JP2011111600A - 可視光応答型光触媒コーティング材、コーティング処理物及びアレルゲン不活性化方法 - Google Patents
可視光応答型光触媒コーティング材、コーティング処理物及びアレルゲン不活性化方法 Download PDFInfo
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- JP2011111600A JP2011111600A JP2009272342A JP2009272342A JP2011111600A JP 2011111600 A JP2011111600 A JP 2011111600A JP 2009272342 A JP2009272342 A JP 2009272342A JP 2009272342 A JP2009272342 A JP 2009272342A JP 2011111600 A JP2011111600 A JP 2011111600A
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Classifications
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Abstract
【解決手段】可視光応答型光触媒コーティング材は、次の成分を含有する;価電子帯の電位が3V(vs.SHE,pH=0)以上である光半導体性を有する金属酸化物粒子の表面に銅二価塩が担持されてなる可視光活性を有する光触媒材料、シロキサン結合を有し或いは反応によりシロキサン結合を形成する成分を含むバインダー成分、及び塩素イオン化合物。コーティング膜に可視光が照射されると、銅二価イオンと塩素イオンの存在下で金属酸化物粒子の光触媒活性が発現することで、極めて高いアレルゲン不活性化作用が発現する。また、コーティング膜からの光触媒材料の脱落を防止することができる。
【選択図】なし
Description
また、バインダー成分の含有量は可視光応答型光触媒コーティング材の固形分質量に対して10〜70質量%の範囲が好ましい。この含有量が10質量%未満であれば可視光応答型光触媒コーティング材から形成されるコーティング膜の硬度や耐久性が不十分になってしまう可能性があり、70質量%より多いとコーティング膜中で光触媒材料の表面がバインダー成分で覆い隠されてしまうことで光触媒材料によるアレルゲンの不活性化作用が不十分になってしまう可能性がある。特にバインダー成分のうちシロキサン結合を有し或いは反応によりシロキサン結合を形成する成分の含有量はバインダー成分の固形分質量に対して10〜100質量%の範囲が好ましい。この含有量が10質量%未満であれば可視光応答型光触媒コーティング材から形成されるコーティング膜中で光触媒の酸化分解作用によってバインダー成分が分解されることによりコーティング膜の耐久性が低下してしまうおそれがある。
WO3粉末(平均粒径250nm、株式会社高純度化学研究所製)をフィルターに通して粒径1μm以上の粒子を除去した後、650℃で3時間焼成する前処理を行なうことによって、三酸化タングステン微粒子を得た。
ルチル型二酸化チタン(テイカ株式会社製のMT−150A)を蒸留水中に、この蒸留水に対する割合が10質量%になるように加えて懸濁させた。この懸濁液にCu(NO3)2・3H2O(和光純薬工業株式会社製)を、銅イオンのルチル型二酸化チタンに対する割合が0.1質量%になるように加え、攪拌しながら90℃に加熱して1時間保持した。次に、この懸濁液を吸引濾過した後に、残渣を蒸留水によって洗浄し、さらにこの残渣を110℃で加熱乾燥することによって、銅二価塩を担持したルチル型二酸化チタン微粒子を得た。
実施例1において、テトラエトキシシランの部分加水分解縮重合物を得る際に、濃度0.1mol/lのHCl水溶液0.07質量部に代えて、濃度0.1mol/lのHNO3水溶液0.07質量部を用い、可視光応答型光触媒コーティング材を得る際に塩化カリウム0.0005質量部を加えた。それ以外は実施例1と同じ方法により、可視光応答型光触媒コーティング材、及び評価サンプルである可視光応答型光触媒コーティング処理物を得た。
実施例1の場合と同じ方法で、銅二価塩担持三酸化タングステン微粒子分散液を得た。
アナターゼ型二酸化チタン(石原産業株式会社製のST−01)をアンモニア気流中(1SCCM)、550℃で3時間アニールすることによって、3V(vs.SHE,pH=0)未満の電位に孤立準位を有する窒素ドープ二酸化チタン微粒子を得た。
比較例1の場合と同じ方法で得られた窒素ドープ二酸化チタン微粒子を蒸留水中に、この蒸留水に対する割合が10質量%になるように加えて懸濁させた。この懸濁液にCu(NO3)2・3H2O(和光純薬工業株式会社製)を、銅イオンの窒素ドープ二酸化チタン微粒子に対する割合が0.1質量%になるように加え、攪拌しながら90℃に加熱して1時間保持した。次に、この懸濁液を吸引濾過した後に、残渣を蒸留水によって洗浄し、さらにこの残渣を110℃で加熱乾燥することによって、銅二価塩を担持した窒素ドープ二酸化チタン微粒子を得た。
反応容器中にテトラエトキシシラン(和光純薬工業株式会社製)を5質量部、イオン交換水を0.8質量部、濃度0.1mol/lのHCl水溶液0.07質量部、及びエタノール94.13質量部を混合し、16時間攪拌することで、テトラエトキシシランの部分加水分解縮重合物の溶液を得た。
WO3粉末(平均粒径250nm、株式会社高純度化学研究所製)をフィルターに通して粒径1μm以上の粒子を除去した後、650℃で3時間焼成する前処理を行なうことによって、三酸化タングステン微粒子を得た。
実施例1において、テトラエトキシシランの部分加水分解縮重合物を得る際に、濃度0.1mol/lのHCl水溶液0.07質量部に代えて、濃度0.1mol/lのHNO3水溶液0.07質量部を用いた。それ以外は実施例1と同じ方法により、可視光応答型光触媒コーティング材、及び評価サンプルである可視光応答型光触媒コーティング処理物を得た。
実施例1と同様にして、銅二価塩担持三酸化タングステン微粒子分散液を得た。
上記各実施例及び比較例で得られた評価サンプルについて、各種の性能評価を行った。以下に詳細を示す。
まず、前処理として、評価サンプルをバックサイズ3Lのテドラーバックの中に適当量の純空気と共に封入後、ブラックライト(Handy UV Lamp LUV−16 AS ONE製)から紫外線光を、評価サンプル表面の紫外線放射照度が1mW/cm2となるように24時間照射した。この評価サンプルを以下の評価試験に供した。
アレルゲン(アサヒビール製の精製ダニ抗原Derf 1)を緩衝液(タカラバイオ製の生化学用緩衝液20X PBS Tween-20 Bufferを超純水で20倍に希釈したもの)に加えて濃度33.3ng/Lのアレルゲン液を調製し、このアレルゲン液0.4mlを評価用サンプル上に滴下した後、この評価用サンプルを40mm角のフィルムで被覆した。
JISK5600−5−4に従う鉛筆法により、評価サンプル表面のコーティング膜の硬度を測定した。
JISK5600−7−7に従う促進耐候性(キセノンランプ法)により、評価サンプル表面のコーティング膜の耐候性を評価した。なお、室内で使用される条件を想定して、試験板の湿潤を行わないサイクルC試験を行った。50時間の連続暴露試験後に評価サンプルの外観を目視にて観察し、以下の基準に基づいてコーティング膜の耐候性を評価した。
○:耐候性試験前と外観に変化なし。
×:耐候性試験前と外観に明らかに変化あり。
Claims (6)
- 次の成分を含有することを特徴とする可視光応答型光触媒コーティング材;
価電子帯の電位が3V(vs.SHE,pH=0)以上である光半導体性を有する金属酸化物粒子の表面に銅二価塩が担持されてなる可視光活性を有する光触媒材料、
シロキサン結合を有し或いは反応によりシロキサン結合を形成する成分を含むバインダー成分、及び
塩素イオン化合物。 - 請求項1において、前記金属酸化物粒子が、二酸化チタン、三酸化タングステン及び金属イオンがドープされた二酸化チタンから選択される少なくとも一種の粒子を含む可視光応答型光触媒コーティング材。
- 請求項1又は2において、前記バインダー成分が、一般式Si(OR)4(ただし、Rは同一または異種の炭素数1〜8の炭化水素基またはフェニル基)で表されるテトラアルコキシシランと、その部分加水分解縮重合物のうち、少なくとも一方を含む可視光応答型光触媒コーティング材。
- 請求項1乃至3のいずれか一項において、前記塩素イオン化合物が塩酸を含む可視光応答型光触媒コーティング材。
- 請求項1乃至4のいずれか一項に記載の可視光応答型光触媒コーティング材によるコーティング処理が施されていることを特徴とするコーティング処理物。
- 請求項5に記載のコーティング処理物のコーティング処理が施されている表面に可視光応答型光触媒を励起する波長を含む可視光を照射することで、前記表面上のアレルゲンを不活性化させることを特徴とするアレルゲン不活性化方法。
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JP2009272342A JP5567828B2 (ja) | 2009-11-30 | 2009-11-30 | 可視光応答型光触媒コーティング材、コーティング処理物及びアレルゲン不活性化方法 |
US13/512,379 US9138734B2 (en) | 2009-11-30 | 2010-08-26 | Visible light-responsive photocatalyst coating material, coated article, allergen inactivation method |
KR1020127015962A KR20120086355A (ko) | 2009-11-30 | 2010-08-26 | 가시광 응답형 광촉매 코팅 재료, 코팅 처리물 및 알레르겐 불활성화 방법 |
EP10832925.1A EP2508578A4 (en) | 2009-11-30 | 2010-08-26 | VISIBLE PHOTO CATALYST COATING MATERIAL, COATED ARTICLE AND ALLERGENIC ACTIVATION METHOD |
PCT/JP2010/064445 WO2011065078A1 (ja) | 2009-11-30 | 2010-08-26 | 可視光応答型光触媒コーティング材、コーティング処理物及びアレルゲン不活性化方法 |
CN201080053835.3A CN102648256B (zh) | 2009-11-30 | 2010-08-26 | 可见光响应型光催化剂涂覆材料、涂覆制品、使变应原失活的方法 |
KR1020147015717A KR101550233B1 (ko) | 2009-11-30 | 2010-08-26 | 가시광 응답형 광촉매 코팅 재료, 코팅 처리물 및 알레르겐 불활성화 방법 |
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JP2013155095A (ja) * | 2012-01-31 | 2013-08-15 | National Institute For Materials Science | 光照射による酸素生成方法 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0867835A (ja) * | 1994-08-31 | 1996-03-12 | Matsushita Electric Works Ltd | 抗菌性無機塗料 |
JP2000051708A (ja) * | 1998-08-10 | 2000-02-22 | Showa Alum Corp | 光触媒皮膜およびその形成方法 |
JP2006232729A (ja) * | 2005-02-24 | 2006-09-07 | Taki Chem Co Ltd | ファージ・ウイルスの不活性化剤及び水溶性塗料 |
WO2009116627A1 (ja) * | 2008-03-21 | 2009-09-24 | 国立大学法人東京大学 | 光触媒材料、有機物分解方法、内装部材、空気清浄装置、酸化剤製造装置 |
WO2010050548A1 (ja) * | 2008-10-30 | 2010-05-06 | 国立大学法人東京大学 | 光触媒材料、有機物分解方法、内装部材、空気清浄装置、酸化剤製造装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1112539A (ja) * | 1997-06-20 | 1999-01-19 | Nippon Parkerizing Co Ltd | 機能性塗料組成物、および機能性塗膜の形成方法 |
JP2000095977A (ja) * | 1998-09-22 | 2000-04-04 | Toto Ltd | 抗菌性光触媒性塗料および抗菌性光触媒性部材 |
JP3601532B2 (ja) | 1999-08-05 | 2004-12-15 | 株式会社豊田中央研究所 | 光触媒物質、光触媒体およびこれらの製造方法 |
US20050126428A1 (en) * | 2001-04-25 | 2005-06-16 | Tai-Kyu Lee | Photocatalytic coating material having photocatalytic activity and adsorption property and method for preparing the same |
JP4110279B2 (ja) * | 2004-02-02 | 2008-07-02 | 昭和電工株式会社 | 光触媒皮膜を塗布した基材および光触媒皮膜を基材上に形成する方法 |
JP4880410B2 (ja) | 2006-09-28 | 2012-02-22 | 多木化学株式会社 | 光触媒コーティング組成物が被覆された部材 |
-
2009
- 2009-11-30 JP JP2009272342A patent/JP5567828B2/ja active Active
-
2010
- 2010-08-26 US US13/512,379 patent/US9138734B2/en not_active Expired - Fee Related
- 2010-08-26 KR KR1020147015717A patent/KR101550233B1/ko not_active IP Right Cessation
- 2010-08-26 WO PCT/JP2010/064445 patent/WO2011065078A1/ja active Application Filing
- 2010-08-26 KR KR1020127015962A patent/KR20120086355A/ko active Application Filing
- 2010-08-26 CN CN201080053835.3A patent/CN102648256B/zh not_active Expired - Fee Related
- 2010-08-26 EP EP10832925.1A patent/EP2508578A4/en not_active Withdrawn
- 2010-08-30 TW TW099129109A patent/TWI418404B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0867835A (ja) * | 1994-08-31 | 1996-03-12 | Matsushita Electric Works Ltd | 抗菌性無機塗料 |
JP2000051708A (ja) * | 1998-08-10 | 2000-02-22 | Showa Alum Corp | 光触媒皮膜およびその形成方法 |
JP2006232729A (ja) * | 2005-02-24 | 2006-09-07 | Taki Chem Co Ltd | ファージ・ウイルスの不活性化剤及び水溶性塗料 |
WO2009116627A1 (ja) * | 2008-03-21 | 2009-09-24 | 国立大学法人東京大学 | 光触媒材料、有機物分解方法、内装部材、空気清浄装置、酸化剤製造装置 |
WO2010050548A1 (ja) * | 2008-10-30 | 2010-05-06 | 国立大学法人東京大学 | 光触媒材料、有機物分解方法、内装部材、空気清浄装置、酸化剤製造装置 |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013002151A1 (ja) * | 2011-06-27 | 2013-01-03 | 昭和電工株式会社 | 銅化合物担持酸化チタン光触媒及びその製造方法 |
JP5129897B1 (ja) * | 2011-06-27 | 2013-01-30 | 昭和電工株式会社 | 銅化合物担持酸化チタン光触媒及びその製造方法 |
CN103228358A (zh) * | 2011-06-27 | 2013-07-31 | 昭和电工株式会社 | 担载有铜化合物的氧化钛光催化剂和其制造方法 |
US9248432B2 (en) | 2011-06-27 | 2016-02-02 | The University Of Tokyo | Titanium oxide photocatalyst having copper compounds supported thereon, and method for producing same |
WO2013038705A1 (ja) * | 2011-09-14 | 2013-03-21 | 日本板硝子株式会社 | 抗ウイルス性薄膜つき基材 |
JPWO2013038705A1 (ja) * | 2011-09-14 | 2015-03-23 | 日本板硝子株式会社 | 抗ウイルス性薄膜つき基材 |
WO2013038949A1 (ja) * | 2011-09-16 | 2013-03-21 | 住化エンビロサイエンス株式会社 | 抗アレルゲン組成物 |
JP2013064058A (ja) * | 2011-09-16 | 2013-04-11 | Sumika Enviro-Science Co Ltd | 抗アレルゲン組成物 |
JP2013155095A (ja) * | 2012-01-31 | 2013-08-15 | National Institute For Materials Science | 光照射による酸素生成方法 |
JP2013242254A (ja) * | 2012-05-22 | 2013-12-05 | Sumika Enviro-Science Co Ltd | アレルゲン低減化機能の評価方法 |
TWI506189B (zh) * | 2012-07-05 | 2015-11-01 | Tai Cheng Lee | Wave plate and wave plate module |
US10051859B2 (en) | 2012-08-10 | 2018-08-21 | Tsukasa Sakurada | Sterilizing agents, their method of manufacture and uses |
US11033026B2 (en) | 2012-08-10 | 2021-06-15 | Tsukasa Sakurada | Sterilizing agents, their method of manufacture and uses |
WO2014112345A1 (ja) * | 2013-01-16 | 2014-07-24 | 日本板硝子株式会社 | 抗ウイルス性薄膜つき基材 |
JP5955984B2 (ja) * | 2013-01-16 | 2016-07-20 | 日本板硝子株式会社 | 抗ウイルス性薄膜つき基材 |
JPWO2014112345A1 (ja) * | 2013-01-16 | 2017-01-19 | 日本板硝子株式会社 | 抗ウイルス性薄膜つき基材 |
JP2016137463A (ja) * | 2015-01-28 | 2016-08-04 | シャープ株式会社 | 光触媒材料 |
JP2017000655A (ja) * | 2015-06-16 | 2017-01-05 | 日本板硝子株式会社 | 抗ウイルス性薄膜つき基材 |
KR101917149B1 (ko) | 2018-05-17 | 2018-11-09 | 주식회사 대수하이테크 | 내후성이 우수한 방오성 코팅조성물 |
JP2019069450A (ja) * | 2019-02-18 | 2019-05-09 | シャープ株式会社 | 光触媒材料 |
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US20120237396A1 (en) | 2012-09-20 |
CN102648256A (zh) | 2012-08-22 |
TWI418404B (zh) | 2013-12-11 |
KR101550233B1 (ko) | 2015-09-07 |
WO2011065078A1 (ja) | 2011-06-03 |
KR20120086355A (ko) | 2012-08-02 |
CN102648256B (zh) | 2015-02-11 |
KR20140092393A (ko) | 2014-07-23 |
US9138734B2 (en) | 2015-09-22 |
JP5567828B2 (ja) | 2014-08-06 |
TW201127489A (en) | 2011-08-16 |
EP2508578A4 (en) | 2013-07-17 |
EP2508578A1 (en) | 2012-10-10 |
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