[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

WO2022083735A1 - Procédé de calcul de l'image d'interférence de cisaillement ronchi dans un objectif de projection photolithographique - Google Patents

Procédé de calcul de l'image d'interférence de cisaillement ronchi dans un objectif de projection photolithographique Download PDF

Info

Publication number
WO2022083735A1
WO2022083735A1 PCT/CN2021/125704 CN2021125704W WO2022083735A1 WO 2022083735 A1 WO2022083735 A1 WO 2022083735A1 CN 2021125704 W CN2021125704 W CN 2021125704W WO 2022083735 A1 WO2022083735 A1 WO 2022083735A1
Authority
WO
WIPO (PCT)
Prior art keywords
electric field
expression
function
image
light
Prior art date
Application number
PCT/CN2021/125704
Other languages
English (en)
Chinese (zh)
Inventor
牛志元
施伟杰
Original Assignee
深圳晶源信息技术有限公司东方晶源微电子科技（北京）有限公司深圳分公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳晶源信息技术有限公司东方晶源微电子科技（北京）有限公司深圳分公司 filed Critical 深圳晶源信息技术有限公司东方晶源微电子科技（北京）有限公司深圳分公司
Publication of WO2022083735A1 publication Critical patent/WO2022083735A1/fr

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation

Definitions

  • the invention relates to the technical field of optical measurement, in particular to a method for calculating a Ronchi shearing interference image in a lithography projection objective lens.
  • the detection system that extracts the wave aberration of the projection objective lens with high precision and high speed is the core subsystem of the high-end lithography machine.
  • Wave aberration is the main parameter of the imaging quality of the projection objective, which directly determines the resolution and overlay accuracy of the lithography machine.
  • the wave aberration of the projection objective of the high-end lithography machine has reached below 1nm. The difference is more pronounced.
  • the object-side grating is an ideal periodic line grating (that is, a grating with infinitely many lines, and the line length is infinite), and the object-side grating is a 2D graphics, rather than complex two-dimensional graphics, has limitations; and the traditional detection method assumes that the imaging model is a scalar model rather than a strict vector model in the calculation process, and the receiving screen interference image calculation in the traditional detection method defaults to Far-field approximation technology (ie Fraunhofer diffraction region), however, these approximation conditions have certain limitations in practical applications, and it is difficult to obtain shear interference images accurately.
  • Far-field approximation technology ie Fraunhofer diffraction region
  • the present invention provides a Ronchi shearing interference in a computational lithography projection objective lens. image method.
  • the present invention provides a method for calculating the Langchi shearing interference image in a lithography projection objective lens, which is used to calculate and obtain the wave aberration of the measured projection objective lens,
  • the method includes the following steps, step S1: obtaining the scalar electric field function of the light incident on the object-side grating and the object-side grating spectrum of the object-side grating by calculating to obtain the electric field spectrum spatial distribution function of the light diffracted by the object-side grating
  • Step S2 the light passes through the measured projection objective lens, calculates the pupil function of the measured projection objective lens and calculates the electric field distribution expression at the exit pupil of the light in conjunction with the described electric field spectral spatial distribution function
  • the polarization information of the grating is obtained from the upper surface of the grating, and the electric field distribution expression at the exit pupil is converted from the sp component
  • Step S4 Calculate the RS integral kernel function, and calculate the electric field expression on the upper surface of the image square grating to obtain the electric field expression on the lower surface of the image square grating, which is based on the expression of the electric field on the lower surface of the image square grating formula and combined with the RS integral kernel function to calculate to obtain the shear interference pattern formed by multiple lights on the receiving screen;
  • Step S5 define the IMM (f x , f y ; f' x , f' y ) variable matrix and calculate it
  • the eigenvalue decomposition is performed to rewrite a plurality of shearing interference patterns and obtain the decomposition results, and the accurate shearing interference images of different shearing positions of the light on the receiving screen are obtained by repeatedly calculating the decomposition results.
  • the light irradiated on the object-side grating is multi-directional incident light output by the light source
  • the step S1 further includes the following steps; step S11: obtaining the light source frequency (s) of the light irradiated on the object-side grating by calculation x , s y ) and spatial frequency (f x , f y ), and obtain the scalar electric field function of the incident parallel light as U(x, y);
  • Step S13 further calculate the electric field spectrum spatial distribution function of the light diffracted by the object-side grating is M 1 (f x -s x ,f y -s y ), and its expression is:
  • step S11 the frequency of the light source (s x , s
  • the pupil function is P(f x , f y ), and its function expression is:
  • the radiation correction factor when the light is imaged at the exit pupil is calculated, and its expression is: Multiply the electric field spectral spatial distribution function, the pupil function and the radiation correction factor in turn to obtain the electric field distribution expression at the exit pupil:
  • the step S3 includes the following steps: Step S31 : the geometric rotation matrix R 3 ⁇ 2 is a 3 ⁇ 2 dimensional geometric rotation matrix, and the expression of the electric field distribution at the exit is expanded into a vector form by Jones vector. Obtain the electric field distribution vector expression at the exit; Step S32: convert the sp component of the local coordinate system of the electric field distribution vector expression at the exit into the xyz component of the global coordinate system to calculate the upper surface of the image square grating electric field expression; in step S31, the Jones vector for x polarization is For y polarization the Jones vector is Using the geometric rotation matrix R 3 ⁇ 2 to obtain the vector form expression of the electric field distribution expression at the exit pupil is: In step S32, the surface electric field expression on the image square grating is:
  • the electric field expression on the lower surface of the image-square grating is used to describe the electric field distribution of light after passing through the image-square grating, and the electric field expression on the lower surface of the image-square grating is:
  • the step S4 includes the following steps:
  • Step S41 Calculate the electric field distribution function expression of the receiving screen based on the lower surface electric field expression of the image square grating combined with the RS integral kernel function through diffraction integration, and the receiving screen electric field distribution function expression is:
  • Step S42 The ( ⁇ , ⁇ ) degrees of freedom in the expression of the electric field distribution function of the receiving screen are eliminated by integration and then perform fast Fourier calculation to obtain the scalar electric field function of the electric field formed by light on the receiving screen; the scalar electric field
  • the expression of the function is:
  • the RS integral kernel function is a Rayleigh-Sommerfeld integral kernel function
  • the expression of the RS integral kernel function is:
  • the function expression of r is:
  • the step S4 further includes the following steps: Step S43 : obtaining the light source function I(s x , s y ) used to describe the intensity distribution of the light source in the frequency space by calculation, and incoherently superposing the scalar electric field function
  • the superposition weight is the light source function I(s x , s y );
  • the step 5 further includes the following steps: Step S51: Store the decomposition result obtained by decomposing the eigenvalues of the IMM (f x , f y ; f′ x , f′ y ) variable matrix for multiple computations Using, the decomposition result includes eigenvalues and eigenvectors obtained by eigenvalue decomposition.
  • the method for calculating the Ronchi shearing interference image in a lithography projection objective lens has the following advantages:
  • a geometric rotation matrix R 3 ⁇ 2 is defined to represent the The sp component of the local coordinate system of the electric field distribution expression at the exit is converted into the xyz component of the global coordinate system, and the expression of the electric field distribution at the exit is further extended to a vector form through the Jones vector to obtain the vector expression of the electric field distribution at the exit.
  • the technical personnel can finally calculate the electric field expression on the upper surface of the image square grating through the vector expression; it can be understood that the method for calculating the Ronchi shear interference image in the lithography projection objective involved in the present invention is in the calculation of the image square
  • a strict vector model is used in the expression of the surface electric field on the grating, because when the light passes through the projection objective, it is more convenient to use the sp component to calculate, and when the light passes through the projection objective and irradiates the image square grating, it needs to be
  • the electric field is converted into the xyz components of the global coordinate system to facilitate the calculation, and finally the electric field expression on the upper surface of the image square grating is obtained by calculation.
  • This calculation method simplifies the calculation process and makes the calculation more convenient and effective for technicians. The work efficiency of technicians is improved, and the problem of time-consuming and labor-intensive caused by low calculation efficiency is avoided.
  • the method for calculating the Ronchi shear interference image in the lithography projection objective lens involved in the present invention combines the expression of the electric field on the lower surface of the image square grating with the RS integral kernel function and calculates the diffraction integral to finally obtain the expression used to express the light in The expression of the electric field distribution function of the receiving screen of the electric field distribution on the receiving screen; it can be understood that the method for calculating the Ronchi shear interference image in the lithography projection objective lens involved in the present invention calculates the process of the light from the image-side grating to the receiving screen When the electric field distribution in the light source is 1, the strict Rayleigh-Sommerfeld diffraction integral is used to calculate the electric field distribution function expression of the receiving screen, which makes the final result of the electric field distribution of the light more accurate, which is beneficial to finally obtain an accurate shearing interference image. It solves the problem that the traditional detection method is difficult to obtain the clipped interference image accurately.
  • an IMM(f x , f y is defined in the process of calculating the shearing interference image formed by the light on the receiving screen ; f′ x , f′ y ) variable matrix for decomposing sheared interference images at different clipping positions, and the IMM(f x , f y ; f′ x , f′ y ) variable matrix is the light source function I(s x , s y ) and the spectrum of the object-side grating, technicians can study different wave aberrations (that is , different effective pupil functions P ( f x , f y )), different image square gratings and shearing interference images at different shearing positions; it can be understood that the precise shearing interference images are mainly used to reflect the image on the receiving screen
  • the technician can calculate the wave aberration of the projection objective lens to be measured by inverse calculation by precisely shearing the interference image.
  • the calculation of diffraction integral improves the accuracy, so that the finally obtained wave aberration data is accurate and reliable, and avoids the problem of unreliable detection results caused by insufficient detection accuracy of traditional detection methods; further, the calculation method involved in the present invention
  • the method of Ronchi shearing interference images in the lithography projection objective can obtain multiple precise shearing interference images by decomposing the IMM (f x , f y ; f′ x , f′ y ) variable matrix at one time.
  • the decomposition result is stored in the disk, so that the technician can directly use the decomposition result in the subsequent calculation, which effectively improves the work efficiency of the technician and realizes the function of decomposing one time and using it multiple times.
  • FIG. 1 is a schematic block diagram of a process flow of a method for calculating a Ronchi shear interference image in a lithography projection objective lens provided by the first embodiment of the present invention
  • FIG. 2 is a schematic diagram of the Ronchi shearing interference principle of a method for calculating a Ronchi shearing interference image in a lithography projection objective lens provided by the first embodiment of the present invention
  • Fig. 3 is the object square grating pattern of a specific detection process provided by the second embodiment of the present invention.
  • FIG. 4 is an object-side grating space imaging of a specific detection process provided by the second embodiment of the present invention.
  • FIG. 5 is a shearing interference image of a specific detection process provided by the second embodiment of the present invention.
  • the object-side grating 2. The projection objective lens to be tested; 3. The image-side grating; 4. The receiving screen; z, the distance between the receiving screen and the image-side grating.
  • the first embodiment of the present invention provides a method for calculating the Ronchi shear interference image in a lithography projection objective lens, which is used to calculate and obtain the wave aberration of the projection objective lens 2 under test,
  • the method includes the following steps, step S1: obtaining the scalar electric field function of the light incident on the object-side grating 1 and the object-side grating spectrum of the object-side grating 1 by calculating to obtain the electric field spectrum of the light diffracted by the object-side grating 1 Spatial distribution function;
  • Step S2 light passes through the measured projection objective lens 2, calculates the pupil function of the measured projection objective lens 2, and calculates the electric field distribution expression at the exit pupil of the light in combination with the electric field spectrum spatial distribution function;
  • Step S3 light irradiation When the upper surface of the image-side grating (the upper surface of the image-side grating, that is, the side where the light first contacts the image-side grating 3), its polarization information is
  • the surface electric field expression is calculated in combination with the RS integral kernel function to obtain the shear interference pattern formed by a plurality of lights on the receiving screen 4;
  • Step S5 define IMM (f x , f y ; f′ x , f′ y ) variables matrix and perform eigenvalue decomposition on it to rewrite multiple shearing interference patterns and obtain the decomposition results, and obtain accurate shearing interference images of different shearing positions of light on the receiving screen 4 by repeatedly calculating the decomposition results.
  • Step S1 further includes the following steps; Step S11 : The light source frequency (s x , s y ) and spatial frequency (f x , f y ) of the light irradiated on the object-side grating 1 are obtained by calculation, and the scalar electric field function of the incident parallel light is U(x, y); Step S12: measure the perspective function of the object-side grating as m 1 (x′, y′) and perform Fourier transform on it to obtain the object-side grating spectrum as M 1 (f x , f y ); Step S13: further calculate the electric field spectrum spatial distribution function of the light diffracted by the object-side grating 1 as M 1 (f x -s x , f y -s
  • the receiving screen 4 will Obtain different clipped interference images.
  • the shearing interference image on the receiving screen 4 contains the aberration information of the projection objective lens 2 under test, and the technician can extract the projection objective lens under test by synthesizing the shearing interference images with different phase shifts 2 wave aberration.
  • step S2 the pupil function is P(f x , f y ), and its function expression is:
  • the radiation correction factor when the light is imaged at the exit pupil is calculated, and its expression is: Multiply the electric field spectral spatial distribution function, pupil function and radiation correction factor in turn to obtain the electric field distribution expression at the exit pupil:
  • step S3 includes the following steps: Step S31 : the geometric rotation matrix R 3 ⁇ 2 is a 3 ⁇ 2 dimensional geometric rotation matrix, and the expression of the electric field distribution at the outlet is extended to a vector form through the Jones vector to obtain the electric field distribution at the outlet.
  • Step S32 convert the sp component of the local coordinate system of the electric field distribution vector expression at the exit into the xyz component of the global coordinate system to calculate the electric field expression on the upper surface of the image square grating;
  • step S31 for The x-polarized Jones vector is The Jones vector for y polarization is Using the geometric rotation matrix R 3 ⁇ 2 , the vector form expression of the electric field distribution expression at the exit pupil is obtained as:
  • step S32 the surface electric field expression on the image square grating is:
  • the geometric rotation matrix R 3 ⁇ 2 represents the transformation of the sp component of the local coordinate system into the xyz component of the global coordinate system. It is more convenient to use the sp component to calculate the light when it passes through the projection objective After projecting the objective lens, in order to facilitate the calculation, it is necessary to convert the electric field of the light into the xyz components of the global coordinate system, and finally obtain the expression of the electric field on the upper surface of the image square grating.
  • a geometric rotation matrix R 3 ⁇ 2 is defined to represent the sp component of the local coordinate system of the electric field distribution expression at the exit pole is converted into the global coordinate.
  • the method for calculating the Ronchi shear interference image in the lithography projection objective involved in the present invention adopts a strict vector model in the process of calculating the surface electric field expression on the image square grating, because the light When passing through the projection objective lens, it is convenient to use the sp component for calculation, and in the process of light passing through the projection objective lens and irradiating the image square grating 3, it is necessary to convert the electric field into the xyz component of the global coordinate system to facilitate the calculation, and finally through the calculation The electric field expression on the upper surface of the square grating is obtained.
  • This calculation method simplifies the calculation process, makes it more convenient for technicians to perform calculations, effectively improves the work efficiency of technicians, and avoids the time-consuming and laborious work caused by low calculation efficiency. question.
  • the electric field expression on the lower surface of the image-square grating is used to describe the electric field distribution of light after passing through the image-square grating 3, and the electric field expression on the lower surface of the image-square grating is:
  • step S4 includes the following steps:
  • Step S41 Calculate the electric field distribution function expression of the receiving screen based on the lower surface electric field expression of the image square grating combined with the RS integral kernel function through diffraction integration, and the electric field distribution function expression of the receiving screen is:
  • Step S42 the ( ⁇ , ⁇ ) degrees of freedom in the expression of the electric field distribution function of the receiving screen are eliminated by integration and then perform a fast Fourier calculation to obtain a scalar electric field function that multiple lights form an electric field on the receiving screen 4;
  • the RS integral kernel function is the Rayleigh-Sommerfeld integral kernel function, and the expression of the RS integral kernel function is:
  • the method for calculating the Langqi shear interference image in the lithography projection objective adopts a strict lithography vector model and the Rayleigh-Sommerfeld diffraction integral to perform the electric field distribution (ie, the light intensity distribution). Therefore, there is no need to consider the near-field or far-field of the object-side grating 1 and the image-side grating 3, and the receiving screen 4 also does not need to consider factors such as paraxial approximation, which avoids the limitation of traditional testing methods, which makes it difficult to accurately obtain sheared interference images. The problem.
  • the present invention relates to The method of calculating the Ronchi shearing interference image in the lithography projection objective uses the strict Rayleigh-Sommerfeld diffraction integral to calculate the electric field distribution of the receiving screen when calculating the electric field distribution in the process of light from the image square grating 3 to the receiving screen 4.
  • the calculation of the function expression makes the final result of the electric field distribution of the light more accurate, which is beneficial to finally obtain an accurate shearing interference image, and solves the problem that the traditional detection method is difficult to obtain the shearing interference image accurately.
  • step S4 further includes the following steps: Step S43 : obtaining the light source function I(s x , s y ) for describing the intensity distribution of the light source in the frequency space by calculation, and performing incoherent superposition of the scalar electric field functions to obtain multiple
  • the shear interference pattern formed by the light in the incident direction on the receiving screen 4, its superposition weight is the light source function I(s x , s y );
  • the expression of the shearing interference pattern is:
  • step 5 further includes the following steps: Step S51: Store the decomposition result obtained by decomposing the eigenvalues of the IMM (f x , f y ; f′ x , f′ y ) variable matrix for multiple use, and the decomposition result includes The eigenvalues and eigenvectors obtained by eigenvalue decomposition; it can be understood that the method for calculating the Ronchi shear interference image in the lithography projection objective provided in the present invention decomposes the IMM(f x , f y ; f′ x , f′ y ) variable matrix to obtain multiple precise shearing interference images, and technicians can store the decomposition results obtained by eigenvalue decomposition into the disk, so as to facilitate technicians in subsequent calculations directly By using the decomposition result, the work efficiency of the technician is effectively improved, and the function of decomposing one time and using it multiple times is realized.
  • Step S51 Store the decomposition result obtained by decomposing the eigenvalue
  • the eigenvalue decomposition of the IMM(f x , f y ; f′ x , f′ y ) variable matrix can obtain its eigenvalues and eigenvalue vectors, IMM(f x , f y ; f′ x , f′ y )
  • the expression formula for eigenvalue decomposition of variable matrix is: The skilled person can rewrite the expression of the sheared interference pattern according to the above formula to obtain the expression of the exact sheared interference image as:
  • the IMM(f x , f y ; f′ x , f′ y ) variable matrix is a function of the light source function I (s x , s y ) and the spectrum of the object-side grating, and is used to study different wave aberrations (ie different The effective pupil function P(f x , f y )), different image square gratings 3 (that is, m 2 ( ⁇ , ⁇ ) parameters are different) and shear interference images at different shear positions;
  • the precise shearing interference image is mainly used to reflect the light intensity distribution of the light on the receiving screen 4, and the technician can perform inverse calculation through the precise shearing interference image to obtain the wave aberration of the projection objective lens to be tested;
  • the precise shearing interference image is obtained by using a strict vector model and strict diffraction integral calculation, which improves the accuracy, makes the final wave aberration data accurate and reliable, and avoids the lack of detection accuracy caused by traditional detection methods. Unreliable test results.
  • the second embodiment of the present invention provides a specific detection process.
  • the detection process is based on the method for calculating the Ronchi shearing interference image in the lithography projection objective provided in the first embodiment of the present invention. It is a calculation method, which is substituted into a concretely constructed application scenario to further illustrate the content of the present invention, but is not intended to limit the present invention, and its specific implementation steps are as follows:
  • Step 1 Input the illumination mode to the light source, so that the illumination mode is traditional illumination, the coherence factor of the light emitted by the light source in this illumination mode is 1, the wavelength is 632 nm, and the polarization direction is X;
  • Step 3 Input the parameters of the object-side grating 1.
  • the GDS pattern of the object-side grating 1 is a 4-line grating (as shown in Figure 3), and the specific parameters of the object-side grating 1 are: the period of the object-side grating 1 is 25um , the line width of the object-side grating 1 is 12.5um, and the length of the object-side grating 1 is 100um; the object-side mask type of the input object-side grating 1 is a binary mask and has a dark field;
  • Step 4 Enter the information of the image-side grating 3, which is set to be exactly the same as the object-side mask.
  • Step 5 Input the phase shift of the image square grating 3, and its phase shift is 0um and 6.25um in turn (ie 1/4 period);
  • Step 6 The distance z between the input receiving screen and the image square grating 3 is 5000um, the size of the calculated image is 5000um*5000um, and the sampling pixels of the receiving screen 4 are 256*256 pixels;
  • Step 7 Perform the calculation task with the method for calculating the Ronchi shearing interference image in the lithography projection objective provided in the first embodiment of the present invention. After the calculation task is completed, the aerial image of the object-side grating 1 can be obtained (as shown in FIG. 4 ). shown) and the result of clipping the interference image (shown in Figure 5).
  • the method for calculating the Ronchi shearing interference image in a lithography projection objective lens has the following advantages:
  • a geometric rotation matrix R 3 ⁇ 2 is defined to represent the The sp component of the local coordinate system of the electric field distribution expression at the exit is converted into the xyz component of the global coordinate system, and the expression of the electric field distribution at the exit is further extended to a vector form through the Jones vector to obtain the vector expression of the electric field distribution at the exit.
  • the technical personnel can finally calculate the electric field expression on the upper surface of the image square grating through the vector expression; it can be understood that the method for calculating the Ronchi shear interference image in the lithography projection objective involved in the present invention is in the calculation of the image square
  • a strict vector model is used in the expression of the surface electric field on the grating, because when the light passes through the projection objective, it is more convenient to use the sp component to calculate, and when the light passes through the projection objective and irradiates the image square grating, it needs to be
  • the electric field is converted into the xyz components of the global coordinate system to facilitate the calculation, and finally the electric field expression on the upper surface of the image square grating is obtained through calculation.
  • the work efficiency of technicians is improved, and the problem of time-consuming and labor-intensive caused by low calculation efficiency is avoided.
  • the method for calculating the Ronchi shear interference image in the lithography projection objective lens involved in the present invention combines the expression of the electric field on the lower surface of the image square grating with the RS integral kernel function and calculates the diffraction integral to finally obtain the expression used to express the light in The expression of the electric field distribution function of the receiving screen of the electric field distribution on the receiving screen; it can be understood that the method for calculating the Ronchi shear interference image in the lithography projection objective lens involved in the present invention calculates the process of the light from the image-side grating to the receiving screen When the electric field distribution in the light source is 1, the strict Rayleigh-Sommerfeld diffraction integral is used to calculate the electric field distribution function expression of the receiving screen, which makes the final result of the electric field distribution of the light more accurate, which is beneficial to finally obtain an accurate shearing interference image. It solves the problem that the traditional detection method is difficult to obtain the clipped interference image accurately.
  • an IMM(f x , f y is defined in the process of calculating the shearing interference image formed by the light on the receiving screen ; f′ x , f′ y ) variable matrix for decomposing sheared interference images at different clipping positions, and the IMM(f x , f y ; f′ x , f′ y ) variable matrix is the light source function I(s x , s y ) and the spectrum of the object-side grating, technicians can study different wave aberrations (that is , different effective pupil functions P ( f x , f y )), different image square gratings and shearing interference images at different shearing positions; it can be understood that the precise shearing interference image is mainly used to reflect the light intensity distribution of the light on the receiving screen, and the technician can use the The precise shearing interference image is
  • the precise shearing interference image is calculated by using a strict vector model and strict diffraction integration, its accuracy has been improved.
  • the final obtained wave aberration data is accurate and reliable, and the problem of unreliable detection results caused by insufficient detection accuracy of the traditional detection method is avoided.
  • decomposing the IMM (f x , f y ; f′ x , f′ y ) variable matrix at one time multiple precise shearing interference images can be obtained.
  • the technician stores the decomposition results in the disk to facilitate the technicians in the follow-up.
  • the decomposition result is directly used in the calculation of , which effectively improves the work efficiency of technicians, and realizes the function of decomposing one time and using it many times.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un procédé de calcul d'une image d'interférence de cisaillement de Ronchi dans un objectif de projection photolithographique (2). Dans le procédé, un modèle de vecteur de photolithographie strict est utilisé pour le calcul pendant le processus de transmission de lumière, émise par une source de lumière, depuis un réseau côté objet (1) vers un réseau côté image (3). Le procédé peut également convenir pour des réseaux côté objet et côté image de n'importe quelle forme. De plus, une intégrale de diffraction de Rayleigh-Sommerfeld stricte est utilisée pour le calcul pendant le processus de transmission de lumière depuis le réseau côté image (3) vers un écran de réception (4). Dans le procédé de calcul d'une image d'interférence de cisaillement de Ronchi dans un objectif de projection photolithographique (2), du fait qu'un modèle de vecteur de photolithographie strict et une intégrale de diffraction de Rayleigh-Sommerfeld sont utilisés pour le calcul, il n'est pas nécessaire de prendre en considération les champs proches ou les champs lointains de réseaux côté objet et côté image (1, 3), et il n'est pas non plus nécessaire de prendre en considération des facteurs tels que l'approximation paraxiale e, ce qui concerne l'écran de réception (4), évitant ainsi le problème de la difficulté d'obtenir avec précision une image d'interférence de cisaillement en raison d'une limitation importante d'un procédé d'essai classique.
PCT/CN2021/125704 2020-10-23 2021-10-22 Procédé de calcul de l'image d'interférence de cisaillement ronchi dans un objectif de projection photolithographique WO2022083735A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202011148935.6A CN112114501B (zh) 2020-10-23 2020-10-23 一种计算光刻投影物镜中朗奇剪切干涉图像的方法
CN202011148935.6 2020-10-23

Publications (1)

Publication Number Publication Date
WO2022083735A1 true WO2022083735A1 (fr) 2022-04-28

Family

ID=73794345

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2021/125704 WO2022083735A1 (fr) 2020-10-23 2021-10-22 Procédé de calcul de l'image d'interférence de cisaillement ronchi dans un objectif de projection photolithographique

Country Status (2)

Country Link
CN (1) CN112114501B (fr)
WO (1) WO2022083735A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118857694A (zh) * 2024-09-26 2024-10-29 泉州装备制造研究所 一种光学检测方法及系统

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112114501B (zh) * 2020-10-23 2023-06-02 东方晶源微电子科技（北京）有限公司深圳分公司 一种计算光刻投影物镜中朗奇剪切干涉图像的方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59116522A (ja) * 1982-12-24 1984-07-05 Rikagaku Kenkyusho 光学非球面の検査法
CN102681365A (zh) * 2012-05-18 2012-09-19 中国科学院光电技术研究所 一种投影物镜波像差检测装置及方法
CN102889980A (zh) * 2012-10-15 2013-01-23 中国科学院光电技术研究所 一种基于光栅剪切干涉检测系统的微透镜定焦检测方法
CN104111120A (zh) * 2014-07-25 2014-10-22 中国科学院上海光学精密机械研究所 基于朗奇剪切干涉仪的相位提取方法
CN107367906A (zh) * 2017-08-16 2017-11-21 吴飞斌 一种光学系统的检焦装置和检焦方法
CN112114501A (zh) * 2020-10-23 2020-12-22 东方晶源微电子科技（北京）有限公司深圳分公司 一种计算光刻投影物镜中朗奇剪切干涉图像的方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130063805A1 (en) * 2011-05-24 2013-03-14 Craig B. Arnold Tunable acoustic gradient index of refraction lens and system
US9817320B2 (en) * 2013-11-20 2017-11-14 Asml Netherlands B.V. Lithographic method and apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59116522A (ja) * 1982-12-24 1984-07-05 Rikagaku Kenkyusho 光学非球面の検査法
CN102681365A (zh) * 2012-05-18 2012-09-19 中国科学院光电技术研究所 一种投影物镜波像差检测装置及方法
CN102889980A (zh) * 2012-10-15 2013-01-23 中国科学院光电技术研究所 一种基于光栅剪切干涉检测系统的微透镜定焦检测方法
CN104111120A (zh) * 2014-07-25 2014-10-22 中国科学院上海光学精密机械研究所 基于朗奇剪切干涉仪的相位提取方法
CN107367906A (zh) * 2017-08-16 2017-11-21 吴飞斌 一种光学系统的检焦装置和检焦方法
CN112114501A (zh) * 2020-10-23 2020-12-22 东方晶源微电子科技（北京）有限公司深圳分公司 一种计算光刻投影物镜中朗奇剪切干涉图像的方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118857694A (zh) * 2024-09-26 2024-10-29 泉州装备制造研究所 一种光学检测方法及系统

Also Published As

Publication number Publication date
CN112114501B (zh) 2023-06-02
CN112114501A (zh) 2020-12-22

Similar Documents

Publication Publication Date Title
US20230062585A1 (en) Metrology System and Method for Determining a Characteristic of One or More Structures on a Substrate
CN108319009B (zh) 基于结构光调制的快速超分辨成像方法
EP3480554A1 (fr) Appareil de métrologie et procédé pour déterminer une caractéristique d'une ou de plusieurs structures sur un substrat
WO2022083735A1 (fr) Procédé de calcul de l'image d'interférence de cisaillement ronchi dans un objectif de projection photolithographique
KR102416784B1 (ko) 임의의 입사각에서의 코히어런트 회절 영상
US11397312B2 (en) Structured illumination with optimized illumination geometry
CN103322941B (zh) 一种准确获取三维显微图像的方法
CN103322940B (zh) 一种获取三维形貌显微图像的方法
CN106097269A (zh) 基于计算鬼成像的高分辨率微视觉系统及获取图像的方法
CN103323938B (zh) 一种获取立体显微图像的方法
CN102636882A (zh) 一种分析高数值孔径成像系统空间像的方法
CN114924466A (zh) 一种高精度无掩膜激光投影光刻系统及方法
JP6000773B2 (ja) 収差推定方法、プログラムおよび撮像装置
Stockton et al. Tomographic single pixel spatial frequency projection imaging
CN110927116B (zh) 一种测量标记结构的方法、装置及系统
Chen et al. Fast-converging algorithm for wavefront reconstruction based on a sequence of diffracted intensity images
CN109780993B (zh) 微分相位对比显微系统与方法
GB2403616A (en) Diffraction pattern imaging using moving aperture.
CN102495535A (zh) 基于Abbe矢量成像模型获取掩模三维矢量空间像的方法
Filipovich et al. TorchOptics: An open-source Python library for differentiable Fourier optics simulations
CN114995053B (zh) 一种用于微纳结构表面三维形貌上的光刻方法
Rosenbluth et al. Radiometric consistency in source specifications for lithography
EP4296780A1 (fr) Procédé d'imagerie et dispositif de métrologie
US20240264423A1 (en) High throughput lensless imaging method and system thereof
Wang et al. Correction of grating patterns for high dynamic range 3D measurement based on deep learning

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21882147

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 31.08.2023)

122 Ep: pct application non-entry in european phase

Ref document number: 21882147

Country of ref document: EP

Kind code of ref document: A1