シアン真鍮めっき浴およびめっき方法に関する。 The present invention relates to a non-cyanide brass plating bath and method.
シアン化物は、錯化剤として優れていることからめっきにおいて多用されてきたが、生物に有害であり、水質汚染、大気汚染、作業者の健康等に厳重な管理が必要であるため、シアン化物を含有しない弱酸性領域からアルカリ性領域でのめっき液が求められている。 Cyanide has been widely used in plating because it is an excellent complexing agent, but it is harmful to living things and requires strict control to prevent water pollution, air pollution, and worker health. There is a need for a plating solution in the weakly acidic to alkaline range that does not contain .
非シアン真鍮めっき浴としては、銅と、亜鉛と、金属ポリリン酸とオルトリン酸塩と、を含み、シアン化物を含まない非シアン化物真鍮めっき浴混合物(特許文献1)が知られている。 As a non-cyanide brass plating bath, a non-cyanide brass plating bath mixture containing copper, zinc, metal polyphosphoric acid and orthophosphate, and containing no cyanide (Patent Document 1) is known.
特許文献1の発明は、銅箔の上に真鍮バリア層を付着させる方法であり、装飾用途として使用するには、光沢、均一性、付き回り性等が不足している。 The invention of Patent Document 1 is a method of attaching a brass barrier layer on copper foil, and the method lacks gloss, uniformity, coverage, etc. for use as a decoration.
また、一般的に、非シアン真鍮めっき浴を用いてめっきすると、どうしても銅に由来する着色(赤味)が避けられないという問題もある。特に、ボタン、ファスナー、ホック、その他の小物部品でのバレルめっきを行うと、低電流密度部分においては赤っぽいめっきが混ざり、均一性、付き回り性不足が顕著に現れるので、装飾用途のめっき浴には使用できない。 Additionally, in general, when plating is performed using a non-cyanide brass plating bath, there is a problem in that coloring (reddish) originating from copper is unavoidable. In particular, when barrel plating is performed on buttons, fasteners, hooks, and other small parts, reddish plating is mixed in at low current density areas, resulting in noticeable lack of uniformity and coverage. Cannot be used for bathing.
本発明者らは、銅に由来する着色(赤味)を抑え、安定した皮膜の均一性、付き回り性が得られる非シアン真鍮めっき浴について、鋭意研究の結果、錯化剤として、ヒドロキシ酸塩とヒダントイン類化合物とを併用すると、前記の課題が解決できることを見出し、本発明を完成したものである。 As a result of extensive research into a non-cyanide brass plating bath that suppresses coloring (reddish) derived from copper and provides stable coating uniformity and coverage, the present inventors discovered that hydroxy acid as a complexing agent The present invention has been completed based on the discovery that the above-mentioned problems can be solved by using a salt and a hydantoin compound in combination.
すなわち本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物および電導塩を含み、さらにスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含むことを特徴とする非シアン銅-亜鉛合金電気めっき浴である。 That is, the present invention includes a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, and a conductive salt , and further includes a tin salt, a manganese salt, a cobalt salt, or a nickel salt. This is a non-cyanide copper-zinc alloy electroplating bath.
また、本発明は、前記ヒドロキシ酸塩が炭素数2または4のヒドロキシ酸であり、前記ヒダントイン類化合物が、ヒダントイン、アルキルヒダントインまたはフェニルヒダントインであることを特徴とする。 Further, the present invention is characterized in that the hydroxy acid salt is a hydroxy acid having 2 or 4 carbon atoms, and the hydantoin compound is hydantoin, alkylhydantoin, or phenylhydantoin.
また、本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物および電導塩を含み、さらにスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含む非シアン銅-亜鉛合金電気めっき浴を用いて、被めっき物に銅-亜鉛合金めっきすることを特徴とするめっき方法である。 Further, the present invention includes a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, and a conductive salt , and further includes a non-containing salt containing any one of a tin salt, a manganese salt, a cobalt salt, or a nickel salt. This is a plating method characterized by plating a copper -zinc alloy onto an object to be plated using a cyan copper-zinc alloy electroplating bath.
本発明によれば、ヒドロキシ酸塩およびヒダントイン類化合物に加え、スズ塩、マンガン塩、コバルト塩またはニッケル塩の比率を調整する事によりバレルめっきにおいても安定した均一性、付き回り性が得られる非シアン真鍮めっき浴を提供することができる。 According to the present invention, stable uniformity and coverage can be obtained even in barrel plating by adjusting the ratio of tin salt, manganese salt, cobalt salt, or nickel salt in addition to hydroxy acid salts and hydantoin compounds. Cyan brass plating bath can be provided.
さらに、本発明の非シアン真鍮めっき浴は、ラック方式だけでなくバレルめっきにおいても安定した均一性、付き回り性が得られるので、装飾用めっき物を製造する際にも好適にめっきを施すことができる。 Furthermore, the non-cyanide brass plating bath of the present invention provides stable uniformity and coverage not only in rack plating but also in barrel plating, making it suitable for plating when manufacturing decorative plated objects. Can be done.
また、本発明の非シアン真鍮めっき浴は、安定した均一性、付き回り性が得られるので、浴温が40℃程度と低い温度でめっきを施すことができ、めっき皮膜外観の向上だけでなく、作業性の向上という効果も得ることができる。 In addition, the non-cyanide brass plating bath of the present invention provides stable uniformity and coverage, so plating can be performed at a bath temperature as low as about 40°C, which not only improves the appearance of the plating film but also improves the appearance of the plating film. , it is also possible to obtain the effect of improving workability.
また、めっき浴に電導塩を加えることにより、更に均一性、付き回り性が得られ、電流密度範囲を広げる事ができる。 Furthermore, by adding a conductive salt to the plating bath, further uniformity and coverage can be obtained, and the current density range can be expanded.
本発明は、二価の亜鉛塩、二価の銅塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩またはニッケル塩のいずれかを含むことを特徴とする非シアン真鍮電気めっき浴である。 The present invention provides a non-cyanide salt containing a divalent zinc salt, a divalent copper salt, a hydroxy acid salt, a hydantoin compound, a conductive salt and any one of a tin salt, a manganese salt, a cobalt salt or a nickel salt. Brass electroplating bath.
本発明において、ヒドロキシ酸塩、ヒダントイン類化合物は、いずれも錯化剤として用いられる。 In the present invention, both hydroxy acid salts and hydantoin compounds are used as complexing agents.
ヒドロキシ酸塩としては、炭素数2または4のヒドロキシ酸塩があげられ、具体的には
たとえばグルコン酸塩、酒石酸塩、クエン酸塩、リンゴ酸塩などがあげられ、なかでも酒石酸塩、クエン酸塩が好ましい。
Examples of hydroxy acid salts include hydroxy acid salts having 2 or 4 carbon atoms, such as gluconate, tartrate, citrate, malate, among others, tartrate, citric acid, etc. Salt is preferred.
ヒドロキシ酸の塩としては、ヒドロキシ酸のアルカリ金属塩、アルカリ土類金属塩があげられ、たとえばカリウム塩、ナトリウム塩、カルシウム塩などがあげられる。ヒドロキシ酸塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 Examples of the salts of hydroxy acids include alkali metal salts and alkaline earth metal salts of hydroxy acids, such as potassium salts, sodium salts, and calcium salts. The above-mentioned hydroxy acid salts may be blended alone or in combination of two or more.
ヒドロキシ酸塩は、めっき浴において、50~400g/L含まれることが好ましく、とりわけ100~300g/L含まれることが好ましい。 The hydroxy acid salt is preferably contained in the plating bath in an amount of 50 to 400 g/L, particularly preferably 100 to 300 g/L.
ヒダントイン類化合物としては、ヒダントイン、1-メチルヒダントイン、5-エチルヒダントインまたは5,5-ジメチルヒダントインなどのアルキルヒダントイン、5-フェニルヒダントインなどがあげられ、ヒダントイン、アルキルヒダントインが好ましく、とりわけヒダントイン、5,5-ジメチルヒダントインが好ましい。ヒダントイン類化合物は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 Examples of hydantoin compounds include hydantoin, alkylhydantoin such as 1-methylhydantoin, 5-ethylhydantoin or 5,5-dimethylhydantoin, 5-phenylhydantoin, and hydantoin and alkylhydantoin are preferred, with hydantoin, 5, 5-dimethylhydantoin is preferred. The above-mentioned hydantoin compounds may be blended alone or in combination of two or more.
ヒダントイン類化合物は、めっき浴において、10~150g/L含まれることが好ましく、なかでも10~150g/L含まれることがより好ましい。 The hydantoin compound is preferably contained in the plating bath in an amount of 10 to 150 g/L, more preferably 10 to 150 g/L.
本発明のめっき浴においては、ヒドロキシ酸塩とヒダントイン類化合物とは、その重量比率としてヒドロキシ酸塩1重量部に対して、ヒダントイン類化合物が0.15~0.6重量部となるよう用いることが好ましい。 In the plating bath of the present invention, the hydroxy acid salt and the hydantoin compound are used in a weight ratio of 0.15 to 0.6 part by weight per 1 part by weight of the hydroxy acid salt. is preferred.
二価の銅塩としては、二価の銅と無機酸もしくは有機酸との塩があげられ、たとえば硫酸第一銅、ピロリン酸第一銅、シュウ酸第一銅、酸化第一銅、塩化第一銅等があげられる。本発明のめっき浴においては、二価の銅の酸化物、塩化物等であっても用いることができる。二価の銅塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 Examples of divalent copper salts include salts of divalent copper and inorganic or organic acids, such as cuprous sulfate, cuprous pyrophosphate, cuprous oxalate, cuprous oxide, and cuprous chloride. Examples include copper. In the plating bath of the present invention, even divalent copper oxides, chlorides, etc. can be used. The divalent copper salts mentioned above may be blended alone or in combination of two or more.
二価の銅塩は、めっき浴において、1~30g/L含まれることが好ましく、なかでも3~15g/L含まれることがより好ましい。 The divalent copper salt is preferably contained in the plating bath in an amount of 1 to 30 g/L, more preferably 3 to 15 g/L.
二価の亜鉛塩としては二価の亜鉛と無機酸もしくは有機酸との塩があげられ、たとえば
硫酸亜鉛、酢酸亜鉛、水酸化亜鉛、酸化亜鉛、塩化亜鉛等があげられる。本発明のめっき浴においては、二価の亜鉛の酸化物、塩化物等であっても用いることができる。二価の亜鉛塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。
Examples of divalent zinc salts include salts of divalent zinc and inorganic or organic acids, such as zinc sulfate, zinc acetate, zinc hydroxide, zinc oxide, and zinc chloride. In the plating bath of the present invention, even divalent zinc oxides, chlorides, etc. can be used. The divalent zinc salts mentioned above may be blended alone or in combination of two or more.
二価の亜鉛塩は、めっき浴において、1~30g/L含まれることが好ましく、なかでも1.5~7.0g/L含まれることがより好ましい。 The divalent zinc salt is preferably contained in the plating bath in an amount of 1 to 30 g/L, more preferably 1.5 to 7.0 g/L.
真鍮色のめっき皮膜を得るためには、めっき浴中において金属銅と金属亜鉛の重量比率が重要であり、金属銅1重量部に対して金属亜鉛が0.3~0.9重量部の範囲内にあるように、二価の亜鉛塩と二価の銅塩を用いることが好ましい。 In order to obtain a brass-colored plating film, the weight ratio of metallic copper and metallic zinc in the plating bath is important, and the ratio of metallic zinc to 1 part by weight of metallic copper is in the range of 0.3 to 0.9 parts by weight. It is preferable to use a divalent zinc salt and a divalent copper salt, as shown in .
本発明においては、めっき浴に、スズ塩、マンガン塩、コバルト塩、ニッケル塩のいずれかを添加することにより、めっき金属が三元合金となり光沢性が上昇する。かかる金属塩としてはスズ、マンガン、コバルト、ニッケルと、アルカリ金属、アルカリ土類金属、無機酸または有機酸との塩があげられ、具体的には、たとえばスズ酸ナトリウム、硫酸マンガン、硫酸コバルト、硫酸ニッケルがあげられる。 In the present invention, by adding any one of tin salt, manganese salt, cobalt salt, and nickel salt to the plating bath, the plating metal becomes a ternary alloy and the glossiness is increased. Examples of such metal salts include salts of tin, manganese, cobalt, nickel, and alkali metals, alkaline earth metals, inorganic acids, or organic acids, such as sodium stannate, manganese sulfate, cobalt sulfate, Examples include nickel sulfate.
前記金属塩は、めっき浴に0.1~2g/L含まれることが好ましい。 The metal salt is preferably contained in the plating bath in an amount of 0.1 to 2 g/L.
本発明のめっき浴においては、さらに電導塩を加えることにより、めっき皮膜の均一性、付き回り性が向上し、電流密度範囲も広がるので、より好ましい結果を得ることができる。 In the plating bath of the present invention, by further adding a conductive salt, the uniformity and coverage of the plating film are improved and the current density range is widened, so that more favorable results can be obtained.
電導塩としては、アルカリ金属、アルカリ土類金属またはアンモニアの塩化物が好ましく、具体的には、たとえば塩化カリウム、塩化ナトリウム、塩化カルシウムまたは塩化アンモニウムがあげられる。二価の銅塩は、前記のものを、単独で配合してもよく、2種以上を組み合わせて配合することもできる。 As the conductive salt, chlorides of alkali metals, alkaline earth metals, or ammonia are preferable, and specific examples thereof include potassium chloride, sodium chloride, calcium chloride, and ammonium chloride. The divalent copper salts mentioned above may be blended alone or in combination of two or more.
電導塩は、めっき浴中に5~50g/L含まれることが好ましい。 The conductive salt is preferably contained in the plating bath in an amount of 5 to 50 g/L.
本発明の非シアン真鍮めっき浴は、前記の二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを、水に溶解することにより製造することができる。 The non-cyanide brass plating bath of the present invention includes any of the above-mentioned divalent copper salts, divalent zinc salts, hydroxy acid salts, hydantoin compounds, conductive salts, tin salts, manganese salts, cobalt salts, or nickel salts. can be produced by dissolving it in water.
本発明は、二価の銅塩、二価の亜鉛塩、ヒドロキシ酸塩、ヒダントイン類化合物、電導塩およびスズ塩、マンガン塩、コバルト塩、またはニッケル塩のいずれかを含む非シアン真鍮電気めっき浴を用いて、被めっき物に真鍮めっきするめっき方法である。 The present invention provides a non-cyanide brass electroplating bath containing a divalent copper salt, a divalent zinc salt, a hydroxy acid salt, a hydantoin compound, a conductive salt and any of a tin salt, a manganese salt, a cobalt salt, or a nickel salt. This is a plating method that uses brass to plate the object to be plated.
めっきは、電気めっきの常法により実施すればよく、たとえば被めっき物を、脱脂、洗浄、酸浸漬、電解脱脂、酸活性などの前処理ののち、ラック方式やバレル方式などの方法によりめっきすることができる。たとえば、浴温30~50℃で、ラック方式によるときは電流0.2~2.0A/dm2、めっき時間0.5~3分間、バレル方式によるときは、電流5~10A/kg、めっき時間5~15分間、回転数4~15回転/分の条件でめっきすることにより、実施することができる。 Plating may be carried out using conventional electroplating methods, such as pretreatment of the object to be plated by degreasing, washing, acid immersion, electrolytic degreasing, acid activation, etc., and then plating by a method such as a rack method or a barrel method. be able to. For example, when using the rack method, the bath temperature is 30 to 50°C, the current is 0.2 to 2.0 A/dm 2 and the plating time is 0.5 to 3 minutes, and when the barrel method is used, the current is 5 to 10 A/kg, and the plating time is 0.5 to 3 minutes. This can be carried out by plating for 5 to 15 minutes and at a rotational speed of 4 to 15 revolutions/minute.
以下、本発明を実施例によりさらに詳細に説明するが、本発明はかかる実施例により限定されるものではない。 EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to examples, but the present invention is not limited to these examples.
実施例1
酒石酸ナトリウムカリウム150.0g/L、ヒダントイン30.0g/L、硫酸銅(II)・5水和物5.0g/L、硫酸亜鉛(II)・7水和物3.0g/L、塩化ナトリウム20.0g/L、スズ酸ナトリウム(IV)・3水和物0.5g/Lを用いてめっき浴10Lを建浴した。
Example 1
Potassium sodium tartrate 150.0g/L, hydantoin 30.0g/L, copper(II) sulfate pentahydrate 5.0g/L, zinc(II) sulfate heptahydrate 3.0g/L, sodium chloride A 10 L plating bath was prepared using 20.0 g/L and 0.5 g/L of sodium (IV) stannate trihydrate.
銅めっき済みの亜鉛ダイカスト250個(3.2g/個)をアクチベーターCu(商品名:株式会社シミズ製)50.0g/Lを用いてアルカリ電解脱脂し、水洗、酸洗浄、水洗の前処理を行った後、ミニバレル(コンドウ製ミニバレル)中で、以下の条件によりめっきを行った。 250 copper-plated zinc die castings (3.2 g/piece) were subjected to alkaline electrolytic degreasing using 50.0 g/L of activator Cu (product name: Shimizu Co., Ltd.), followed by water washing, acid washing, and pretreatment for water washing. After that, plating was performed in a mini-barrel (mini-barrel made by Kondo) under the following conditions.
めっき条件
陽極=カーボン板(100cm×100cm×1cm) 2枚
電流値=7A/Kg、通電時間=10分、浴温=40℃
バレル回転数=毎分6回転
めっき厚=約0.4m
めっき後、速やかにバレルから被めっき物を取り出し、水洗し、遠心乾燥機にて乾燥した。
Plating conditions Anode = 2 carbon plates (100cm x 100cm x 1cm) Current value = 7A/Kg, Current time = 10 minutes, Bath temperature = 40°C
Barrel rotation speed = 6 revolutions per minute Plating thickness = approx. 0.4m
After plating, the object to be plated was immediately taken out of the barrel, washed with water, and dried in a centrifugal dryer.
評価方法
色味:
色差計(CM-3500d、コニカミノルタ株式会社製)を用いて、被めっき物平面部分のL値、a値、b値SCI(正反射光込み)を測定(n=10)し、その平均値を、シアン系真鍮めっき物とのΔEとして算出した。数値が低いほどシアン系真鍮色に近い色味であることを示す。
なお、シアン系真鍮めっき物は、以下のめっき条件で、「真鍮ソルト」(商品名、日本化学産業株式会社製)により銅めっき済みの亜鉛ダイカスト250個(3.2g/個)をめっきしたものを用いた。
めっき条件
陽極=真鍮板(100cm×100cm×0.5mm) 2枚
電流値=5A/Kg、通電時間=10分、浴温=40℃
バレル回転数=毎分6回転
Evaluation method Color:
Using a color difference meter (CM-3500d, manufactured by Konica Minolta, Inc.), measure the L value, a value, and b value SCI (including specular reflection light) of the flat part of the object to be plated (n = 10), and calculate the average value. was calculated as ΔE with respect to the cyan-based brass plating. The lower the value, the closer the color is to a cyan-based brass color.
The cyan-based brass plated product is obtained by plating 250 copper-plated zinc die castings (3.2 g/piece) with "Brass Salt" (trade name, manufactured by Nihon Kagaku Sangyo Co., Ltd.) under the following plating conditions. was used.
Plating conditions Anode = 2 brass plates (100cm x 100cm x 0.5mm) Current value = 5A/Kg, Current time = 10 minutes, Bath temperature = 40℃
Barrel rotation speed = 6 revolutions per minute
付き回り均一性:
色差計で測定(n=100)し、被めっき物全部のサンプルのL値、a値、b値の平均から個々のL値、a値、b値を用いて平均値からのΔEを算出した。算出したn=100のΔEを用いて標準偏差を計算して、付き回り、均一性を評価した。標準偏差の数値が低い程、付き回り、均一性の良い仕上がりであることを示す。
◎:標準偏差が0.3以下
○:標準偏差が0.3超過~0.7未満
△:標準偏差が0.7以上
Coverage uniformity:
Measured with a color difference meter (n = 100), and calculated ΔE from the average value using the individual L value, a value, and b value from the average of the L value, a value, and b value of all samples to be plated. . The standard deviation was calculated using the calculated ΔE of n=100, and the coverage and uniformity were evaluated. The lower the standard deviation value, the better the coverage and uniformity of the finish.
◎: Standard deviation is 0.3 or less ○: Standard deviation is more than 0.3 to less than 0.7 △: Standard deviation is 0.7 or more
光沢性:
同様に色差計で測定(n=10)してL値の平均値で評価した。L値平均値の数値が高い程、光沢性の良い仕上がりであることを示す。
◎:L値平均値が83.5以上
○:L値平均値が83.5未満~82.4超過
△:L値平均値が82.4以下
Glossiness:
Measurements were similarly made using a color difference meter (n=10), and the average value of the L values was used for evaluation. The higher the average L value, the more glossy the finish.
◎: Average L value is 83.5 or more ○: Average L value is less than 83.5 to over 82.4 △: Average L value is 82.4 or less
実施例2~9
表1および2に示すめっき浴を用いる他は、実施例1と同様にしてめっきを行った。
なお、実施例2~9においては、二価の銅塩として硫酸銅(II)・5水和物5.0g/L、二価の亜鉛塩として硫酸亜鉛(II)・7水和物3.0g/L、電導塩として塩化ナトリウム20.0g/Lをそれぞれめっき浴に配合した。
Examples 2 to 9
Plating was carried out in the same manner as in Example 1, except that the plating baths shown in Tables 1 and 2 were used.
In Examples 2 to 9, 5.0 g/L of copper (II) sulfate pentahydrate was used as the divalent copper salt, and 3.0 g/L of zinc (II) sulfate heptahydrate was used as the divalent zinc salt. 0 g/L and 20.0 g/L of sodium chloride as a conductive salt were added to the plating bath.
比較例1および2
表3に示すめっきを用いる他は、実施例1と同様にしてめっきを行った。
なお、比較例1および2においても、二価の銅塩として硫酸銅(II)・5水和物5.0g/L、二価の亜鉛塩として硫酸亜鉛(II)・7水和物3.0g/L、電導塩として塩化ナトリウム20.0g/Lをそれぞれめっき浴に配合した。
結果は、表1~4に示すとおりである。
Comparative examples 1 and 2
Plating was carried out in the same manner as in Example 1, except that the plating shown in Table 3 was used.
In Comparative Examples 1 and 2, copper (II) sulfate pentahydrate was used as the divalent copper salt at 5.0 g/L, and zinc (II) sulfate heptahydrate was used as the divalent zinc salt at 3.0 g/L. 0 g/L and 20.0 g/L of sodium chloride as a conductive salt were added to the plating bath.
The results are shown in Tables 1 to 4.
結果および考察
表1~4からわかるように、ヒドロキシ酸、ヒダントイン類化合物および光択剤を配合しためっき浴では、シアン真鍮色基準のΔE値は低く、付き回り・均一性も対比に用いたシアン系真鍮めっきと同様または近い結果が得られているが、比較例では、ΔE値も上昇し、真鍮色より赤味を増し、付き回り、均一性も悪化していることがわかる。
Results and Discussion As can be seen from Tables 1 to 4, in the plating bath containing hydroxy acid, hydantoin compound, and photoselector, the ΔE value based on the cyan brass color was low, and the coverage and uniformity of the cyan brass color standard was also low. Although results similar to or similar to those of brass plating were obtained, in the comparative example, the ΔE value also increased, the color became more reddish than the brass color, and the coverage and uniformity were also deteriorated.
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2011528406A (en) | 2008-07-15 | 2011-11-17 | エントン インコーポレイテッド | Cyanide-free electrolyte composition for galvanic deposition of copper layers |
JP2013534963A (en) | 2010-04-15 | 2013-09-09 | ミーバ グライトラガー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Multi-layer radial bearing with corrosion protection layer |
JP2015134960A (en) | 2013-12-17 | 2015-07-27 | Ykk株式会社 | Copper strike plating solution |
JP2016540893A (en) | 2013-12-17 | 2016-12-28 | ウミコレ・ガルファノテフニック・ゲーエムベーハー | Precipitation of copper-tin and copper-tin-zinc alloys from electrolytes |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2011528406A (en) | 2008-07-15 | 2011-11-17 | エントン インコーポレイテッド | Cyanide-free electrolyte composition for galvanic deposition of copper layers |
JP2013534963A (en) | 2010-04-15 | 2013-09-09 | ミーバ グライトラガー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Multi-layer radial bearing with corrosion protection layer |
JP2015134960A (en) | 2013-12-17 | 2015-07-27 | Ykk株式会社 | Copper strike plating solution |
JP2016540893A (en) | 2013-12-17 | 2016-12-28 | ウミコレ・ガルファノテフニック・ゲーエムベーハー | Precipitation of copper-tin and copper-tin-zinc alloys from electrolytes |
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