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DE19581386T1 - Hemmsteg-Schneidevorrichtung und Hemmsteg-Schneideverfahren - Google Patents

Hemmsteg-Schneidevorrichtung und Hemmsteg-Schneideverfahren

Info

Publication number
DE19581386T1
DE19581386T1 DE19581386T DE19581386T DE19581386T1 DE 19581386 T1 DE19581386 T1 DE 19581386T1 DE 19581386 T DE19581386 T DE 19581386T DE 19581386 T DE19581386 T DE 19581386T DE 19581386 T1 DE19581386 T1 DE 19581386T1
Authority
DE
Germany
Prior art keywords
hemmsteg
cutting
cutting device
cutting method
hemmsteg cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19581386T
Other languages
English (en)
Other versions
DE19581386C2 (de
Inventor
Nobuhiko Tada
Kojiro Ogata
Naoki Miyanagi
Yoshiaki Shimomura
Shigeyuki Sakurai
Yoshinari Nagano
Shinya Okumura
Yasushi Minomoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Construction Machinery Co Ltd
Original Assignee
Hitachi Construction Machinery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Construction Machinery Co Ltd filed Critical Hitachi Construction Machinery Co Ltd
Publication of DE19581386T1 publication Critical patent/DE19581386T1/de
Application granted granted Critical
Publication of DE19581386C2 publication Critical patent/DE19581386C2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/50Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • B23K26/0736Shaping the laser spot into an oval shape, e.g. elliptic shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4821Flat leads, e.g. lead frames with or without insulating supports
    • H01L21/4842Mechanical treatment, e.g. punching, cutting, deforming, cold welding
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/0092Treatment of the terminal leads as a separate operation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lead Frames For Integrated Circuits (AREA)
DE19581386T 1994-10-13 1995-10-09 Vorrichtung und Verfahren zum Schneiden von Hemmstegen (Dam-bars) Expired - Fee Related DE19581386C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24795294 1994-10-13
PCT/JP1995/002064 WO1996012300A1 (fr) 1994-10-13 1995-10-09 Dispositif et procede permettant d'usiner une barre de liaison

Publications (2)

Publication Number Publication Date
DE19581386T1 true DE19581386T1 (de) 1996-12-05
DE19581386C2 DE19581386C2 (de) 1998-07-23

Family

ID=17170996

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19581386T Expired - Fee Related DE19581386C2 (de) 1994-10-13 1995-10-09 Vorrichtung und Verfahren zum Schneiden von Hemmstegen (Dam-bars)

Country Status (5)

Country Link
US (1) US5662822A (de)
JP (1) JP3413204B2 (de)
KR (1) KR100191675B1 (de)
DE (1) DE19581386C2 (de)
WO (1) WO1996012300A1 (de)

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DE19741029A1 (de) * 1997-09-18 1999-04-08 Bosch Gmbh Robert Optische Vorrichtung zum Bohren mittels Laserstrahls
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US20040134894A1 (en) * 1999-12-28 2004-07-15 Bo Gu Laser-based system for memory link processing with picosecond lasers
US6281471B1 (en) 1999-12-28 2001-08-28 Gsi Lumonics, Inc. Energy-efficient, laser-based method and system for processing target material
US7838794B2 (en) 1999-12-28 2010-11-23 Gsi Group Corporation Laser-based method and system for removing one or more target link structures
US7723642B2 (en) * 1999-12-28 2010-05-25 Gsi Group Corporation Laser-based system for memory link processing with picosecond lasers
US7671295B2 (en) * 2000-01-10 2010-03-02 Electro Scientific Industries, Inc. Processing a memory link with a set of at least two laser pulses
US6777645B2 (en) 2001-03-29 2004-08-17 Gsi Lumonics Corporation High-speed, precision, laser-based method and system for processing material of one or more targets within a field
US6951995B2 (en) 2002-03-27 2005-10-04 Gsi Lumonics Corp. Method and system for high-speed, precise micromachining an array of devices
DE10318688A1 (de) * 2003-04-24 2004-11-25 W. C. Heraeus Gmbh & Co. Kg Verfahren zum Trennen der elektrischen Verbindungsknoten bei IC-Frames und Verfahren zur Herstellung eines elektronischen Bauteils sowie von Frames dafür
JP2005334922A (ja) * 2004-05-26 2005-12-08 Yamazaki Mazak Corp レーザ加工機におけるノズルチェック装置
US8198137B2 (en) * 2005-06-30 2012-06-12 Jon Heyl Lead frame isolation using laser technology
US8290239B2 (en) * 2005-10-21 2012-10-16 Orbotech Ltd. Automatic repair of electric circuits
US8084706B2 (en) * 2006-07-20 2011-12-27 Gsi Group Corporation System and method for laser processing at non-constant velocities
ATE511425T1 (de) * 2007-02-13 2011-06-15 Lasag Ag Verfahren zum schneiden von zu verarbeitenden teilen mittels eines gepulsten lasers
JP2008254035A (ja) 2007-04-05 2008-10-23 Disco Abrasive Syst Ltd レーザー加工装置
KR100829009B1 (ko) 2007-08-28 2008-05-14 지에스아이 루모닉스 인코퍼레이티드 표적 물질 처리를 위한 에너지 효율적인 레이저 기반 방법 및 시스템
US9280913B2 (en) 2009-07-10 2016-03-08 Lincoln Global, Inc. Systems and methods providing enhanced education and training in a virtual reality environment
US9196169B2 (en) 2008-08-21 2015-11-24 Lincoln Global, Inc. Importing and analyzing external data using a virtual reality welding system
US9318026B2 (en) 2008-08-21 2016-04-19 Lincoln Global, Inc. Systems and methods providing an enhanced user experience in a real-time simulated virtual reality welding environment
US9483959B2 (en) 2008-08-21 2016-11-01 Lincoln Global, Inc. Welding simulator
US8274013B2 (en) 2009-03-09 2012-09-25 Lincoln Global, Inc. System for tracking and analyzing welding activity
CN104465414B (zh) 2009-07-06 2017-08-15 瑞萨电子株式会社 半导体器件的制造方法
US20110210105A1 (en) * 2009-12-30 2011-09-01 Gsi Group Corporation Link processing with high speed beam deflection
JP5319571B2 (ja) * 2010-02-12 2013-10-16 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
CN102218607B (zh) * 2010-04-15 2014-11-05 鸿富锦精密工业(深圳)有限公司 块体非晶合金的脉冲激光切割方法
DE102010020183B4 (de) * 2010-05-11 2013-07-11 Precitec Kg Laserschneidkopf und Verfahren zum Schneiden eines Werkstücks mittels eines Laserschneidkopfes
JP4896274B2 (ja) * 2010-06-14 2012-03-14 三菱電機株式会社 レーザ加工装置、及びレーザ加工方法
US20160093233A1 (en) 2012-07-06 2016-03-31 Lincoln Global, Inc. System for characterizing manual welding operations on pipe and other curved structures
US10930174B2 (en) 2013-05-24 2021-02-23 Lincoln Global, Inc. Systems and methods providing a computerized eyewear device to aid in welding
US20150072323A1 (en) 2013-09-11 2015-03-12 Lincoln Global, Inc. Learning management system for a real-time simulated virtual reality welding training environment
JP2015077629A (ja) * 2013-10-18 2015-04-23 三菱マテリアル株式会社 レーザ加工方法及び加工装置
US10083627B2 (en) 2013-11-05 2018-09-25 Lincoln Global, Inc. Virtual reality and real welding training system and method
US9836987B2 (en) 2014-02-14 2017-12-05 Lincoln Global, Inc. Virtual reality pipe welding simulator and setup
WO2015185972A1 (en) 2014-06-02 2015-12-10 Lincoln Global, Inc. System and method for manual welder training
WO2016143083A1 (ja) 2015-03-10 2016-09-15 技術研究組合次世代3D積層造形技術総合開発機構 光加工ヘッド、光加工装置およびその制御方法ならびに制御プログラム
EP3319066A1 (de) 2016-11-04 2018-05-09 Lincoln Global, Inc. Magnetische frequenzwahl für elektromagnetische positionsverfolgung
US10913125B2 (en) 2016-11-07 2021-02-09 Lincoln Global, Inc. Welding system providing visual and audio cues to a welding helmet with a display
US20180130226A1 (en) 2016-11-07 2018-05-10 Lincoln Global, Inc. System and method for calibrating a welding trainer
JP6598807B2 (ja) * 2017-03-13 2019-10-30 株式会社Screenホールディングス 検査方法および検査装置
US10997872B2 (en) 2017-06-01 2021-05-04 Lincoln Global, Inc. Spring-loaded tip assembly to support simulated shielded metal arc welding
US11557223B2 (en) 2018-04-19 2023-01-17 Lincoln Global, Inc. Modular and reconfigurable chassis for simulated welding training
US11475792B2 (en) 2018-04-19 2022-10-18 Lincoln Global, Inc. Welding simulator with dual-user configuration
US11423364B2 (en) * 2018-11-29 2022-08-23 Capital One Services, Llc Device and method for facilitating recycling
US11569152B2 (en) 2019-01-23 2023-01-31 Texas Instruments Incorporated Electronic device with lead pitch gap

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Also Published As

Publication number Publication date
KR100191675B1 (ko) 1999-07-01
JP3413204B2 (ja) 2003-06-03
DE19581386C2 (de) 1998-07-23
KR960706195A (ko) 1996-11-08
US5662822A (en) 1997-09-02
WO1996012300A1 (fr) 1996-04-25

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8125 Change of the main classification

Ipc: H01L 23/50

D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee