CN108864948A - Glass polishing powder, polishing fluid and preparation method thereof, glass and electronic product - Google Patents
Glass polishing powder, polishing fluid and preparation method thereof, glass and electronic product Download PDFInfo
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- CN108864948A CN108864948A CN201810941338.5A CN201810941338A CN108864948A CN 108864948 A CN108864948 A CN 108864948A CN 201810941338 A CN201810941338 A CN 201810941338A CN 108864948 A CN108864948 A CN 108864948A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
- H04M1/0279—Improving the user comfort or ergonomics
- H04M1/0283—Improving the user comfort or ergonomics for providing a decorative aspect, e.g. customization of casings, exchangeable faceplate
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- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a kind of glass polishing powder, polishing fluid and preparation method thereof, glass and electronic products, are related to glass polishing technical field.Polishing powder includes：Cerium oxide 50-60%, lanthana 20-30% and fluorine 10-20%；The D50 of polishing powder is 1.0-1.6 μm, and D90 is 2.4-2.6 μm, Mohs' hardness 7-8.Polishing fluid includes：The water of polishing powder 50-60%, suspending agent 0.5-1%, dispersing agent 1-10%, levelling agent 1-5%, grinding aid 1-5% and surplus.By control polishing powder component content, size distribution and hardness, it not only can guarantee high cutting rate but also can be reduced scuffing.In addition, passing through the addition of suspending agent, dispersing agent, levelling agent and grinding aid, polishing powder suspendability, dispersion performance, levelability and uniform performance and grinding efficiency are increased, polishing fluid suspends, dispersion performance is excellent, and polishing speed is high, and surface quality is good.
Description
Technical field
The present invention relates to glass polishing technical fields, in particular to a kind of glass polishing powder, polishing fluid and its system
Preparation Method, glass and electronic product.
Background technique
The glass cover-plate of the electronic products such as mobile phone, tablet computer and liquid crystal display is required to add by chemically mechanical polishing
The realization of work process is surface flattening, while improving surface smoothness.As electronic product becomes increasingly popular, market is to high-accuracy and high
The chip glass demand of surface quality is growing day by day, and the planarization and smoothness requirements to glass surface also step up, this
Higher technical requirements just are proposed to glass surface polishing.
Polishing powder directly determines the quality of finish of glass surface as important polishing material, and polishing powder is to pass through it
Mechanical lapping and chemical attack effect polish glass.Currently, polishing powder in the market mainly stresses on application performance
In how to improve polishing speed, widespread practice is to improve the grain graininess of polishing powder, by increasing the machinery in polishing process
Effect deposits to improve polishing speed and easily causes glass surface scuffing during the polishing process and polish after polishing fluid is made
Powder is easy the applied defects such as sedimentation.Simultaneously as glass material hardness is more and more harder, processing efficiency is low for general polishing fluid, is easy
It causes to scratch, glass surface poor quality after polishing, has been unable to meet demand, and China is currently used for high rigidity chip glass essence
The polishing fluid of close processing relies primarily on import, higher cost.
It is therefore desired to provide, a kind of polishing speed is high, surface quality is good, scratches few glass grinding polishing powder
And polishing fluid, it is able to solve at least one of above problem.
In view of this, the present invention is specifically proposed.
Summary of the invention
One of the objects of the present invention is to provide a kind of glass polishing powder, the ingredient of the polishing powder includes certain content
The fluorine of cerium oxide, lanthana and high level, and by control powder granularity distribution and hardness in a certain range, not only at
This is low, and performance is good, not only can guarantee the cutting rate to high rigidity glass but also can guarantee the defects of not causing surface scratching, should
Polishing powder cutting force is big, and polishing speed is high, and the glass surface after polishing is high-quality (scratch is few, and flatness is high).
The second object of the present invention is to provide a kind of glass polishing fluid, including above-mentioned glass polishing powder, and adds
Suspending agent, dispersing agent, levelling agent and grinding aid, polishing fluid also have with above-mentioned polishing powder advantage on the basis of suspend,
The excellent feature of dispersion performance, prevent process polishing powder settle and influence polishing fluid polishing speed and polishing after glass table
Face quality, further promotes polishing speed.
The third object of the present invention is to provide a kind of preparation method of glass polishing fluid, and preparation process is simple, technique
It is easy to control, preparation consumes less, is at low cost, is conducive to industrial application.
The fourth object of the present invention is to provide a kind of glass, be polished using above-mentioned glass polishing fluid or above-mentioned glass
The glass that the preparation method of liquid obtains obtains after being polished with polishing fluid, and the glass surface after polishing is high-quality, and scratch is few, flatness
It is high.
The fifth object of the present invention is to provide a kind of electronic product including above-mentioned glass.
In order to realize above-mentioned purpose of the invention, spy uses following technical scheme：
In a first aspect, providing a kind of glass polishing powder, the glass polishing powder includes the as follows of mass percent
Ingredient：Cerium oxide 50-60%, lanthana 20-30% and fluorine 10-20%；The D50 of glass polishing powder is 1.0-1.6 μm,
D90 is 2.4-2.6 μm, Mohs' hardness 7-8.
Preferably, based on the technical solution of the present invention, the glass polishing powder includes the as follows of mass percent
Ingredient：Cerium oxide 55-60%, lanthana 25-30% and fluorine 10-20%；The D50 of glass polishing powder is 1.0-1.5 μm,
D90 is 2.4-2.5 μm, Mohs' hardness 7-8；
Preferably, the glass polishing powder includes the following ingredient of mass percent：Cerium oxide 55%, lanthana 25%
With fluorine 20%；The D50 of glass polishing powder is 1.2-1.5 μm, and D90 is 2.4-2.5 μm, Mohs' hardness 8.
Preferably, based on the technical solution of the present invention, with the particle of spherical morphology in the glass polishing powder
Quantity accounts for the 75-90% of polishing powder total number of particles amount, preferably 75-85%, and further preferred 80%.
Second aspect, provides a kind of glass polishing fluid, and the glass polishing fluid includes the as follows of mass percent
Component：Glass polishing powder 50-60%, suspending agent 0.5-1%, dispersing agent 1-10%, levelling agent 1-5%, grinding aid 1-
5% and surplus water.
Preferably, based on the technical solution of the present invention, the glass polishing fluid includes the as follows of mass percent
Component：Glass polishing powder 55-60%, suspending agent 0.6-0.8%, dispersing agent 3-8%, levelling agent 2-4%, grinding aid 2-
4% and surplus water；
Preferably, the glass polishing fluid includes the following component of mass percent：Glass polishing powder 55%,
Suspending agent 0.7%, dispersing agent 5%, levelling agent 3%, grinding aid 2% and surplus water.
Preferably, based on the technical solution of the present invention, the pH value of glass polishing fluid is 7-9, preferably 8-
9, further preferably 8.
Preferably, based on the technical solution of the present invention, the suspending agent includes Inorganic suspending agent, cellulose ether suspension
One or more of agent or natural polymer and its derivative suspending agent, preferably include bentonite, diatomite, starch, gelatin,
One or more of attapulgite soil, methylcellulose, carboxymethyl cellulose or hydroxyethyl cellulose；
Preferably, the dispersing agent includes one of inorganic electrolyte, surfactant or macromolecule dispersing agent or several
Kind, preferably include sodium tripolyphosphate, calgon, sodium pyrophosphate, lauryl sodium sulfate, polyacrylamide, polyacrylic acid
One or more of sodium or polyethylene glycol 400；
Preferably, the levelling agent include organic solvent class levelling agent, acrylic compounds levelling agent, silicone levelling agent or
One or more of fluorocarbons class levelling agent preferably includes phorone, diacetone alcohol, dimethyl silicone polymer, poly- first
One of base phenyl siloxane, fluorin modified crylic acid or phosphate modified acrylic acid or at least two combination；
Preferably, the grinding aid include aluminum sulfate, calcium chloride, sodium sulphate, triethanolamine, triisopropanolamine, ethylene glycol,
One of propylene glycol, diethylene glycol, sodium acetate, detergent alkylate and polyalcohol amine or at least two combination.
The third aspect provides a kind of preparation method of glass polishing fluid, includes the following steps：
Glass polishing powder, suspending agent, dispersing agent, levelling agent, grinding aid and water are sufficiently mixed uniformly, glass use is obtained
Polishing fluid；
Preferably, the preparation method of the glass polishing fluid, includes the following steps：
(a) water and suspending agent are sufficiently mixed uniformly, obtain A；
(b) glass is added into A to be sufficiently mixed uniformly with polishing powder, stands 4-5h, obtains B；
(c) dispersing agent and levelling agent are added into B, mixes 1-2h, obtains C；
(d) grinding aid is added into C, mixes 1-2h, obtains glass polishing fluid.
Fourth aspect provides a kind of glass, using the preparation of above-mentioned glass polishing fluid or above-mentioned glass polishing fluid
The glass that method obtains obtains after being polished with polishing fluid.
5th aspect, provides a kind of electronic product, including above-mentioned glass.
Compared with the prior art, the present invention has the advantages that：
(1) composition content, granularity and its distribution and hardness of the invention by polishing powder comprehensively considers, and passes through control
Both cerium oxide and lanthana of lanthanum cerium processed system polishing powder content forms more fluorite type and six square solid solution, throws simultaneously
The fluorinated volume of light powder is high, is 10-20%, facilitates polishing powder aggregate and disintegrates at high-wearing feature and active crystal grain, together
When and glass play the role of chemical polishing, help to improve polishing speed.Furthermore the present invention by control powder granularity distribution and
Hardness in a certain range, not only can guarantee the cutting rate to high rigidity glass but also can guarantee the defects of not causing surface scratching.
Polishing powder of the invention is not only at low cost, but also cutting force is big, and polishing speed is high, and the glass surface after polishing is high-quality, scratch
Less, flatness is high, and stock removal rate and scuffing degree performance indicator is enable to balance well.
(2) glass polishing fluid of the present invention includes above-mentioned glass polishing powder, and is added to suspending agent, dispersing agent, levelling
Agent and grinding aid, polishing fluid also have suspension, dispersion performance excellent on the basis of having the characteristics that above-mentioned polishing powder advantage, prevent
Only process polishing powder settle and influence polishing fluid polishing speed and polishing after glass surface quality, in the polishing fluid of formation
Polishing powder is uniformly dispersed, stablizes, and promotes polishing speed and improves polished surface quality.Average polished rate be greater than 15 μm/
60min, for average apparent yield 75% or more, surface roughness is less than 6nm.
(3) preparation process of glass of the present invention polishing fluid is simple, technique is easy to control, preparation consumption less, at low cost, benefit
In industrial application.
Specific embodiment
Embodiment of the present invention is described in detail below in conjunction with embodiment, but those skilled in the art will
Understand, the following example is merely to illustrate the present invention, and is not construed as limiting the scope of the invention.It is not specified in embodiment specific
Condition person carries out according to conventional conditions or manufacturer's recommended conditions.Reagents or instruments used without specified manufacturer is
The conventional products that can be obtained by commercially available purchase.
According to the first aspect of the invention, provide a kind of glass polishing powder, including mass percent it is following at
Point：Cerium oxide 50-60%, lanthana 20-30% and fluorine 10-20%；The D50 of glass polishing powder is 1.0-1.6 μm, and D90 is
2.4-2.6 μm, Mohs' hardness 7-8.
Typical but non-limiting glass is, for example, that the electronics such as mobile phone, tablet computer, electronic watch or liquid crystal display produce
The hard glass such as the cover-plate glass of product.
The main component of polishing powder of the present invention is fluorine cerium lanthanum oxide, and wherein cerium-oxide contents account for the 50- of polishing powder gross mass
60wt%, lanthanum oxide content account for the 20-30wt% of polishing powder gross mass, and fluorine accounts for the 10-20wt% of polishing powder gross mass.
Typical but non-limiting cerium-oxide contents are, for example, 50wt%, 55wt% or 60wt%.
Typical but non-limiting lanthanum oxide content is, for example, 20wt%, 25wt% or 30wt%.
Typical but non-limiting fluorine content is, for example, 10wt%, 15wt% or 20wt%.
Pass through both the cerium oxide of control lanthanum cerium system polishing powder and lanthana content, cerium oxide and lanthana mutual cooperation shape
At solid solution, crystalline form becomes fluorite type and six squares, to obtain good wear intensity, and at low cost.While polishing powder
Fluorinated volume is high, is 10-20%, and fluorine makes polishing powder aggregate disintegrate into crystal grain, and crystal grain has high-wearing feature and activity, furthermore fluorine
It can play the role of chemical polishing with glass, help to improve polishing speed.
Control the particle diameter distribution of glass polishing powder：D50 is 1.0-1.6 μm, and D90 is 2.4-2.6 μm.
D represents the diameter of powder granule, and D50 indicates accumulative 50% point of diameter (or 50% pass through partial size), and D90 is indicated
Accumulative 90% point of diameter.The example of D50 is for example including 1.0 μm, 1.1 μm, 1.2 μm, 1.3 μm, 1.4 μm, 1.5 μm or 1.6 μm.
The example of D90 is for example including 2.4 μm, 2.5 μm or 2.6 μm.
The crystallite size of polishing powder and its distribution are an important factor for influencing polishing powder polishing performance.Coarse granule in polishing powder
When more, polishing speed is good with wearability, but average particle size particle size is excessive, the roughness of polished surface can be made larger, large granule
Size may also exceed gel surface thickness and generate scuffing.The average particle size of polishing powder is small when fine particle content is more, polishing speed
Rate decline, but the roughness of polished surface is smaller, when grain graininess it is meticulous to less than gel layer thicknesses when just lose wear intensity.
And as the reduction of polishing Powder Particle Size, specific surface area increase, it is many that polishing powder can show bulk effect and skin effect etc.
Different characteristics.The big cutting force of average particle size is strong, and polished surface flatness is low, and the small cutting force of average particle size is weak, polishing speed
Rate is low, and polished surface flatness is high, so that crystal grain is had suitable granularity and size distribution by control partial size D50, D90 distribution,
Epigranular, can obtain higher polishing speed and bulky grain scratches, improves polished surface flatness.
The Mohs' hardness of glass polishing powder is controlled in 7-8, Mohs' hardness is to indicate a kind of standard of hardness of mineral, also known as
Mohs hardness is pyramid spark drypoint to be drawn to the surface of tested mineral with indentation method, and measure the depth of scratch, divides ten
Grade indicates.
The hardness of polishing powder has a major impact polishing performance, and hardness is larger, is easy to produce scuffing, is unfavorable for deep processing,
Hardness is too small, causes frictional force and interfacial interaction to reduce, polishing speed reduces.
In practical applications, the key technical indexes of polishing powder is divided into two classes：One kind is that polishing powder is cut to body is polished
It cuts rate (polishing speed), one kind is polishing powder to the scuffing degree for being polished part surface, and the high product of cutting force be easy to cause scuffing,
Scratching small polishing powder, but cutting force is low, this two indexs contradiction each other balances extremely important between the two.
The present invention is comprehensively considered by composition content, granularity and its distribution to polishing powder and hardness, passes through control
Both cerium oxide and lanthana of lanthanum cerium system polishing powder content forms more fluorite type and six square solid solution, polishes simultaneously
The fluorinated volume of powder is high, is 10-20%, facilitates polishing powder aggregate and disintegrates at high-wearing feature and active crystal grain, simultaneously
Play the role of chemical polishing with glass, helps to improve polishing speed.Furthermore the present invention passes through control powder granularity distribution and hard
Degree in a certain range, not only can guarantee the cutting rate to high rigidity glass but also can guarantee the defects of not causing surface scratching.This
The polishing powder of invention is not only at low cost, but also cutting force is big, and polishing speed is high, and the glass surface after polishing is high-quality, scratch is few,
Flatness is high, and stock removal rate and scuffing degree performance indicator is enable to balance well.
The preparation process of polishing powder can be used conventional solid reaction process or the calcining precipitation method and carry out.
Preferably, the preparation method of polishing powder, includes the following steps：
(1) presoma of lanthanum cerium mischmetal polishing powder is synthesized；
(2) above-mentioned presoma is fluorinated, the additional amount for controlling fluorine accounts for the 10-20% of total amount, and is uniformly mixed；
(3) by dry and calcination, polishing powder semi-finished product is obtained, are then post-processed.
Preferably, the presoma of lanthanum cerium mischmetal polishing powder is lanthanum, the chloride of cerium, sulfate, nitrate, carbonate or oxygen
The mixture of the form composition of compound.
Preferably, carrying out the fluoride of fluorination addition to presoma is fluosilicic acid, hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, fluorine
Change one of sodium or potassium fluoride or a variety of.
Preferably, the composition after fluorination is dried to 0.5-4h, 900-1000 DEG C of calcination 4-8h at 300-550 DEG C.
Preferably, post-processing includes being crushed and classified to polishing powder semi-finished product, and auxiliary agent is then added and obtains finished product throwing
Light powder or polishing fluid.It is crushed and classified control polishing powder particle diameter distribution D50 1.0-1.6 μm, D90 2.4-2.6 μm.
In a preferred embodiment, glass polishing powder includes the following ingredient of mass percent：Cerium oxide 55-
60%, lanthana 25-30% and fluorine 10-20%；The D50 of glass polishing powder is 1.0-1.5 μm, and D90 is 2.4-2.5 μm, not
Family name's hardness is 7-8；
Preferably, glass polishing powder includes the following ingredient of mass percent：Cerium oxide 55%, lanthana 25% and fluorine
20%；The D50 of glass polishing powder is 1.2-1.5 μm, and D90 is 2.4-2.5 μm, Mohs' hardness 8.
By composition content, size distribution and the hardness of optimal control polishing powder, make that polishing powder stock removal rate is higher, scuffing degree
It is lower with surface roughness.
Preferably, glass accounts for the 75- of polishing powder total number of particles amount with the amounts of particles in polishing powder with spherical morphology
90%, preferably 75-85%, further preferred 80%.
The granule-morphology of polishing powder has great influence to polishing performance, and the particle of spherical morphology can reduce scuffing rate,
Promoted surface quality, but the particle with corner angle facilitate promoted stock removal rate, the ratio of the particle by rationally controlling spherical morphology,
It can guarantee better stock removal rate and surface quality.
According to the second aspect of the invention, provide a kind of glass polishing fluid, including mass percent such as the following group
Point：Glass polishing powder 50-60%, suspending agent 0.5-1%, dispersing agent 1-10%, levelling agent 1-5%, grinding aid 1-5% and remaining
The water of amount.
Identical to the description of glass polishing powder and the description of first aspect present invention, details are not described herein.Glass is thrown
The typical but non-limiting mass percent of light powder is, for example, 50%, 52%, 54%, 56%, 58% or 60%.
Polishing powder suspension concentration is moderate extremely important, excessively high too low all to influence polishing speed and quality.
Suspending agent it is typical but non-limiting be, for example, Inorganic suspending agent, cellulose ether suspending agent or natural polymer and its
Derivative suspending agent etc., including but not limited to bentonite, diatomite, starch, gelatin, attapulgite soil, methylcellulose, carboxylic first
Base cellulose or hydroxyethyl cellulose etc..
The typical but non-limiting mass percent of suspending agent be, for example, 0.5%, 0.6%, 0.7%, 0.8%, 0.9% or
1%.
Suspension has larger impact to polishing performance.Suspension is poor, and coagulation easily occurs for polishing powder particles, makes in polishing fluid
Grain is unevenly distributed, and is generated reunion, is caused finished surface scratch occur, influence polished surface quality, while also throw actual participation
The granule number of light is reduced, to reduce polishing speed.It is able to ascend in polishing fluid and is polished by a certain amount of suspending agent of addition
The suspension of powder.
Typical but non-limiting dispersing agent is, for example, inorganic electrolyte, surfactant or macromolecule dispersing agent etc., packet
Include but be not limited to sodium tripolyphosphate, calgon, sodium pyrophosphate, lauryl sodium sulfate, polyacrylamide, Sodium Polyacrylate
Or polyethylene glycol 400 etc..
The typical but non-limiting mass percent of dispersing agent is, for example, 1%, 2%, 3%, 4%, 5%, 6%, 7%,
8%, 9% or 10%.
The dispersion of wetting and particle of the dispersing agent to particle in liquid phase medium and the shadow of reunion are added in suspension system
Sound all play an important role, dispersing agent additional amount is very few, particle cannot in liquid phase medium stable dispersion, dispersing agent additional amount
Excessively, ionic strength is excessively high, compressed particle surface electric double layer, causes intergranular electrostatic repulsion to reduce, while excessive freedom
Macromolecular chain is also easy to happen bridging or vacancy flocculation, declines polishing slurries stability.
Typical but non-limiting levelling agent is, for example, organic solvent class levelling agent, acrylic compounds levelling agent, organic silicon
Levelling agent or fluorocarbons class levelling agent, including but not limited to phorone, diacetone alcohol, dimethyl silicone polymer, poly- methyl
Phenyl siloxane, fluorin modified crylic acid or phosphate modified acrylic acid etc..
The typical but non-limiting mass percent of levelling agent is, for example, 1%, 2%, 3%, 4% or 5%.
The surface tension that polishing fluid can be effectively reduced by the way that a certain amount of levelling agent is added improves its levelability and uniformly
Property.
Grinding aid it is typical but non-limiting be, for example, aluminum sulfate, calcium chloride, sodium sulphate, triethanolamine, triisopropanolamine,
Ethylene glycol, propylene glycol, diethylene glycol, sodium acetate, detergent alkylate or polyalcohol amine etc..
The typical but non-limiting mass percent of grinding aid is, for example, 1%, 2%, 3%, 4% or 5%.
Polishing powder crystal grain can be gradually ground or broken during the polishing process, reduced polishing action and polishing speed, passed through
A certain amount of grinding aid, which is added, can make polishing fluid remain higher polishing speed.
Water can be conventional water, be also possible to deionized water or ultrapure water etc..
The " comprising ", it is intended that it can also include other components exceptionally except described group, these other components assign institute
State the different characteristic of polishing fluid.In addition to this, " comprising " of the present invention, may be replaced by enclosed " for " or
" by ... form ".
It should be noted that surplus be water, refer in the component of polishing fluid remove glass polishing powder, suspending agent, dispersing agent,
Levelling agent, grinding aid and surplus optionally except other components are water, water and glass polishing powder, suspending agent, dispersing agent,
The sum of mass percentage of levelling agent, grinding aid and optionally other components is 100%.
Glass polishing fluid of the present invention includes above-mentioned glass polishing powder, and be added to suspending agent, dispersing agent, levelling agent and
Grinding aid, polishing fluid also have suspension, dispersion performance excellent on the basis of having the characteristics that above-mentioned polishing powder advantage, prevent from adding
Work process polishing powder settle and influence polishing fluid polishing speed and polishing after glass surface quality, polish in the polishing fluid of formation
Powder is uniformly dispersed, stablizes, and promotes polishing speed and improves polished surface quality.
In a preferred embodiment, glass polishing fluid includes the following component of mass percent：The glass
With polishing powder 55-60%, suspending agent 0.6-0.8%, dispersing agent 3-8%, levelling agent 2-4%, grinding aid 2-4% and surplus
Water；
Glass polishing fluid includes the following component of mass percent：The glass polishing powder 55%, suspending agent
0.7%, the water of dispersing agent 5%, levelling agent 3%, grinding aid 2% and surplus.
By advanced optimizing the content of polishing powder and auxiliary agent in glass polishing fluid, polishing speed can be further promoted
With improvement polished surface quality.
In a preferred embodiment, the pH value of glass polishing fluid is 7-9, preferably 8-9, further preferably
8。
The example of pH value is, for example, 7,7.5,8,8.5 or 9, and cerium oxide is amphoteric oxide, by controlling the pH of polishing fluid,
Can adjust cerium oxide form, pH value to the formation for the etching and oxidation film for being polished surface, the decomposition of polishing powder and dissolution with
And suspension stability has an impact, by the way that polishing fluid pH control in a certain range, can be promoted the form activity of polishing powder, polishing
Grain be not easy to tie again it is poly-, polishing fluid have more excellent polishing speed.
According to the third aspect of the present invention, a kind of preparation method of glass polishing fluid is provided, is included the following steps：
Glass polishing powder, suspending agent, dispersing agent, levelling agent, grinding aid and water are sufficiently mixed uniformly, glass use is obtained
Polishing fluid.
The preparation process of glass of the present invention polishing fluid is simple, technique is easy to control, and preparation consumes less, is at low cost, is conducive to
Industrial application.
In a preferred embodiment, the preparation method of glass polishing fluid, includes the following steps：
(a) water and suspending agent are sufficiently mixed uniformly, obtain A；
(b) glass is added into A to be sufficiently mixed uniformly with polishing powder, stands 4-5h, obtains B；
(c) dispersing agent and levelling agent are added into B, mixes 1-2h, obtains C；
(d) grinding aid is added into C, mixes 1-2h, obtains glass polishing fluid.
A kind of preparation method of typical glass polishing fluid, includes the following steps：
(1) water of formula ratio is added to clean reaction kettle, turn on agitator, 400~600rpm of revolving speed；
(2) it is slowly added to suspending agent to (1), stirred to uniformly mixed；
(3) it is slowly added to glass polishing powder to (2), to after mixing, stopping stirring standing 4~5h for stirring；
(4) continue to be slowly added to dispersing agent and levelling agent to (3), stir 1~2h；
(5) it finally is slowly added to grinding aid to (4), stirs 1~2h to get glass polishing fluid.
The polishing fluid good dispersion that the typical method is prepared, property are stablized.
According to the fourth aspect of the present invention, a kind of glass is provided, using above-mentioned glass polishing fluid or above-mentioned glass
It is obtained after being polished with the glass that the preparation method of polishing fluid obtains with polishing fluid.
Glass surface after polishing fluid of the present invention polishing is high-quality, average apparent yield 75% or more, scratch is few,
Flatness is high, and surface roughness is less than 6nm.
According to the fifth aspect of the present invention, a kind of electronic product, including above-mentioned glass are provided.
Typical but non-limiting electronic product is, for example, mobile phone, tablet computer, electronic watch or liquid crystal display etc..
Equipment has advantage identical with above-mentioned glass, details are not described herein due to using glass of the invention.
The present invention is further illustrated below by specific embodiment and comparative example, it should be understood, however, that, these implementations
Example, which is only for being described in more detail, to be used, and but should not be understood as present invention is limited in any form.It is of the present invention
Each raw material can pass through commercially available acquisition.
Embodiment 1
A kind of glass polishing powder, the following ingredient including mass percent：Cerium oxide 50%, lanthana 30% and fluorine
20%.Wherein, the D50 of glass polishing powder is 1.04 μm, and D90 is 2.4 μm, Mohs' hardness 7.Have in glass polishing powder
The amounts of particles of spherical morphology accounts for the 50% of polishing powder total number of particles amount.
Embodiment 2
A kind of glass polishing powder, the following ingredient including mass percent：Cerium oxide 55%, lanthana 25% and fluorine
20%.Wherein, the D50 of glass polishing powder is 1.5 μm, and D90 is 2.4 μm, Mohs' hardness 7.Have in glass polishing powder
The amounts of particles of spherical morphology accounts for the 50% of polishing powder total number of particles amount.
Embodiment 3
A kind of glass polishing powder, the following ingredient including mass percent：Cerium oxide 60%, lanthana 30% and fluorine
10%.Wherein, the D50 of glass polishing powder is 1.3 μm, and D90 is 2.6 μm, Mohs' hardness 8.Have in glass polishing powder
The amounts of particles of spherical morphology accounts for the 50% of polishing powder total number of particles amount.
Embodiment 4
A kind of glass polishing powder, the following ingredient including mass percent：Cerium oxide 53%, lanthana 27% and fluorine
20%.Wherein, the D50 of glass polishing powder is 1.0 μm, and D90 is 2.4 μm, Mohs' hardness 7.Have in glass polishing powder
The amounts of particles of spherical morphology accounts for the 50% of polishing powder total number of particles amount.
Embodiment 5
A kind of glass polishing powder, the following ingredient including mass percent：Cerium oxide 58%, lanthana 22% and fluorine
20%.Wherein, the D50 of glass polishing powder is 1.6 μm, and D90 is 2.6 μm, Mohs' hardness 8.Have in glass polishing powder
The amounts of particles of spherical morphology accounts for the 50% of polishing powder total number of particles amount.
Embodiment 6
The present embodiment the difference from embodiment 1 is that, glass accounts for throwing with the amounts of particles of spherical morphology in polishing powder
The 80% of light powder particles total quantity.
Comparative example 1
The present embodiment the difference from embodiment 1 is that, glass polishing powder includes the following ingredient of mass percent：Oxidation
Cerium 70%, lanthana 26.5% and fluorine 3.5%.
Comparative example 2
The present embodiment the difference from embodiment 1 is that, glass polishing powder includes the following ingredient of mass percent：Oxidation
Cerium 30%, lanthana 40% and fluorine 30%.
Comparative example 3
The present embodiment the difference from embodiment 1 is that, the D90 of glass polishing powder is 1.92 μm.
Comparative example 4
The present embodiment the difference from embodiment 1 is that, the Mohs' hardness of glass polishing powder is 6.
Comparative example 5
The present embodiment the difference from embodiment 1 is that, the Mohs' hardness of glass polishing powder is 9.
Test example 1
By the polishing powder of embodiment 1-6 and comparative example 1-5 according to water 1:Polishing fluid is made in 1 ratio (mass ratio),
It is tested as follows：
Every set product (at least 1000pcs mobile phone faceplate glass) is polished respectively, is polished automatic in UNIPOL-1202
It is carried out on precise grinding polisher (Shenyang Kejing Automatic Equipment Co., Ltd), polishing pad material is cellular polyurethane, polishing
Parameter is polishing pad rate 120rpm, pressure 138N/cm2, gob speed 2mL/min, polishing time 60min, by with spiral
Mircrometer gauge measurement polishing front and back thickness of glass is poor, and erosion amount is thrown in metering, and is converted into the thickness of cutting of unit time, is come with this
It characterizes polishing speed (MRR, nm/min), calculation formula is MRR=Δ H/t, wherein Δ H is that the thickness of polishing front and back glass becomes
Change, t is polishing time.And with JSM-6700F field emission scanning electron microscope (Japan Electronics Corporation) to polishing front and back glass
Section is characterized, flatness variation before and after observation glass polishing.Glass substrate ultrasonic cleaning after polishing, then dry
It is analyzed after drying in dry case.Surface roughness refer to finished surface have smaller spacing and small peak valley unevenness, two
The distance between wave crest or two troughs (pitch of waves) very little (in 1mm or less), is with the naked eye nondescript, thus it belong to it is microcosmic
Error in geometrical form, Ra are mean roughness, and the assessment parameters of usual polished surface roughness use profile arithmetic average error,
It is tested using the JB-4C type precision roughness tester of German Huo Meier Co., Ltd.Average apparent yield：People's naked eyes are seen
Glass appearance is examined, no scuffing defect is non-defective unit, and non-defective unit number/check number is average apparent yield.
The results are shown in Table 1.
Table 1
As can be seen from Table 1, glass of the present invention polishing powder liquid suspension, dispersion performance are excellent, throw in the polishing fluid of formation
Light powder is uniformly dispersed, stablizes, and high using the polishing speed of polishing fluid, the surface quality of glass is good after polishing, average polished rate
Greater than 10 μm/60min, for the average apparent yield of glass 68% or more, surface roughness is less than 8nm after polishing.
Embodiment 6 increases the spherical morphology particle accounting of polishing powder, while guaranteeing good stock removal rate, can obtain
Better surface quality.
1 polishing powder cerium-oxide contents of comparative example are more, and at high cost, polishing speed is not high.And 2 polishing powder cerium oxide of comparative example contains
Amount is few, although at low cost, lanthanum oxide content and fluorine content fluorine content are excessive, polishing fluid polishing speed decline obtained.As it can be seen that
The present invention is by both the cerium oxide of control polishing powder and lanthanas content, and fluorinated volume is increased to particular range, is dropping
Good polishing effect is kept while inexpensive.
3 polishing powder particle diameter distribution D 90 of comparative example is distinguished with embodiment 1, and obtained polishing fluid polishing speed is not so good as embodiment
1 is high, it is seen then that control D90 distribution makes crystal grain have suitable granularity and size distribution, could obtain more preferably polishing performance.
4 polishing powder hardness of comparative example is small, and polishing speed reduces.5 polishing powder hardness of comparative example is big, is easy to produce scuffing, makes
Decline at yield.
As it can be seen that polishing powder of the invention is not only at low cost, but also cutting force is big, and polishing speed is high, the glass table after polishing
Face is high-quality, and scratch is few, flatness is high, and stock removal rate and scuffing degree performance indicator is enable to balance well.
Embodiment 7
A kind of glass polishing fluid, the following component including mass percent：The glass of embodiment 1 polishing powder 50%,
Bentonite 0.5%, calgon 1%, phosphate modified acrylic acid 1%, sodium sulphate 1% and water 46.5%.Glass polishing
The pH value of liquid is 7.
The preparation method of glass polishing fluid, includes the following steps：
(1) water of formula ratio is added to clean reaction kettle, turn on agitator, revolving speed 400rpm；
(2) it is slowly added to bentonite to (1), stirred to uniformly mixed；
(3) it is slowly added to glass polishing powder to (2), to after mixing, stopping stirring standing 4~5h for stirring；
(4) continue to be slowly added to calgon and phosphate modified acrylic acid to (3), stir 1h；
(5) it finally is slowly added to sodium sulphate to (4), stirs 2h, adjusted pH, obtain glass polishing fluid.
Embodiment 8
A kind of glass polishing fluid, the following component including mass percent：The glass of embodiment 2 polishing powder 52%,
Starch 0.6%, lauryl sodium sulfate 3%, fluorin modified crylic acid 2%, triethanolamine 2% and water 40.4%.Glass polishing
The pH value of liquid is 7.
The preparation method of glass polishing fluid, includes the following steps：
(1) water of formula ratio is added to clean reaction kettle, turn on agitator, revolving speed 500rpm；
(2) it is slowly added to starch to (1), stirred to uniformly mixed；
(3) it is slowly added to glass polishing powder to (2), to after mixing, stopping stirring standing 4~5h for stirring；
(4) continue to be slowly added to lauryl sodium sulfate and fluorin modified crylic acid to (3), stir 2h；
(5) it finally is slowly added to triethanolamine to (4), stirs 2h, adjusted pH, obtain glass polishing fluid.
Embodiment 9
A kind of glass polishing fluid, the following component including mass percent：The glass of embodiment 3 polishing powder 55%,
Gelatin 0.8%, polyacrylamide 5%, polymethylphenylsiloxane 3%, ethylene glycol 3% and water 33.2%.Glass polishing fluid
PH value be 7.
The preparation method of glass polishing fluid, includes the following steps：
(1) water of formula ratio is added to clean reaction kettle, turn on agitator, revolving speed 600rpm；
(2) it is slowly added to gelatin to (1), stirred to uniformly mixed；
(3) it is slowly added to glass polishing powder to (2), to after mixing, stopping stirring standing 4~5h for stirring；
(4) continue to be slowly added to polyacrylamide and polymethylphenylsiloxane to (3), stir 2h；
(5) it finally is slowly added to ethylene glycol to (4), stirs 1h, adjusted pH, obtain glass polishing fluid.
Embodiment 10
A kind of glass polishing fluid, the following component including mass percent：The glass of embodiment 4 polishing powder 58%,
Methylcellulose 0.9%, Sodium Polyacrylate 8%, diacetone alcohol 4%, sodium acetate 4% and water 25.1%.Glass polishing fluid
PH value is 7.
The preparation method of glass polishing fluid, includes the following steps：
(1) water of formula ratio is added to clean reaction kettle, turn on agitator, revolving speed 600rpm；
(2) it is slowly added to methylcellulose to (1), stirred to uniformly mixed；
(3) it is slowly added to glass polishing powder to (2), to after mixing, stopping stirring standing 4~5h for stirring；
(4) continue to be slowly added to Sodium Polyacrylate and diacetone alcohol to (3), stir 1h；
(5) it finally is slowly added to sodium acetate to (4), stirs 2h, adjusted pH, obtain glass polishing fluid.
Embodiment 11
A kind of glass polishing fluid, the following component including mass percent：The glass of embodiment 5 polishing powder 60%,
Carboxymethyl cellulose 1%, polyethylene glycol 400 10%, phorone 5%, detergent alkylate 5% and water 19%.Glass polishing fluid
PH value be 7.
The preparation method of glass polishing fluid, includes the following steps：
(1) water of formula ratio is added to clean reaction kettle, turn on agitator, revolving speed 500rpm；
(2) it is slowly added to carboxymethyl cellulose to (1), stirred to uniformly mixed；
(3) it is slowly added to glass polishing powder to (2), to after mixing, stopping stirring standing 4~5h for stirring；
(4) continue to be slowly added to polyethylene glycol 400 and phorone to (3), stir 1h；
(5) it finally is slowly added to detergent alkylate to (4), stirs 1h, adjusted pH, obtain glass polishing fluid.
Embodiment 12
The present embodiment and the difference of embodiment 7 are that the pH value for adjusting glass polishing fluid is 8.
Comparative example 6
The difference of this comparative example and embodiment 7 is that the group of glass polishing fluid is divided into：The glass of embodiment 1 polishes
Powder 50%, calgon 1%, phosphate modified acrylic acid 1%, sodium sulphate 1% and water 47%.
Comparative example 7
The difference of this comparative example and embodiment 7 is that the group of glass polishing fluid is divided into：The glass of embodiment 1 polishes
Powder 50%, bentonite 0.5%, phosphate modified acrylic acid 1%, sodium sulphate 1% and water 47.5%.
Comparative example 8
The difference of this comparative example and embodiment 7 is that the group of glass polishing fluid is divided into：The glass of embodiment 1 polishes
Powder 50%, bentonite 0.5%, calgon 1%, phosphate modified acrylic acid 1% and water 47.5%.
Comparative example 9
The difference of this comparative example and embodiment 7 is that the group of glass polishing fluid is divided into：The glass of embodiment 1 polishes
Powder 50%, bentonite 2%, calgon 0.5%, phosphate modified acrylic acid 1%, sodium sulphate 0.5% and water 46%.
Test example 2
The polishing fluid that embodiment 7-12 and comparative example 6-9 are obtained is tested according to method identical with test example 1,
The results are shown in Table 2.
Table 2
As can be seen from Table 2, suspending agent, dispersing agent, levelling agent and grinding aid, the polishing fluid of acquisition are added in polishing fluid
Middle polishing powder is uniformly dispersed, stablizes, and further improves polishing speed and improves polished surface quality, average polished rate is greater than
15 μm/60min, for the average apparent yield of glass 75% or more, surface roughness is less than 6nm after polishing.
The pH of polishing fluid is transferred to 8 by embodiment 12, and the polishing speed of polishing fluid is more preferable than embodiment 7, it is seen that by that will throw
Light liquid pH is controlled in a certain range, can further promote the polishing performance of polishing fluid.
Comparative example 6-8 can be seen that suspending agent, dispersing agent and grinding aid to the polishing speed of polishing fluid and surface quality
It plays a key effect.The adding proportion of 9 suspending agent of comparative example, dispersing agent and grinding aid is different from the present invention, the polishing of polishing fluid
Performance can not obtain preferable level.
Although illustrate and describing the present invention with specific embodiment, it will be appreciated that without departing substantially from of the invention
Many other change and modification can be made in the case where spirit and scope.It is, therefore, intended that wrapping in the following claims
Include all such changes and modifications belonged in the scope of the invention.
Claims (10)
1. a kind of glass polishing powder, which is characterized in that the glass polishing powder includes the following ingredient of mass percent：Oxygen
Change cerium 50-60%, lanthana 20-30% and fluorine 10-20%；The D50 of glass polishing powder is 1.0-1.6 μm, and D90 is
2.4-2.6 μm, Mohs' hardness 7-8.
2. glass polishing powder described in accordance with the claim 1, which is characterized in that the glass polishing powder includes quality percentage
The following ingredient of ratio：Cerium oxide 55-60%, lanthana 25-30% and fluorine 10-20%；The D50 of glass polishing powder is
1.0-1.5 μm, D90 is 2.4-2.5 μm, Mohs' hardness 7-8；
Preferably, the glass polishing powder includes the following ingredient of mass percent：Cerium oxide 55%, lanthana 25% and fluorine
20%；The D50 of glass polishing powder is 1.2-1.5 μm, and D90 is 2.4-2.5 μm, Mohs' hardness 8.
3. glass polishing powder according to claim 1 or 2, which is characterized in that have ball in the glass polishing powder
The amounts of particles of shape pattern accounts for the 75-90% of polishing powder total number of particles amount, preferably 75-85%, and further preferred 80%.
4. a kind of glass polishing fluid, which is characterized in that the glass polishing fluid includes the following component of mass percent：Power
Benefit requires the described in any item glass polishing powder 50-60% of 1-3, suspending agent 0.5-1%, dispersing agent 1-10%, levelling agent 1-
5%, the water of grinding aid 1-5% and surplus.
5. glass polishing fluid according to claim 4, which is characterized in that the glass polishing fluid includes quality percentage
The following component of ratio：Glass polishing powder 55-60%, suspending agent 0.6-0.8%, dispersing agent 3-8%, levelling agent 2-4%,
The water of grinding aid 2-4% and surplus；
Preferably, the glass polishing fluid includes the following component of mass percent：Glass polishing powder 55% suspends
Agent 0.7%, dispersing agent 5%, levelling agent 3%, grinding aid 2% and surplus water.
6. glass polishing fluid according to claim 4, which is characterized in that the pH value of glass polishing fluid is 7-9,
Preferably 8-9, further preferably 8.
7. according to the described in any item glass polishing fluids of claim 4-6, which is characterized in that the suspending agent includes inorganic outstanding
Floating agent, cellulose ether suspending agent or one or more of natural polymer and its derivative suspending agent, preferably include bentonite,
One of diatomite, starch, gelatin, attapulgite soil, methylcellulose, carboxymethyl cellulose or hydroxyethyl cellulose are several
Kind；
Preferably, the dispersing agent includes one or more of inorganic electrolyte, surfactant or macromolecule dispersing agent, excellent
Choosing includes sodium tripolyphosphate, calgon, sodium pyrophosphate, lauryl sodium sulfate, polyacrylamide, Sodium Polyacrylate or poly-
One or more of ethylene glycol 400；
Preferably, the levelling agent includes organic solvent class levelling agent, acrylic compounds levelling agent, silicone levelling agent or fluorine carbon
One or more of compounds levelling agent preferably includes phorone, diacetone alcohol, dimethyl silicone polymer, polymethyl-benzene
One of radical siloxane, fluorin modified crylic acid or phosphate modified acrylic acid or at least two combination；
Preferably, the grinding aid includes aluminum sulfate, calcium chloride, sodium sulphate, triethanolamine, triisopropanolamine, ethylene glycol, the third two
One of alcohol, diethylene glycol, sodium acetate, detergent alkylate and polyalcohol amine or at least two combination.
8. a kind of preparation method of the described in any item glass polishing fluids of claim 4-7, which is characterized in that including following step
Suddenly：
Glass polishing powder, suspending agent, dispersing agent, levelling agent, grinding aid and water are sufficiently mixed uniformly, glass polishing is obtained
Liquid；
Preferably, the preparation method of the glass polishing fluid, includes the following steps：
(a) water and suspending agent are sufficiently mixed uniformly, obtain A；
(b) glass is added into A to be sufficiently mixed uniformly with polishing powder, stands 4-5h, obtains B；
(c) dispersing agent and levelling agent are added into B, mixes 1-2h, obtains C；
(d) grinding aid is added into C, mixes 1-2h, obtains glass polishing fluid.
9. a kind of glass, which is characterized in that use the described in any item glass polishing fluids of claim 4-7 or claim 8
The glass that the preparation method of glass polishing fluid obtains obtains after being polished with polishing fluid.
10. a kind of electronic product, which is characterized in that including glass as claimed in claim 9.
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| CN116970343A (en) * | 2023-08-02 | 2023-10-31 | 包头天骄清美稀土抛光粉有限公司 | Rare earth polishing solution for polishing curved glass cover plate and preparation method and application thereof |
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Application publication date: 20181123 |