ATE503209T1 - Herstellungsprozesse für substrate mit mehreren tiefen - Google Patents
Herstellungsprozesse für substrate mit mehreren tiefenInfo
- Publication number
- ATE503209T1 ATE503209T1 AT01932865T AT01932865T ATE503209T1 AT E503209 T1 ATE503209 T1 AT E503209T1 AT 01932865 T AT01932865 T AT 01932865T AT 01932865 T AT01932865 T AT 01932865T AT E503209 T1 ATE503209 T1 AT E503209T1
- Authority
- AT
- Austria
- Prior art keywords
- selected regions
- resist layer
- substrates
- manufacturing processes
- multiple depth
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00428—Etch mask forming processes not provided for in groups B81C1/00396 - B81C1/0042
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US20150400P | 2000-05-03 | 2000-05-03 | |
PCT/US2001/014125 WO2001084242A1 (en) | 2000-05-03 | 2001-05-01 | Multi depth substrate fabrication processes |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE503209T1 true ATE503209T1 (de) | 2011-04-15 |
Family
ID=22746084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01932865T ATE503209T1 (de) | 2000-05-03 | 2001-05-01 | Herstellungsprozesse für substrate mit mehreren tiefen |
Country Status (7)
Country | Link |
---|---|
US (1) | US6569607B2 (de) |
EP (1) | EP1279071B1 (de) |
AT (1) | ATE503209T1 (de) |
AU (2) | AU2001259355B2 (de) |
CA (1) | CA2406063A1 (de) |
DE (1) | DE60144278D1 (de) |
WO (1) | WO2001084242A1 (de) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6048734A (en) | 1995-09-15 | 2000-04-11 | The Regents Of The University Of Michigan | Thermal microvalves in a fluid flow method |
WO2001098199A1 (fr) * | 2000-06-20 | 2001-12-27 | Kawamura Institute Of Chemical Research | Microdispositif a structure multicouche et son procede de fabrication |
US6692700B2 (en) | 2001-02-14 | 2004-02-17 | Handylab, Inc. | Heat-reduction methods and systems related to microfluidic devices |
US6852287B2 (en) | 2001-09-12 | 2005-02-08 | Handylab, Inc. | Microfluidic devices having a reduced number of input and output connections |
US7829025B2 (en) | 2001-03-28 | 2010-11-09 | Venture Lending & Leasing Iv, Inc. | Systems and methods for thermal actuation of microfluidic devices |
US8895311B1 (en) | 2001-03-28 | 2014-11-25 | Handylab, Inc. | Methods and systems for control of general purpose microfluidic devices |
US7323140B2 (en) | 2001-03-28 | 2008-01-29 | Handylab, Inc. | Moving microdroplets in a microfluidic device |
US7010391B2 (en) | 2001-03-28 | 2006-03-07 | Handylab, Inc. | Methods and systems for control of microfluidic devices |
US20030232450A1 (en) * | 2002-06-13 | 2003-12-18 | Yoshikazu Yoshida | Microfluidic device and method for producing the same |
EP2402089A1 (de) | 2003-07-31 | 2012-01-04 | Handylab, Inc. | Verarbeitung partikelhaltiger Proben |
DE102004020363A1 (de) * | 2004-04-23 | 2005-11-17 | Schott Ag | Verfahren zur Herstellung eines Masters, Master und Verfahren zur Herstellung von optischen Elementen sowie optischen Element |
EP1745153B1 (de) | 2004-05-03 | 2015-09-30 | Handylab, Inc. | Bearbeitung polynukleotidhaltiger proben |
US8852862B2 (en) | 2004-05-03 | 2014-10-07 | Handylab, Inc. | Method for processing polynucleotide-containing samples |
US7378068B2 (en) * | 2005-06-01 | 2008-05-27 | Conocophillips Company | Electrochemical process for decomposition of hydrogen sulfide and production of sulfur |
US11806718B2 (en) | 2006-03-24 | 2023-11-07 | Handylab, Inc. | Fluorescence detector for microfluidic diagnostic system |
EP2001990B1 (de) | 2006-03-24 | 2016-06-29 | Handylab, Inc. | Integriertes system zur verarbeitung von mikrofluidischen proben und verwendungsverfahren |
US10900066B2 (en) | 2006-03-24 | 2021-01-26 | Handylab, Inc. | Microfluidic system for amplifying and detecting polynucleotides in parallel |
US7998708B2 (en) | 2006-03-24 | 2011-08-16 | Handylab, Inc. | Microfluidic system for amplifying and detecting polynucleotides in parallel |
WO2008060604A2 (en) | 2006-11-14 | 2008-05-22 | Handylab, Inc. | Microfluidic system for amplifying and detecting polynucleotides in parallel |
US8765076B2 (en) | 2006-11-14 | 2014-07-01 | Handylab, Inc. | Microfluidic valve and method of making same |
JP2008262953A (ja) * | 2007-04-10 | 2008-10-30 | Sharp Corp | 半導体装置の製造方法 |
US9618139B2 (en) | 2007-07-13 | 2017-04-11 | Handylab, Inc. | Integrated heater and magnetic separator |
ES2648798T3 (es) | 2007-07-13 | 2018-01-08 | Handylab, Inc. | Materiales de captura de polinucleótidos y métodos de utilización de los mismos |
US8287820B2 (en) | 2007-07-13 | 2012-10-16 | Handylab, Inc. | Automated pipetting apparatus having a combined liquid pump and pipette head system |
USD621060S1 (en) | 2008-07-14 | 2010-08-03 | Handylab, Inc. | Microfluidic cartridge |
US20090136385A1 (en) | 2007-07-13 | 2009-05-28 | Handylab, Inc. | Reagent Tube |
US8133671B2 (en) | 2007-07-13 | 2012-03-13 | Handylab, Inc. | Integrated apparatus for performing nucleic acid extraction and diagnostic testing on multiple biological samples |
US8105783B2 (en) | 2007-07-13 | 2012-01-31 | Handylab, Inc. | Microfluidic cartridge |
US8182763B2 (en) | 2007-07-13 | 2012-05-22 | Handylab, Inc. | Rack for sample tubes and reagent holders |
US9186677B2 (en) | 2007-07-13 | 2015-11-17 | Handylab, Inc. | Integrated apparatus for performing nucleic acid extraction and diagnostic testing on multiple biological samples |
US8016260B2 (en) * | 2007-07-19 | 2011-09-13 | Formulatrix, Inc. | Metering assembly and method of dispensing fluid |
US7951722B2 (en) | 2007-08-08 | 2011-05-31 | Xilinx, Inc. | Double exposure semiconductor process for improved process margin |
USD618820S1 (en) | 2008-07-11 | 2010-06-29 | Handylab, Inc. | Reagent holder |
USD787087S1 (en) | 2008-07-14 | 2017-05-16 | Handylab, Inc. | Housing |
US8100293B2 (en) * | 2009-01-23 | 2012-01-24 | Formulatrix, Inc. | Microfluidic dispensing assembly |
KR20120055754A (ko) * | 2010-11-22 | 2012-06-01 | 한국전자통신연구원 | 클리세 및 그의 제조방법 |
CN106190806B (zh) | 2011-04-15 | 2018-11-06 | 贝克顿·迪金森公司 | 扫描实时微流体热循环仪和用于同步的热循环和扫描光学检测的方法 |
CN106996984B (zh) | 2011-09-30 | 2018-11-27 | 贝克顿·迪金森公司 | 组合试剂条 |
USD692162S1 (en) | 2011-09-30 | 2013-10-22 | Becton, Dickinson And Company | Single piece reagent holder |
WO2013067202A1 (en) | 2011-11-04 | 2013-05-10 | Handylab, Inc. | Polynucleotide sample preparation device |
CA2863637C (en) | 2012-02-03 | 2021-10-26 | Becton, Dickinson And Company | External files for distribution of molecular diagnostic tests and determination of compatibility between tests |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5122490B2 (de) | 1972-04-21 | 1976-07-10 | ||
US6007324A (en) * | 1977-10-23 | 1999-12-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Double layer method for fabricating a rim type attenuating phase shifting mask |
LU86722A1 (fr) | 1986-12-23 | 1988-07-14 | Glaverbel | Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse |
US5143854A (en) | 1989-06-07 | 1992-09-01 | Affymax Technologies N.V. | Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof |
US5173442A (en) * | 1990-07-23 | 1992-12-22 | Microelectronics And Computer Technology Corporation | Methods of forming channels and vias in insulating layers |
JPH0625000B2 (ja) | 1990-07-24 | 1994-04-06 | 日本ディジタルイクイップメント株式会社 | 固体表面処理方法 |
US5604081A (en) * | 1992-08-14 | 1997-02-18 | Siemens Aktiengesellschaft | Method for producing a surface structure with reliefs |
US5413884A (en) * | 1992-12-14 | 1995-05-09 | American Telephone And Telegraph Company | Grating fabrication using electron beam lithography |
KR0186067B1 (ko) * | 1993-08-06 | 1999-05-15 | 기타지마 요시토시 | 계조 마스크 및 그의 제조방법 |
JPH07186155A (ja) * | 1993-12-28 | 1995-07-25 | Dainippon Printing Co Ltd | 化粧板用賦形型の製造方法 |
US5942443A (en) | 1996-06-28 | 1999-08-24 | Caliper Technologies Corporation | High throughput screening assay systems in microscale fluidic devices |
US5753417A (en) * | 1996-06-10 | 1998-05-19 | Sharp Microelectronics Technology, Inc. | Multiple exposure masking system for forming multi-level resist profiles |
BR9710054A (pt) | 1996-06-28 | 2000-01-11 | Caliper Techn Corp | Aparelhos para separar compostos de teste para um efeito sobre um sistema bioquìmico e para detectar ummefeito de um composto de teste sobre um sistema bioquìmico, processos de determinação de se uma amostra contém um composto capaz de afetar um sistema bioquìmico, de separação de uma pluralidade de compostos de teste para um efeito sobre um sistema bioquìmico e usos de um sistema microfluido e de um substrato de ensaio. |
US5779868A (en) | 1996-06-28 | 1998-07-14 | Caliper Technologies Corporation | Electropipettor and compensation means for electrophoretic bias |
WO1998000705A1 (en) | 1996-06-28 | 1998-01-08 | Caliper Technologies Corporation | Electropipettor and compensation means for electrophoretic bias |
US5821169A (en) * | 1996-08-05 | 1998-10-13 | Sharp Microelectronics Technology,Inc. | Hard mask method for transferring a multi-level photoresist pattern |
US5976336A (en) | 1997-04-25 | 1999-11-02 | Caliper Technologies Corp. | Microfluidic devices incorporating improved channel geometries |
US6090251A (en) | 1997-06-06 | 2000-07-18 | Caliper Technologies, Inc. | Microfabricated structures for facilitating fluid introduction into microfluidic devices |
US5972570A (en) * | 1997-07-17 | 1999-10-26 | International Business Machines Corporation | Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby |
US5842787A (en) | 1997-10-09 | 1998-12-01 | Caliper Technologies Corporation | Microfluidic systems incorporating varied channel dimensions |
US5955221A (en) | 1997-11-21 | 1999-09-21 | The Regents Of The University Of California | Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart |
US6093507A (en) * | 1999-01-04 | 2000-07-25 | Taiwan Semiconductor Manufacturing Company | Simplified process for fabricating levinson and chromeless type phase shifting masks |
-
2001
- 2001-05-01 AT AT01932865T patent/ATE503209T1/de not_active IP Right Cessation
- 2001-05-01 EP EP01932865A patent/EP1279071B1/de not_active Expired - Lifetime
- 2001-05-01 US US09/846,679 patent/US6569607B2/en not_active Expired - Lifetime
- 2001-05-01 AU AU2001259355A patent/AU2001259355B2/en not_active Ceased
- 2001-05-01 DE DE60144278T patent/DE60144278D1/de not_active Expired - Lifetime
- 2001-05-01 AU AU5935501A patent/AU5935501A/xx active Pending
- 2001-05-01 WO PCT/US2001/014125 patent/WO2001084242A1/en active IP Right Grant
- 2001-05-01 CA CA002406063A patent/CA2406063A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU5935501A (en) | 2001-11-12 |
EP1279071B1 (de) | 2011-03-23 |
WO2001084242A1 (en) | 2001-11-08 |
EP1279071A4 (de) | 2006-08-02 |
EP1279071A1 (de) | 2003-01-29 |
US20020004182A1 (en) | 2002-01-10 |
US6569607B2 (en) | 2003-05-27 |
CA2406063A1 (en) | 2001-11-08 |
AU2001259355B2 (en) | 2005-09-01 |
DE60144278D1 (de) | 2011-05-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |