JP2015185675A - Substrate processing apparatus, substrate processing method, and method for manufacturing substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device and a method for processing a substrate before being coated, capable of efficiently preventing coating liquid coated in a hole on the substrate from exuding to the outside of the hole, and also to provide a method for manufacturing the substrate.SOLUTION: Disclosed is a substrate processing apparatus 20 which processes a substrate 11 before performing coating processing in a prescribed coating region of the substrate 11. This apparatus includes: a processing member 36 whose surface is formed with a prescribed rubber; and a holding member 37 which holds the processing member 36 and rubs the prescribed region including the prescribed coating region on the surface of the substrate 11 on the surface of the processing member 36.

Description

The present invention relates to a substrate processing apparatus, a substrate processing method, and a method for manufacturing a substrate, and more particularly, to a substrate processing apparatus, a substrate processing method, and a method for manufacturing a substrate that perform surface treatment of a substrate before applying a coating solution to the substrate.

  As a supply of flux for forming solder bumps on electrodes on a substrate, a method of screen printing a paste-like flux is used. Although the method of printing such a flux is a method with a track record of use, the management of the printing plate used as a screen is complicated, and it is said that the degree of difficulty in dealing with fine electrode patterns and deep holes for electrodes is high. There are challenges.

  As an alternative to the above method, there is a method of patterning and applying to a hole by a dispenser or an ink jet type application head, but in a general dispenser, a diameter of several tens of μm, a depth of several μm to several tens of μm, which is a normal hole size. In contrast, it is unsuitable for this application because of its excessive droplet volume and the small number of nozzles, and it is considered that the ink jet type capable of forming and dropping microdroplets with a multi-nozzle is superior (for example, Patent Document 1).

JP 2006-253485 A

  However, the ink jet type has a limitation on the viscosity of the liquid that can be discharged from the structure of the head, and a liquid having a relatively low viscosity of about 20 cP when discharging with a general head and about 100 cP when discharging with a special head is used. There is a need.

  By the way, when the material of the substrate on which the hole for the electrode is formed has a shape in which capillary phenomenon is likely to occur like a porous material, the coating solution dropped and applied in the hole has a low viscosity, There may be a phenomenon of seeping out of the hole due to capillary action. In particular, the above phenomenon becomes remarkable when the material on the substrate has good wettability to the coating solution.

  FIG. 6 shows an explanatory diagram of the phenomenon in which the coating liquid oozes out of the hole from the electrode hole on the substrate. As shown in FIG. 6A, an electrode hole 102 is formed in a substrate 101 by a resist (solder resist) 103. In this hole 102, a flux 105 is dropped as a coating liquid for mounting a solder ball (not shown). The resist 103 described above is in a porous state, and a large number of irregularities are formed on the surface 103 a of the resist 103 including the side surfaces of the holes 102.

  As shown in FIG. 6B, the flux 105 dropped and applied to the hole 102 starts to ooze out of the hole 102 along the side surface of the hole 102 due to a capillary phenomenon due to the uneven portion of the resist surface 103a. . As shown in FIG. 6C, the flux 105 oozes out to the upper end of the side surface of the hole 102, and the resist 103 has good wettability with the flux 105. Therefore, as shown in FIG. Out of the hole 102, the surface of the resist 103 on the substrate 101 is soaked and spreads.

  In this way, when the coating liquid (flux) dripped into the hole oozes out of the hole, there is a problem of an insufficient amount of liquid in the hole and an adverse effect of the liquid leached on the substrate, Furthermore, the merit of pattern application is lost. Specifically, if the coating liquid is a flux, insufficient liquid in the hole may cause a problem in the reflow process due to insufficient flux, and leaching onto the substrate is mistrap during ball mounting, This can lead to residue residue during substrate cleaning. It is difficult to solve such a problem with only liquid properties (for example, high surface tension) while maintaining the performance required for a coating solution such as flux. For example, in order to cope with a liquid that can be ejected by ink jet, it is not possible to cope with a special liquid having a phase change such as hot melt, UV curing, or quick drying, and the selection range of usable liquids is remarkably narrowed. These are common problems not only when using an ink jet head but also when using a low viscosity liquid.

  In order to prevent the coating liquid from seeping out of the hole, it is only necessary to deteriorate the wettability (enhance liquid repellency) between the coating liquid such as flux and the surface of the resist film on the substrate. As a pretreatment, it is conceivable to coat a liquid repellent film on the resist film of the substrate.

  If the substrate is processed by the above method before coating, it is possible to prevent the coating liquid (for example, flux) from seeping out of the hole, but it is necessary to newly provide a coating apparatus and a drying apparatus (process). However, there is a problem that consideration is necessary to prevent the influence on the subsequent process.

  The present invention has been made in view of such circumstances, and a substrate processing apparatus before coating that can prevent leaching of the coating solution applied to the coating region on the substrate other than the coating region with a simple configuration, A substrate processing method and a method for manufacturing a substrate are provided.

  The substrate processing apparatus according to the present invention is a substrate processing apparatus for processing the substrate before performing a coating process on the surface of the substrate, the processing member having a surface formed of rubber or resin, and the surface of the processing member And a moving device that contacts a portion of the surface of the substrate that does not require application of the coating liquid.

  A substrate processing apparatus according to the present invention is a substrate processing apparatus for processing a substrate before performing a coating process on a coating region of the substrate, the processing member having a surface formed of rubber or resin, and the processing member And a moving device for bringing a surface into contact with a region including the coating region of the substrate.

  A substrate processing method according to the present invention is a substrate processing method for processing a substrate before applying a coating liquid to a coating region of the substrate, and the surface of a processing member whose surface is formed of rubber or resin, The surface treatment step is brought into contact with a region including the application region on the surface of the substrate.

  A method of manufacturing a substrate according to the present invention is a method of manufacturing a substrate by performing a coating process on a coating region on the surface of the substrate after the surface treatment of the substrate, wherein the surface treatment is performed with a rubber or resin surface. It becomes the structure which is the process which makes the said surface of the process member formed by contact the area | region including the said application | coating area | region of the surface of the said board | substrate.

  According to the present invention, by treating the surface of the substrate with the processing member before the coating treatment of the coating solution, it is easy for the coating solution applied to the coating region on the substrate to ooze out of the coating region. It is possible to provide a substrate processing apparatus, a substrate processing method, and a method for manufacturing a substrate that can be suppressed by a simple configuration and improve the coating accuracy of the coating liquid.

1 is a schematic side view showing a schematic side view of a solder bump forming apparatus including a substrate processing apparatus according to a first embodiment of the present invention. 1 is a schematic plan view of a solder bump forming apparatus including a substrate processing apparatus according to a first embodiment of the present invention. Sectional drawing of the processing member of the substrate processing apparatus which concerns on the 1st Embodiment of this invention. Sectional drawing of the processing member of the substrate processing apparatus which concerns on the 2nd Embodiment of this invention. The side surface schematic of the substrate processing apparatus which concerns on the 3rd Embodiment of this invention. The side surface schematic of the substrate processing apparatus which concerns on the 4th Embodiment of this invention. Explanatory drawing of the phenomenon from which a coating liquid oozes out from the hole to the substrate surface from the hole for electrodes formed on the board | substrate.

  Embodiments of the present invention will be described with reference to the drawings.

<First Embodiment>
The substrate processing apparatus according to the first embodiment of the present invention is configured as shown in FIGS. 1A and 1B.

  FIG. 1A is a schematic side view showing a schematic side view of a solder bump forming apparatus for forming solder bumps on a substrate, and FIG. 1B is a schematic plan view of the solder bump forming apparatus. A substrate processing apparatus according to an embodiment of the present invention is an apparatus for processing a substrate by forming solder bumps shown in FIGS. 1A and 1B.

  As shown in FIGS. 1A and 1B, the solder bump forming apparatus 10 includes a substrate supply apparatus 12 for supplying a substrate 11 stored in a cassette (not shown) and a substrate 11 from the substrate supply apparatus 12 to form solder bumps. Is applied to the hole for the electrode as an application region formed on the surface of the substrate 11, and a flux as a coating solution is sprayed and applied, and the hole of the substrate 11 to which the flux is applied by the application device 13 A solder ball mounting device 15 for mounting a solder ball (not shown), a reflow device 16 for melting the solder by heating the mounted solder ball, and a substrate on which solder bumps are formed by heat processing by the reflow device 16. A substrate storage device 17 is provided, and the substrate processing apparatus 2 according to the present embodiment is provided between the substrate supply device 12 and the coating device 13. There are located. Here, the flux is a flux solution, and is adjusted to a viscosity suitable for ejection by an ink jet type coating head described later by mixing a soldering flux with a solvent such as an organic solvent.

  The solder bump forming apparatus 10 further includes a substrate transfer device 23 between the substrate supply device 12 and the coating device 13, and a substrate transfer device 24, a solder ball mounting device 15 and a reflow device between the coating device 13 and the solder ball mounting device 15. A substrate transfer device 25 is provided between the substrate 16 and the substrate transfer device 26 between the reflow device 16 and the substrate storage device 17.

  The substrate storage device 12 includes a substrate storage cassette (not shown) that stores a plurality of substrates 11, and a delivery mechanism (not shown) that sends the substrate 11 stored in the substrate storage cassette to the transport device 23.

  The substrate transfer device 23 includes two columnar shaft members 23a and 23b arranged in parallel on a horizontal plane with a predetermined interval. In the shaft members 23a and 23b, the center axis of the cylinder is orthogonal to the substrate transport direction (indicated by the arrow 28), and the center substrate is rotated about the rotation axis so that the mounted substrate 11 is moved in the transport direction. This is a so-called transport roller that transports toward the coating device 13. The predetermined interval between the shaft members 23a and 23b is set to an optimum interval for mounting and transporting the substrate 11. The substrate transport device 23 sequentially places the substrate 11 sent from the feed mechanism of the substrate storage device 12 on the rotating shaft members 23 a and 23 b of the substrate transport device 23 and transports the substrate 11 to the coating device 13. The substrate transport device 24 (shaft members 24a and 24b), the substrate transport device 25 (shaft members 25a and 25b), and the substrate transport device 26 (shaft members 26a and 26b) also have the same structure and function as the substrate transport device 23 described above. It is what you have.

  The coating device 13 includes a movable substrate stage 31 on which the substrate 11 transported by the substrate transport device 23 is placed, an ink jet coating head 32 that sprays and applies a flux (coating liquid) to the substrate 11, and And an ionizer 33 for removing static electricity generated on the substrate 11 before application. As will be described later, static electricity is removed by the ionizer 33. Since the surface of the substrate 11 transported to the coating device 13 is processed (rubbed and pressed) by the substrate processing device 20, static electricity is generated on the substrate 11. This is because there is a possibility that the trouble due to static electricity is prevented when the coating liquid is applied onto the substrate 11.

  The substrate 11 placed on the substrate stage 31 is subjected to static electricity removal by an ionizer 33, and further, a flux is sprayed and applied to the electrode holes of the substrate 11 by the coating head 32. 24. The substrate 11 placed on the shaft members 24a and 24b of the substrate transport device 24 is sent to the solder ball mounting device 15 by the rotation of the shaft members 24a and 24b.

  The substrate 11 sent to the solder ball mounting device 15 is placed on the substrate stage 34 and moved to a predetermined position for mounting a solder ball (not shown). When the mounting of the solder balls into the holes on the substrate 11 where the flux is applied is completed, the substrate stage 34 on which the substrate 11 is placed moves toward the substrate transfer device 25. And the board | substrate 11 mounted in the shaft members 25a and 25b of the conveying apparatus 25 is sent to the reflow apparatus 16 by rotation of the shaft members 25a and 25b.

  The substrate 11 sent to the reflow device 16 is placed on the substrate stage 35, and the solder balls are melted by heat treatment by a heating device (not shown) to form solder bumps (not shown). After the heat treatment in the reflow device 16 is completed, the substrate stage 35 on which the substrate 11 is placed moves toward the substrate transport device 26. The substrate 11 placed on the shaft members 26a and 26b of the transport device 26 is sent to the substrate storage device 17 by the rotation of the shaft members 26a and 26b.

  In the substrate storage device 17, the substrate 11 transported by the substrate transport device 26 is stored in a substrate storage cassette (not shown). In this way, after the flux is sprayed and applied to the electrode holes on the substrate, the solder balls are mounted in the holes, and the solder is melted by heat treatment to form solder bumps.

  In the formation of the solder bump, a predetermined amount of flux is supplied to an electrode hole formed on the substrate, and then a solder ball (not shown) is mounted in the hole. If the flux applied to the hole oozes out of the hole due to capillarity due to the uneven shape of the resist surface that forms the hole, the amount of flux in the hole will be insufficient and the reflow process will be hindered. It will be. Therefore, in order to avoid the occurrence of the above-mentioned trouble, the substrate processing apparatus 20 before applying the flux (coating liquid) to the substrate 11 by the coating apparatus 13 in order to prevent the flux from seeping out from the hole. The surface of the substrate 11 is processed. In addition, although the above-mentioned board | substrate 11 is a square-shaped and thin printed board, it is not limited to this.

As shown in FIGS. 1A and 1B, the substrate processing apparatus 20 is provided between the substrate supply apparatus 12 and the coating apparatus 13 and performs a surface treatment of the substrate 11 placed on the substrate transport apparatus 23. The substrate processing apparatus 20 includes a cylindrical processing member 36 and a holding member 37 that holds the processing member 36 at a predetermined position.

  The processing member 36 is a member for pressing or rubbing the surface of the substrate 11 with the surface of the processing member 36 (the side surface of the cylinder). For example, as shown in FIG. It is a columnar member having a two-layer structure including a member 36a and a cylindrical surface layer member 36b formed so as to cover the core member 36a. The surface layer member 36b is a portion that directly touches (contacts) the surface of the substrate 11 and performs surface treatment (pressing and rubbing). For example, a rubber member such as nitrile rubber or urethane rubber, or a silicone resin or Tygon (registered trademark). ) Or the like. Note that the rubber member and the resin are preferably softer than the hard one, and may cause damage such as scratches on the surface of the substrate 11 such as having flexibility and elasticity that can follow the unevenness of the surface of the substrate 11. It is preferable to use a material having a difficult hardness or surface state. The core member 36a is formed of a cushioning material such as sponge. In this case, when the surface of the substrate 11 is processed with the surface layer member 36b, the core member 36a serves as a cushion in order to prevent damage due to a load on the substrate 11. The length of the processing member 36 in the axial direction is set to be slightly larger than the width of the substrate 11 (the length in the direction orthogonal to the transport direction (arrow 28)).

  The holding member 37 of the substrate processing apparatus 20 has, for example, a structure that holds both side surfaces (both bottom surfaces) of the columnar processing member 36 from the left and right, and a shaft member 23b disposed on the coating apparatus 13 side. In parallel with the shaft member 23b, and is held at a height at which the surface of the substrate 11 is pressed with a predetermined pressure. The predetermined pressure is set to a pressure that is suitable for the surface treatment of the substrate 11 and that does not damage or damage the substrate 11. During the surface treatment (pressing or rubbing) of the substrate 11 by the processing member 36, the holding member 37 of the substrate processing apparatus 20 holds the processing member 36 in a fixed position without rotating. Before starting the surface treatment of the substrate 11, the processing member 36 may be rotated by a predetermined angle so as to change the position of the surface layer member 36 b used this time in the surface treatment so as to have a rotation mechanism portion (not shown). Good. In this case, a rotation shaft is provided through the center of the cylindrical core member 36a, the rotation shaft is rotatably held by the holding member 37, and a driving source for rotationally driving the processing member 36 on the rotation shaft. Should be connected.

  Next, the operation of the substrate processing apparatus 20 according to the present embodiment will be described with reference to FIGS. 1A, 1B and 2. The substrate processing apparatus 20 processes the surface of the substrate 11 on the substrate 11 sent from the substrate supply apparatus 12 and placed on the substrate transfer apparatus 23 before being transferred to the coating apparatus 13.

  When the substrate 11 is placed on the shaft members 23a and 23b of the substrate transport device 23 and the substrate 11 is transported to the coating device 12 by the rotation of the shaft members 23a and 23b, the holding member 37 of the substrate processing apparatus 20 is connected to the shaft member 23b. The substrate 11 that has been sent is sandwiched between the processing member 36 and the surface layer member 36b of the processing member 36 presses the entire width direction of the front end of the substrate transport direction (arrow 28) with a predetermined pressure. Since the substrate 11 is further transported in the transport direction toward the coating device 13 by the substrate transport device 23, the substrate processing device 20 is a surface layer member 36 b of the processing member 36, and the substrate 11 is moved from the front end toward the rear end. By rubbing the entire surface (upper surface), the surface treatment of the substrate 11 can be performed. That is, in this embodiment, the substrate transfer device 23 also serves as a moving device that brings the processing member 36 into contact with the substrate 11 in the substrate processing apparatus 20.

  The substrate 11 subjected to the surface treatment by rubbing with the surface layer member 36b of the processing member 36 of the substrate processing apparatus 20 supplies the flux to the hole for the electrode formed on the substrate 11 in the coating apparatus 13, and the outside of the flux hole No oozing into was confirmed. In the case of the substrate 11 not subjected to the above surface treatment, the flux oozes out of the hole when it is left to stand for about 1 minute after coating, and wetting of the surface of the substrate 11 was confirmed. As for the substrate 11 that was pressed and rubbed to the extent that it touched the surface and was subjected to the above surface treatment, wetting on the surface was not confirmed even after being left for about 10 minutes. This is a surface layer member 36b of the processing member 36 formed of rubber (for example, nitrile rubber, urethane rubber or the like) or resin (silicon resin or the like), and is applied to the surface of the rubber or resin by surface treatment that rubs the surface of the substrate 11. The adhered organic matter is transferred to the surface of the substrate, or a part of rubber or resin is adhered to the surface of the substrate, and the surface of the substrate 11 is organically contaminated. Inferred to have been made.

  As described above, according to the present embodiment, the surface of the substrate 11 can be subjected to the liquid repellent treatment with a simple configuration in which the processing member 36 is brought into contact with the surface of the substrate 11. It is possible to prevent the flux applied inside from seeping out of the hole. Therefore, it becomes possible to reliably apply (supply) a required amount of flux in the hole, and to improve the application accuracy. Accordingly, during the subsequent solder ball reflow process, the wettability of the molten solder can be promoted well, the reoxidation of the solder surface can be prevented, and the solder bumps can be formed well. Therefore, the yield of solder bumps to be formed can be improved.

  In addition, since organic contaminants attached to the surface of the substrate 11 by contacting the processing member 36 can be expected to disappear by heating to melt the solder balls, in such a case, the organic contaminants are removed. This eliminates the need for a special apparatus such as a cleaning apparatus, and prevents the apparatus configuration from becoming complicated.

  Further, since the substrate transport device 23 also serves as a moving device for bringing the processing member 36 into contact with the substrate 11 of the substrate processing apparatus 20, the substrate processing apparatus 20 has a holding member 37 for holding the processing member 36 at a predetermined height position. It is only necessary to provide the moving mechanism, and it is not necessary to provide a moving mechanism. Therefore, the surface of the substrate 11 can be subjected to a liquid repellent treatment with a simple configuration.

  Further, since the processing member 36 includes the core member 36a formed of a cushioning member and the surface layer member 36b having flexibility and elasticity, the substrate 11 can be used even when the surface of the substrate 11 is not flat. It is possible to prevent a partial strong pressing force from acting on the surface of the substrate 11 and to thereby prevent the substrate 11 from being damaged.

  The substrate processing apparatus 20 includes a holding member 37 that holds the processing member 36 in a predetermined position, and further includes a moving device (not shown) that moves the holding member 37 horizontally and vertically. It can be. For example, by moving the holding member 37 holding the processing member 36 in the direction opposite to the substrate transport direction, the substrate 11 being transported can be strongly rubbed by the processing member 36, and the effect of the surface treatment can be improved. It is thought that it can be improved. In addition, the surface of the substrate 11 can be rubbed by stopping the conveyance by the substrate conveyance device 23 and moving the holding member 37 holding the processing member 36 in the direction opposite to the substrate conveyance direction. Further, by moving the holding member 37 holding the processing member 36 in the vertical direction by the moving device, the degree of pressing by the processing member 36 against the substrate 11 can be adjusted. As described above, the strength of rubbing the surface of the substrate 11 can be changed by adjusting the degree of pressing the substrate 11 by the moving device, the direction of the horizontal movement by the moving device, and the speed. It is possible to perform surface treatment of the substrate by rubbing or pressing according to the above.

<Second Embodiment>
Next, a second embodiment of the substrate processing apparatus according to the present invention will be described with reference to FIG. In this embodiment, the processing member 36 in the first embodiment described above is improved and changed, and there is no difference in other portions. Accordingly, the same components as those in the first embodiment will be described with the same names and the same symbols.

  As shown in FIG. 3, the processing member 41 of the substrate processing apparatus of the present embodiment has a rectangular column shape with a rectangular cross section on one side surface (lower surface) of a plate member 41a that is a rectangular column member having a rectangular cross section. One side surface (upper surface) of the core member 41b in the longitudinal direction is adhered, and a surface layer member 41c is adhered so as to cover three side surfaces in the longitudinal direction of the core member 41b adhered to the plate member 41a. It is a structure. The lengths in the longitudinal direction of the core member 41b and the surface layer member 41c are provided slightly larger than the length of the substrate 11 in the width direction, which is a direction orthogonal to the direction in which the substrate 11 is conveyed. The lengths of the core member 41b and the surface layer member 41c in the short direction are not particularly limited, but are set to be shorter than the length of the substrate 11 in the transport direction.

  As in the first embodiment, the surface layer member 41c of the processing member 41 is a part that directly touches the surface of the substrate 11 to perform surface treatment. For example, a rubber member such as nitrile rubber or urethane rubber, or a silicone resin, Tygon ( The core member 41b is formed of a cushioning material such as sponge. As in the first embodiment, when the surface of the substrate 11 is treated with the surface layer member 36b, the core member 36a serves as a cushion to prevent the substrate 11 from being damaged.

  Similar to the first embodiment, the holding member 37 of the substrate processing apparatus of the present embodiment supports the upper surface of the plate member 41a at the lower end portion thereof, and the shaft member 23b disposed on the coating apparatus 13 side. The substrate 11 is sandwiched between the shaft member 23b and the surface of the substrate 11 so as to be pressed at a predetermined pressure. The longitudinal direction of the processing member 41 is a direction orthogonal to the transport direction 28 of the substrate 11.

  Next, the operation of the substrate processing apparatus according to the present embodiment will be described. The description will focus on differences from the first embodiment. When the substrate 11 is placed on the shaft members 23a and 23b of the substrate transport device 23 and the substrate 11 is transported to the coating device 12 by the rotation of the shaft members 23a and 23b, the holding member 37 of the substrate processing apparatus of this embodiment is The substrate 11 is sandwiched between the member 23b and the processing member 41, and the transport direction (arrow 28) of the substrate 11 sent with a predetermined pressure by the rectangular side surface (bottom surface) of the surface layer member 41c of the processing member 41. Press the entire width of the tip. Since the substrate 11 is further transported in the transport direction toward the coating device 13 by the substrate transport device 23, the substrate 11 is directed from the front end to the rear end of the substrate 11 on one rectangular side surface of the surface layer member 41 c of the processing member 41. The surface (upper surface) of the substrate 11 can be rubbed to perform the surface treatment of the substrate 11.

  Also in such an embodiment, the same operational effects as those of the first embodiment can be obtained. Further, in the present embodiment, as described above, the surface of the substrate 11 is rubbed with one rectangular side surface of the surface layer member 41c of the processing member 41. Therefore, compared with the first embodiment, the contact area in the substrate transport direction is larger. It can be considered that even if the pressure is the same and the conveyance speed is the same, the organic contaminant can be more reliably attached to the surface of the substrate 11 and the effect of the surface treatment can be obtained.

  In the present embodiment, the substrate processing apparatus has a holding member that holds the processing member 41 in a predetermined position, but a moving device (not shown) that further moves the holding member in the horizontal and vertical directions. Can be included. For example, by moving the holding member holding the processing member 41 in the direction opposite to the substrate transport direction, it is possible to increase the rubbing on the transported substrate 11 and improve the effect of the surface treatment. It is done. Further, the surface of the substrate 11 can be rubbed by stopping the conveyance by the substrate conveyance device 23 and moving the holding member holding the processing member 41 in the direction opposite to the substrate conveyance direction.

<Third Embodiment>
Next, a third embodiment of the substrate processing apparatus according to the present invention will be described with reference to FIG. The substrate processing apparatus of this embodiment is a substrate processing apparatus in which the processing apparatus mechanism for the substrate 11 is incorporated into the coating apparatus 13 shown in FIG. 1 and the surface treatment of the substrate 11 and the subsequent coating of the substrate 11 are integrated. .

  As shown in FIG. 4, the processing apparatus mechanism 51 included in the substrate processing apparatus 50 of this embodiment includes a processing member 52, a holding member 53 a that holds the processing member 52, and a lifting device that moves the holding member 53 a up and down. 53. The processing device mechanism 51 is disposed on the front side of the substrate 11 in the transport direction (indicated by an arrow 28) from the position where the coating head 54 and the ionizer 55 are disposed. The processing member 52 is adhered to a plate member 52a having a rectangular plate shape on the surface (upper and lower surfaces) in a state where a core member 52b which is a rectangular plate member is overlapped, and the remaining part of the core member 52b is attached. It is the structure where the surface layer member 52c was stuck so that a surface (5th surface) might be covered. The processing member 52 has a surface and a lower surface of the surface layer member 52 c positioned facing the substrate 11 held on the substrate stage 31, that is, a size and shape that can press the entire substrate 11.

  Similar to the first embodiment, the surface layer member 52c of the processing member 52 is a portion that directly touches the surface of the substrate 11 to perform surface treatment. For example, a rubber member such as nitrile rubber or urethane rubber, or a silicone resin, Tygon (registered) The core member 52b is formed of a cushioning material such as sponge. As in the first embodiment, when the surface of the substrate 11 is processed with the surface layer member 52c, the core member 52b serves as a cushion in order to prevent the substrate 11 from being damaged.

  The lifting device 53 is a device that holds the plate member 52a of the processing member 52 and moves the processing member 52 up and down by a driving device (not shown). When the processing member 52 is pressed against the surface of the substrate 11, the elevating device 53 adjusts the pressing force and can be set to a pressing force suitable for the surface treatment of the substrate 11.

  Next, the operation of the substrate processing apparatus 50 according to the present embodiment will be described with reference to FIG. The substrate processing apparatus 50 according to the present embodiment has a configuration in which the processing apparatus mechanism 51 is incorporated in the coating apparatus as described above, and the coating apparatus is the same as that described in the first embodiment. . The processing device mechanism 51 performs a surface treatment of the substrate 11 before the static electricity removing process by the ionizer 55 and the coating process by the coating head 54 shown in FIGS. 1A and 1B. Arrow 28) Installed on the near side.

  As shown in FIG. 4, the substrate 11 transported by a substrate transport device (not shown) is placed on the substrate stage 31 and placed at a position where surface treatment by the processing device mechanism 51 is performed. That is, the substrate stage 31 stops at this position. In this state, the processing device mechanism 51 drives the elevating device 53 to lower the processing member 52 toward the substrate 11, presses the entire surface of the substrate 11 with the surface layer member 52 c, and performs surface processing by pressing. it can. Thereafter, the substrate stage 31 moves toward the coating head 54, and during this movement, the substrate 11 is subjected to static electricity removal processing by the ionizer 55 and coating processing by the coating head 54.

  Also in such an embodiment, it is possible to obtain the same operational effects as the first embodiment. In the present embodiment, the surface layer member 52c of the processing member 52 can be pressed so as to cover the entire surface of the substrate 11 as described above. It is something that can be done.

  The processing device mechanism 51 lowers the processing member 52 by the elevating device 53 and performs surface treatment of the substrate 11 by pressing. However, the processing device mechanism 51 is in a pressing state against the substrate 11 by adding a horizontal moving device. It is also possible to perform surface treatment by rubbing the surface of the substrate 11 by moving the elevating device 53 in the horizontal direction.

  Further, although the processing member 52 is brought into contact with the entire surface of the substrate 11, it may be brought into contact with only a portion to be processed. In this case, a block-shaped processing body (consisting of a core member 52b and a surface layer member 52c) having a size corresponding to the size of the portion to be processed on the surface of the substrate 11 is prepared for the number of portions to be processed. A processing member may be configured by attaching a block-shaped processing body to the lower surface of the plate member 52a in accordance with the position of the portion of the surface of the substrate 11 to be processed. If the processing member formed in this way is used, it is not necessary to impart more liquid repellency to the surface of the substrate 11 than necessary. Therefore, even when the liquid repellency is removed after the solder bump is formed, the removal is easy. Can be done.

<Fourth Embodiment>
Next, a fourth embodiment of the substrate processing apparatus according to the present invention will be described with reference to FIG. As in the third embodiment described above, the present embodiment is a substrate processing apparatus in which a processing apparatus mechanism is incorporated in a coating apparatus, and surface treatment of the substrate and subsequent coating of the substrate are integrated. Accordingly, the same components as those in the third embodiment will be described with the same names and the same symbols.

  As shown in FIG. 5, the processing apparatus mechanism 61 included in the substrate processing apparatus 60 of the present embodiment includes a processing member 62, a holding member 63 a that holds the processing member 62, and a lifting device that moves the holding member 63 a up and down. 63b and a moving device 63 including a horizontal moving device 63c that moves in the horizontal direction. The processing member 62 has the same configuration as that of the first embodiment, and includes a columnar core member (not shown) and a cylindrical surface layer member (not shown) formed so as to cover the core member. This is a two-layered cylindrical member. The surface layer member is a portion that performs surface treatment by directly touching the surface of the substrate 11, and is formed of, for example, a rubber member such as nitrile rubber or urethane rubber, or a resin such as silicone resin or Tygon (registered trademark). It is made of a cushioning material such as sponge. The length of the processing member 62 in the axial direction is set slightly larger than the width of the substrate 11 (the length in the direction orthogonal to the transport direction (arrow 28), see FIG. 1A).

  Next, the operation of the substrate processing apparatus according to this embodiment will be described with reference to FIG. The substrate processing apparatus 60 according to the present embodiment has a configuration in which the processing apparatus mechanism 61 is incorporated in the coating apparatus as described above, and the coating apparatus is the same as that described in the first embodiment. . The processing device mechanism 61 performs a substrate surface treatment that is performed before the static electricity removing process by the ionizer 55 and the coating process by the coating head 54 shown in FIGS. 1A and 1B, and transports the substrate 11 by the ionizer 55 and the coating head 54. It is installed on the front side in the direction (arrow 28).

  As shown in FIG. 5, the substrate 11 transported by a substrate transport device (not shown) is placed on the substrate stage 31 and placed at a position where surface treatment by the processing device mechanism 61 is performed. That is, the substrate stage 31 stops at this position. In this state, the processing device mechanism 61 drives the moving device 63 to lower the processing member 62 toward the substrate 11 (arrow 65), presses the surface of the substrate 11 with the processing member 62, and further presses the substrate 11. In this state, the surface treatment can be performed by rubbing the surface of the substrate 11 by moving in the horizontal direction (arrow 66). Further, for processing the next substrate 11, the processing device mechanism 61 drives the moving device 63 to raise the processing member 62 (arrow 67), and then horizontally moves it toward the first position (arrow 68). ), The processing member 62 is moved to the original position and is put on standby. Thereafter, the substrate stage 31 moves toward the coating head 54, and during this movement, the substrate 11 is subjected to static electricity removal processing by the ionizer 55 and coating processing by the coating head 54.

  Also in such an embodiment, the same operational effects as those of the first embodiment can be obtained. Further, in the present embodiment, as described above, the processing member 62 can be moved up and down and moved in the horizontal direction to rub the surface of the substrate 11, so that efficient surface treatment of the substrate 11 is possible. is there. Instead of the processing member 62, the surface of the substrate 11 may be pressed and rubbed using the processing member 41 of the second embodiment.

  The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the invention.

  For example, in the first embodiment and the fourth embodiment, the surface of the substrate 11 is rubbed with the processing members 36 and 62 formed in a cylindrical shape, but the present invention is not limited to this, and the cylindrical processing is performed. The members 36 and 62 may be rolled on the surface of the substrate 11 so as to contact or press without rubbing the surface of the substrate 11. In this case, the processing members 36 and 62 may be supported by the holding members 37 and 63a so as to be rotatable around the central axis. In this case, it is possible to prevent damage such as scratches on the surface of the substrate 11 as compared with the case where the processing members 36 and 62 are rubbed on the surface of the substrate 11. This is effective when the surface of the material is easily damaged or hard.

  In the above embodiment, the solder bump forming device 10 is configured to store the substrate 11 in the substrate storage device 17 after the solder is reflowed by the reflow device 16, but is not limited thereto. A substrate cleaning device for cleaning the surface of the substrate 11 may be arranged after the reflow device 16. As described above, by providing the substrate cleaning apparatus, even when the organic pollutant cannot be completely eliminated by the heat treatment by the reflow apparatus 16, it can be removed by the cleaning process and manufactured. The quality of the solder bump forming substrate 11 can be further improved.

  Moreover, although the surface which contacts the board | substrate 11 in a process member shall be formed with the surface layer member of rubber | gum or resin, you may make it form with a brush-like member made of rubber | gum or resin.

  In addition, although the flux is used as the coating solution, the present invention is not limited to this, and any coating solution other than the flux is applicable.

  Moreover, the hole for an electrode as a coating area | region of the surface of the board | substrate 11 does not need to be a recessed part depressed with respect to the surface of the board | substrate 11, and the same surface may be sufficient, and the point is an electrode formation point. If it is good.

  In addition, the application region and the region including the application region, that is, the region to be processed by the processing member are the same as those of the substrate 11 such as the hole for an electrode and the surface of the substrate 11 in the above embodiment. It includes those positioned below the surface of the substrate 11 without having to be positioned on the surface. That is, the area including the application area may be any area including the application area in plan view.

  In addition, the processing by the processing member is performed on the surface of the substrate 11 around the hole for the electrode as the application region on the substrate. However, the present invention is not limited to this. For example, the surface is formed on the surface of the substrate. When forming an insulating film by applying an insulating material as a coating solution around a rectangular electrode, a processing member, for example, a processing member formed in the same size as the electrode portion in contact with the electrode portion May be brought into contact with the electrode portion and subjected to a liquid repellent treatment on the electrode surface. In short, it is only necessary to perform processing by the processing member on a portion of the surface of the substrate where it is not necessary to apply the coating liquid. In this case as well, it is not necessary to perform processing by the processing member over the entire area where the coating liquid does not need to be applied. For example, among the parts where the coating liquid does not need to be applied, such as a portion adjacent to the coating area. The processing member may perform the processing only on the portion where the coating liquid applied to the coating region is likely to wet and spread.

DESCRIPTION OF SYMBOLS 10 Solder bump formation apparatus 11 Substrate 12 Substrate supply apparatus 13 Coating apparatus 15 Solder ball mounting apparatus 16 Reflow apparatus 17 Substrate storage apparatus 20 Substrate processing apparatus 23, 24, 25, 26 Substrate transport apparatus 36 Processing member 37 Holding member

Claims (9)

A substrate processing apparatus for processing the substrate before performing a coating process on the surface of the substrate,
A treatment member whose surface is formed of rubber or resin;
A substrate processing apparatus comprising: a moving device that brings a surface of the processing member into contact with a portion of the surface of the substrate that does not require application of the coating liquid. A substrate processing apparatus for processing the substrate before performing a coating process on a coating region of the substrate,
A treatment member whose surface is formed of rubber or resin;
A substrate processing apparatus comprising: a moving device that brings a surface of the processing member into contact with an area including the application area of the substrate.   The substrate processing apparatus according to claim 2, wherein the moving device includes an elevating device that moves the processing member in a vertical direction and a horizontal moving device that moves the processing member in a horizontal direction. The processing member is formed such that a surface facing the substrate is formed larger than the region of the substrate.
The substrate processing apparatus according to claim 2, wherein the moving device is a lifting device that moves the processing member up and down in a vertical direction.   The said processing member has a surface layer member and the core member which is covered with this surface layer member, and has cushioning properties, The said surface layer member is formed with the said rubber | gum or resin, It is characterized by the above-mentioned. 4. The substrate processing apparatus according to any one of 4 above. A substrate processing method for processing a substrate before applying a coating liquid to a substrate application region,
A substrate processing method comprising a surface processing step of bringing a surface of a processing member whose surface is formed of rubber or resin into contact with an area including the application area on the surface of the substrate.   The substrate processing method according to claim 6, wherein in the surface treatment step, the processing member is moved along the region in a state where the surface of the processing member is in contact with the region of the substrate. A method of manufacturing a substrate by performing a coating process on a coating region on the surface of the substrate after the surface treatment of the substrate,
The method of manufacturing a substrate, wherein the surface treatment is a treatment in which the surface of a processing member whose surface is formed of rubber or resin is brought into contact with a region including the application region on the surface of the substrate.   9. The method of manufacturing a substrate according to claim 8, wherein in the surface treatment, the processing member is moved along the region in a state where the surface of the processing member is in contact with the region of the substrate. .

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