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ATE444567T1 - Herstellung von zweifach-gate-logikbauelementen - Google Patents

Herstellung von zweifach-gate-logikbauelementen

Info

Publication number
ATE444567T1
ATE444567T1 AT02735604T AT02735604T ATE444567T1 AT E444567 T1 ATE444567 T1 AT E444567T1 AT 02735604 T AT02735604 T AT 02735604T AT 02735604 T AT02735604 T AT 02735604T AT E444567 T1 ATE444567 T1 AT E444567T1
Authority
AT
Austria
Prior art keywords
gate
self
logic devices
dual gate
aligned
Prior art date
Application number
AT02735604T
Other languages
English (en)
Inventor
Toshiharu Furukawa
Mark Hakey
Steven Holmes
David Horak
William Ma
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of ATE444567T1 publication Critical patent/ATE444567T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66484—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with multiple gate, at least one gate being an insulated gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
    • H01L21/2807—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being Si or Ge or C and their alloys except Si
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7831—Field effect transistors with field effect produced by an insulated gate with multiple gate structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78645—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78645—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate
    • H01L29/78648—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate arranged on opposing sides of the channel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
  • Element Separation (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
AT02735604T 2001-06-12 2002-05-30 Herstellung von zweifach-gate-logikbauelementen ATE444567T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/879,590 US6596597B2 (en) 2001-06-12 2001-06-12 Method of manufacturing dual gate logic devices
PCT/GB2002/002622 WO2002101834A2 (en) 2001-06-12 2002-05-30 An intermediate manufacture for a dual gate logic device

Publications (1)

Publication Number Publication Date
ATE444567T1 true ATE444567T1 (de) 2009-10-15

Family

ID=25374451

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02735604T ATE444567T1 (de) 2001-06-12 2002-05-30 Herstellung von zweifach-gate-logikbauelementen

Country Status (9)

Country Link
US (2) US6596597B2 (de)
EP (1) EP1396029B1 (de)
JP (1) JP4256772B2 (de)
KR (1) KR100586770B1 (de)
CN (1) CN1291499C (de)
AT (1) ATE444567T1 (de)
DE (1) DE60233872D1 (de)
TW (1) TW564468B (de)
WO (1) WO2002101834A2 (de)

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US6798017B2 (en) * 2001-08-31 2004-09-28 International Business Machines Corporation Vertical dual gate field effect transistor
US6580132B1 (en) * 2002-04-10 2003-06-17 International Business Machines Corporation Damascene double-gate FET
US6919647B2 (en) * 2003-07-03 2005-07-19 American Semiconductor, Inc. SRAM cell
US7015547B2 (en) 2003-07-03 2006-03-21 American Semiconductor, Inc. Multi-configurable independently multi-gated MOSFET
US7019342B2 (en) 2003-07-03 2006-03-28 American Semiconductor, Inc. Double-gated transistor circuit
US7078300B2 (en) * 2003-09-27 2006-07-18 International Business Machines Corporation Thin germanium oxynitride gate dielectric for germanium-based devices
US7098477B2 (en) * 2004-04-23 2006-08-29 International Business Machines Corporation Structure and method of manufacturing a finFET device having stacked fins
US7348641B2 (en) * 2004-08-31 2008-03-25 International Business Machines Corporation Structure and method of making double-gated self-aligned finFET having gates of different lengths
US7176090B2 (en) 2004-09-07 2007-02-13 Intel Corporation Method for making a semiconductor device that includes a metal gate electrode
FR2893762B1 (fr) * 2005-11-18 2007-12-21 Commissariat Energie Atomique Procede de realisation de transistor a double grilles auto-alignees par reduction de motifs de grille
US7704838B2 (en) * 2006-08-25 2010-04-27 Freescale Semiconductor, Inc. Method for forming an independent bottom gate connection for buried interconnection including bottom gate of a planar double gate MOSFET
US8530972B2 (en) * 2006-08-25 2013-09-10 Freescale Semiconductor, Inc. Double gate MOSFET with coplanar surfaces for contacting source, drain, and bottom gate
FR2911004B1 (fr) * 2006-12-28 2009-05-15 Commissariat Energie Atomique Procede de realisation de transistors a double-grille asymetriques permettant la realisation de transistors a double-grille asymetriques et symetriques sur un meme substrat
US20090003083A1 (en) * 2007-06-28 2009-01-01 Sandisk 3D Llc Memory cell with voltage modulated sidewall poly resistor
US9542687B2 (en) 2008-06-26 2017-01-10 Visa International Service Association Systems and methods for visual representation of offers
US8478692B2 (en) 2008-06-26 2013-07-02 Visa International Service Association Systems and methods for geographic location notifications of payment transactions
US8396455B2 (en) 2008-09-25 2013-03-12 Visa International Service Association Systems and methods for sorting alert and offer messages on a mobile device
US8159327B2 (en) * 2008-11-13 2012-04-17 Visa International Service Association Device including authentication glyph
US9312230B2 (en) * 2010-02-08 2016-04-12 Taiwan Semiconductor Manufacturing Company, Ltd. Conductive pillar structure for semiconductor substrate and method of manufacture
JP5364668B2 (ja) * 2010-09-22 2013-12-11 株式会社東芝 赤外線撮像装置
JP5933300B2 (ja) * 2011-03-16 2016-06-08 株式会社半導体エネルギー研究所 半導体装置
US8739078B2 (en) 2012-01-18 2014-05-27 International Business Machines Corporation Near-neighbor trimming of dummy fill shapes with built-in optical proximity corrections for semiconductor applications
FR2987709B1 (fr) * 2012-03-05 2017-04-28 Soitec Silicon On Insulator Table de correspondance
US9178077B2 (en) 2012-11-13 2015-11-03 Micron Technology, Inc. Semiconductor constructions
US9105737B2 (en) 2013-01-07 2015-08-11 Micron Technology, Inc. Semiconductor constructions
US8853769B2 (en) 2013-01-10 2014-10-07 Micron Technology, Inc. Transistors and semiconductor constructions
US9219070B2 (en) 2013-02-05 2015-12-22 Micron Technology, Inc. 3-D memory arrays
US9159845B2 (en) 2013-05-15 2015-10-13 Micron Technology, Inc. Charge-retaining transistor, array of memory cells, and methods of forming a charge-retaining transistor
KR102102783B1 (ko) * 2014-01-06 2020-04-22 삼성전자주식회사 반도체 소자, 자기 기억 소자 및 이들의 제조 방법
KR102191217B1 (ko) * 2014-04-28 2020-12-16 삼성전자주식회사 반도체 소자, 자기 기억 소자 및 이들의 제조 방법
US10103262B2 (en) * 2016-01-12 2018-10-16 Taiwan Semiconductor Manufacturing Co., Ltd. Method of forming a finFET structure with high quality EPI film
US10176870B1 (en) 2017-07-05 2019-01-08 Micron Technology, Inc. Multifunctional memory cells
US10262736B2 (en) 2017-07-05 2019-04-16 Micron Technology, Inc. Multifunctional memory cells
US10727216B1 (en) 2019-05-10 2020-07-28 Sandisk Technologies Llc Method for removing a bulk substrate from a bonded assembly of wafers
US11482423B2 (en) * 2021-01-28 2022-10-25 Tokyo Electron Limited Plasma etching techniques
US20230011006A1 (en) * 2021-07-09 2023-01-12 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and manufacturing method thereof

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US5324673A (en) * 1992-11-19 1994-06-28 Motorola, Inc. Method of formation of vertical transistor
US5612552A (en) * 1994-03-31 1997-03-18 Lsi Logic Corporation Multilevel gate array integrated circuit structure with perpendicular access to all active device regions
US5583368A (en) * 1994-08-11 1996-12-10 International Business Machines Corporation Stacked devices
KR100212693B1 (ko) * 1996-12-14 1999-08-02 권혁준 규소/규소게르마늄 모스 전계 트랜지스터 및 그 제조방법
FR2791177A1 (fr) * 1999-03-19 2000-09-22 France Telecom Procede de realisation d'une grille en forme de champignon ou grille en "t"
US6509586B2 (en) * 2000-03-31 2003-01-21 Fujitsu Limited Semiconductor device, method for fabricating the semiconductor device and semiconductor integrated circuit
JP2001332630A (ja) * 2000-05-19 2001-11-30 Sharp Corp 半導体装置の製造方法
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KR100354438B1 (ko) * 2000-12-12 2002-09-28 삼성전자 주식회사 모스 트랜지스터의 실리콘 게르마늄 게이트 폴리 형성방법 및 이를 이용한 씨모스 트랜지스터 형성 방법
US6518106B2 (en) * 2001-05-26 2003-02-11 Motorola, Inc. Semiconductor device and a method therefor

Also Published As

Publication number Publication date
KR100586770B1 (ko) 2006-06-08
WO2002101834A2 (en) 2002-12-19
TW564468B (en) 2003-12-01
EP1396029A2 (de) 2004-03-10
US20020187610A1 (en) 2002-12-12
US6891226B2 (en) 2005-05-10
US6596597B2 (en) 2003-07-22
CN1291499C (zh) 2006-12-20
JP4256772B2 (ja) 2009-04-22
CN1516902A (zh) 2004-07-28
US20030201500A1 (en) 2003-10-30
WO2002101834A3 (en) 2003-05-30
JP2004529509A (ja) 2004-09-24
EP1396029B1 (de) 2009-09-30
DE60233872D1 (de) 2009-11-12
KR20040006032A (ko) 2004-01-16

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Legal Events

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