DE602004010461D1 - Multi-funktionelle cyclische Siloxanverbindung, Siloxanpolymer hergestellt daraus und Verfahren zur Herstellung eines dielektrischen Films mit Hilfe des Polymers - Google Patents
Multi-funktionelle cyclische Siloxanverbindung, Siloxanpolymer hergestellt daraus und Verfahren zur Herstellung eines dielektrischen Films mit Hilfe des PolymersInfo
- Publication number
- DE602004010461D1 DE602004010461D1 DE200460010461 DE602004010461T DE602004010461D1 DE 602004010461 D1 DE602004010461 D1 DE 602004010461D1 DE 200460010461 DE200460010461 DE 200460010461 DE 602004010461 T DE602004010461 T DE 602004010461T DE 602004010461 D1 DE602004010461 D1 DE 602004010461D1
- Authority
- DE
- Germany
- Prior art keywords
- polymer
- making
- methods
- dielectric film
- prepared therefrom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920000642 polymer Polymers 0.000 title 2
- -1 cyclic siloxane compound Chemical class 0.000 title 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20030043558 | 2003-06-30 | ||
KR2003043558 | 2003-06-30 | ||
KR20030078009 | 2003-11-05 | ||
KR2003078009 | 2003-11-05 | ||
KR1020040042522A KR100660265B1 (ko) | 2003-06-30 | 2004-06-10 | 다반응성 환형 실록산 화합물, 상기 화합물로부터 제조된실록산계 중합체 및 상기 중합체를 이용한 절연막제조방법 |
KR2004042522 | 2004-06-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE602004010461D1 true DE602004010461D1 (de) | 2008-01-17 |
DE602004010461T2 DE602004010461T2 (de) | 2008-11-06 |
Family
ID=33437010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE200460010461 Expired - Lifetime DE602004010461T2 (de) | 2003-06-30 | 2004-06-28 | Multi-funktionelle cyclische Siloxanverbindung, Siloxanpolymer hergestellt daraus und Verfahren zur Herstellung eines dielektrischen Films mit Hilfe des Polymers |
Country Status (5)
Country | Link |
---|---|
US (2) | US7576230B2 (de) |
EP (1) | EP1493746B1 (de) |
JP (1) | JP4465233B2 (de) |
CN (1) | CN100383147C (de) |
DE (1) | DE602004010461T2 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2004161877A (ja) * | 2002-11-13 | 2004-06-10 | Shin Etsu Chem Co Ltd | 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
KR20060068348A (ko) * | 2004-12-16 | 2006-06-21 | 삼성코닝 주식회사 | 실록산계 중합체 및 상기 중합체를 이용한 절연막 제조방법 |
KR100723401B1 (ko) * | 2005-01-29 | 2007-05-30 | 삼성전자주식회사 | 나노 크기의 다공성 재료를 이용한 표면 플라즈몬 공명소자 및 그 제조방법 |
EP2256123B1 (de) * | 2005-01-31 | 2013-08-14 | Tosoh Corporation | Cyclische siloxanverbindung, si-haltiges filmbildendes material und anwendung davon |
US8513448B2 (en) | 2005-01-31 | 2013-08-20 | Tosoh Corporation | Cyclic siloxane compound, a material for forming Si-containing film, and its use |
EP1698632A1 (de) * | 2005-03-02 | 2006-09-06 | Fuji Photo Film Co., Ltd. | Zusammensetzung, Isolierfim, und Verfahren zu deren Herstellung |
EP1698633A1 (de) * | 2005-03-02 | 2006-09-06 | Fuji Photo Film Co., Ltd. | Zusammensetzung, isolierender Film und Prozess zur Herstellung der Zusammensetzung |
KR100685734B1 (ko) * | 2005-06-07 | 2007-02-26 | 삼성전자주식회사 | 다공성 스핀 온 글래스 조성물, 이의 제조 방법 및 이를이용한 다공성 실리콘 산화막 제조 방법 |
US7674864B2 (en) * | 2005-12-23 | 2010-03-09 | Boston Scientific Scimed, Inc. | Polymeric hybrid precursors, polymeric hybrid precursor composite matrices, medical devices, and methods |
US8455088B2 (en) * | 2005-12-23 | 2013-06-04 | Boston Scientific Scimed, Inc. | Spun nanofiber, medical devices, and methods |
KR101445878B1 (ko) * | 2008-04-04 | 2014-09-29 | 삼성전자주식회사 | 보호 필름 및 이를 포함하는 봉지 재료 |
KR20090107882A (ko) * | 2008-04-10 | 2009-10-14 | 삼성전자주식회사 | 고정층을 포함하는 경사 조성 봉지 박막 및 그의 제조방법 |
JP2011040634A (ja) * | 2009-08-13 | 2011-02-24 | Ulvac Japan Ltd | 多孔質膜の前駆体組成物、多孔質膜及びその作製方法、並びに半導体装置 |
KR101248530B1 (ko) * | 2010-09-17 | 2013-04-03 | 한국과학기술연구원 | 가지형 실세스퀴옥산 폴리머 중합용 모노머 조성물, 이로부터 합성된 가지형 실세스퀴옥산 폴리머 및 이의 합성방법 |
JP2011116758A (ja) * | 2010-12-22 | 2011-06-16 | Tosoh Corp | 有機シラン化合物、その製法、それを含むSi含有膜形成材料、および成膜方法 |
JP2012232975A (ja) * | 2011-04-20 | 2012-11-29 | Central Glass Co Ltd | シロキサン化合物およびその硬化物 |
CN102731543B (zh) * | 2012-06-29 | 2015-04-15 | 浙江大学 | 含硅型n-取代烷氧基受阻胺化合物及其制备方法 |
US20140170786A1 (en) | 2012-12-13 | 2014-06-19 | Juanita N. Kurtin | Ceramic composition having dispersion of nano-particles therein and methods of fabricating same |
JP5842861B2 (ja) | 2013-04-26 | 2016-01-13 | 信越化学工業株式会社 | 低温速硬化性コーティング剤組成物及び硬化物品 |
DE102014212698A1 (de) * | 2014-07-01 | 2016-01-07 | Wacker Chemie Ag | Verfahren zur Herstellung von Siloxanen aus Alkalisalzen von Silanolen |
JP2017048081A (ja) * | 2015-09-01 | 2017-03-09 | 日立化成株式会社 | エアロゲル及びエアロゲル積層体 |
JP2017145229A (ja) * | 2016-02-19 | 2017-08-24 | 国立大学法人群馬大学 | ルイス酸を用いた環状シロキサンの製造方法 |
JP7084402B2 (ja) * | 2016-12-22 | 2022-06-14 | イラミーナ インコーポレーテッド | インプリント装置 |
KR101932763B1 (ko) * | 2017-03-22 | 2018-12-26 | 한국과학기술원 | 다공성 절연물질 표면의 선택적 실링 방법 |
KR102533432B1 (ko) * | 2017-08-16 | 2023-05-16 | 아사히 가세이 가부시키가이샤 | 실라놀 조성물, 경화물, 접착제, 실라놀 조성물을 경화시키는 방법 |
JP6931324B2 (ja) * | 2017-12-18 | 2021-09-01 | 旭化成株式会社 | 硬化物 |
KR102426200B1 (ko) * | 2018-01-23 | 2022-07-27 | 동우 화인켐 주식회사 | 절연막 형성용 조성물 및 이로부터 형성된 절연막 |
JP7201430B2 (ja) * | 2018-12-28 | 2023-01-10 | 旭化成株式会社 | 紫外線発光装置用硬化性組成物、紫外線発光装置用部品、及び紫外線発光装置 |
JP7144331B2 (ja) * | 2019-01-17 | 2022-09-29 | 旭化成株式会社 | シラノール組成物、硬化物、接着剤、複合膜、及び硬化方法 |
TWI742534B (zh) * | 2019-02-20 | 2021-10-11 | 日商旭化成股份有限公司 | 硬化物、硬化物改質體及硬化方法 |
JP7377765B2 (ja) * | 2020-05-21 | 2023-11-10 | 信越化学工業株式会社 | オルガノポリシロキサン、およびそれを含有する組成物 |
KR102394522B1 (ko) * | 2020-06-23 | 2022-05-06 | 엔씨케이 주식회사 | 박막 봉지용 조성물 |
Family Cites Families (23)
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BE630246A (de) * | 1962-03-29 | |||
FR1437889A (fr) * | 1964-07-29 | 1966-05-06 | Thomson Houston Comp Francaise | Nouveaux polysiloxanes cycliques |
US3528941A (en) * | 1967-12-26 | 1970-09-15 | Gen Electric | Siloxane cured with an alkoxycyclopolysiloxane |
US3615272A (en) | 1968-11-04 | 1971-10-26 | Dow Corning | Condensed soluble hydrogensilsesquioxane resin |
EP0046695B1 (de) | 1980-08-26 | 1986-01-08 | Japan Synthetic Rubber Co., Ltd. | Leiterpolymere von Niederalkylpolysilsesquioxanen und Verfahren zur Herstellung |
US4756977A (en) | 1986-12-03 | 1988-07-12 | Dow Corning Corporation | Multilayer ceramics from hydrogen silsesquioxane |
JPS63202659A (ja) * | 1987-02-18 | 1988-08-22 | Shin Etsu Chem Co Ltd | 射出成形用シリコ−ンゴム組成物 |
US4999397A (en) | 1989-07-28 | 1991-03-12 | Dow Corning Corporation | Metastable silane hydrolyzates and process for their preparation |
US5010159A (en) | 1989-09-01 | 1991-04-23 | Dow Corning Corporation | Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol |
US5378790A (en) | 1992-09-16 | 1995-01-03 | E. I. Du Pont De Nemours & Co. | Single component inorganic/organic network materials and precursors thereof |
AU3460095A (en) | 1994-06-30 | 1996-01-25 | Hitachi Chemical Company, Ltd. | Material for forming silica-base coated insulation film, process for producing the material, silica-base insulation film, semiconductor device, and process for producing the device |
JPH11512474A (ja) | 1995-09-12 | 1999-10-26 | ゲレスト インコーポレーテツド | ベータ−置換オルガノシルセスキオキサンおよびその使用法 |
US6005131A (en) * | 1996-01-30 | 1999-12-21 | Bayer Aktiengesellschaft | Multi-functional, cyclic organosiloxanes, process for the production thereof and use thereof |
US5698654A (en) * | 1996-07-30 | 1997-12-16 | General Electric Company | Process for preparing hydrogen siloxane copolymers |
WO1999003926A1 (fr) * | 1997-07-15 | 1999-01-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Composition alcoxysilane/polymere organique destinee a la production de fines pellicules isolantes et procede d'utilisation |
JP2000309753A (ja) * | 1999-04-27 | 2000-11-07 | Jsr Corp | 膜形成用組成物および絶縁膜形成用材料 |
US6410150B1 (en) * | 1999-09-29 | 2002-06-25 | Jsr Corporation | Composition for film formation, method of film formation, and insulating film |
US6232424B1 (en) | 1999-12-13 | 2001-05-15 | Dow Corning Corporation | Soluble silicone resin compositions having good solution stability |
JP2001291713A (ja) * | 2000-04-07 | 2001-10-19 | Canon Sales Co Inc | 成膜方法及び半導体装置 |
DE10056344A1 (de) * | 2000-11-14 | 2002-05-16 | Degussa | n-Propylethoxysiloxane, Verfahren zu deren Herstellung und deren Verwendung |
KR100343938B1 (en) * | 2000-11-29 | 2002-07-20 | Samsung Electronics Co Ltd | Preparation method of interlayer insulation membrane of semiconductor |
CN100381483C (zh) * | 2002-04-18 | 2008-04-16 | Lg化学株式会社 | 有机硅酸酯聚合物和包含该有机硅酸酯聚合物的绝缘薄膜 |
US6740602B1 (en) * | 2003-03-17 | 2004-05-25 | Asm Japan K.K. | Method of forming low-dielectric constant film on semiconductor substrate by plasma reaction using high-RF power |
-
2004
- 2004-06-25 JP JP2004188031A patent/JP4465233B2/ja not_active Expired - Lifetime
- 2004-06-28 DE DE200460010461 patent/DE602004010461T2/de not_active Expired - Lifetime
- 2004-06-28 EP EP20040253848 patent/EP1493746B1/de not_active Expired - Lifetime
- 2004-06-29 US US10/878,119 patent/US7576230B2/en active Active
- 2004-06-30 CN CNB2004100766981A patent/CN100383147C/zh not_active Expired - Lifetime
-
2009
- 2009-06-29 US US12/458,009 patent/US7750176B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US7750176B2 (en) | 2010-07-06 |
JP4465233B2 (ja) | 2010-05-19 |
EP1493746A2 (de) | 2005-01-05 |
EP1493746A3 (de) | 2005-01-12 |
CN1616468A (zh) | 2005-05-18 |
US7576230B2 (en) | 2009-08-18 |
US20050038220A1 (en) | 2005-02-17 |
US20090269942A1 (en) | 2009-10-29 |
JP2005023075A (ja) | 2005-01-27 |
EP1493746B1 (de) | 2007-12-05 |
CN100383147C (zh) | 2008-04-23 |
DE602004010461T2 (de) | 2008-11-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |