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AU2001232248A1 - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
AU2001232248A1
AU2001232248A1 AU2001232248A AU3224801A AU2001232248A1 AU 2001232248 A1 AU2001232248 A1 AU 2001232248A1 AU 2001232248 A AU2001232248 A AU 2001232248A AU 3224801 A AU3224801 A AU 3224801A AU 2001232248 A1 AU2001232248 A1 AU 2001232248A1
Authority
AU
Australia
Prior art keywords
integrated circuit
semiconductor integrated
circuit device
semiconductor
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001232248A
Inventor
Masakazu Aoki
Koichiro Ishibashi
Junichi Nishimoto
Shoji Syukuri
Masanao Yamaoka
Kazumasa Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of AU2001232248A1 publication Critical patent/AU2001232248A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0441Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B28/00Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements
    • C04B28/02Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements containing hydraulic cements other than calcium sulfates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/04Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
    • G11C29/08Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
    • G11C29/12Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/70Masking faults in memories by using spares or by reconfiguring
    • G11C29/78Masking faults in memories by using spares or by reconfiguring using programmable devices
    • G11C29/785Masking faults in memories by using spares or by reconfiguring using programmable devices with redundancy programming schemes
    • G11C29/789Masking faults in memories by using spares or by reconfiguring using programmable devices with redundancy programming schemes using non-volatile cells or latches
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/70Masking faults in memories by using spares or by reconfiguring
    • G11C29/78Masking faults in memories by using spares or by reconfiguring using programmable devices
    • G11C29/84Masking faults in memories by using spares or by reconfiguring using programmable devices with improved access time or stability
    • G11C29/848Masking faults in memories by using spares or by reconfiguring using programmable devices with improved access time or stability by adjacent switching
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    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/22Connection or disconnection of sub-entities or redundant parts of a device in response to a measurement
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    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0207Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
    • H01L27/0211Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique adapted for requirements of temperature
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    • C04B2103/00Function or property of ingredients for mortars, concrete or artificial stone
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    • C04B2103/0097Anion- and far-infrared-emitting materials
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    • C04B2111/00017Aspects relating to the protection of the environment
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    • C04B2111/00439Physico-chemical properties of the materials not provided for elsewhere in C04B2111/00
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    • C04B2111/00482Coating or impregnation materials
    • C04B2111/00517Coating or impregnation materials for masonry
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    • C04B2111/00Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/20Resistance against chemical, physical or biological attack
    • C04B2111/2092Resistance against biological degradation
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2216/00Indexing scheme relating to G11C16/00 and subgroups, for features not directly covered by these groups
    • G11C2216/02Structural aspects of erasable programmable read-only memories
    • G11C2216/10Floating gate memory cells with a single polysilicon layer
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    • H01L2223/54433Marks applied to semiconductor devices or parts containing identification or tracking information
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    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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    • H01L2224/4912Layout
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    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
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    • H01L23/53209Conductive materials based on metals, e.g. alloys, metal silicides
    • H01L23/53228Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being copper
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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
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  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • For Increasing The Reliability Of Semiconductor Memories (AREA)
  • Semiconductor Memories (AREA)
  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
AU2001232248A 2000-02-10 2001-02-08 Semiconductor integrated circuit device Abandoned AU2001232248A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000038167A JP4191355B2 (en) 2000-02-10 2000-02-10 Semiconductor integrated circuit device
JP2000-038167 2000-02-10
PCT/JP2001/000887 WO2001059789A1 (en) 2000-02-10 2001-02-08 Semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
AU2001232248A1 true AU2001232248A1 (en) 2001-08-20

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AU2001232248A Abandoned AU2001232248A1 (en) 2000-02-10 2001-02-08 Semiconductor integrated circuit device

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US (3) US6611458B2 (en)
EP (1) EP1262996B1 (en)
JP (1) JP4191355B2 (en)
KR (2) KR100817343B1 (en)
CN (2) CN100590739C (en)
AU (1) AU2001232248A1 (en)
DE (1) DE60143643D1 (en)
TW (1) TW506135B (en)
WO (1) WO2001059789A1 (en)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1042853A2 (en) * 1997-11-28 2000-10-11 Abb Ab Method and device for controlling the magnetic flux with an auxiliary winding in a rotating high voltage electric alternating current machine
US6829737B1 (en) * 2000-08-30 2004-12-07 Micron Technology, Inc. Method and system for storing device test information on a semiconductor device using on-device logic for determination of test results
JP4043703B2 (en) * 2000-09-04 2008-02-06 株式会社ルネサステクノロジ Semiconductor device, microcomputer, and flash memory
DE10120670B4 (en) * 2001-04-27 2008-08-21 Qimonda Ag Method for repairing hardware faults in memory chips
US7075829B2 (en) * 2001-08-30 2006-07-11 Micron Technology, Inc. Programmable memory address and decode circuits with low tunnel barrier interpoly insulators
US7476925B2 (en) * 2001-08-30 2009-01-13 Micron Technology, Inc. Atomic layer deposition of metal oxide and/or low asymmetrical tunnel barrier interploy insulators
US7087954B2 (en) * 2001-08-30 2006-08-08 Micron Technology, Inc. In service programmable logic arrays with low tunnel barrier interpoly insulators
US6754108B2 (en) * 2001-08-30 2004-06-22 Micron Technology, Inc. DRAM cells with repressed floating gate memory, low tunnel barrier interpoly insulators
US6963103B2 (en) * 2001-08-30 2005-11-08 Micron Technology, Inc. SRAM cells with repressed floating gate memory, low tunnel barrier interpoly insulators
US7135734B2 (en) * 2001-08-30 2006-11-14 Micron Technology, Inc. Graded composition metal oxide tunnel barrier interpoly insulators
JP3821697B2 (en) 2001-12-07 2006-09-13 エルピーダメモリ株式会社 Method for verifying semiconductor integrated circuit device and semiconductor integrated circuit device
US6943575B2 (en) * 2002-07-29 2005-09-13 Micron Technology, Inc. Method, circuit and system for determining burn-in reliability from wafer level burn-in
JP2004079138A (en) * 2002-08-22 2004-03-11 Renesas Technology Corp Nonvolatile semiconductor memory device
DE60306488D1 (en) * 2003-02-27 2006-08-10 St Microelectronics Srl Built-in test procedure in a flash memory
JP4108519B2 (en) * 2003-03-31 2008-06-25 エルピーダメモリ株式会社 Control circuit, semiconductor memory device, and control method
JP4314085B2 (en) * 2003-09-08 2009-08-12 パナソニック株式会社 Nonvolatile semiconductor memory device
KR100586841B1 (en) * 2003-12-15 2006-06-07 삼성전자주식회사 Method for controlling Variable Delay and Circuit for the same
JP4130634B2 (en) 2004-01-20 2008-08-06 松下電器産業株式会社 Semiconductor device
JP4124743B2 (en) 2004-01-21 2008-07-23 株式会社ルネサステクノロジ Phase change memory
JP2005327337A (en) * 2004-05-12 2005-11-24 Matsushita Electric Ind Co Ltd Semiconductor memory device
KR100591764B1 (en) * 2004-05-18 2006-06-22 삼성전자주식회사 Semiconductor memory device with signal lines wired across cell array
US7102371B1 (en) * 2004-05-19 2006-09-05 National Semiconductor Corporation Bilevel probe
KR100634439B1 (en) * 2004-10-26 2006-10-16 삼성전자주식회사 Fuse_free circuit, fuse_free semiconductor ic and non_volatile memory device, and fuse_free method
US7373573B2 (en) 2005-06-06 2008-05-13 International Business Machines Corporation Apparatus and method for using a single bank of eFuses to successively store testing data from multiple stages of testing
US7927948B2 (en) 2005-07-20 2011-04-19 Micron Technology, Inc. Devices with nanocrystals and methods of formation
US8110469B2 (en) 2005-08-30 2012-02-07 Micron Technology, Inc. Graded dielectric layers
JP2007172690A (en) * 2005-12-19 2007-07-05 Fujitsu Ltd Memory redundancy selection device, memory system, information processor, and redundancy selection method for memory cell
JP4764723B2 (en) * 2006-01-10 2011-09-07 ルネサスエレクトロニクス株式会社 Manufacturing method of semiconductor device
JP4675813B2 (en) 2006-03-31 2011-04-27 Okiセミコンダクタ株式会社 Semiconductor memory device and manufacturing method thereof
JP2008181634A (en) * 2006-12-26 2008-08-07 Semiconductor Energy Lab Co Ltd Semiconductor device
US8055982B2 (en) * 2007-02-21 2011-11-08 Sigmatel, Inc. Error correction system and method
KR100843243B1 (en) * 2007-04-18 2008-07-02 삼성전자주식회사 Semiconductor memory device capable of optimizing signal transmission power and power initializing method thereof
KR100888885B1 (en) * 2007-04-19 2009-03-17 삼성전자주식회사 Lead frame and semiconductor apparatus having the same
JP2008300575A (en) 2007-05-30 2008-12-11 Oki Electric Ind Co Ltd Semiconductor memory device, and manufacturing method thereof
JP2009070943A (en) 2007-09-12 2009-04-02 Oki Semiconductor Co Ltd Semiconductor memory and manufacturing method thereof
KR100933839B1 (en) * 2008-03-10 2009-12-24 주식회사 하이닉스반도체 Nonvolatile Memory Device and Operation Method
JP2009239161A (en) * 2008-03-28 2009-10-15 Genusion Inc Nonvolatile semiconductor memory device and usage method thereof
KR100998945B1 (en) * 2008-09-05 2010-12-09 주식회사 하이닉스반도체 Method for fabricating non-volatile memory device
DE102008063429B4 (en) * 2008-12-31 2015-03-26 Globalfoundries Dresden Module One Limited Liability Company & Co. Kg Setting the configuration of a multi-gate transistor by controlling individual lands
BR112013028972A2 (en) 2011-05-12 2017-02-07 Olive Medical Corp pixel frame area optimization using a stacking scheme for a hybrid image sensor with minimal vertical interconnect elements
EP2877079B1 (en) 2012-07-26 2021-04-21 DePuy Synthes Products, Inc. Camera system with minimal area monolithic cmos image sensor
CN107760646A (en) * 2012-09-04 2018-03-06 人类起源公司 Organize production method
KR102044827B1 (en) * 2012-10-17 2019-11-15 삼성전자주식회사 Data loading circuit and semiconductor memory device including the same
BR112015023206A2 (en) 2013-03-15 2017-08-22 Olive Medical Corp IMAGE SENSOR SYNCHRONIZATION WITHOUT INPUT TIMER AND DATA TRANSMISSION TIMER
EP2967286B1 (en) * 2013-03-15 2021-06-23 DePuy Synthes Products, Inc. Minimize image sensor i/o and conductor counts in endoscope applications
US9270174B2 (en) * 2013-05-12 2016-02-23 Freescale Semiconductor, Inc. Integrated circuit power management module
CN104409104B (en) * 2014-10-30 2018-02-06 上海华虹宏力半导体制造有限公司 The verification method of chip-stored unit scrambler address
CN104616698A (en) * 2015-01-28 2015-05-13 山东华翼微电子技术股份有限公司 Method for sufficiently utilizing memory redundancy unit
JP6097775B2 (en) * 2015-02-16 2017-03-15 力晶科技股▲ふん▼有限公司 Semiconductor memory device and semiconductor integrated circuit device
US9343156B1 (en) * 2015-06-25 2016-05-17 Sandisk Technologies Inc. Balancing programming speeds of memory cells in a 3D stacked memory
WO2019203019A1 (en) * 2018-04-19 2019-10-24 ソニーセミコンダクタソリューションズ株式会社 Non-volatile storage circuit
KR20210145413A (en) * 2020-05-25 2021-12-02 에스케이하이닉스 주식회사 Memory device

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60201599A (en) 1984-03-26 1985-10-12 Hitachi Ltd Semiconductor integrated circuit device
JPS61123100A (en) * 1984-11-20 1986-06-10 Fujitsu Ltd Semiconductor memory device
EP0225960B1 (en) * 1985-12-07 1991-03-20 Deutsche ITT Industries GmbH Cmos inverter chain
US4794597A (en) * 1986-03-28 1988-12-27 Mitsubishi Denki Kabushiki Kaisha Memory device equipped with a RAS circuit
US5089433A (en) * 1988-08-08 1992-02-18 National Semiconductor Corporation Bipolar field-effect electrically erasable programmable read only memory cell and method of manufacture
EP0420401B1 (en) * 1989-07-31 1994-06-01 Masakazu Osawa Reducing the wave-making resistance of a ship
GB8926004D0 (en) * 1989-11-17 1990-01-10 Inmos Ltd Repairable memory circuit
JPH03179780A (en) * 1989-12-07 1991-08-05 Fujitsu Ltd Semiconductor device
KR920005798A (en) * 1990-04-18 1992-04-03 미타 가쓰시게 Semiconductor integrated circuit
JP3083547B2 (en) * 1990-07-12 2000-09-04 株式会社日立製作所 Semiconductor integrated circuit device
JPH05114300A (en) * 1991-05-21 1993-05-07 Citizen Watch Co Ltd Semiconductor memory device
US5278439A (en) * 1991-08-29 1994-01-11 Ma Yueh Y Self-aligned dual-bit split gate (DSG) flash EEPROM cell
JPH05298898A (en) * 1992-04-14 1993-11-12 Toshiba Corp Nonvolatile semiconductor memory
JPH05314789A (en) 1992-05-14 1993-11-26 Fujitsu Ltd Redundant address storage circuit
JP2596695B2 (en) 1993-05-07 1997-04-02 インターナショナル・ビジネス・マシーンズ・コーポレイション EEPROM
JP3212421B2 (en) 1993-09-20 2001-09-25 富士通株式会社 Nonvolatile semiconductor memory device
US5466231A (en) * 1993-11-04 1995-11-14 Merocel Corporation Laminated sponge device
JPH07287994A (en) 1994-04-19 1995-10-31 Mitsubishi Electric Corp Semiconductor memory and its manufacturing method
KR0126101B1 (en) * 1994-07-07 1997-12-26 김주용 Forming method of repair mask
KR0161399B1 (en) * 1995-03-13 1998-12-01 김광호 Non-volatile memory device & method of making thereof
US5765544A (en) * 1995-06-05 1998-06-16 Vigansky, Jr.; Charles E. Flow-through humidifier for mobile home furnace
US6166293A (en) * 1996-07-18 2000-12-26 The Salk Institute For Biological Studies Method of increasing growth and yield in plants
JPH10149694A (en) * 1996-11-19 1998-06-02 Toshiba Microelectron Corp Semiconductor memory and data rewriting circuit
US5949703A (en) * 1996-12-26 1999-09-07 Kabushiki Kaisha Toshiba Semiconductor memory device in which data in programmable ROM can be apparently rewritten
JP3519583B2 (en) 1997-09-19 2004-04-19 株式会社東芝 Nonvolatile semiconductor memory device and method of manufacturing the same
US6005270A (en) * 1997-11-10 1999-12-21 Sony Corporation Semiconductor nonvolatile memory device and method of production of same
JPH11197652A (en) 1998-01-06 1999-07-27 Sanden Corp Water purifying and sterilizing apparatus
JP2000123591A (en) * 1998-10-16 2000-04-28 Fujitsu Ltd Non-volatile semiconductor memory
KR100686681B1 (en) * 1999-02-01 2007-02-27 가부시키가이샤 히타치세이사쿠쇼 Semiconductor integrated circuit and nonvolatile memory element

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