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DE69028329D1 - Abriebfestes transparentes Harz und polymerisierbares Monomer - Google Patents

Abriebfestes transparentes Harz und polymerisierbares Monomer

Info

Publication number
DE69028329D1
DE69028329D1 DE69028329T DE69028329T DE69028329D1 DE 69028329 D1 DE69028329 D1 DE 69028329D1 DE 69028329 T DE69028329 T DE 69028329T DE 69028329 T DE69028329 T DE 69028329T DE 69028329 D1 DE69028329 D1 DE 69028329D1
Authority
DE
Germany
Prior art keywords
abrasion
transparent resin
polymerizable monomer
resistant transparent
resistant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69028329T
Other languages
English (en)
Other versions
DE69028329T2 (de
Inventor
Toshiyuki Suzuki
Katsuyoshi Sasagawa
Masao Imai
Yoshinobu Kanemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Application granted granted Critical
Publication of DE69028329D1 publication Critical patent/DE69028329D1/de
Publication of DE69028329T2 publication Critical patent/DE69028329T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F36/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D493/00Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/02Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
    • C07D493/10Spiro-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C333/00Derivatives of thiocarbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C333/02Monothiocarbamic acids; Derivatives thereof
    • C07C333/04Monothiocarbamic acids; Derivatives thereof having nitrogen atoms of thiocarbamic groups bound to hydrogen atoms or to acyclic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D251/00Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/26Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
    • C07D251/30Only oxygen atoms
    • C07D251/34Cyanuric or isocyanuric esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C08F212/22Oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C08F212/26Nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/32Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34Monomers containing two or more unsaturated aliphatic radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041Lenses
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/253Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyurethanes Or Polyureas (AREA)
DE69028329T 1989-03-01 1990-03-01 Abriebfestes transparentes Harz und polymerisierbares Monomer Expired - Fee Related DE69028329T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4891989 1989-03-01
JP12662989 1989-05-22
JP24175989 1989-09-20

Publications (2)

Publication Number Publication Date
DE69028329D1 true DE69028329D1 (de) 1996-10-10
DE69028329T2 DE69028329T2 (de) 1997-03-20

Family

ID=27293462

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69028329T Expired - Fee Related DE69028329T2 (de) 1989-03-01 1990-03-01 Abriebfestes transparentes Harz und polymerisierbares Monomer

Country Status (8)

Country Link
US (1) US5084538A (de)
EP (1) EP0385456B1 (de)
KR (1) KR930005030B1 (de)
CN (5) CN1051982C (de)
AU (1) AU619956B2 (de)
BR (1) BR9000916A (de)
CA (1) CA2011075A1 (de)
DE (1) DE69028329T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR9000917A (pt) * 1989-03-01 1991-02-13 Mitsui Toatsu Chemicals Processo para preparar uma resina transparente de elevada dureza,processo para preparar um monomero,material de envidracamento,cobertura protetora,lente otica,material de revestimento duro e processo para preparar uma camada de revestimento duro
US5393607A (en) * 1992-01-13 1995-02-28 Mitsui Toatsu Chemiclas, Inc. Laminated transparent plastic material and polymerizable monomer
IT1256020B (it) * 1992-05-26 1995-11-20 Enichem Sintesi Vetri organici ad alto indice di rifrazione
US5426164A (en) * 1992-12-24 1995-06-20 The Dow Chemical Company Photodefinable polymers containing perfluorocyclobutane groups
DK0608021T3 (da) * 1993-01-21 1997-10-20 Akzo Nobel Nv Vanddispergerbar hybridpolymer.
JP2695599B2 (ja) * 1993-09-29 1997-12-24 ホーヤ株式会社 ポリウレタンレンズの製造方法
US6274694B1 (en) 1995-11-20 2001-08-14 Hoya Corporation Process for the production of polyurethane lens
JP3746076B2 (ja) * 1997-05-02 2006-02-15 コーニング ソシエテ アノニム 二官能性モノマー類に基づく重合性組成物、樹脂およびそれを含む眼用物品
FR2762845B1 (fr) * 1997-05-02 1999-07-16 Corning Sa Compositions polymerisables a base de monomeres difonctionnels differents, resine et articles ophtalmiques les incorporant
US6329482B1 (en) 1997-05-02 2001-12-11 Corning, S.A. Polymerizable compositions based on difunctional monomers, resins and ophthalmic articles containing same
KR100872476B1 (ko) * 2002-07-10 2008-12-05 삼성전자주식회사 평판 표시 장치
US20040023122A1 (en) * 2002-08-01 2004-02-05 Felder Thomas C. Optical element resistant to pressure-induced defects
FR2925912B1 (fr) * 2007-12-26 2010-01-22 Toray Plastics Europ Film polyester enroulable comprenant sur au moins l'une de ses faces, un revetement reticule resistant aux rayures, procede d'obtention de ce film polyester
IL214883A (en) * 2011-08-29 2017-11-30 Alon Shimshon Protective layer for optical devices
TWI475321B (zh) * 2013-03-06 2015-03-01 Chi Mei Corp 感光性樹脂組成物及其應用
JP6702953B2 (ja) 2014-09-26 2020-06-03 ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー 表面効果組成物のための非フッ素化モノマー及び非フッ素化ポリマー
US9702081B2 (en) 2014-09-26 2017-07-11 The Chemours Company Fc, Llc Polyurethanes derived from non-fluorinated or partially fluorinated polymers
EP3610845A1 (de) * 2018-08-13 2020-02-19 Stick Tech OY Dentale zusammensetzung
CN113956184B (zh) * 2021-11-05 2023-05-02 中石化石油工程技术服务有限公司 疏水交联单体、超支化堵漏凝胶及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2363546A1 (fr) * 1976-09-07 1978-03-31 Poudres & Explosifs Ste Nale Monomeres mixtes allyliques-acryliques, leur preparation et polymeres en derivant
EP0149038A3 (de) * 1983-12-29 1985-08-21 American Cyanamid Company Kationische Copolymerisation von Meta- oder Paraisopropenyl-alpha,alpha-Dimethylbenzylisocyanat
JPS60233114A (ja) * 1984-05-07 1985-11-19 Mitsui Toatsu Chem Inc 架橋性重合体
US4604439A (en) * 1985-05-28 1986-08-05 The Goodyear Tire & Rubber Company Functionalized monomers from 1-(1-isocyanato-1-methylethyl)-3- or 4-(1-methylethenyl) benzene
JP2628040B2 (ja) * 1987-01-28 1997-07-09 武田薬品工業株式会社 自己架橋性樹脂組成物
JP2641763B2 (ja) * 1988-06-09 1997-08-20 三井東圧化学株式会社 高硬度透明樹脂
DE4006097A1 (de) * 1990-02-27 1991-08-29 Hoechst Ag Ethylenisch ungesaettigte, fluorhaltige urethanderivate und verfahren zu ihrer herstellung

Also Published As

Publication number Publication date
EP0385456A3 (de) 1991-08-21
AU619956B2 (en) 1992-02-06
US5084538A (en) 1992-01-28
EP0385456B1 (de) 1996-09-04
CN1051995C (zh) 2000-05-03
DE69028329T2 (de) 1997-03-20
KR930005030B1 (ko) 1993-06-12
CN1051982C (zh) 2000-05-03
CN1104652A (zh) 1995-07-05
AU5056590A (en) 1990-09-06
CN1059501C (zh) 2000-12-13
EP0385456A2 (de) 1990-09-05
CN1106794A (zh) 1995-08-16
CN1131748A (zh) 1996-09-25
KR900014438A (ko) 1990-10-24
CN1104208A (zh) 1995-06-28
CN1052075C (zh) 2000-05-03
BR9000916A (pt) 1991-02-13
CA2011075A1 (en) 1990-09-01
CN1042234C (zh) 1999-02-24
CN1105662A (zh) 1995-07-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUI CHEMICALS, INC., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee