JP2005060794A - Functional aluminum building material - Google Patents
Functional aluminum building material Download PDFInfo
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- JP2005060794A JP2005060794A JP2003294379A JP2003294379A JP2005060794A JP 2005060794 A JP2005060794 A JP 2005060794A JP 2003294379 A JP2003294379 A JP 2003294379A JP 2003294379 A JP2003294379 A JP 2003294379A JP 2005060794 A JP2005060794 A JP 2005060794A
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- building material
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- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 99
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 99
- 239000004566 building material Substances 0.000 title claims abstract description 88
- 239000011941 photocatalyst Substances 0.000 claims abstract description 273
- 239000011230 binding agent Substances 0.000 claims abstract description 57
- 239000011248 coating agent Substances 0.000 claims abstract description 53
- 238000000576 coating method Methods 0.000 claims abstract description 53
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 135
- 229920001296 polysiloxane Polymers 0.000 claims description 91
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 71
- 239000000203 mixture Substances 0.000 claims description 67
- 239000002245 particle Substances 0.000 claims description 64
- 125000000217 alkyl group Chemical group 0.000 claims description 63
- 150000001875 compounds Chemical class 0.000 claims description 52
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 29
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 28
- 230000001699 photocatalysis Effects 0.000 claims description 27
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 25
- 150000003377 silicon compounds Chemical class 0.000 claims description 25
- 125000003342 alkenyl group Chemical group 0.000 claims description 23
- 239000003607 modifier Substances 0.000 claims description 21
- 125000003545 alkoxy group Chemical group 0.000 claims description 19
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- 229910000838 Al alloy Inorganic materials 0.000 claims description 14
- 125000002344 aminooxy group Chemical group [H]N([H])O[*] 0.000 claims description 14
- 125000004423 acyloxy group Chemical group 0.000 claims description 13
- 125000005843 halogen group Chemical group 0.000 claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims description 11
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 claims description 11
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims description 10
- 125000003544 oxime group Chemical group 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 6
- 238000005191 phase separation Methods 0.000 claims description 6
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims description 6
- 125000004122 cyclic group Chemical group 0.000 claims description 4
- 150000002923 oximes Chemical class 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims 1
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 23
- 230000003373 anti-fouling effect Effects 0.000 abstract description 13
- 241000894006 Bacteria Species 0.000 abstract description 6
- 230000000855 fungicidal effect Effects 0.000 abstract description 3
- 241000233866 Fungi Species 0.000 abstract description 2
- 238000011109 contamination Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 44
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 35
- 238000012360 testing method Methods 0.000 description 33
- -1 BiVO 4 Inorganic materials 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 26
- 229920005989 resin Polymers 0.000 description 25
- 239000011347 resin Substances 0.000 description 25
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 239000003054 catalyst Substances 0.000 description 19
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 19
- 239000000126 substance Substances 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 18
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- 230000000843 anti-fungal effect Effects 0.000 description 12
- 230000000694 effects Effects 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- 239000011164 primary particle Substances 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 230000009471 action Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
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- 239000006185 dispersion Substances 0.000 description 8
- 239000002612 dispersion medium Substances 0.000 description 8
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
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- 230000002829 reductive effect Effects 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 6
- 238000009833 condensation Methods 0.000 description 6
- 230000005494 condensation Effects 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000006356 dehydrogenation reaction Methods 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 6
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 5
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- 230000009102 absorption Effects 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 235000019504 cigarettes Nutrition 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000006482 condensation reaction Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
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- 150000003058 platinum compounds Chemical class 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 150000004756 silanes Chemical class 0.000 description 5
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 229940121375 antifungal agent Drugs 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
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- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- SWGZAKPJNWCPRY-UHFFFAOYSA-N methyl-bis(trimethylsilyloxy)silicon Chemical compound C[Si](C)(C)O[Si](C)O[Si](C)(C)C SWGZAKPJNWCPRY-UHFFFAOYSA-N 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
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- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 3
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- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 125000002339 acetoacetyl group Chemical group O=C([*])C([H])([H])C(=O)C([H])([H])[H] 0.000 description 2
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- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
- 238000007540 photo-reduction reaction Methods 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920006294 polydialkylsiloxane Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920012287 polyphenylene sulfone Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000001965 potato dextrose agar Substances 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000005464 sample preparation method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000008279 sol Substances 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical compound C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- UTADZBVVSYSYTG-UHFFFAOYSA-N tert-butyl(methyl)silane Chemical compound C[SiH2]C(C)(C)C UTADZBVVSYSYTG-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- DHMBAQQIVDNJQY-UHFFFAOYSA-N triethyl-[ethyl(triethylsilyloxy)silyl]oxysilane Chemical compound CC[Si](CC)(CC)O[SiH](CC)O[Si](CC)(CC)CC DHMBAQQIVDNJQY-UHFFFAOYSA-N 0.000 description 1
- ISPSHPOFLYFIRR-UHFFFAOYSA-N trihexylsilicon Chemical compound CCCCCC[Si](CCCCCC)CCCCCC ISPSHPOFLYFIRR-UHFFFAOYSA-N 0.000 description 1
- IXSPLXSQNNZJJU-UHFFFAOYSA-N trimethyl(silyloxy)silane Chemical compound C[Si](C)(C)O[SiH3] IXSPLXSQNNZJJU-UHFFFAOYSA-N 0.000 description 1
- MVDKZIOZIWKNCP-UHFFFAOYSA-N trimethyl-[phenyl(trimethylsilyloxy)silyl]oxysilane Chemical compound C[Si](C)(C)O[SiH](O[Si](C)(C)C)C1=CC=CC=C1 MVDKZIOZIWKNCP-UHFFFAOYSA-N 0.000 description 1
- YBSONWFCMKTZDG-UHFFFAOYSA-N trimethyl-[propan-2-yl(trimethylsilyloxy)silyl]oxysilane Chemical compound CC(C)[SiH](O[Si](C)(C)C)O[Si](C)(C)C YBSONWFCMKTZDG-UHFFFAOYSA-N 0.000 description 1
- PMFSLPPNQCIHBT-UHFFFAOYSA-N trimethyl-[propyl(trimethylsilyloxy)silyl]oxysilane Chemical compound CCC[SiH](O[Si](C)(C)C)O[Si](C)(C)C PMFSLPPNQCIHBT-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- MMYRBBZVCDXGHG-UHFFFAOYSA-N tripropylsilicon Chemical compound CCC[Si](CCC)CCC MMYRBBZVCDXGHG-UHFFFAOYSA-N 0.000 description 1
- XAASNKQYFKTYTR-UHFFFAOYSA-N tris(trimethylsilyloxy)silicon Chemical compound C[Si](C)(C)O[Si](O[Si](C)(C)C)O[Si](C)(C)C XAASNKQYFKTYTR-UHFFFAOYSA-N 0.000 description 1
- ZQTYRTSKQFQYPQ-UHFFFAOYSA-N trisiloxane Chemical compound [SiH3]O[SiH2]O[SiH3] ZQTYRTSKQFQYPQ-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Catalysts (AREA)
Abstract
Description
本発明は、簡便にコーティングでき、抗菌、防カビ性に優れ、光触媒作用により悪臭や、汚れが壁面等に浸透してしまうまでにその原因物質を分解し、セルフクリーニング性を有する機能性アルミニウム建材を提供することが可能な、機能性アルミニウム建材用光触媒被覆組成物、およびこれにより得られる機能性アルミニウム建材に関する。 The present invention is a functional aluminum building material that can be easily coated, has excellent antibacterial and antifungal properties, decomposes the causative substances by the photocatalytic action and penetrates the walls and the like, and has self-cleaning properties It is related with the photocatalyst coating composition for functional aluminum building materials which can provide, and the functional aluminum building material obtained by this.
酸化チタンに代表される光触媒作用を有する半導体微粒子が、その光触媒作用により有機物の分解を行い、その作用に基づき抗菌・防黴・防汚・防臭作用を有することは従来から知られており、最近ではそれらを利用して、細菌や黴が繁殖しにくい様々な材料が研究、開発されている。例えば、特開平2?6333号公報には酸化チタンの粒子表面に銅、亜鉛等の抗菌性金属を担持させた抗菌性粉末について開示されており、この粉末を樹脂、ゴム、ガラス等に配合することによって抗菌性組成物が得られ、また、公知の方法により、電機機器、家具調度品、室内装飾材、食品等の包装資材などに対する抗菌性処理のほか、環境衛生施設、機器類の抗菌剤として上記粉末を利用できると教示している。たとえば、特開平6?65012号公報には、銀、銅、亜鉛、白金等の金属を含有した酸化チタン膜をコンクリート、ガラス、プラスチック、セラミックス、金属等の材質からなる基板にコーティングすることによって、該基板において雑菌及び黴の繁殖を防止できる旨が開示されている。さらに例えば、特開平4?307066号公報には、パネルの裏面に光触媒を付設し、該パネルの裏側に短波長ランプを配置し、このランプから光触媒へ紫外線照射することによって、光触媒を活性化し、パネルが設置された室内の脱臭を図るという室内空気のリフレッシュ法が開示されている。しかしながら、アルミニウム又はアルミニウム合金(以下、アルミ合金という)製の建築部材、例えばパネル材上に酸化チタン等の光触媒をコーティングすると、光触媒の強い酸化還元作用によってパネル表面が腐食(酸化)され易いという問題がある。また、アルミ合金基材と光触媒の充分な密着性が得られず、コーティングした光触媒の膜が剥離し易いという問題がある。また、複雑な形状を有する建材上に均一に光触媒をコーティングすることは困難であり、さらに、通常、光触媒をコーティングする場合、200℃を超える温度に基材を加熱する必要があり、このような温度にアルミ合金をさらすとアルミ合金の強度が著しく低下してしまうといった問題がある。 It has been known that semiconductor fine particles having a photocatalytic action represented by titanium oxide have an antibacterial / antifungal / antifouling / deodorizing action based on the action of organic matter decomposition by the photocatalytic action. Then, using these materials, various materials that are difficult for bacteria and pupae to grow are being researched and developed. For example, Japanese Patent Application Laid-Open No. 2-6333 discloses an antibacterial powder in which an antibacterial metal such as copper or zinc is supported on the surface of titanium oxide particles, and this powder is blended with resin, rubber, glass or the like. In addition to antibacterial treatment of electrical equipment, furniture furniture, interior decoration materials, packaging materials such as food, etc. by known methods, antibacterial agents for environmental hygiene facilities and equipment Teaches that the above powder can be used. For example, in JP-A-6-65012, a titanium oxide film containing a metal such as silver, copper, zinc, or platinum is coated on a substrate made of a material such as concrete, glass, plastic, ceramics, or metal, It is disclosed that it is possible to prevent the propagation of germs and sputum on the substrate. Further, for example, in Japanese Patent Laid-Open No. 4-307066, a photocatalyst is attached to the back side of the panel, a short wavelength lamp is disposed on the back side of the panel, and the photocatalyst is activated by irradiating the photocatalyst with ultraviolet rays. A refreshing method for indoor air that attempts to deodorize a room where a panel is installed is disclosed. However, when a photocatalyst such as titanium oxide is coated on a building member made of aluminum or an aluminum alloy (hereinafter referred to as aluminum alloy), for example, a panel material, the panel surface is easily corroded (oxidized) by the strong redox action of the photocatalyst. There is. Further, there is a problem that sufficient adhesion between the aluminum alloy substrate and the photocatalyst cannot be obtained, and the coated photocatalyst film is easily peeled off. In addition, it is difficult to uniformly coat a photocatalyst on a building material having a complicated shape, and usually, when coating a photocatalyst, it is necessary to heat the substrate to a temperature exceeding 200 ° C. When the aluminum alloy is exposed to temperature, there is a problem that the strength of the aluminum alloy is significantly reduced.
これらの問題を解決するべく、例えば特開平8−302498号公報には、アルミニウム又はアルミニウム合金からなる基材の表面に陽極酸化皮膜を形成し、さらに該陽極酸化皮膜上に光触媒作用を有する半導体微粒子を含有もしくは担持した塗膜が形成されてなる建築材料が提案されている。本発明によれば、確かに、基材の表面に形成された陽極酸化皮膜はその上に形成される光触媒作用を有する半導体粒子を含有もしくは担持する塗膜との密着性を向上するが、光触媒を有する半導体微粒子の光酸化機能によるバインダー塗料の劣化といった問題は解決されていない。 In order to solve these problems, for example, Japanese Patent Application Laid-Open No. 8-302498 discloses a semiconductor fine particle in which an anodized film is formed on the surface of a base material made of aluminum or an aluminum alloy, and further has a photocatalytic action on the anodized film. There has been proposed a building material in which a coating film containing or carrying is formed. According to the present invention, the anodic oxide film formed on the surface of the base material certainly improves the adhesion with the coating film containing or carrying the semiconductor particles having photocatalytic action formed thereon, The problem of the deterioration of the binder paint due to the photo-oxidation function of the semiconductor fine particles having the above has not been solved.
上述した理由により、かねてよりセルフクリーニング性を有し、特別の装置を要することなくメンテナンスフリーであり、しかも抗菌・防黴性の膜がアルミニウムあるいはアルミニウム合金基材表面を腐食することなくかつ高い密着強度で光触媒がコーティングされた抗菌・防黴性のアルミニウム建材が切望されていた。
従って、本発明の目的は、上記のような問題を解決し、特別の装置を要することなくメンテナンスフリーであり、しかも光触媒含有皮膜がアルミニウムあるいはアルミニウム合金基材表面を腐食することなくかつ高い密着強度で付着した抗菌、防黴性、防汚性等の光触媒活性を有するアルミニウム建材を提供することにある。 Accordingly, the object of the present invention is to solve the above-mentioned problems, maintenance-free without the need for special equipment, and the photocatalyst-containing film does not corrode the aluminum or aluminum alloy substrate surface and has high adhesion strength. The object is to provide an aluminum building material having photocatalytic activity such as antibacterial, antifungal and antifouling properties adhered in
本発明者らは上記課題を解決すべく鋭意検討した結果、本発明に到達した。すなわち、本発明は以下の通りである。
1.光触媒(a)及びバインダー成分(B)を含む皮膜を備えたアルミニウム建材であって、該皮膜中における光触媒(a)の濃度がアルミニウム又はアルミニウム合金基材に接する面から露出面に向かって高くなることを特徴とする機能性アルミニウム建材。
2.光触媒(a)及びバインダー成分(B)を含む皮膜を備えたアルミニウム建材であって、該皮膜中における光触媒(a)の濃度がアルミニウム又はアルミニウム合金基材上に形成された陽極酸化皮膜に接する面から露出面に向かって高くなることを特徴とする機能性アルミニウム建材。
3.該皮膜が、光触媒(a)及びバインダー成分(B)を含む光触媒組成物(C)から形成されることを特徴とする発明1または2のいずれかに記載の機能性アルミニウム建材。
As a result of intensive studies to solve the above problems, the present inventors have reached the present invention. That is, the present invention is as follows.
1. An aluminum building material provided with a coating containing a photocatalyst (a) and a binder component (B), wherein the concentration of the photocatalyst (a) in the coating increases from the surface in contact with the aluminum or aluminum alloy substrate toward the exposed surface. This is a functional aluminum building material.
2. An aluminum building material provided with a film containing a photocatalyst (a) and a binder component (B), wherein the concentration of the photocatalyst (a) in the film is in contact with the anodized film formed on the aluminum or aluminum alloy substrate Functional aluminum building material characterized in that it becomes higher toward the exposed surface.
3. 3. The functional aluminum building material according to claim 1, wherein the film is formed from a photocatalyst composition (C) containing a photocatalyst (a) and a binder component (B).
4.該光触媒(a)が、式(1)で表されるトリオルガノシラン単位、式(2)で表されるモノオキシジオルガノシラン単位、式(3)で表されるジオキシオルガノシラン単位、及びフッ化メチレン(−CF2−)単位よりなる群から選ばれる少なくとも1種の構造単位を有する化合物類よりなる群から選ばれる少なくとも1種の変性剤化合物(b)で変性された変性光触媒(A)であることを特徴とする発明1〜3のいずれかに記載の機能性アルミニウム建材。
R3Si− (1)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す)
−(R2SiO)− (2)
(式中、Rは式(1)で定義した通りである。)
4). The photocatalyst (a) is a triorganosilane unit represented by the formula (1), a monooxydiorganosilane unit represented by the formula (2), a dioxyorganosilane unit represented by the formula (3), and Modified photocatalyst (A) modified with at least one modifier compound (b) selected from the group consisting of compounds having at least one structural unit selected from the group consisting of methylene fluoride (—CF 2 —) units The functional aluminum building material according to any one of the inventions 1 to 3, wherein:
R 3 Si- (1)
(In the formula, each R is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 1 to 30 carbon atoms. A fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group)
- (R 2 SiO) - ( 2)
(In the formula, R is as defined in formula (1).)
(式中、Rは式(1)で定義した通りである。)
5.該バインダー成分(B)が、下記式(4)で表されるフェニル基含有シリコーン(BP)を含有することを特徴とする発明1〜4のいずれかに記載の機能性アルミニウム建材。
R1 pR2 qXrSiO(4−p−q−r)/2 (4)
(式中、各R1はフェニル基を表し、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。
そしてp、q及びrは、0<p<4、0≦q<4、0≦r<4、及び0<(p+q+r)<4であり、そして0.05≦p/(p+q)≦1である。)
(In the formula, R is as defined in formula (1).)
5). The functional aluminum building material according to any one of inventions 1 to 4, wherein the binder component (B) contains a phenyl group-containing silicone (BP) represented by the following formula (4).
R 1 p R 2 q X r SiO (4-p-q-r) / 2 (4)
(In the formula, each R 1 represents a phenyl group, and each R 2 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or Represents a branched alkenyl group having 2 to 30 carbon atoms, each X independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, or 1 carbon atom; Represents -20 oxime groups and halogen atoms.
And p, q, and r are 0 <p <4, 0 ≦ q <4, 0 ≦ r <4, and 0 <(p + q + r) <4, and 0.05 ≦ p / (p + q) ≦ 1 is there. )
6.該フェニル基含有シリコーン(BP)が、下記式(5)で表される、アルキル基を含有しないフェニル基含有シリコーン(BP1)であることを特徴とする発明5に記載の機能性アルミニウム建材。
R1 sXtSiO(4−s−t)/2 (5)
(式中、R1はフェニル基を表し、Xは各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。s及びtは、0<s<4、0≦t<4、そして0<(s+t)<4である。)
6). The functional aluminum building material according to invention 5, wherein the phenyl group-containing silicone (BP) is a phenyl group-containing silicone (BP1) not containing an alkyl group, represented by the following formula (5).
R 1 s X t SiO (4 -s-t) / 2 (5)
(In the formula, R 1 represents a phenyl group, and each X independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, or an oxime group having 1 to 20 carbon atoms. And s and t are 0 <s <4, 0 ≦ t <4, and 0 <(s + t) <4.
7.該バインダー成分(B)が、下記式(6)で表されるアルキル基含有シリコーン(BA)を更に含有することを特徴とする発明5または6のいずれかに記載の機能性アルミニウム建材。
R2 uXvSiO(4−u−v)/2 (6)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表しす。そしてu及びvは、0<u<4、0≦v<4、そして0<(u+v)<4である。)
7). The functional aluminum building material according to any one of inventions 5 and 6, wherein the binder component (B) further contains an alkyl group-containing silicone (BA) represented by the following formula (6).
R 2 u X v SiO (4-uv) / 2 (6)
(In the formula, each R 2 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Each independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, an oxime group having 1 to 20 carbon atoms, or a halogen atom. And u and v are 0 <u <4, 0 ≦ v <4, and 0 <(u + v) <4.)
8.該バインダー成分(B)が、式(5)で表される、アルキル基を含有しないフェニル基含有シリコーン(BP1)と式(6)で表されるアルキル基含有シリコーン(BA)を含有することを特徴とする発明1〜4のいずれかに記載の機能性アルミニウム建材。
R1 sXtSiO(4−s−t)/2 (5)
(式中、R1はフェニル基を表し、Xは各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。s及びtは、0<s<4、0≦t<4、そして0<(s+t)<4である。)
R2 uXvSiO(4−u−v)/2 (6)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。u及びvは、0<u<4、0≦v<4、そして0<(u+v)<4である。)
8). The binder component (B) contains a phenyl group-containing silicone (BP1) not containing an alkyl group represented by formula (5) and an alkyl group-containing silicone (BA) represented by formula (6). The functional aluminum building material according to any one of inventions 1 to 4, which is characterized by the above.
R 1 s X t SiO (4 -s-t) / 2 (5)
(Wherein, R 1 represents a phenyl group, and each X independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, or an oxime having 1 to 20 carbon atoms. Group represents a halogen atom, s and t are 0 <s <4, 0 ≦ t <4, and 0 <(s + t) <4.
R 2 u X v SiO (4-uv) / 2 (6)
(In the formula, each R 2 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Each independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, an oxime group having 1 to 20 carbon atoms, or a halogen atom. U and v are 0 <u <4, 0 ≦ v <4, and 0 <(u + v) <4.)
9.該アルキル基含有シリコーン(BA)が、式(7)で表されるモノオキシジオルガノシラン単位(D)と式(8)で表されるジオキシオルガノシラン単位(T)を有することを特徴とする発明7または8に記載の機能性アルミニウム建材。
−(R2 2SiO)− (7)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。
9. The alkyl group-containing silicone (BA) has a monooxydiorganosilane unit (D) represented by the formula (7) and a dioxyorganosilane unit (T) represented by the formula (8). The functional aluminum building material as described in invention 7 or 8.
— (R 2 2 SiO) — (7)
(In the formula, each R 2 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Represents an alkenyl group.
(式中、R2は式(7)で定義した通りである。)
10.該フェニル基含有シリコーン(BP)と該アルキル基含有シリコーン(BA)について相分離構造を有する皮膜であることを特徴とする発明7〜9のいずれかに記載の機能性アルミニウム建材。
11.光触媒(a)が該アルキル基含有シリコーン(BA)相に存在することを特徴とする発明10に記載の機能性アルミニウム建材。
12.該変性光触媒(A)の数平均粒子径が400nm以下であることを特徴とする発明4に記載の機能性アルミニウム建材。
(Wherein R 2 is as defined in formula (7).)
10. The functional aluminum building material according to any one of inventions 7 to 9, which is a film having a phase separation structure for the phenyl group-containing silicone (BP) and the alkyl group-containing silicone (BA).
11. The functional aluminum building material according to invention 10, wherein the photocatalyst (a) is present in the alkyl group-containing silicone (BA) phase.
12 The functional aluminum building material according to invention 4, wherein the number average particle size of the modified photocatalyst (A) is 400 nm or less.
13.該変性剤化合物(b)が、式(9)で表されるSi−H基含有ケイ素化合物(b1)であることを特徴とする発明4に記載の機能性アルミニウム建材。
HxRySiO(4−x−y)/2 (9)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。x及びyは、0<x<4、0<y<4であり、そして(x+y)≦4である。)
13. The functional aluminum building material according to invention 4, wherein the modifier compound (b) is a Si-H group-containing silicon compound (b1) represented by the formula (9).
H x R y SiO (4-xy) / 2 (9)
(In the formula, each R is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 1 to 30 carbon atoms. A fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group, where x and y are 0 <x <4, 0 <Y <4 and (x + y) ≦ 4.)
14.該Si−H基含有ケイ素化合物(b1)が、式(10)で表されるモノSi−H基含有化合物、式(11)で表される両末端Si−H基含有化合物、式(12)で表されるHシリコーンよりなる群から選ばれる少なくとも1種の化合物であることを特徴とする発明13に記載の機能性アルミニウム建材。 14 The Si-H group-containing silicon compound (b1) is a mono-Si-H group-containing compound represented by the formula (10), a Si-H group-containing compound represented by the formula (11), a formula (12) The functional aluminum building material according to invention 13, which is at least one compound selected from the group consisting of H silicones represented by:
(式中、R3は各々独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、フェニル基、又は式(13)で表されるシロキシ基を表す。
−O−(R4 2SiO)m−SiR4 3 ・・・(13)
(式中、R4はそれぞれ独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数が1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、又はフェニル基を表す。また、mは整数であり、0≦m≦1000である。))
H−(R3 2SiO)n−SiR3 2−H ・・・(11)
(式中、R3は式(10)で定義した通りである。nは整数であり、0≦n≦1000である。)
(R3HSiO)a(R3 2SiO)b(R3 3SiO1/2)c ・・・(12)
(式中、R3は式(10)で定義した通りである。aは1以上の整数であり、bは0以上の整数であり、(a+b)≦10000であり、そしてcは0又は2である。但し、(a+b)が2以上の整数であり且つc=0の場合、式(12)の該Hシリコーンは環状シリコーンであり、c=2の場合、式(12)の該Hシリコーンは鎖状シリコーンである。)
(In the formula, each R 3 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a linear or branched alkenyl group having 2 to 30 carbon atoms, or a carbon number of 5 to 20). A cycloalkyl group, a linear or branched fluoroalkyl group having 1 to 30 carbon atoms, a phenyl group, or a siloxy group represented by the formula (13).
—O— (R 4 2 SiO) m —SiR 4 3 (13)
(In the formula, each R 4 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon number of 1 to 1. 30 represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, or a phenyl group, and m is an integer and 0 ≦ m ≦ 1000.)
H— (R 3 2 SiO) n —SiR 3 2 —H (11)
(In the formula, R 3 is as defined in formula (10). N is an integer and 0 ≦ n ≦ 1000.)
(R 3 HSiO) a (R 3 2 SiO) b (R 3 3 SiO 1/2 ) c (12)
(Wherein R 3 is as defined in formula (10), a is an integer of 1 or more, b is an integer of 0 or more, (a + b) ≦ 10000, and c is 0 or 2) Provided that when (a + b) is an integer of 2 or more and c = 0, the H silicone of formula (12) is a cyclic silicone, and when c = 2, the H silicone of formula (12). Is a chain silicone.)
15.該皮膜中のバインダー成分(B)が、相分離構造を形成していることを特徴とする発明1または2のいずれかに記載の機能性アルミニウム建材。
16.該皮膜に含まれる光触媒(a)のバンドギャップエネルギーよりも高いエネルギーの光を照射することにより光触媒活性を示すことを特徴とする発明1または2のいずれかに記載の機能性アルミニウム建材。
17.該皮膜に含まれる光触媒(a)のバンドギャップエネルギーよりも高いエネルギーの光を照射することにより、該光触媒(a)粒子の近傍に存在する珪素原子に結合した有機基の少なくとも一部が水酸基及び/又はシロキサン結合に置換されてなることを特徴とする発明4、5、7、8のいずれかに記載の機能性アルミニウム建材。
18.光触媒(a)とバインダー成分(B)を含む光触媒組成物(C)であって、発明1または2のいずれかに記載の皮膜を形成することを特徴とする機能性アルミニウム建材用光触媒被覆組成物。
15. The functional aluminum building material according to any one of inventions 1 and 2, wherein the binder component (B) in the coating forms a phase separation structure.
16. 3. The functional aluminum building material according to claim 1, wherein the functional aluminum building material exhibits photocatalytic activity when irradiated with light having energy higher than the band gap energy of the photocatalyst (a) contained in the coating.
17. By irradiating light with energy higher than the band gap energy of the photocatalyst (a) contained in the film, at least a part of the organic groups bonded to silicon atoms existing in the vicinity of the photocatalyst (a) particles are hydroxyl groups and The functional aluminum building material according to any one of Inventions 4, 5, 7, and 8, wherein the functional aluminum building material is substituted with a siloxane bond.
18. A photocatalyst composition (C) comprising a photocatalyst (a) and a binder component (B), wherein the photocatalyst coating composition for functional aluminum building materials is characterized in that the film according to any one of the inventions 1 and 2 is formed. .
本発明は、生活環境下の光により、アルミニウム建材基材自体を劣化すること無しに、長期間にわたり優れた抗菌性、防カビ性、防汚性を発現することができ、煩雑な工程を必用とせずに製造の容易な、機能性アルミニウム建材を提供することができる。 The present invention can exhibit excellent antibacterial, antifungal and antifouling properties over a long period of time without deteriorating the aluminum building material base material itself due to light in the living environment, and requires a complicated process. Therefore, it is possible to provide a functional aluminum building material that is easy to manufacture.
以下、本発明を詳細に説明する。
本発明の機能性アルミニウム建材は、光触媒(a)及びバインダー成分(B)を含む皮膜を備えたアルミニウム建材であって、該皮膜中における光触媒(a)の濃度がアルミニウム建材の基材に接する面から露出面に向かって高くなることを特徴とする。
この際、全皮膜中の光触媒含有量(濃度)100に対し、露出面と接する表面側近傍の相対濃度が120以上であることが光触媒能力や親水化能力の向上効果を発現し、防汚、抗菌、防カビ効果が大きくなるために好ましい。該表面側近傍の相対濃度はより好ましくは150以上、さらに好ましくは200以上であることがよい。また、アルミニウム建材基材に接する面近傍の相対濃度が50以下であると界面劣化防止効果の点で好ましい。アルミニウム建材基材に接する面近傍の相対濃度はより好ましくは10以下、さらに好ましくは0であると良い。
また、本発明における皮膜中における光触媒(a)の濃度は、アルミニウム建材基材に接する面から他方の露出面に向かって徐々に高くなっても良いし、単にアルミニウム建材基材に接する面での光触媒濃度が低く、他方の露出面における光触媒濃度が高く、その間の変化が不連続であっても良い。
Hereinafter, the present invention will be described in detail.
The functional aluminum building material of the present invention is an aluminum building material provided with a film containing a photocatalyst (a) and a binder component (B), wherein the concentration of the photocatalyst (a) in the film is in contact with the base material of the aluminum building material. It is characterized by becoming higher toward the exposed surface.
At this time, with respect to the photocatalyst content (concentration) of 100 in the entire film, the effect of improving the photocatalytic ability and the hydrophilization ability is expressed that the relative concentration in the vicinity of the surface side in contact with the exposed surface is antifouling It is preferable because the antibacterial and antifungal effects are increased. The relative concentration in the vicinity of the surface side is more preferably 150 or more, and further preferably 200 or more. Moreover, it is preferable at the point of the interface deterioration prevention effect that the relative density | concentration of the surface vicinity which contacts an aluminum building material base material is 50 or less. The relative concentration in the vicinity of the surface in contact with the aluminum building material substrate is more preferably 10 or less, and even more preferably 0.
In addition, the concentration of the photocatalyst (a) in the film according to the present invention may gradually increase from the surface in contact with the aluminum building material substrate toward the other exposed surface, or simply on the surface in contact with the aluminum building material substrate. The photocatalyst concentration may be low, the photocatalyst concentration on the other exposed surface may be high, and the change therebetween may be discontinuous.
本発明において、光触媒(a)とは、光照射によって酸化、還元反応を起こす物質のことを言う。すなわち、伝導帯と価電子帯との間のエネルギーギャップよりも大きなエネルギー(すなわち短い波長)の光(励起光)を照射したときに、価電子帯中の電子の励起(光励起)が生じて、伝導電子と正孔を生成しうる物質であり、このとき、伝導帯に生成した電子の還元力および/または価電子帯に生成した正孔の酸化力を利用して、種々の化学反応を行うことができる。例えば、
種々の有機物の酸化分解反応を挙げることができる。従って、この光触媒をアルミニウム建材の表面に固定化させれば、アルミニウム建材に付着した種々の有機物(汚染物質)を、光エネルギーを利用して酸化分解することができ、さらにアルミニウム建材の表面を親水性に保つことが可能となる。
In the present invention, the photocatalyst (a) refers to a substance that undergoes an oxidation or reduction reaction upon irradiation with light. That is, when light (excitation light) with an energy larger than the energy gap between the conduction band and the valence band (ie, short wavelength) is irradiated, excitation of electrons in the valence band (photoexcitation) occurs. It is a substance that can generate conduction electrons and holes. At this time, various chemical reactions are performed using the reducing power of electrons generated in the conduction band and / or the oxidizing power of holes generated in the valence band. be able to. For example,
Examples thereof include oxidative decomposition reactions of various organic substances. Therefore, if this photocatalyst is immobilized on the surface of the aluminum building material, various organic substances (contaminants) adhering to the aluminum building material can be oxidatively decomposed using light energy, and the surface of the aluminum building material can be made hydrophilic. It becomes possible to keep in sex.
本発明において光触媒活性とは、光照射によって酸化、還元反応を起こすことを言う。材料表面の、光照射時における色素等の有機物の分解性を測定することにより表面が光触媒活性であるか否かを判定できる。光触媒活性を有する表面は、優れた細菌やカビ等の汚染有機物質の分解活性を有し、防汚性、抗菌性や防カビ性を発現する。
本発明において、アルミニウム建材の表面を光触媒活性にするのに有用に使用できる光触媒(a)としては、例えばTiO2、ZnO、SrTiO3、CdS、GaP、InP、GaAs、BaTiO3、BaTiO4、BaTi4O9、K2NbO3、Nb2O5、Fe2O3、Ta2O5、K3Ta3Si2O3、WO3、SnO2、Bi2O3、BiVO4、NiO、Cu2O、SiC、MoS2、InPb、RuO2、CeO2、Ta3N5等、さらにはTi、Nb、Ta、Vから選ばれた少なくとも1種の元素を有する層状酸化物(例えば、特開昭62−74452号公報、特開平2−172535号公報、特開平7−24329号公報、特開平8−89799号公報、特開平8−89800号公報、特開平8−89804号公報、特開平8−198061号公報、特開平9−248465号公報、特開平10−99694号公報、特開平10−244165号公報等参照)を挙げることができる。
In the present invention, the photocatalytic activity means that an oxidation or reduction reaction is caused by light irradiation. It is possible to determine whether or not the surface is photocatalytically active by measuring the decomposability of the organic material such as a dye during light irradiation on the surface of the material. The surface having photocatalytic activity has excellent decomposition activity of contaminating organic substances such as bacteria and fungi, and exhibits antifouling properties, antibacterial properties and fungicidal properties.
In the present invention, examples of the photocatalyst (a) useful for making the surface of the aluminum building material photocatalytically active include TiO 2 , ZnO, SrTiO 3 , CdS, GaP, InP, GaAs, BaTiO 3 , BaTiO 4 , and BaTi. 4 O 9 , K 2 NbO 3 , Nb 2 O 5 , Fe 2 O 3 , Ta 2 O 5 , K 3 Ta 3 Si 2 O 3 , WO 3 , SnO 2 , Bi 2 O 3 , BiVO 4 , NiO, Cu 2 O, SiC, MoS 2 , InPb, RuO 2 , CeO 2 , Ta 3 N 5 and the like, and further a layered oxide having at least one element selected from Ti, Nb, Ta, V (for example, JP JP 62-74452 A, JP 2-172535 A, JP 7-24329 A, JP 8-89799 A, JP 8-898 A. No. 0, JP-A-8-89804, JP-A-8-198061, JP-A-9-248465, JP-A-10-99694, JP-A-10-244165, etc.) it can.
これらの光触媒(a)の中でTiO2(酸化チタン)は無害であり、化学的安定性にも優れるため好ましい。酸化チタンとしては、アナターゼ、ルチル、ブルッカイトのいずれも使用できる。
また、本発明に使用する光触媒(a)として、可視光(例えば約400〜800nmの波長)の照射により光触媒活性及び/又は親水性を発現することが出来る可視光応答型光触媒を選択すると、本発明の機能性アルミニウム建材は、室内等の紫外線が十分に照射されない場所等においても防汚性能や有機物分解作用等が発現することが出来るため好ましい。
Among these photocatalysts (a), TiO 2 (titanium oxide) is preferable because it is harmless and has excellent chemical stability. As titanium oxide, any of anatase, rutile, and brookite can be used.
When a visible light responsive photocatalyst capable of expressing photocatalytic activity and / or hydrophilicity by irradiation with visible light (for example, a wavelength of about 400 to 800 nm) is selected as the photocatalyst (a) used in the present invention, The functional aluminum building material of the invention is preferable because it can exhibit antifouling performance, an organic matter decomposing action, etc. even in a place where ultraviolet rays such as indoors are not sufficiently irradiated.
上記可視光応答型光触媒は、可視光で光触媒活性及び/又は親水性を発現するものであれば全て使用することが出来るが、例えばTaON、LaTiO2N、CaNbO2N、LaTaON2、CaTaO2N等のオキシナイトライド化合物(例えば特開2002−66333号公報参照)やSm2Ti2S2O7等のオキシサルファイド化合物(例えば特開2002−233770号公報参照)、Ta3N5等の窒化化合物、CaIn2O4、SrIn2O4、ZnGa2O4、Na2Sb2O6等のd10電子状態の金属イオンを含む酸化物(例えば特開2002−59008号公報参照)、アンモニアや尿素等の窒素含有化合物存在下でチタン酸化物前駆体(オキシ硫酸チタン、塩化チタン、アルコキシチタン等)や高表面酸化チタンを焼成して得られる窒素ドープ酸化チタン(例えば特開2002−29750号公報、特開2002−87818号公報、特開2002−154823号公報、特開2001−207082号公報参照)、チオ尿素等の硫黄化合物存在下にチタン酸化物前駆体(オキシ硫酸チタン、塩化チタン、アルコキシチタン等)を焼成して得られる硫黄ドープ酸化チタン、酸化チタンを水素プラズマ処理したり真空下で加熱処理したりすることによって得られる酸素欠陥型の酸化チタン(例えば特開2001−98219号公報参照)、さらには光触媒粒子をハロゲン化白金化合物で処理したり(例えば特開2002−239353号公報参照)、タングステンアルコキシドで処理(特開2001−286755号公報参照)することによって得られる表面処理光触媒等を好適に挙げることができる。 Any visible light responsive photocatalyst can be used as long as it exhibits photocatalytic activity and / or hydrophilicity with visible light. For example, TaON, LaTiO 2 N, CaNbO 2 N, LaTaON 2 , and CaTaO 2 N can be used. Oxynitride compounds such as JP-A-2002-66333, oxysulfide compounds such as Sm 2 Ti 2 S 2 O 7 (see JP-A-2002-233770, for example), and nitriding such as Ta 3 N 5 Compounds, oxides containing metal ions in the d10 electronic state such as CaIn 2 O 4 , SrIn 2 O 4 , ZnGa 2 O 4 , and Na 2 Sb 2 O 6 (see, for example, JP 2002-59008 A), ammonia and urea In the presence of nitrogen-containing compounds such as titanium oxide precursors (titanium oxysulfate, titanium chloride, alkoxytita Etc.) or nitrogen-doped titanium oxide obtained by firing high surface titanium oxide (for example, JP 2002-29750 A, JP 2002-87818 A, JP 2002-154823 A, JP 2001-207082 A). See), sulfur-doped titanium oxide obtained by firing titanium oxide precursors (titanium oxysulfate, titanium chloride, alkoxytitanium, etc.) in the presence of sulfur compounds such as thiourea, hydrogen plasma treatment or under vacuum Or oxygen-deficient titanium oxide obtained by heat treatment (for example, see JP-A-2001-98219), and further, photocatalyst particles are treated with a halogenated platinum compound (for example, JP-A-2002-239353). And treatment with tungsten alkoxide (see JP 2001-286755 A). The surface-treated photocatalyst obtained by this can be mentioned suitably.
上記可視光応答型光触媒の中でオキシナイトライド化合物、オキシサルファイド化合物は可視光による光触媒活性が大きく、特に好適に使用することができる。
更に、上述した光触媒(a)は、好適にPt、Rh、Ru、Nb、Cu、Sn、Ni、Feなどの金属及び/又はこれらの酸化物を添加あるいは固定化したり、多孔質リン酸カルシウム等で被覆したり光触媒(例えば特開平10−244166号公報参照)して使用することもできる。
上記光触媒(a)の結晶粒子径(1次粒子径)は1〜400nmであることが好ましく、より好ましくは1〜50nmの光触媒が好適に選択される。
Among the visible light responsive photocatalysts, oxynitride compounds and oxysulfide compounds have a large photocatalytic activity by visible light, and can be used particularly preferably.
Furthermore, the above-mentioned photocatalyst (a) is preferably added or fixed with a metal such as Pt, Rh, Ru, Nb, Cu, Sn, Ni, Fe and / or an oxide thereof, or coated with porous calcium phosphate or the like. Or a photocatalyst (see, for example, JP-A-10-244166).
The crystal particle size (primary particle size) of the photocatalyst (a) is preferably 1 to 400 nm, and more preferably a photocatalyst of 1 to 50 nm is suitably selected.
本発明の光触媒(a)の形態としては粉体、分散液、ゾルのいずれでも用いることが出来る。
本発明において光触媒(a)の変性とは、後述する少なくとも1種の変性剤化合物(b)を、光触媒(a)粒子の表面に固定化することを意味する。上記の変性剤化合物の光触媒粒子の表面への固定化は、ファン・デル・ワールス力(物理吸着)やクーロン力または化学結合によるものと考えられる。特に、化学結合を利用した変性は、変性剤化合物と光触媒との相互作用が強く、変性剤化合物が光触媒粒子の表面に強固に固定化されるので好ましい。
本発明の光触媒(a)を変性光触媒(A)とすることにより、本発明の、アルミニウム建材基材に、上記光触媒(a)を含む皮膜を形成する場合に、該皮膜中における光触媒(a)の濃度が、該皮膜のアルミニウム建材基材に接する面から他方の露出面に向かって高くなる構造の形成が、特に後述するバインダー成分(B)と組み合わせた場合に容易になるため、非常に好ましい。
As the form of the photocatalyst (a) of the present invention, any of powder, dispersion, and sol can be used.
In the present invention, the modification of the photocatalyst (a) means that at least one modifier compound (b) described later is immobilized on the surface of the photocatalyst (a) particles. The immobilization of the above modifier compound on the surface of the photocatalyst particles is considered to be due to van der Waals force (physical adsorption), Coulomb force, or chemical bonding. In particular, modification using a chemical bond is preferable because the interaction between the modifier compound and the photocatalyst is strong, and the modifier compound is firmly immobilized on the surface of the photocatalyst particles.
By using the photocatalyst (a) of the present invention as the modified photocatalyst (A), when the film containing the photocatalyst (a) is formed on the aluminum building material base material of the present invention, the photocatalyst (a) in the film Since the formation of a structure in which the concentration of the coating increases from the surface in contact with the aluminum building material base to the other exposed surface of the coating is facilitated particularly when combined with the binder component (B) described later, it is very preferable. .
本発明においては、変性に用いる光触媒(a)の性状が、変性光触媒(A)の分散安定性、成膜性、及び種々の機能の発現にとって重要な因子となる。すなわち、本発明の変性に使用される光触媒(a)としては、1次粒子と2次粒子との混合物(1次粒子、2次粒子何れかのみでも良い)の数平均分散粒子径が400nm以下の光触媒が変性後の光触媒の表面特性を有効に利用できるために好ましい。特に数平均分散粒子径が100nm以下の光触媒を使用した場合、生成する変性光触媒(A)と後述するバインダー成分(B)を含む光触媒組成物(C)から形成された本発明の皮膜では、変性光触媒(A)を効率的に該皮膜の表面(露出面)に存在させることができるため非常に好ましい。より好ましくは80nm以下3nm以上、さらに好ましくは50nm以下3nm以上の光触媒(a)が好適に選択される。 In the present invention, the properties of the photocatalyst (a) used for modification are important factors for the dispersion stability of the modified photocatalyst (A), film-forming properties, and expression of various functions. That is, as the photocatalyst (a) used for the modification of the present invention, the number average dispersed particle size of a mixture of primary particles and secondary particles (which may be either primary particles or secondary particles) is 400 nm or less. These photocatalysts are preferable because the surface characteristics of the modified photocatalyst can be effectively utilized. In particular, when a photocatalyst having a number average dispersed particle size of 100 nm or less is used, the film of the present invention formed from a photocatalyst composition (C) containing a modified photocatalyst (A) to be produced and a binder component (B) described later is modified. This is very preferable because the photocatalyst (A) can be efficiently present on the surface (exposed surface) of the coating. More preferably, the photocatalyst (a) having a thickness of 80 nm or less and 3 nm or more, more preferably 50 nm or less and 3 nm or more is suitably selected.
これらの光触媒(a)としては、以下の理由から、光触媒粉体ではなく光触媒ゾルを使用することが好ましい。一般に微細な粒子からなる粉体は、単結晶粒子(一次粒子)が強力に凝集した二次粒子を形成するため、無駄にする表面特性が多いが、一次粒子にまで分散させるのは非常に困難である。これに対して、光触媒ゾルの場合、光触媒粒子は溶解せずに一次粒子に近い形で存在しているため表面特性を有効に利用でき、それから生成する変性光触媒は分散安定性、成膜性等に優れるばかりか、種々の機能を有効に発現するので好ましく使用することができる。ここで、本発明に用いる光触媒ゾルとは、光触媒粒子が水及び/又は有機溶媒中に好ましくは0.01〜70質量%、より好ましくは0.1〜50質量%で一次粒子及び/または二次粒子として分散されたものである。 As these photocatalysts (a), it is preferable to use a photocatalyst sol instead of a photocatalyst powder for the following reasons. In general, powders composed of fine particles form secondary particles in which single crystal particles (primary particles) are strongly agglomerated, so there are many surface properties that are wasted, but it is very difficult to disperse to primary particles. It is. On the other hand, in the case of a photocatalyst sol, the photocatalyst particles do not dissolve but exist in a form close to primary particles, so that the surface characteristics can be used effectively. It can be preferably used because it effectively exhibits various functions. Here, the photocatalyst sol used in the present invention means that the photocatalyst particles are preferably 0.01 to 70% by mass, more preferably 0.1 to 50% by mass in water and / or an organic solvent, and primary particles and / or secondary particles. Dispersed as secondary particles.
ここで、上記光触媒ゾルに使用される上記有機溶媒としては、例えばエチレングリコール、ブチルセロソルブ、n−プロパノール、イソプロパノール、n−ブタノール、エタノール、メタノール等のアルコール類、トルエンやキシレン等の芳香族炭化水素類、ヘキサン、シクロヘキサン、ヘプタン等の脂肪族炭化水素類、酢酸エチル、酢酸n−ブチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、クロロホルム、塩化メチレン、四塩化炭素等のハロゲン化合物類、ジメチルスルホキシド、ニトロベンゼン等、さらにはこれらの2種以上の混合物が挙げられる。 Here, examples of the organic solvent used in the photocatalyst sol include alcohols such as ethylene glycol, butyl cellosolve, n-propanol, isopropanol, n-butanol, ethanol and methanol, and aromatic hydrocarbons such as toluene and xylene. , Aliphatic hydrocarbons such as hexane, cyclohexane and heptane, esters such as ethyl acetate and n-butyl acetate, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ethers such as tetrahydrofuran and dioxane, dimethylacetamide, dimethyl Examples include amides such as formamide, halogen compounds such as chloroform, methylene chloride, and carbon tetrachloride, dimethyl sulfoxide, nitrobenzene, and a mixture of two or more of these.
該光触媒ゾルとして酸化チタンのゾルを例にとると、例えば実質的に水を分散媒とし、その中に酸化チタン粒子が解膠された酸化チタンヒドロゾル等を挙げることができる。(ここで、実質的に水を分散媒とするとは、分散媒中に水が80質量%程度以上含有されていることを意味する。)かかるゾルの調整は公知であり、容易に製造できる(例えば、特開昭63−17221号公報、特開平7−819号公報、特開平9−165218号公報、特開平11−43327号公報等参照)。例えば、硫酸チタンや四塩化チタンの水溶液を加熱加水分解して生成したメタチタン酸をアンモニア水で中和し、析出した含水酸化チタンを濾別、洗浄、脱水させると酸化チタン粒子の凝集物が得られる。この凝集物を、硝酸、塩酸、又はアンモニア等の作用の下に解膠させ水熱処理等を行うことにより酸化チタンヒドロゾルが得られる。また、酸化チタンヒドロゾルとしては、酸化チタン粒子を酸やアルカリの作用の下で解膠させたものや、酸やアルカリを使用せず、必要に応じてポリアクリル酸ソーダなどの分散安定剤を使用し、強力なせん断力の下で水中に分散させたゾルも用いることができる。さらに、pHが中性付近の水溶液中においても分散安定性に優れる、粒子表面がペルオキソ基で修飾されたアナターゼ型酸化チタンゾルも、例えば、特開平10−67516号公報で提案された方法によって容易に得ることができる。 Taking a titanium oxide sol as an example of the photocatalyst sol, for example, a titanium oxide hydrosol in which water is substantially used as a dispersion medium and titanium oxide particles are peptized therein can be exemplified. (Here, substantially using water as a dispersion medium means that water is contained in the dispersion medium in an amount of about 80% by mass or more.) Adjustment of such a sol is known and can be easily produced ( For example, see JP-A-63-17221, JP-A-7-819, JP-A-9-165218, JP-A-11-43327, etc.). For example, metatitanic acid produced by heating and hydrolyzing an aqueous solution of titanium sulfate or titanium tetrachloride is neutralized with aqueous ammonia, and the precipitated hydrous titanium oxide is filtered, washed, and dehydrated to obtain aggregates of titanium oxide particles. It is done. Titanium oxide hydrosol can be obtained by peptizing the agglomerates under the action of nitric acid, hydrochloric acid, ammonia or the like and performing hydrothermal treatment. In addition, as titanium oxide hydrosol, titanium oxide particles are peptized under the action of acid or alkali, or dispersion stabilizer such as sodium polyacrylate is used as required without using acid or alkali. Sols that are used and dispersed in water under strong shear forces can also be used. Further, anatase-type titanium oxide sols having excellent dispersion stability even in an aqueous solution having a pH near neutral and whose particle surface is modified with a peroxo group can be easily obtained by, for example, the method proposed in JP-A-10-67516. Can be obtained.
上述した酸化チタンヒドロゾルはチタニアゾルとして市販されている。(例えば、石原産業株式会社製「STS−02」、田中転写株式会社製「TO−240」等)
上記酸化チタンヒドロゾル中の酸化チタンは好ましくは50質量%以下、より好ましくは30質量%以下である。さらに好ましくは30質量%以下0.1質量%以上である。
このようなヒドロゾルの粘度(20℃)は比較的低い。本発明においては、ヒドロゾルの粘度は、0.05mPa・s〜2000mPa・s程度の範囲にあるのが好ましい。より好ましくは0.5mPa・s〜1000mPa・s、さらに好ましくは1mPa・s〜500mPa・sである。
The titanium oxide hydrosol described above is commercially available as a titania sol. (For example, “STS-02” manufactured by Ishihara Sangyo Co., Ltd., “TO-240” manufactured by Tanaka Transcript Co., Ltd., etc.)
The titanium oxide in the titanium oxide hydrosol is preferably 50% by mass or less, more preferably 30% by mass or less. More preferably, it is 30 mass% or less and 0.1 mass% or more.
Such hydrosols have a relatively low viscosity (20 ° C.). In the present invention, the viscosity of the hydrosol is preferably in the range of about 0.05 mPa · s to 2000 mPa · s. More preferably, it is 0.5 mPa * s-1000 mPa * s, More preferably, it is 1 mPa * s-500 mPa * s.
また、例えば酸化セリウムゾル(例えば、特開平8−59235号公報参照)やTi、Nb、Ta、Vよりなる群から選ばれた少なくとも1種の元素を有する層状酸化物のゾル(例えば、特開平9−25123号公報、特開平9−67124号公報、特開平9−227122号公報、特開平9−227123号公報、特開平10−259023号公報等参照)等、様々な光触媒ゾルの製造方法についても酸化チタンゾルと同様に知られている。
さらに、本発明で好適に使用できる可視光応答型の光触媒ゾルも市販されている。(例えば、昭和電工(株)製「NTB−200」、住友化学工業(株)製「TSS」等)
Further, for example, a cerium oxide sol (for example, see JP-A-8-59235) or a layered oxide sol having at least one element selected from the group consisting of Ti, Nb, Ta, and V (for example, No. 25123, JP-A-9-67124, JP-A-9-227122, JP-A-9-227123, JP-A-10-259023, etc.), etc. It is known as well as titanium oxide sol.
Furthermore, a visible light responsive photocatalyst sol that can be suitably used in the present invention is also commercially available. (For example, “NTB-200” manufactured by Showa Denko KK, “TSS” manufactured by Sumitomo Chemical Co., Ltd., etc.)
また、実質的に有機溶媒を分散媒とし、その中に光触媒粒子が分散された光触媒オルガノゾルは、例えば上記光触媒ヒドロゾルをポリエチレングリコール類の如き相間移動活性を有する化合物(異なる第1の相と第2相との界面に第3の相を形成し、第1の相、第2の相、第3の相を相互に溶解及び/又は可溶化する化合物)で処理し有機溶媒で希釈したり(例えば、特開平10−167727号公報)、ドデシルベンゼンスルホン酸ナトリウム等の陰イオン界面活性剤で水に不溶性の有機溶剤中に分散移行させてゾルを調整する方法(例えば、特開昭58−29863号公報)やブチルセロソルブ等の水より高沸点のアルコール類を上記光触媒ヒドロゾルに添加した後、水を(減圧)蒸留等によって除去する方法等により得ることができる。また、実質的に有機溶媒を分散媒とし、その中に酸化チタン粒子が分散された酸化チタンオルガノゾルは市販されている(例えば、テイカ株式会社製「TKS−251」)。ここで、実質的に有機溶媒を分散媒とするとは、分散媒中に有機溶媒が50質量%程度以上含有されていることを意味する。 In addition, a photocatalyst organosol in which an organic solvent is substantially used as a dispersion medium and in which photocatalyst particles are dispersed is a compound having a phase transfer activity such as polyethylene glycol (for example, different first phase and second phase). A third phase is formed at the interface with the phase, the first phase, the second phase, the third phase are mutually dissolved and / or solubilized compounds) and diluted with an organic solvent (for example, JP-A-10-167727), a method for preparing a sol by dispersing and transferring it in an organic solvent insoluble in water with an anionic surfactant such as sodium dodecylbenzenesulfonate (for example, JP-A-58-29863). Gazette) and alcohols having a boiling point higher than that of water such as butyl cellosolve are added to the photocatalyst hydrosol, and then the water can be obtained by (reduced pressure) distillation or the like.In addition, a titanium oxide organosol in which an organic solvent is substantially used as a dispersion medium and titanium oxide particles are dispersed therein is commercially available (for example, “TKS-251” manufactured by Teika Co., Ltd.). Here, substantially using an organic solvent as a dispersion medium means that the organic solvent is contained in the dispersion medium in an amount of about 50% by mass or more.
本発明において、変性光触媒(A)を得るのに用いられる少なくとも1種の変性剤化合物(b)は、式(1)で表されるトリオルガノシラン単位、式(2)で表されるモノオキシジオルガノシラン単位、式(3)で表されるジオキシオルガノシラン単位、及びフッ化メチレン(―CF2−)単位よりなる群から選ばれる少なくとも1種の構造単位を有する化合物類よりなる群から選ばれる。
R3Si− (1)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す)
−(R2SiO)− (2)
(式中、Rは式(1)で定義した通りである。)
In the present invention, at least one modifier compound (b) used to obtain the modified photocatalyst (A) is a triorganosilane unit represented by the formula (1), a monooxy represented by the formula (2). From the group consisting of compounds having at least one structural unit selected from the group consisting of diorganosilane units, dioxyorganosilane units represented by formula (3), and methylene fluoride (—CF 2 —) units. To be elected.
R 3 Si- (1)
(In the formula, each R is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 1 to 30 carbon atoms. A fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group)
- (R 2 SiO) - ( 2)
(In the formula, R is as defined in formula (1).)
(式中、Rは式(1)で定義した通りである。)
上述した構造単位を有する変性剤化合物(b)で光触媒粒子表面が変性処理された変性光触媒(A)は、その粒子表面の表面エネルギーが非常に小さくなる。
本発明において、光触媒(a)の変性剤化合物(b)による変性処理は、水及び/又は有機溶媒の存在、あるいは非存在下において、前述した光触媒(a)と、同じく前述した変性剤化合物(b)を好ましくは質量比(a)/(b)=1/99〜99.9/0.1、より好ましくは(a)/(b)=10/90〜99/1の割合で混合し、好ましくは0〜200℃、より好ましくは10〜80℃にて加熱したり、(減圧)蒸留等により該混合物の溶媒組成を変化させる等の操作をすることにより得ることができる。
(In the formula, R is as defined in formula (1).)
In the modified photocatalyst (A) in which the surface of the photocatalyst particle is modified with the modifier compound (b) having the structural unit described above, the surface energy of the particle surface is very small.
In the present invention, the modification treatment of the photocatalyst (a) with the modifier compound (b) is carried out in the presence or absence of water and / or an organic solvent in the same manner as the above-described photocatalyst (a). b) is preferably mixed at a mass ratio (a) / (b) = 1/99 to 99.9 / 0.1, more preferably (a) / (b) = 10/90 to 99/1. Preferably, it can be obtained by heating at 0 to 200 ° C., more preferably at 10 to 80 ° C., or by changing the solvent composition of the mixture by (reduced pressure) distillation or the like.
ここで上記変性処理を行う場合、使用できる有機溶媒としては、例えばトルエンやキシレン等の芳香族炭化水素類、ヘキサン、シクロヘキサン、ヘプタン等の脂肪族炭化水素類、酢酸エチル、酢酸n−ブチル等のエステル類、エチレングリコール、ブチルセロソルブ、イソプロパノール、n−ブタノール、エタノール、メタノール等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、クロロホルム、塩化メチレン、四塩化炭素等のハロゲン化合物類、ジメチルスルホキシド、ニトロベンゼン等やこれらの2種以上の混合物が挙げられる。 Here, when performing the above modification treatment, examples of organic solvents that can be used include aromatic hydrocarbons such as toluene and xylene, aliphatic hydrocarbons such as hexane, cyclohexane, and heptane, ethyl acetate, and n-butyl acetate. Esters, alcohols such as ethylene glycol, butyl cellosolve, isopropanol, n-butanol, ethanol and methanol, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ethers such as tetrahydrofuran and dioxane, amides such as dimethylacetamide and dimethylformamide , Halogen compounds such as chloroform, methylene chloride, carbon tetrachloride, dimethyl sulfoxide, nitrobenzene, and a mixture of two or more thereof.
本発明の変性光触媒(A)を得るのに使用される上記変性剤化合物(b)としては、例えばSi−H基、加水分解性シリル基(アルコキシシリル基、ヒドロキシシリル基、ハロゲン化シリル基、アセトキシシリル基、アミノキシシリル基等)、エポキシ基、アセトアセチル基、チオール基、酸無水物基等の光触媒粒子(a)と反応性を有するケイ素化合物やフルオロアルキル化合物、フルオロオレフィン重合体等を挙げることができる。
また、上記変性剤化合物(b)の他の例としては、例えばポリオキシアルキレン基、スルホン酸基、カルボキシル基等の光触媒粒子(a)とファン・デル・ワールス力、クーロン力等により相互作用する構造を有するケイ素化合物等やフルオロアルキル化合物、フルオロオレフィン重合体等を挙げることができる。
Examples of the modifier compound (b) used to obtain the modified photocatalyst (A) of the present invention include Si-H groups, hydrolyzable silyl groups (alkoxysilyl groups, hydroxysilyl groups, halogenated silyl groups, Acetoxysilyl group, aminoxysilyl group, etc.), epoxy compounds, acetoacetyl groups, thiol groups, acid anhydride groups and other photocatalyst particles (a) reactive with silicon compounds, fluoroalkyl compounds, fluoroolefin polymers, etc. Can be mentioned.
Other examples of the modifier compound (b) include interaction with photocatalyst particles (a) such as polyoxyalkylene group, sulfonic acid group, and carboxyl group by van der Waals force, Coulomb force, and the like. Examples thereof include a silicon compound having a structure, a fluoroalkyl compound, and a fluoroolefin polymer.
本発明において、上記変性剤化合物(b)として、組成式(9)で表されるSi−H基含有ケイ素化合物(b1)を用いると、非常に効率よく光触媒粒子表面を変性することができるため好ましい。
HxRySiO(4−x−y)/2 (9)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。x及びyは、0<x<4、0<y<4であり、そして(x+y)≦4である。)
In the present invention, when the Si-H group-containing silicon compound (b1) represented by the composition formula (9) is used as the modifier compound (b), the surface of the photocatalyst particles can be modified very efficiently. preferable.
H x R y SiO (4-xy) / 2 (9)
(In the formula, each R is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 1 to 30 carbon atoms. A fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group, where x and y are 0 <x <4, 0 <Y <4 and (x + y) ≦ 4.)
本発明において、光触媒(a)の上記組成式(9)で表されるSi−H基含有ケイ素化合物(b1)による変性処理は、水及び/又は有機溶媒の存在、あるいは非存在下において、光触媒(a)と該Si−H基含有ケイ素化合物(b1)を好ましくは質量比(a)/(b1)=1/99〜99.9/0.1、より好ましくは(a)/(b1)=10/90〜99/1の割合で好ましくは0〜200℃にて混合することにより実施できる。この変性の操作により混合液からは水素ガスが発生すると共に、光触媒(a)として光触媒ゾルを用いた場合、その平均分散粒子径の増加が観察される。また、例えば光触媒(a)として酸化チタンを用いた場合、上記変性の操作により、Ti−OH基の減少がIRスペクトルにおける3630〜3640cm−1の吸収の減少として観測される。 In the present invention, the modification of the photocatalyst (a) with the Si—H group-containing silicon compound (b1) represented by the above composition formula (9) is carried out in the presence or absence of water and / or an organic solvent. The mass ratio (a) / (b1) = 1/99 to 99.9 / 0.1, more preferably (a) / (b1), between (a) and the Si—H group-containing silicon compound (b1). = 10/90 to 99/1, preferably by mixing at 0 to 200 ° C. By this modification operation, hydrogen gas is generated from the mixed solution, and when the photocatalyst sol is used as the photocatalyst (a), an increase in the average dispersed particle diameter is observed. For example, when titanium oxide is used as the photocatalyst (a), a decrease in Ti—OH groups is observed as a decrease in absorption at 3630 to 3640 cm −1 in the IR spectrum by the above modification.
これらのことより、変性剤化合物(b)として上記式(9)で表されるSi−H基含有ケイ素化合物(b1)を選択した場合は、本発明の変性光触媒(A1)は、Si−H基含有ケイ素化合物(b1)と光触媒(a)との単なる混合物ではなく、両者の間には化学反応に伴う何らかの相互作用を生じていることが予測できるため非常に好ましい。実際、この様にして得られた変性光触媒(A)は、有機溶媒に対する分散安定性や化学的安定性、耐久性等において非常に優れたものとなっている。
本発明において、光触媒(a)の上記式(9)で表されるSi−H基含有ケイ素化合物(b1)による変性処理は、Si−H基に対する脱水素縮合触媒を使用して好ましくは0〜150℃で実施することもできる。
From these, when the Si-H group-containing silicon compound (b1) represented by the above formula (9) is selected as the modifier compound (b), the modified photocatalyst (A1) of the present invention is Si-H. This is very preferable because it is not a simple mixture of the group-containing silicon compound (b1) and the photocatalyst (a) but can be expected to cause some kind of interaction between the two due to a chemical reaction. In fact, the modified photocatalyst (A) thus obtained is very excellent in dispersion stability, chemical stability, durability and the like in an organic solvent.
In the present invention, the modification of the photocatalyst (a) with the Si—H group-containing silicon compound (b1) represented by the above formula (9) is preferably performed using a dehydrogenative condensation catalyst for Si—H groups. It can also be carried out at 150 ° C.
この場合、あらかじめ光還元法等の方法で脱水素縮合触媒を光触媒(a)に固定し、上記Si−H基含有ケイ素化合物(b1)で変性処理しても良いし、脱水素縮合触媒の存在下に上記Si−H基含有化合物ケイ素(b1)で光触媒(a)を変性処理しても良い。
ここでSi−H基に対する脱水素縮合触媒とは、Si−H基と光触媒表面に存在する水酸基(酸化チタンの場合はTi−OH基)やチオール基、アミノ基、カルボキシル基等の活性水素基、さらには水等との脱水素縮合反応を加速する物質を意味し、該脱水素縮合触媒を使用することにより温和な条件で光触媒表面を変性することが可能となる。
該脱水素縮合触媒としては、例えば白金族触媒、すなわちルテニウム、ロジウム、パラジウム、オスミウム、イリジウム、白金の単体及びその化合物や、銀、鉄、銅、コバルト、ニッケル、錫等の単体及びその化合物が挙げられる。これらの中で白金族触媒が好ましく、白金の単体及びその化合物が特に好ましい。
In this case, the dehydrogenation condensation catalyst may be fixed to the photocatalyst (a) in advance by a method such as a photoreduction method and may be modified with the Si-H group-containing silicon compound (b1), or the presence of the dehydrogenation condensation catalyst. Under the above, the photocatalyst (a) may be modified with the Si—H group-containing compound silicon (b1).
Here, the dehydrogenative condensation catalyst for the Si-H group is an active hydrogen group such as a Si-H group and a hydroxyl group (Ti-OH group in the case of titanium oxide) existing on the photocatalyst surface, a thiol group, an amino group, or a carboxyl group. Furthermore, it means a substance that accelerates the dehydrogenation condensation reaction with water or the like, and the use of the dehydrogenation condensation catalyst makes it possible to modify the surface of the photocatalyst under mild conditions.
Examples of the dehydrogenative condensation catalyst include platinum group catalysts, that is, ruthenium, rhodium, palladium, osmium, iridium, platinum simple substance and compounds thereof, and simple substances such as silver, iron, copper, cobalt, nickel, tin and compounds thereof. Can be mentioned. Of these, platinum group catalysts are preferred, and platinum alone and its compounds are particularly preferred.
ここで、上記白金の化合物としては、例えば塩化白金(II)、テトラクロロ白金酸(II)、塩化白金(IV)、ヘキサクロロ白金酸(IV)、ヘキサクロロ白金(IV)アンモニウム、ヘキサクロロ白金(IV)カリウム、水酸化白金(II)、二酸化白金(IV)、ジクロロ−ジシクロペンタジエニル−白金(II)、白金−ビニルシロキサン錯体、白金−ホスフィン錯体、白金−オレフィン錯体等を使用することができる。
本発明の上記式(9)で表されるSi−H基含有ケイ素化合物において、Si−H基は光触媒を穏和な条件で選択性良く変性するために好ましい官能基である。これに対し、加水分解性基は、同様に光触媒の変性に利用することもできるが、副反応を抑制し、得られる変性光触媒の安定性を向上するためには、その含有量は少ない方が好ましい。
Here, as the platinum compound, for example, platinum chloride (II), tetrachloroplatinic acid (II), platinum chloride (IV), hexachloroplatinic acid (IV), hexachloroplatinum (IV) ammonium, hexachloroplatinum (IV) Potassium, platinum hydroxide (II), platinum dioxide (IV), dichloro-dicyclopentadienyl-platinum (II), platinum-vinylsiloxane complex, platinum-phosphine complex, platinum-olefin complex, etc. can be used. .
In the Si—H group-containing silicon compound represented by the above formula (9) of the present invention, the Si—H group is a preferred functional group for modifying the photocatalyst with good selectivity under mild conditions. On the other hand, the hydrolyzable group can also be used for the modification of the photocatalyst, but in order to suppress side reactions and improve the stability of the resulting modified photocatalyst, the content thereof should be smaller. preferable.
本発明に好適に使用できる上記式(9)で表されるSi−H基含有ケイ素化合物(b1)としては、例えば式(10)で表されるモノSi−H基含有化合物、式(11)で表される両末端Si−H基含有化合物、式(12)で表されるHシリコーンよりなる群から選ばれる少なくとも1種の、加水分解性シリル基を有さないSi−H基含有化合物を挙げることができる。 Examples of the Si-H group-containing silicon compound (b1) represented by the above formula (9) that can be suitably used in the present invention include a mono-Si-H group-containing compound represented by the formula (10), a formula (11) Si-H group-containing compound having no hydrolyzable silyl group, at least one selected from the group consisting of Si-H group-containing compound represented by formula (12) and H silicone represented by formula (12) Can be mentioned.
(式中、R3は各々独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、フェニル基、又は式(13)で表されるシロキシ基を表す。
−O−(R4 2SiO)m−SiR4 3 ・・・(13)
(式中、R4はそれぞれ独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数が1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、又はフェニル基を表す。また、mは整数であり、0≦m≦1000である。))
H−(R3 2SiO)n−SiR3 2−H ・・・(11)
(式中、R3は式(10)で定義した通りである。nは整数であり、0≦n≦1000である。)
(R3HSiO)a(R3 2SiO)b(R3 3SiO1/2)c ・・・(12)
(式中、R3は式(10)で定義した通りである。aは1以上の整数であり、bは0以上の整数であり、(a+b)≦10000であり、そしてcは0又は2である。但し、(a+b)が2以上の整数であり且つc=0の場合、式(12)の該Hシリコーンは環状シリコーンであり、c=2の場合、式(12)の該Hシリコーンは鎖状シリコーンである。)
(In the formula, each R 3 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a linear or branched alkenyl group having 2 to 30 carbon atoms, or a carbon number of 5 to 20). A cycloalkyl group, a linear or branched fluoroalkyl group having 1 to 30 carbon atoms, a phenyl group, or a siloxy group represented by the formula (13).
—O— (R 4 2 SiO) m —SiR 4 3 (13)
(In the formula, each R 4 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon number of 1 to 1. 30 represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, or a phenyl group, and m is an integer and 0 ≦ m ≦ 1000.)
H— (R 3 2 SiO) n —SiR 3 2 —H (11)
(In the formula, R 3 is as defined in formula (10). N is an integer and 0 ≦ n ≦ 1000.)
(R 3 HSiO) a (R 3 2 SiO) b (R 3 3 SiO 1/2 ) c (12)
(Wherein R 3 is as defined in formula (10), a is an integer of 1 or more, b is an integer of 0 or more, (a + b) ≦ 10000, and c is 0 or 2) Provided that when (a + b) is an integer of 2 or more and c = 0, the H silicone of formula (12) is a cyclic silicone, and when c = 2, the H silicone of formula (12). Is a chain silicone.)
本発明において、上記式(10)で表されるモノSi−H基含有化合物の具体例としては、例えばビス(トリメチルシロキシ)メチルシラン、ビス(トリメチルシロキシ)エチルシラン、ビス(トリメチルシロキシ)n−プロピルシラン、ビス(トリメチルシロキシ)i−プロピルシラン、ビス(トリメチルシロキシ)n−ブチルシラン、ビス(トリメチルシロキシ)n−ヘキシルシラン、ビス(トリメチルシロキシ)シクロヘキシルシラン、ビス(トリメチルシロキシ)フェニルシラン、ビス(トリエチルシロキシ)メチルシラン、ビス(トリエチルシロキシ)エチルシラン、トリス(トリメチルシロキシ)シラン、トリス(トリエチルシロキシ)シラン、ペンタメチルジシロキサン、1,1,1,3,3,5,5−ヘプタメチルトリシロキサン、1,1,1,3,3,5,5,6,6−ノナメチルテトラシロキサン、トリメチルシラン、エチルジメチルシラン、メチルジエチルシラン、トリエチルシラン、フェニルジメチルシラン、ジフェニルメチルシラン、シクロヘキシルジメチルシラン、t−ブチルジメチルシラン、ジ−t−ブチルメチルシラン、n−オクタデシルジメチルシラン、トリ−n−プロピルシラン、トリ−i−プロピルシラン、トリ−i−ブチルシラン、トリ−n−ヘキシルシラン、トリフェニルシラン、アリルジメチルシラン、1−アリル−1,1,3,3−テトラメチルジシロキサン、クロロメチルジメチルシラン、7−オクテニルジメチルシラン等を挙げることができる。 In the present invention, specific examples of the mono-Si—H group-containing compound represented by the formula (10) include, for example, bis (trimethylsiloxy) methylsilane, bis (trimethylsiloxy) ethylsilane, bis (trimethylsiloxy) n-propylsilane. Bis (trimethylsiloxy) i-propylsilane, bis (trimethylsiloxy) n-butylsilane, bis (trimethylsiloxy) n-hexylsilane, bis (trimethylsiloxy) cyclohexylsilane, bis (trimethylsiloxy) phenylsilane, bis (triethylsiloxy) ) Methylsilane, bis (triethylsiloxy) ethylsilane, tris (trimethylsiloxy) silane, tris (triethylsiloxy) silane, pentamethyldisiloxane, 1,1,1,3,3,5,5-heptamethyltrisilo Sun, 1,1,1,3,3,5,5,6,6-nonamethyltetrasiloxane, trimethylsilane, ethyldimethylsilane, methyldiethylsilane, triethylsilane, phenyldimethylsilane, diphenylmethylsilane, cyclohexyldimethylsilane , T-butyldimethylsilane, di-t-butylmethylsilane, n-octadecyldimethylsilane, tri-n-propylsilane, tri-i-propylsilane, tri-i-butylsilane, tri-n-hexylsilane, triphenyl Examples thereof include silane, allyldimethylsilane, 1-allyl-1,1,3,3-tetramethyldisiloxane, chloromethyldimethylsilane, and 7-octenyldimethylsilane.
これらのモノSi−H基含有化合物の中で、光触媒の変性処理時におけるSi−H基の反応性(脱水素縮合反応)の良さや表面エネルギーの低さから、ビス(トリメチルシロキシ)メチルシラン、トリス(トリメチルシロキシ)シラン、ペンタメチルジシロキサン等の分子中にシロキシ基を有し、フェニル基を有さない下式(14)で表されるものが好ましい。 Among these mono-Si-H group-containing compounds, bis (trimethylsiloxy) methylsilane and tris are preferred because of the good reactivity (dehydrogenation condensation reaction) and low surface energy of Si-H groups during photocatalytic modification treatment. Those represented by the following formula (14) having a siloxy group in the molecule, such as (trimethylsiloxy) silane, pentamethyldisiloxane and the like and having no phenyl group are preferable.
(式中、Rはそれぞれ独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、直鎖状または分岐状の炭素数が1〜30個のアルケニル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数が1〜30個のフルオロアルキル基、もしくは式(13b)で表されるシロキシ基から選ばれた1種以上からなる基であり、かつR5の中の少なくとも1つは式(13b)で表されるシロキシ基である。
−O−(R4’ 2SiO)m−SiR4’ 3 ・・・(13b)
(式中、R4’はそれぞれ独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数が1〜30個のフルオロアルキル基を表す。また、mは整数であり、0≦m≦1000である。))
(In the formula, each R is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a linear or branched alkenyl group having 1 to 30 carbon atoms, or a carbon number of 5 to 20). A cycloalkyl group, a linear or branched fluoroalkyl group having 1 to 30 carbon atoms, or a group consisting of one or more selected from a siloxy group represented by formula (13b), and R At least one of 5 is a siloxy group represented by the formula (13b).
—O— (R 4 ′ 2 SiO) m —SiR 4 ′ 3 (13b)
(Wherein R 4 ′ each independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon number. Represents 1 to 30 fluoroalkyl groups, m is an integer, and 0 ≦ m ≦ 1000.))
本発明において、上記式(11)で表される両末端Si−H基含有化合物の具体例としては、例えば1,1,3,3−テトラメチルジシロキサン、1,1,3,3,5,5−ヘキサメチルトリシロキサン、1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン等の数平均分子量50000以下のH末端ポリジメチルシロキサン類や、1,1,3,3−テトラエチルジシロキサン、1,1,3,3,5,5−ヘキサエチルトリシロキサン、1,1,3,3,5,5,7,7−オクタエチルテトラシロキサン等の数平均分子量50000以下のH末端ポリジエチルシロキサン類や、1,1,3,3−テトラフェニルジシロキサン、1,1,3,3,5,5−ヘキサフェニルトリシロキサン、1,1,3,3,5,5,7,7−オクタフェニルテトラシロキサン等の数平均分子量50000以下のH末端ポリジフェニルシロキサン類や、1,3−ジフェニル−1,3−ジメチル−ジシロキサン、1,3,5−トリメチル−1,3,5−トリフェニル−トリシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラフェニル−テトラシロキサン等の数平均分子量50000以下のH末端ポリフェニルメチルシロキサン類や、ジメチルシラン、エチルメチルシラン、ジエチルシラン、フェニルメチルシラン、ジフェニルシラン、シクロヘキシルメチルシラン、t−ブチルメチルシラン、ジ−t−ブチルシラン、n−オクタデシルメチルシラン、アリルメチルシラン等を例示することができる。 In the present invention, specific examples of the both-terminal Si—H group-containing compound represented by the above formula (11) include 1,1,3,3-tetramethyldisiloxane, 1,1,3,3,5, and the like. , 5-hexamethyltrisiloxane, 1,1,3,3,5,5,7,7-octamethyltetrasiloxane and the like H-terminal polydimethylsiloxanes having a number average molecular weight of 50000 or less, Number average molecular weight of 50,000 or less such as 3-tetraethyldisiloxane, 1,1,3,3,5,5-hexaethyltrisiloxane, 1,1,3,3,5,5,7,7-octaethyltetrasiloxane H-terminal polydiethylsiloxanes, 1,1,3,3-tetraphenyldisiloxane, 1,1,3,3,5,5-hexaphenyltrisiloxane, 1,1,3,3,5,5 , 7,7-octa H-terminal polydiphenylsiloxanes having a number average molecular weight of 50,000 or less, 1,3-diphenyl-1,3-dimethyl-disiloxane, 1,3,5-trimethyl-1,3,5-triphenyl -H-terminal polyphenylmethylsiloxanes having a number average molecular weight of 50000 or less, such as trisiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetraphenyl-tetrasiloxane, dimethylsilane, ethylmethyl Examples thereof include silane, diethylsilane, phenylmethylsilane, diphenylsilane, cyclohexylmethylsilane, t-butylmethylsilane, di-t-butylsilane, n-octadecylmethylsilane, and allylmethylsilane.
これらの中で、光触媒の変性処理時におけるSi−H基の反応性(脱水素縮合反応)の良さや表面エネルギーの低さから、数平均分子量が好ましくは10000以下、より好ましくは2000以下、さらに好ましくは1000以下のH末端ポリジアルキルシロキサン(式(15))が両末端Si−H基含有化合物として好適に使用できる。
H−(R6 2SiO)d−SiR6 2−H ・・・(15)
(式中、R6はそれぞれ独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、直鎖状または分岐状の炭素数が1〜30個のフルオロアルキル基を表す。dは整数であり、0≦d≦1000である。)
Among these, the number average molecular weight is preferably 10000 or less, more preferably 2000 or less, more preferably due to the good reactivity of the Si—H group (dehydrogenation condensation reaction) and the low surface energy during the modification of the photocatalyst. Preferably 1000 or less H-terminated polydialkylsiloxanes (formula (15)) can be suitably used as the Si-H group-containing compound at both ends.
H— (R 6 2 SiO) d —SiR 6 2 —H (15)
(In the formula, each R 6 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, or a linear or branched fluoroalkyl group having 1 to 30 carbon atoms. D Is an integer and 0 ≦ d ≦ 1000.)
本発明に用いる上記式(12)で表されるHシリコーンとしては、光触媒の変性処理時における分散安定性(光触媒粒子の凝集の防止)の点より、数平均分子量が好ましくは5000以下、より好ましくは2000以下、さらに好ましくは1000以下のHシリコーンが好適に使用できる。
また、本発明に使用される変性剤化合物(b)として、一般式(20)で表される構造を有するフッ素系樹脂(b2)を使用すると、該フッ素系樹脂で変性された変性光触媒(A)は、有害物質分解性と有機基材保護性の両立に優れるため好ましい。
The H silicone represented by the above formula (12) used in the present invention has a number average molecular weight of preferably 5,000 or less, more preferably from the viewpoint of dispersion stability (preventing aggregation of photocatalyst particles) during photocatalytic modification treatment. H silicone of 2000 or less, more preferably 1000 or less can be suitably used.
Moreover, when the fluororesin (b2) having the structure represented by the general formula (20) is used as the modifier compound (b) used in the present invention, a modified photocatalyst (A) modified with the fluororesin (A) ) Is preferable because it is excellent in both decomposability of harmful substances and organic base material protection.
(式中、A1〜A5は同一でも異なっていても良く、それぞれフッ素原子、水素原子、塩素原子、炭素数1〜6のアルキル基、及び炭素数1〜6のハロ置換アルキル基から選ばれる1種を示す。Yは分子量14〜50000のw価の有機基(当該有機基Yの主鎖との結合以外にw価である基、好ましくはフッ化メチレン単位を有する基、より好ましくはパーフルオロアルキル基を有する基)を表す。Vは、エポキシ基、水酸基、アセトアセチル基、チオール基、環状酸無水物基、カルボキシル基、スルホン酸基、ポリオキシアルキレン基、加水分解性シリル基からなる群から選ばれた少なくとも1つの官能基を表す。kは0以上1000000以下の整数であり、lは1以上100000以下の整数を表す。ただし、k=0の時は、好ましくはA3〜A5の少なくとも1つがフッ素原子、より好ましくはA3、A4が共にフッ素原子を表す。wは1〜20の整数である。) (Wherein A 1 to A 5 may be the same or different and are each selected from a fluorine atom, a hydrogen atom, a chlorine atom, an alkyl group having 1 to 6 carbon atoms, and a halo-substituted alkyl group having 1 to 6 carbon atoms) Y represents a w-valent organic group having a molecular weight of 14 to 50000 (a group having a w-value other than the bond to the main chain of the organic group Y, preferably a group having a methylene fluoride unit, more preferably V represents an epoxy group, a hydroxyl group, an acetoacetyl group, a thiol group, a cyclic acid anhydride group, a carboxyl group, a sulfonic acid group, a polyoxyalkylene group, or a hydrolyzable silyl group. Represents at least one functional group selected from the group consisting of: k is an integer of 0 or more and 1000000 or less, and l is an integer of 1 or more and 100000 or less, provided that k = 0 is preferable. The at least one fluorine atom in A 3 to A 5, more preferably an integer of .w 1 to 20 representing the A 3, A 4 are both fluorine atoms.)
本発明において、光触媒(a)の式(20)で表されるフッ素系樹脂(b2)による変性処理は、水及び/又は有機溶媒の存在、あるいは非存在下において、光触媒(a)と該フッ素系樹脂(b2)を好ましくは質量比(a)/(b2)=1/99〜99.9/0.1、より好ましくは(a)/(b2)=10/90〜99/1の割合で好ましくは0〜200℃にて混合し、好ましくは(減圧)蒸留等により該混合物の溶媒組成を変化させる等の操作をすることにより得ることができる。
上記フッ素系樹脂(b2)の好ましい例としては、例えば式(21)で表される構造を有するパーフルオロカーボンスルホン酸ポリマーフッ素系樹脂(b2’)を挙げることができる。
In the present invention, the modification of the photocatalyst (a) with the fluorine-based resin (b2) represented by the formula (20) is performed in the presence or absence of water and / or an organic solvent. The resin (b2) is preferably a mass ratio (a) / (b2) = 1/99 to 99.9 / 0.1, more preferably a ratio of (a) / (b2) = 10/90 to 99/1 It is preferably obtained by mixing at 0 to 200 ° C. and preferably by changing the solvent composition of the mixture by distillation under reduced pressure.
Preferable examples of the fluororesin (b2) include a perfluorocarbon sulfonic acid polymer fluororesin (b2 ′) having a structure represented by the formula (21), for example.
(式中、xは1〜1000000の整数であり、yは1〜100000の整数を表す。また、mは0〜20の整数であり、nは0〜20の整数を表す。)
また、本発明の変性光触媒(A)において、その好ましい形態は、変性光触媒の一次粒子と二次粒子との混合物(一次粒子、二次粒子何れかのみでも良い)の数平均分散粒子径が400nm以下、さらに好ましくは1nm以上100nm以下、特に好ましくは5nm以上80nm以下である。ゾルの状態であることが好ましい。
(In the formula, x is an integer of 1 to 1000000, y represents an integer of 1 to 100000, m represents an integer of 0 to 20, and n represents an integer of 0 to 20).
In the modified photocatalyst (A) of the present invention, the preferred form is that the number average dispersed particle diameter of the mixture of primary particles and secondary particles of the modified photocatalyst (which may be either primary particles or secondary particles) is 400 nm. Hereinafter, it is more preferably 1 nm to 100 nm, particularly preferably 5 nm to 80 nm. A sol state is preferable.
また、特に数平均分散粒子径が100nm以下の変性光触媒ゾルを本発明の光触媒組成物(C)に用いると、変性光触媒粒子の濃度がアルミニウム建材基材と接する界面近傍では小さく、皮膜の表面近傍では大きく分布するような表面方向に異方分布した皮膜を形成するのに有利となり、光触媒作用によるアルミニウム建材基材との界面劣化が無く、光触媒活性が大きい皮膜を形成するため非常に好ましい。この様な変性光触媒ゾルは、上記変性剤化合物(b)で変性処理をする光触媒として前述した光触媒ゾルを用いることにより得ることができる。 In particular, when a modified photocatalyst sol having a number average dispersed particle size of 100 nm or less is used in the photocatalyst composition (C) of the present invention, the concentration of the modified photocatalyst particles is small in the vicinity of the interface in contact with the aluminum building material substrate, and in the vicinity of the surface of the film. In this case, it is advantageous for forming a film having an anisotropic distribution in the surface direction, which is largely distributed, and it is very preferable because a film having a large photocatalytic activity is formed without interfacial deterioration with the aluminum building material base due to photocatalytic action. Such a modified photocatalyst sol can be obtained by using the above-mentioned photocatalyst sol as a photocatalyst to be modified with the above modifier compound (b).
なお、従来、二酸化チタンなどで単に粒径として表示されている数値は、多くの場合一次粒子径(結晶子径)であり、凝集による二次粒子径を考慮した数値ではない。
本発明の皮膜を形成する光触媒組成物(C)は、光触媒(a)(好ましくは変性光触媒(A))とバインダー成分(B)を含むことを特徴とし、その質量比(a)/(B)は0.1/99.9〜90/10であることが好ましく、(a)/(B)が1/99〜50/50で含むことがより好ましい。
本発明の変性光触媒(A)は、表面エネルギーの非常に小さい構造{式(1)〜(3)、フッ化メチレン単位から選ばれる少なくとも1種}を有する変性剤化合物(b)で変性処理されているため、皮膜を形成する際、空気と接する側の皮膜表面に移動しやすい性質を持っている。
Conventionally, a numerical value simply displayed as a particle diameter in titanium dioxide or the like is a primary particle diameter (crystallite diameter) in many cases, and is not a numerical value considering a secondary particle diameter due to aggregation.
The photocatalyst composition (C) for forming a film of the present invention comprises a photocatalyst (a) (preferably a modified photocatalyst (A)) and a binder component (B), and its mass ratio (a) / (B ) Is preferably 0.1 / 99.9 to 90/10, and more preferably (a) / (B) is included at 1/99 to 50/50.
The modified photocatalyst (A) of the present invention is modified with a modifier compound (b) having a structure having a very small surface energy {formula (1) to (3), at least one selected from methylene fluoride units}. Therefore, when forming a film, it has the property of easily moving to the surface of the film in contact with air.
ここで、本発明のバインダー成分(B)として、光触媒(a)、特に該変性光触媒(A)より表面エネルギーが高いバインダー成分を用いることにより、変性光触媒(A)の上記性質を助長するため、本発明の光触媒組成物(C)は、光触媒(a)、特に変性光触媒(A)の分布について大きな自己傾斜性を有することが可能となる。ここで自己傾斜性とは、光触媒組成物(C)から皮膜を形成する際、その形成過程において光触媒(a)、特に変性光触媒(A)が、皮膜や接する界面の性状(特に親水/疎水性)に対応して、光触媒(a)、特に変性光触媒(A)の濃度勾配を有する構造を自律的に形成することを意味する。
本発明のバインダー成分(B)としては、光触媒(a)(好ましくは変性光触媒(A))より、表面エネルギーが2mN/m以上、好ましくは5mN/m以上大きい樹脂を選択すると、上記自己傾斜性が大きくなり非常に好ましい。
Here, as the binder component (B) of the present invention, by using a photocatalyst (a), in particular, a binder component having a surface energy higher than that of the modified photocatalyst (A), the above properties of the modified photocatalyst (A) are promoted. The photocatalyst composition (C) of the present invention can have a large self-gradient with respect to the distribution of the photocatalyst (a), particularly the modified photocatalyst (A). Here, the self-gradient property means that when a film is formed from the photocatalyst composition (C), the photocatalyst (a), particularly the modified photocatalyst (A), in the formation process, the properties of the film or the interface with which it contacts (particularly hydrophilic / hydrophobic) ) Means to autonomously form a structure having a concentration gradient of the photocatalyst (a), particularly the modified photocatalyst (A).
As the binder component (B) of the present invention, when a resin having a surface energy of 2 mN / m or more, preferably 5 mN / m or more larger than that of the photocatalyst (a) (preferably the modified photocatalyst (A)) is selected, the self-gradient Is very preferable.
ここで、上記表面エネルギーや表面エネルギーの相対差は、例えばPolymer Handbook(米国 A Wiley-interscience publication 出版)等を参照したり、以下の方法で測定したりすることにより求めることができる。
すなわち、上記光触媒組成物(C)を構成する光触媒(a)、特に変性光触媒(A)及びバインダー成分(B)から各々それらの皮膜を有する基材を調整し、脱イオン水を滴下して20℃における接触角(θ)を測定し、下記のSellとNeumannの実験式により、各々の表面エネルギーを求めることができる。
Here, the surface energy and the relative difference between the surface energies can be determined by referring to, for example, Polymer Handbook (published by A Wiley-interscience publication in the United States) or by the following method.
That is, the base material which each has those films | membranes from the photocatalyst (a) which comprises the said photocatalyst composition (C), especially modified photocatalyst (A), and a binder component (B) is adjusted, deionized water is dripped and 20 The contact angle (θ) at ° C. is measured, and the surface energy of each can be obtained by the following empirical formulas for Sell and Neumann.
[式中、γsは脱イオン水の接触角を測定した皮膜の表面エネルギー(mN/m)を表し、γlは水の表面エネルギー{72.8mN/m(20℃)}を表わす。
本発明の光触媒組成物(C)において、バインダー成分(B)に使用できる化合物としては、上記条件を満たす表面エネルギーを有すればよく特に制限されないが、各種単量体、合成樹脂及び天然樹脂等が挙げられ、また皮膜や成形体の形成後に、乾燥、加熱、吸湿、光照射等により硬化するものも挙げることができる。また、その形態については、無溶媒の状態(ペレット、粉体、液体等)であっても溶媒に溶解あるいは分散した形態であっても良く、特に制限はない。
[Wherein γs represents the surface energy (mN / m) of the film obtained by measuring the contact angle of deionized water, and γl represents the surface energy of water {72.8 mN / m (20 ° C.)}.
In the photocatalyst composition (C) of the present invention, the compound that can be used for the binder component (B) is not particularly limited as long as it has a surface energy that satisfies the above conditions. Various monomers, synthetic resins, natural resins, and the like In addition, after the formation of a film or a molded body, those that are cured by drying, heating, moisture absorption, light irradiation, or the like can also be mentioned. Further, the form thereof may be in a solvent-free state (pellet, powder, liquid, etc.) or may be dissolved or dispersed in a solvent, and is not particularly limited.
上記合成樹脂としては、熱可塑性樹脂と硬化性樹脂(熱硬化性樹脂、光硬化性樹脂、湿気硬化性樹脂等)の使用が可能であり、例えばシリコーン樹脂、アクリル樹脂、メタクリル樹脂、フッ素樹脂、アルキド樹脂、アミノアルキド樹脂、ビニル樹脂、ポリエステル樹脂、スチレン−ブタジエン樹脂、ポリオレフィン樹脂、ポリスチレン樹脂、ポリケトン樹脂、ポリアミド樹脂、ポリカーボネート樹脂、ポリアセタール樹脂、ポリエーテルエーテルケトン樹脂、ポリフェニレンオキシド樹脂、ポリスルフォン樹脂、ポリフェニレンスルホン樹脂ポリエーテル樹脂、ポリ塩化ビニル樹脂、ポリ塩化ビニリデン樹脂、尿素樹脂、フェノール樹脂、メラミン樹脂、エポキシ樹脂、ウレタン樹脂、シリコーン−アクリル樹脂、さらには水ガラスやジルコニウム化合物、過酸化チタン等の無機系化合物を挙げることができる。
また、上記天然高分子としては、ニトロセルロース等のセルロース系樹脂、天然ゴム等のイソプレン系樹脂、カゼイン等のタンパク質系樹脂やでんぷん等を挙げることができる。
As the synthetic resin, a thermoplastic resin and a curable resin (thermosetting resin, photocurable resin, moisture curable resin, etc.) can be used. For example, silicone resin, acrylic resin, methacrylic resin, fluororesin, Alkyd resin, amino alkyd resin, vinyl resin, polyester resin, styrene-butadiene resin, polyolefin resin, polystyrene resin, polyketone resin, polyamide resin, polycarbonate resin, polyacetal resin, polyether ether ketone resin, polyphenylene oxide resin, polysulfone resin, Polyphenylene sulfone resin, polyether resin, polyvinyl chloride resin, polyvinylidene chloride resin, urea resin, phenol resin, melamine resin, epoxy resin, urethane resin, silicone-acrylic resin, water glass and zirco Um compounds, and inorganic compounds such as titanium peroxide.
Examples of the natural polymer include cellulose resins such as nitrocellulose, isoprene resins such as natural rubber, protein resins such as casein, and starch.
本発明において、光触媒組成物(C)に使用するバインダー成分(B)としては、下記式(4)で表されるフェニル基含有シリコーン(BP)が、本発明の変性光触媒(A)より表面エネルギーが高く、その骨格を成すシロキサン結合(−O−Si−)は光触媒作用による酸化分解がおこらないため、最も好適に使用できる。
R1 pR2 qXrSiO(4−p−q−r)/2 (4)
(式中、各R1はフェニル基を表し、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。そしてp、q及びrは、0<p<4、0≦q<4、0≦r<4、及び0<(p+q+r)<4であり、そして0.05≦p/(p+q)≦1である。)
上記式(4)で示されるフェニル基含有シリコーン(BP)としては、例えば一般式(16)、(17)、(18)及び(19)で表されるシロキサン結合の少なくとも1種の構造を含むシリコーンを挙げることができる。
In the present invention, as the binder component (B) used in the photocatalyst composition (C), the phenyl group-containing silicone (BP) represented by the following formula (4) is more surface energy than the modified photocatalyst (A) of the present invention. Since the siloxane bond (—O—Si—) constituting the skeleton does not undergo oxidative decomposition due to photocatalysis, it can be most preferably used.
R 1 p R 2 q X r SiO (4-p-q-r) / 2 (4)
(In the formula, each R 1 represents a phenyl group, and each R 2 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or Represents a branched alkenyl group having 2 to 30 carbon atoms, each X independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, or 1 carbon atom; Represents an oxime group of ˜20, a halogen atom, and p, q and r are 0 <p <4, 0 ≦ q <4, 0 ≦ r <4, and 0 <(p + q + r) <4, and 0 .05 ≦ p / (p + q) ≦ 1.)
Examples of the phenyl group-containing silicone (BP) represented by the above formula (4) include at least one structure of a siloxane bond represented by the general formulas (16), (17), (18), and (19). Mention may be made of silicone.
−(R7 2SiO)− ・・・(17) — (R 7 2 SiO) — (17)
(式中、R7はそれぞれ独立に、フェニル基、直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基を表す。) (In the formula, each R 7 independently represents a phenyl group, a linear or branched alkyl group having 1 to 30 carbon atoms, or a cycloalkyl group having 5 to 20 carbon atoms.)
上述した構造を含むシリコーンは、例えば一般式RSiX3(式中、Rは、フェニル基、直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基を表す。各Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子からなる群より選ばれる一つの反応性基を表す。以下同様。)で表される3官能シラン誘導体及び/又は一般式R2SiX2で表される2官能シラン誘導体及び/又は一般式SiX4で表される4官能シラン誘導体を部分的に加水分解・縮重合させ、必要により一般式R3SiXで表される1官能シラン誘導体及び/又はアルコール類によって末端停止させることにより調製できる。この様にして得られるシラン誘導体モノマーの部分縮合物のポリスチレン換算重量平均分子量は、好ましくは100〜100,000、より好ましくは400〜50,000である。 The silicone containing the above-described structure is, for example, a general formula RSiX 3 (wherein R represents a phenyl group, a linear or branched alkyl group having 1 to 30 carbon atoms, or a cycloalkyl group having 5 to 20 carbon atoms). Each X is independently selected from the group consisting of a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, an oxime group having 1 to 20 carbon atoms, and a halogen atom. 4) represented by a trifunctional silane derivative and / or a bifunctional silane derivative represented by the general formula R 2 SiX 2 and / or 4 represented by the general formula SiX 4. It can be prepared by partially hydrolyzing / condensing a functional silane derivative and, if necessary, terminating with a monofunctional silane derivative represented by the general formula R 3 SiX and / or an alcohol. The polystyrene-converted weight average molecular weight of the partial condensate of the silane derivative monomer thus obtained is preferably 100 to 100,000, more preferably 400 to 50,000.
これらの中で、上記式(4)で示されるフェニル基含有シリコーンとして、上記式(16)で表されるラダー構造を10モル%以上、好ましくは40モル%以上含むものを選択すると、本発明の光触媒組成物(C)から形成される光触媒含有皮膜は、硬度、耐熱性、耐候性、抗菌性、耐カビ性、耐汚染性、耐薬品性等の点で非常に優れたものとなるため好ましい。特に、上記ラダー構造としてフェニルラダー構造〔式(16)におけるR7が全てフェニル基のもの〕を有するものは上述した光触媒含有皮膜の物性が非常に向上するため好ましい。この様なラダー構造は、例えば赤外線吸収スペクトルにおける1040cm−1と1160cm−1付近の2本のシロキサン結合に由来する吸収の存在により同定する事ができる。
(J.F.Brown.Jr.,etal.:J.Am.Chem.Soc.,82,6194(1960)参照。)
本発明に用いる上記式(4)で表されるフェニル基含有シリコーン(BP)は、Ph−Si結合(Ph:フェニル基)を有することが好ましい。
Among these, when a phenyl group-containing silicone represented by the above formula (4) is selected to contain a ladder structure represented by the above formula (16) of 10 mol% or more, preferably 40 mol% or more, the present invention The photocatalyst-containing film formed from the photocatalyst composition (C) is extremely excellent in terms of hardness, heat resistance, weather resistance, antibacterial properties, mold resistance, stain resistance, chemical resistance, etc. preferable. In particular, those having a phenyl ladder structure as the ladder structure [wherein all R 7 in the formula (16) are phenyl groups] are preferable because the physical properties of the above-described photocatalyst-containing film are greatly improved. Such ladder structure, for example can be identified by the presence of absorption derived from two siloxane bonds near 1040 cm -1 and 1160 cm -1 in the infrared absorption spectrum.
(See JFBrown. Jr., etal .: J. Am. Chem. Soc., 82, 6194 (1960).)
The phenyl group-containing silicone (BP) represented by the above formula (4) used in the present invention preferably has a Ph—Si bond (Ph: phenyl group).
すなわち、本発明の光触媒組成物(C)において、表面エネルギーの非常に小さい構造{式(1)〜(3)、フッ化メチレン単位から選ばれる少なくとも1種}を有する変性剤化合物(b)で変性処理されている変性光触媒(A)のバインダーとして、該変性光触媒(A)より表面エネルギーが高いフェニル基含有シリコーン(BP)を含むバインダー成分(B)を用いることにより、本発明の光触媒組成物(C)は、変性光触媒(A)の分布について非常に高い自己傾斜性を有することが可能となり、好ましい。
この様な表面エネルギーの高いフェニル基含有シリコーン(BP)による自己傾斜性の発現効果は、フェニル基(R1)を、フェニル基(R1)とR2(R2は直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、炭素数2〜20のアルケニル基を表す。)の合計{以下(R1+R2)と表す。}に対し5モル%以上有する上記式(4)で示されるフェニル基含有シリコーン(BP)を用いることによってより顕著に発揮することができるので、このようなフェニル基含有シリコーン(BP)を用いることは好ましい。
That is, in the photocatalyst composition (C) of the present invention, the modifier compound (b) having a structure having a very small surface energy {formula (1) to (3), at least one selected from methylene fluoride units}. By using the binder component (B) containing a phenyl group-containing silicone (BP) having a surface energy higher than that of the modified photocatalyst (A) as the binder of the modified photocatalyst (A) that has been modified, the photocatalyst composition of the present invention (C) is preferable because it can have a very high self-gradient with respect to the distribution of the modified photocatalyst (A).
Such a self-gradient effect by the phenyl group-containing silicone (BP) having a high surface energy is obtained by converting the phenyl group (R 1 ) into the phenyl group (R 1 ) and R 2 (R 2 is linear or branched). Represents an alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, and an alkenyl group having 2 to 20 carbon atoms) (hereinafter referred to as (R 1 + R 2 )). }, A phenyl group-containing silicone (BP) represented by the above formula (4) having 5 mol% or more of Is preferred.
また、上述した自己傾斜性の発現効果は、フェニル基(R1)の(R1+R2)に対する割合が増えるに従い増大する。よって、本発明の光触媒組成物に使用するバインダー成分(B)のフェニル基含有シリコーンとしてより好ましいものは、(R1+R2)に対するフェニル基(R1)の割合が10モル%以上、さらに好ましくは20モル%以上、さらに好ましくは50モル%以上のものである。 In addition, the self-tilting effect described above increases as the ratio of the phenyl group (R 1 ) to (R 1 + R 2 ) increases. Therefore, the more preferable phenyl group-containing silicone of the binder component (B) used in the photocatalyst composition of the present invention is more preferably a ratio of phenyl group (R 1 ) to (R 1 + R 2 ) of 10 mol% or more. Is 20 mol% or more, more preferably 50 mol% or more.
本発明の光触媒組成物(C)において、バインダー成分(B)に使用するフェニル基含有シリコーン(BP)として、上述した効果を発揮するより好ましいものは、下記式(5)で表されるアルキル基を含有しないフェニル基含有シリコーン(BP1)である。
R1 sXtSiO(4−s−t)/2 (5)
(式中、R1はフェニル基を表し、Xは各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表し、s及びtは、0<s<4、0≦t<4、そして0<(s+t)<4である。)
In the photocatalyst composition (C) of the present invention, the phenyl group-containing silicone (BP) used in the binder component (B) is more preferably an alkyl group represented by the following formula (5), which exhibits the above-described effects. It is a phenyl group-containing silicone (BP1) that does not contain.
R 1 s X t SiO (4 -s-t) / 2 (5)
(Wherein, R 1 represents a phenyl group, and each X independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, or an oxime having 1 to 20 carbon atoms. Group represents a halogen atom, and s and t are 0 <s <4, 0 ≦ t <4, and 0 <(s + t) <4.)
また、バインダー成分(B)が、下記式(6)で表されるアルキル基含有シリコーン(BA)を更に含有すると、本発明の光触媒組成物から形成される皮膜は、成膜性、硬度、耐熱性、抗菌性、防カビ性、耐汚染性、耐薬品性等の点で優れたものとなるため好ましい。
R2 uXvSiO(4−u−v)/2 (6)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。u及びvは、0<u<4、0≦v<4、そして0<(u+v)<4である。)
Further, when the binder component (B) further contains an alkyl group-containing silicone (BA) represented by the following formula (6), the film formed from the photocatalyst composition of the present invention has a film formability, hardness, and heat resistance. It is preferable because it is excellent in terms of properties, antibacterial properties, antifungal properties, stain resistance, chemical resistance, and the like.
R 2 u X v SiO (4-uv) / 2 (6)
(In the formula, each R 2 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Each independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, an oxime group having 1 to 20 carbon atoms, or a halogen atom. U and v are 0 <u <4, 0 ≦ v <4, and 0 <(u + v) <4.)
さらに、上記フェニル基含有シリコーン(BP1)と混合する上記アルキル基含有シリコーン(BA)として、式(7)で表されるモノオキシジオルガノシラン単位(D)と式(8)で表されるジオキシオルガノシラン単位(T)を、モル比が好ましくは(D)/(T)=100/0〜5/95、より好ましくは90/10〜10/90の割合で有する構造のものを用いると、アルキル基含有シリコーン(BA)の応力緩和作用が増加し、本発明の光触媒組成物(C)から生成する光触媒含有皮膜の耐クラック性が向上する結果、耐候性が非常に優れたものとなる。
−(R2 2SiO)− (7)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。)
Further, as the alkyl group-containing silicone (BA) to be mixed with the phenyl group-containing silicone (BP1), the monooxydiorganosilane unit (D) represented by the formula (7) and the diester represented by the formula (8) are used. When a oxyorganosilane unit (T) having a structure having a molar ratio of preferably (D) / (T) = 100/0 to 5/95, more preferably 90/10 to 10/90 is used. As a result, the stress relaxation action of the alkyl group-containing silicone (BA) is increased, and the crack resistance of the photocatalyst-containing film produced from the photocatalyst composition (C) of the present invention is improved, resulting in extremely excellent weather resistance. .
— (R 2 2 SiO) — (7)
(In the formula, each R 2 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Represents an alkenyl group of
(式中、R2は式(7)で定義した通りである。)
本発明において、長期の耐候性向上には、バインダー成分(B)が相分離構造を形成することが好ましく、特にミクロ相分離した構造を形成することが好ましい。
たとえば、バインダー成分(B)として、上述した光触媒(a)、特に該変性光触媒(A)より表面エネルギーが高いバインダー樹脂(B’)と上記式(6)で表されるアルキル基含有シリコーン(BA)とを、好ましくは質量比(B’)/(BA)=5/95〜95/5、より好ましくは(B’)/(BA)=30/70〜90/10で混合したものを用いると、本発明の光触媒組成物(C)から形成される光触媒含有皮膜は、表面エネルギーが高いバインダー樹脂(B’)とアルキル基含有シリコーン(BA)が相分離したバインダー中に光触媒(a)が分散した構造となり、長期の耐候性に優れたものとなるため好ましい。
(Wherein R 2 is as defined in formula (7).)
In the present invention, in order to improve long-term weather resistance, the binder component (B) preferably forms a phase separation structure, and particularly preferably forms a microphase separation structure.
For example, as the binder component (B), the above-mentioned photocatalyst (a), particularly the binder resin (B ′) having a higher surface energy than the modified photocatalyst (A) and the alkyl group-containing silicone (BA) represented by the above formula (6) ), Preferably in a mass ratio (B ′) / (BA) = 5/95 to 95/5, more preferably (B ′) / (BA) = 30/70 to 90/10 The photocatalyst-containing film formed from the photocatalyst composition (C) of the present invention has a photocatalyst (a) in a binder in which a binder resin (B ′) and an alkyl group-containing silicone (BA) having a high surface energy are phase-separated. This is preferable because it has a dispersed structure and excellent long-term weather resistance.
ここで、表面エネルギーが高いバインダー成分(B’)とアルキル基含有シリコーン(BA)の相分離は、連続層でない相が好ましくは1nm3〜1μm3、より好ましくは10nm3〜0.1μm3、さらに好ましくは10nm3〜0.001μm3の大きさのドメインを形成してミクロ相分離した場合に、より効果を奏する。
また、光触媒(a)が、表面エネルギーの高いバインダー樹脂(B’)と相分離状態にあるアルキル基含有シリコーン(BA)相中に存在した状態は、光触媒含有皮膜の表面により多く光触媒(a)が存在することができるため好ましい。
本発明におけるアルキル基含有シリコーン(BA)と相分離する表面エネルギーの高いバインダー樹脂(B’)としては、上述したフェニル基含有シリコーン(BP)が、その骨格を成すシロキサン結合(−O−Si−)は光触媒作用による酸化分解がおこらないため好ましく、アルキル基を含有しないフェニル基含有シリコーン(BP1)が特に好ましい。
Here, the phase separation between the binder component (B ′) having a high surface energy and the alkyl group-containing silicone (BA) is preferably a phase that is not a continuous layer, preferably 1 nm 3 to 1 μm 3 , more preferably 10 nm 3 to 0.1 μm 3 , More preferably, a more effective effect can be obtained when a domain having a size of 10 nm 3 to 0.001 μm 3 is formed and microphase separation is performed.
In addition, the state in which the photocatalyst (a) is present in the alkyl group-containing silicone (BA) phase in a phase-separated state with the binder resin (B ′) having a high surface energy is more on the surface of the photocatalyst-containing film. Is preferred because it can be present.
As the binder resin (B ′) having a high surface energy that is phase-separated from the alkyl group-containing silicone (BA) in the present invention, the above-mentioned phenyl group-containing silicone (BP) is a siloxane bond (—O—Si—) constituting the skeleton. ) Is preferable because it does not undergo oxidative degradation due to photocatalysis, and phenyl group-containing silicone (BP1) not containing an alkyl group is particularly preferable.
この際、上記フェニル基含有シリコーン(BP1)及び上記アルキル基含有シリコーン(BA)の各々の、GPCで測定したポリスチレン換算重量平均分子量が、好ましくは100〜10,000、より好ましくは500〜6,000、さらに好ましくは700〜4,000であるものを使用すると、上述したバインダー成分(B)はミクロ相分離構造を容易に形成するため好ましい。
本発明の光触媒組成物(C)に使用する前述したバインダー成分(B)は、溶剤に溶けたタイプ、溶媒に分散したタイプ、溶媒と混合されていないタイプ(液体、固体)のいずれであっても良い。
At this time, each of the phenyl group-containing silicone (BP1) and the alkyl group-containing silicone (BA) has a polystyrene-reduced weight average molecular weight measured by GPC, preferably 100 to 10,000, more preferably 500 to 6, 000, more preferably 700 to 4,000, is preferable because the above-described binder component (B) easily forms a microphase separation structure.
The binder component (B) used in the photocatalyst composition (C) of the present invention is any of a type dissolved in a solvent, a type dispersed in a solvent, and a type not mixed with a solvent (liquid or solid). Also good.
本発明の光触媒組成物(C)において上記式(4)で示されるフェニル基含有シリコーン(BP)は、反応性を有する基(式(4)中のX)を有しても、有さなくても良いが、反応性を有する基(式(4)中のX)を有する(即ち、式(4)において0<r)と、本発明の光触媒組成物(C)から得られる光触媒含有皮膜は、硬度や耐熱性、抗菌性、防カビ性、耐薬品性、耐久性等に優れたものとなるため好ましい。また、同様の理由から、式(5)において0<t、式(6)において0<vが好ましい。
本発明の光触媒組成物(C)において上記式(4)で示されるフェニル基含有シリコーン(BP)が反応性を有する基(式(4)中のX)として、水酸基及び/又は加水分解性基を有する場合、従来公知の加水分解触媒や硬化触媒を、フェニル基含有シリコーン(BP)に対し、好ましくは0.01〜20質量%、より好ましくは0.1〜5質量%の割合で添加することができる。
In the photocatalyst composition (C) of the present invention, the phenyl group-containing silicone (BP) represented by the above formula (4) does not have a reactive group (X in the formula (4)). A photocatalyst-containing film obtained from the photocatalyst composition (C) of the present invention having a reactive group (X in formula (4) (that is, 0 <r in formula (4)). Is preferable because it is excellent in hardness, heat resistance, antibacterial property, antifungal property, chemical resistance, durability and the like. For the same reason, 0 <t in formula (5) and 0 <v in formula (6) are preferable.
In the photocatalyst composition (C) of the present invention, the phenyl group-containing silicone (BP) represented by the above formula (4) has a reactive group (X in the formula (4)) as a hydroxyl group and / or a hydrolyzable group. In the case where it has, a conventionally known hydrolysis catalyst or curing catalyst is preferably added in an amount of 0.01 to 20% by mass, more preferably 0.1 to 5% by mass with respect to the phenyl group-containing silicone (BP). be able to.
該加水分解触媒としては、酸性のハロゲン化水素、カルボン酸、スルホン酸、酸性あるいは弱酸性の無機塩、イオン交換樹脂などの固体酸などが好ましい。
また、加水分解触媒の量は、ケイ素原子上の加水分解性基1モルに対して好ましくは0.001〜5モルの範囲内であることが好ましい。
また上記硬化触媒としては、例えば水酸化ナトリウム、水酸化カリウム、ナトリウムメチラート、酢酸ナトリウム、テトラメチルアンモニウムクロライド、テトラメチルアンモニウムヒドロキシドのごとき塩基性化合物類;トリブチルアミン、ジアザビシクロウンデセン、エチレンジアミン、ジエチレントリアミン、エタノールアミン類、γ−アミノプロピルトリメトキシシラン、γ−(2−アミノエチル)−アミノプロピルトリメトキシシランのごときアミン化合物;テトライソプロピルチタネート、テトラブチルチタネートのようなチタン化合物;アルミニウムトリイソプロポキシド、アルミニウムアセチルアセトナート、過塩素酸アルミニウム、塩化アルミニウムのようなアルミニウム化合物;錫アセチルアセトナート、ジブチル錫オクチレート、ジブチル錫ジラウレートのような錫化合物;コバルトオクチレート、コバルトアセチルアセトナート、鉄アセチルアセトナートのごとき含金属化合物類;リン酸、硝酸、フタル酸、p−トルエンスルホン酸、トリクロル酢酸のごとき酸性化合物類などが挙げられる。
The hydrolysis catalyst is preferably an acidic hydrogen halide, a carboxylic acid, a sulfonic acid, an acidic or weakly acidic inorganic salt, or a solid acid such as an ion exchange resin.
The amount of the hydrolysis catalyst is preferably in the range of 0.001 to 5 mol with respect to 1 mol of the hydrolyzable group on the silicon atom.
Examples of the curing catalyst include basic compounds such as sodium hydroxide, potassium hydroxide, sodium methylate, sodium acetate, tetramethylammonium chloride, tetramethylammonium hydroxide; tributylamine, diazabicycloundecene, ethylenediamine. Amine compounds such as diethylenetriamine, ethanolamines, γ-aminopropyltrimethoxysilane, γ- (2-aminoethyl) -aminopropyltrimethoxysilane; titanium compounds such as tetraisopropyl titanate, tetrabutyl titanate; Aluminum compounds such as propoxide, aluminum acetylacetonate, aluminum perchlorate, aluminum chloride; tin acetylacetonate, dibutyltin octoate Tin compounds such as tyrates and dibutyltin dilaurate; metal-containing compounds such as cobalt octylate, cobalt acetylacetonate and iron acetylacetonate; acidic such as phosphoric acid, nitric acid, phthalic acid, p-toluenesulfonic acid and trichloroacetic acid Examples thereof include compounds.
本発明の光触媒組成物(C)において上記式(4)で示されるフェニル基含有シリコーン(BP)がSi−H基を有する場合、多官能アルケニル化合物のごとき架橋剤を、Si−H基に対しアルケニル基が好ましくは0.01〜2当量、より好ましくは0.1〜1当量となるように添加することが好ましい。該多官能アルケニル合物としては、アルケニル基を有しSi−H基と反応して硬化を促進するものであれば何でもよいが、ビニル基、アリル基、ヘキセニル基などの炭素数2〜30の1価不飽和炭化水素基を有するアルケニル基含有シリコーンが一般に用いられている。 In the photocatalyst composition (C) of the present invention, when the phenyl group-containing silicone (BP) represented by the above formula (4) has a Si—H group, a crosslinking agent such as a polyfunctional alkenyl compound is used for the Si—H group. The alkenyl group is preferably added so that the amount is preferably 0.01 to 2 equivalents, more preferably 0.1 to 1 equivalents. The polyfunctional alkenyl compound may be anything as long as it has an alkenyl group and reacts with the Si—H group to accelerate curing, but has 2 to 30 carbon atoms such as a vinyl group, an allyl group, or a hexenyl group. Alkenyl group-containing silicones having monounsaturated hydrocarbon groups are generally used.
また、Si−H基と該多官能アルケニル化合物の反応を促進する目的で、触媒をフェニル基含有シリコーン(BP)と多官能アルケニル化合物の総量に対しに好ましくは1〜10000ppm、より好ましくは1〜1000ppmの割合で添加しても良い。該触媒としては白金族触媒、すなわちルテニウム、ロジウム、パラジウム、オスミウム、イリジウム、白金の化合物が適しているが、特に白金の化合物とパラジウムの化合物が好適である。白金の化合物としては、例えば塩化白金(II)、テトラクロロ白金酸(II)、塩化白金(IV)、ヘキサクロロ白金酸(IV)、ヘキサクロロ白金(IV)アンモニウム、ヘキサクロロ白金(IV)カリウム、水酸化白金(II)、二酸化白金(IV)、ジクロロ−ジシクロペンタジエニル−白金(II)、白金−ビニルシロキサン錯体、白金−ホスフィン錯体、白金−オレフィン錯体や白金の単体、アルミナやシリカや活性炭に固体白金を担持させたものが挙げられる。パラジウムの化合物としては、例えば塩化パラジウム(II)、塩化テトラアンミンパラジウム(II)酸アンモニウム、酸化パラジウム(II)等が挙げられる。該白金族触媒はSi−H基含有シリコーンと多官能アルケニル化合物の合計量に対し白金族金属の量で好ましくは5〜1000ppmの範囲内で使用されるが、これは反応性、経済性及び所望の硬化速度等に応じて増減させることができる。また、所望により白金族触媒の活性を抑制し、ポットライフを延長させる目的で、各種の有機窒素化合物、有機リン化合物、アセチレン系化合物などの活性抑制剤を添加してもよい。 Further, for the purpose of promoting the reaction between the Si—H group and the polyfunctional alkenyl compound, the catalyst is preferably 1 to 10000 ppm, more preferably 1 to 10000 based on the total amount of the phenyl group-containing silicone (BP) and the polyfunctional alkenyl compound. You may add in the ratio of 1000 ppm. As the catalyst, a platinum group catalyst, that is, a ruthenium, rhodium, palladium, osmium, iridium, or platinum compound is suitable, and a platinum compound and a palladium compound are particularly suitable. Examples of platinum compounds include platinum chloride (II), tetrachloroplatinic acid (II), platinum chloride (IV), hexachloroplatinic acid (IV), hexachloroplatinum (IV) ammonium, hexachloroplatinum (IV) potassium, hydroxide Platinum (II), platinum dioxide (IV), dichloro-dicyclopentadienyl-platinum (II), platinum-vinylsiloxane complex, platinum-phosphine complex, platinum-olefin complex, platinum simple substance, alumina, silica and activated carbon The thing which carry | supported solid platinum is mentioned. Examples of the palladium compound include palladium (II) chloride, ammonium tetraamminepalladium (II) chloride, palladium (II) oxide and the like. The platinum group catalyst is preferably used in an amount of 5 to 1000 ppm in terms of platinum group metal based on the total amount of Si-H group-containing silicone and polyfunctional alkenyl compound. It can be increased / decreased according to the curing rate and the like. Moreover, you may add activity inhibitors, such as various organic nitrogen compounds, an organic phosphorus compound, and an acetylene type compound, for the purpose of suppressing the activity of a platinum group catalyst and extending pot life if desired.
また、本発明の光触媒組成物(C)には、それから形成される光触媒含有皮膜の硬度や耐擦傷性、親水性を向上させる目的でシリカ、アルミナ、酸化ジルコニウム、酸化アンチモン、希土類酸化物等の金属酸化物微粒子を粉末あるいはゾルの状態で添加しても良い。ただしこれら金属酸化物微粒子は、本発明におけるバインダー成分(B)の様なバインダーとしての能力はなく、光触媒と同様に皮膜の柔軟性(耐屈曲性、耐衝撃性)を低下させる。よって、該金属酸化物の添加量は、光触媒組成物(C)から形成される光触媒含有皮膜中において光触媒(A)と金属酸化物の総重量が50質量%以下とすることが好ましい。 Further, the photocatalyst composition (C) of the present invention includes silica, alumina, zirconium oxide, antimony oxide, rare earth oxide and the like for the purpose of improving the hardness, scratch resistance and hydrophilicity of the photocatalyst-containing film formed therefrom. Metal oxide fine particles may be added in the form of powder or sol. However, these metal oxide fine particles do not have the ability as a binder like the binder component (B) in the present invention, and reduce the flexibility (flexibility and impact resistance) of the film as with the photocatalyst. Therefore, the addition amount of the metal oxide is preferably such that the total weight of the photocatalyst (A) and the metal oxide is 50% by mass or less in the photocatalyst-containing film formed from the photocatalyst composition (C).
本発明の光触媒組成物(C)は、無溶媒の状態(液体、固体)であっても溶媒に溶解あるいは分散した状態であっても良く、特に制限はないが、コーティング剤として用いる場合は、溶媒に対し溶解あるいは分散した状態が好ましい。この際、該光触媒組成物(C)中の変性光触媒(A1)とバインダー成分(B)の総量は、好ましくは0.01〜95質量%、より好ましくは0.1〜70質量%である。 The photocatalyst composition (C) of the present invention may be in a solvent-free state (liquid, solid) or dissolved or dispersed in a solvent, and is not particularly limited, but when used as a coating agent, A dissolved or dispersed state in a solvent is preferred. At this time, the total amount of the modified photocatalyst (A1) and the binder component (B) in the photocatalyst composition (C) is preferably 0.01 to 95% by mass, more preferably 0.1 to 70% by mass.
本発明の光触媒組成物(C)に用いる溶媒としては、例えば水やエチレングリコール、ブチルセロソルブ、イソプロパノール、n−ブタノール、エタノール、メタノール等のアルコール類、トルエンやキシレン等の芳香族炭化水素類、ヘキサン、シクロヘキサン、ヘプタン等の脂肪族炭化水素類、酢酸エチル、酢酸n−ブチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、クロロホルム、塩化メチレン、四塩化炭素等のハロゲン化合物類、ジメチルスルホキシド、ニトロベンゼン等が挙げられる。これらの溶媒は、単独で又は組み合わせて用いられる。 Examples of the solvent used in the photocatalyst composition (C) of the present invention include water, alcohols such as ethylene glycol, butyl cellosolve, isopropanol, n-butanol, ethanol and methanol, aromatic hydrocarbons such as toluene and xylene, hexane, Aliphatic hydrocarbons such as cyclohexane and heptane, esters such as ethyl acetate and n-butyl acetate, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ethers such as tetrahydrofuran and dioxane, dimethylacetamide, dimethylformamide and the like Amides, halogen compounds such as chloroform, methylene chloride, carbon tetrachloride, dimethyl sulfoxide, nitrobenzene and the like can be mentioned. These solvents are used alone or in combination.
また、本発明の光触媒組成物(C)には、必要により通常、塗料に添加配合される成分、例えば顔料、充填剤、分散剤、光安定剤、湿潤剤、増粘剤、レオロジーコントロール剤、消泡剤、可塑剤、成膜助剤、防錆剤、染料、防腐剤等がそれぞれの目的に応じて選択、組み合わせて配合することができる。
本発明の光触媒組成物(C)において、自己傾斜性が非常に高い場合(即ち、皮膜中の変性光触媒(A)含有量(濃度)100に対し、アルミニウム建材基材でない側である、露出面と接する表面近傍の相対濃度が好ましくは150以上、より好ましくは200以上である場合)、該光触媒組成物(C)において変性光触媒(A)とバインダー成分(B)の質量比が好ましくは(A)/(B)=0.1/99.9〜40/60、より好ましくは(A)/(B)=0.1/99.9〜30/70という変性光触媒(A)の含有量が非常に少ない範囲においてさえ、形成される皮膜は、光照射による優れた光触媒活性を有する。また、この様に光触媒含有量が少ない皮膜はバインダー成分(B)本来の物性を発現するため、強度や柔軟性(耐屈曲性、耐衝撃性)等に優れたものとなる。
In addition, the photocatalyst composition (C) of the present invention usually contains components that are usually added to the paint as necessary, for example, pigments, fillers, dispersants, light stabilizers, wetting agents, thickeners, rheology control agents, An antifoaming agent, a plasticizer, a film forming aid, a rust preventive agent, a dye, a preservative, and the like can be selected, combined and blended depending on the purpose.
In the photocatalyst composition (C) of the present invention, when the self-gradient property is very high (that is, the exposed surface that is not the aluminum building material substrate with respect to the modified photocatalyst (A) content (concentration) of 100 in the film). When the relative concentration in the vicinity of the surface in contact with is preferably 150 or more, more preferably 200 or more), the mass ratio of the modified photocatalyst (A) to the binder component (B) is preferably (A ) / (B) = 0.1 / 99.9 to 40/60, more preferably (A) / (B) = 0.1 / 99.9 to 30/70 content of the modified photocatalyst (A) Even in a very small range, the film formed has excellent photocatalytic activity by light irradiation. In addition, such a film having a low photocatalyst content exhibits the original physical properties of the binder component (B), and thus has excellent strength and flexibility (flexibility, impact resistance) and the like.
本発明における機能性アルミニウム建材は、例えば上記光触媒組成物(C)をアルミニウム建材基材に塗布し、乾燥した後、所望により好ましくは20℃〜500℃、より好ましくは30℃〜200℃の熱処理や紫外線照射等を行い、皮膜を形成することにより得ることができる。上記塗布方法としては、例えばスプレー吹き付け法、フローコーティング法、ロールコート法、刷毛塗り法、キャスティング法、スポンジ塗り法、ナイフコ−ト法、グラビアコ−ト法、スクリ−ンコ−ト法、彫刻ロ−ルコ−ト法、フレキソコ−ト法あるいはディッピング法さらには電着塗装あるいは静電塗装等の公知の方法が挙げられる。
この際、本発明の光触媒組成物(C)から形成される皮膜の膜厚は、好ましくは0.1〜200μm、より好ましくは0.2〜20μm、さらに好ましくは0.5〜10μmである。
この際、皮膜の状態は、連続膜であっても、不連続膜、島状分散膜等の態様であっても構わない。
The functional aluminum building material in the present invention is preferably heat-treated at 20 ° C. to 500 ° C., more preferably 30 ° C. to 200 ° C., if desired, after applying the photocatalyst composition (C) to an aluminum building material substrate and drying, for example. Or by irradiating with ultraviolet rays or the like to form a film. Examples of the coating method include spraying, flow coating, roll coating, brush coating, casting, sponge coating, knife coating, gravure coating, screen coating, engraving roll, and the like. -Known methods such as a lacquer method, a flexo coat method, a dipping method, and electrodeposition coating or electrostatic coating.
Under the present circumstances, the film thickness of the film | membrane formed from the photocatalyst composition (C) of this invention becomes like this. Preferably it is 0.1-200 micrometers, More preferably, it is 0.2-20 micrometers, More preferably, it is 0.5-10 micrometers.
At this time, the state of the film may be a continuous film, a discontinuous film, an island-shaped dispersion film, or the like.
本発明の機能性アルミニウム建材の表面層には、Ag、Cu、Znのような金属を添加することができる。前記金属を添加した表面層は、表面に付着した細菌や黴を暗所でも死滅させることができる。
本発明の機能性アルミニウム建材は、アルミニウムまたはアルミ合金からなる基材の表面に陽極酸化皮膜が形成され、さらにこの陽極酸化皮膜上に光触媒含有皮膜が形成されたものが好ましい。陽極酸化皮膜は絶縁膜であり、しかも表面に直径約5nm〜200nmの細孔が無数に開いた微多孔質で、しかも凹凸のある構造を有している。従って、その絶縁効果によってアルミ合金地金に対する光触媒の酸化還元作用がある程度バリヤーされ、しかも、微多孔質構造によるアンカー効果によって、本発明の光触媒含有皮膜の密着性を向上させることができる。
本発明の機能性アルミニウム建材を得るのに使用できるアルミニウム建材基材には、下地調整、密着性向上、多孔質基材の目止め、平滑化、模様付けなどを目的として、予め表面処理を施すこともできる。表面処理としては、例えば、研磨、脱脂、メッキ処理、クロメート 処理、火炎処理、カップリング処理などを挙げることができる。
Metals such as Ag, Cu, and Zn can be added to the surface layer of the functional aluminum building material of the present invention. The surface layer to which the metal is added can kill bacteria and sputum attached to the surface even in the dark.
The functional aluminum building material of the present invention is preferably such that an anodized film is formed on the surface of a base material made of aluminum or an aluminum alloy, and further a photocatalyst-containing film is formed on the anodized film. The anodized film is an insulating film, and has a microporous structure with irregularities with numerous pores having a diameter of about 5 nm to 200 nm opened on the surface. Therefore, the oxidation / reduction action of the photocatalyst on the aluminum alloy metal is barriered to some extent by the insulating effect, and the adhesion of the photocatalyst-containing film of the present invention can be improved by the anchor effect by the microporous structure.
The aluminum building material base material that can be used to obtain the functional aluminum building material of the present invention is subjected to surface treatment in advance for the purpose of adjusting the foundation, improving adhesion, sealing the porous base material, smoothing, and patterning. You can also Examples of the surface treatment include polishing, degreasing, plating treatment, chromate treatment, flame treatment, and coupling treatment.
本発明の機能性アルミニウム建材は光触媒含有皮膜に含まれる光触媒(a)のバンドギャップエネルギーよりも高いエネルギーの光(励起光)を照射することにより光触媒活性を示し、優れた防汚性、抗菌性、防カビ性を発現する。この際、光触媒(a)が、上述した式(1)で表されるトリオルガノシラン単位、式(2)で表されるモノオキシジオルガノシラン単位、式(3)で表されるジオキシオルガノシラン単位よりなる群から選ばれる少なくとも1種の構造単位を有する化合物類よりなる群から選ばれる少なくとも1種の変性剤化合物(b)で変性処理された変性光触媒(A)である場合、励起光照射により光触媒(a)粒子の近傍に存在する該変性剤化合物(b)の珪素原子に結合した有機基(R)の少なくとも一部は、光触媒の分解作用により水酸基に置換される。その結果、本発明の皮膜表面の親水性が高まると共に、生成した水酸基同士が脱水縮合反応してシロキサン結合が生成した場合には、該皮膜の硬度が非常に高くなる。この様な状態は、本発明の様態において好ましい。 The functional aluminum building material of the present invention exhibits photocatalytic activity when irradiated with light (excitation light) having an energy higher than the band gap energy of the photocatalyst (a) contained in the photocatalyst-containing coating, and exhibits excellent antifouling and antibacterial properties. , Expresses fungicidal properties. At this time, the photocatalyst (a) is a triorganosilane unit represented by the above formula (1), a monooxydiorganosilane unit represented by the formula (2), or a dioxyorgano represented by the formula (3). In the case of the modified photocatalyst (A) modified with at least one modifier compound (b) selected from the group consisting of compounds having at least one structural unit selected from the group consisting of silane units, excitation light At least a part of the organic group (R) bonded to the silicon atom of the modifier compound (b) present in the vicinity of the photocatalyst (a) particles by irradiation is substituted with a hydroxyl group by the decomposition action of the photocatalyst. As a result, the hydrophilicity of the surface of the film of the present invention is increased, and when the generated hydroxyl groups are subjected to a dehydration condensation reaction to form a siloxane bond, the hardness of the film becomes very high. Such a state is preferable in the aspect of the present invention.
また、バインダー成分(B)として上述したシリコーンを用いたときも同様に、励起光照射により光触媒(a)粒子の近傍に存在するシリコーンの珪素原子に結合した有機基の少なくとも一部は、光触媒の分解作用により水酸基に置換され、本発明の皮膜表面の親水性が高まると共に、生成した水酸基同士の脱水縮合反応が進行しシロキサン結合が生成した場合には、該皮膜の硬度が非常に高くなる。この様な状態は、本発明の様態において好ましい。
本発明において、光触媒(a)のバンドギャップエネルギーよりも高いエネルギーの光の光源としては、太陽光や室内照明灯等の一般住宅環境下で得られる光の他、ブラックライト、キセノンランプ、水銀灯、LED等の光が利用できる。
Similarly, when the above-described silicone is used as the binder component (B), at least a part of the organic group bonded to the silicon atom of the silicone present in the vicinity of the photocatalyst (a) particles by excitation light irradiation is the photocatalyst. When the hydroxyl group is substituted by the decomposition action to increase the hydrophilicity of the surface of the film of the present invention, and when a dehydration condensation reaction between the generated hydroxyl groups proceeds to form a siloxane bond, the hardness of the film becomes very high. Such a state is preferable in the aspect of the present invention.
In the present invention, as a light source having a higher energy than the band gap energy of the photocatalyst (a), in addition to light obtained in a general residential environment such as sunlight and indoor lighting, black light, xenon lamp, mercury lamp, Light such as LED can be used.
以下の実施例、参考例及び比較例により本発明を具体的に説明するが、これらは本発明の範囲を限定するものではない。
実施例、参考例及び比較例中において、各種の物性は下記の方法で測定した。
1.粒径分布及び数平均粒子径
試料中の光触媒含有量が1〜20質量%となるよう適宜溶媒を加えて希釈し、湿式粒度分析計(日機装製マイクロトラックUPA−9230)を用いて測定した。
2.重量平均分子量
ポリスチレン標品を用いて作成した検量線を用い、ゲルパーミエーションクロマトグラフィー(GPC)によって求めた。
GPCの条件は以下の通りである。
・装置:東ソー製HLC−8020 LC−3A型クロマトグラフ
・カラム:TSKgel G1000HXL、TSKgel G2000HXLおよびTSKgel G4000HXL(いずれも東ソー製)を直列に接続して用いた。
・データ処理装置:島津製作所製CR−4A型データ処理装置
・移動相:
テトラヒドロフラン(フェニル基含有シリコーンの分析に使用)
トルエン(フェニル基を含有しないシリコーンの分析に使用)
・流速:1.0ml/min.
・サンプル調製法
移動相に使用する溶媒で希釈(濃度は0.5〜2重量%の範囲で適宜調節した)して分析に供した。
The present invention will be specifically described by the following examples, reference examples and comparative examples, but these do not limit the scope of the present invention.
In Examples, Reference Examples and Comparative Examples, various physical properties were measured by the following methods.
1. Particle size distribution and number average particle size The sample was diluted with an appropriate solvent so that the photocatalyst content in the sample was 1 to 20% by mass, and measured using a wet particle size analyzer (Nikkiso Microtrac UPA-9230).
2. Weight average molecular weight It calculated | required by the gel permeation chromatography (GPC) using the analytical curve created using the polystyrene sample.
The conditions for GPC are as follows.
Apparatus: Tosoh HLC-8020 LC-3A type chromatograph column: TSKgel G1000H XL , TSKgel G2000H XL, and TSKgel G4000H XL (all manufactured by Tosoh) were used in series.
-Data processing device: CR-4A type data processing device manufactured by Shimadzu Corporation-Mobile phase:
Tetrahydrofuran (used for analysis of phenyl group-containing silicone)
Toluene (used to analyze silicones that do not contain phenyl groups)
-Flow rate: 1.0 ml / min.
-Sample preparation method It diluted with the solvent used for a mobile phase (concentration was adjusted suitably in the range of 0.5-2 weight%), and used for the analysis.
3.赤外線吸収スペクトル
日本分光製FT/IR−5300型赤外分光計を用いて測定した。
4.29Si核磁気共鳴の測定
日本電子製JNM−LA400を用いて測定した。
5.皮膜硬度
JIS−K5400に準じ、鉛筆硬度(塗膜のすり傷)として求めた。
6.紫外線照射後の皮膜硬度
皮膜表面に、東芝ライテック製FL20S BLB型ブラックライトの光を7日間照射後、上記の方法(5)にて測定した。
なおこのとき、トプコン製UVR−2型紫外線強度計{受光部として、トプコン製UD−36型受光部(波長310〜400nmの光に対応)を使用}を用いて測定した紫外線強度が1mW/cm2となるよう調整した。
3. Infrared absorption spectrum The infrared absorption spectrum was measured using a FT / IR-5300 type infrared spectrometer manufactured by JASCO Corporation.
4). Measurement of 29 Si nuclear magnetic resonance Measurement was performed using JNM-LA400 manufactured by JEOL.
5). Film hardness It calculated | required as pencil hardness (scratch of a coating film) according to JIS-K5400.
6). Film hardness after ultraviolet irradiation The surface of the film was irradiated with light of FL20S BLB type black light manufactured by Toshiba Lighting & Technology for 7 days, and then measured by the above method (5).
At this time, the UV intensity measured using a Topcon UVR-2 type UV intensity meter {using a TOPCON UD-36 type light receiving part (corresponding to light with a wavelength of 310 to 400 nm) as the light receiving part} is 1 mW / cm. It was adjusted to be 2 .
7.試料表面に対する水の接触角
試料の表面に脱イオン水の滴を乗せ、20℃で1分間放置した後、協和界面科学製CA−X150型接触角計を用いて測定した。
水の接触角が小さいほど、試料表面は親水性が高い。
8.紫外線照射前後の、試料表面の親水性(疎水性)の変化
試料表面に、上記6の方法で紫外線を7日間照射した後、上記7の方法にて水の接触角を測定した。
9.耐候性(光沢保持率)
スガ試験器製DPWL−5R型デューパネル光コントロールウェザーメーターを使用して曝露試験(照射:60℃4時間、暗黒・湿潤:40℃4時間)を行った。曝露1000時間後の60°−60°鏡面反射率を最終的な光沢値として測定し、これを初期光沢値で割り、この値を光沢保持率として算出した。
7). Contact angle of water with respect to sample surface A drop of deionized water was placed on the surface of the sample and left at 20 ° C. for 1 minute, and then measured using a CA-X150 contact angle meter manufactured by Kyowa Interface Science.
The smaller the water contact angle, the more hydrophilic the sample surface.
8). Change in hydrophilicity (hydrophobicity) of the sample surface before and after ultraviolet irradiation After the sample surface was irradiated with ultraviolet rays for 7 days by the method 6 above, the contact angle of water was measured by the method 7 above.
9. Weather resistance (gloss retention)
An exposure test (irradiation: 60 ° C. for 4 hours, dark / wet: 40 ° C. for 4 hours) was performed using a DPWL-5R type dew panel light control weather meter manufactured by Suga Test Instruments. The 60 ° -60 ° specular reflectance after 1000 hours of exposure was measured as the final gloss value, divided by the initial gloss value, and this value was calculated as the gloss retention.
10.光触媒の傾斜構造の評価
試料をエポキシ樹脂(Quetol812)に包埋後、独国Reichert社製ULTRACUT−N型ミクロトームにより50〜60nmの厚さの超薄切片を作成し、支持膜を張ったメッシュに積載した。続いて5分程度のRuO4蒸気染色を施した後、カーボン蒸着を行い検鏡用試料とし、TEMにより塗膜断面の観察を実施した。
TEM観察の条件は以下の通りである。
・装置:日立製HF2000型
・加速電圧:125kV
また、光触媒酸化チタンの存在場所は、Ti元素のEDX分析により解析した。
また、アクリルウレタン系のベースコート層を有するアルミ板上に形成させた皮膜の観察は、試料をDISCOエンジニアリングサービス製DAD321型ダイシングソーで粗切断した後、FIB(Focused Ion Beam)加工を行い、TEMによる皮膜断面の観察を実施した。
FIB加工条件は以下の通りである。
使用機器:日立製FB2000型
加工条件:加速電圧(30kV)
イオン源:Ga
また、TEM観察の条件は以下の通りである。
・装置:日立製HF2000型
・加速電圧:200kV
10. Evaluation of inclined structure of photocatalyst After embedding the sample in an epoxy resin (Quetol 812), an ultrathin section having a thickness of 50 to 60 nm was prepared with a ULTRACUT-N type microtome manufactured by Reichert, Germany, and applied to a mesh with a supporting film. Loaded. Subsequently, RuO 4 vapor dyeing was performed for about 5 minutes, and then carbon deposition was performed to prepare a microscopic sample, and a coating cross section was observed by TEM.
The conditions for TEM observation are as follows.
・ Device: Hitachi HF2000 type ・ Acceleration voltage: 125kV
The location of photocatalytic titanium oxide was analyzed by EDX analysis of Ti element.
In addition, observation of the film formed on the aluminum plate having the acrylic urethane base coat layer was performed by roughly cutting the sample with a DAD321 type dicing saw manufactured by DISCO Engineering Service, performing FIB (Focused Ion Beam) processing, and using TEM Observation of the cross section of the film was performed.
The FIB processing conditions are as follows.
Equipment used: Hitachi FB2000 machining conditions: Acceleration voltage (30 kV)
Ion source: Ga
The conditions for TEM observation are as follows.
・ Device: Hitachi HF2000 ・ Acceleration voltage: 200kV
11.耐衝撃性
JIS−K5400に準じ、デュポン式(500g×50cm)で評価した。
12.密着性
試験片 に対し、スコッチテープ試験(JIS H 8602の 5.8項に記載のセロハン粘着テープを用いた皮膜の付着性試験)を行い、またJIS H 8504に規定する方法にしたがってスクラッチ試験を行い、それぞれ皮膜の密着性をテストした。
11. Impact resistance In accordance with JIS-K5400, the DuPont type (500 g x 50 cm) was evaluated.
12 Adhesion test piece is subjected to a scotch tape test (film adhesion test using cellophane adhesive tape described in 5.8 of JIS H 8602), and a scratch test is performed according to the method specified in JIS H 8504. Each was tested for film adhesion.
13.防カビ試験
あらかじめ滅菌しておいたポテトデキストロース寒天培地をシャーレに入れ固化させた。その寒天培地の上に試験片(5cm×1cm)を置いた。続いて0.005質量%のスルホコハク酸ジオクチルナトリウム水溶液10mlに別途培養したアスペルギルス・ニガー(IFO 4414)を5白金耳取り、遠心分離により胞子を分離した。その胞子をGPLP培地10mlに入れた菌液をシャーレのテストピースの上に噴霧し、室温で14日間蛍光灯(100W)を照射後、試料の外観(目視で評価)に基づき、防カビ性を以下の2段階で評価した。
○:菌糸の生育なし
×:菌糸が表面を50〜100%覆う
13. Antifungal test A potato dextrose agar medium sterilized in advance was placed in a petri dish and solidified. A test piece (5 cm × 1 cm) was placed on the agar medium. Subsequently, 5 platinum Aspergillus niger (IFO 4414) separately cultured in 10 ml of a 0.005% by mass dioctyl sodium sulfosuccinate aqueous solution was collected, and spores were separated by centrifugation. After spraying the spore in 10 ml of GPLP medium onto a petri dish test piece and irradiating it with a fluorescent lamp (100 W) at room temperature for 14 days, it is resistant to mold based on the appearance of the sample (visually evaluated). Evaluation was made in the following two stages.
○: No growth of hyphae ×: Mycelia cover 50-100% of the surface
14.紫外線照射による抗菌性試験
5cm×1cmの試料を殺菌されたプラスチックシャーレに入れ、大腸菌の菌数が約105個/mlとなるように調整された菌液を、それぞれのシャーレ中の試料に0.5mlずつ滴下し、シャーレをポリエチレンフィルムで覆い外気と遮断し、検体試料上の菌液の乾燥と外部からの菌の侵入を防止した。続いて、シャーレの外から東芝ライテック製FL20SBLB型ブラックライトの光を4時間照射した後、シャーレの試料から菌液を洗い出し、培地に移して、その生菌数を測定し、次式により求めた死滅率に基づき、抗菌性を以下の3段階で評価した。
死滅率={(当初生菌数−試験後の生菌数)/当初生菌数}×100
○:死滅率80%以上
△:死滅率20%以上80%未満
×:死滅率20%未満
紫外線強度は、トプコン製UVR−2型紫外線強度計{受光部として、トプコン製UD−36型受光部(波長310〜400nmの光に対応)を使用}を用いて測定した紫外線強度が2mW/cm2となるよう調整した。
14 Placed in a sample a plastic petri dish which has been sterilized antimicrobial test 5 cm × 1 cm by ultraviolet irradiation, the bacterial solution prepared as the number of bacteria E. coli is about 10 5 / ml, the sample in each dish 0 Each 5 ml was dropped, and the petri dish was covered with a polyethylene film to block it from the outside air, thereby preventing the bacterial solution on the specimen sample from drying and the entry of bacteria from the outside. Subsequently, after irradiating the light of FL20SBLB type black light manufactured by Toshiba Lighting & Technology from outside the petri dish for 4 hours, the bacterial solution was washed out from the petri dish, transferred to the medium, and the number of viable bacteria was measured. Based on the death rate, antibacterial properties were evaluated in the following three stages.
Death rate = {(initial viable cell count−viable cell count after test) / initial viable cell count} × 100
○: Death rate 80% or more △: Death rate 20% or more and less than 80% ×: Death rate 20% or less UV intensity is a UVR-2 type UV intensity meter manufactured by Topcon {as a light receiving unit, a UD-36 type light receiving unit manufactured by Topcon (Corresponding to light having a wavelength of 310 to 400 nm)} was adjusted so that the ultraviolet intensity measured using 2} was 2 mW / cm 2 .
15.防汚性能
5cm×1cmに切り出した試料を120mlのガラス製瓶に入れ、たばこ5本分の煙を充満させ、試料にたばこのヤニを付着させた後、試料に東芝ライテック製FL20SBLB型ブラックライトの光を4時間照射し、試料の外観(目視で評価)に基づき、防汚性能を以下の3段階で評価した。
このとき、トプコン製UVR−2型紫外線強度計{受光部として、トプコン製UD−36型受光部(波長310〜400nmの光に対応)を使用}を用いて測定した紫外線強度が2mW/cm2となるよう調整した。
○:たばこのヤニによる着色が完全に消失
△:たばこのヤニによる着色が薄くなる
×:たばこのヤニによる着色に変化無し
15. Antifouling performance A sample cut into 5 cm x 1 cm is placed in a 120 ml glass bottle, filled with 5 cigarettes of smoke, and a cigarette spear is attached to the sample. The sample was irradiated with light for 4 hours, and the antifouling performance was evaluated in the following three stages based on the appearance (visually evaluated) of the sample.
At this time, the UV intensity measured using a Topcon UVR-2 type UV intensity meter {using a TOPCON UD-36 type light receiving part (corresponding to light with a wavelength of 310 to 400 nm) as the light receiving part} is 2 mW / cm 2. It adjusted so that it might become.
○: Coloring due to cigarette dust completely disappeared △: Coloring due to cigarette dust becomes light ×: No change in coloring due to cigarette dust
16.耐候性(外観)
スガ試験器製DPWL−5R型デューパネル光コントロールウェザーメーターを使用して曝露試験(照射:60℃4時間、暗黒・湿潤:40℃4時間)を行った。曝露1000時間後の試料の外観(目視で評価)に基づき、耐候性を以下の3段階で評価した。
○:外観変化なし
△:白化が生じる
×:光触媒含有皮膜の剥がれが生じる
16. Weather resistance (appearance)
An exposure test (irradiation: 60 ° C. for 4 hours, dark / wet: 40 ° C. for 4 hours) was performed using a DPWL-5R type dew panel light control weather meter manufactured by Suga Test Instruments. Based on the appearance (visual evaluation) of the sample after 1000 hours of exposure, the weather resistance was evaluated in the following three stages.
○: No change in appearance △: Whitening occurs
X: Peeling of the photocatalyst-containing film occurs
[参考例1]
フェニル基含有シリコーン(BP1−1)の合成。
還流冷却器、温度計および撹拌装置を有する反応器にいれたジオキサン78gにフェニルトリクロロシラン26.0gを添加した後、室温にて約10分間撹拌した。これに水3.2gとジオキサン12.9gからなる混合液を、反応液を10〜15℃に保ちながら約30分かけて滴下した後、さらに10〜15℃で約30分撹拌し、続いて反応液を60℃に昇温させ3時間撹拌した。得られた反応液を25〜30℃に降温させ、392gのトルエンを約30分かけて滴下した後、再度反応液を60℃に昇温させ2時間撹拌した。
[Reference Example 1]
Synthesis of phenyl group-containing silicone (BP1-1).
After 26.0 g of phenyltrichlorosilane was added to 78 g of dioxane in a reactor having a reflux condenser, a thermometer, and a stirring device, the mixture was stirred at room temperature for about 10 minutes. A mixture of 3.2 g of water and 12.9 g of dioxane was added dropwise thereto over about 30 minutes while maintaining the reaction solution at 10 to 15 ° C., followed by further stirring at 10 to 15 ° C. for about 30 minutes, The reaction solution was heated to 60 ° C. and stirred for 3 hours. The resulting reaction solution was cooled to 25-30 ° C., 392 g of toluene was added dropwise over about 30 minutes, and then the reaction solution was again heated to 60 ° C. and stirred for 2 hours.
得られた反応液を10〜15℃に降温させ、メタノール19.2gを約30分かけて添加した。その後さらに25〜30℃にて約2時間撹拌を続行し、続いて反応液を60℃に昇温させ2時間撹拌した。得られた反応液から60℃で減圧下に溶媒を溜去することにより重量平均分子量3600のラダ−骨格を有するフェニル基含有シリコーン(BP1−1)を得た。(得られたフェニル基含有シリコーン(BP1−1)には、IRスペクトルにおけるラダ−骨格の伸縮振動に由来する吸収(1130cm−1及び1037cm−1)が観測された。)
また、29Si核磁気共鳴の測定結果より求めた上記フェニル基含有シリコーン(BP1−1)の式は、(Ph)1(OCH3)0.58SiO1.21であった。(ここでPhはフェニル基を表す。)
The resulting reaction solution was cooled to 10 to 15 ° C., and 19.2 g of methanol was added over about 30 minutes. Thereafter, stirring was further continued at 25 to 30 ° C. for about 2 hours, and then the reaction solution was heated to 60 ° C. and stirred for 2 hours. The solvent was distilled off from the resulting reaction solution at 60 ° C. under reduced pressure to obtain a phenyl group-containing silicone (BP1-1) having a ladder skeleton having a weight average molecular weight of 3600. (In the obtained phenyl group-containing silicone (BP1-1), absorptions (1130 cm −1 and 1037 cm −1 ) derived from the stretching vibration of the ladder skeleton in the IR spectrum were observed.)
Further, 29 wherein the Si-nuclear magnetic resonance measurement results from the phenyl group-containing silicone obtained (BP1-1) was (Ph) 1 (OCH 3) 0.58 SiO 1.21. (Here, Ph represents a phenyl group.)
[参考例2]
アルキル基含有シリコーン(BA−1)の合成。
還流冷却器、温度計および撹拌装置を有する反応器に入れたメタノール300gにメチルトリメトキシシラン136g(1モル)、及びジメチルジメトキシシラン120g(1モル)を添加した後、室温にて約10分間撹拌した。これに氷冷下で、0.05Nの塩酸水溶液12.6g(0.7モル)とメタノール63gからなる混合液を、約40分かけて滴下し、加水分解を行った。滴下終了後、さらに10℃以下で約20分、室温で6時間それぞれ撹拌した。
その後、得られた反応液から60℃で減圧下に溶媒を溜去することにより重量平均分子量3600のアルキル基含有シリコーン(BA−1)を得た。得られたアルキル基含有シリコーン(BA−1)の構造を29Si核磁気共鳴によって測定したところ、T構造とD構造を示すシグナルが確認され、その比率はT構造:D構造=1:1であった。
また、29Si核磁気共鳴の測定結果より求めた上記アルキル基含有シリコーン(BA−1)の平均組成式は、(CH3)1.5(OCH3)0.27SiO1.12であった。
[Reference Example 2]
Synthesis of alkyl group-containing silicone (BA-1).
After adding 136 g (1 mol) of methyltrimethoxysilane and 120 g (1 mol) of dimethyldimethoxysilane to 300 g of methanol in a reactor having a reflux condenser, a thermometer and a stirring device, the mixture was stirred at room temperature for about 10 minutes. did. Under ice cooling, a mixture of 12.6 g (0.7 mol) of 0.05N aqueous hydrochloric acid and 63 g of methanol was added dropwise over about 40 minutes for hydrolysis. After completion of the dropwise addition, the mixture was further stirred at 10 ° C. or lower for about 20 minutes and at room temperature for 6 hours.
Then, the alkyl group containing silicone (BA-1) of the weight average molecular weight 3600 was obtained by distilling a solvent off from the obtained reaction liquid under reduced pressure at 60 degreeC. When the structure of the obtained alkyl group-containing silicone (BA-1) was measured by 29 Si nuclear magnetic resonance, signals indicating T structure and D structure were confirmed, and the ratio was T structure: D structure = 1: 1. there were.
The average composition formula of the above alkyl group-containing silicone obtained from the measurement results of 29 Si nuclear magnetic resonance (BA-1) was (CH 3) 1.5 (OCH 3 ) 0.27 SiO 1.12 .
[参考例3]
シリコーン組成物(B−1)の調整。
参考例1で合成したフェニル基含有シリコーン(BP1−1)6gと参考例2で合成したアルキル基含有シリコーン(BA−1)3gを混合したものに、トルエン14.7g、イソプロパノール29.8g、ブチルセロソルブ15.1gを添加し、室温で撹拌する事によりバインダー成分(B−1)の溶液を得た。
また、各々の組成物の平均組成式より、上記バインダー成分(B−1)の平均組成式は、(Ph)0.67(CH3)0.5(OCH3)0.47SiO1.18と計算できる。(ここでPhはフェニル基を表す。)
[Reference Example 3]
Adjustment of silicone composition (B-1).
To a mixture of 6 g of the phenyl group-containing silicone (BP1-1) synthesized in Reference Example 1 and 3 g of the alkyl group-containing silicone (BA-1) synthesized in Reference Example 2, 14.7 g of toluene, 29.8 g of isopropanol, and butyl cellosolve 15.1g was added and the solution of the binder component (B-1) was obtained by stirring at room temperature.
From the average composition formula of each composition, the average composition formula of the binder component (B-1) is (Ph) 0.67 (CH 3 ) 0.5 (OCH 3 ) 0.47 SiO 1.18. Can be calculated. (Here, Ph represents a phenyl group.)
[参考例4]
還流冷却器、温度計および撹拌装置を有する反応器にいれたTKS−251{酸化チタンオルガノゾルの商品名(テイカ製)、分散媒:トルエンとイソプロパノールの混合溶媒、TiO2濃度20重量%、平均結晶子径6nm(カタログ値)}40gにビス(トリメチルシロキシ)メチルシランの20重量%トルエン溶液40gを50℃にて約5分かけて添加し、さらに50℃で12時間撹拌を続けることにより、非常に分散性の良好な変性光触媒オルガノゾル(A−1)を得た。この時、ビス(トリメチルシロキシ)メチルシランの反応に伴い生成した水素ガス量は23℃において718mlであった。また、得られた変性酸化チタンオルガノゾルをKBr板上にコーティングしIRスペクトルを測定したところ、Ti−OH基の吸収(3630〜3640cm−1)の消失が観測された。
[Reference Example 4]
TKS-251 {trade name of titanium oxide organosol (manufactured by TEIKA), dispersion medium: mixed solvent of toluene and isopropanol, TiO 2 concentration 20% by weight, average By adding 40 g of a 20 wt% toluene solution of bis (trimethylsiloxy) methylsilane to 40 g of crystallite diameter 6 nm (catalog value) at 50 ° C. over about 5 minutes, and continuing stirring at 50 ° C. for 12 hours, A modified photocatalyst organosol (A-1) having good dispersibility was obtained. At this time, the amount of hydrogen gas produced by the reaction of bis (trimethylsiloxy) methylsilane was 718 ml at 23 ° C. Moreover, when the obtained modified titanium oxide organosol was coated on a KBr plate and IR spectrum was measured, disappearance of absorption of Ti—OH group (3630 to 3640 cm −1 ) was observed.
また、図1、図2にそれぞれ変性処理前のTKS−251及び得られた変性光触媒オルガノゾル(A−1)の粒径分布を示す。得られた変性光触媒オルガノゾル(A−1)の粒径分布は単一分散(数平均粒子径は25nm)であり、さらに変性処理前のTKS−251の単一分散(数平均粒子径は12nm)の粒径分布が完全に消失していることが分かる。
続いて、参考例3で調整したシリコーン成分(B−1)の溶液68gに上記変性光触媒オルガノゾル(A−1)20gを室温にて撹拌下において添加し、さらに硬化触媒(ジラウリル酸ジブチル錫)0.5gを攪拌下に添加して光触媒組成物(C−1)を得た。
1 and 2 show the particle size distributions of TKS-251 before the modification treatment and the obtained modified photocatalyst organosol (A-1), respectively. The resulting modified photocatalyst organosol (A-1) has a single particle size distribution (number average particle size is 25 nm), and further a single dispersion of TKS-251 before the modification treatment (number average particle size is 12 nm). As can be seen from FIG.
Subsequently, 20 g of the modified photocatalyst organosol (A-1) was added to 68 g of the solution of the silicone component (B-1) prepared in Reference Example 3 at room temperature with stirring, and a curing catalyst (dibutyltin dilaurate) 0 .5 g was added with stirring to obtain a photocatalyst composition (C-1).
50mm×60mmに裁断した厚さ1mmのアルミ板(JIS,H,4000(A1050P))にマイティラック白{アクリルウレタン樹脂塗料(2液混合型)の商品名(日本ペイント製)}をスプレー塗布し、室温にて3日間乾燥した。得られたアクリルウレタン塗装を行ったアルミ板に上記光触媒組成物(C−1)を膜厚が2μmとなるようにスプレー塗布した後、室温で1時間乾燥し、150℃で30分加熱する事により、光触媒塗膜を有する試験板(D−1)を得た。
得られた光触媒塗膜を有する試験板(D−1)をFIB加工し、TEMによる塗膜断面の観察を行った結果を図3(a)の写真に示す。また、図3(a)の写真のイラストレーションが図3(b)である。変性光触媒粒子(図3(b)中の参照番号1で示す)を含む光触媒塗膜(図3(b)中の参照番号2で示す)と、基材である、顔料酸化チタン(図3(b)中の参照番号4で示す)を含むアクリルウレタン皮膜(図3(b)中の参照番号3で示す)との界面には変性光触媒粒子は存在せず、光触媒塗膜表面は全て変性光触媒粒子で覆われていることが観察された。
Spray a 1mm thick aluminum plate (JIS, H, 4000 (A1050P)) cut to 50mm x 60mm with Mighty Rack White {trade name of acrylic urethane resin paint (two-component mixed type)} (manufactured by Nippon Paint)} And dried at room temperature for 3 days. After spray-applying the photocatalyst composition (C-1) to the obtained aluminum plate coated with acrylic urethane so as to have a film thickness of 2 μm, it is dried at room temperature for 1 hour and heated at 150 ° C. for 30 minutes. Thus, a test plate (D-1) having a photocatalytic coating film was obtained.
The test plate (D-1) having the obtained photocatalyst coating film was subjected to FIB processing, and the result of observation of the coating film cross section by TEM is shown in the photograph of FIG. Moreover, the illustration of the photograph of Fig.3 (a) is FIG.3 (b). A photocatalyst coating film (indicated by reference numeral 2 in FIG. 3B) containing modified photocatalyst particles (indicated by reference numeral 1 in FIG. 3B), and pigment titanium oxide (FIG. 3 (in FIG. 3B). The modified photocatalyst particles are not present at the interface with the acrylic urethane film (indicated by reference numeral 3 in FIG. 3B) including the reference numeral 4 in b), and the entire surface of the photocatalyst coating film is the modified photocatalyst. It was observed that it was covered with particles.
得られた光触媒塗膜を有する試験板(D−1)の鉛筆硬度はHであり、水との接触角は105゜であった。また、耐衝撃性試験は合格した。
また、得られた光触媒塗膜を有する試験板(D−1)の紫外線(ブラックライト)照射後の鉛筆硬度は5H以上であり、水の接触角は0゜であった。
さらに、デューパネル光コントロールウェザーメーターによる曝露試験(1000時間後)による光沢保持率は98%であり、非常に良好な耐候性を示した。
続いて、光触媒組成物(C−1)をエポキシ樹脂(Quetol812)上にスプレー塗布した後、室温で2日間乾燥し、続いて50℃にて3日間加熱することにより平滑な光触媒塗膜を有するエポキシ樹脂(D−2)を得た。
The test plate (D-1) having the photocatalyst coating film obtained had a pencil hardness of H and a contact angle with water of 105 °. Moreover, the impact resistance test passed.
Moreover, the pencil hardness after the ultraviolet-ray (black light) irradiation of the test board (D-1) which has the obtained photocatalyst coating film was 5H or more, and the contact angle of water was 0 degree.
Furthermore, the gloss retention by an exposure test (after 1000 hours) using a dew panel light control weather meter was 98%, indicating very good weather resistance.
Subsequently, the photocatalyst composition (C-1) is spray-coated on an epoxy resin (Quetol 812), dried at room temperature for 2 days, and then heated at 50 ° C. for 3 days to have a smooth photocatalyst coating film. An epoxy resin (D-2) was obtained.
得られた光触媒塗膜を有するエポキシ樹脂(D−2)をエポキシ樹脂(Quetol812)に包埋後、ミクロトームにより50〜60nmの厚さの超薄切片を作成し、RuO4でフェニル基含有シリコーン(BP1−1)を染色した後、TEMによる塗膜断面の観察を行った結果を図4(a)の写真に示す。また、図4(a)の写真のイラストレーションが図4(b)である。
変性光触媒粒子(図4(b)中の参照番号1で示す)を含む光触媒塗膜(図4(b)中の参照番号2で示す)と基材であるエポキシ樹脂(図4(b)中の参照番号5で示す)との界面には変性光触媒粒子はほとんど存在せず、光触媒塗膜表面は全て変性光触媒粒子で覆われていることが観察された。
After embedding the obtained epoxy resin having a photocatalyst coating film (D-2) to epoxy resin (Quetol812), to create the ultra-thin sections of a thickness of 50~60nm by microtome, a phenyl group-containing silicone with RuO 4 ( The result of observing the cross section of the coating film by TEM after dyeing BP1-1) is shown in the photograph of FIG. Moreover, the illustration of the photograph of Fig.4 (a) is FIG.4 (b).
A photocatalyst coating film (indicated by reference numeral 2 in FIG. 4 (b)) containing modified photocatalyst particles (indicated by reference numeral 1 in FIG. 4 (b)) and an epoxy resin (in FIG. 4 (b)). It was observed that almost no modified photocatalyst particles were present at the interface with the photocatalyst coating film, and the entire surface of the photocatalyst coating film was covered with the modified photocatalyst particles.
また、図4(b)中の参照番号5(b)で示す部分が、変性光触媒粒子相1と変性光触媒粒子を含まないバインダー相7との境界部分で、その部分を拡大した写真が図5(a)である。また、図5(a)の写真のイラストレーションが図5(b)である。
図5(a)には、変性光触媒粒子(図5(b)中の参照番号1で示す)を含むバインダー相と変性光触媒粒子を含まないバインダー相(図5(b)中の参照番号7で示す)が存在することが観察できる。また、変性光触媒粒子を含まないバインダー相(図5(b)中の参照番号7で示す)では、RuO4で染色されたフェニル基含有シリコーンと染色されていないアルキル基含有シリコーンがミクロ相分離構造を有して存在していることが観察できる。
4B is a boundary portion between the modified photocatalyst particle phase 1 and the binder phase 7 not containing the modified photocatalyst particles, and an enlarged photograph of the portion is shown in FIG. (A). Moreover, the illustration of the photograph of Fig.5 (a) is FIG.5 (b).
FIG. 5A shows a binder phase containing modified photocatalyst particles (indicated by reference numeral 1 in FIG. 5B) and a binder phase not containing modified photocatalyst particles (reference numeral 7 in FIG. 5B). Can be observed. In the binder phase not containing the modified photocatalyst particles (indicated by reference numeral 7 in FIG. 5B), the phenyl group-containing silicone dyed with RuO 4 and the undyed alkyl group-containing silicone are composed of a microphase-separated structure. It can be observed that it exists.
[参考例5]
変性光触媒オルガノゾル(A−1)20gの代わりに変性処理をしていないTKS−251の10gを用いた以外は、参考例4と同様の操作を行い光触媒組成物(C−2)を得た。
得られた光触媒組成物(C−2)を用い、参考例4と同様の操作を行って光触媒塗膜(酸化チタン含量は参考例4と同量)を有する試験板(D−3)を得た。
得られた光触媒塗膜を有する試験板(D−3)の鉛筆硬度はHであり、水との接触角は97゜であった。
また、得られた光触媒塗膜を有する試験板(D−3)の紫外線(ブラックライト)照射後の鉛筆硬度は3Hであり、水の接触角は94゜であった。
[Reference Example 5]
A photocatalyst composition (C-2) was obtained in the same manner as in Reference Example 4 except that 10 g of unmodified TKS-251 was used instead of 20 g of the modified photocatalyst organosol (A-1).
Using the obtained photocatalyst composition (C-2), the same operation as in Reference Example 4 was performed to obtain a test plate (D-3) having a photocatalyst coating film (titanium oxide content is the same as in Reference Example 4). It was.
The test plate (D-3) having a photocatalyst coating film obtained had a pencil hardness of H and a contact angle with water of 97 °.
The test plate (D-3) having the photocatalytic coating film obtained had a pencil hardness of 3H after irradiation with ultraviolet light (black light) and a water contact angle of 94 °.
さらに、デューパネル光コントロールウェザーメーターによる200時間の曝露試験で、光沢保持率は10%以下となり、チョーキング現象が観察された。
続いて、上記光触媒組成物(C−2)をエポキシ樹脂(Quetol812)上にスプレー塗布した後、室温で2日間乾燥し、続いて50℃にて3日間加熱することにより平滑な光触媒塗膜を有するエポキシ樹脂(D−4)を得た。
得られた光触媒塗膜を有するエポキシ樹脂(D−4)をエポキシ樹脂(Quetol812)に包埋後、ミクロトームにより50〜60nmの厚さの超薄切片を作成し、RuO4でフェニル基含有シリコーン(BP1−1)を染色した後、TEMによる塗膜断面の観察を行った結果を図6(a)の写真に示す。また図6(a)の写真のイラストレーションが図6(b)である。
Further, in a 200-hour exposure test using a dew panel light control weather meter, the gloss retention was 10% or less, and a choking phenomenon was observed.
Subsequently, the photocatalyst composition (C-2) was spray-coated on an epoxy resin (Quetol 812), dried at room temperature for 2 days, and then heated at 50 ° C. for 3 days to form a smooth photocatalyst coating film. The obtained epoxy resin (D-4) was obtained.
After embedding the obtained epoxy resin having a photocatalyst coating film (D-4) to the epoxy resin (Quetol812), to create the ultra-thin sections of a thickness of 50~60nm by microtome, a phenyl group-containing silicone with RuO 4 ( The result of having observed the cross section of the coating film by TEM after dyeing | staining BP1-1) is shown to the photograph of Fig.6 (a). FIG. 6B is an illustration of the photograph of FIG.
変性光触媒粒子(図6(b)中の参照番号1で示す)を含む光触媒塗膜(図6(b)中の参照番号2で示す)と、基材であるエポキシ樹脂(図6(b)中の参照番号5で示す)との界面には変性光触媒粒子が多く存在し、光触媒塗膜の露出表面は全て変性光触媒粒子の存在しないアルキル基含有シリコーン(図6(b)中参照番号8で示す)で覆われており、光触媒活性の発現が期待できないことが観察された。 A photocatalyst coating film (indicated by reference numeral 2 in FIG. 6B) containing modified photocatalyst particles (indicated by reference numeral 1 in FIG. 6B), and an epoxy resin (FIG. 6B) as a base material There are many modified photocatalyst particles at the interface with the reference number 5 in the figure, and the exposed surface of the photocatalyst coating film is all alkyl group-containing silicone without the modified photocatalyst particles (reference number 8 in FIG. 6B). It was observed that the photocatalytic activity could not be expected.
[実施例1]
硫酸電解浴中で膜厚10μmの陽極酸化皮膜を形成したアルミニウム板上に参考例4で調整した光触媒組成物(C−1)を乾燥膜厚約3μmとなるように塗布、130℃で30分焼成し、東芝ライテック製FL20SBLB型ブラックライトの光[トプコン製UVR−2型紫外線強度計(受光部:トプコン製UD−36型受光部)を用いて測定した紫外線強度が2mW/cm2となるよう調整]5日間照射して機能性アルミニウム建材試料(E−1)を作成した。
この試料(E−1)の密着性を測定した結果、スコッチテープ試験、スクラッチ試験共に良好で、剥離はなかった。また、抗菌性、防カビ性も共に非常に良好(○)であった。さらに、防汚性能を評価したところ、非常に良好な結果(○)となった。
また、この試料(E−1)の耐候性試験における外観変化は非常に良好(○)であった。
[Example 1]
The photocatalyst composition (C-1) prepared in Reference Example 4 was applied on an aluminum plate on which an anodized film having a film thickness of 10 μm was formed in a sulfuric acid electrolytic bath so that the dry film thickness was about 3 μm, and 30 minutes at 130 ° C. calcined, manufactured by Toshiba Lighting & Technology Corporation FL20SBLB type black light light [manufactured by Topcon UVR-2 type ultraviolet intensity meter (light receiving unit: Topcon UD-36 type light receiving portion) so that the measured ultraviolet intensity becomes 2 mW / cm 2 using a Adjustment] A functional aluminum building material sample (E-1) was prepared by irradiation for 5 days.
As a result of measuring the adhesion of this sample (E-1), both the Scotch tape test and the scratch test were good, and there was no peeling. The antibacterial and antifungal properties were both very good (◯). Furthermore, when the antifouling performance was evaluated, a very good result (◯) was obtained.
Moreover, the external appearance change in the weather resistance test of this sample (E-1) was very favorable ((circle)).
[比較例1]
参考例4で調整した光触媒組成物(C−1)の代わりに参考例5で調整した光触媒組成物(C−2)を使用した以外は実施例1と同様に実施し、機能性アルミニウム建材試料(E−2)を得た。
この試料(E−2)の密着性を測定した結果、スコッチテープ試験、スクラッチ試験共に良好で、剥離はなかった。しかし、抗菌性、防カビ性も共に不良(×)であった。さらに、防汚性能を評価したところ、結果は不良(×)であった。
また、この試料(E−2)の耐候性試験における外観変化は悪い結果(×)であった。
[Comparative Example 1]
A functional aluminum building material sample was prepared in the same manner as in Example 1 except that the photocatalyst composition (C-2) prepared in Reference Example 5 was used instead of the photocatalyst composition (C-1) prepared in Reference Example 4. (E-2) was obtained.
As a result of measuring the adhesion of this sample (E-2), both the Scotch tape test and the scratch test were good, and there was no peeling. However, both the antibacterial and antifungal properties were poor (x). Furthermore, when the antifouling performance was evaluated, the result was poor (x).
Moreover, the external appearance change in the weather resistance test of this sample (E-2) was a bad result (x).
[比較例2]
参考例4で調整した光触媒組成物(C−1)の代わりに市販の光触媒コーティング液であるST?K03(石原産業(株)製)を使用した以外は、実施例1と同様の操作を行い機能性アルミニウム建材試料(E−3)を得た。
この試料(E−3)の成膜性は不良で、ヒビ割れし、評価に値する皮膜が得られなかった。
[Comparative Example 2]
The same operation as in Example 1 was performed except that a commercially available photocatalyst coating liquid ST? K03 (manufactured by Ishihara Sangyo Co., Ltd.) was used instead of the photocatalyst composition (C-1) prepared in Reference Example 4. A functional aluminum building material sample (E-3) was obtained.
The film formability of this sample (E-3) was poor, cracked, and a film worthy of evaluation was not obtained.
[比較例3]
参考例4で調整した光触媒組成物(C−1)の代わりに市販の光触媒コーティング液であるST−K03(石原産業(株)製)を乾燥膜厚が0.3μmとなるように塗布する以外は、実施例1と同様の操作を行い機能性アルミニウム建材試料(E−4)を得た。
この試料(E−4)の密着性を測定した結果、スコッチテープ試験、スクラッチ試験共に良好で、剥離はなかった。また、抗菌性、防カビ性も共に良好(○)であった。さらに、防汚性能を評価したところ、非常に良好(○)であった。
しかし、この試料(E−4)の耐候性試験における外観変化は非常に悪い結果(×)であった。
[Comparative Example 3]
Instead of applying the commercially available photocatalyst coating liquid ST-K03 (manufactured by Ishihara Sangyo Co., Ltd.) in place of the photocatalyst composition (C-1) prepared in Reference Example 4 so that the dry film thickness is 0.3 μm. Performed the same operation as Example 1 and obtained the functional aluminum building material sample (E-4).
As a result of measuring the adhesion of this sample (E-4), both the Scotch tape test and the scratch test were good, and there was no peeling. Moreover, both antibacterial and antifungal properties were good (◯). Furthermore, when the antifouling performance was evaluated, it was very good (◯).
However, the appearance change in the weather resistance test of this sample (E-4) was very bad (×).
本発明は、簡便にコーティングでき、抗菌、防カビ性に優れ、光触媒作用により悪臭や、汚れが壁面等に浸透してしまうまでにその原因物質を分解し、セルフクリーニング性を有する機能性アルミニウム建材等に好適に利用できる。 The present invention is a functional aluminum building material that can be easily coated, has excellent antibacterial and antifungal properties, decomposes the causative substances by the photocatalytic action and penetrates the walls and the like, and has self-cleaning properties It can utilize suitably for etc.
1 変性光触媒粒子
2 光触媒含有皮膜
3 アクリルウレタン皮膜
4 顔料である酸化チタン
5 エポキシ樹脂
5(b) 変性光触媒粒子相1と変性光触媒粒子を含まないバインダー相7との境界部分で、その拡大図を図5(b)に示す
6 包埋用エポキシ樹脂
7 変性光触媒粒子を含まないバインダー相
8 アルキル基含有シリコーン
DESCRIPTION OF SYMBOLS 1 Modified photocatalyst particle 2 Photocatalyst containing film | membrane 3 Acrylic urethane film | membrane 4 Titanium oxide which is a pigment 5 Epoxy resin 5 (b) The enlarged view in the boundary part of the modified photocatalyst particle phase 1 and the binder phase 7 which does not contain modified photocatalyst particles 5 (b) 6 embedded epoxy resin 7 binder phase not containing modified photocatalyst particles 8 alkyl group-containing silicone
Claims (18)
R3Si− (1)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す)
−(R2SiO)− (2)
(式中、Rは式(1)で定義した通りである。)
R 3 Si- (1)
(In the formula, each R is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 1 to 30 carbon atoms. A fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group)
- (R 2 SiO) - ( 2)
(In the formula, R is as defined in formula (1).)
R1 pR2 qXrSiO(4−p−q−r)/2 (4)
(式中、各R1はフェニル基を表し、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表し;
Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。そしてp、q及びrは、0<p<4、0≦q<4、0≦r<4、及び0<(p+q+r)<4であり、そして0.05≦p/(p+q)≦1である。) The functional aluminum building material according to any one of claims 1 to 4, wherein the binder component (B) contains a phenyl group-containing silicone (BP) represented by the following formula (4).
R 1 p R 2 q X r SiO (4-p-q-r) / 2 (4)
(In the formula, each R 1 represents a phenyl group, and each R 2 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or Represents a branched alkenyl group having 2 to 30 carbon atoms;
X represents a hydrogen atom, a hydroxyl group, a C1-C20 alkoxy group, a C1-C20 acyloxy group, an aminoxy group, a C1-C20 oxime group, and a halogen atom each independently. And p, q, and r are 0 <p <4, 0 ≦ q <4, 0 ≦ r <4, and 0 <(p + q + r) <4, and 0.05 ≦ p / (p + q) ≦ 1 is there. )
R1 sXtSiO(4−s−t)/2 (5)
(式中、R1はフェニル基を表す。Xは各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。s及びtは、0<s<4、0≦t<4、そして0<(s+t)<4である。) The functional aluminum building material according to claim 5, wherein the phenyl group-containing silicone (BP) is a phenyl group-containing silicone (BP1) not represented by an alkyl group represented by the following formula (5).
R 1 s X t SiO (4 -s-t) / 2 (5)
(Wherein R 1 represents a phenyl group. X is independently a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, or an oxime having 1 to 20 carbon atoms. Group represents a halogen atom, and s and t are 0 <s <4, 0 ≦ t <4, and 0 <(s + t) <4.)
R2 uXvSiO(4−u−v)/2 (6)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。そしてu及びvは、0<u<4、0≦v<4、そして0<(u+v)<4である。) The functional aluminum building material according to claim 5 or 6, wherein the binder component (B) further contains an alkyl group-containing silicone (BA) represented by the following formula (6).
R 2 u X v SiO (4-uv) / 2 (6)
(In the formula, each R 2 independently represents a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Each independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, an oxime group having 1 to 20 carbon atoms, or a halogen atom. And u and v are 0 <u <4, 0 ≦ v <4, and 0 <(u + v) <4.)
R1 sXtSiO(4−s−t)/2 (5)
(式中、R1はフェニル基を表し、Xは各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。s及びtは、0<s<4、0≦t<4、そして0<(s+t)<4である。)
R2 uXvSiO(4−u−v)/2 (6)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表し、Xは、各々独立に水素原子、水酸基、炭素数1〜20のアルコキシ基、炭素数1〜20のアシロキシ基、アミノキシ基、炭素数1〜20のオキシム基、ハロゲン原子を表す。
u及びvは、0<u<4、0≦v<4、そして0<(u+v)<4である。) The binder component (B) contains a phenyl group-containing silicone (BP1) not containing an alkyl group represented by formula (5) and an alkyl group-containing silicone (BA) represented by formula (6). The functional aluminum building material as described in any one of Claims 1-4 characterized by the above-mentioned.
R 1 s X t SiO (4 -s-t) / 2 (5)
(Wherein, R 1 represents a phenyl group, and each X independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, or an oxime having 1 to 20 carbon atoms. Group represents a halogen atom, s and t are 0 <s <4, 0 ≦ t <4, and 0 <(s + t) <4.
R 2 u X v SiO (4-uv) / 2 (6)
(In the formula, each R 2 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Each independently represents a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, an aminoxy group, an oxime group having 1 to 20 carbon atoms, or a halogen atom. Represent.
u and v are 0 <u <4, 0 ≦ v <4, and 0 <(u + v) <4. )
−(R2 2SiO)− (7)
(式中、R2は各々独立に直鎖状または分岐状の炭素数1〜30のアルキル基、炭素数5〜20のシクロアルキル基、又は直鎖状または分岐状の炭素数2〜30個のアルケニル基を表す。)
— (R 2 2 SiO) — (7)
(In the formula, each R 2 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 2 to 30 carbon atoms. Represents an alkenyl group of
HxRySiO(4−x−y)/2 (9)
(式中、Rは各々独立に直鎖状または分岐状の炭素数1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、フェニル基、炭素数1〜20のアルコキシ基、又は水酸基を表す。x及びyは、0<x<4、0<y<4であり、そして(x+y)≦4である。) The functional aluminum building material according to claim 4, wherein the modifier compound (b) is a Si-H group-containing silicon compound (b1) represented by the formula (9).
H x R y SiO (4-xy) / 2 (9)
(In the formula, each R is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon group having 1 to 30 carbon atoms. A fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, a phenyl group, an alkoxy group having 1 to 20 carbon atoms, or a hydroxyl group, where x and y are 0 <x <4, 0 <Y <4 and (x + y) ≦ 4.)
−O−(R4 2SiO)m−SiR4 3 ・・・(13)
(式中、R4はそれぞれ独立に直鎖状または分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、直鎖状または分岐状の炭素数が1〜30個のフルオロアルキル基、直鎖状または分岐状の炭素数2〜30個のアルケニル基、又はフェニル基を表す。また、mは整数であり、0≦m≦1000である。)
H−(R3 2SiO)n−SiR3 2−H ・・・(11)
(式中、R3は式(10)で定義した通りである。nは整数であり、0≦n≦1000である。)
(R3HSiO)a(R3 2SiO)b(R3 3SiO1/2)c ・・・(12)
(式中、R3は式(10)で定義した通りであり、aは1以上の整数であり、bは0以上の整数であり、(a+b)≦10000であり、そしてcは0又は2である。但し、(a+b)が2以上の整数であり且つc=0の場合、式(12)の該Hシリコーンは環状シリコーンであり、c=2の場合、式(12)の該Hシリコーンは鎖状シリコーンである。) The Si-H group-containing silicon compound (b1) is a mono-Si-H group-containing compound represented by the formula (10), a Si-H group-containing compound represented by the formula (11), a formula (12) The functional aluminum building material according to claim 13, wherein the functional aluminum building material is at least one compound selected from the group consisting of H silicones represented by:
—O— (R 4 2 SiO) m —SiR 4 3 (13)
(In the formula, each R 4 is independently a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, or a linear or branched carbon number of 1 to 1. 30 represents a fluoroalkyl group, a linear or branched alkenyl group having 2 to 30 carbon atoms, or a phenyl group, and m is an integer, and 0 ≦ m ≦ 1000.
H— (R 3 2 SiO) n —SiR 3 2 —H (11)
(In the formula, R 3 is as defined in formula (10). N is an integer and 0 ≦ n ≦ 1000.)
(R 3 HSiO) a (R 3 2 SiO) b (R 3 3 SiO 1/2 ) c (12)
(Wherein R 3 is as defined in formula (10), a is an integer of 1 or more, b is an integer of 0 or more, (a + b) ≦ 10000, and c is 0 or 2) Provided that when (a + b) is an integer of 2 or more and c = 0, the H silicone of the formula (12) is a cyclic silicone, and when c = 2, the H silicone of the formula (12) Is a chain silicone.)
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Cited By (4)
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JP2008093905A (en) * | 2006-10-10 | 2008-04-24 | Furukawa Sky Kk | Aluminum-coated plate and precoated aluminum fin material using the plate |
JP2011000717A (en) * | 2009-06-16 | 2011-01-06 | Sumitomo Light Metal Ind Ltd | Aluminum material for interior and exterior and method of manufacturing the same |
JP2014173120A (en) * | 2013-03-07 | 2014-09-22 | Nbc Meshtec Inc | Member having antiviral property and production method thereof |
WO2023054624A1 (en) * | 2021-10-01 | 2023-04-06 | 日本製鉄株式会社 | Coated metal sheet |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008093905A (en) * | 2006-10-10 | 2008-04-24 | Furukawa Sky Kk | Aluminum-coated plate and precoated aluminum fin material using the plate |
JP2011000717A (en) * | 2009-06-16 | 2011-01-06 | Sumitomo Light Metal Ind Ltd | Aluminum material for interior and exterior and method of manufacturing the same |
JP2014173120A (en) * | 2013-03-07 | 2014-09-22 | Nbc Meshtec Inc | Member having antiviral property and production method thereof |
WO2023054624A1 (en) * | 2021-10-01 | 2023-04-06 | 日本製鉄株式会社 | Coated metal sheet |
TWI830412B (en) * | 2021-10-01 | 2024-01-21 | 日商日本製鐵股份有限公司 | Painted metal sheet |
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