JP2002373810A - Chip type common mode choke coil - Google Patents
Chip type common mode choke coilInfo
- Publication number
- JP2002373810A JP2002373810A JP2001179959A JP2001179959A JP2002373810A JP 2002373810 A JP2002373810 A JP 2002373810A JP 2001179959 A JP2001179959 A JP 2001179959A JP 2001179959 A JP2001179959 A JP 2001179959A JP 2002373810 A JP2002373810 A JP 2002373810A
- Authority
- JP
- Japan
- Prior art keywords
- conductive thin
- coil
- spiral conductive
- thin film
- thin films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims abstract description 72
- 238000004804 winding Methods 0.000 claims abstract description 63
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000004020 conductor Substances 0.000 claims description 29
- 239000000696 magnetic material Substances 0.000 claims description 23
- 238000000605 extraction Methods 0.000 claims description 17
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 230000008878 coupling Effects 0.000 abstract description 6
- 238000010168 coupling process Methods 0.000 abstract description 6
- 238000005859 coupling reaction Methods 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 17
- 238000000206 photolithography Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010276 construction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Coils Or Transformers For Communication (AREA)
- Filters And Equalizers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、各種電子機器に侵
入するノイズ対策に用いられる電子部品に係り、とくに
チップ型コモンモードチョークコイルに関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component used as a countermeasure for noise invading various electronic devices, and more particularly to a chip type common mode choke coil.
【0002】[0002]
【従来の技術】従来、薄膜形成工法を使用したこの種の
電子部品として、特開平8−203737号公報に示さ
れたコイル部品が知られている。このコイル部品は図8
及び図9に示すように、磁性基板40上に、絶縁層4
1、引出電極53,54、絶縁層42、第1コイル導体
51、絶縁層43、第2コイル導体52、絶縁層44を
順に配し、その上面より磁性基板45で挟み込んだ構造
である。また、図9のように外部電極55は磁性基板4
0,45の側面に形成されている。なお、スルーホール
56は第1コイル導体51と引出電極53とを接続して
第1のコイル巻線を構成するもので、スルーホール57
a,57bは第2コイル導体52と引出電極54とを接
続して第2のコイル巻線を構成するものである。2. Description of the Related Art Conventionally, a coil component disclosed in Japanese Patent Application Laid-Open No. 8-203737 is known as this kind of electronic component using a thin film forming method. This coil part is shown in FIG.
As shown in FIG. 9 and FIG.
1, the lead electrodes 53 and 54, the insulating layer 42, the first coil conductor 51, the insulating layer 43, the second coil conductor 52, and the insulating layer 44 are arranged in this order, and are sandwiched by the magnetic substrate 45 from the upper surface. In addition, as shown in FIG.
0,45 are formed on the side surfaces. The through-hole 56 connects the first coil conductor 51 and the extraction electrode 53 to form a first coil winding.
Reference numerals a and 57b denote connecting the second coil conductor 52 and the extraction electrode 54 to form a second coil winding.
【0003】[0003]
【発明が解決しようとする課題】ところで、上記図8及
び図9の構造では高いインピーダンス値が必要な場合
や、チップの小型化対応のためには、コイル巻線を構成
するコイル導体や引出電極の導体幅を細くする必要があ
り、作り込み上の歩留り低下や磁気的結合等の特性低下
が問題となる。In the structures shown in FIGS. 8 and 9, when a high impedance value is required, or in order to cope with the miniaturization of a chip, a coil conductor or an extraction electrode constituting a coil winding is required. It is necessary to make the conductor width narrower, and there is a problem in that the production yield is lowered and the characteristics such as magnetic coupling are lowered.
【0004】また、2個のコイル巻線で形状の異なる引
出電極部及びコイル導体の外部電極接続部が全導体に対
し占める比率が大きく、重ね合わせた各コイル巻線のイ
ンピーダンスの差が大きくなり、ノーマルモード特性に
ノイズ発生等の悪影響を与える。In addition, the ratio of the extraction electrode portion and the external electrode connection portion of the coil conductor occupying all the conductors in the two coil windings to the entire conductor is large, and the difference in impedance between the superposed coil windings becomes large. Adversely affects the normal mode characteristics, such as generation of noise.
【0005】本発明の第1の目的は、上記の点に鑑み、
引出電極パターン部を形成せず薄膜形成工法による螺旋
状導体薄膜の2層で対をなすコイル巻線をそれぞれ構成
することで、容易に各コイル巻線の巻数増加ができ、高
いインピーダンスを得ることを可能とし、対を成すコイ
ル巻線同士で高い磁気結合を得ることが可能なチップ型
コモンモードチョークコイルを提供することにある。[0005] A first object of the present invention is to solve the above problems,
By forming a pair of coil windings of a spiral conductive thin film by a thin film forming method without forming an extraction electrode pattern portion, it is possible to easily increase the number of turns of each coil winding and obtain high impedance. It is an object of the present invention to provide a chip-type common mode choke coil capable of achieving high magnetic coupling between paired coil windings.
【0006】本発明の第2の目的は、対をなすコイル巻
線のインピーダンスの増大を図るとともに、対を成すコ
イル巻線によるインダクタンスの差を小さくすることが
可能なチップ型コモンモードチョークコイルを提供する
ことにある。A second object of the present invention is to provide a chip type common mode choke coil capable of increasing the impedance of a pair of coil windings and reducing the difference in inductance between the paired coil windings. To provide.
【0007】本発明のその他の目的や新規な特徴は後述
の実施の形態において明らかにする。[0007] Other objects and novel features of the present invention will be clarified in embodiments described later.
【0008】[0008]
【課題を解決するための手段】上記目的を達成するため
に、本発明に係るチップ型コモンモードチョークコイル
は、絶縁基板の主面上に、絶縁層及び螺旋状導体薄膜を
厚み方向に積み重ねた構造で対を成すコイル巻線を形成
し、各コイル巻線は2層の螺旋状導体薄膜の直列接続か
らなり、前記2層の螺旋状導体薄膜の一端同士が接続さ
れ、他端が外部電極にそれぞれ接続されるとともに、一
方のコイル巻線を構成する2層の螺旋状導体薄膜の層間
に他方のコイル巻線を構成する2層の螺旋状導体薄膜の
うちの一層が介在していることを特徴としている。In order to achieve the above object, a chip-type common mode choke coil according to the present invention has an insulating layer and a spiral conductive thin film stacked in a thickness direction on a main surface of an insulating substrate. A pair of coil windings is formed in a structure, and each coil winding is composed of a series connection of two layers of spiral conductive thin films, one end of the two layers of spiral conductive thin films is connected, and the other end is an external electrode. And one of the two spiral conductive thin films forming the other coil winding is interposed between the two layers of the spiral conductive thin film forming the one coil winding. It is characterized by.
【0009】前記チップ型コモンモードチョークコイル
において、前記絶縁基板が磁性基板であり、さらに上側
に磁性材を配して前記対をなすコイル巻線を前記磁性基
板と磁性材で挟み込んだ構成としてもよい。In the above-mentioned chip-type common mode choke coil, the insulating substrate may be a magnetic substrate, and a magnetic material may be disposed on the upper side, and the pair of coil windings may be sandwiched between the magnetic substrate and the magnetic material. Good.
【0010】また、前記絶縁基板が磁性基板であり、各
螺旋状導体薄膜の中央部及び周辺部となる位置の前記絶
縁層に開口を形成し、該開口にも磁性材を設けて閉磁路
構造としてもよい。Further, the insulating substrate is a magnetic substrate, and an opening is formed in the insulating layer at a position to be a central portion and a peripheral portion of each spiral conductive thin film, and a magnetic material is also provided in the opening to form a closed magnetic circuit structure. It may be.
【0011】さらに、各螺旋状導体薄膜が、螺旋状周回
部と外部電極取出部とからなり、前記周辺部の開口が前
記外部電極取出部より内側に位置する構成であるとよ
い。Further, it is preferable that each spiral conductive thin film has a spiral winding portion and an external electrode extraction portion, and the opening in the peripheral portion is located inside the external electrode extraction portion.
【0012】前記磁性材が各螺旋状導体薄膜の外部電極
取出部以外の螺旋状周回部を含む領域上に配されている
とよい。It is preferable that the magnetic material is disposed on a region including a helical wrap around the helical conductor thin film other than the external electrode extraction portion.
【0013】[0013]
【発明の実施の形態】以下、本発明に係るチップ型コモ
ンモードチョークコイルの実施の形態を図面に従って説
明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a chip type common mode choke coil according to the present invention will be described below with reference to the drawings.
【0014】図1及び図2は本発明に係るチップ型コモ
ンモードチョークコイルの第1の実施の形態を示す。実
際の作製時は複数個のチップ型コモンモードチョークコ
イルを同時に基板上で作製するが、本実施の形態では1
素子分で説明する。FIGS. 1 and 2 show a first embodiment of a chip type common mode choke coil according to the present invention. In actual manufacturing, a plurality of chip-type common mode choke coils are simultaneously manufactured on a substrate.
This will be described in terms of elements.
【0015】図1及び図2に示すように、チップ型コモ
ンモードチョークコイルは、絶縁基板1の主面上に、絶
縁層と導体薄膜の積層構造で1対のコイル巻線11,1
2を形成したものであり、絶縁層2、第1のコイル巻線
11の下層コイル導体としての螺旋状導体薄膜11a、
絶縁層3、第2のコイル巻線12の下層コイル導体とし
ての螺旋状導体薄膜12a、絶縁層4、第1のコイル巻
線11の上層コイル導体としての螺旋状導体薄膜11
b、絶縁層5、第2のコイル巻線12の上層コイル導体
としての螺旋状導体薄膜12b、及び絶縁層6を順次設
けている。そして、第1のコイル巻線11は、その下層
及び上層コイル導体としての螺旋状導体薄膜11a,1
1bの直列接続で構成され、第2のコイル巻線12は、
その下層及び上層コイル導体としての螺旋状導体薄膜1
2a,12bの直列接続で構成され、さらに第1のコイ
ル巻線11を構成する2層の螺旋状導体薄膜11a,1
1bの層間に第2のコイル巻線12を構成する2層の螺
旋状導体薄膜12a,12bのうちの一層(つまり薄膜
12a)が介在している。As shown in FIGS. 1 and 2, a chip-type common mode choke coil is formed on a main surface of an insulating substrate 1 by a pair of coil windings 11, 1 having a laminated structure of an insulating layer and a conductive thin film.
2, a spiral conductive thin film 11a as a lower coil conductor of the insulating layer 2, the first coil winding 11,
Insulating layer 3, spiral conductive thin film 12a as lower coil conductor of second coil winding 12, insulating layer 4, spiral conductive thin film 11 as upper coil conductor of first coil winding 11
b, an insulating layer 5, a spiral conductor thin film 12b as an upper layer coil conductor of the second coil winding 12, and an insulating layer 6 are sequentially provided. The first coil winding 11 is formed of a spiral conductor thin film 11a, 1 as a lower and upper coil conductor.
1b, and the second coil winding 12 is
Spiral conductor thin film 1 as lower and upper coil conductors
2a, 12b, and a two-layer spiral conductor thin film 11a, 1 constituting the first coil winding 11.
One of the two layers of the spiral conductive thin films 12a and 12b constituting the second coil winding 12 (that is, the thin film 12a) is interposed between the layers 1b.
【0016】また、図2のように、外部電極(端子電
極)20を絶縁基板1の側面部(一部は基板1の下面及
び絶縁層6の上面に延長している)に形成している。As shown in FIG. 2, external electrodes (terminal electrodes) 20 are formed on side surfaces of the insulating substrate 1 (partly extending to the lower surface of the substrate 1 and the upper surface of the insulating layer 6). .
【0017】各螺旋状導体薄膜11a,11b,12
a,12bは絶縁基板1の側面部に設けられる外部電極
20に接続するための引出端部である外部電極取出部Y
以外は螺旋状周回部Xとなっており、大部分が螺旋状周
回部で形成されている。Each of the spiral conductive thin films 11a, 11b, 12
Reference numerals a and 12b denote external electrode extraction portions Y which are extraction ends for connection to external electrodes 20 provided on the side surface portion of the insulating substrate 1.
The other parts are helical circling parts X, and are mostly formed by helical circulating parts.
【0018】前記絶縁層2,3,4,5上に設ける螺旋
状導体薄膜11a,12a,11b,12bは薄膜形成
工法で形成され、下層及び上層の螺旋状導体薄膜11
a,11bは絶縁層3,4のスルーホール15a,15
bを介し一端同士が接続され、他端が前記絶縁基板側面
部の外部電極20にそれぞれ接続されている。同様に、
下層及び上層の螺旋状導体薄膜12a,12bは絶縁層
4,5のスルーホール16a,16bを介し一端同士が
接続され、他端が前記絶縁基板側面部の外部電極20に
それぞれ接続されている。The spiral conductive thin films 11a, 12a, 11b, and 12b provided on the insulating layers 2, 3, 4, and 5 are formed by a thin film forming method, and the lower and upper spiral conductive thin films 11a, 12a, 11b, and 12b are formed.
a, 11b are through holes 15a, 15 of the insulating layers 3, 4;
b, one end is connected to each other, and the other end is connected to each of the external electrodes 20 on the side surface of the insulating substrate. Similarly,
The lower and upper spiral conductive thin films 12a and 12b have one ends connected to each other via through holes 16a and 16b in the insulating layers 4 and 5, and the other ends connected to the external electrodes 20 on the side surfaces of the insulating substrate.
【0019】前記絶縁基板1は好ましくは低誘電率のセ
ラミック、樹脂等であり、絶縁層2,3,4,5,6は
ポリイミド樹脂,エポキシ樹脂等の絶縁性に優れ,加工
性の良い材料であり、各螺旋状導体薄膜の材料はCu,
Ag,Al等の優れた電気伝導度を有する金属が採用さ
れる。The insulating substrate 1 is preferably a low dielectric constant ceramic, resin or the like. And the material of each spiral conductive thin film is Cu,
A metal having excellent electric conductivity such as Ag or Al is employed.
【0020】次に本実施の形態に係るチップ型コモンモ
ードチョークコイルの製造手順を図1を参照し説明す
る。Next, a manufacturing procedure of the chip type common mode choke coil according to the present embodiment will be described with reference to FIG.
【0021】絶縁基板1上に絶縁層2を形成する。形成
方法としては、スピンコート法、ディップ法、スプレ
法、印刷法等が採用される。An insulating layer 2 is formed on an insulating substrate 1. As a forming method, a spin coating method, a dipping method, a spray method, a printing method, or the like is employed.
【0022】それから、絶縁層2上に導体薄膜を成膜
し、フォトリソグラフィー法により螺旋状導体薄膜11
aのパターンを形成する。成膜工法はスパッタ、蒸着、
めっき等の薄膜形成工法が採用される。フォトリソグラ
フィー工法では感光性のレジストを使用し露光現像後、
不要金属部分をエッチングし、その後で前記レジストを
剥離する。Then, a conductive thin film is formed on the insulating layer 2 and the spiral conductive thin film 11 is formed by photolithography.
The pattern a is formed. Sputtering, evaporation,
A thin film forming method such as plating is employed. The photolithography method uses a photosensitive resist and after exposure and development,
Unnecessary metal portions are etched, and then the resist is stripped.
【0023】次に、絶縁層3を形成する。形成工法は絶
縁層2と同様であるが、螺旋状導体薄膜11aと11b
との接続の為、フォトリソグラフィー工法を使用しスル
ーホール15aを現像により形成する。Next, an insulating layer 3 is formed. The forming method is the same as that of the insulating layer 2, except that the spiral conductive thin films 11a and 11b are formed.
The through holes 15a are formed by development using a photolithography method.
【0024】次に、螺旋状導体薄膜12aの成膜、パタ
ーンニングを行う。工法は螺旋状導体薄膜11aと同様
である。Next, the spiral conductive thin film 12a is formed and patterned. The construction method is the same as that of the spiral conductive thin film 11a.
【0025】その後、絶縁層4を絶縁層3と同様工法で
形成する。ここではフォトリソグラフィー工法の現像に
よりスルーホール15b,16aを形成する。スルーホ
ール15bは螺旋状導体薄膜11aと11bとの接続の
為、スルーホール16aは螺旋状導体薄膜12aと12
bとの接続の為のものである。After that, the insulating layer 4 is formed by the same method as the insulating layer 3. Here, through holes 15b and 16a are formed by development using a photolithography method. The through hole 15b is for connecting the spiral conductive thin films 11a and 11b, and the through hole 16a is for the spiral conductive thin films 12a and 12b.
This is for connection with b.
【0026】次に、螺旋状導体薄膜11bの成膜、パタ
ーンニングを行う。工法は螺旋状導体薄膜11aと同様
であり、これにより螺旋状導体薄膜11a,11bがス
ルーホール15a,15bを通して直列接続された第1
のコイル巻線11が得られる。Next, the spiral conductive thin film 11b is formed and patterned. The construction method is the same as that of the spiral conductive thin film 11a, whereby the spiral conductive thin films 11a and 11b are connected in series through the through holes 15a and 15b.
Is obtained.
【0027】その後、絶縁層5を絶縁層3と同様工法で
形成する。ここではフォトリソグラフィー工法の現像に
よりスルーホール16bを形成する。スルーホール16
bは螺旋状導体薄膜12aと12bとの接続の為のもの
である。After that, the insulating layer 5 is formed by the same method as the insulating layer 3. Here, the through-hole 16b is formed by development using a photolithography method. Through hole 16
b is for connection between the spiral conductive thin films 12a and 12b.
【0028】次に、螺旋状導体薄膜12bの成膜、パタ
ーンニングを行う。工法は螺旋状導体薄膜12aと同様
であり、これにより螺旋状導体薄膜12a,12bがス
ルーホール16a,16bを通して直列接続された第2
のコイル巻線12が得られる。Next, film formation and patterning of the spiral conductive thin film 12b are performed. The construction method is the same as that of the spiral conductive thin film 12a, whereby the spiral conductive thin films 12a and 12b are connected in series through the through holes 16a and 16b.
Is obtained.
【0029】その後、絶縁層6を同様工法で全面に形成
する。Thereafter, an insulating layer 6 is formed on the entire surface by the same method.
【0030】上記説明は1個の素子での説明であるが、
実際は複数個の素子が同時に基板上で作製される。この
基板上で作製されたものを1素子形状に切断後、1素子
分の絶縁基板1の側面部に外部電極20を形成しチップ
型コモンモードチョークコイルが完成する。The above description is for one element.
In practice, a plurality of elements are simultaneously produced on a substrate. After the device manufactured on this substrate is cut into one element shape, external electrodes 20 are formed on the side surface of the insulating substrate 1 for one element, and a chip type common mode choke coil is completed.
【0031】この第1の実施の形態によれば、次の通り
の効果を得ることができる。According to the first embodiment, the following effects can be obtained.
【0032】(1) 対をなすコイル巻線11,12は、
殆ど全て螺旋状に周回する螺旋状導体薄膜の2層でそれ
ぞれ形成するため、容易に各コイル巻線の巻き数増加が
でき、高いインピーダンスを得ることが可能となる。ま
た、各導体幅を広くすることが可能となり高い磁気結合
を得ることができる。(1) The pair of coil windings 11 and 12 are
Almost all are formed with two layers of spiral conductive thin films that spirally spiral, respectively, so that the number of turns of each coil winding can be easily increased, and high impedance can be obtained. Further, the width of each conductor can be increased, and high magnetic coupling can be obtained.
【0033】(2) 一方のコイル巻線11を構成する2
層の螺旋状導体薄膜11a,11bの層間に他方のコイ
ル巻線12を構成する2層の螺旋状導体薄膜12a,1
2bのうちの一層が介在しており、これによっても対を
なすコイル巻線同士間で高い磁気結合を得ることができ
る。(2) 2 constituting one coil winding 11
Two layers of the spiral conductive thin films 12a, 1 constituting the other coil winding 12 between the layers of the spiral conductive thin films 11a, 11b
One of the coil windings 2b is interposed, so that a high magnetic coupling can be obtained between the pair of coil windings.
【0034】(3) 各螺旋状導体薄膜は殆ど全部が螺旋
状周回部となっており、2つのコイル巻線によるインピ
ーダンスの差を少なくすることが容易である。(3) Almost all of the spiral conductive thin films are spiral wraps, and it is easy to reduce the impedance difference between the two coil windings.
【0035】図3は本発明の第2の実施の形態であっ
て、対をなすコイル巻線11,12の各螺旋状導体薄膜
のパターンを変更した例を示し、第1のコイル巻線11
は、その下層及び上層コイル導体としての螺旋状導体薄
膜11c,11dの直列接続で構成され、第2のコイル
巻線12は、その下層及び上層コイル導体としての螺旋
状導体薄膜12c,12dの直列接続で構成されてい
る。FIG. 3 shows a second embodiment of the present invention, in which the pattern of the spiral conductive thin films of the coil windings 11 and 12 forming a pair is changed, and the first coil winding 11
Is composed of a series connection of spiral conductor thin films 11c and 11d as its lower and upper coil conductors, and a second coil winding 12 is formed of a series of spiral conductor thin films 12c and 12d as its lower and upper coil conductors. Consists of connections.
【0036】なお、その他の構成は前述した第1の実施
の形態と同様であり、同一又は相当部分に同一符号を付
して説明を省略する。The other structure is the same as that of the first embodiment, and the same or corresponding parts are denoted by the same reference characters and description thereof will be omitted.
【0037】図4は本発明の第3の実施の形態を示す。
この場合、絶縁基板としてフェライト、複合フェライト
等の磁性基板21を用い、さらに最上層の絶縁層6の上
側に同様材質の磁性材(磁性基板でもよい)22を配
置、固着し、第1及び第2のコイル巻線11,12を磁
性基板21と磁性材22とで挟み込んでいる。FIG. 4 shows a third embodiment of the present invention.
In this case, a magnetic substrate 21 made of ferrite, composite ferrite, or the like is used as an insulating substrate, and a magnetic material (a magnetic substrate may be used) 22 of the same material is further disposed and fixed above the uppermost insulating layer 6. The two coil windings 11 and 12 are sandwiched between a magnetic substrate 21 and a magnetic material 22.
【0038】なお、その他の構成は前述した第1の実施
の形態と同様であり、同一又は相当部分に同一符号を付
して説明を省略する。The rest of the configuration is the same as that of the first embodiment, and the same or corresponding parts are denoted by the same reference characters and description thereof is omitted.
【0039】この第3の実施の形態によれば、第1及び
第2のコイル巻線11,12を磁性基板21と磁性材2
2とで挟み込んだことで、各コイル巻線によるインピー
ダンスの増大を図ることができる。According to the third embodiment, the first and second coil windings 11 and 12 are connected to the magnetic substrate 21 and the magnetic material 2.
2, the impedance can be increased by each coil winding.
【0040】図5は本発明の第4の実施の形態であっ
て、下側の磁性基板21に上側の磁性材22の一部が接
合して図6のように閉磁路構造となっている場合を示
す。この場合、製造手順は第3の実施の形態と同様であ
るが、異なる点は絶縁層2,3,4,5,6のパターン
形状である。第3の実施の形態での各絶縁層形成領域に
絶縁層開口部2a,3a,4a,5a,6aが互いに重
なるように現像により形成され、上側の磁性材22を層
状に形成したときに、絶縁層開口部2a,3a,4a,
5a,6a内に磁性材22が入り込んで下側の磁性基板
1に接合して閉磁路構造が形成される。ここで、対をな
したコイル巻線11,12(それぞれ2層の螺旋状導体
薄膜の直列接続)のうち、各螺旋状導体薄膜11a,1
1b,12a,12bの螺旋状周回部Xの中心部及び当
該螺旋状周回部Xの外周部で外部電極取出部Yよりも内
側位置に前記開口部2a,3a,4a,5a,6aが位
置しているから、結局、各コイル巻線11,12の巻き
方向が揃った部分を囲むように閉磁路が構成される。FIG. 5 shows a fourth embodiment of the present invention, in which a part of an upper magnetic material 22 is joined to a lower magnetic substrate 21 to form a closed magnetic circuit structure as shown in FIG. Show the case. In this case, the manufacturing procedure is the same as that of the third embodiment, except for the pattern shape of the insulating layers 2, 3, 4, 5, and 6. When the insulating layer openings 2a, 3a, 4a, 5a, 6a are formed in the respective insulating layer forming regions in the third embodiment by development so as to overlap each other, and when the upper magnetic material 22 is formed in a layered form, The insulating layer openings 2a, 3a, 4a,
The magnetic material 22 enters the insides 5a and 6a and is joined to the lower magnetic substrate 1 to form a closed magnetic circuit structure. Here, of the coil windings 11 and 12 (each of which is connected in series with two layers of spiral conductive thin films), each spiral conductive thin film 11a, 1
The openings 2a, 3a, 4a, 5a, and 6a are located at the center of the spirally wound portion X of 1b, 12a, and 12b and at the outer peripheral portion of the spirally wound portion X and inside the external electrode extraction portion Y. As a result, a closed magnetic circuit is formed so as to surround a portion where the winding directions of the coil windings 11 and 12 are aligned.
【0041】なお、上側の磁性材22として磁性基板を
用いる場合、各絶縁層2乃至6の中央部及び外部電極取
出部Yより内側の絶縁層開口部2a,3a,4a,5
a,6aに磁性材を埋め込み上面より磁性基板を貼り付
けた構造としてもよい。When a magnetic substrate is used as the upper magnetic material 22, the insulating layer openings 2a, 3a, 4a, 5 inside the central portions of the insulating layers 2 to 6 and the external electrode extraction portion Y.
It is also possible to adopt a structure in which a magnetic material is embedded in a and 6a and a magnetic substrate is attached from the upper surface.
【0042】この第4の実施の形態によれば、対をなし
たコイル巻線11,12(螺旋状導体薄膜の直列接続)
のうち、巻き方向の揃った螺旋状周回部Xを囲むように
閉磁路が構成されるため、いっそう各コイル巻線による
インピーダンスを増加させることができる。According to the fourth embodiment, a pair of coil windings 11 and 12 (series connection of spiral conductive thin films)
Of these, the closed magnetic path is formed so as to surround the spirally wound portion X having the same winding direction, so that the impedance of each coil winding can be further increased.
【0043】図7は本発明の第5の実施の形態であっ
て、下側の磁性基板21に上側の磁性材23の一部が接
合して閉磁路構造となっており、さらに磁性材23の形
状、配置を工夫した構成を示す。この場合、磁性基板2
1、各コイル巻線11,12、絶縁層2乃至6等は第4
の実施の形態と同様であるが、磁性材23の幅が磁性基
板21よりも狭くなっており、磁性材23が各螺旋状導
体薄膜11a,11b,12a,12bの巻き方向の揃
った螺旋状周回部Xを覆い、外部電極取出部Yは覆わな
いように選択的に配置され、前記螺旋状周回部Xを囲む
ように閉磁路を構成している。FIG. 7 shows a fifth embodiment of the present invention, in which a part of an upper magnetic material 23 is joined to a lower magnetic substrate 21 to form a closed magnetic circuit structure. The structure which devised the shape and arrangement of is shown. In this case, the magnetic substrate 2
1, the coil windings 11 and 12, the insulating layers 2 to 6 etc.
In this embodiment, the width of the magnetic material 23 is smaller than that of the magnetic substrate 21, and the magnetic material 23 has a spiral shape in which the spiral conductor thin films 11a, 11b, 12a, 12b are wound in the same winding direction. It is selectively disposed so as to cover the circling portion X and not to cover the external electrode extraction portion Y, and forms a closed magnetic circuit so as to surround the helical circulating portion X.
【0044】この第5の実施の形態によれば、対をなし
たコイル巻線11,12(螺旋状導体薄膜の直列接続)
のうち、巻き方向の揃った螺旋状周回部Xを囲むように
閉磁路が構成され、それら螺旋状周回部Xの領域につい
ては上下に磁性材が存在する閉磁路構造で、高いインピ
ーダンスが得られるが、インピーダンスの差が発生し易
い外部電極取出部Yを含む部分は下面のみに磁性材が存
在することになってインピーダンスが低く、コモンモー
ドチョークコイルの2個のコイル部のインピーダンスの
差が小さくなる。According to the fifth embodiment, a pair of coil windings 11 and 12 (series connection of spiral conductive thin films)
Among them, a closed magnetic circuit is formed so as to surround the spirally wound portion X having the same winding direction, and a high impedance can be obtained in a region of the spirally wound portion X by a closed magnetic circuit structure in which magnetic materials exist above and below. However, the portion including the external electrode extraction portion Y where the impedance difference is easily generated has a low impedance because the magnetic material is present only on the lower surface, and the impedance difference between the two coil portions of the common mode choke coil is small. Become.
【0045】以上本発明の実施の形態について説明して
きたが、本発明はこれに限定されることなく請求項の記
載の範囲内において各種の変形、変更が可能なことは当
業者には自明であり、例えば、螺旋状導体薄膜パターン
を変更したり、磁性材形状を変更してもよく、また2対
以上のコイル巻線を基板上に形成する構造にも本発明は
適用可能である。Although the embodiments of the present invention have been described above, it is obvious to those skilled in the art that the present invention is not limited to the embodiments and that various modifications and changes can be made within the scope of the claims. For example, the present invention is also applicable to a structure in which the spiral conductive thin film pattern is changed or the shape of the magnetic material is changed, and two or more pairs of coil windings are formed on a substrate.
【0046】[0046]
【発明の効果】以上説明したように、本発明によれば、
薄膜形成工法にて対をなすコイル巻線を螺旋状に周回し
た螺旋状導体薄膜で形成することにより、小型化及び高
いインピーダンスに対応でき、しかもインピーダンスを
均一にすることが可能で、ノーマルモード特性にノイズ
を与えない磁気結合の優れた小型のチップ型コモンモー
ドチョークコイルを実現できる。As described above, according to the present invention,
By forming a pair of coil windings with a spiral conductor thin film spirally wound by the thin film formation method, it is possible to cope with miniaturization and high impedance, and it is possible to make the impedance uniform and normal mode characteristics A small chip-type common mode choke coil with excellent magnetic coupling that does not cause noise to be realized.
【図1】本発明に係るチップ型コモンモードチョークコ
イルの第1の実施の形態を示す分解斜視図である。FIG. 1 is an exploded perspective view showing a first embodiment of a chip-type common mode choke coil according to the present invention.
【図2】同斜視図である。FIG. 2 is a perspective view of the same.
【図3】本発明の第2の実施の形態を示す分解斜視図で
ある。FIG. 3 is an exploded perspective view showing a second embodiment of the present invention.
【図4】本発明の第3の実施の形態を示す分解斜視図で
ある。FIG. 4 is an exploded perspective view showing a third embodiment of the present invention.
【図5】本発明の第4の実施の形態を示す分解斜視図で
ある。FIG. 5 is an exploded perspective view showing a fourth embodiment of the present invention.
【図6】第4の実施の形態の閉磁路構造を示す側断面図
である。FIG. 6 is a side sectional view showing a closed magnetic circuit structure according to a fourth embodiment.
【図7】本発明の第5の実施の形態を示す分解斜視図で
ある。FIG. 7 is an exploded perspective view showing a fifth embodiment of the present invention.
【図8】従来技術の分解斜視図である。FIG. 8 is an exploded perspective view of a conventional technique.
【図9】同斜視図である。FIG. 9 is a perspective view of the same.
1 絶縁基板 2,3,4,5,6 絶縁層 2a,3a,4a,5a,6a 開口部 11,12 コイル巻線 11a,11b,12a,12b 螺旋状導体薄膜 20 外部電極 21 磁性基板 22,23 磁性材 15a,15b,16a,16b スルーホール DESCRIPTION OF SYMBOLS 1 Insulating substrate 2,3,4,5,6 Insulating layer 2a, 3a, 4a, 5a, 6a Opening 11,12 Coil winding 11a, 11b, 12a, 12b Spiral conductor thin film 20 External electrode 21 Magnetic substrate 22, 23 Magnetic material 15a, 15b, 16a, 16b Through hole
Claims (5)
導体薄膜を厚み方向に積み重ねた構造で対を成すコイル
巻線を形成し、各コイル巻線は2層の螺旋状導体薄膜の
直列接続からなり、前記2層の螺旋状導体薄膜の一端同
士が接続され、他端が外部電極にそれぞれ接続されると
ともに、一方のコイル巻線を構成する2層の螺旋状導体
薄膜の層間に他方のコイル巻線を構成する2層の螺旋状
導体薄膜のうちの一層が介在していることを特徴とする
チップ型コモンモードチョークコイル。1. A pair of coil windings having a structure in which an insulating layer and a spiral conductive thin film are stacked in a thickness direction on a main surface of an insulating substrate, and each coil winding is a two-layer spiral conductive thin film. Are connected in series, one end of the two-layer spiral conductive thin film is connected to each other, and the other end is connected to the external electrode, respectively, and between the two spiral conductive thin films forming one coil winding. Characterized in that one of the two layers of the spiral conductive thin film constituting the other coil winding is interposed therebetween.
上側に磁性材を配して前記対をなすコイル巻線を前記磁
性基板と磁性材で挟み込んだ請求項1記載のチップ型コ
モンモードチョークコイル。2. The chip-type common mode choke according to claim 1, wherein said insulating substrate is a magnetic substrate, and a pair of coil windings is sandwiched between said magnetic substrate and said magnetic material by further arranging a magnetic material on the upper side. coil.
状導体薄膜の中央部及び周辺部となる位置の前記絶縁層
に開口を形成し、該開口にも磁性材が設けられて閉磁路
構造となっている請求項2記載のチップ型コモンモード
チョークコイル。3. The closed magnetic circuit, wherein the insulating substrate is a magnetic substrate, an opening is formed in the insulating layer at a position to be a central portion and a peripheral portion of each spiral conductive thin film, and a magnetic material is also provided in the opening. 3. The chip-type common mode choke coil according to claim 2, which has a structure.
部電極取出部とからなり、前記周辺部の開口が前記外部
電極取出部より内側に位置する請求項3記載のチップ型
コモンモードチョークコイル。4. The chip-type common mode according to claim 3, wherein each spiral conductive thin film includes a spiral circling portion and an external electrode extraction portion, and the opening in the peripheral portion is located inside the external electrode extraction portion. choke coil.
極取出部以外の螺旋状周回部を含む領域上に配されてい
る請求項4記載のチップ型コモンモードチョークコイ
ル。5. The chip-type common mode choke coil according to claim 4, wherein said magnetic material is disposed on a region including a helical wrap around the helical conductor thin film other than the external electrode extraction portion.
Priority Applications (1)
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JP2001179959A JP2002373810A (en) | 2001-06-14 | 2001-06-14 | Chip type common mode choke coil |
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Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001179959A JP2002373810A (en) | 2001-06-14 | 2001-06-14 | Chip type common mode choke coil |
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Family
ID=19020446
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