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ATE430992T1 - Znosse halbleiterverbindung, integrierte halbleiterschaltung und verfahren zu deren herstellung - Google Patents

Znosse halbleiterverbindung, integrierte halbleiterschaltung und verfahren zu deren herstellung

Info

Publication number
ATE430992T1
ATE430992T1 AT02256104T AT02256104T ATE430992T1 AT E430992 T1 ATE430992 T1 AT E430992T1 AT 02256104 T AT02256104 T AT 02256104T AT 02256104 T AT02256104 T AT 02256104T AT E430992 T1 ATE430992 T1 AT E430992T1
Authority
AT
Austria
Prior art keywords
znosse
production
semiconductor
layer
silicon substrate
Prior art date
Application number
AT02256104T
Other languages
English (en)
Inventor
K Iwata
S Niki
P Fons
A Yamada
K Matsubara
Original Assignee
Nat Inst Of Advanced Ind Scien
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nat Inst Of Advanced Ind Scien filed Critical Nat Inst Of Advanced Ind Scien
Application granted granted Critical
Publication of ATE430992T1 publication Critical patent/ATE430992T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/327—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26—Materials of the light emitting region
    • H01L33/28—Materials of the light emitting region containing only elements of Group II and Group VI of the Periodic Table
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/021—Silicon based substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
AT02256104T 2001-09-05 2002-09-03 Znosse halbleiterverbindung, integrierte halbleiterschaltung und verfahren zu deren herstellung ATE430992T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001269497A JP4543162B2 (ja) 2001-09-05 2001-09-05 ＺｎＯＳＳｅ混晶半導体

Publications (1)

Publication Number Publication Date
ATE430992T1 true ATE430992T1 (de) 2009-05-15

Family

ID=19095308

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02256104T ATE430992T1 (de) 2001-09-05 2002-09-03 Znosse halbleiterverbindung, integrierte halbleiterschaltung und verfahren zu deren herstellung

Country Status (5)

Country Link
US (1) US6770913B2 (de)
EP (1) EP1291930B1 (de)
JP (1) JP4543162B2 (de)
AT (1) ATE430992T1 (de)
DE (1) DE60232213D1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10341681A1 (de) * 2003-09-08 2005-04-07 TransMIT Gesellschaft für Technologietransfer mbH Optische Funktionsschichten, insbesondere Zinkoxid-Sulfid-Schichten mit variabler dielektrischer Response
US8148731B2 (en) * 2006-08-29 2012-04-03 Moxtronics, Inc. Films and structures for metal oxide semiconductor light emitting devices and methods
WO2008087856A1 (ja) * 2007-01-15 2008-07-24 Stanley Electric Co., Ltd. ＺｎＯ系半導体発光素子とその製造方法
JP5259103B2 (ja) * 2007-02-27 2013-08-07 スタンレー電気株式会社 ＺｎＯ系半導体層の製造方法
JP5155611B2 (ja) * 2007-07-06 2013-03-06 スタンレー電気株式会社 ＺｎＯ系半導体発光素子
US8440497B2 (en) * 2010-10-26 2013-05-14 International Business Machines Corporation Fabricating kesterite solar cells and parts thereof
US20120100663A1 (en) * 2010-10-26 2012-04-26 International Business Machines Corporation Fabrication of CuZnSn(S,Se) Thin Film Solar Cell with Valve Controlled S and Se
US10121920B2 (en) * 2015-06-30 2018-11-06 International Business Machines Corporation Aluminum-doped zinc oxysulfide emitters for enhancing efficiency of chalcogenide solar cell

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03160735A (ja) * 1989-11-17 1991-07-10 Daido Steel Co Ltd 硫化亜鉛系化合物半導体
US5045897A (en) * 1990-03-14 1991-09-03 Santa Barbara Research Center Quaternary II-VI materials for photonics
US5838029A (en) * 1994-08-22 1998-11-17 Rohm Co., Ltd. GaN-type light emitting device formed on a silicon substrate
JPH09219563A (ja) 1996-02-09 1997-08-19 Hitachi Ltd 半導体光素子とそれを用いた応用システム
JPH09270564A (ja) * 1996-04-01 1997-10-14 Sony Corp Ｉｉ−ｖｉ族化合物半導体の製造方法
JPH11150337A (ja) * 1997-11-14 1999-06-02 Sony Corp 半導体発光素子および光装置
US6392257B1 (en) * 2000-02-10 2002-05-21 Motorola Inc. Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same
JP2002016285A (ja) * 2000-06-27 2002-01-18 National Institute Of Advanced Industrial & Technology 半導体発光素子

Also Published As

Publication number Publication date
US6770913B2 (en) 2004-08-03
JP4543162B2 (ja) 2010-09-15
JP2003081698A (ja) 2003-03-19
DE60232213D1 (de) 2009-06-18
EP1291930A3 (de) 2007-05-09
US20030042851A1 (en) 2003-03-06
EP1291930A2 (de) 2003-03-12
EP1291930B1 (de) 2009-05-06

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Legal Events

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