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NL1001124C2 - Met alkoxyfenyl gesubstitueerde bisacylfosfineoxiden. - Google Patents

Met alkoxyfenyl gesubstitueerde bisacylfosfineoxiden. Download PDF

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Publication number
NL1001124C2
NL1001124C2 NL1001124A NL1001124A NL1001124C2 NL 1001124 C2 NL1001124 C2 NL 1001124C2 NL 1001124 A NL1001124 A NL 1001124A NL 1001124 A NL1001124 A NL 1001124A NL 1001124 C2 NL1001124 C2 NL 1001124C2
Authority
NL
Netherlands
Prior art keywords
formula
alkyl
hydrogen
compounds
formula sheet
Prior art date
Application number
NL1001124A
Other languages
English (en)
Dutch (nl)
Other versions
NL1001124A1 (nl
Inventor
Manfred Koehler
David George Leppard
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of NL1001124A1 publication Critical patent/NL1001124A1/xx
Application granted granted Critical
Publication of NL1001124C2 publication Critical patent/NL1001124C2/nl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/30Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
    • C07F9/32Esters thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/124Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Paper (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
NL1001124A 1994-09-02 1995-09-01 Met alkoxyfenyl gesubstitueerde bisacylfosfineoxiden. NL1001124C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH269194 1994-09-02
CH269194 1994-09-02

Publications (2)

Publication Number Publication Date
NL1001124A1 NL1001124A1 (nl) 1996-03-04
NL1001124C2 true NL1001124C2 (nl) 1997-05-13

Family

ID=4239412

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1001124A NL1001124C2 (nl) 1994-09-02 1995-09-01 Met alkoxyfenyl gesubstitueerde bisacylfosfineoxiden.

Country Status (19)

Country Link
US (2) US5965776A (fr)
JP (1) JP3834738B2 (fr)
KR (1) KR100363978B1 (fr)
CN (1) CN1130632A (fr)
AT (1) AT402298B (fr)
AU (1) AU700479B2 (fr)
BE (1) BE1010179A4 (fr)
BR (1) BR9503915A (fr)
CA (1) CA2157342A1 (fr)
CZ (1) CZ223695A3 (fr)
DE (1) DE19532358A1 (fr)
FR (1) FR2724172B1 (fr)
GB (2) GB9517257D0 (fr)
IT (1) IT1281126B1 (fr)
NL (1) NL1001124C2 (fr)
SE (1) SE510489C2 (fr)
SK (1) SK284316B6 (fr)
TW (1) TW381106B (fr)
ZA (1) ZA957404B (fr)

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DE19650562A1 (de) * 1996-12-05 1998-06-10 Basf Ag Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate
US5922473A (en) * 1996-12-26 1999-07-13 Morton International, Inc. Dual thermal and ultraviolet curable powder coatings
EP0975693B2 (fr) * 1997-04-22 2006-01-18 Koninklijke DSM N.V. Composition de resine liquide durcissable
US6130980A (en) * 1997-05-06 2000-10-10 Dsm N.V. Ribbon assemblies and ink coating compositions for use in forming the ribbon assemblies
EP0980343B1 (fr) * 1997-05-06 2006-02-01 DSM IP Assets B.V. Composition d'encre durcissable par exposition a un rayonnement
US6359025B1 (en) 1997-05-16 2002-03-19 Dsm N.V. Radiation-curable liquid resin composition for coating optical fibers
DK1062288T3 (da) 1998-03-13 2003-08-04 Akzo Nobel Nv Ikke-vandig belægningssammensætning baseret på en oxidativt tørrende alkydharpiks og en fotoinitiator
DE19812859A1 (de) * 1998-03-24 1999-09-30 Basf Ag Photoinitiatorgemische
US5925402A (en) * 1998-07-15 1999-07-20 Morton International, Inc. Method of forming a hidden identification using powder coating
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US6888031B1 (en) 1998-11-30 2005-05-03 Ciba Specialty Chemicals Corporation Process for the preparation of acylphosphines, acyl oxides and acyl sulfides
SE9904080D0 (sv) 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
US6520926B2 (en) * 1999-02-24 2003-02-18 Lohmann Rauscher, Inc. Compression support sleeve
SE9900935D0 (sv) 1999-03-16 1999-03-16 Pharmacia & Upjohn Bv Macromolecular compounds
CA2388046A1 (fr) 1999-11-05 2001-05-17 Z Corporation Systemes de produit et procedes pour impression tridimensionnelle
EP1106627B1 (fr) 1999-12-08 2003-10-29 Ciba SC Holding AG Système photoinitiateur à la base des oxydes de phosphines et compositions durcissables à faible coloration
DE19961347A1 (de) 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Acylphosphinoxid-Initiatoren
DE19961355A1 (de) * 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Titanocen-Initiatoren
GB2360283B (en) 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
GB2365430B (en) 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
EP1326901B1 (fr) * 2000-09-14 2005-06-08 Ciba SC Holding AG Photo-initiateurs a l'oxyde d'acylphosphine dans des resines de coulee au methacrylate
BR0113853B1 (pt) * 2000-09-15 2011-11-29 composição polimérica aquosa estável e seca estável, formulação, pelìcula, processo para fabricar a composição polimérica aquosa estável e processo para fabricar um revestimento polimérico resistente à água ou um gel polimérico fortemente intumescìvel.
US6737216B2 (en) 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
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JP5189598B2 (ja) 2006-12-08 2013-04-24 スリーディー システムズ インコーポレーテッド 過酸化物硬化を用いた三次元印刷材料系および方法
EP2109528B1 (fr) 2007-01-10 2017-03-15 3D Systems Incorporated Système de matériau d'impression tridimensionnel avec une couleur, une performance de l'article et une facilité d'utilisation améliorées et procédé utilisant ce système
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JP7180068B2 (ja) * 2017-11-09 2022-11-30 株式会社リコー 硬化型液体組成物、硬化物、硬化物の製造方法及び硬化物の製造装置
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Citations (3)

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Publication number Priority date Publication date Assignee Title
EP0184095A2 (fr) * 1984-11-27 1986-06-11 ESPE Stiftung & Co Produktions- und Vertriebs KG Bisacylphosphinoxides, leur préparation et utilisation
EP0262629A2 (fr) * 1986-10-01 1988-04-06 Ciba-Geigy Ag Composition photopolymérisable pour enregistrement, en particulier pour l'obtention de plaques d'impression et plaques en relief
EP0446175A2 (fr) * 1990-03-09 1991-09-11 Ciba-Geigy Ag Mélange de photoinitiateurs

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DE3837569A1 (de) * 1988-11-04 1990-05-10 Espe Stiftung Mit sichtbarem licht aushaertbare dentalmassen
US4962144B1 (en) * 1988-12-30 1998-03-24 Gen Electric Composition
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
NL9200052A (nl) * 1992-01-14 1993-08-02 Gen Electric Polymeermengsels en daaruit gevormde plaatvormige of filmvormige produkten.
ZA941879B (en) * 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
EP0184095A2 (fr) * 1984-11-27 1986-06-11 ESPE Stiftung & Co Produktions- und Vertriebs KG Bisacylphosphinoxides, leur préparation et utilisation
EP0262629A2 (fr) * 1986-10-01 1988-04-06 Ciba-Geigy Ag Composition photopolymérisable pour enregistrement, en particulier pour l'obtention de plaques d'impression et plaques en relief
EP0446175A2 (fr) * 1990-03-09 1991-09-11 Ciba-Geigy Ag Mélange de photoinitiateurs

Also Published As

Publication number Publication date
KR960010669A (ko) 1996-04-20
US5767169A (en) 1998-06-16
CA2157342A1 (fr) 1996-03-03
JP3834738B2 (ja) 2006-10-18
BR9503915A (pt) 1996-09-17
ITMI951851A0 (it) 1995-09-01
GB9517849D0 (en) 1995-11-01
BE1010179A4 (fr) 1998-02-03
NL1001124A1 (nl) 1996-03-04
ITMI951851A1 (it) 1997-03-01
DE19532358A1 (de) 1996-03-07
AU700479B2 (en) 1999-01-07
ATA147195A (de) 1996-08-15
SK107395A3 (en) 1998-11-04
ZA957404B (en) 1996-04-17
CZ223695A3 (en) 1996-03-13
JPH0881481A (ja) 1996-03-26
AT402298B (de) 1997-03-25
FR2724172A1 (fr) 1996-03-08
SE9503022D0 (sv) 1995-09-01
KR100363978B1 (ko) 2003-02-17
SE510489C2 (sv) 1999-05-31
FR2724172B1 (fr) 1998-01-23
SK284316B6 (sk) 2005-01-03
CN1130632A (zh) 1996-09-11
TW381106B (en) 2000-02-01
US5965776A (en) 1999-10-12
SE9503022L (sv) 1996-03-03
AU3028695A (en) 1996-05-09
GB9517257D0 (en) 1995-10-25
GB2292740B (en) 1998-12-30
GB2292740A (en) 1996-03-06
IT1281126B1 (it) 1998-02-13

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