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EP0619694A4 - Method of monitoring atmospheric pressure glow discharge plasma. - Google Patents

Method of monitoring atmospheric pressure glow discharge plasma.

Info

Publication number
EP0619694A4
EP0619694A4 EP92924896A EP92924896A EP0619694A4 EP 0619694 A4 EP0619694 A4 EP 0619694A4 EP 92924896 A EP92924896 A EP 92924896A EP 92924896 A EP92924896 A EP 92924896A EP 0619694 A4 EP0619694 A4 EP 0619694A4
Authority
EP
European Patent Office
Prior art keywords
atmospheric pressure
plasma
glow discharge
discharge plasma
pressure glow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP92924896A
Other languages
German (de)
French (fr)
Other versions
EP0619694B1 (en
EP0619694A1 (en
Inventor
Satiko Okazaki
Masuhiro Ogoma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of EP0619694A1 publication Critical patent/EP0619694A1/en
Publication of EP0619694A4 publication Critical patent/EP0619694A4/en
Application granted granted Critical
Publication of EP0619694B1 publication Critical patent/EP0619694B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The generation of glow plasma due to discharge at an atmospheric pressure and its stabilization are monitored by counting the number of current pulses. Alternatively, they are monitored by the change of a retention voltage and/or the change of the full current value besides the number of the current pulses, or by Lissajous figures, to detect the plasma state and to stabilize and control the plasma. These procedures make it possible to stabilize and monitor the atmospheric pressure glow discharge plasma accurately, rapidly and readily, and to control the plasma.
EP92924896A 1991-12-10 1992-12-09 Method of monitoring atmospheric pressure glow discharge plasma Expired - Lifetime EP0619694B1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP32620991 1991-12-10
JP326209/91 1991-12-10
JP18927492A JP3149272B2 (en) 1991-12-10 1992-07-16 How to monitor atmospheric pressure glow discharge plasma
JP189274/92 1992-07-16
PCT/JP1992/001606 WO1993012632A1 (en) 1991-12-10 1992-12-09 Method of monitoring atmospheric pressure glow discharge plasma

Publications (3)

Publication Number Publication Date
EP0619694A1 EP0619694A1 (en) 1994-10-12
EP0619694A4 true EP0619694A4 (en) 1995-02-22
EP0619694B1 EP0619694B1 (en) 1997-11-05

Family

ID=26505386

Family Applications (1)

Application Number Title Priority Date Filing Date
EP92924896A Expired - Lifetime EP0619694B1 (en) 1991-12-10 1992-12-09 Method of monitoring atmospheric pressure glow discharge plasma

Country Status (5)

Country Link
US (1) US5539303A (en)
EP (1) EP0619694B1 (en)
JP (1) JP3149272B2 (en)
DE (1) DE69223062T2 (en)
WO (1) WO1993012632A1 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5968377A (en) * 1996-05-24 1999-10-19 Sekisui Chemical Co., Ltd. Treatment method in glow-discharge plasma and apparatus thereof
JP3040358B2 (en) * 1996-05-24 2000-05-15 積水化学工業株式会社 Glow discharge plasma processing method and apparatus
FR2782837B1 (en) * 1998-08-28 2000-09-29 Air Liquide METHOD AND DEVICE FOR SURFACE TREATMENT BY ATMOSPHERIC PRESSURE PLASMA
DE19848636C2 (en) * 1998-10-22 2001-07-26 Fraunhofer Ges Forschung Method for monitoring an AC voltage discharge on a double electrode
AU2279901A (en) 1999-12-20 2001-07-03 Henry Moncrieff O'connor Method for generating and displaying complex data utilizing color-coded signals
JP4270872B2 (en) * 2001-03-16 2009-06-03 東京エレクトロン株式会社 System and method for monitoring impedance
EP1441576B1 (en) * 2001-10-22 2011-12-21 Shibaura Mechatronics Corporation Method for detecting an arc in a glow discharg apparatus and high-frequency arc discharge suppressor
EP1697735A1 (en) * 2003-12-15 2006-09-06 Swiss E-Technik AG Method and device for electrically testing fuels and combustibles by generating a plasma
EP1548795A1 (en) * 2003-12-22 2005-06-29 Fuji Photo Film B.V. Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions
EP1924861A2 (en) * 2005-09-15 2008-05-28 Honeywell International Inc. Arc fault detection and confirmation using voltage and current analysis
US9254397B2 (en) * 2011-11-22 2016-02-09 National Institute Of Advanced Industrial Science And Technology Plasma evaluation apparatus
JP6704641B2 (en) * 2016-02-26 2020-06-03 ダイハツ工業株式会社 Control device for plasma reactor
JP6511998B2 (en) * 2015-07-03 2019-05-15 Ｊｆｅスチール株式会社 Insulation degradation measurement method and insulation degradation measurement device
JP6858441B2 (en) * 2016-07-29 2021-04-14 ダイハツ工業株式会社 Plasma reactor anomaly detector
CN111725091A (en) * 2019-03-22 2020-09-29 北京北方华创微电子装备有限公司 Method and device for optimizing process flow, storage medium and semiconductor processing equipment
JP7067516B2 (en) * 2019-03-26 2022-05-16 日本電産株式会社 Plasma processing equipment
DE102019204818A1 (en) * 2019-04-04 2020-10-08 Robert Bosch Gmbh Method for monitoring a plasma-assisted process for coating a component and device for coating a component
JP2021026811A (en) * 2019-07-31 2021-02-22 日本電産株式会社 Plasma processing device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3833851A (en) * 1971-10-15 1974-09-03 Mobil Oil Corp Systems for measuring the properties of plasma with an ion probe
US4207137A (en) * 1979-04-13 1980-06-10 Bell Telephone Laboratories, Incorporated Method of controlling a plasma etching process by monitoring the impedance changes of the RF power
JPS5769324A (en) * 1980-10-11 1982-04-28 Daiwa Dengiyou Kk Monitor device of dc power supply
JPS62122188A (en) * 1985-11-21 1987-06-03 Komatsu Ltd Measurement for discharge power of silent discharge system laser
JPH0719771B2 (en) * 1986-09-22 1995-03-06 株式会社日立製作所 Discharge abnormality detection device
JPH0672308B2 (en) * 1988-07-04 1994-09-14 新技術事業団 Atmospheric pressure plasma reaction method
JPH02122188A (en) * 1988-10-31 1990-05-09 Matsushita Refrig Co Ltd Fresh foodstuff storage device
WO1992009185A1 (en) * 1990-11-16 1992-05-29 Nichimen Kabushiki Kaisha Device for diagnosing plasma

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
YOKOYAMA T ET AL: "The mechanism of the stabilisation of glow plasma at atmospheric pressure", JOURNAL OF PHYSICS D (APPLIED PHYSICS), 14 AUG. 1990, UK, VOL. 23, NR. 8, PAGE(S) 1125 - 1128, ISSN 0022-3727 *

Also Published As

Publication number Publication date
EP0619694B1 (en) 1997-11-05
WO1993012632A1 (en) 1993-06-24
EP0619694A1 (en) 1994-10-12
JP3149272B2 (en) 2001-03-26
JPH05217690A (en) 1993-08-27
DE69223062D1 (en) 1997-12-11
DE69223062T2 (en) 1998-02-26
US5539303A (en) 1996-07-23

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