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JP2020002436A5 - - Google Patents

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Publication number
JP2020002436A5
JP2020002436A5 JP2018123555A JP2018123555A JP2020002436A5 JP 2020002436 A5 JP2020002436 A5 JP 2020002436A5 JP 2018123555 A JP2018123555 A JP 2018123555A JP 2018123555 A JP2018123555 A JP 2018123555A JP 2020002436 A5 JP2020002436 A5 JP 2020002436A5
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JP
Japan
Prior art keywords
heating device
crucible
heater
reflector
treatment unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018123555A
Other languages
Japanese (ja)
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JP2020002436A (en
JP7092577B2 (en
Filing date
Publication date
Priority claimed from JP2018123555A external-priority patent/JP7092577B2/en
Priority to JP2018123555A priority Critical patent/JP7092577B2/en
Application filed filed Critical
Priority to KR1020180125582A priority patent/KR20200001956A/en
Priority to CN201811362786.6A priority patent/CN110656309B/en
Publication of JP2020002436A publication Critical patent/JP2020002436A/en
Publication of JP2020002436A5 publication Critical patent/JP2020002436A5/ja
Priority to JP2022097249A priority patent/JP2022113863A/en
Publication of JP7092577B2 publication Critical patent/JP7092577B2/en
Application granted granted Critical
Priority to KR1020240032014A priority patent/KR102661888B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

すなわち、本発明の加熱装置は、
坩堝を加熱するヒータと、
前記ヒータを挟んで、前記坩堝とは反対側に設けられ、前記ヒータからの熱を反射させるリフレクタと、
を備える加熱装置であって、
前記リフレクタは、第１部分と、前記第１部分より熱放射率が高い第２部分と、を有することを特徴とする。
That is, the heating device of the present invention
A heater for heating the坩堝,
A reflector provided on the side opposite to the crucible with the heater in between and reflecting heat from the heater.
It is a heating device equipped with
The reflexology data is characterized by having a first portion, a second portion thermal emissivity is not higher than the first portion.

そこで、本実施例では、第１リフレクタ３４１には、熱放射率が他の部位（第１部分）に比べて高い高熱放射率部３４１ａ（第２部分）が部分的に設けられている。この高熱放射率部３４１ａは、坩堝３２１の壁面（外壁面）の温度分布において、平均温度よりも高くなる領域の少なくとも一部の温度を低下させる位置に設けられている（図３（ｃ）（ｄ）参照）。より具体的には、高熱放射率部３４１ａは、坩堝３２１の壁面の温度分布において、平均温度よりも高くなる領域Ｈ０について、第１リフレクタ３４１に対して、坩堝３２１の壁面の法線方向Ｎに仮想的に投影した場合に、仮想的に投影される領域Ｈ１の少なくとも一部に設けられている（図３（ｅ）参照）。本実施例に係る第１リフレクタ３４１においては、２か所に設けられた高熱放射率部３４１ａの熱放射率が、他の部位に比べて高くなっている。なお、上記の「平均温度」とは、図３（ｂ）に示す温度分布における平均温度である。 Therefore, in the present embodiment, the first reflector 341 is partially provided with a high thermal emissivity portion 341a (second portion) having a higher thermal emissivity than the other portion (first portion). The high thermal emissivity portion 341a is provided at a position in the temperature distribution of the wall surface (outer wall surface) of the crucible 321 at a position where the temperature of at least a part of the region higher than the average temperature is lowered (FIGS. 3 (c) and 3 d) See). More specifically, the high thermal emissivity unit 341a is located in the normal direction N of the wall surface of the crucible 321 with respect to the first reflector 341 for the region H0 higher than the average temperature in the temperature distribution of the wall surface of the crucible 321. It is provided in at least a part of the area H1 that is virtually projected when it is virtually projected (see FIG. 3E). In the first reflector 341 according to the present embodiment, the heat emissivity of the high heat emissivity portions 341a provided at two places is higher than that of the other parts. The above "average temperature" is the average temperature in the temperature distribution shown in FIG. 3 (b).

Claims (11)

坩堝を加熱するヒータと、
前記ヒータを挟んで、前記坩堝とは反対側に設けられ、前記ヒータからの熱を反射させるリフレクタと、
を備える加熱装置であって、
前記リフレクタは、第１部分と、前記第１部分より熱放射率が高い第２部分と、を有することを特徴とする加熱装置。 A heater for heating the坩堝,
A reflector provided on the side opposite to the crucible with the heater in between and reflecting heat from the heater.
It is a heating device equipped with
The reflexology motor, a heating apparatus characterized by having a first portion, a second portion thermal emissivity is not higher than the first portion. 前記坩堝の壁面の温度分布において、平均温度よりも高くなる領域の少なくとも一部と熱量を交換する位置に前記第２部分が配置されることを特徴とする請求項１に記載の加熱装置。 The heating device according to claim 1 , wherein the second portion is arranged at a position where the amount of heat is exchanged with at least a part of a region higher than the average temperature in the temperature distribution of the wall surface of the crucible. 前記坩堝の壁面の温度分布において、平均温度よりも高くなる領域について、前記リフレクタに対して、前記坩堝の壁面の法線方向に仮想的に投影した場合に、仮想的に投影される領域の少なくとも一部に前記第２部分が設けられていることを特徴とする請求項１または２に記載の加熱装置。 In the temperature distribution of the wall surface of the crucible, at least the area that is virtually projected when the region higher than the average temperature is virtually projected onto the reflector in the normal direction of the wall surface of the crucible. The heating device according to claim 1 or 2, wherein the second portion is partially provided. 前記第２部分は、前記リフレクタにおける前記ヒータとの対向面側に形成された表面処理部であることを特徴とする請求項１，２または３に記載の加熱装置。 The heating device according to claim 1, 2, or 3, wherein the second portion is a surface treatment portion formed on the side of the reflector facing the heater. 前記第２部分は、前記リフレクタにおける前記ヒータとの対向面の裏側に形成された表面処理部であることを特徴とする請求項１，２または３に記載の加熱装置。 The heating device according to claim 1, 2, or 3, wherein the second portion is a surface treatment portion formed on the back side of the surface of the reflector facing the heater. 前記表面処理部は溶射による処理部であることを特徴とする請求項４または５に記載の加熱装置。 The heating device according to claim 4 or 5, wherein the surface treatment unit is a thermal spraying treatment unit. 前記表面処理部はブラスト加工による処理部であることを特徴とする請求項４または５に記載の加熱装置。 The heating device according to claim 4 or 5, wherein the surface treatment unit is a processing unit by blasting. 前記表面処理部は黒色めっき加工による処理部であることを特徴とする請求項４または
５に記載の加熱装置。 The heating device according to claim 4 or 5, wherein the surface treatment unit is a treatment unit by black plating. 前記第２部分は、前記リフレクタの両面を貫通する複数の貫通孔が形成されていることを特徴とする請求項１，２または３に記載の加熱装置。 The second portion, the heating device according to claim 1, 2 or 3, characterized in a plurality of through holes are formed Turkey penetrating both surfaces of the reflector. 基板に蒸着させる物質の材料を収容する坩堝と、
前記坩堝を加熱する請求項１〜９のいずれか一つに記載の加熱装置と、
を備えることを特徴とする蒸発源。 A crucible that houses the material of the substance to be vapor-deposited on the substrate,
The heating device according to any one of claims 1 to 9, which heats the crucible.
An evaporation source characterized by comprising. 請求項１０に記載の蒸発源と、
前記蒸発源が内部に配置されるチャンバと、
を備えることを特徴とする蒸着装置。 The evaporation source according to claim 10,
The chamber in which the evaporation source is arranged and
A vapor deposition apparatus characterized by comprising.
JP2018123555A 2018-06-28 2018-06-28 Evaporation source and vapor deposition equipment Active JP7092577B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2018123555A JP7092577B2 (en) 2018-06-28 2018-06-28 Evaporation source and vapor deposition equipment
KR1020180125582A KR20200001956A (en) 2018-06-28 2018-10-19 Heating apparatus, evaporation source and vapor deposition apparatus
CN201811362786.6A CN110656309B (en) 2018-06-28 2018-11-16 Evaporation source and evaporation device
JP2022097249A JP2022113863A (en) 2018-06-28 2022-06-16 Evaporation source and vapor deposition apparatus
KR1020240032014A KR102661888B1 (en) 2018-06-28 2024-03-06 Heating apparatus, evaporation source and vapor deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018123555A JP7092577B2 (en) 2018-06-28 2018-06-28 Evaporation source and vapor deposition equipment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022097249A Division JP2022113863A (en) 2018-06-28 2022-06-16 Evaporation source and vapor deposition apparatus

Publications (3)

Publication Number Publication Date
JP2020002436A JP2020002436A (en) 2020-01-09
JP2020002436A5 true JP2020002436A5 (en) 2021-07-26
JP7092577B2 JP7092577B2 (en) 2022-06-28

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KR (2) KR20200001956A (en)
CN (1) CN110656309B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7092577B2 (en) * 2018-06-28 2022-06-28 キヤノントッキ株式会社 Evaporation source and vapor deposition equipment
JP7520515B2 (en) 2020-01-09 2024-07-23 キヤノン株式会社 COMMUNICATION DEVICE, CONTROL METHOD, AND PROGRAM
JP7394242B1 (en) 2023-01-13 2023-12-07 日本碍子株式会社 drying equipment

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JPS6467518A (en) * 1987-09-07 1989-03-14 Matsushita Electric Ind Co Ltd Catalytic combustion equipment
JPH0626926A (en) * 1992-05-12 1994-02-04 Fujitsu Ltd Infrared ray detector
JPH06108236A (en) * 1992-09-25 1994-04-19 Mitsubishi Electric Corp Thin film forming device
JP4908234B2 (en) 2005-01-17 2012-04-04 株式会社ユーテック Evaporation source and vapor deposition equipment
JP2006274336A (en) 2005-03-29 2006-10-12 Jfe Steel Kk Method for heating steel plate in open heat type continuous heating furnace
JP2009093933A (en) 2007-10-10 2009-04-30 Negishi Seisakusho:Kk Infrared heater unit, and heating device with the same
JP2011162867A (en) 2010-02-15 2011-08-25 Mitsubishi Heavy Ind Ltd Vacuum evaporator
JP2012234909A (en) 2011-04-28 2012-11-29 Nissan Motor Co Ltd Heat sink, manufacturing method of the heat sink, and lighting appliance
KR102124588B1 (en) * 2012-10-22 2020-06-22 삼성디스플레이 주식회사 Linear evaporation source and vacuum deposition apparatus and having the same
JP2015067850A (en) 2013-09-27 2015-04-13 株式会社日立ハイテクファインシステムズ Vacuum evaporation system
JP3203978U (en) 2016-02-18 2016-04-28 根岸　敏夫 Organic material evaporation source
KR20160094347A (en) * 2016-03-30 2016-08-09 한국표준과학연구원 Inductive Heating Linear Evaporation Deposition Apparatus
JP7092577B2 (en) * 2018-06-28 2022-06-28 キヤノントッキ株式会社 Evaporation source and vapor deposition equipment

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