[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

EP0169744A3 - Ion source - Google Patents

Ion source Download PDF

Info

Publication number
EP0169744A3
EP0169744A3 EP85305339A EP85305339A EP0169744A3 EP 0169744 A3 EP0169744 A3 EP 0169744A3 EP 85305339 A EP85305339 A EP 85305339A EP 85305339 A EP85305339 A EP 85305339A EP 0169744 A3 EP0169744 A3 EP 0169744A3
Authority
EP
European Patent Office
Prior art keywords
ion source
ions
source
plasma
malecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP85305339A
Other languages
German (de)
French (fr)
Other versions
EP0169744A2 (en
Inventor
Michael Inman
Thomas Stanley Green
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Atomic Energy Authority
Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB848419070A external-priority patent/GB8419070D0/en
Priority claimed from GB848419039A external-priority patent/GB8419039D0/en
Application filed by UK Atomic Energy Authority filed Critical UK Atomic Energy Authority
Publication of EP0169744A2 publication Critical patent/EP0169744A2/en
Publication of EP0169744A3 publication Critical patent/EP0169744A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An ion source in which a gaseous material, the source of the ions, is excited to a plasma state by means of a radio frequency electromagnetic field. The wall of the chamber containing the plasma is maintained at a high temperature and there is provided a solenoidal or radial multipolar electric field thereby to cause the ion source to produce atomic rather than malecular ions.
EP85305339A 1984-07-26 1985-07-26 Ion source Withdrawn EP0169744A3 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB848419070A GB8419070D0 (en) 1984-07-26 1984-07-26 Magnetic analyser
GB848419039A GB8419039D0 (en) 1984-07-26 1984-07-26 Ion source
GB8419070 1984-07-26
GB8419039 1984-07-26

Publications (2)

Publication Number Publication Date
EP0169744A2 EP0169744A2 (en) 1986-01-29
EP0169744A3 true EP0169744A3 (en) 1987-06-10

Family

ID=26288028

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85305339A Withdrawn EP0169744A3 (en) 1984-07-26 1985-07-26 Ion source

Country Status (2)

Country Link
EP (1) EP0169744A3 (en)
GB (1) GB2162365B (en)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920003562B1 (en) * 1986-03-31 1992-05-04 가부시끼가이샤 도시바 Non-ferrous metal mechanical part having a wear resistant and smooth surface
JPS62296332A (en) * 1986-06-16 1987-12-23 Hitachi Ltd Ion source
DE3632340C2 (en) * 1986-09-24 1998-01-15 Leybold Ag Inductively excited ion source
GB8905073D0 (en) * 1989-03-06 1989-04-19 Nordiko Ltd Ion gun
GB2235086A (en) * 1989-06-01 1991-02-20 Ion Tech Ltd Ion beam source
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source
US6264812B1 (en) 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
KR100489918B1 (en) 1996-05-09 2005-08-04 어플라이드 머티어리얼스, 인코포레이티드 Coils for generating a plasma and for sputtering
US6254746B1 (en) 1996-05-09 2001-07-03 Applied Materials, Inc. Recessed coil for generating a plasma
US6368469B1 (en) 1996-05-09 2002-04-09 Applied Materials, Inc. Coils for generating a plasma and for sputtering
US6190513B1 (en) 1997-05-14 2001-02-20 Applied Materials, Inc. Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition
US6254737B1 (en) 1996-10-08 2001-07-03 Applied Materials, Inc. Active shield for generating a plasma for sputtering
US6514390B1 (en) 1996-10-17 2003-02-04 Applied Materials, Inc. Method to eliminate coil sputtering in an ICP source
US5961793A (en) * 1996-10-31 1999-10-05 Applied Materials, Inc. Method of reducing generation of particulate matter in a sputtering chamber
TW358964B (en) 1996-11-21 1999-05-21 Applied Materials Inc Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma
US6451179B1 (en) 1997-01-30 2002-09-17 Applied Materials, Inc. Method and apparatus for enhancing sidewall coverage during sputtering in a chamber having an inductively coupled plasma
US6599399B2 (en) 1997-03-07 2003-07-29 Applied Materials, Inc. Sputtering method to generate ionized metal plasma using electron beams and magnetic field
US6103070A (en) * 1997-05-14 2000-08-15 Applied Materials, Inc. Powered shield source for high density plasma
US6210539B1 (en) 1997-05-14 2001-04-03 Applied Materials, Inc. Method and apparatus for producing a uniform density plasma above a substrate
US6077402A (en) * 1997-05-16 2000-06-20 Applied Materials, Inc. Central coil design for ionized metal plasma deposition
US6579426B1 (en) 1997-05-16 2003-06-17 Applied Materials, Inc. Use of variable impedance to control coil sputter distribution
US6652717B1 (en) 1997-05-16 2003-11-25 Applied Materials, Inc. Use of variable impedance to control coil sputter distribution
US6361661B2 (en) 1997-05-16 2002-03-26 Applies Materials, Inc. Hybrid coil design for ionized deposition
US6235169B1 (en) 1997-08-07 2001-05-22 Applied Materials, Inc. Modulated power for ionized metal plasma deposition
US6375810B2 (en) 1997-08-07 2002-04-23 Applied Materials, Inc. Plasma vapor deposition with coil sputtering
US6345588B1 (en) 1997-08-07 2002-02-12 Applied Materials, Inc. Use of variable RF generator to control coil voltage distribution
US6565717B1 (en) 1997-09-15 2003-05-20 Applied Materials, Inc. Apparatus for sputtering ionized material in a medium to high density plasma
US6042700A (en) * 1997-09-15 2000-03-28 Applied Materials, Inc. Adjustment of deposition uniformity in an inductively coupled plasma source
US6023038A (en) 1997-09-16 2000-02-08 Applied Materials, Inc. Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system
US6280579B1 (en) 1997-12-19 2001-08-28 Applied Materials, Inc. Target misalignment detector
US6254738B1 (en) 1998-03-31 2001-07-03 Applied Materials, Inc. Use of variable impedance having rotating core to control coil sputter distribution
US6146508A (en) * 1998-04-22 2000-11-14 Applied Materials, Inc. Sputtering method and apparatus with small diameter RF coil
TW434636B (en) 1998-07-13 2001-05-16 Applied Komatsu Technology Inc RF matching network with distributed outputs
US6132566A (en) * 1998-07-30 2000-10-17 Applied Materials, Inc. Apparatus and method for sputtering ionized material in a plasma
US6231725B1 (en) 1998-08-04 2001-05-15 Applied Materials, Inc. Apparatus for sputtering material onto a workpiece with the aid of a plasma
US6238528B1 (en) 1998-10-13 2001-05-29 Applied Materials, Inc. Plasma density modulator for improved plasma density uniformity and thickness uniformity in an ionized metal plasma source
US6217718B1 (en) 1999-02-17 2001-04-17 Applied Materials, Inc. Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma
DE10058326C1 (en) 2000-11-24 2002-06-13 Astrium Gmbh Inductively coupled high-frequency electron source with reduced power requirements due to electrostatic confinement of electrons
DE102008022181B4 (en) * 2008-05-05 2019-05-02 Arianegroup Gmbh Ion engine

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4017403A (en) * 1974-07-31 1977-04-12 United Kingdom Atomic Energy Authority Ion beam separators
US4447773A (en) * 1981-06-22 1984-05-08 California Institute Of Technology Ion beam accelerator system
US4598231A (en) * 1982-11-25 1986-07-01 Nissin-High Voltage Co. Ltd. Microwave ion source

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3302026A (en) * 1963-07-25 1967-01-31 Exxon Production Research Co Ion source neutron generator having magnetically stabilized plasma
GB1399603A (en) * 1971-09-07 1975-07-02 Boswell R W Christiansen P J N Ion sources
FR2475798A1 (en) * 1980-02-13 1981-08-14 Commissariat Energie Atomique METHOD AND DEVICE FOR PRODUCING HIGHLY CHARGED HEAVY IONS AND AN APPLICATION USING THE METHOD

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4017403A (en) * 1974-07-31 1977-04-12 United Kingdom Atomic Energy Authority Ion beam separators
US4447773A (en) * 1981-06-22 1984-05-08 California Institute Of Technology Ion beam accelerator system
US4598231A (en) * 1982-11-25 1986-07-01 Nissin-High Voltage Co. Ltd. Microwave ion source

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
ATOMKERNENERGIE, vol. 14, no. 5, September-October 1969, pages 329-332, Munich, DE; N.N. HANNA et al.: "High current radio frequency ion source with non-magnetic analyzer" *
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, vol. NS-30, no. 4, August 1983, part 1, pages 2719-2721, IEEE, New York, US; D.J. CLARK et al.: "An ECR heavy ion source for the LBL 88-inch cyclotron" *
REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 55, no. 4, April 1984, pages 449-456, American institute of Physics, New York, US; J. ISHIKAWA et al.: "Axial magnetic field extraction-type microwave ion source with a permanent magnet" *
REVUE DE PHYSIQUE APPLIQUEE, vol. 15, no. 5, May 1980, pages 995-1005, Paris, FR; R. GELLER et al.: "Micromafios source d'ions multichargés basée sur la résonance cyclotronique des électrons" *

Also Published As

Publication number Publication date
GB8518922D0 (en) 1985-09-04
GB2162365A (en) 1986-01-29
EP0169744A2 (en) 1986-01-29
GB2162365B (en) 1989-06-01

Similar Documents

Publication Publication Date Title
EP0169744A3 (en) Ion source
EP0217361A2 (en) Ion source
GB1352654A (en) Ion source which makes use of a microwave resonant cavity
KR890003266A (en) Plasma treatment method and apparatus
JPS5782955A (en) Microwave plasma generating apparatus
UA32449C2 (en) Plasma accelarator with closed electron drift
MY102271A (en) Electrodeless fluorescent lighting system
EP0247397A3 (en) Apparatus for the surface treatment of work pieces
GB2053559B (en) Microwave plasma ion source
FR2402301A1 (en) Micro-machining substrates by ion erosion - where magnetron creates electron cyclotron resonance in neutral argon ion plasma
JPS55141729A (en) Ion-shower device
WO2000039838A3 (en) Method for igniting a plasma inside a plasma processing reactor
JPS57177975A (en) Ion shower device
JPS5687670A (en) Dry etching apparatus
US4757237A (en) Electron cyclotron resonance negative ion source
JPS5254897A (en) Plasma ion source for solid materials
JPS54158294A (en) Mass analyzer of neutral sputter particles
JPS6424346A (en) Ion source
JPS55134767A (en) Electronic impulse type ion engine
JPS6432631A (en) Etching device
JPS5553422A (en) Plasma reactor
JPS5741375A (en) Ion treating device
JPS6431336A (en) Ion source
JPS5675573A (en) Ion etching method
JPS56152969A (en) Ion etching apparatus

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Designated state(s): CH DE FR LI NL SE

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): CH DE FR LI NL SE

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 19880211

RIN1 Information on inventor provided before grant (corrected)

Inventor name: GREEN, THOMAS STANLEY

Inventor name: INMAN, MICHAEL