CN107629701B - Polishing solution and preparation method thereof - Google Patents
Polishing solution and preparation method thereof Download PDFInfo
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- CN107629701B CN107629701B CN201711062417.0A CN201711062417A CN107629701B CN 107629701 B CN107629701 B CN 107629701B CN 201711062417 A CN201711062417 A CN 201711062417A CN 107629701 B CN107629701 B CN 107629701B
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- polishing solution
- polishing
- abrasive
- glass
- oxidant
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- 238000005498 polishing Methods 0.000 title claims abstract description 63
- 238000002360 preparation method Methods 0.000 title abstract description 6
- 239000011521 glass Substances 0.000 claims abstract description 26
- 239000002270 dispersing agent Substances 0.000 claims abstract description 23
- 239000007800 oxidant agent Substances 0.000 claims abstract description 22
- 230000001590 oxidative effect Effects 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 11
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 4
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 4
- 239000003002 pH adjusting agent Substances 0.000 claims description 3
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 claims description 2
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 claims description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 2
- 239000012286 potassium permanganate Substances 0.000 claims description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 claims description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 235000019864 coconut oil Nutrition 0.000 claims 1
- 239000003240 coconut oil Substances 0.000 claims 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 abstract description 6
- 239000002131 composite material Substances 0.000 abstract description 5
- 239000006185 dispersion Substances 0.000 abstract description 4
- 230000003993 interaction Effects 0.000 abstract description 3
- 230000002195 synergetic effect Effects 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000003756 stirring Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to the field of glass manufacturing, in particular to a polishing solution and a preparation method thereof, wherein the polishing solution contains an abrasive, an oxidant, a dispersant and a pH regulator, the total amount of the abrasive, the oxidant and the dispersant is taken as a reference, the abrasive content is 55-80 wt%, the oxidant content is 2-20 wt%, and the dispersant content is 6-25 wt%. The polishing solution prepared by the invention has high dispersion stability and polishing efficiency, the surface roughness is low after glass is polished, the surface of the glass is flat, and the polishing solution enhances the close contact and interaction of various composite components through high-strength mechanical friction, fully exerts the synergistic function of the components and ensures that the performance of the polishing solution is better.
Description
Technical Field
The invention relates to the field of glass manufacturing, in particular to polishing solution and a preparation method thereof.
Background
The optical glass has high requirements on the surface smoothness of the glass, the quality of finished glass is determined in the polishing process in the post-processing process, the problems of condensation, low polishing efficiency, poor glass surface quality and the like can occur in the use process of the polishing solution on the market at present, and the suspension property and the dispersibility of the existing polishing solution are poor.
Disclosure of Invention
The invention aims to solve the problems of low polishing efficiency, poor glass surface quality and poor suspension property and dispersibility of the existing polishing solution in the prior art, and provides the polishing solution and the preparation method thereof.
In order to achieve the above object, according to one aspect of the present invention, there is provided a polishing solution, wherein the polishing solution contains an abrasive, an oxidizing agent, a dispersing agent, and a pH adjusting agent, and based on the total amount of the abrasive, the oxidizing agent, and the dispersing agent, the content of the abrasive is 55 to 80 wt%, the content of the oxidizing agent is 2 to 20 wt%, and the content of the dispersing agent is 6 to 25 wt%. .
The invention also provides a preparation method of the polishing solution, wherein the method comprises the steps of dissolving the abrasive and the dispersant in water, adding the oxidant after uniformly stirring, and adding the pH regulator after uniformly stirring.
In a third aspect, the invention provides a glass polishing method, wherein the method comprises polishing glass by using the polishing solution of the invention.
The polishing solution is alkaline, and is beneficial to polishing glass; the oxidizing agent is added into the polishing solution, so that a layer of oxide film with weak binding force can be formed on the surface of the glass in a short time, mechanical removal is facilitated, the glass removal rate is improved, and the polishing time is saved; the dispersing agent is added to ensure that the solution has enough dispersion stability, and the polished surface is not easy to scratch and does not damage a polishing machine. Compared with the existing polishing solution, the polishing solution prepared by the invention has the advantages of high dispersion stability and polishing efficiency, low surface roughness after glass polishing and flat glass surface. In addition, the polishing solution disclosed by the invention enhances the close contact and interaction of various composite components through high-strength mechanical friction, and fully exerts the synergistic function of various composite components, so that the performance of the polishing solution is more excellent.
Detailed Description
The endpoints of the ranges and any values disclosed herein are not limited to the precise range or value, and such ranges or values should be understood to encompass values close to those ranges or values. For ranges of values, between the endpoints of each of the ranges and the individual points, and between the individual points may be combined with each other to give one or more new ranges of values, and these ranges of values should be considered as specifically disclosed herein.
The invention provides a polishing solution, wherein the polishing solution contains an abrasive, an oxidant, a dispersant and a pH regulator, and the content of the abrasive is 55-80 wt%, the content of the oxidant is 2-20 wt% and the content of the dispersant is 6-25 wt% based on the total amount of the abrasive, the oxidant and the dispersant.
Preferably, the polishing solution contains 56 to 70 wt% of the abrasive, 5 to 15 wt% of the oxidizing agent and 10 to 20 wt% of the dispersing agent, based on the total amount of the abrasive, the oxidizing agent and the dispersing agent.
In the present invention, preferably, the abrasive is a rare earth oxide, and further preferably, the abrasive is CeO2And/or La2O3. The cerium oxide and lanthanum oxide abrasive has moderate hardness, fine granularity and uniform granularity distribution, and is suitable for polishing of precise instruments.
In the present invention, CeO2And La2O3The weight ratio of (A) to (B) may be 2-5:0.5-2, preferably 1.5-4: 0.55-1.8. CeO in the invention2And La2O3The mixed abrasive formed by mixing the abrasives is more beneficial to improving the removal rate and the flatness of the polished material.
In the present invention, the abrasive may have a particle size of 0.5 to 0.7. mu.m, preferably 0.55 to 0.65. mu.m. The particle size of the abrasive as used herein means: diameter (mm, micron) size of the mineral or particle.
In a preferred aspect, the oxidizing agent of the present invention is at least one of potassium permanganate and manganese dioxide. The oxidant can form an oxide film with weak binding force on the surface of the glass in a short time, is beneficial to mechanical removal, improves the removal rate of the glass and saves the polishing time.
In a preferred aspect, the dispersant of the present invention is at least one of sodium dodecylbenzene sulfonate, polyvinylpyrrolidone and coconut diethanolamide. The dispersing agents enable the polishing solution prepared by the invention to have strong suspension property, difficult deposition and good dispersion stability.
In the present invention, preferably, the pH adjuster is at least one of sodium carbonate, potassium carbonate, sodium hydroxide, and potassium hydroxide. The pH regulator can regulate the pH value of the polishing solution to make the pH value of the polishing solution alkaline, and preferably pH 7-8. The pH of the polishing solution is alkaline, so that the mechanical action and the chemical action reach an equivalent state in the polishing process, and under the condition, the uniformity of the chemical action is good, the surface tension is small, the treatment consistency is good, and a good surface polishing effect can be obtained.
In the present invention, the pH of the polishing solution may be alkaline, and more preferably, the pH is 7 to 8.
The second aspect of the present invention relates to a method for preparing the polishing liquid of the present invention, which comprises: firstly, dissolving the grinding material and the dispersing agent in water, adding the oxidizing agent after uniformly stirring, and adding the pH regulator after uniformly stirring.
The third aspect of the invention relates to a glass polishing method, which comprises polishing glass with the polishing liquid of the invention.
The present invention will be described in detail below by way of examples.
Examples 1 to 7
And weighing the abrasive, the dispersing agent and the oxidant according to the content of each component in the polishing solution. Dissolving an abrasive and a dispersant in a proper amount of water, mechanically stirring, continuously adding an oxidant after the abrasive and the dispersant are uniformly dispersed, mechanically stirring, and then adding a proper amount of a pH value regulator to regulate the pH value of the polishing solution to 7-8 to obtain the alkaline polishing solution A1-A6.
Comparative examples 1 to 3
The components such as commercially available cerium oxide powder and the like are dissolved in a proper amount of water to prepare polishing solution D1-D3.
TABLE 1
Examples 12 to 18 and comparative examples 19 to 22
The same glasses were polished using polishing liquids A1-A7 and D1-D4, respectively, and then subjected to the following tests, the results of which are shown in Table 2.
The removal rate is as follows: after polishing, cleaning the glass, detecting the surface quality and polishing rate of the glass, measuring the mass difference before and after polishing by using a precision balance, and calculating the removal rate.
Surface roughness: and detecting the surface roughness of the polished glass by using a surface roughness tester.
Determination of glass fracture toughness K Using Universal testing machine and Vickers hardness tester, in accordance with ASTM E-1820IC。
TABLE 2
As can be seen from the results in Table 1, the glass polished by the polishing solution of the invention has low surface roughness, high removal rate and flat glass surface. Moreover, the polishing solution disclosed by the invention enhances the close contact and interaction of various composite components through high-strength mechanical friction, and fully exerts the synergistic function of various composite components, so that the performance of the polishing solution is more excellent.
The preferred embodiments of the present invention have been described above in detail, but the present invention is not limited thereto. Within the scope of the technical idea of the invention, many simple modifications can be made to the technical solution of the invention, including combinations of various technical features in any other suitable way, and these simple modifications and combinations should also be regarded as the disclosure of the invention, and all fall within the scope of the invention.
Claims (4)
1. The glass polishing method is characterized by comprising the step of polishing glass by using polishing solution, wherein the polishing solution comprises an abrasive, an oxidant, a dispersant, a pH regulator and water, and by taking the total amount of the abrasive, the oxidant and the dispersant as a reference, the content of the abrasive is 70-75 wt%, the content of the oxidant is 2-20 wt%, and the content of the dispersant is 6-25 wt%; the dispersing agent is one of sodium dodecyl benzene sulfonate, sodium dodecyl sulfate, polyvinylpyrrolidone and coconut oil acid diethanolamide; the oxidant is potassium permanganate and/or manganese dioxide;
wherein the abrasive is CeO2And La2O3；
Wherein the pH value of the polishing solution is 7-8.
2. The method of claim 1 wherein CeO2And La2O3The weight ratio of (A) to (B) is 2-5: 0.5-2.
3. The method according to claim 1, characterized in that the grit has a particle size of 0.5-0.7 μm.
4. The method of claim 1, wherein the pH adjusting agent is at least one of sodium carbonate, potassium carbonate, sodium hydroxide, and potassium hydroxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201711062417.0A CN107629701B (en) | 2017-11-02 | 2017-11-02 | Polishing solution and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711062417.0A CN107629701B (en) | 2017-11-02 | 2017-11-02 | Polishing solution and preparation method thereof |
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| Publication Number | Publication Date |
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| CN107629701A CN107629701A (en) | 2018-01-26 |
| CN107629701B true CN107629701B (en) | 2021-04-13 |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108587479B (en) * | 2018-07-04 | 2021-01-15 | 江西汇诺科技有限公司 | Sapphire polishing solution |
| CN113249035B (en) * | 2020-02-10 | 2024-05-24 | 长春长光圆辰微电子技术有限公司 | Chemical mechanical polishing solution and application thereof |
| CN113292928A (en) * | 2021-05-20 | 2021-08-24 | 内蒙古大学 | Preparation method of nano cerium dioxide polishing solution (powder) |
| CN114479676B (en) * | 2022-03-08 | 2023-04-21 | 机械科学研究总院海西（福建）分院有限公司 | Low-abrasive content and weak-acidity polishing solution for ultra-precise processing of optical glass and preparation method thereof |
| CN115433520B (en) * | 2022-08-29 | 2023-11-21 | 内蒙古广禾元纳米高科技有限公司 | Green and environment-friendly chemical mechanical polishing solution for quartz glass and preparation method and application thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003054096A1 (en) * | 2001-12-20 | 2003-07-03 | Akzo Nobel N.V. | Cerium oxide coated silica particles and method for production thereof |
| EP2011765A1 (en) * | 2006-04-27 | 2009-01-07 | Asahi Glass Company, Limited | Oxide crystal fine particle and polishing slurry including the fine particle |
| KR20100080074A (en) * | 2008-12-31 | 2010-07-08 | 제일모직주식회사 | Cmp slurry composition for polishing metal wiring and polishing method using the same |
| CN102352186A (en) * | 2011-06-24 | 2012-02-15 | 安徽工业大学 | Nanometer polishing solution used for microcrystalline glass and preparation method thereof |
| CN103917332A (en) * | 2011-11-01 | 2014-07-09 | 旭硝子株式会社 | Method for producing glass substrate |
| CN107129762A (en) * | 2017-05-12 | 2017-09-05 | 江南大学 | A kind of polishing fluid of carborundum chemically mechanical polishing and preparation method thereof |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MY133305A (en) * | 2001-08-21 | 2007-11-30 | Kao Corp | Polishing composition |
| JP2004331852A (en) * | 2003-05-09 | 2004-11-25 | Tama Kagaku Kogyo Kk | Abrasive slurry excellent in dispersion stability, and manufacturing method for substrate |
| KR101388956B1 (en) * | 2006-12-28 | 2014-04-24 | 가오 가부시키가이샤 | Polishing liquid composition |
| CN101302404A (en) * | 2008-07-01 | 2008-11-12 | 上海大学 | Preparation of nano-cerium oxide composite abrasive grain polishing solution |
| JPWO2012165376A1 (en) * | 2011-06-03 | 2015-02-23 | 旭硝子株式会社 | Abrasive and polishing method |
| CN102516874A (en) * | 2011-11-09 | 2012-06-27 | 大连理工大学 | Polishing liquid for ultra-precision sharpening of diamond cutting tool and preparation method thereof |
| CN104178033A (en) * | 2013-05-27 | 2014-12-03 | 天津西美半导体材料有限公司 | Nano cerium oxide polishing liquid composition |
| KR20150019008A (en) * | 2013-08-12 | 2015-02-25 | 주식회사 동진쎄미켐 | Chemical mechanical polishing slurry composition for polishing metal layer and polishing method for metal layer |
| JP2015229750A (en) * | 2014-06-06 | 2015-12-21 | コニカミノルタ株式会社 | Cmp polishing liquid |
| CN104385116A (en) * | 2014-09-24 | 2015-03-04 | 尹涛 | Polishing method of SiC semiconductor material |
-
2017
- 2017-11-02 CN CN201711062417.0A patent/CN107629701B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003054096A1 (en) * | 2001-12-20 | 2003-07-03 | Akzo Nobel N.V. | Cerium oxide coated silica particles and method for production thereof |
| EP2011765A1 (en) * | 2006-04-27 | 2009-01-07 | Asahi Glass Company, Limited | Oxide crystal fine particle and polishing slurry including the fine particle |
| KR20100080074A (en) * | 2008-12-31 | 2010-07-08 | 제일모직주식회사 | Cmp slurry composition for polishing metal wiring and polishing method using the same |
| CN102352186A (en) * | 2011-06-24 | 2012-02-15 | 安徽工业大学 | Nanometer polishing solution used for microcrystalline glass and preparation method thereof |
| CN103917332A (en) * | 2011-11-01 | 2014-07-09 | 旭硝子株式会社 | Method for producing glass substrate |
| CN107129762A (en) * | 2017-05-12 | 2017-09-05 | 江南大学 | A kind of polishing fluid of carborundum chemically mechanical polishing and preparation method thereof |
Non-Patent Citations (4)
| Title |
|---|
| CeO2 纳米粒子抛光液分散稳定性及其化学机械抛光特性研究;陈广林等;《表面技术》;20161120;第45卷(第11期);187-193 * |
| 包覆型纳米CeO_2@SiO_2复合磨料的制备、表征及其抛光性能;隆仁伟等;《摩擦学学报》;20090915;第29卷(第05期);412-417 * |
| 直接沉淀法制备纳米氧化铈及其抛光硅晶片的性能与影响因素;李艳花等;《中国稀土学报》;20100615;第28卷(第03期);316-321 * |
| 纳米氧化铈抛光液对钌的化学机械抛光;王婕等;《金刚石与磨料磨具工程》;20130220;第33卷(第01期);60-64 * |
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