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WO2017177796A1 - Applications de nouveau système de durcissement par effet photochimique de radicaux libres et composition associée - Google Patents

Applications de nouveau système de durcissement par effet photochimique de radicaux libres et composition associée Download PDF

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Publication number
WO2017177796A1
WO2017177796A1 PCT/CN2017/077368 CN2017077368W WO2017177796A1 WO 2017177796 A1 WO2017177796 A1 WO 2017177796A1 CN 2017077368 W CN2017077368 W CN 2017077368W WO 2017177796 A1 WO2017177796 A1 WO 2017177796A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
acrylate
meth
compound
photocurable composition
Prior art date
Application number
PCT/CN2017/077368
Other languages
English (en)
Chinese (zh)
Inventor
钱晓春
Original Assignee
常州强力先端电子材料有限公司
常州强力电子新材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 常州强力先端电子材料有限公司, 常州强力电子新材料股份有限公司 filed Critical 常州强力先端电子材料有限公司
Publication of WO2017177796A1 publication Critical patent/WO2017177796A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/08—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Definitions

  • R 1 and R 2 each independently represent hydrogen, nitro, cyano, halogen, C 1 -C 40 linear or branched alkyl, C 1 -C 40 alkoxy, or -O-CO-R group, and R 1 and R 2 at least one -O-CO-R group,
  • R Representative C 3 -C 20 cycloalkyl, C 4 -C 20 alkylcycloalkyl or cycloalkyl group An alkyl group, a C 2 -C 40 ester-containing group, a C 2 -C 40 -containing epoxy group, a halogen, or a C 3 -C 20 halogen-substituted alkyl group;
  • the photocurable composition of the present invention mainly comprises components (A) to (C), and the components will be described in more detail below.
  • the radical type photoinitiator as the component (C) is preferably a benzophenone, an ⁇ -hydroxyalkyl phenone, and a combination of effects such as a cost and a synergistic effect such as photoinitiation efficiency and curing speed. / or ⁇ -aminoalkyl phenones, benzil compounds.
  • the photocurable composition of the present invention can be obtained by weighing each component by weight and uniformly mixing.
  • the present invention enables the photo-curing composition to have a large photosensitive wavelength range by component optimization, particularly the addition of a specific oxime ester sensitizer. It has good light curing effect and can be applied in many aspects such as paint, paint, ink and molding materials, and has strong technical and market competitiveness.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

L'invention concerne une composition de durcissement par effet photochimique de radicaux libres qui comporte : un sensibilisateur d'anthraquinone, choisi parmi un composé ayant une structure représentée par la formule (I) et/ou un composé macromoléculaire utilisant le composé représenté par la formule (I) comme structure principale ; un composé de réaction de radicaux libres ; un initiateur de radicaux libres. La composition est de faible coût, présente une excellente réponse aux sources de lumière ayant une longueur d'onde allant de 200 nm à 500 nm, une vitesse de durcissement élevée, une bonne propriété de développement et une bonne intégrité de motif, permet à un film durci d'avoir une dureté élevée et possède une force d'adhérence élevée sur un substrat, et peut être utilisée dans des peintures, des revêtements, l'encre, des matériaux de moulage et d'autres applications.
PCT/CN2017/077368 2016-04-15 2017-03-20 Applications de nouveau système de durcissement par effet photochimique de radicaux libres et composition associée WO2017177796A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201610238231.5A CN107300833B (zh) 2016-04-15 2016-04-15 一种自由基光固化体系及其组合物的应用
CN201610238231.5 2016-04-15

Publications (1)

Publication Number Publication Date
WO2017177796A1 true WO2017177796A1 (fr) 2017-10-19

Family

ID=60041365

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/077368 WO2017177796A1 (fr) 2016-04-15 2017-03-20 Applications de nouveau système de durcissement par effet photochimique de radicaux libres et composition associée

Country Status (2)

Country Link
CN (1) CN107300833B (fr)
WO (1) WO2017177796A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3316036A4 (fr) * 2015-06-24 2019-02-27 Changzhou Tronly New Electronic Materials Co., Ltd Sensibilisateur pour photodurcissement par del uv, son procédé de préparation et son application
WO2019159908A1 (fr) * 2018-02-13 2019-08-22 川崎化成工業株式会社 Composé ayant un squelette aromatique polycyclique et composé endoperoxyde de celui-ci
CN112898171A (zh) * 2019-12-04 2021-06-04 江苏百赛飞生物科技有限公司 可聚合自由基提氢型光引发剂及其制备方法和用途

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110317483A (zh) * 2018-03-28 2019-10-11 常州格林感光新材料有限公司 用于金属表面的光固化组合物及包含其的组合物
CN110389499A (zh) * 2018-04-17 2019-10-29 常州格林感光新材料有限公司 一种光固化组合物及其应用

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0435531A2 (fr) * 1989-12-27 1991-07-03 International Business Machines Corporation Composition génératrice d'acide en exposition à la lumière et sensibilisateur pour celle-ci
JP2000344704A (ja) * 1999-01-29 2000-12-12 Nippon Kayaku Co Ltd 新規なアントラセン化合物、これを含有する樹脂組成物、９，１０−ジエーテル化アントラセン誘導体の製造方法
WO2007004619A1 (fr) * 2005-07-05 2007-01-11 Hitachi Chemical Company, Ltd. Composition de résine photosensitive et élément photosensible, procédé de formation d'un motif de photorésist, procédé de fabrication d'un tableau de connexions imprimé et procédé de fabrication d'une paroi de séparation pour
CN104991418A (zh) * 2015-06-24 2015-10-21 常州强力电子新材料股份有限公司 一种用于uv-led光固化的增感剂及其制备方法和应用
CN105001081A (zh) * 2015-06-24 2015-10-28 常州强力电子新材料股份有限公司 一种蒽系增感剂及其在uv-led光固化体系中的应用
CN105037587A (zh) * 2015-06-24 2015-11-11 常州强力先端电子材料有限公司 一种适用于uv-led光固化体系的增感剂

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0435531A2 (fr) * 1989-12-27 1991-07-03 International Business Machines Corporation Composition génératrice d'acide en exposition à la lumière et sensibilisateur pour celle-ci
JP2000344704A (ja) * 1999-01-29 2000-12-12 Nippon Kayaku Co Ltd 新規なアントラセン化合物、これを含有する樹脂組成物、９，１０−ジエーテル化アントラセン誘導体の製造方法
WO2007004619A1 (fr) * 2005-07-05 2007-01-11 Hitachi Chemical Company, Ltd. Composition de résine photosensitive et élément photosensible, procédé de formation d'un motif de photorésist, procédé de fabrication d'un tableau de connexions imprimé et procédé de fabrication d'une paroi de séparation pour
CN104991418A (zh) * 2015-06-24 2015-10-21 常州强力电子新材料股份有限公司 一种用于uv-led光固化的增感剂及其制备方法和应用
CN105001081A (zh) * 2015-06-24 2015-10-28 常州强力电子新材料股份有限公司 一种蒽系增感剂及其在uv-led光固化体系中的应用
CN105037587A (zh) * 2015-06-24 2015-11-11 常州强力先端电子材料有限公司 一种适用于uv-led光固化体系的增感剂

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3316036A4 (fr) * 2015-06-24 2019-02-27 Changzhou Tronly New Electronic Materials Co., Ltd Sensibilisateur pour photodurcissement par del uv, son procédé de préparation et son application
WO2019159908A1 (fr) * 2018-02-13 2019-08-22 川崎化成工業株式会社 Composé ayant un squelette aromatique polycyclique et composé endoperoxyde de celui-ci
US12065521B2 (en) 2018-02-13 2024-08-20 Kawasaki Kasei Chemicals Ltd. Compound having polycyclic aromatic skeleton, and endoperoxide compound of same
CN112898171A (zh) * 2019-12-04 2021-06-04 江苏百赛飞生物科技有限公司 可聚合自由基提氢型光引发剂及其制备方法和用途
CN112898171B (zh) * 2019-12-04 2023-07-25 江苏百赛飞生物科技有限公司 可聚合自由基提氢型光引发剂及其制备方法和用途

Also Published As

Publication number Publication date
CN107300833B (zh) 2019-12-13
CN107300833A (zh) 2017-10-27

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