[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

FR2905707B1 - Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince. - Google Patents

Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince.

Info

Publication number
FR2905707B1
FR2905707B1 FR0607876A FR0607876A FR2905707B1 FR 2905707 B1 FR2905707 B1 FR 2905707B1 FR 0607876 A FR0607876 A FR 0607876A FR 0607876 A FR0607876 A FR 0607876A FR 2905707 B1 FR2905707 B1 FR 2905707B1
Authority
FR
France
Prior art keywords
thin layer
metal alloy
depositing
substrate
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0607876A
Other languages
English (en)
Other versions
FR2905707A1 (fr
Inventor
Pascale Gillon
Anne Lise Thomann
Pascal Brault
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite dOrleans
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite dOrleans
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite dOrleans filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR0607876A priority Critical patent/FR2905707B1/fr
Priority to PCT/EP2007/059487 priority patent/WO2008028981A2/fr
Priority to CA2662734A priority patent/CA2662734C/fr
Priority to EP07820102A priority patent/EP2082074A2/fr
Priority to US12/440,259 priority patent/US20090301610A1/en
Publication of FR2905707A1 publication Critical patent/FR2905707A1/fr
Application granted granted Critical
Publication of FR2905707B1 publication Critical patent/FR2905707B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C16/00—Alloys based on zirconium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/52—Alloys

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR0607876A 2006-09-08 2006-09-08 Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince. Expired - Fee Related FR2905707B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0607876A FR2905707B1 (fr) 2006-09-08 2006-09-08 Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince.
PCT/EP2007/059487 WO2008028981A2 (fr) 2006-09-08 2007-09-10 Procédé pour déposer sur un substrat une couche mince d'alliage métallique et un alliage métallique sous forme de couche mince
CA2662734A CA2662734C (fr) 2006-09-08 2007-09-10 Procede pour deposer sur un substrat une couche mince d'alliage metallique et un alliage metallique sous forme de couche mince
EP07820102A EP2082074A2 (fr) 2006-09-08 2007-09-10 Procédé pour déposer sur un substrat une couche mince d'alliage métallique et un alliage métallique sous forme de couche mince
US12/440,259 US20090301610A1 (en) 2006-09-08 2007-09-10 Process for depositing a thin film of metal alloy on a substrate and metal alloy in thin-film form

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0607876A FR2905707B1 (fr) 2006-09-08 2006-09-08 Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince.

Publications (2)

Publication Number Publication Date
FR2905707A1 FR2905707A1 (fr) 2008-03-14
FR2905707B1 true FR2905707B1 (fr) 2009-01-23

Family

ID=37907982

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0607876A Expired - Fee Related FR2905707B1 (fr) 2006-09-08 2006-09-08 Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince.

Country Status (5)

Country Link
US (1) US20090301610A1 (fr)
EP (1) EP2082074A2 (fr)
CA (1) CA2662734C (fr)
FR (1) FR2905707B1 (fr)
WO (1) WO2008028981A2 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106811724A (zh) * 2017-01-18 2017-06-09 太原工业学院 一种镁合金表面耐腐蚀高熵合金涂层及其制备方法
CN109797303A (zh) * 2019-01-28 2019-05-24 太原理工大学 一种提高Al0.3CoCrFeNi高熵合金强度的方法
CN111763867A (zh) * 2019-06-27 2020-10-13 江苏锋泰工具有限公司 一种CoCrTiAlSi高熵合金粉末以及烧结材料

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2848797B1 (fr) * 2002-12-20 2005-05-27 Seb Sa Surface de cuisson facile a nettoyer et article electromenager comportant une telle surface
FR2925767B1 (fr) * 2007-12-20 2010-05-28 Centre Nat Rech Scient Procede de fabrication d'une pile a combustible en couches minces a oxyde solide dite sofc.
FR2943072B1 (fr) * 2009-03-12 2019-08-16 Centre National De La Recherche Scientifique Cnrs Decoration par pulverisation plasma magnetron sur des contenants en verre pour les secteurs de la cosmetique.
US9169538B2 (en) * 2012-05-31 2015-10-27 National Tsing Hua University Alloy material with constant electrical resistivity, applications and method for producing the same
CN103056352B (zh) * 2012-12-04 2015-09-09 中国人民解放军装甲兵工程学院 用于超音速喷涂的高熵合金粉末材料及其制备方法
RU2509825C1 (ru) * 2013-02-12 2014-03-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Тверской государственный технический университет" Способ нанесения покрытия для медных контактов электрокоммутирующих устройств
US20140295141A1 (en) * 2013-03-27 2014-10-02 E I Du Pont De Nemours And Company Making the Surface of an Article Visibly Line Free
US20150362473A1 (en) * 2014-06-12 2015-12-17 Intermolecular Inc. Low-E Panels Utilizing High-Entropy Alloys and Combinatorial Methods and Systems for Developing the Same
CN104550901B (zh) * 2014-11-25 2017-06-16 沈阳工业大学 镍单元素基合金表面激光高熵合金化用粉料及制备工艺
CN105603258B (zh) * 2015-12-25 2017-09-26 燕山大学 一种高强度锆合金及制备方法
WO2017184771A1 (fr) 2016-04-20 2017-10-26 Arconic Inc. Matériaux d'aluminium, cobalt fer et nickel à structure fcc et produits fabriqués à partir de ceux-ci
WO2017184778A1 (fr) 2016-04-20 2017-10-26 Arconic Inc. Matériaux fcc d'aluminium, de cobalt et de nickel, et produits fabriqués à partir de ces derniers
EP3488026A4 (fr) * 2016-07-22 2020-03-25 Westinghouse Electric Company Llc Procédés de pulvérisation pour enrober des barres de combustible nucléaire en vue d'ajouter une barrière résistante à la corrosion
EP3301520A1 (fr) * 2016-09-30 2018-04-04 Nivarox-FAR S.A. Composant horloger comportant un alliage haute entropie
CN106756407B (zh) * 2016-12-07 2019-04-02 西南交通大学 一种CrMnFeCoNiZr高熵合金及其制备方法
US11098403B2 (en) * 2017-02-07 2021-08-24 City University Of Hong Kong High entropy alloy thin film coating and method for preparing the same
CN107523740B (zh) * 2017-09-20 2020-05-05 湘潭大学 CuCrFeNiTi高熵合金材料及其制备方法
CN108099318A (zh) * 2018-01-08 2018-06-01 浙江德清金乾新材料有限公司 一种医用无纺布透气膜
WO2020084166A1 (fr) * 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Revêtements pvd à matrice céramique hea à structure de précipité contrôlée
CN109913771B (zh) * 2019-04-02 2021-03-09 中国科学院宁波材料技术与工程研究所 一种VAlTiCrSi高熵合金薄膜及其在海水环境下的应用
CN109913717B (zh) * 2019-04-04 2020-11-17 西安交通大学 一种轻质高熵合金及其制备方法
CN112048655B (zh) * 2019-06-05 2021-10-22 中国科学院金属研究所 一种高密度高活性多主元合金及其制备方法
CN110202148B (zh) * 2019-07-02 2022-01-21 山东建筑大学 一种激光增材制造高熵合金基多相增强梯度复合材料的方法
CN111074223A (zh) * 2020-01-06 2020-04-28 中国科学院宁波材料技术与工程研究所 成分均匀可控的高熵合金薄膜的物理气相沉积制备方法
CN111088490B (zh) * 2020-01-11 2022-05-17 贵州大学 一种高硬度高耐磨性的高熵合金涂层及其制备方法
CN111270207A (zh) * 2020-02-17 2020-06-12 西安邮电大学 一种层状结构的高熵合金薄膜材料的制备方法
CN111206217A (zh) * 2020-03-25 2020-05-29 郑州大学 一种核电用Zr-Si-O非晶防护涂层的制备方法
FI3960896T3 (fi) * 2020-04-20 2024-02-20 Joint Stock Company Tvel Ioni-plasmaruiskutusmenetelmä, jolla korroosionkestävät kalvopinnoitteet ruiskutetaan zirkoniumseoksesta tehdyille tuotteille
CN111636063A (zh) * 2020-06-01 2020-09-08 浙江工业大学 一种增强铝合金基体表面性能的电子束熔覆方法
CN112921267B (zh) * 2020-06-08 2023-06-09 自贡市量子金属制造有限公司 球阀圆头表面TiVZrCrAl高熵合金涂层及其制备方法
CN111534817B (zh) * 2020-06-21 2022-02-15 华东交通大学 一种激光沉积制备AlxTiCrMnCu高熵合金的方法
CN111926303A (zh) * 2020-08-20 2020-11-13 西安邮电大学 一种高熵合金薄膜的制备方法
CN114807884A (zh) * 2021-01-18 2022-07-29 武汉苏泊尔炊具有限公司 烹饪器具的制备方法和烹饪器具
CN112760610B (zh) * 2021-01-25 2022-04-29 中国科学院兰州化学物理研究所 一种航空轴承表面防护用高熵氮化物涂层及其制备方法
CN112831751B (zh) * 2021-02-04 2022-12-27 郑州大学 一种高温自转变非晶/纳米晶高熵氧化物薄膜、制备方法及应用
CN112981321B (zh) * 2021-02-04 2022-08-30 中国科学院兰州化学物理研究所 一种单相结构(CrZrVTiAl)N高熵陶瓷涂层及其制备方法
CN112813399B (zh) * 2021-02-04 2022-12-27 郑州大学 一种高熵金属玻璃防护涂层及制备方法
CN113025966B (zh) * 2021-02-26 2022-05-17 何阳轩 一种提高热锻模具寿命的Zr基高熵合金涂层及其制备方法
CN113025953B (zh) * 2021-03-02 2023-06-23 中国科学院宁波材料技术与工程研究所 一种高熵合金氮化物复合涂层及其制备方法与应用
CN113073323B (zh) * 2021-03-16 2023-03-17 兰州荣博特数字智造科技有限公司 一种Al-Ni-Mo-Cu-Crx-Fe(x=0,0.5,1.0,1.5,2.0)高熵合金涂层的制备方法
CN113308675B (zh) * 2021-05-10 2023-04-25 西安工业大学 一种高熵合金氮化物刀具涂层及其制备方法
CN113322441B (zh) * 2021-05-31 2023-01-17 中国人民解放军空军工程大学 基于高熵合金的中高温红外隐身涂层材料及其制备方法
CN113634764B (zh) * 2021-07-26 2023-04-25 太原理工大学 镁合金表面激光增材制造不锈钢基复合涂层的方法
CN113718200B (zh) * 2021-08-25 2022-06-07 西安交通大学 一种基于高温离子辐照制备梯度结构非晶薄膜的方法
CN113789503B (zh) * 2021-09-15 2023-08-22 郑州大学 一种具有抗氧化特性的高熵硅化物薄膜的原位合成方法
CN113957403A (zh) * 2021-09-29 2022-01-21 西安交通大学 一种高强度的Al-Cr金属玻璃涂层及其制备方法
CN114058981B (zh) * 2021-11-05 2022-06-10 中国科学院宁波材料技术与工程研究所 一种难熔高熵非晶合金材料及其制备方法和应用
CN114561621B (zh) * 2021-12-10 2022-12-02 吉林大学 一种高熵金属玻璃薄膜及其制备方法和应用
CN114196914B (zh) * 2021-12-14 2022-09-02 中国科学院兰州化学物理研究所 一种碳化物高熵陶瓷材料、碳化物陶瓷层及其制备方法和应用
WO2023186704A1 (fr) 2022-04-01 2023-10-05 Saes Getters S.P.A. Substrat comprenant une base et un film getter intégré pour fabriquer des dispositifs microélectroniques
CN114951634B (zh) * 2022-05-05 2023-12-12 苏州大学 高熵合金耐磨耐腐蚀涂层及其制备方法
CN114959582B (zh) * 2022-05-05 2023-06-27 北京科技大学 一种高硬度六元高熵合金薄膜及其制备方法
CN114783980B (zh) * 2022-06-21 2022-09-23 亚芯半导体材料(江苏)有限公司 Cu互连集成电路用多层合金扩散阻挡层及其制备方法
CN115094295B (zh) * 2022-06-23 2023-03-31 江苏科技大学 一种高熵合金粉末及其涂层和涂层的制备方法
CN115449760B (zh) * 2022-08-01 2024-04-02 香港城市大学深圳福田研究院 一种聚合物复合材料及其制备方法
CN115449764B (zh) * 2022-09-14 2023-09-01 中国工程物理研究院材料研究所 一种锕系合金梯度膜及其制备方法
CN115449790B (zh) * 2022-10-14 2024-01-19 长沙理工大学 一种螺旋桨再制造用耐磨耐蚀高熵合金熔覆层及制备方法
CN115821208B (zh) * 2022-12-06 2024-06-07 西北有色金属研究院 一种核燃料包壳管用耐事故高熵合金涂层及其制备方法
CN116121707B (zh) * 2023-02-24 2024-03-19 广东省科学院中乌焊接研究所 一种钛合金表面TiCrAlSiX系涂层及其制备方法
CN116083870B (zh) * 2023-04-07 2023-06-23 西南交通大学 一种三相纳米复合高熵薄膜及其制备方法和应用
CN116288219B (zh) * 2023-05-19 2023-08-11 西南交通大学 一种FeCoNiCu高熵合金掺杂非晶碳薄膜及制备方法和应用
CN117305787B (zh) * 2023-09-28 2024-06-18 郑州大学 高熵涂层和原位锆硅扩散层的多层协同防护体系、制备方法及应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4125446A (en) * 1977-08-15 1978-11-14 Airco, Inc. Controlled reflectance of sputtered aluminum layers
US4774170A (en) * 1987-06-05 1988-09-27 Eastman Kodak Company Recording elements comprising write-once thin film alloy layers
AU620155B2 (en) * 1988-10-15 1992-02-13 Koji Hashimoto Amorphous aluminum alloys
JPH02107757A (ja) * 1988-10-15 1990-04-19 Koji Hashimoto アモルファス超格子合金の作製法
JP2677721B2 (ja) * 1991-05-15 1997-11-17 功二 橋本 高耐食アモルファス合金
EP0564998B1 (fr) * 1992-04-07 1998-11-04 Koji Hashimoto Alliages amorphes résistantes à la corrosion à chaud
GB9324505D0 (en) * 1992-12-07 1994-01-19 Fuji Electric Co Ltd Method for preparing thin-film electro-luminescence element
US5622608A (en) * 1994-05-05 1997-04-22 Research Foundation Of State University Of New York Process of making oxidation resistant high conductivity copper layers
DE10100223A1 (de) * 2000-01-07 2001-07-12 Nippon Sheet Glass Co Ltd Verfahren zum Beschichten eines Substrats und beschichteter Gegenstand
KR20030047046A (ko) * 2001-12-07 2003-06-18 삼성전자주식회사 Ｃｏ－ｓｐｕｔｔｅｒｉｎｇ에 의한 Ｈｅｕｓｌｅｒａｌｌｏｙ 의 증착방법
TW593704B (en) * 2003-08-04 2004-06-21 Jin Ju Annealing-induced extensive solid-state amorphization in a metallic film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106811724A (zh) * 2017-01-18 2017-06-09 太原工业学院 一种镁合金表面耐腐蚀高熵合金涂层及其制备方法
CN109797303A (zh) * 2019-01-28 2019-05-24 太原理工大学 一种提高Al0.3CoCrFeNi高熵合金强度的方法
CN111763867A (zh) * 2019-06-27 2020-10-13 江苏锋泰工具有限公司 一种CoCrTiAlSi高熵合金粉末以及烧结材料

Also Published As

Publication number Publication date
US20090301610A1 (en) 2009-12-10
WO2008028981A3 (fr) 2008-07-31
EP2082074A2 (fr) 2009-07-29
CA2662734A1 (fr) 2008-03-13
CA2662734C (fr) 2014-06-03
FR2905707A1 (fr) 2008-03-14
WO2008028981B1 (fr) 2008-09-25
WO2008028981A2 (fr) 2008-03-13

Similar Documents

Publication Publication Date Title
FR2905707B1 (fr) Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince.
EP1857570A3 (fr) Procédé pour la formation d'une structure stratifiée à base de nickel sur un substrat en alliage de magnésium, un article en alliage de magnésium à surface traitée fabriqué à partir de celle-ci et une solution de nettoyage et une solution de traitement de surface utilisée à ces fins
SG131872A1 (en) Layer arrangement for the formation of a coating on a surface of a substrate,coating method,and substrate with a layer arrangement
FR2867310B1 (fr) Technique d'amelioration de la qualite d'une couche mince prelevee
WO2008096089A3 (fr) Procede de depot de couche mince et produit obtenu
FR2856677B1 (fr) Substrat revetu d'une couche dielectrique et procede pour sa fabrication
WO2009019147A3 (fr) Dépôt à partir de liquides ioniques
DK1921119T3 (da) Pletbestandig overtrækssammensætning, pletbestandig overtræksfilm, substrat med overtræksfilm, pletbestandig substrat, fremgangsmåde til dannelse af overtræksfilm på overflade af substrat og fremgangsmåde til at gøre substrat pletbestandigt
FR2890983B1 (fr) Composition d'electrodeposition destinee au revetement d'une surface d'un substrat par un metal.
EP1770187A4 (fr) Matériau de formation de couche mince et procédé de production de couche mince
EP1889940A3 (fr) Revêtement de barrière thermique doté d'une couche supérieure à pulvérisation plasma
EP2374612A8 (fr) Matériau pour film métallique de surface, son procédé de fabrication, procédé de fabrication d'un matériau de motif métallique et matériau de motif métallique
FR2890984B1 (fr) Procede d'electrodeposition destine au revetement d'une surface d'un substrat par un metal.
FR2918793B1 (fr) Procede de fabrication d'un substrat semiconducteur-sur- isolant pour la microelectronique et l'optoelectronique.
TW200719981A (en) Method for applying chemical coatings
FR2889887B1 (fr) Procede de report d'une couche mince sur un support
FR2830856B1 (fr) Precurseur de revetement et procede pour revetir un substrat d'une couche refractaire
FR2881573B1 (fr) Procede de transfert d'une couche mince formee dans un substrat presentant des amas de lacunes
TW200628938A (en) Substrate of a liquid crystal display and method of forming an alignment layer
FR2843742B1 (fr) Microstructure a surface fonctionnalisee par depot localise d'une couche mince et procede de fabrication associe
EP1765522A4 (fr) Procedes de revetement anticorrosion
FR2900848B1 (fr) Procede de depot de film mince nanometrique sur un substrat
FR2918672B1 (fr) Procede pour proteger la surface d'un substrat en alliage intermetallique a base d'aluminiure de titane contre la corrosion.
FR2882746B1 (fr) Procede de preparation d'une solution sol-gel et utilisation de cette solution pour constituer un revetement pour proteger un substrat a surface metallique
FR2867199B1 (fr) Procede pour l'obtention d'un substrat mettalique comportant un revetement protecteur

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 10

ST Notification of lapse

Effective date: 20170531