CN107921775A - 热敏平版印版原版 - Google Patents
热敏平版印版原版 Download PDFInfo
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- CN107921775A CN107921775A CN201680047726.8A CN201680047726A CN107921775A CN 107921775 A CN107921775 A CN 107921775A CN 201680047726 A CN201680047726 A CN 201680047726A CN 107921775 A CN107921775 A CN 107921775A
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- CN
- China
- Prior art keywords
- optionally substituted
- coating
- aryl
- heteroaryl
- plate precursor
- Prior art date
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- 238000000576 coating method Methods 0.000 claims abstract description 85
- 239000011248 coating agent Substances 0.000 claims abstract description 83
- 125000003118 aryl group Chemical group 0.000 claims abstract description 32
- 239000002243 precursor Substances 0.000 claims abstract description 31
- 125000000547 substituted alkyl group Chemical group 0.000 claims abstract description 29
- 125000001072 heteroaryl group Chemical group 0.000 claims abstract description 27
- 239000001257 hydrogen Substances 0.000 claims abstract description 24
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 24
- 125000002877 alkyl aryl group Chemical group 0.000 claims abstract description 22
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 21
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 13
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 13
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 9
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 7
- 239000006096 absorbing agent Substances 0.000 claims abstract description 5
- 239000000470 constituent Substances 0.000 claims abstract description 5
- -1 S-R4 Chemical group 0.000 claims description 82
- 150000001875 compounds Chemical class 0.000 claims description 45
- 239000000203 mixture Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 21
- 150000002431 hydrogen Chemical group 0.000 claims description 16
- 229910019142 PO4 Inorganic materials 0.000 claims description 9
- 238000010521 absorption reaction Methods 0.000 claims description 9
- 239000010452 phosphate Substances 0.000 claims description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 6
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 5
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 125000005605 benzo group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 150000003949 imides Chemical class 0.000 claims description 2
- 238000002679 ablation Methods 0.000 abstract description 24
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 97
- 239000000975 dye Substances 0.000 description 97
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 85
- 239000000243 solution Substances 0.000 description 61
- 239000010410 layer Substances 0.000 description 56
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 42
- 239000002585 base Substances 0.000 description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 35
- 239000012044 organic layer Substances 0.000 description 29
- 229920000642 polymer Polymers 0.000 description 25
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 24
- 229920001577 copolymer Polymers 0.000 description 24
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 24
- 239000002904 solvent Substances 0.000 description 22
- 239000003795 chemical substances by application Substances 0.000 description 21
- 239000002253 acid Substances 0.000 description 19
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 18
- 239000000178 monomer Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 238000011161 development Methods 0.000 description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 15
- 239000000976 ink Substances 0.000 description 15
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 14
- CSNNHWWHGAXBCP-UHFFFAOYSA-L magnesium sulphate Substances [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 13
- 238000001556 precipitation Methods 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 229920002554 vinyl polymer Polymers 0.000 description 12
- XBZHIKRGNIXARV-UHFFFAOYSA-N C(=C)C1=CC=C(CSC=2SC=NN2)C=C1 Chemical class C(=C)C1=CC=C(CSC=2SC=NN2)C=C1 XBZHIKRGNIXARV-UHFFFAOYSA-N 0.000 description 11
- 229910052799 carbon Inorganic materials 0.000 description 11
- 238000004090 dissolution Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- 238000000926 separation method Methods 0.000 description 11
- 150000004867 thiadiazoles Chemical class 0.000 description 11
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 229960003742 phenol Drugs 0.000 description 10
- OVQAQBXRJOPVEV-UHFFFAOYSA-M potassium;1-fluorobutane-1-sulfonate Chemical class [K+].CCCC(F)S([O-])(=O)=O OVQAQBXRJOPVEV-UHFFFAOYSA-M 0.000 description 10
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- 239000005011 phenolic resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- UIIMBOGNXHQVGW-UHFFFAOYSA-M sodium bicarbonate Substances [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 9
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 9
- 239000004411 aluminium Substances 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 8
- 229920001600 hydrophobic polymer Polymers 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 8
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000003480 eluent Substances 0.000 description 7
- 230000002708 enhancing effect Effects 0.000 description 7
- 238000001914 filtration Methods 0.000 description 7
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 6
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 150000001299 aldehydes Chemical class 0.000 description 6
- 230000002209 hydrophobic effect Effects 0.000 description 6
- 150000002576 ketones Chemical class 0.000 description 6
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 6
- 229940124530 sulfonamide Drugs 0.000 description 6
- 150000003456 sulfonamides Chemical class 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 5
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 5
- 238000002048 anodisation reaction Methods 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 230000003179 granulation Effects 0.000 description 5
- 238000005469 granulation Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical class OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 239000005864 Sulphur Substances 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 239000005030 aluminium foil Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- 125000002843 carboxylic acid group Chemical group 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000008199 coating composition Substances 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 239000000284 extract Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical class [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 4
- 235000009518 sodium iodide Nutrition 0.000 description 4
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 239000003292 glue Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 150000003009 phosphonic acids Chemical class 0.000 description 3
- 125000005499 phosphonyl group Chemical group 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 125000001544 thienyl group Chemical group 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 238000003809 water extraction Methods 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- YTFVRYKNXDADBI-UHFFFAOYSA-N 3,4,5-trimethoxycinnamic acid Chemical compound COC1=CC(C=CC(O)=O)=CC(OC)=C1OC YTFVRYKNXDADBI-UHFFFAOYSA-N 0.000 description 2
- VISOTGQYFFULBK-UHFFFAOYSA-N 3-hydroxy-4-phenylpyrrole-2,5-dione Chemical class O=C1C(=O)NC(O)=C1C1=CC=CC=C1 VISOTGQYFFULBK-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- FTOAOBMCPZCFFF-UHFFFAOYSA-N 5,5-diethylbarbituric acid Chemical compound CCC1(CC)C(=O)NC(=O)NC1=O FTOAOBMCPZCFFF-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical class N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
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Abstract
本发明公开阳图制版平版印版原版,其中优化涂层,用于在曝露于热和/或光时产生最小程度的烧蚀。涂层包括包含式(I)的结构成分的红外吸收剂:其中A表示‑S‑R1,其中R1表示任选被取代的烷基、芳烷基、烷芳基、环烷基、烯基、炔基、芳基或杂芳基和/或其组合,且Q=‑CHR’‑CHR”‑、‑CR’=CR”‑或‑CHR’‑CHR”‑CHR”’‑,并且R’、R”和R”’独立表示氢、烷基、环烷基、芳烷基、烷芳基、芳基或杂芳基,或者R’和R”或R”和R”’一起形成环状结构。
Description
发明领域
本发明涉及一种包括新IR染料的阳图制版平版印版原版,该IR染料在曝露于热和/或光时提供具有减小烧蚀的版。
发明背景
平版印刷一般包括利用一种安装在旋转印刷机滚筒上所谓的印刷母版,如印版。母版的表面上带有平版印版图像,并通过将油墨施加到所述图像上,然后将油墨从母版转印到接收材料上来得到印刷品,接收材料一般为纸。在常规平版印刷中,油墨及含水润版液(也被称为润湿液体)被提供到平版图像,平版图像由亲油(或疏水性,即接受油墨,斥水)区域及亲水(或疏油,即接受水,斥墨)区域组成。在所谓的无水胶印中,平版图像由受墨区域和不粘墨(斥墨)区域组成,在无水胶印期间,只有油墨提供到母版上。
平版印刷母版一般由以成像方式曝光并且处理一种被称为印版原版的成像材料获得。原版涂层以成像方式曝露于热或光,一般通过数字调制曝光装置,例如,激光,其触发(物理)化学过程,如烧蚀、聚合、由聚合物交联或热塑性聚合物胶乳颗粒的凝聚作用降溶,由分子间相互作用破坏或增加显影阻挡层渗透性增溶。虽然一些印版原版能够在曝光后立即产生平版图像,但最流行的印版原版需要湿处理,因为曝光在涂层的曝光和非曝光区域之间在显影剂中产生溶解性或溶解速率差异。在阳图制版中,涂层的曝光区域溶于显影剂,而非曝光区域保持耐显影剂。在阴图制版中,涂层的非曝光区域溶于显影剂,而曝光区域保持耐显影剂。大多数版在亲水载体上包含疏水涂层,以便保持耐显影剂的区域限定版的受墨印刷区域,而亲水载体在非印刷区域由在显影剂中溶解涂层而显露。
很多平版印版包含聚合物粘合剂,例如酚树脂,粘合剂可经烘烤,以增加印版耐印力。近年来,提供高印版耐印力而不用焙烤的印版材料变得更加普及,因为可排除后焙箱,使能耗减少,占地面积更小。对于在卷筒纸印刷机上较高印刷速度和使用再生纸的趋势需要高耐磨性特征的版涂层。未烘烤酚树脂具有不良耐磨性,且不能在这些条件下提供高印版耐印力,如酚醛清漆、可熔酚醛或聚(乙烯基苯酚)。
在现有技术,基于酚树脂的平版印版的印版耐印力通过这些粘合剂化学改性提高。其实例描述于例如WO 99/01795、EP 934 822、EP 1 072 432、US 3,929,488和EP 2 102446。为了提高涂层的耐磨性,已使酚树脂与其它聚合物混合或用其代替,例如,聚(乙烯醇缩醛)树脂。适合聚(乙烯醇缩醛)树脂描述于US 5,262,270、US 5,169,897、US 5,534,381、US 6,458,511、US 6,541,181、US 6,087,066、US 6,270,938、WO 2001/9682、EP 1 162209、US 6,596,460、US 6,458,503、US 6,783,913、US 6,818,378、US 6,596,456、WO 2002/73315、WO 2002/96961、WO 2003/79113、WO 2004/20484、WO 2004/81662、EP 1 627 732、WO2007/17162、WO 2008/103258、US 6,255,033、WO 2009/5582、WO 2009/85093、WO 2001/09682、US 2009/4599、WO 2009/99518、US 2006/130689、US 2003/166750、US 5,330,877、US 2005/3296、WO 2007/3030、US 2009/0291387、US 2010/47723和US 2011/0059399。
利用所谓的热数字印版,用红外激光使红外辐射敏感原版成像。这些红外辐射敏感原版具有一种化合物作为共同成分,该化合物通过吸收用于使原版成像的红外辐射和使红外辐射转化成热触发成像机制。此类化合物经常为染料,一般被称为IR染料。已观察到,在原版涂层中作为主要成分存在的这些IR染料也可对这些原版的性能有负作用。例如,已观察到,由于在共同涂料溶剂中不良的溶解性,IR染料可能在印版涂层中不均匀分布或甚至形成团块。此类团块可能倾向于在涂层中形成所谓的热点,导致有害部分烧蚀。产生烧蚀碎屑可污染曝光装置的电子器件和光学器件。
在现有技术中通过优化涂层组成,以便在曝露于高功率红外激光期间发生最少烧蚀,提供解决这种烧蚀问题的方法。日本专利申请JP 2008-197566和JP 2008-509245公开为了抑制烧蚀包括具有特定结构的粘合剂的图像记录层。JP 2003-156850公开在图像记录层上提供的阻挡层,以防止烧蚀,然而,阻挡层延迟显影剂透入记录层,因此降低涂层的显影性。
JP 2005-99631公开能够改善薄膜性能的特定粘合剂抑制其中使用它的成像记录层的烧蚀。然而,由于改善薄膜性能,在非图像部分中显影剂的渗透性受到抑制,因此,在此也损害涂层的显影性。
US 2013/0029268公开能够抑制烧蚀与极佳印刷耐久性和显影性组合的图像记录层,该层包含红外吸收剂和包含在侧链具有两性离子结构的重复单元和在主链具有杂脂环结构的重复单元的共聚物。
虽然为了提供其中减少和/或抑制烧蚀的印版在现有技术已作出很多尝试,但在激光曝光期间形成烧蚀碎屑在本领域仍是个主要问题。
发明概述
本发明的一个方面是提供阳图制版平版印版原版,其中优化涂层,用于在曝露于热和/或光时产生最小程度的烧蚀。此目的通过权利要求1的材料达到,即,一种包括涂层的阳图制版平版印版原版,该涂层包括包含式I的结构成分的红外吸收化合物:
其中A表示-S-R1,R1表示任选被取代的烷基、芳烷基、烷芳基、环烷基、烯基、炔基、芳基或杂芳基和/或其组合,且Q = -CHR’-CHR”-、-CR’=CR”-或-CHR’-CHR”-CHR”’-,并且R’、R”和R”’独立表示氢、烷基、环烷基、芳烷基、烷芳基、芳基或杂芳基,或者R’和R”或R”和R”’一起形成环状结构;并且
*表示到分子其余部分的连接位置。
通过以下本发明优选实施方案详述,本发明的其它特点、要素、步骤、特征和优点将变得更加显而易见。本发明的具体实施方案也在从属权利要求中限定。
发明详述
本发明的平版印版原版包括在载体上的热和/或光敏涂层,且优选阳图制版,即,在曝光和显影后,涂层的曝光区域从载体去除,并限定亲水(非印刷)区域,而未曝光涂层不从载体去除,并限定亲油(印刷)区域。
红外吸收化合物,在本文中也称为IR吸收化合物或IR染料,吸收红外(IR)辐射光,并使吸收的能量转化成热。IR染料优选包括共轭系统,也称为“发色部分”。发色部分在红外区域具有其主要吸收,即,具有750至1500nm范围波长的辐射,优选750nm至1250nm,更优选750nm至1100nm,最优选780nm至900nm。优选发色基团在红外区域具有其最大吸收。
IR染料的适合实例包括但不限于聚甲基吲哚鎓、金属络合物IR染料、吲哚菁绿、聚次甲基染料、克酮酸染料、菁染料、部花菁染料、方酸菁染料、硫属苝基(pyrylo)亚芳基染料、金属硫醇盐络合物染料、双(硫属苝基)聚次甲基染料、包括巴比妥基的染料、羟吲嗪染料、双(氨基芳基)聚次甲基染料、吲嗪染料、金属二硫啉染料、吡喃鎓染料、醌型染料、醌染料、酞菁染料、萘酞菁染料、偶氮染料、(金属化)偶氮甲碱染料及其组合。优选的染料包括方酸菁染料、克酮酸染料、部花菁染料、菁染料、吲嗪染料、吡喃鎓染料或金属二硫啉染料。最优选的IR染料为菁染料,并包含式I的结构成分:
其中A表示-S-R1,R1表示任选被取代的烷基、芳烷基、烷芳基、环烷基、烯基、炔基、芳基或杂芳基和/或其组合,且Q = -CHR’-CHR”-、-CR’=CR”-或-CHR’-CHR”-CHR”’-,并且R’、R”和R”’独立表示氢、烷基、环烷基、芳烷基、烷芳基、芳基或杂芳基,或者R’和R”或R”和R”’一起形成环状结构。
在A的限定中,R1优选表示任选被取代的烷基、芳基或杂芳基或其组合,杂芳基是最优选的。最优选R1表示衍生自呋喃、噻吩、吡咯、吡唑、咪唑、1,2,3-三唑、1,2,4-三唑、四唑、噁唑、异噁唑、噻唑、异噻唑、噻二唑、噁二唑、吡啶、哒嗪、嘧啶、吡嗪、1,3,5-三嗪、1,2,4-三嗪或1,2,3-三嗪的任选被取代的杂芳基。所有这些化合物可环化,如苯并呋喃、苯并噻吩、吲哚、吲唑、苯并噁唑、喹啉、喹唑啉、苯并咪唑或苯并三唑。
杂芳基优选由式II表示:
其中*表示到S的连接位置,并且
X表示NR2、S或O,其中R2表示氢、任选被取代的烷基、环烷基、烯基、烷芳基、芳烷基、芳基、杂芳基或杂脂环基团或其组合,并且R3表示氢、任选被取代的烷基、烯基、S-R4、芳烷基、烷芳基、芳基或杂芳基或其组合。
杂芳基最优选由式III表示:
其中X为S、O或NR2,优选X= S或O;并且
R4表示氢、任选被取代的烷基、环烷基、烯基、炔基、芳烷基、烷芳基、芳基、杂芳基或杂脂环基团和/或其组合。
在一个优选的实施方案中,IR吸收化合物为阳离子,并具有式IV的结构:
其中
A和Q具有与以上式I中相同的含义;
T和T’独立表示氢、烷基、卤素、烷氧基、氰基、-CO2Rn、-CONRkRm、-SO2Rn、-SO2NRoRp或任选被取代的环化苯并环,其中Rk, Rm表示氢、任选被取代的烷基或芳基,Rn表示任选被取代的烷基或芳基,并且Ro和Rp表示氢、任选被取代的烷基或芳基;
Rz和Rz’独立表示任选被取代的烷基;
Z和Z’独立表示-S-、-CH=CH-或-CRaRb-;
Ra和Rb表示任选被取代的烷基、芳烷基、烷芳基或芳基;并且
W-使发色基团为中性。
优选Z和Z’独立表示-CRaRb-,其中Ra和Rb独立表示任选被取代的烷基、烷芳基、芳烷基或芳基。最优选Ra和Rb独立表示任选被取代的烷基;最优选Ra和Rb表示甲基或乙基。T和T’优选独立表示氢或烷基,例如甲基或乙基。Rz和Rz’优选表示C1至C10烷基,更优选C1至C5烷基,例如甲基、乙基、丙基或丁基,最优选丁基。
红外吸收染料更优选具有式V的结构:
其中Q、T、T’、Rz、Rz’、W-、R4、Ra和Rb如上式中所限定,并且X= O或S。
在一个优选的实施方案中,在以上式I至V中,Q表示-CHRy-CHRy’-、-CRy=CRy’-或-CH2-CH2-CH2-,且包括Q的结构成分优选由式VI、VII或VIII表示:
其中
Ry和Ry’独立表示氢、任选被取代的烷基、芳烷基、烷芳基或芳基,或者表示形成环状结构必需的原子。在式VI中,Ry和Ry’优选独立表示氢或任选被取代的烷基;在式VII中,Ry和Ry’优选表示环化的环,优选如式IX所示:
在式VI至IX中,*表示到染料其余部分的连接位置。
反离子W- 优选表示卤素阴离子,例如Cl-、Br-或I-;磺酸根阴离子,例如烷基或芳基磺酸根,例如CH3SO3 -、CF3SO3 -或对甲苯磺酸根;四氟硼酸根;六氟磷酸根或包含全氟烷基的基团;全氟烷基优选包括至少5个氟原子。全氟烷基最优选,并可由CF3-(CF2)m-(CH2)n-G表示,其中m和n独立表示0或大于0的整数,G表示例如-SO3 -、-HPO3 -、-HPO4 -或-COO-。最优选G表示-SO3 -或-COO-,m = 0、1、2或3,并且n = 0、1、2或3。
适合芳基的实例可由例如任选被取代的苯基、苄基、甲苯基或邻-、间-或对-二甲苯基、任选被取代的萘基、蒽基、菲基和/或其组合代表。除非另外规定,本文杂芳基优选为在环结构中包含碳原子和一个或多个杂原子的单环或多环芳族环,优选包含1至4个独立选自氮、氧、硒和硫的杂原子。其优选实例包括任选被取代的呋喃基、吡啶基、嘧啶基、吡唑基、咪唑基、噁唑基、异噁唑基、噻吩基(thienyl)、四唑基、三唑基、(1,2,3)三唑基、(1,2,4)三唑基、噻二唑基、噻吩基(thiofenyl)和/或其组合。
适合烷基的实例为甲基、乙基、正丙基、异丙基、正丁基、1-异丁基、2-异丁基和叔丁基、正戊基、正己基、氯甲基、三氯甲基、异丙基、异丁基、异戊基、新戊基、1-甲基丁基和异己基、1,1-二甲基丙基、2,2-二甲基丙基和2-甲基丁基、环丙基、环丁基、环戊基、环己基和甲基环己基、正丁基等。
适合烯基优选C2至C6-烯基,例如乙烯基、正丙烯基、正丁烯基、正戊烯基、正己烯基、异丙烯基、异丁烯基、异戊烯基、新戊烯基、1-甲基丁烯基、异己烯基、环戊烯基、环己烯基和甲基环己烯基。
适合炔基优选为C2至C6-炔基,适合芳烷基优选为包括一、二、三或更多个C1至C6-烷基的苯基或萘基,适合烷芳基优选为包括芳基的C1至C6-烷基,芳基优选为苯基或萘基。
环状基团或环状结构包括至少一个环结构,并且可以为单环或多环基团,这指一个或多个环稠合在一起。
术语“被取代的”,例如,在被取代的烷基中,指烷基可由此基团中正常存在的原子(即,碳和氢)以外的原子取代。例如,被取代的烷基可包括卤素原子或硫醇基。未取代烷基只含碳和氢原子。
烷基、环烷基、烯基、环烯基、炔基、芳烷基、烷芳基、芳基、杂芳基和杂环基团上的任选取代基优选选自羟基、-Cl、-Br、-I、-OH、-SH、-CN、-NO2、烷基(如甲基或乙基)、烷氧基(如甲氧基或乙氧基)、芳氧基、羧酸基团或其烷基酯、磺酸基团或其烷基酯、膦酸基团或其烷基酯、磷酸基团或酯(如烷基酯,例如甲酯或乙酯)、烷硫基、芳硫基、杂芳基硫基、-SH、硫醚(如烷硫基或芳硫基)、酮、醛、亚砜、砜、磺酸酯、磺酰胺、氨基、乙烯基、烯基、炔基、环烷基、烷芳基、芳烷基、芳基、杂芳基或杂脂环基团和/或其组合。
不限于此,本发明的红外吸收染料的典型实例以下给出。
其中反离子W-如上限定。
光和/或热敏涂层可包括一层或多于一层。优选涂层包括至少两层,第一层和位于所述第一层上的第二层。第一层是指该层与第二层相比更接近平版印版载体。本发明的红外吸收染料可存在于第一层、存在于第二层或存在于第一层和第二层中。本发明的红外吸收染料优选只存在于第二层中。
涂层中本发明的IR染料的浓度优选相对于涂层总体在0.25和15.0%重量之间,更优选在0.5和10.0%重量之间,最优选1.0和7.5%重量之间。
除红外吸收染料外,光和/或热敏涂层优选还包含碱溶性亲油树脂。涂层中存在的亲油树脂优选为可溶于含水显影剂的聚合物,更优选为可溶于具有7.5和14之间pH的含水碱性显影液的聚合物。亲油树脂优选为选自酚醛清漆、可熔酚醛或聚乙烯基酚树脂的酚树脂。其它优选的聚合物为酚树脂,其中酚单体单元的苯基或羟基用有机取代基化学改性,如EP 894 622、EP 901 902、EP 933 682、WO99/63407、EP 934 822、EP 1 072 432、US 5,641,608、EP 982 123、WO99/01795、WO04/035310、WO04/035686、WO04/035645、WO04/035687或EP1 506 858中所述。也可在涂层中存在一种或多种碱溶性亲油树脂。
任选存在于涂层的酚树脂的量优选为相对于涂层中存在的所有组分的总重量至少20%重量,更优选至少30%重量,最优选至少45%重量。
酚醛清漆树脂或可熔酚醛树脂可通过在酸催化剂存在下芳烃(如苯酚、邻甲酚、对甲酚、间甲酚、2,5-二甲苯酚、3,5-二甲苯酚、间苯二酚、连苯三酚、双酚、双酚A、三酚、邻乙基苯酚、对乙基苯酚、丙基苯酚、正丁基苯酚、叔丁基苯酚、1-萘酚和2-萘酚)与至少一种醛或酮(选自醛,如甲醛、乙二醛、乙酰乙醛、丙醛、苯甲醛和呋喃甲醛;和酮,如丙酮、甲基·乙基酮和甲基·异丁基酮)的缩聚反应来制备。可分别用仲甲醛和仲乙醛代替甲醛和乙醛。使用通用校准和聚苯乙烯标准,通过凝胶渗透色谱法测定酚醛清漆树脂的重均分子量优选为500至150,000g/mol,更优选1,500至50,000g/mol。
聚(乙烯基苯酚)树脂可以为一种或多种含羟基-苯基的单体的聚合物,如羟基苯乙烯或(甲基)丙烯酸羟基苯酯。此类羟基苯乙烯的实例为邻羟基苯乙烯、间羟基苯乙烯、对羟基苯乙烯、2-(邻羟基苯基)丙烯、2-(间羟基苯基)丙烯和2-(对羟基苯基)丙烯。此类羟基苯乙烯可在其芳环上具有取代基,例如氯、溴、碘或氟基或C1-4烷基。此类(甲基)丙烯酸羟基苯酯的实例为甲基丙烯酸2-羟基苯酯。聚(乙烯基苯酚)树脂可通过在自由基引发剂或阳离子聚合引发剂存在下一种或多种含羟基苯基的单体聚合,或通过一种或多种这些含羟基苯基的单体与其它单体化合物(如丙烯酸酯单体、甲基丙烯酸酯单体、丙烯酰胺单体、甲基丙烯酰胺单体、乙烯基单体、芳族乙烯基单体或二烯单体)共聚来制备。使用通用校准和聚苯乙烯标准,通过凝胶渗透色谱法测定聚(乙烯基苯酚)树脂的重均分子量优选为1,000至200,000g/mol,更优选1,500至50,000g/mol。
热敏涂层可进一步包含一种或多种不溶于水而溶于碱溶液的其它粘合剂,例如,优选具有小于13pKa的酸性基团的有机聚合物,以保证该层可溶于或至少可溶胀于含水碱性显影剂。粘合剂可选自聚酯树脂、聚酰胺树脂、环氧树脂、丙烯酸类树脂、甲基丙烯酸类树脂、苯乙烯基树脂、聚氨酯树脂或聚脲树脂。粘合剂可具有一个或多个官能基。官能基可选自
(i)磺酰胺基,例如-NR-SO2-、-SO2-NR-或-SO2-NR’R”,其中R和R’独立表示氢或任选被取代的烃基,例如,任选被取代的烷基、芳基或杂芳基,关于这些聚合物的更多细节可发现于EP 2 159 049;
(ii)包含酸氢原子的磺酰胺基,例如-SO2-NH-CO-或-SO2-NH-SO2-,例如公开于US 6,573,022,这些化合物的适合实例包括例如N-(对甲苯磺酰)甲基丙烯酰胺和N-(对甲苯磺酰)丙烯酰胺;
(iii)脲基,例如-NH-CO-NH-,关于这些聚合物的更多细节可发现于WO 01/96119;
(iv)星形聚合物,其中至少三个聚合物链连接到核,如EP 2 497 639中所述;
(v)羧酸基团;
(vi)腈基团;
(vii)磺酸基团;和/或
(viii)磷酸基团。
包含磺酰胺基团的(共)聚合物是优选的。磺酰胺(共)聚合物优选为通过含至少一个磺酰胺基的单体均聚或通过此单体和其它可聚合单体共聚制备的高分子量化合物。优选在其中涂层包括两层的实施方案中,包含至少一个磺酰胺基的共聚物存在于位于最外层和亲水载体之间的第一层。
与含至少一个磺酰胺基的单体共聚的单体的实例包括如EP 1 262 318、EP 1 275498、EP 909 657、EP 1 120 246、EP 894 622、US 5,141,838、EP 1 545 878和EP 1 400351中公开的单体。优选单体如(甲基)丙烯酸烷酯或芳酯,如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸2-苯基乙酯、(甲基)丙烯酸羟乙酯、(甲基)丙烯酸苯酯;(甲基)丙烯酸;(甲基)丙烯酰胺;N-烷基或N-芳基(甲基)丙烯酰胺,如,N-甲基(甲基)丙烯酰胺、N-乙基(甲基)丙烯酰胺、N-苯基(甲基)丙烯酰胺、N-苄基(甲基)丙烯酰胺、N-羟甲基(甲基)丙烯酰胺、N-(4-羟基苯基)(甲基)丙烯酰胺、N-(4-甲基吡啶基)(甲基)丙烯酰胺;(甲基)丙烯腈;苯乙烯;被取代的苯乙烯,如2-、3-或4-羟基苯乙烯、4-苯甲酸苯乙烯;乙烯基吡啶,如2-乙烯基吡啶、3-乙烯基吡啶、4-乙烯基吡啶;被取代的乙烯基吡啶,如4-甲基-2-乙烯基吡啶;乙酸乙烯酯,任选共聚的乙酸乙烯酯单体单元至少部分水解,生成醇基,和/或至少部分通过醛化合物(如甲醛或丁醛)反应,生成缩醛或缩丁醛基;乙烯醇;乙烯醇缩乙醛;乙烯醇缩丁醛;乙烯基醚,如甲基·乙烯基醚;乙烯基酰胺;N-烷基乙烯基酰胺,如N-甲基乙烯基酰胺、己内酰胺、乙烯基吡咯烷酮;马来酰亚胺;N-烷基或N-芳基马来酰亚胺,如N-苄基马来酰亚胺。
磺酰胺(共)聚合物和/或其制备方法的适合实例公开于EP 933 682、EP 982 123、EP 1 072 432、WO 99/63407、EP 1 400 351和EP 2 159 049。磺酰胺(共)聚合物的非常优选的实例描述于EP 2 047 988 A [0044]至[0046]。
磺酰胺(共)聚合物的具体优选实例为包含N-(对氨基磺酰基苯基)(甲基)丙烯酰胺、N-(间氨基磺酰基苯基)(甲基)丙烯酰胺、N-(邻氨基磺酰基苯基)(甲基)丙烯酰胺和或(甲基)丙烯酸间氨基磺酰基苯酯的聚合物。
包含酰亚胺基的(共)聚合物也优选作为粘合剂用于热敏涂层。具体实例包括甲基·乙烯基醚/马来酸酐共聚物的衍生物和苯乙烯/马来酸酐共聚物的衍生物,它们包含N-取代环酰亚胺单体单元和/或N-取代马来酰亚胺,如N-苯基马来酰亚胺单体单元和N-苄基马来酰亚胺单体单元。优选在其中涂层包括两层的实施方案中,这种共聚物存在于第一层中。这种共聚物优选为碱溶性。适合实例描述于EP 933 682、EP 894 622 A [0010]至[0033]、EP 901 902、EP 0 982 123 A [007]至[0114]、EP 1 072 432 A [0024]至[0043]和WO 99/63407(第4页13行至第9页37行)。
也可向热敏涂层加入具有游离酚羟基的缩聚物和聚合物,例如通过苯酚、间苯二酚、甲酚、二甲苯酚或三甲基苯酚与醛(尤其甲醛)或酮反应得到。氨磺酰基或氨甲酰基取代的芳族化合物和醛或酮的缩合物也适用。双羟甲基取代脲、乙烯基醚、乙烯醇、乙烯醇缩醛或乙烯基酰胺的聚合物和丙烯酸苯酯的聚合物及羟基苯基马来酰亚胺的共聚物同样适用。此外还可提及具有乙烯基芳族或(甲基)丙烯酸芳酯的单元的聚合物,这些单元也可分别具有一个或多个羧基、酚羟基、氨磺酰基或氨甲酰基。具体实例包括具有(甲基)丙烯酸2-羟基苯酯、4-羟基苯乙烯或羟基苯基马来酰亚胺的单元的聚合物。该聚合物可另外包含没有酸性单元的其它单体的单元。此类单元包括乙烯基芳族、(甲基)丙烯酸甲酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸苄酯、甲基丙烯酰胺或丙烯腈。
涂层的溶解性质可通过任选的溶解性调节组分精细调节。更具体地讲,可使用显影性增强化合物、显影加速剂和显影抑制剂。在其中涂层包括多于一层的实施方案中,这些成分可加到第一层和/或加到第二层和/或加到任选的涂层的其它层。
适合显影性增强化合物为(i)在加热时释放气体的化合物,如WO 2003/79113中所公开;(ii)如WO 2004/81662中公开的化合物;(iii)包含一种或多种碱性含氮有机化合物的组合物,如WO 2008/103258中所公开;和(iv)具有至少一个氨基和至少一个羧酸基团的有机化合物,如WO 2009/85093中所公开。
用于显影性增强组合物的碱性含氮有机化合物的实例为N-(2-羟基乙基)-2-吡咯烷酮、1-(2-羟基乙基)哌嗪、N-苯基二乙醇胺、三乙醇胺、2-[双(2-羟基乙基)氨基]-2-羟基甲基-1,3-丙二醇、N,N,N',N'-四(2-羟基乙基)乙二胺、N,N,N',N'-四(2-羟基丙基)乙二胺、3-[(2-羟基乙基)苯基氨基]丙腈和六氢-1,3,5-三(2-羟基乙基)-均三嗪。优选使用N,N,N',N'-四(2-羟基丙基)乙二胺。也可使用两种或更多种这些化合物的混合物。碱性含氮有机化合物可从一些商源得到,包括BASF(Germany)和Aldrich Chemical Company(Milwaukee, WI)。
碱性含氮有机化合物优选以基于涂料组合物总固体1至30%重量存在于涂层中,一般3至15%重量。
优选一种或多种碱性含氮有机化合物与一种或多种酸性显影性增强化合物组合使用,例如羧酸或环酸酐、磺酸、亚磺酸、烷基硫酸、膦酸、次膦酸、膦酸酯、酚、磺酰胺或磺酰亚胺,因为此组合可允许进一步改善显影宽容度和印刷耐久性。酸性显影性增强化合物的代表性实例提供于US 2005/0214677的[0030]至[0036]。它们可以基于涂料组合物总干重0.1至30%重量的量存在。一种或多种碱性含氮有机化合物与一种或多种酸性显影性增强化合物的摩尔比一般为0.1:1至10:1,更一般 0.5:1至2:1。
聚合物显影性增强化合物与上述低分子量显影性增强化合物组合也引人关注。聚合物优选具有高于1500g/mol的分子量,并优选以总涂料组合物小于40%重量的量存在,更优选小于10%重量,最优选小于5%重量。低分子量组分优选具有低于1500g/mol的分子量,并优选以总涂料组合物小于10%重量的量存在,更优选小于5%重量,最优选小于2.5%重量。这种类型的对比增强系统优选用于基本不含硅酸盐的低pH显影剂溶液,pH<12。
聚合物可以为具有低于100000g/mo分子量的二醇的衍生物(例如聚氧化乙烯、聚氧化丙烯和/或其共聚物)或酚树脂。
适合一起使用的此类高和低分子量显影性增强化合物的具体实例为例如高支化聚酯(例如,BoltornTM产品,购自Perstorp)和以下化合物:
显影加速剂为作为溶解促进剂的化合物,因为它们能够提高涂层的溶解速率。例如,为了改善水性显影性,可使用环酸酐、酚或有机酸。环酸酐的实例包括邻苯二甲酸酐、四氢邻苯二甲酸酐、六氢邻苯二甲酸酐、3,6-桥氧-4-四氢邻苯二甲酸酐、四氯邻苯二甲酸酐、马来酸酐、氯代马来酸酐、α-苯基马来酸酐、琥珀酸酐和均苯四酸酐,如美国专利4,115,128中所述。酚的实例包括双酚A、对硝基苯酚、对乙氧基苯酚、2,4,4'-三羟基二苯甲酮、2,3,4-三羟基二苯甲酮、4-羟基二苯甲酮、4, 4', 4"-三羟基三苯基甲烷和4,4',3",4"-四羟基-3,5,3',5'-四甲基三苯基甲烷等。有机酸的实例包括磺酸、亚磺酸、烷基硫酸、膦酸、磷酸酯和羧酸,如JP-A 60-88,942和2-96,755中所述。这些有机酸的具体实例包括对甲苯磺酸、十二烷基苯磺酸、对甲苯亚磺酸、乙基硫酸、苯基膦酸、苯基次膦酸、磷酸苯酯、磷酸二苯酯、苯甲酸、间苯二甲酸、己二酸、对甲苯甲酸、3,4-二甲氧基苯甲酸、3,4,5-三甲氧基苯甲酸、3,4,5-三甲氧基肉桂酸、邻苯二甲酸、对苯二甲酸、4-环己烯-1,2-二甲酸、芥酸、月桂酸、正十一烷酸和抗坏血酸。涂层中所含环酸酐、酚或有机酸的量优选为相对于涂层总体0.05至20%重量。聚合物显影加速剂,如含至少70%摩尔间甲酚作为重复单体单元的酚-甲醛树脂,也是适合的显影加速剂。
在一个优选的实施方案中,涂层也包含抗显影剂手段,也称为显影抑制剂,即,能够在处理期间延迟未曝光区域溶解的一种或多种成分。优选通过加热使溶解抑制作用反向,以免实质延迟曝光区域溶解,从而能够在曝光区域和未曝光区域之间得到大的溶解差异。例如EP 823 327和WO 97/39894中所述的化合物由例如与涂层中的碱溶性树脂形成氢桥的作用作为溶解抑制剂。此类型抑制剂一般为包含至少一个芳族基团和氢结合部位的有机化合物,氢结合部位如氮原子,可为杂环的部分,或者为氨基取代基、鎓基、羰基、亚磺酰基或磺酰基。此类型适合溶解抑制剂已公开于例如EP 825 927和EP 823 327。以下提到的一些化合物也可作为溶解抑制剂,例如红外染料(如菁)和对比染料(如季碱化三芳基甲烷染料)。
其它适合抑制剂改善显影剂耐性,因为它们延迟含水碱性显影剂渗入涂层。此类化合物可存在于第一层和/或存在于任选的第二层和/或存在于所述层顶上的显影阻挡层中,如EP 864 420、EP 950 517、WO 99/21725和WO 01/45958中所述。显影剂中阻挡层的溶解性和/或穿透性可通过暴露于热和/或红外光提高。
斥水聚合物代表另一种类型的适合溶解抑制剂。此类聚合物似乎通过从涂层排斥含水显影剂增加涂层的显影剂耐性。斥水聚合物可加到涂层,并且/或者可存在于在涂层顶上提供的单独层中。在后一实施方案中,斥水聚合物形成阻挡层,保护涂层免受显影剂,显影剂中阻挡层的溶解性或显影剂对阻挡层的穿透性可通过暴露于热或红外光增加,如EP864 420、EP 950 517和WO99/21725中所述。
延迟含水碱性显影剂渗入涂层的抑制剂的优选实例包括包含硅氧烷和/或全氟烷基单元的斥水聚合物。聚硅氧烷可以为直链、环或复杂交联聚合物或共聚物。术语聚硅氧烷化合物应包括任何包含多于1个硅氧烷基-Si(R,R’)-O-的化合物,其中R和R'为任选被取代的烷基或芳基。优选的硅氧烷为苯基烷基硅氧烷和二烷基硅氧烷。聚合物中硅氧烷基数为至少2,优选至少10,更优选至少20。可小于100,优选小于60。
斥水聚合物可以为嵌段共聚物或接枝共聚物,共聚物包含极性嵌段(如聚或低聚(氧化烯))和疏水嵌段(如长链烃基、聚硅氧烷和/或全氟烃基)。全氟表面活性剂的一般实例为Megafac F-177,购自Dainippon Ink & Chemicals, Inc.。其它适合共聚物包含约15至25个硅氧烷单元和50至70个氧化烯基。优选的实例包括包含苯基甲基硅氧烷和/或二甲基硅氧烷及氧化乙烯和/或氧化丙烯的共聚物,如Tego Glide 410、Tego Wet 265、TegoProtect 5001或Silikophen P50/X,均购自Tego Chemie, Essen, Germany。
涂层中这种斥水聚合物的适合量在0.5和25mg/m2之间,优选在0.5和15mg/m2之间,最优选在0.5和10mg/m2之间。当斥水聚合物也斥墨时,例如在聚硅氧烷的情况下,高于25mg/m2的量可能导致未曝光区域的不良受墨性。另一方面,低于0.5mg/m2的量可导致不能令人满意的显影耐性。
相信在涂覆和干燥期间,斥水聚合物或共聚物作为表面活性剂,并由于其双官能结构倾向于自身位于涂层和空气之间的界面,并因此形成单独的顶层,甚至在作为涂料溶液的成分施加时。同时,此类表面活性剂也作为铺展剂改善涂层品质。或者,可将斥水聚合物或共聚物施加于单独溶液中,涂覆在包含一个或任选多个层的涂层的顶部上。在此实施方案中,可有利在单独溶液中使用不能使其它层中存在成分溶解的溶剂,以便在涂层顶部得到高浓斥水相。
热敏印版原版的涂层可任选包含另外的红外光吸收染料或颜料,在涂层包括多于一层的实施方案中,红外光吸收染料或颜料可存在于第一层和/或存在于第二层和/或存在于任选的其它层中。优选的IR吸收染料为菁染料、部花菁染料、靛苯胺染料、氧杂菁染料、吡喃鎓染料和方酸菁(squarilium)染料。适合IR染料的实例描述于例如EP-As 823327、978376、1029667、1053868、1093934、WO 97/39894和00/29214。优选的化合物为以下菁染料:
其中X-为适合反离子,如甲苯磺酸根。
涂层中任选另外IR染料的浓度优选相对于涂层总体在0.25和15.0%重量之间,更优选在0.5和10.0%重量之间,最优选1.0和7.5%重量之间。
涂层可进一步包含一种或多种着色剂,如染料或颜料,着色剂为涂层提供可见颜色,并且保留在涂层中在处理步骤期间基本不去除的图像区域。因此形成可见图像,图像使得能够检查经显影印版上的平版印版图像。此类染料通常被称为对比染料或指示染料。优选染料具有蓝色和在600nm和750nm之间波长范围的最大吸收。此类对比染料的一般实例为氨基取代的三或二芳基甲烷染料,例如结晶紫、甲基紫、维多利亚艳蓝、flexoblau 630、basonylblau 640、金胺和孔雀绿。在EP-A 400,706中深入讨论的染料也是适合的对比染料。也可用与特定添加剂组合只略微使涂层着色但在曝光后强烈变色的染料作为着色剂,如二-或三-芳基甲烷染料、菁染料、苯乙烯染料和份苯乙烯染料,如WO2006/005688中所述。
为了保护热敏和/或光敏印版原版的涂层表面,特别是保护不受机械损伤,也可任选施加保护层。保护层一般包含至少一种水溶性粘合剂,如聚乙烯醇、聚乙烯吡咯烷酮、部分水解的聚乙酸乙烯酯、明胶、碳水化合物或羟乙基纤维素,并且可以任何已知方式例如由水性溶液或分散体产生,如果需要,水性溶液或分散体可包含少量有机溶剂,即,对于保护层基于涂料溶剂总重量小于5%重量。保护层的厚度可适合为有利最高5.0μm,优选0.1至3.0μm,特别优选0.15至1.0μm的任何量。
涂层可任选进一步包含另外的成分,如表面活性剂(尤其全氟表面活性剂)、无机填料或聚合物颗粒(如消光剂和隔离剂)。无机填料的实例包括硅或二氧化钛颗粒、氧化锆、高岭土和衍生物、任选涂覆和/或改性的氧化硅基颗粒、氧化铝、热解法二氧化硅和氧化铈。颗粒可在微米范围,一般在1µm和10µm之间。更优选颗粒在纳米范围,即,在10nm和900nm之间。
为了将一种或多种涂料溶液施加到载体的亲水表面,可使用任何涂覆方法。通过依序涂覆/干燥各层,或者同时涂覆数种涂料溶液,可施加多层涂层。在干燥步骤中,从涂层去除挥发性溶剂,直到涂层自支承并且摸起来是干的。然而,不必(甚至不可能)在干燥步骤去除所有溶剂。实际上,可将残余溶剂含量认为是优化组合物可利用的另外的组合物变量。干燥一般通过在涂层上吹热空气进行,一般在至少70℃温度,适合80-150℃,尤其90-140℃。也可使用红外灯。干燥时间一般可为15-600秒。
在涂覆和干燥之间,或在干燥步骤后,热处理和随后冷却可提供另外的益处,如WO99/21715、EP-A 1074386、EP-A 1074889、WO00/29214和WO/04030923、WO/04030924、WO/04030925中所述。
在本发明中使用的平版印版原版包括具有亲水表面或提供有亲水层的载体。载体可以为片状材料,例如板,或者可以为能够围绕印刷机的印刷滚筒滑动的圆筒形元件,例如套筒。载体优选为金属载体,如铝或不锈钢。载体也可以为包括铝箔和塑料层(例如聚酯薄膜)的层压材料。
特别优选的平版印版载体为粒化并且经阳极化的铝载体。铝载体通常具有约0.1-0.6mm厚度。然而,此厚度可适当根据所用印版的尺寸和/或在其上印版原版曝光的印版记录机(plate-setter)的尺寸变化。铝优选通过电化学粒化进行粒化,并通过利用磷酸或硫酸/磷酸混合物的阳极化技术进行阳极化。铝的粒化和阳极化两者的方法均在本领域熟知。
通过使铝载体粒化(或粗糙化),印刷图像的附着和非图像区域的湿润性质均得到改善。通过在粒化步骤改变电解质的类型和/或浓度和施加的电压,可得到不同类型的纹理。表面粗糙度通常表示为算术平均中心线粗糙度Ra(ISO 4287/1或DIN 4762),并且可以在0.05和1.5μm之间变化。本发明的铝基片优选具有0.30μm和0.60μm之间的Ra值,更优选在0.35μm和0.55μm之间,最优选在0.40μm和0.50μm之间。Ra值的下限优选为约0.1μm。关于经粒化和阳极化的铝载体的表面的优选Ra值的更多细节描述于EP 1 356 926。
通过使铝载体阳极化,改善其耐磨性和亲水性质。Al2O3层的微结构和厚度通过阳极化步骤确定,阳极重量(g/m2在铝表面上生成的Al2O3)在1和8g/m2之间。阳极重量优选在1.5g/m2和5.0g/m2之间,更优选在2.5g/m2和4.0g/m2之间,最优选在2.5g/m2和3.5g/m2之间。
可使经粒化和阳极化处理的铝载体经过所谓的后阳极处理,以改善其表面的亲水性质。例如,通过在高温(例如95℃)用溶液处理其表面,可使铝载体硅酸化,溶液包含一种或多种碱金属硅酸盐化合物,例如,包含碱金属磷硅酸盐、原硅酸盐、硅酸盐(metasilicate)、水合硅酸盐、聚硅酸盐或焦硅酸盐的溶液。在用不含硅酸盐的显影剂使本发明的印版原版显影的实施方案中,硅酸化载体是优选的。或者,可运用磷酸盐处理,包括用磷酸盐溶液处理氧化铝表面,磷酸盐溶液可进一步包含无机氟化物。另外,氧化铝表面可用柠檬酸或柠檬酸盐溶液、葡糖酸或酒石酸清洗。此处理可在室温进行,或者可在约30至50℃略高温度进行。更引人关注的处理包括用碳酸氢盐溶液清洗氧化铝表面。另外,氧化铝表面可用聚乙烯基膦酸、聚乙烯基甲基膦酸、聚乙烯醇的磷酸酯、聚乙烯基磺酸、聚乙烯基苯磺酸、聚乙烯醇的硫酸酯、由与磺化脂族醛反应生成的聚乙烯醇的缩醛、聚丙烯酸或衍生物(例如,GLASCOL E15TM,购自Ciba Speciality Chemicals)处理。一个或多个这些后处理可单独或组合进行。这些处理的更详细说明在GB-A 1,084,070、DE-A 4,423,140、DE-A 4,417,907、EP-A 659,909、EP-A 537,633、DE-A 4,001,466、EP-A 292,801、EP-A 291,760和US 4,458,005中给出。
在一个优选的实施方案中,载体首先用包含一种或多种上述硅酸盐化合物的水溶液处理,随后用包含具有羧酸基团和/或膦酸基团或其盐的化合物的水溶液处理载体。特别优选的硅酸盐化合物为原硅酸钠或钾和硅酸(metasilicate)钠或钾。具有羧酸基团和/或膦酸基团和/或其酯或盐的化合物的适合实例为聚合物,例如聚乙烯基膦酸、聚乙烯基甲基膦酸、聚乙烯醇的磷酸酯、聚丙烯酸、聚甲基丙烯酸及丙烯酸和乙烯基膦酸的共聚物。包含聚乙烯基膦酸或聚(甲基)丙烯酸的溶液非常优选。
载体也可为柔性载体,柔性载体可提供有亲水层,以后称为‘基层’。柔性载体为例如纸、塑料薄膜或铝。塑料薄膜的优选实例为聚对苯二甲酸乙二酯薄膜、聚萘二甲酸乙二酯薄膜、乙酸纤维素薄膜、聚苯乙烯薄膜、聚碳酸酯薄膜等。塑料薄膜载体可不透明或透明。
基层优选为用硬化剂交联的亲水粘合剂得到的交联亲水层,硬化剂如甲醛、乙二醛、多异氰酸酯或经水解的原硅酸四烷基酯。后者特别优选。亲水基层的厚度可以为0.2至25μm,优选1至10μm。基层的优选实施方案的更多细节可发现于例如EP 1 025 992。
根据本发明,本发明也提供制备阳图制版平版印版的方法,所述方法包括以下步骤,使印版原版以成像方式曝光,随后使以成像方式曝光的原版显影,以便经曝光的区域溶于显影液。
热敏印版原版可直接用热以成像方式曝光,例如通过热头,或间接通过红外光,优选近红外光。红外光优选由如上讨论的IR光吸收化合物转化成热。热敏平版印版原版优选对可见光不敏感,即,曝露于可见光不实质影响涂层在显影剂中的溶解速率。最优选涂层对环境日光不敏感,即,包括近UV光(300-400nm)和可见光(400-750nm)的波长范围。
印版原版可曝露于红外光,例如通过LED或激光。最优选用于曝光的光为发射约750至约1500nm(更优选750至1100nm)波长的近红外光的激光,例如半导体激光二极管、Nd:YAG或Nd:YLF激光。所需的激光功率取决于印版原版的灵敏性、由斑点直径(现代印版记录机在最大强度1/e2的一般值:5-25μm)决定的激光束的像素停留时间、曝光设备的扫描速度和分辨率(即每单位线性距离可寻址像素的数目,通常用每英寸点数或dpi表示,一般值:1000-4000dpi)。
一般使用两种类型激光曝光设备:内鼓式(ITD)和外鼓式(XTD)印版记录机。用于热敏印版的ITD印版记录机一般具有高达500m/sec的极高扫描速度特征,并且可能需要数瓦激光功率。用于热敏印版的XTD印版记录机具有一般约200mW至约1W的激光功率,在例如0.1至10m/sec较低扫描速度工作。装配有一个或多个在750和850nm之间波长范围发射的激光二极管的XTD印版记录机为用于本发明方法的尤其优选实施方案。
已知的印版记录机可用作离机曝光设备,这提供减少停机时间的益处。XTD印版记录机构造也可用于机上曝光,这提供在多色印刷机中直接对准的益处。机上曝光设备的更多技术细节描述于例如US 5,174,205和US 5,163,368。
在曝光后,使原版显影,由此通过浸入显影剂去除涂层的非图像区域,优选含水碱性显影剂,可与机械摩擦结合,例如通过使用旋转刷。显影剂优选包含碱剂,碱剂可以为无机碱剂(例如,碱金属氢氧化物)、有机碱剂(例如胺)和/或碱性硅酸盐(例如,碱金属硅酸盐或碱金属硅酸盐(metasilicate))。具有至少1的二氧化硅:碱金属氧化物比的硅酸盐基显影剂是有利的,因为它们保证不损伤基片的氧化铝层(如果存在)。优选的碱金属氧化物包括Na2O和K2O及其混合物。特别优选的硅酸盐基显影液为包含硅酸钠或硅酸钾的显影液,即,其中二氧化硅:碱金属氧化物比为1的硅酸盐。显影剂优选具有高于8的pH,更优选高于10,最优选高于12。显影剂可进一步包含在本领域已知的组分,如缓冲物质、络合剂、消泡剂、有机溶剂、腐蚀抑制剂、染料、抗淤渣剂、阻溶剂(如,非离子表面活性剂)、阴离子、阳离子或两性表面活性剂和/或水溶助长剂。显影剂可进一步包含多羟基化合物,例如,山梨糖醇,优选至少40g/l浓度,也含有包含聚氧化乙烯的化合物,例如Supronic B25,购自RHODIA,优选最大0.15g/l浓度,这可与机械摩擦结合,例如通过使用旋转刷。在显影期间,也去除任何存在的水溶性保护层。在一个优选实施方案中,显影剂基本不含硅酸盐,例如碱金属硅酸盐或碱金属硅酸盐(metasilicate)。
关于显影步骤的更多细节可发现于例如EP 2 263 874、US 2010/0047723和WO/2004071767。
也可在显影步骤后进行清洗步骤和/或涂胶步骤。涂胶步骤包括用胶溶液后处理平版印版。胶溶液一般为包含一种或多种表面保护化合物的水性液体,表面保护化合物能够保护印版的平版图像不受污染或损伤。此类化合物的适合实例为成膜亲水聚合物或表面活性剂。可在显影步骤后使用的适合胶溶液描述于例如EP 1 342 568和WO 2005/111727。如果需要,可进一步用在本领域已知的适合校正剂或防腐剂后处理印版原版。
为了提高完成印版的耐性并因此扩大其耐印能力,可将层简短地加热到高温(“烘烤”)。可在烘烤前干燥印版,或者在其烘烤过程期间干燥。在烘烤步骤期间,可在高于热敏涂层玻璃化转变温度的温度加热印版40秒至5分钟,例如,在100℃和230℃之间。烘烤可在常规热风炉中进行,或者通过曝露于在红外或紫外光谱发射的灯。由于此烘烤步骤,印版对洗版剂、校正剂和UV可固化印刷油墨的耐性提高。这种热后处理特别描述于DE 1,447,963和GB 1,154,749。
热和/或光敏印版可用于其中油墨和水性润湿液体提供到印版的普通所谓的湿胶版印刷。另一种适合的印刷方法使用所谓的单流体油墨,而不使用润湿液体。适合的单流体油墨已描述于US 4,045,232、US 4,981,517和US 6,140,392。在一个最优选的实施方案中,单流体油墨包含油墨相(也称为疏水或亲油相)和多元醇相,如WO 00/32705中所述。
实施例
1. IR染料.
本发明的 IR染料IR-1至IR-12和比较性 IR染料(Comp-01)在以下表1中给出。
表1:IR染料
2. 合成本发明的红外染料.
2.1 合成中间体巯基-噻二唑衍生物.
合成2-(5-巯基-[1,3,4]噻二唑-2-基硫基)-丙酸乙酯:
使15g(0.1mol) 2,5-二巯基-[1,3,4]-噻二唑溶于70ml丙酮。加入10.1g (0.1mol)三乙胺和0.5g碘化钠。加入15g(0.083mol) 2-溴-丙酸乙酯,并将混合物在25℃搅拌1小时。加入500ml水。将分开的有机层分离。加入200ml二氯甲烷,并用200ml 水萃取溶液一次,用200ml 1M NaHCO3溶液萃取一次。使有机层分离,经MgSO4干燥,并在减压下蒸发。分离12g(y:57%) 2-(5-巯基-[1,3,4]噻二唑-2-基硫基)-丙酸乙酯,为油状化合物(在Whatman提供的Partisil KC18F上TLC分析,用MeOH/0.5 M NaCl作为洗脱剂:Rf = 0.53)。
使用所得2-(5-巯基-[1,3,4]噻二唑-2-基硫基)-丙酸乙酯不用进一步纯化。
合成2-(5-巯基-[1,3,4]噻二唑-2-基硫基)-己酸甲酯:
使15g(0.1mol) 2,5-二巯基-[1,3,4]-噻二唑溶于70ml丙酮。加入10.1g (0.1mol)三乙胺和0.5g碘化钠。加入17.5g(0.083mol) 2-溴-己酸甲酯,并将混合物在25℃搅拌1小时。加入500ml水。将分开的有机层分离。加入200ml二氯甲烷,并用200ml 水萃取溶液一次,用200ml 1M NaHCO3溶液萃取一次。使有机层分离,经MgSO4干燥,并在减压下蒸发。分离18g(y:78%) 2-(5-巯基-[1,3,4]噻二唑-2-基硫基)-己酸甲酯,为油状化合物(在Whatman提供的Partisil KC18F上TLC分析,用MeOH/0.5 M NaCl作为洗脱剂:Rf = 0.37)。
使用所得2-(5-巯基-[1,3,4]-噻二唑-2-基硫基)-己酸甲酯不用进一步纯化。
合成5-苄基硫基-[1,3,4]-噻二唑-2-硫醇:
使15g(0.1mol) 2,5-二巯基-[1,3,4]-噻二唑溶于70ml甲醇。加入10.1g (0.1mol)三乙胺和0.5g碘化钠。加入10.5g(0.083mol) 苄基氯,并将混合物在25℃搅拌2小时。缓慢加入70ml水,并从介质沉淀粗5-苄基硫基-[1,3,4]-噻二唑-2-硫醇。通过过滤分离粗5-苄基硫基-[1,3,4]-噻二唑-2-硫醇,并从70ml甲醇重结晶。通过过滤分离经重结晶的5-苄基硫基-[1,3,4]-噻二唑-2-硫醇,用少量甲醇洗涤,并干燥。分离7.8g(y:39%) 5-苄基硫基-[1,3,4]-噻二唑-2-硫醇(在由Merck提供的TLC Silica gel 60F254上TLC分析,用二氯甲烷作为洗脱剂:Rf = 0.68(拖尾))。
合成5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇:
使15g(0.1mol) 2,5-二巯基-[1,3,4]-噻二唑溶于100ml甲醇。加入10.1g (0.1mol)三乙胺。加入12.6g(0.083mol) (4-氯甲基)苯乙烯和(3-氯甲基)苯乙烯的混合物,并将混合物在20℃搅拌2小时。从介质沉淀粗5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇。加入少量甲醇稀释浆料。通过过滤分离粗5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇,并干燥。使粗5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇分散于100ml甲苯,并搅拌3小时。通过过滤分离5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇,用少量甲苯和己烷洗涤,并干燥。分离11g(y:50%) 5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇(在由Merck提供的TLC Silica gel 60F254上TLC分析,用二氯甲烷/乙酸乙酯97/3作为洗脱剂:Rf= 0.3)。
合成5-(2-乙基-己基硫基)-[1,3,4]-噻二唑-2-硫醇:
使5.4g(36mmol) 2,5-二巯基-[1,3,4]-噻二唑溶于50ml丙酮。加入3.6g(36mmol)三乙胺和0.3g碘化钠。加入5.8g(30mmol) 2-乙基-己基溴,并使反应在40℃继续2小时。向混合物加入40ml水,并从混合物沉淀5-(2-乙基-己基硫基)-[1,3,4]-噻二唑-2-硫醇。通过过滤分离粗5-(2-乙基-己基硫基)-[1,3,4]-噻二唑-2-硫醇,并干燥。使经分离的5-(2-乙基-己基硫基)-[1,3,4]-噻二唑-2-硫醇分散于50ml甲苯,并搅拌3小时。通过过滤分离5-(2-乙基-己基硫基)-[1,3,4]-噻二唑-2-硫醇,用少量甲苯和己烷洗涤,并干燥。分离2g(y:25%)5-(2-乙基-己基硫基)-[1,3,4]-噻二唑-2-硫醇(在由Merck提供的TLC Silica gel 60F254上TLC分析,用二氯甲烷作为洗脱剂:Rf = 0.7)。
2.2.合成中间体中氯菁染料
可如WO2013/055640(Eastman Kodak Company)和由Nagao等人(Dyes and Pigments,73(3), 344-352 (2006))、Xing等人(Macromolecular Chemistry and Physics, 214(5),578-588 (2013))和Mojzych等人(Heterocyclic Communications, 15(2), 123-126(2009))所公开制备中间体中氯菁染料。
2.3.合成本发明的红外染料.
发明性红外染料IR-01:
使7.5g(10mmol) 起始IR染料和2.8g(11.5mmol) 5-苄基硫基-[1,3,4]噻二唑-2-硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续16小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入100ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml 0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-1,并干燥。分离10g发明性红外染料IR-1(y:85%,UV-VIS λmax:841nm,在甲醇中)。
发明性红外染料IR-02:
使7.5g(10mmol) 起始IR染料和3.06g(11.5mmol) 5-(4-乙烯基-苄基硫基)-[1,3,4]噻二唑-2-硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续16小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入100ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml 0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-2,并干燥。分离9.2g发明性红外染料IR-2(y:76%,UV-VIS λmax:842nm,在甲醇中)。
发明性红外染料IR-03:
使7.5g(10mmol) 起始IR染料和3.2g(11.5mmol) 2-(5-巯基-[1,3,4]噻二唑-2-基硫基)-己酸甲酯溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续16小时。加入另外的0.32g(1.15mmol) 2-(5-巯基-[1,3,4]噻二唑-2-基-硫基)-己酸甲酯和0.115g(1.15 mmol)三乙胺,并使反应在室温继续4小时。加入500ml0.1M NaHCO3溶液,并分离有机层。加入另外的50ml二氯甲烷,随后加入150ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml 0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-3,并干燥。分离9g发明性红外染料IR-3(y:74%,UV-VIS λmax:840nm,在甲醇中)。
发明性红外染料IR-04:
使20.4g(0.03mol)起始红外染料和8.8g(0.033mol) 5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇溶于75ml二氯甲烷。加入3.3g(0.033mol)三乙胺,并使反应继续30分钟。分三个部分加入2.1g(0.0078mol) 5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇,每次后使反应继续30分钟。加入200ml水,并分离有机层。在减压下去除溶剂,并使中间体碘化物分离为油状化合物。中间体转化成发明性红外染料IR-4,不用进一步纯化。
使25g粗中间体碘化物溶于400ml甲基·叔丁基醚。加入用300ml水稀释的十七氟-1-辛烷磺酸锂盐的151g 30%重量溶液(0.09mol),并搅拌混合物30分钟。分离有机部分,用500ml 水萃取一次,用200ml 5%重量氯化钠溶液萃取一次。在减压下蒸发溶剂,并使油状残余物溶于200ml二氯甲烷。溶液经MgSO4干燥。在减压下蒸发溶剂,并使发明性红外染料IR-4分离为油状化合物。分离23g发明性红外染料IR-4(y:70%,UV-VIS λmax:843nm,在甲醇中)。
发明性红外染料IR-05:
使7.5g(10mmol) 起始IR染料和1.68g(11.5mmol) 2-乙基-己基硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续16小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入100ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml 0.1MNaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-5,并干燥。分离8g发明性红外染料IR-5(y:74%,UV-VIS λmax:821nm,在甲醇中)。
发明性红外染料IR-06:
使7.4g(10mmol) 起始IR染料和1.68g(11.5mmol) 2-乙基己基硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续2小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入100ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml 0.1MNaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-6,并干燥。分离6g发明性红外染料IR-6 (y:56%,UV-VIS λmax:851nm,在甲醇中)。
发明性红外染料IR-07:
使6.3g(7.05mmol) 起始IR染料和2.2g(8.17mmol) 5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇溶于24ml二氯甲烷和16ml甲醇的混合物。加入0.82g(8.17mmol)三乙胺,并使反应在室温继续16小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入100ml水中3.4g(10mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml的0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-7,并干燥。分离6g发明性红外染料IR-7(y:68%,UV-VIS λmax:812nm,在甲醇中)。
发明性红外染料IR-08:
使7.5g(10mmol) 起始IR染料和2.9g 2-(5-巯基-[1,3,4]噻二唑-2-基-硫基)-丙酸乙酯(11.5mmol)溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续16小时。加入另一克(4mmol) 2-(5-巯基-[1,3,4]噻二唑-2-基硫基)-丙酸乙酯和0.4g(4mmol)三乙胺。使反应在室温继续另外6小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入50ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml的0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-8,并干燥。分离8g发明性红外染料IR-8(y:67%,UV-VIS λmax:840nm,在甲醇中)。
发明性红外染料IR-09:
使7.1g(10mmol) 起始IR染料和3.06g(11.5mmol) 5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续16小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入150ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml的0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入100ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-9,并干燥。分离10.5g发明性红外染料IR-9(y:94%,UV-VIS λmax:835nm,在甲醇中)。
发明性红外染料IR-10:
使6.81g(10mmol) 起始IR染料和3.06g(11.5mmol) 5-(4-乙烯基-苄基硫基)-[1,3,4]-噻二唑-2-硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入1.15g(11.5mmol)三乙胺,并使反应在室温继续1小时。加入500ml水,并分离有机层。加入另外的100ml二氯甲烷,随后加入150ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml的0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入100ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-10,并干燥。分离8.8g发明性红外染料IR-10(y:81%,UV-VIS λmax:834nm,在甲醇中)。
发明性红外染料IR-11:
使7.8g(10mmol) 起始IR染料和1.68g(11.5mmol) 2-乙基己基硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入2.15g(21.5mmol)三乙胺,并使反应在室温继续16小时。加入900ml水和30ml 1N HCl,并分离有机层。用100ml水萃取有机层一次。向有机部分加入另外的100ml二氯甲烷,随后加入150ml水中5g(14.7mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml 0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入100ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-11,并干燥。分离9g发明性红外染料IR-11(y:75%,UV-VIS λmax:823nm,在甲醇中)。
发明性红外染料IR-12:
使5.6g(8.3mmol) 起始IR染料和2.5g(9.5mmol) 5-(2-乙基-己基硫基)-[1,3,4]-噻二唑-2-硫醇溶于30ml二氯甲烷和20ml甲醇的混合物。加入1g(10mmol)三乙胺,并使反应在室温继续30分钟。加入300ml水,并分离有机层。用300ml的0.1M NaHCO3溶液萃取有机层。向有机部分加入另外的100ml二氯甲烷,随后加入150ml水中4g(11.8mmol)九氟-丁烷-1-磺酸钾盐的溶液。在室温搅拌混合物30分钟。分离有机层,用100ml的0.1M NaHCO3溶液洗涤,并经MgSO4干燥。去除溶剂,加入150ml甲基·叔丁基醚,随后加入150ml己烷。分离沉淀为油的发明性红外染料IR-12,并干燥。分离3.3g发明性红外染料IR-12(y:37%,UV-VIS λmax:832nm,在甲醇中)。
除非另外说明,用于实施例的所有化合物和溶剂均容易地得自精细化学供应商,例如Acros或Aldrich。
本发明的红外染料的结构已用LC MS根据以下方法分析。
在HP1000 Esquire-LC上,使用填充有5µm C18二氧化硅的Machery Nagel C18Pyramid柱(125x2),用ESI作为离子化方法进行分析。使2mg各染料的样品溶于20ml甲醇。注射5µl溶液,并根据下表用梯度洗脱洗脱样品。
时间 | % B |
0 | 55 |
3 | 55 |
13 | 100 |
30 | 停止 |
洗脱剂A:水/甲醇9/1,包含10mmol乙酸铵
洗脱剂B:甲醇,包含10mmol乙酸铵
3. 印版原版.
3.1制备平版印刷载体S-01.
通过用70℃含34g/l NaOH的水溶液对0.3mm厚铝箔喷6秒使铝箔脱脂,并用软化水清洗3.6秒钟。然后,用交流电在37℃温度和约100A/dm2电流密度(电荷密度约800C/dm2)在含15g/l HCl、15g/1 SO4 2-离子和5g/l Al3+离子的水溶液中使箔片在8秒期间电化学粒化。随后,通过用35℃含6.5g/l氢氧化钠的水溶液浸蚀铝箔5秒使铝箔去污,并用软化水清洗4秒。随后,在57℃温度和250C/dm2阳极电荷在含145g/l硫酸的水溶液中使箔片在10秒钟期间经过阳极氧化,然后用软化水洗涤7秒,并在120℃干燥7秒。
如此得到的载体特征在于,用干涉仪NT3300检测的0.45-0.50μm的表面粗糙度Ra,并且具有3.0g/m2 (重量分析)阳极重量。
通过在70℃将含2.2g/l聚乙烯基膦酸(PVPA)的后处理溶液喷到所得载体上4秒,用软化水清洗3.5秒,并在120℃干燥7秒,制备平版印刷载体S-01。
3.2 制备印版原版
通过混合表2中所述组分制备50g涂料溶液。IR染料的量保持等摩尔,最小重量差用Dowanol PM溶剂校正。
通过半自动涂覆装置,以26µm湿层厚度,在平版印刷载体S-01上涂覆各涂料溶液。在100℃干燥涂层1min。
表2:印版原版PPP-01至PPP-09.
(1) 在Dowanol PM中Tegoglide 265的1%重量溶液(见以下表4);Tegoglide 265为聚硅氧烷和聚氧化烯的共聚物,购自Tego Chemie Service GmbH;
(2) 在Dowanol PM中Tegoglide 410的1%重量溶液(见以下表4);Tegoglide 410为聚硅氧烷和聚氧化烯的共聚物,购自Tego Chemie Service GmbH;
(3) 在Dowanol PM中Tegoglide 100的1%重量溶液(见以下表4);Tegoglide 100为聚硅氧烷和聚氧化烯的共聚物,购自Tego Chemie Service GmbH;
(4) Dowanol PM:丙二醇单甲基醚(1-甲氧基-2-丙醇),购自Dow Chemical Company;
(5) TMCA为3,4,5-三甲氧基肉桂酸
(6) 比较性IR染料,购自FEW CHEMICALS;见以上表1;
(7) 发明性IR染料,见以上表1;
(8) 1-甲氧基-2-丙醇中的1%重量Basonyl Blue 640,由BASF提供;
(9) Alnovol SPN452为Dowanol PM中酚醛清漆树脂的44.3%重量溶液(见以上表4),购自Clariant GmbH;
3.3烧蚀检验方法
在第一步骤中,通过快滤收集(FFC)方法收集烧蚀粉尘。随后,总有机碳(TOC)检测提供每版表面释放的固体粉尘重量精确值(例如,mg碳/m2)。
快滤收集
快滤收集(FFC)是提供在曝光时每版表面释放的烧蚀粉尘总质量精确值(例如,mg/m2)的重量分析方法。
快滤收集(FFC)方法在Creo Trendsetter上进行,印版记录机具有20W红外激光头(830nm),在140rpm和2400dpi操作,购自Eastman Kodak Corp.。
滤器(PallflexTM Membrame Filter Tissu; Quartz 47mm; rec. no. 7202)置于激光头和直接在激光头后的真空清洁器之间。滤器阻挡在栅格和载体之间。使约1050cm2表面积的印版原版曝露于200mJ/cm2,并在11cm2滤器上收集粉尘。随后,通过总有机碳(TOC)检测对烧蚀水平定量。
总有机碳(TOC)检测
TOC分析是提供由FFC方法得到样品中存在的所有有机碳原子总重量的定量方法。得到在曝露步骤期间由于烧蚀现象释放的碳原子的量,即,mg碳/m2,并给出关于烧蚀度的意见。
关于该检测的更多细节可见于以下标准:
ISO NBN EN 15936/2012:污泥、经处理生物废料、土壤和废物,通过干燃烧测定总有机碳(TOC)。NBN EN 13137/2001:废物表征,测定废物、污泥和沉淀中的总有机碳(TOC)。
对PPP-01至PPP-09进行的烧蚀检验的结果在以下表3中给出。
表3:烧蚀结果
烧蚀结果显示,与包括比较性IR染料的印版原版(PPP-01)比较,利用本发明的IR染料的印版原版(PPP-02至PPP-09)的烧蚀碎屑产生有明显减少。使用发明性染料,烧蚀水平降低大于30%。
3.4 曝光和显影.
利用Creo Trendsetter以100至220mJ/cm2范围能量密度使印版原版以成像方式曝光,印版记录机具有20W红外激光头(830nm),在140rpm和2400dpi操作,购自Eastman KodakCorp.。
然后在购自Agfa Graphics的包含THD200显影剂的实验室处理器装置中使经曝光原版显影。温度设定在25℃,停留时间为30s。得到印版PP-01至PP-09。
3.5合适曝光量(RE).
测定合适曝光量(RE),其定义为,按利用购自GretagMacbeth AG的GretagMacBethD19C光密度计测定,2x2方格图案达到52%覆盖率所在的能量密度值(mJ/cm2)。使用自动滤色器设定。
RE试验的结果在以下表4中给出。
表4:RE结果
*RE如上限定
表4中的结果显示,包括本发明的IR染料的印版PP-02至PP-09的RE值与包括比较性IR染料的印版PP-01的RE值相似。
Claims (10)
1.一种阳图制版平版印版原版,所述阳图制版平版印版原版在具有亲水表面或提供有亲水层的载体上包括包含红外吸收化合物的热敏和/或光敏涂层,
其特征在于红外吸收化合物包含式I的结构成分:
其中
A表示-S-R1,其中R1表示任选被取代的芳烷基、烷芳基、环烷基、烯基、炔基或杂芳基和/或其组合;
Q = -CHR’-CHR”-、-CR’=CR”-或-CHR’-CHR”-CHR”’-,并且R’、R”和R”’独立表示氢、烷基、环烷基、芳烷基、烷芳基、芳基或杂芳基,或者R’和R”或R”和R”’一起形成环状结构。
2.权利要求1的印版原版,其中所述红外吸收剂具有式II的结构:
其中
A和Q具有与权利要求1中相同的含义;
T和T’独立表示氢、烷基、卤素、烷氧基、氰基、-CO2Rn、-CONRkRm、-SO2Rn、-SO2NRoRp或任选被取代的环化苯并环,其中Rk, Rm表示氢、任选被取代的烷基或芳基,Rn表示任选被取代的烷基或芳基,并且Ro和Rp表示氢、任选被取代的烷基或芳基;
Rz和Rz’独立表示任选被取代的烷基;
Z和Z’独立表示-S-、-CH=CH-或-CRaRb-;
Ra和Rb表示任选被取代的烷基、芳烷基、烷芳基或芳基;并且
W-使发色基团为中性。
3.权利要求1或2的印版原版,其中R1表示任选被取代的杂芳基。
4.前述权利要求中任一项的印版原版,其中所述任选被取代的杂芳基由式III表示:
其中X表示NR2、S或O;R2表示氢、烷基、环烷基、烯基、烷芳基、芳烷基、芳基、杂芳基或杂脂环基团或其组合;R3表示氢、任选被取代的烷基、烯基、S-R4、芳烷基、烷芳基、芳基或杂芳基或其组合;R4表示氢、任选被取代的烷基、环烷基、烯基、炔基、芳烷基、烷芳基、芳基、杂芳基或杂脂环基团和/或其组合;并且
其中*表示到S的连接位置。
5.前述权利要求中任一项的印版原版,其中所述任选被取代的杂芳基由式IV表示:
其中X和R4如权利要求4中限定,并且*表示到S的连接位置。
6.前述权利要求中任一项的印版原版,其中所述红外吸收剂具有式V的结构:
其中Q、T、T’、Rz、Rz’、W-、X、R4、Ra和Rb如上式中所限定。
7.权利要求5或6的印版原版,其中R4表示任选被取代的烷基、烯基、芳烷基、烷芳基、芳基或杂芳基和/或其组合。
8.权利要求2至7中任一项的印版原版,其中W-包括全氟烷基。
9. 前述权利要求中任一项的印版原版,其中所述涂层包括两层:
- 第一层,该层包括含磺酰胺基、酰亚胺基、腈基、脲基、羧基、磺酸基和/或磷酸基的粘合剂;和
- 位于第一层上的第二层,该第二层包含权利要求1至8中任一项限定的红外吸收化合物。
10.一种制备平版印版原版的方法,所述方法包括以下步骤:
- 提供具有亲水表面或提供有亲水层的载体;
- 施加包含权利要求1至8中任一项限定的红外吸收剂的涂料;并且
- 使原版干燥。
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EP15180688.2A EP3130465B1 (en) | 2015-08-12 | 2015-08-12 | Heat-sensitive lithographic printing plate precursor |
EP15180688.2 | 2015-08-12 | ||
PCT/EP2016/067644 WO2017025307A1 (en) | 2015-08-12 | 2016-07-25 | Heat-sensitive lithographic printing plate precursor |
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CN107921775A true CN107921775A (zh) | 2018-04-17 |
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US (1) | US20180236759A1 (zh) |
EP (1) | EP3130465B1 (zh) |
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WO (1) | WO2017025307A1 (zh) |
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US20180236759A1 (en) | 2018-08-23 |
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EP3130465A1 (en) | 2017-02-15 |
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