JP2001337208A - Rough body, reflecting plate, reflective liquid crystal display device, method for producing the same and apparatus therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a rough body capable of easily producing a rough structure, a reflecting plate, a lens, a method for producing the same and an apparatus therefor. SOLUTION: A reflecting layer having a rough structure is formed on a substrate by subjecting a negative type resist to back exposure. When the resist is converted to an absorption type resist by adding a dye, a rough structure having an inclined plane is formed by only one layer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a concavo-convex shaped body having a concavo-convex structure such as a scattering reflector capable of realizing a bright and good image display with low power consumption by utilizing ambient light. And a reflection type liquid crystal display device provided with a scattering reflection plate, and a manufacturing method and a manufacturing apparatus thereof.

[0002]

2. Description of the Related Art With the rapid spread of mobile terminals and the like, reflective liquid crystal panels have been receiving attention. The reflective liquid crystal panel reflects external light to perform display, so that sufficient display performance can be obtained in an environment where external light is strong, such as outdoors, but visibility deteriorates extremely in dark indoors or at night.

[0003] For this purpose, it is desirable to improve the reflectance in the observer direction by using a scattering reflector that reflects light incident from the periphery in the direction of the observer in the reflective liquid crystal panel. . As a means for achieving this, a method of forming a plurality of uneven structures on a pixel electrode has been disclosed (Japanese Patent Application Laid-Open No. 5-281533). At this time, the uneven structure composed of a plurality of layers was formed by repeating the process of applying, exposing, and developing the photosensitive polymer film, and then performing the thermal annealing process.

[0004]

The reflectance of the panel in the observer direction is determined by the unevenness of the reflective layer. At this time, it is necessary to maintain a high luminance in a range from the front to a polar angle of 30 ° with ideal reflection characteristics.

[0005] In order to realize ideal reflectance characteristics, it is necessary to make the inclined surface of the convex portion of the uneven shape as steep as a substantially triangular shape. However, a technique for easily forming the uneven inclined surface into a substantially triangular shape has not been obtained so far. Further, conventionally, a method of repeating a process of applying and exposing a photosensitive polymer film, and a process of developing and thermally annealing to form a concave-convex shape has been adopted, and the process was complicated and there was a problem in productivity. . In addition, the problem of such a scattering reflector is the same also in the uneven structure having an uneven structure such as a lens.

An object of the present invention is to solve the above-mentioned problems and to provide a concave-convex-shaped body, a reflector and a lens, and a method and a device for producing the same, which can easily produce a concave-convex structure.

[0007]

In order to achieve the above-mentioned object, the present invention provides an uneven body having an uneven structure on a substrate, wherein the uneven structure comprises a photosensitive polymer containing a light-absorbing substance. It is characterized by including. Alternatively, the uneven structure portion includes a photosensitive polymer including a light-scattering substance.

By using a photosensitive polymer containing a light-absorbing substance or a light-scattering substance and performing backside exposure and development processing, a concavo-convex structure having a predetermined inclination angle can be obtained. Note that the present invention can be applied to an uneven body having an uneven structure, a scattering reflector, a lens, and a liquid crystal display element using the scattering reflector.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. The present invention is not limited by the present embodiment.

[0010] The present invention is an invention of a concavo-convex shaped body having a concavo-convex structure portion on a substrate, wherein a photosensitive polymer containing a light-absorbing substance is subjected to a backside exposure treatment and a development treatment.
The main feature is to form an uneven shape of the uneven structure portion. Embodiments 1 to 2-9 will be described below as specific examples of the present invention group, and the contents of the present invention group will be described. In the following embodiments, a reflector of a liquid crystal display element will be described as an example of the uneven body.

(First Embodiment) FIG. 1 is a sectional view of a liquid crystal display device according to a first embodiment. In this embodiment mode, a TFT element 202 as a pixel switching element is formed on an array substrate 200, and a flattening layer 201 is stacked thereon. The feature of this embodiment is that the planarizing layer 20
1 is that an uneven structure composed of a single layer of the photosensitive polymer 203 is formed on the first polymer. At this time, the photosensitive polymer 2
It is preferable that a negative type be used as 03 and that the negative type photosensitive polymer (hereinafter referred to as a resist) contains a light absorbing substance such as a dye. A resist containing a dye absorbs light in the layer thickness direction as shown in FIG. 2, so that the transmittance changes according to the film thickness. For this reason, at the time of exposure, the amount of exposure is large on the irradiation side of the layer, and the amount of exposure decreases toward the opposite side. Since the exposed portion of the negative resist remains, when exposed from the back surface, the residual film property increases toward the substrate side as shown in FIG. 3, and an uneven structure having an upwardly inclined surface is formed by the development process.

Conventionally, two or more resist layers are laminated to form an uneven structure. However, by using the above method, an uneven structure having an inclined surface can be easily formed with only one resist layer.

The reflective layer 204 is laminated on the thus formed uneven structure using a conductive material such as a metal to form a reflective electrode. The reflective electrode is connected to the TFT element 202 via a contact hole 210 opened in the flattening layer 201, and an image signal is supplied to the reflective electrode by the TFT element. Then, the optical characteristics of the liquid crystal 205 sandwiched between the reflective electrode and a counter electrode (not shown) formed on the counter substrate 207 are controlled according to the image signal.
The change in the optical characteristics of the liquid crystal layer 205 is converted into a change in transmittance by the polarizing plate 209 and the phase difference plate 208 disposed outside the counter substrate, and an image is displayed. In the present embodiment, an active matrix system using a TFT element is taken as an example, but it goes without saying that such a reflective electrode can be applied to a simple matrix system using no TFT. The role of the reflective electrode and the operation of the liquid crystal display element described here are the same in the following embodiments.

[Method of Manufacturing Concavo-convex Structure on Substrate]
The principle of the method of manufacturing the uneven structure will be described, and then a specific manufacturing method will be described.

(1) Principle of Manufacturing Method for Concavo-convex Structure FIG. 3 is a principle diagram showing a method for manufacturing a concavo-convex structure in the present embodiment. As shown in FIG.
After the negative photosensitive polymer 203 is applied thereon, the convex portion 215 (see FIG. 3B) is formed by exposing the substrate back surface with ultraviolet rays 214 using a mask 213. At this time, if the photosensitive polymer 203 contains a dye, the ultraviolet rays 214 are absorbed in the layer thickness direction, and the etching rate during development differs in the layer thickness direction. Therefore, an uneven structure having an inclined surface is formed after the development. By making the etching rate different in the layer thickness direction in this way, it becomes possible to form an inclined surface in the uneven structure after development. Therefore, an uneven structure is formed with a one-layer structure. By using the backside exposure, an upwardly convex structure can be obtained. The etching rate at this time is determined by the layer thickness and the content of the dye, and can be arbitrarily set according to the inclination angle of the uneven structure. Also, the greater the layer thickness and the greater the absorption by the dye, the greater the layer change in the etching rate and the sharper the projections.

(2) Specific Example of Manufacturing Method for Concavo-convex Structure A specific method for manufacturing the concavo-convex structure in the present embodiment will be described based on the above principle. On the array substrate 200, a negative photosensitive polymer 203 (OMR-83, manufactured by Tokyo Ohka Kogyo Co., Ltd.)
Was applied at a film thickness of 2 μm. At this time, the photosensitive polymer 20
No. 3 contains a dye and has a wavelength of 405 when the film thickness is 2 μm.
The light absorption in nm was set to 80%.

Next, using a mask in which a large number of circles each having a diameter of 10 μm are arranged as openings, projection exposure is performed from the back surface of the substrate using ultraviolet light having a wavelength of 405 nm.
Development processing was performed with a developer and a rinse solution (both manufactured by Tokyo Ohka Kogyo Co., Ltd.).

When the substrate was observed with a laser microscope, it was found that a smooth uneven structure having an average inclination angle of 10 ° was formed on the surface. FIG. 4 shows the result of measuring the average inclination angle of the concavo-convex structure by performing the same treatment by changing the light absorption rate when the film thickness is 2 μm according to the dye content. As the light absorptivity increased, the average tilt angle increased exponentially. This is because the etching rate in the layer thickness direction correlates with the light absorption rate. When the light absorptance is 50% or less, the difference in etching rate is small, so that the average inclination angle is as small as about 1 to 2 °, and the reflection characteristics are mirror-like, so that good reflection display cannot be obtained.

When the light absorption rate was 50% or more, the average inclination angle became 3 ° or more, and scattering performance began to occur. The average tilt angle of 8 ° to 15 ° at which a good reflection display was obtained was obtained at a light absorption rate of 70% or more. Note that if the light absorption is too large, the exposure time will be long. Therefore, it is desirable that the light absorption not exceed 95% from the viewpoint of productivity.

Conventionally, two or more resist layers are laminated to form an uneven structure. However, by using the above-described method, an uneven structure having an inclined surface can be easily formed using only one resist layer.

If the photosensitive polymer is of a negative type, the above-mentioned example is not applied. Also. The film thickness and the dye content can be arbitrarily set using the light absorptivity as an index, but in practice, the film thickness is desirably 1 μm or more and 5 μm or less. When the film thickness is 1 μm or less, there is a possibility that the layer is peeled off by development, and when the film thickness is 5 μm or more, the upper surface of the layer is shaved at the time of development, and the shape of the uneven structure becomes unstable. Any negative resist other than the above examples may be used as the resist.

(Embodiment 2) The present embodiment 2 is different from FIG.
Is characterized in that the photosensitive polymer 203 is made of a negative resist in which the shape of the concavo-convex structure does not substantially change by thermal annealing after development. When the concavo-convex structure is formed in the same manner as in Embodiment 1, the residual film property of the resist changes in the layer thickness direction, so that a concavo-convex structure having an upwardly inclined surface is formed. By adopting a configuration in which this uneven structure formed of resist does not change its shape due to heat, the effect that the uneven structure is not deformed even during a high-temperature process such as alignment film or seal hardening at the time of panel production and good reflection characteristics can be obtained. There is.

Conventionally, an inclined surface is formed by dissolving an upper layer resist by a thermal annealing treatment, and it has been difficult to control the shape. When this configuration is used, a heat treatment step is not required, and the controllability of the uneven shape is increased, so that the productivity is greatly improved. Since heat treatment is unnecessary, a plastic substrate having lower heat resistance than glass can be used as the substrate.

[Manufacturing Method of Concavo-convex Structure on Substrate] The manufacturing method in this embodiment is basically the same as that in the first embodiment. However, this embodiment differs from the first embodiment in that the photosensitive polymer 203 is a negative resist (OMR-85, manufactured by Tokyo Ohka Kogyo Co., Ltd.) whose shape of the concavo-convex structure is not substantially changed by thermal annealing after development.

Using such a negative resist, a substrate was manufactured in the same manner as in the first embodiment. Then, the prepared substrate is subjected to a heat treatment step of 20 for panel production.
Annealing treatment was performed at 0 ° C./30 minutes (curing of the alignment film) and at 160 ° C./120 minutes (curing of the seal), and the shape change of the concavo-convex structure was observed with a laser microscope. As a result, the change in the average inclination angle before and after annealing was as small as about 1 °, 9.4 ° after annealing, compared with 10.5 ° before annealing, and the change was 10% or less. In addition, almost the same reflection characteristics were obtained.

Change in average tilt angle before and after annealing is 20%
If it is less than the above, it is a level that can be used for a small panel of 2 "or less even if the dispersion of the inclination angle distribution is taken into consideration.
It is possible to apply to.

By forming the concave-convex structure having the inclined surface with the resist whose shape does not change by the heat treatment, the variation in the inclination angle due to the annealing treatment is reduced and the productivity is improved.

(Embodiment 3) FIG. 5 is a sectional view of a liquid crystal display device of Embodiment 3. A configuration in which a plurality of photosensitive polymers are laminated on the array substrate 200 (photosensitive polymer 23
1A, 231B, and 231C), at least one layer is a negative photosensitive polymer when the uneven structure is formed. At this time, by performing back exposure on the negative resist, an uneven structure having an inclined surface is formed for the above-described reason. In addition, when the photosensitive polymer layer has a multilayer structure, an effect is obtained in which the height of the uneven structure and the angle of the inclined surface can be more easily controlled. Further, by making the negative resist layer the uppermost surface, the vertices of the convex portions become smooth and the regular reflection portions are reduced, so that the visibility is improved.

[Method of Manufacturing Irregular Structure on Substrate] Positive photosensitive polymers 231A and 23
1B (both OFPR5000, manufactured by Tokyo Ohka Kogyo Co., Ltd.) were each 12 μm in diameter, 0.5 μm in thickness, and 8 μm in diameter.
After being formed to a thickness of 0.6 μm, the negative photosensitive polymer C2
31C (OMR-83, manufactured by Tokyo Ohka Kogyo Co., Ltd.)
4 μm in diameter and 1.0 μm in thickness
Was processed into a convex structure. At this time, an uneven structure having a total step of 2.3 μm was obtained in the three layers. Then, the concavo-convex structure was covered with a resin, and a reflective layer 204 was further formed thereon using aluminum. At this time, the average inclination angle of the projections of the reflective layer was 9 °, and the reflection characteristics were high and excellent.

The structure of the photosensitive polymer layer can be arbitrarily set depending on the height of the uneven structure and the angle of the inclined surface, regardless of the above example. Further, an inorganic material may be used instead of the photosensitive polymer layer, and a step may be formed using, for example, Si, SiO ₂ , SiNx, or the like. By making the negative resist layer the uppermost surface, the apex of the convex portion becomes smooth, and the effect of improving the visibility by reducing the regular reflection portion is obtained. However, this is not necessarily the uppermost layer. Even in the lower part, an inclined surface can be obtained by laminating the upper layer on the shape of the convex vertex. However, in this case, since the upper layer is a planar layer, shape control becomes slightly difficult.

(Embodiment 4) In the structure similar to that of FIG. 5, the photosensitive polymer 231C is formed of a negative resist in which the shape of the uneven structure is not substantially changed by thermal annealing after development. I do. When a negative resist in which the shape of the uneven structure is not changed by the thermal annealing is used, the uneven structure can be easily formed for the reason described in the second embodiment, and the productivity is improved.

[Method of Manufacturing Concavo-convex Structure on Substrate] In the same configuration as in the third embodiment, a photosensitive polymer 231C
However, a negative resist (OMR-85, manufactured by Tokyo Ohka Kogyo Co., Ltd.) in which the shape of the concavo-convex structure hardly changes by thermal annealing after development
Formed. For the reason described in Embodiment 2, there was no change in the shape of the concavo-convex structure in the heat treatment step at the time of manufacturing the panel, and thus the manufactured liquid crystal display element had good reflection characteristics.

(Embodiment 5) FIG. 6 is a sectional view of a liquid crystal display device according to Embodiment 5. The fifth embodiment is similar to the first embodiment, and corresponding parts are denoted by the same reference numerals.
In the fifth embodiment, the opening 242 is formed on the array substrate 200.
When the light-shielding layer 241 and the planarizing layer 201 and the like having the
40 is formed on the opening 242 of the light shielding layer 241.

By performing backside exposure using the light-shielding layer 241 as a mask, a concave-convex structure can be formed on the negative photosensitive polymer 203. At this time, the vertex 240 corresponds to the opening 2
42.

By providing the light-shielding layer internally, there is an effect that an external mask becomes unnecessary, alignment accuracy is improved, and shape control of the uneven structure is facilitated. In addition, a storage capacitor can be formed between the light shielding layer 241 and the reflection layer 204, so that productivity is improved.

[Method of Manufacturing Uneven Structure on Substrate]
The principle of the method of manufacturing the uneven structure will be described, and then a specific manufacturing method will be described.

(1) Principle of Manufacturing Method for Concavo-convex Structure FIG. 7 is a principle view showing a method for manufacturing a concavo-convex structure according to the present embodiment. As shown in FIG. 7A, a light-shielding layer 241 having an opening, a flattening layer 201, and the like are formed on a substrate 200, and a negative photosensitive polymer containing a dye or the like is applied to form a photosensitive layer. The polymer resin layer 203A is formed. Next, when light is exposed from the back surface of the substrate using ultraviolet light 214, the light shielding layer 24 is exposed.
1 serves as a mask, and a convex portion 215 (see FIG. 7B) having an apex in a region of the opening of the light shielding layer is formed.

By providing the light shielding layer 241 inside the substrate,
There is an advantage that a mask becomes unnecessary and patterning accuracy is improved. The photosensitive polymer layer is different from the one-layer structure shown in FIG. 7 in that the photosensitive polymer 256A, 256 shown in FIG.
A multilayer structure such as two layers of B may be used.

(2) Specific Example of Manufacturing Method of Concavo-convex Structure Portion A circular opening 24 having a diameter of 10 μm is formed on the array substrate 200.
Light-shielding layer 241 having a thickness of 2 and a planarizing layer 201
(SiO 2 layer, layer thickness 1 μm) and the like. Next, a negative photosensitive polymer 203 (OMR-83, manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied to a thickness of 2 μm, and then exposed from the back surface of the substrate using the light-shielding layer 241 as a mask. As a result of development and rinsing after exposure, an uneven structure having an apex 240 at the opening 242 of the light shielding layer 241 was formed.
The average inclination angle at this time was 8 °.

As described above, by performing the back surface exposure using the light shielding layer 241 as a mask, an uneven structure was formed on the negative photosensitive polymer 203. By providing the light-shielding layer internally, there is an effect that an external mask is not required, the alignment accuracy is improved, and the shape control of the uneven structure is facilitated. Also, the light shielding layer 24
1 and the reflective layer 204 can also be used as a storage capacitor, which improves productivity. The opening 242 may have any configuration according to the shape of the uneven structure.

(Embodiment 6) FIG. 9 is a structural view of an array substrate of a liquid crystal display element according to Embodiment 6. Embodiment 5
In the same configuration as described above, the light shielding layer 2
41 are formed, and the uneven structure has a plurality of photosensitive polymers (2
60A, 260B, 260C). By using a plurality of photosensitive polymers, the effect of easily controlling the shape of the uneven structure for the above-described reason can be obtained. Also,
By providing the light shielding layer 241 internally, there is an effect that an external mask becomes unnecessary.

[Method of Manufacturing Concavo-convex Structure on Substrate] A light-shielding layer 241 was formed of aluminum on the array substrate 200 in the same manner as in the fifth embodiment. Further, a plurality of photosensitive polymers (260A, 260A,
260B, 260C). At this time, the photosensitive polymer 260C of the uppermost layer was formed by exposing the negative resist to the back surface. By using a plurality of photosensitive polymers, the effect of easily controlling the shape of the uneven structure for the above-described reason can be obtained. Further, by internally providing the light shielding layer 241, there is an effect that an external mask becomes unnecessary.

(Embodiment 7) FIG. 10 shows a pixel configuration of a liquid crystal display element of Embodiment 7. In the configuration substantially similar to that of the fifth embodiment shown in FIG. 6, the opening 271 of the light shielding layer 270 is formed in the shape of the opening of the diffraction grating. At this time, the opening 271 is
And a structure including the vertices. Further, the negative resist does not necessarily need to contain a dye or the like. In FIG. 10, 273 is a contact hole, 274 is a reflective electrode,
75 indicates a source line, and 276 indicates a gate line.

When the back surface exposure is performed with the light-shielding layer in the form of a diffraction grating, the exposed light 214 is diffracted as shown in FIG. 0 of diffracted light
Next, the light goes straight and becomes straight light 214A. However, since the diffracted light 214B having a higher order than the first order irradiates the resist obliquely,
The concavo-convex shape after the development is a concavo-convex structure having an inclined surface (see FIG. 11A). When exposure is performed using diffracted light in this manner, an uneven structure having an inclined surface is formed without using a multilayer structure. Also, the resist does not need to contain a dye or the like.

In the above description of the principle, the case of performing exposure using a mask has been described as an example. However, the same applies to exposure in which a light-shielding layer having an opening is formed and the mask is omitted.

[Method of Manufacturing Irregularity Structure on Substrate]
The principle of the method of manufacturing the uneven structure will be described, and then a specific manufacturing method will be described.

(1) Principle of Manufacturing Method for Concavo-convex Structure FIG. 12 is a principle diagram showing a method for manufacturing a concavo-convex structure according to the present embodiment. In a configuration substantially similar to that of the fifth embodiment,
The light shielding layer 270 is formed in a shape having diffraction performance. When the exposure is performed using the diffracted light, the photosensitive polymer is exposed even to oblique light for the above-described reason, and an uneven structure having an inclined surface is formed. The use of diffracted light does not require the negative resist to contain a dye or the like, and has the advantage of cost reduction.

The pitch of the openings of the light-shielding layer 270 is P, and the distance between the light-shielding layer 270 and the apex of the projection of the uneven structure is d.
By setting P> d, nodes and antinodes of the diffracted light (interference light) are formed at a short pitch, and consequently, the uneven structure can be formed densely.

Further, the concavo-convex structure can be changed by changing the shape of the opening of the light-shielding layer 270. For example, if it is circular, a dot-like uneven structure can be formed, and if it is a stripe, a stripe-like uneven structure can be obtained.

(2) Specific Example of Manufacturing Method of Concavo-convex Structure A specific method of manufacturing the concavo-convex structure in this embodiment will be described based on the above principle. In a configuration substantially similar to that of the fifth embodiment, the light shielding layer 270 was formed in the shape of a dot-shaped diffraction grating. At this time, the opening 271 of the diffraction grating
Was a circle having a diameter of 10 μm. Next, a negative photosensitive polymer (OMR-83, manufactured by Tokyo Ohka Kogyo Co., Ltd.) was
Was applied. At this time, a photosensitive polymer containing no dye or the like and having a light absorption of 5% was used.

When the back surface exposure was performed with the light-shielding layer in the form of a diffraction grating, the photosensitive resist was irradiated with diffracted light. At this time, the 0th order of the diffracted light goes straight, but the diffracted light of higher order than the 1st order irradiates the resist obliquely, so that the concavo-convex shape after development has a concavo-convex structure having an inclined surface. The average inclination angle at this time was 7 °. When exposure is performed using diffracted light in this manner, an uneven structure having an inclined surface is formed without using a multilayer structure. Further, the resist does not need to contain a dye or the like, so that the cost can be reduced.

(Eighth Embodiment) In the eighth embodiment, when the photosensitive polymer on the substrate is exposed, the exposure light is made incident on the substrate in an oblique direction, so that the uneven structure portion is formed on the substrate. Is formed.

More specifically, a manufacturing apparatus described below was used for producing the uneven structure. FIG. 13 shows a principle diagram of the substrate manufacturing apparatus of the present invention. As shown in FIG. 13A, after a photosensitive polymer 203 is applied on a substrate 200,
By providing a means (mechanism) for irradiating light to be exposed from a plurality of directions (ultraviolet rays 214C and ultraviolet rays 214D) through the mask 213, the projections 215 (FIG.
(See (b)). By irradiating from a plurality of directions, the etching rate of the photosensitive polymer 203 in the layer thickness direction changes, and an uneven structure having an inclined surface is formed. At this time, the incident direction is desirably within a polar angle of 60 °. The solid angle of the exposure light is 0.5 ° or more and 15 ° or more.
° or less.

Further, by using a manufacturing apparatus having a mechanism for making the incident angle of the ultraviolet ray different when the light is incident from a plurality of directions, an uneven structure having an asymmetrical shape can be easily formed. At this time, the reflection characteristics become asymmetric, and for example, when the substrate is tilted, the reflected light is condensed on the observer side to achieve high luminance.

The degree of interference can be adjusted by changing the phases of the ultraviolet rays 214C and 214D. At this time, an effect is obtained that the etching rate in the layer thickness direction can be further arbitrarily adjusted. For this reason, an ultraviolet phase conversion mechanism may be provided in the substrate manufacturing apparatus.

Embodiment 9 This embodiment is characterized in that a substrate having an uneven structure is manufactured by exposure using a so-called two-beam interference method.

The exposure apparatus used in this embodiment is shown in FIG.
As shown in FIG. 19, exposure light is irradiated onto the substrate 200 on which the photosensitive resin 285 is applied through a mask 281 having a pinhole 280 having a diameter of 5 μm and two or more slits 283. At this time, an ultra-high pressure mercury lamp was used as a light source of the exposure light, and a resin having a photosensitive characteristic for i-line (365 nm) was used as the photosensitive resin 285. The distance between the slits was h (= 50 μm), which was set equal to the distance from the pinhole, and the slit used was a pinhole having a diameter of 5 μm.
Assuming that the distance between the slit and the substrate is D (= 3.42 mm),
When the photosensitive resin was irradiated with exposure light and developed, a convex shape having a pitch Δ (= 25 μm) was formed. By setting the thickness of the resin to 2 to 3 μm, a shape having an inclination angle of about 10 ° could be produced.

In this embodiment, a single light source and
Although the exposure light of two spherical waves having the same phase was apparently achieved by using the pinhole and the two slits, the present invention can be similarly implemented by using two or more lasers or the like. Further, the pitch of the uneven shape is Δμm, the distance between the slits is hμm, the distance between the slits and the photosensitive resin is Dμm,
Assuming that the wavelength of the exposure light is λ nm, Δ = 1000 × λD / h If the inclination angle is θ ° and the maximum thickness of the resin after development is d, 2d / Δ = tan θ By appropriately setting h, D, λ, d, and θ, it is possible to produce an arbitrary uneven shape.

(Other Matters) (1) By providing a backlight, a housing, and the like to the liquid crystal display element described in the above embodiment, favorable display can be achieved at low cost due to simplification of the manufacturing process. A liquid crystal display device exhibiting high performance can be realized.

(2) In the above embodiment, the reflector of the liquid crystal display element has been described. However, the present invention is not limited to this, and may be used in an optical element such as a lens or in other technical fields. It can be widely applied to irregularly shaped bodies and the like.

(3) In the above embodiment, the light absorbing material such as a dye is contained in the photosensitive polymer. However, instead of the light absorbing material, a light scattering material such as metal particles is used in the photosensitive polymer. May be contained. When a light-scattering substance is contained, the absorptivity of ultraviolet rays at the time of exposure can be changed in the film thickness direction in the same manner as when a light-absorbing substance is contained, so that an uneven structure can be formed.

(4) Although a negative photosensitive polymer is used in the above embodiment, a positive photosensitive polymer may be used. In the case of using a positive photosensitive polymer, a mask in which a light-shielding portion and an opening of a mask used when a negative photosensitive polymer are used may be used.

[0063]

As described above, according to the present invention, a negative photosensitive polymer is coated on a substrate and then exposed from the back surface, thereby forming a concavo-convex structure having a one-layer structure and an inclined surface. Is done. Further, since it is not necessary to control the uneven shape by thermal annealing, productivity is improved and cost can be reduced.

[Brief description of the drawings]

FIG. 1 is a sectional view of a liquid crystal display device according to a first embodiment of the present invention.

FIG. 2 is a graph showing the relationship between the thickness of a resist containing a dye and the transmittance.

FIG. 3 is a principle view showing a method for manufacturing a concave-convex structure portion in the first embodiment.

FIG. 4 is a diagram showing a relationship between a light absorption rate of a photosensitive polymer and an average inclination angle.

FIG. 5 is a sectional view of a liquid crystal display element according to a third embodiment.

FIG. 6 is a cross-sectional view of a liquid crystal display device according to a fifth embodiment.

FIG. 7 is a principle view illustrating a method of manufacturing a concave-convex structure portion according to a fifth embodiment.

FIG. 8 is a sectional view of a multilayer structure such as two layers made of photosensitive polymers 256A and 256B.

FIG. 9 is a configuration diagram of an array substrate of a liquid crystal display element according to a sixth embodiment.

FIG. 10 illustrates a pixel configuration of a liquid crystal display element in Embodiment 7.

FIG. 11 is a diagram showing a state in which the exposure light becomes a diffracted light and irradiates a photosensitive resist.

FIG. 12 is a principle view illustrating a method of manufacturing a concave-convex structure portion according to a seventh embodiment.

FIG. 13 shows a principle view of a substrate manufacturing apparatus according to the present invention.

FIG. 14 is a view illustrating the principle of an exposure apparatus used in Embodiment 9;

[Explanation of symbols]

 200: array substrate 201: flattening film 202: TFT element 203: photosensitive polymer 204: reflective layer 205: liquid crystal 206: color filter 207: counter substrate 208: retardation plate 209: polarizing plate 210: contact hole

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification code FI Theme coat ゛ (Reference) G02F 1/1335 520 G02F 1/1335 520 (72) Inventor Naohide Wakita 1006 Odakadoma, Kadoma City, Osaka Matsushita Electric F-term in Sangyo Co., Ltd. (reference) 2H042 BA02 BA03 BA12 BA14 BA15 BA20 2H048 CA01 CA04 CA14 CA19 CA24 2H091 FA02Y FA08X FA11X FA14Y FB04 FB06 FC10 GA13 KA10 LA12 LA16 LA30

Claims (35)

[Claims] 1. An uneven body having an uneven structure on a substrate, wherein the uneven structure includes a photosensitive polymer containing a light-absorbing substance. 2. An uneven shape body having an uneven structure portion on a substrate, wherein the uneven structure portion contains a photosensitive polymer containing a light-scattering substance. 3. The uneven body according to claim 1, wherein said light-absorbing substance is a dye. 4. The uneven body according to claim 1, wherein said photosensitive resin comprises one layer. 5. The uneven shape body according to claim 1, wherein the uneven structure portion has an inorganic layer. 6. The uneven shape body according to claim 1, wherein the uneven structure portion has an organic layer. 7. The uneven body according to claim 1, wherein a light shielding layer is formed on the substrate side. 8. The uneven body according to claim 7, wherein said light shielding layer is formed in a stripe shape. 9. The uneven shape body according to claim 7, wherein said light shielding layer is formed in a dot shape. 10. The pitch of the dot-shaped light-shielding layer is P μ
m, wherein when the thickness between the light-shielding layer and the apex of the convex portion is d μm, P> d is satisfied.
The uneven shape body as described. 11. An uneven body having an uneven structure portion on a substrate, wherein the uneven shape of the uneven structure portion is obtained by subjecting a photosensitive polymer containing a light-absorbing substance to a back surface exposure process and a development process. An uneven shape characterized by being obtained by: 12. An uneven body having an uneven structure on a substrate, wherein the uneven shape of the uneven structure is obtained by subjecting a photosensitive polymer containing a light-scattering substance to a backside exposure treatment and a development treatment. An uneven shape characterized by being obtained by: 13. A method for manufacturing an uneven shape body having an uneven structure portion on a substrate, comprising: forming at least a photosensitive polymer layer on the substrate; A method for producing a concavo-convex body, comprising forming a concavo-convex structure on a surface of a layer. 14. The method according to claim 13, wherein the backside exposure is exposure using diffracted light on a mask. 15. The method according to claim 13, wherein the photosensitive polymer layer is a single layer. 16. The photosensitive polymer layer contains a material that attenuates transmitted light in a layer thickness direction, and the exposure is exposure using attenuated light in the photosensitive polymer layer. A method for producing an uneven shape body according to claim 13. 17. In the photosensitive polymer layer, the intensity of light incident upon exposure at an exposure wavelength of 50% or more and 95% or more.
%. The method for producing a concave-convex shaped body according to claim 16, wherein not more than% is absorbed. 18. The photosensitive polymer layer, wherein the intensity of light incident upon exposure at an exposure wavelength is 70% or more and 95% or more.
%. The method for producing a concave-convex shaped body according to claim 16, wherein not more than% is absorbed. 19. The method according to claim 13, wherein the thickness of the photosensitive polymer layer is 1 μm or more and 5 μm or less. 20. A method of manufacturing an uneven body having an uneven structure on a substrate, comprising: forming a light-shielding layer having an opening at least at a position corresponding to a convex portion of the uneven structure on the substrate; A method for producing a concavo-convex body, wherein a concavo-convex structure is formed on the surface of the photosensitive polymer layer by forming a layer and performing a backside exposure and a development treatment. 21. The method according to claim 20, wherein the backside exposure is a backside exposure using diffracted light caused by an opening of the light shielding layer. 22. The photosensitive polymer layer contains a material that attenuates transmitted light in a layer thickness direction, and the exposure is exposure using attenuated light in the photosensitive polymer layer. 21. The method for producing a concavo-convex body according to claim 20. 23. The photosensitive polymer layer, wherein the intensity of light incident upon exposure at an exposure wavelength is 50% or more and 95% or more.
23. The method according to claim 22, wherein not more than 10% is absorbed. 24. The photosensitive polymer layer, wherein the intensity of light incident upon exposure at an exposure wavelength is 70% or more and 95% or more.
23. The method according to claim 22, wherein not more than 10% is absorbed. 25. A method of manufacturing a concave-convex shaped body having a concave-convex structure, wherein when exposing a back surface to a substrate on which a photosensitive polymer layer is laminated, light to be exposed enters the substrate obliquely. The method for producing a concave-convex body according to claim 13. 26. The method according to claim 25, wherein the solid angle of the light to be exposed at the time of performing the back surface exposure is 0.5 ° or more and 15 ° or less. 27. An uneven body having an uneven structure portion on a substrate, wherein the uneven shape of the uneven structure portion is such that a photosensitive polymer layer is formed on a substrate, and a three-dimensional structure is formed on the photosensitive polymer layer. An uneven surface characterized by being obtained by performing a back surface exposure process and a development process of an oblique exposure method in which exposure light having an angle of 0.5 ° or more and 15 ° or less is incident on a substrate in an oblique direction. Shape body. 28. A manufacturing apparatus for a substrate, comprising: means for causing light to be exposed to enter the substrate obliquely when performing backside exposure on the substrate on which the photosensitive polymer layer is laminated. apparatus. 29. The substrate manufacturing apparatus according to claim 28, wherein a solid angle of light to be exposed when performing the backside exposure is 0.5 ° or more and 15 ° or less. 30. An uneven shape body manufactured by the manufacturing apparatus according to claim 28. 31. A step of applying a photosensitive resin to a substrate, a step of irradiating the photosensitive resin with exposure light having at least two spherical waves having the same phase, and a step of applying the photosensitive resin irradiated with the exposure light. And a developing step. 32. An uneven body having an uneven structure portion on a substrate, wherein the uneven shape of the uneven structure portion is such that a photosensitive polymer layer is formed on a substrate, and at least two photosensitive polymer layers are formed on the photosensitive polymer layer. An uneven shape body obtained by performing an exposure process of irradiating exposure light having a same number of spherical waves of the same phase and a development process. 33. A lens comprising the uneven body according to any one of claims 1 to 12, 27, 30, and 32. 34. A scattering reflection plate comprising the uneven body according to any one of claims 1 to 12, 27, 30, and 32. 35. A reflective liquid crystal display device comprising the scattering reflector according to claim 34.