CN1476418A - 具有层叠金属反射薄层的透明基材 - Google Patents
具有层叠金属反射薄层的透明基材 Download PDFInfo
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- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
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- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3689—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one oxide layer being obtained by oxidation of a metallic layer
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Abstract
本发明涉及一种玻璃板,它可作为耐高温金属反射层系统。此层系统包括介电底层、由铬或含铬至少45重量%的合金制造的高反射金属层和氮化物上部覆盖层。该介电底层包括至少一个与玻璃表面相邻的由SnO2、ZnO和/或TiO2制造的部分氧化层和与金属层相邻的部分氮化物层。
Description
本发明涉及具有耐高温层叠金属反射薄层的透明基材,此基材特别适合于热处理(弯曲、淬火、退火),而薄层的外观和光学性能不会有明显的改变。该叠层包括介电底层、具有高反射率的由铬或含铬至少45重量%合金制造的金属层,以及介电性氮化覆盖层。但是,本发明的意义还在于“玻璃”,这里的层叠基材载体是透明的,但不是玻璃的,特别是基于有机聚合物的聚对苯二甲酸乙二醇酯PET型的硬基材。
这种具有金属高反射率和比较低透射率的涂布基材是很有装饰性的。在建筑学中,它们经常被用于墙壁装饰材料、装饰面材(玻璃装饰面、装饰面材),作为镜面元件、半透明镜面或玻璃装饰板。它们还可以具有附加的装饰印花和/或在必要时呈弯曲、曲线的形状使用。它们被用做整块玻璃的玻璃窗时,表面层没有任何保护地曝露在大气中,它应该对大气的影响具有特别高的耐受性。由于其安全性和/或从增加其耐弯曲和抗冲击的观点出发,用于此应用的涂层玻璃基材通过热的途径被施加上预应力,即在高于500℃、550℃或600℃的温度下加热,然后进行快速冷却。此叠层反射薄层也应该在不损伤其热性能要求的情况下提高各种性能,特别是美学性能、光学性能、热性能和有关能量的性能,由涂层玻璃制造的玻璃板不应受此处理的干扰。
由文献EP 0,962,429A1可以知道,由耐高温玻璃制造的玻璃板具有能够满足此要求的在开头所举出的那种叠层。在这种已知的叠层的情况下,介电底层由SiO2、Al2O3、SiON、Si3N4或AlN组成,或者由这些物质中至少两种的混合物组成。由于阴极溅射率相对较低和/或比较高的技术支持,所有这些物质都不能施用在玻璃板上。出于经济的原因,工业涂布装置以尽可能高的运行速度(vitesse de défilement)操作,因此在一般装置的情况下,底层涂布的厚度一般比较薄。但是有时希望更厚的底层作为干涉层以改变玻璃板的在玻璃面的光线反射方面,以及在光线的透射方面反光特性(颜色、颜色强度)。
由文献EP 0,4 36,045A1还知道,一种能够弯曲和/或施加预应力的叠层具有作为反射层的铬层。不过,在此情况下,涂层由Al和Ti和/或Zr的合金组成。由于使用了这类上层覆盖层,涂层一侧的铬层的高反射能力丧失了,玻璃一侧的反射率最大为50%。在此情况下,底层由TiO2、Ta2O5、ZrO2或SiO2组成。当然,在此情况下,底层应该涂布的厚度要根据干涉层改变颜色的情况来确定,不过对于这些材料,厚度的增加受到技术和经济原因的限制。
在文献EP 0,536,607B1中叙述了具有金属外观的涂层玻璃板,其透明的涂层也适合于热处理。在此情况下,具有金属性能的层由金属化合物组成,即金属硼化物、金属碳化物、金属氮化物或金属氧氮化物。这些金属化合物不具有反光性,甚至不具有纯金属层的光泽。在此层上涂布上金属保护层,比如铬的保护层,当进行热处理时,此保护层被氧化。在此专利中叙述的叠层首先是具有高透明度的叠层,在用于装饰的玻璃板两面上的金属反光性的应用,在这些叠层的情况下不起任何作用。
因此,希望通过底层的干涉作用形成反射光的颜色是可以根据目标进行调节的,而用不着非得做出技术上的创新或者降低连续运转的涂布装置上玻璃板的运行速度。这类叠层应该具有耐腐蚀性(机械腐蚀和化学腐蚀)和很高的耐久性,在弯曲、淬火和退火之类的热处理过程之后,还应该保持其性能,特别是高的反光性,以及对于基本中性的层面颜色,保持其透射率在2~15%。
本发明的目的是指出一种在开头举出的一类改善的叠层,该叠层在如此涂布的玻璃板的两面都具有高的金属反射率。
按照本发明,由权利要求1的特征解决了这个目的。第二层次的权利要求提供了本发明目的的有益的改善。
因此,该介电底层包括至少一层与折光指数≥2.0的玻璃表面相邻的部分氧化层和一层与金属层邻接或不邻接的部分氮化层。
简单地基于仅通过阴极溅射很容易雾化的氧化物的底层是不能证明有效的,因为在此情况下已经证实,在热处理的过程中金属铬层的颜色要发生改变,甚至于被破坏。按照本发明通过形成多层底层就完全消除了此风险,在此,在金属层的下面直接配置(dispose)一层由部分金属氮化物形成的薄层。由于与基于可简单通过阴极溅射就能够雾化的金属氧化物、折光指数至少为2.0的玻璃表面邻接的此第二部分薄层的排布状况,此叠层的耐热性不会受到破坏。可以在很宽的范围内很简单地改变反射光线的反光特征(颜色、颜色强度)。但是,玻璃板通过涂布装置的运行速度实质上不用降低。由于此部分氧化层的厚度只有至多90nm,所以可以没有问题地进行配置,其排布的方式对于能够得到的光线反射特征具有很大的作用。
由于实施本发明,介电底层的部分氮化层由Si3N4和/或AlN(可任选地含有作为靶添加剂的少数元素(Al、B等)),其厚度至少是10nm。一层或多层介电底层的这些部分氧化层优选基于SnO2和/或ZnO和/或TiO2和/或Nb2O5,和/或ZnO2,其厚度为30~90nm。
由于对具有高反射率的金属层使用了纯铬而得到涂布玻璃板的特别高的光泽。由于此纯铬层,能够使在可见光谱的范围内的反射率达到60%。作为含铬的金属合金,适用的还有含铬75~80重量%的铬铝(CrAl)合金、含铬45~85重量%的铬硅(CrSi)合金,含铬70~80重量%的铬铝硅(CrAlSi)合金等。
作为例子,能够得到金属氧化物层和金属氮化物层的操作模式如下:
—如果沉积层是活性的,由呈氧化状态的金属靶(在金属层的情况下)、由Si的金属靶(任选添加有铝或硼)或者呈氮化状态下的靶(氮化层的情况);
—如果沉积层是非活性的,可以涉及陶瓷靶(金属层的情况)、由氮化靶(氮化层的情况)。
在本发明有益的改善中,在叠层的氮化覆盖层上配置了厚度1~3nm的由金属或合金,比如Zr、Ti、TiCr、ZrCr或TiNi制造的保护层。当进行热处理时,此金属保护层发生转变,形成相应的氧化层。
按照本发明的叠层可应用于玻璃板,作为在其各个表面上互相粘结的完整的层。当此反射叠层用在玻璃表面上作为间断的装饰花样层或图案层,或者如果图案或装饰比如由烘烤使颜色印在玻璃板的涂布面上时,能够得到特殊美学效果。在热处理的工序之后烘烤的颜色可以被退火。
通过下面3个实施例的叙述可以看出本发明的附加优点和细节,与它们相反,两个比较例是按照现有技术的。
作为用来评价叠层耐腐蚀性的试验,按照标准ISO 9227进行“盐雾”试验,按照标准DIN 50018进行“SO2”试验,按照标准DIN EN1096-1;-2进行“Taber磨蚀”试验,按照标准DIN 50017进行“发汗水(eau de sudation)”试验,按照标准ISO 9227进行“Cass”试验。按照标准DIN 5033进行在可见光谱范围内的透射率Tvis和反射率Rvis的测量,以及确定反射颜色用的色坐标a*和b*的测定。
比较例1
在阴极溅射的工业装置中,按照具有磁性助力的阴极溅射方法对厚度为6mm,表面尺寸6×3.21m2的浮法(flotté)玻璃板进行涂布,具有如下的叠层:玻璃-10nm的SiO2-35nm的Cr-6nm的Si3N4。在玻璃板的宽度上得到的试样进行测试给出反射率Rvis和透射率Tvis的数值如下:
Rvis:
—涂层面 57.0%
—玻璃面 48.7%
Tvis: 2.5%
反射颜色(试验室系统)
—涂层面 a* -0.36
b* 1.43
—玻璃面 a* -0.53
b* 0.32
在玻璃面的反射颜色和在涂层面上的反射颜色几乎是一样的,但是涂层面具有浅的黄色,也可以由正的b*值1.43看到这一点。
关于涂层的耐腐蚀性和耐久性的试验给出如下的结果:
盐雾试验: 通过
SO2试验: 通过
Taber磨蚀试验: 通过
发汗水试验: 通过
Cass试验 通过
比较例2
在与比较例1的情况下所用的同样阴极溅射装置上,试图以同样的叠层给玻璃板涂布,但是底层的厚度使得在玻璃面的反射颜色是蓝色。为此,应该涂布厚度为100nm的SiO2底层。尽管使用了由Si制造的特殊阴极,还是可以制造厚度100nm的底层,而玻璃板的运行速度实质上没有降低。
测量光学性能得到如下的数值:
Rvis:
—涂层面 57.3%
—玻璃面 28.3%
Tvis: 3.0%
反射颜色(试验室系统)
涂层面 a* -0.5
b* +1.5
玻璃面 a* -1.1
b* -8.3
与比较例1相比,玻璃面上的反射有很大的降低。另外,在涂布时的生产率也有相当的下降。反之,所有的腐蚀试验和耐久性试验都没有问题地通过,和在比较例1的情况完全一样。
实施例1
在同样的大尺寸阴极溅射装置上,按照本发明进行如下的层叠:玻璃-58nm的SnO2-17nm的Si3N4-35nm的Cr-6nm的Si3N4-2nm的Zr。从涂布的玻璃板上取下玻璃宽度的不同试样。通过热途径使试样进行处理。对预先施加应力的试样测试光学性能,得到如下的数值:
Rvis:
—涂层面 57.4%
—玻璃面 30.0%
Tvis: 3.5%
反射颜色(试验室系统)
—涂层面 a* 0.13
b* 4.03
—玻璃面 a* -0.01
b* -0.96
所有的腐蚀试验和耐久性试验没有问题都获得通过。在玻璃面显示出中性的反射颜色,而在涂层面显示出具有舒适的黄色暖色调的特别高的反射。
实施例2
在相同的试验周期中,在相同的试验条件下,通过设置附加的阴极制造如下的按照本发明的叠层:玻璃-42nm的SnO2-8nm的ZnO-17nm的Si3N4-17nm的Cr-18.5nm的Si3N4-2nm的Zr。
测定如下的光学性能:
Rvis:
—涂层面 38.4%
—玻璃面 19.0%
Tvis: 14.0%
反射颜色(试验室系统)
—涂层面 a* -0.39
b* 16.8
—玻璃板玻璃面 a* -0.86
b* -11.6
所有的腐蚀试验和耐久性试验没有问题都获得通过。在玻璃面,反射颜色是鲜亮的蓝色,而在涂层面,反射颜色是黄色。此类玻璃板元件可以用做比如半透明镜面,比如完整的玻璃支持物,一面显示出蓝色的反光,另一面显示出黄色。
实施例3
在大尺寸的阴极溅射装置上,在同样的试验条件下制造如下的按照本发明的叠层并测定这些层的性能:玻璃-56nm的SnO2-34nm的Si3N4-35nm的Cr-6nm的Si3N4-2nm的Zr。
测定光学性能得到如下的数值:
Rvis:
—涂层面 55.5%
—玻璃面 39.5%
Tvis: 2.5%
反射颜色(试验室系统)
—涂层面 a* 0.13
b* 3.98
—玻璃面 a* -6.53
b* -2.0
全部腐蚀试验和耐久性试验都没有问题地通过,玻璃板在玻璃面显示出蓝绿色,在涂层面具有黄色调的高度反射。此类玻璃板可以作为玻璃面向外的装饰玻璃板,在此情况下涂层面没有任何装饰功能。
Claims (12)
1.具有高耐热性,特别适合热处理(弯曲、淬火、退火)的金属反射薄叠层的透明基材,该基材包括介电底层、由铬或含有至少45重量%铬的金属合金制造的高反射金属层和氮化的介电覆盖层,其特征在于,该介电底层包括至少一层与折光指数≥2.0的透明基材相邻或不相邻的部分氧化层和与金属层相邻的部分氮化层。
2.如权利要求1的基材,其特征在于,一层或多层该介电底层的部分氧化层是基于SnO2和/或ZnO和/或TiO2。
3.如权利要求1或2的基材,其特征在于,一层或多层该介电底层的部分氧化层的总厚度为30~90nm。
4.如权利要求1~3中任何一项的基材,其特征在于,该介电底层的部分氮化层是基于Si3N4和/或AlN,任选还含有少数的元素。
5.如权利要求1~4中任何一项的基材,其特征在于,该介电底层的部分氮化层的厚度为至少10nm。
6.如权利要求1~5中任何一项的基材,其特征在于,该含铬合金是含铬75~80重量%的CrAl合金、含铬45~85重量%的CrSi合金或含铬70~80重量%的CrAlSi合金。
7.如权利要求1~6中任何一项的基材,其特征在于,该含铬或铬合金金属层的厚度为15~50nm。
8.如权利要求1~7中任何一项的基材,其特征在于,在该氮化覆盖层上配置厚度1~3nm的由金属或合金,比如Zr、Ti、TiCr、ZrCr或TiNi制造的保护层,在如此涂布的基材进行热处理以后,该保护层转化为相应的氧化层。
9.如权利要求1~8中任何一项的基材,其特征在于,该氮化覆盖层是基于Si3N4和/或AlN,其厚度至少为6nm。
10.如权利要求1~9中任何一项的基材,其特征在于,该叠层涂布在基材上作为连续的涂层。
11.如权利要求1~9中任何一项的基材,其特征在于,该叠层涂布在基材上作为间断的装饰或图案层。
12.如权利要求1~11中任何一项的基材,其特征在于,如此涂布的基材通过热途径经受机械或化学处理。
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DE10058700A DE10058700A1 (de) | 2000-11-25 | 2000-11-25 | Glasscheibe mit einem metallisch reflektierenden Schichtsystem |
DE10058700.3 | 2000-11-25 |
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EP (1) | EP1347947B1 (zh) |
JP (2) | JP2004514636A (zh) |
KR (1) | KR100812217B1 (zh) |
CN (1) | CN100357207C (zh) |
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BR (1) | BR0115541B1 (zh) |
CZ (1) | CZ305189B6 (zh) |
DE (1) | DE10058700A1 (zh) |
ES (1) | ES2371336T3 (zh) |
MX (1) | MXPA03004339A (zh) |
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- 2000-11-25 DE DE10058700A patent/DE10058700A1/de not_active Withdrawn
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2001
- 2001-11-21 BR BRPI0115541-5A patent/BR0115541B1/pt not_active IP Right Cessation
- 2001-11-21 AT AT01997185T patent/ATE522482T1/de active
- 2001-11-21 US US10/416,206 patent/US7153595B2/en not_active Expired - Lifetime
- 2001-11-21 KR KR1020037006889A patent/KR100812217B1/ko active IP Right Grant
- 2001-11-21 AU AU2002220814A patent/AU2002220814A1/en not_active Abandoned
- 2001-11-21 WO PCT/FR2001/003657 patent/WO2002042234A1/fr active Application Filing
- 2001-11-21 ES ES01997185T patent/ES2371336T3/es not_active Expired - Lifetime
- 2001-11-21 CZ CZ2003-1338A patent/CZ305189B6/cs not_active IP Right Cessation
- 2001-11-21 PT PT01997185T patent/PT1347947E/pt unknown
- 2001-11-21 JP JP2002544375A patent/JP2004514636A/ja not_active Withdrawn
- 2001-11-21 MX MXPA03004339A patent/MXPA03004339A/es active IP Right Grant
- 2001-11-21 PL PL362570A patent/PL207991B1/pl unknown
- 2001-11-21 EP EP01997185A patent/EP1347947B1/fr not_active Expired - Lifetime
- 2001-11-21 CN CNB018194672A patent/CN100357207C/zh not_active Expired - Fee Related
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Publication number | Publication date |
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CZ305189B6 (cs) | 2015-06-03 |
PL362570A1 (en) | 2004-11-02 |
ES2371336T3 (es) | 2011-12-30 |
PL207991B1 (pl) | 2011-02-28 |
US7153595B2 (en) | 2006-12-26 |
JP2004514636A (ja) | 2004-05-20 |
CZ20031338A3 (cs) | 2005-02-16 |
JP2009132611A (ja) | 2009-06-18 |
KR100812217B1 (ko) | 2008-03-13 |
DE10058700A1 (de) | 2002-06-06 |
MXPA03004339A (es) | 2003-08-19 |
PT1347947E (pt) | 2011-12-07 |
BR0115541A (pt) | 2003-09-02 |
EP1347947B1 (fr) | 2011-08-31 |
ATE522482T1 (de) | 2011-09-15 |
EP1347947A1 (fr) | 2003-10-01 |
KR20030051862A (ko) | 2003-06-25 |
AU2002220814A1 (en) | 2002-06-03 |
WO2002042234A1 (fr) | 2002-05-30 |
CN100357207C (zh) | 2007-12-26 |
BR0115541B1 (pt) | 2010-12-28 |
US20040053068A1 (en) | 2004-03-18 |
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