[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

WO2011141996A1 - Transfer device and method, and computer program - Google Patents

Transfer device and method, and computer program Download PDF

Info

Publication number
WO2011141996A1
WO2011141996A1 PCT/JP2010/057953 JP2010057953W WO2011141996A1 WO 2011141996 A1 WO2011141996 A1 WO 2011141996A1 JP 2010057953 W JP2010057953 W JP 2010057953W WO 2011141996 A1 WO2011141996 A1 WO 2011141996A1
Authority
WO
WIPO (PCT)
Prior art keywords
mold
holding
transfer
contact surface
holding means
Prior art date
Application number
PCT/JP2010/057953
Other languages
French (fr)
Japanese (ja)
Inventor
哲也 今井
良明 小島
孝幸 糟谷
Original Assignee
パイオニア株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by パイオニア株式会社 filed Critical パイオニア株式会社
Priority to PCT/JP2010/057953 priority Critical patent/WO2011141996A1/en
Publication of WO2011141996A1 publication Critical patent/WO2011141996A1/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/30Mounting, exchanging or centering
    • B29C33/305Mounting of moulds or mould support plates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855Coating only part of a support with a magnetic layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023Microembossing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/42Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424Moulding surfaces provided with means for marking or patterning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0003Discharging moulded articles from the mould

Definitions

  • the present invention relates to a transfer device and method for transferring a concavo-convex pattern onto a surface of a transfer target by pressing a mold having a concavo-convex pattern formed on the surface of the transfer target, and a computer program technical field.
  • Patent Documents 1 and 2 disclose a configuration in which a mold is held by a mold holding unit having a flat holding surface in accordance with the back surface structure of the mold and the pressure distribution during pressing is uniform.
  • the mold When holding the mold on a flat holding surface, the mold may slide on the holding surface depending on the material and characteristics of the mold and the holding member. When the mold slides on the holding surface, it is difficult to fix the mold at a desired position on the holding member, and therefore, the alignment operation for aligning the pattern on the mold surface with the desired position on the transfer target cannot be performed properly. This leads to technical problems. Further, the mold and the holding member may be damaged due to friction caused by the sliding of the mold.
  • the present invention has been made in view of the above-described technical problems, and an object of the present invention is to provide a transfer apparatus and method, and a computer program that can suitably execute installation and holding of a mold.
  • a first transfer device of the present invention is a transfer device that transfers a pattern formed on a mold onto a transfer target, and the first transfer device holds the mold on a first contact surface.
  • the relative position with respect to the holding means is variable.
  • the second transfer apparatus of the present invention transfers the pattern formed on the first mold to the first surface of the transfer target, and the pattern formed on the second mold A transfer device for transferring to a second surface of a transfer target, wherein the first mold is held by a first contact surface, and the first mold is held by a second contact surface.
  • a third transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target.
  • First mold holding means for holding the mold on the first contact surface in accordance with an instruction from the apparatus, and second mold holding means for holding the mold on the second contact surface in accordance with an instruction from the control apparatus
  • transfer means for transferring the pattern onto the transfer target body in accordance with an instruction from the control device, and in accordance with an instruction from the control device, the first mold holding means and the second mold holding means, Change the relative position of.
  • a first transfer method of the present invention is a transfer method in a transfer apparatus that transfers a pattern formed on a mold to a transfer target, and the mold is held on the first contact surface.
  • a first holding step, a second holding step for holding the mold on a second contact surface, and a transfer step for transferring the pattern to the transfer target, the first mold holding means and the second The relative position with the mold holding means is changed.
  • the second transfer method of the present invention transfers the pattern formed on the first mold to the first surface of the transfer object, and the pattern formed on the second mold
  • a transfer device for transferring to a second surface of a transfer object wherein a first holding step of holding the first mold on a first contact surface, and a first holding step of holding the first mold on a second contact surface.
  • a computer program according to the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target, and the mold is moved on the first contact surface.
  • FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation.
  • FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation.
  • An embodiment according to the transfer apparatus of the present invention is a transfer apparatus that transfers a pattern formed on a mold to a transfer target, and includes a first mold holding unit that holds the mold on a first contact surface, and the mold.
  • the position is variable.
  • the mold held by the first mold holding means and the second mold holding means is pressed against the transfer object by the operation of the transfer means, so that the mold surface The pattern is transferred to the transfer target.
  • the first mold holding means and the second mold holding means are used to hold one mold.
  • the term “holding member” including the first mold holding means and the second mold holding means is used for the purpose of the member that holds the mold.
  • the first mold holding means of the present embodiment is a member that makes contact with the mold at the “first contact surface” and realizes holding of the mold.
  • the “first contact surface” is a surface formed by at least a portion in contact with the mold among the members constituting the first mold holding means, and typically the first mold holding means. It is a surface including all points where the component and the mold contact.
  • the first mold holding means that includes a plurality of suction nozzles, and that is in contact with the back surface of the mold at the front ends of the plurality of suction nozzles and realizes the holding by suction, formed by the front ends of the plurality of suction nozzles
  • the surface to be used becomes the first contact surface.
  • the second mold holding means of the present embodiment is a member that realizes holding of the mold by contacting the back surface of the mold at the “second contact surface”.
  • the “second contact surface” is a surface formed by at least a portion in contact with the mold among the members constituting the second mold holding means, and typically constitutes the second mold holding means. It is a surface comprising all points where the member to be in contact with the mold.
  • the 2nd mold holding means which has a flat surface and contacts the back surface of a mold in the surface, the flat surface which touches a mold serves as the 2nd contact surface.
  • the transfer unit performs an operation of pressing the mold held by the first mold holding unit and the second mold holding unit against the surface of the transfer target.
  • the pressing operation is preferably performed after an appropriate pressing force, pressing time, or other conditions are set so that the pattern formed on the mold surface is sufficiently transferred to the surface of the transfer target.
  • the transfer unit may perform the pressing operation described above by operating, for example, the first mold holding unit and the second mold holding unit.
  • the transfer unit holds the transfer target and holds the transfer target. You may implement pressing operation by making it operate
  • the transfer apparatus is configured such that the relative position between the first contact surface formed by the first mold holding unit and the second contact surface formed by the second mold holding unit changes. .
  • the first mold holding means moves relative to the second mold holding means
  • the first contact surface moves with respect to the second contact surface, and the relative positions of the first contact surface change. .
  • the relative positions of the first contact surface and the second contact surface are typically the first contact surface and the second contact surface that are formed in a state of maintaining a mutually parallel positional relationship.
  • the position in the direction perpendicular to each of these is shown. That is, the relative position between the first contact surface and the second contact surface is preferably changed in a direction perpendicular to each of the first contact surface and the second contact surface (hereinafter, “high” This is to indicate that the mutual position (hereinafter referred to as “height”) in the “direction” is changed.
  • the present invention is not limited to such a position change in the height direction, and may indicate a position change in a direction parallel to each of the first contact surface and the second contact surface.
  • the first mold holding means when holding the mold, first contacts the mold on the first contact surface to hold the first stage, and then By the relative movement of the first contact surface, the mold comes into contact with the second mold holding means on the second contact surface, and the second stage holding by the second mold holding means is performed.
  • the mold in the first stage holding, the mold only comes into contact with the first contact surface of the first mold holding means, and the first mold holding means is a part that comes into contact with the mold in the second stage holding.
  • the area is small compared to the first contact surface and the second contact surface of the second mold holding means.
  • the holding member typically contacts the mold on the back surface (that is, the non-pattern surface) of the surface on which the mold pattern is formed, and holds the mold by suction or the like.
  • the non-pattern surface of the mold is often configured as a flat surface for easy holding and for uniform pressure distribution during pressing.
  • the contact surface that contacts the mold of the holding member that holds the mold is also configured to have a flat surface that matches the shape of the non-patterned surface of the mold. For this reason, when the mold having the flat back surface is brought into contact with the holding member having a flat surface when the mold is installed on the holding member, there is a possibility that slip occurs on the contact surface between the mold and the holding member. is there. Such slipping may be caused by, for example, an air flow generated between opposing contact surfaces when the mold and the holding member are in contact with each other.
  • the mold When slip occurs on the contact surface between the mold and the holding member, the mold is not fixed at a desired position on the holding member, and the alignment operation for aligning the pattern on the mold surface with the desired position on the transfer target can be performed appropriately. Therefore, there is a possibility that the operation of the apparatus is disadvantageous such as re-installation of the mold on the holding member. For this reason, there is a possibility that the efficiency of the transfer operation is lowered and the yield is deteriorated.
  • the first stage is compared with all the parts (that is, the first contact surface and the second contact surface) prepared for holding the mold in the holding member.
  • the area of the part that comes into contact with the mold during holding (that is, the first contact surface) is relatively small.
  • the pressure exerted on the mold from the holding member at the time of contact between the mold and the holding member increases as the area of the contact surface decreases.
  • the frictional force generated on the first contact surface of the mold and the first mold holding means increases, and as a result, the occurrence of slipping in the direction parallel to the first contact surface of the mold can be suppressed.
  • the tip of the suction nozzle of the first mold holding means has the same height as the flat surface on the second mold holding means.
  • the mold contacts and holds the first mold holding means and the second mold holding means at a portion having a larger area on the second contact surface than the contact portion with the first mold holding means at the time of installation. Is done.
  • the mold is held in a wider area using both the first mold holding means and the second mold holding means as compared to when the mold and the first mold holding means are in contact with each other.
  • the mold can be pressed.
  • it is possible to make the distribution of the pressing force applied to the mold more uniform when pressing the transfer target. Therefore, transfer of a suitable pattern can be realized, which leads to an improvement in yield by the transfer device.
  • the mold holding unit further includes a mold holding control unit that controls a position of at least one of the first mold holding unit and the second mold holding unit.
  • the control means changes a distance between the mold held by the first contact surface and the second contact surface in a direction perpendicular to the first contact surface.
  • At least relative movement between the first contact surface and the second contact surface causes the positional relationship between the mold and the second contact surface to change so as to approach or separate from each other. For this reason, the above-described two-stage mold holding can be realized relatively easily.
  • the mold holding control means changes the relative positions of the first mold holding means and the second mold holding means. It is a member to make.
  • the mold holding control unit changes the relative position between the first mold holding unit and the second mold holding unit by pressing the first mold holding unit in the direction of the second contact surface of the second mold holding unit.
  • the first mold holding means includes a distance between the mold and the first contact surface, and a distance between the mold and the second contact surface. In a state where the distance is different, the mold is held, and the transfer unit is configured such that the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are equal. Is transferred to the transfer target.
  • the contact between the mold and each contact surface is different.
  • the relative position of the mold holding means defining the surface has changed.
  • the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are intended to indicate the distance between each contact surface and the mold in a direction perpendicular to each contact surface. . Therefore, the state where the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are different is that the first contact surface and the second contact surface are different from each other from the mold. It is a state to be arranged. On the other hand, when the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are equal, the first contact surface and the second contact surface are approximately the same distance from the mold. This is a state in which the first contact surface and the second contact surface are disposed on the same plane. Note that “the distances are equal” does not necessarily indicate a state in which the distances are completely coincident with each other, but the distances between the two are slightly different as long as the effects of the transfer device of the present embodiment can be enjoyed. It may be.
  • the first contact surface is disposed at a position closer to the mold than the second contact surface. Specifically, since the first mold holding means is held in contact with the mold, the distance between the first contact surface and the mold is substantially zero, while the second contact surface is against the mold. Since it is in a state of being arranged at a position different from the first contact surface, it is located at a predetermined distance from the mold and the first contact surface.
  • the first contact surface and the second contact surface are arranged at the same distance with respect to the mold. Specifically, with respect to one surface of the mold, the first mold holding means on the first contact surface and the second mold holding means on the second contact surface are in contact with each other and held, The transfer unit presses the mold against the transfer target.
  • the area of the first mold holding means that is, the area of the first contact surface
  • the area of the first mold holding means that is, the area of the first contact surface
  • the mold receives the mold at the time of contact.
  • the holding by suppressing the slip on the contact surface between the mold and the first mold holding means, it is possible to realize the holding after suitably fixing the mold at a desired position in the first mold holding means when the mold is installed. It becomes possible.
  • the control means moves the first mold holding means so that the tip of the suction nozzle of the first mold holding means is flush with the flat surface on the second mold holding means. For this reason, the mold contacts and holds the first mold holding means and the second mold holding means at a portion having a larger area on the second contact surface than the contact portion with the first mold holding means at the time of installation. Is done.
  • the mold is held in a wider area using both the first mold holding means and the second mold holding means as compared to when the mold and the first mold holding means are in contact with each other.
  • the mold can be pressed.
  • it is possible to make the distribution of the pressing force applied to the mold more uniform when pressing the transfer target. Therefore, transfer of a suitable pattern can be realized, which leads to an improvement in yield by the transfer device.
  • the first contact surface is in contact with a region where the pattern is not formed on a surface of the mold where the pattern is not formed
  • the second contact surface is in contact with a region including a region where the pattern is formed on a surface of the mold where the pattern is not formed.
  • the first mold holding means is configured and arranged to come into contact with the mold and realize holding in a region corresponding to a region where the pattern of the pattern surface is not formed on the non-pattern surface of the mold. Has been.
  • the second mold holding means is configured to contact the mold and realize holding at least in a region corresponding to a region including a region where a pattern is formed on the pattern surface in the non-pattern surface of the mold, and Has been placed.
  • the “area where the pattern is formed” on the pattern surface of the mold is intended to indicate an area where a pattern to be actually transferred is formed by being pressed against the transfer target.
  • the region to be processed may be treated as “a region where a pattern is not formed”.
  • the first mold holding means comes into contact with the mold at least in a region including a region corresponding to the region where the pattern is formed. For this reason, it is possible to realize the pressing to the transfer body through the first mold holding means so that the pressure distribution at the time of pressing on the surface on which the pattern of the mold is formed becomes uniform. For this reason, it becomes possible to appropriately transfer the pattern on the pattern surface to the transfer target, leading to an improvement in yield by the transfer device.
  • the first contact surface is in contact with the mold at an outer peripheral portion of a surface of the mold where the pattern is not formed, and the second contact surface The contact surface is in contact with the mold at the inner periphery of the surface of the mold where the pattern is not formed.
  • the first mold holding means is configured and arranged so as to come into contact with the mold at the outer peripheral portion on the back surface of the mold and to further realize the holding.
  • the second mold holding means is configured and arranged so as to come into contact with the mold and realize holding at the inner peripheral portion on the back surface of the mold.
  • the first stage holding of the mold by the first mold holding means can be performed at the outer peripheral portion of the mold, and the holding is relatively stable as compared with the holding at the inner peripheral portion. Can be realized.
  • the pattern of the mold is often provided on the inner peripheral side of the mold on the pattern surface. Therefore, by performing the first stage holding on the outer peripheral portion of the mold, the pattern on the non-pattern surface as described above. An effect equivalent to that in the case where holding is performed in a region corresponding to a region in which no is formed can be obtained.
  • the mold held by the first mold holding means is pressed so that the first in the direction perpendicular to the first contact surface is obtained.
  • the relative position between the first contact surface and the second contact surface changes.
  • the transfer device includes a pressing member such as a clamp mechanism, and moves the first mold holding means for holding the mold by pressing the mold with the clamp mechanism.
  • the clamp mechanism presses the mold in the direction from the first contact surface toward the second contact surface against the mold in contact with the first mold holding unit on the first contact surface.
  • the first mold holding means moves in the direction of the second contact surface by this pressing force, and the relative position between the first contact surface and the second contact surface formed by the first mold holding means changes. .
  • the first contact surface and the second contact surface are the same surface.
  • the clamp mechanism mentioned above is a structure which adds pressing force with respect to a mold, it can be used also for the purpose of strengthening holding
  • the transfer device of the present embodiment it is possible to confirm whether or not the mold is in contact with the first mold holding means from the position of the first mold holding means. That is, since the first mold holding means moves in accordance with the mold contact and holding mode, the mold is moved to the first mold holding means by detecting the position of the first mold holding means and the applied pressure. It is possible to detect whether contact has been made.
  • sensors such as a pressure sensor for detecting whether a mold is contacting each mold holding means, Preferably it is for detecting the position and pressure of a 1st mold holding means.
  • a device such as a pressure sensor in a portion of the first mold holding means and the second mold holding means that contacts the mold. For this reason, even when heating or UV light irradiation is performed to cure the transfer layer of the transfer target, it is possible to place sensors in a position that is not affected by heat or UV light. There is no need for a special structure to prevent the effects of heat and UV light on the varieties. Further, by arranging the sensors at a position other than the portion in contact with the mold in the first mold holding means and the second mold holding means, the structure of each holding means can be made relatively simple.
  • the first mold holding means may be supported by an elastic member provided between the second mold holding means.
  • the vertical position between the first contact surface and the second contact surface of the first mold holding means can be changed with the deformation of the elastic member.
  • the tip of the first mold holding means protrudes from the surface of the second mold holding means to form the first contact surface.
  • the elastic member of this aspect is an elastic body that generates an elastic force corresponding to a predetermined spring coefficient in response to an external force such as pressing due to mechanical or some other factor.
  • the pressing force of the clamp mechanism and the elastic force of the elastic member are set so that at least the first contact surface formed by the tip of the first mold holding means has the same height as the second contact surface.
  • Various conditions are set. In other words, when the elastic member is deformed so that the first contact surface formed by the first mold holding means is at the same height as the second contact surface, the elastic force of the elastic member is It is set to balance with pressure.
  • the second mold holding means may have a recess in the second contact surface, and the first mold holding means may be supported by the elastic member in the recess.
  • the structure which makes a 1st contact surface and a 2nd contact surface the same surface by a comparatively simple structure by adjusting the depth of a recessed part and the elastic coefficient and size of an elastic member. It can be realized.
  • the first mold holding means holds the mold by suction.
  • the first mold holding means in this aspect is, for example, an adsorption member having an adsorption groove connected to a vacuum pump or the like, and the adsorption portion comes into contact with the negative pressure in the adsorption groove due to the operation of the vacuum pump.
  • the mold surface (that is, the back surface of the surface on which the pattern in the mold is formed) is adsorbed. By such an adsorbing portion, holding of the mold is realized.
  • the first mold holding means may realize holding of the mold by using other holding members in addition to such holding members by suction.
  • the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object.
  • a transfer device for transferring to a second surface wherein the first mold holding means for holding the first mold on a first contact surface, and the second mold holding means for holding the first mold on a second contact surface.
  • a transfer means for transferring, the relative positions of the first mold holding means and the second mold holding means being variable, and the relative relationship between the third mold holding means and the fourth mold holding means. The position is variable.
  • the transfer apparatus of the present invention has means for holding two molds, a first mold holding means for holding the first mold and a second mold holding means for holding the second mold. .
  • the first mold was pressed against the first surface of the transferred body and the second mold was pressed against the second surface of the transferred body, thereby forming each mold.
  • Pattern transfer is performed on both sides of the transfer object.
  • each pressing may be performed in succession, or may be performed simultaneously.
  • the transfer object is sandwiched between the first mold and the second mold, and the transfer is performed simultaneously by pressing from both surfaces. You may do it.
  • the third embodiment according to the transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target, and in response to an instruction from the control device.
  • a transfer unit that transfers the pattern to the transfer target according to the instruction of the control unit, and a relative position between the first mold holding unit and the second mold holding unit according to the instruction of the control device.
  • the same operation can be performed.
  • mode which concern on the transfer apparatus of this invention mentioned above can be enjoyed.
  • 1st Embodiment which concerns on the transfer method of this invention is a transfer method in the transfer apparatus which transfers the pattern formed in the mold to a to-be-transferred body, Comprising: The 1st holding process hold
  • the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object.
  • a transfer device that transfers to the second surface, a first holding step of holding the first mold on a first contact surface, a second holding step of holding the first mold on a second contact surface, A third holding step for holding the second mold on a third contact surface; a fourth holding step for holding the second mold on a fourth contact surface; and a transfer step for transferring the pattern to the transfer target. And changing at least one of a relative position between the first mold holding means and the second mold holding means and a relative position between the third mold holding means and the fourth mold holding means. .
  • An embodiment according to the computer program of the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target, and the first is to hold the mold on a first contact surface. Causing the transfer device to execute a holding step, a second holding step for holding the mold on a second contact surface, and a transfer step for transferring the pattern to the transfer target, and the first mold holding means and the The relative position with respect to the second mold holding means is changed.
  • the computer program is read from a recording medium such as a ROM, a CD-ROM, a DVD-ROM, and a hard disk that stores the computer program, and executed. If the computer program is executed after being downloaded to the computer via the communication means, the transfer apparatus can execute the various operations in the first embodiment according to the transfer method of the present invention described above relatively easily. I can do it.
  • the first embodiment and the third embodiment according to the transfer apparatus of the present invention include the first mold holding means, the second mold holding means, and the transfer means.
  • the second embodiment according to the transfer apparatus of the present invention includes a first mold holding means, a second mold holding means, a third mold holding means, a fourth mold holding means, and a transfer means.
  • the first embodiment according to the transfer method of the present invention includes a first mold holding step, a second mold holding step, a transfer step, and mold holding control.
  • the second embodiment according to the transfer method of the present invention includes a first mold holding step, a second mold holding step, a third mold holding step, a fourth mold holding step, a transfer step, and a first mold holding control. A process and a second mold holding control process.
  • the embodiment according to the computer program of the present invention causes the transfer device to execute the first mold holding step, the second mold holding step, the transfer step, and the mold holding control. Therefore, it is possible to provide a transfer device capable of suppressing a slip of the mold on the contact surface between the member holding the mold and the mold in the transfer device and performing a suitable transfer operation.
  • FIG. 1 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 which is an embodiment of a transfer apparatus of the present invention.
  • the imprint apparatus 1 shown in FIG. 1 is a UV-type transfer apparatus that transfers a pattern on a mold to a transfer target having a transfer layer that is cured by UV irradiation. Further, the imprint apparatus 1 uses the lower mold 200a and the upper mold 200b on which patterns such as unevenness to be transferred are formed, and the lower transfer layer 301a and the upper surface formed on the lower surface of the substrate 300 that is a transfer target. In this configuration, transfer is performed on both of the upper transfer layer 301b formed on the substrate.
  • FIG. 1 shows the imprint apparatus 1 in a state where the lower mold 200a, the upper mold 200b, and the substrate 300 are installed.
  • the lower mold 200a has a disk shape having a center hole in the center or a shape similar to the disk, and a pattern such as irregularities is formed near the center hole on the pattern surface.
  • a pattern area is constructed.
  • At least a portion corresponding to the pattern region of each mold is made of a material that transmits UV light, such as quartz glass, and is preferably hardly affected by a change in character due to irradiation with UV light.
  • the outside of the pattern area on the pattern surface is referred to as a non-pattern area.
  • the upper mold 200b has the same configuration as the lower mold 200a.
  • the pattern surface of the lower mold 200a and the upper mold 200b is subjected to a surface treatment for the purpose of improving mold releasability of the mold and the substrate at the time of mold release described later, for example, a surface treatment with a silane coupling agent or the like, A release layer having a thickness of a single molecule to several molecules is formed.
  • the lower mold 200a is a specific example of the “mold” or “second mold” of the present invention
  • the upper mold 200b is a specific example of the “mold” or “first mold” of the present invention. It is an example.
  • the substrate 300 has a disk-like shape having a center hole whose diameter is smaller than the center hole of the mold at the center, and has a lower transfer layer 301a and an upper transfer layer 301b made of a material that is cured by UV irradiation on the lower surface and the upper surface. .
  • the imprint apparatus 1 connects a lower mechanism part A including a lower base 110a, an upper mechanism part B including an upper base 110b, and the lower base 110a and the upper base 110b.
  • a ball screw 101 that rotates
  • an actuator 104 that rotates the ball screw
  • a control unit 102 that controls the operation of the lower mechanism unit A and the upper mechanism unit B
  • an operation unit that can input user instructions to the control unit 102 103.
  • the lower mechanism A is provided on the upper surface of the lower base 110a, and includes a lower center pin 120a, a lower UV irradiation unit 130a, a lower center pin driving unit 140a, a lower mounting table 150a, A side mold holding part 152a and a lower mold clamp 153a are provided.
  • the lower base 110a is a member on the board.
  • the lower base 110a is provided with a lower mounting table 150a and a lower opening 151a, and has a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut. .
  • the lower center pin 120a is a member having a cylindrical tip portion 121a, a substrate support portion 122a, and a mold support portion 123a having different diameters.
  • the lower center pin 120a is connected to a lower center pin driving unit 140a, which will be described later, and penetrates a center hole and a lower opening 151a of the lower mounting table 150a, which will be described later. It is supported so as to be perpendicular to the surface Sa2.
  • the diameter of the tip 121a of the lower center pin 120a is smaller than the diameter of the substrate support 122a and the center hole of the substrate 300 described later.
  • the diameter of the substrate support portion 122a is larger than the diameter of the center hole of the substrate 300, and smaller than the diameters of the center holes of the mold support portion 123a, the lower mold 200a and the upper mold 200b described later.
  • the diameter of the mold support part 123a is larger than the diameters of the center holes of the lower mold 200a and the upper mold 200b and smaller than the diameters of the center hole and the lower opening 151a of the lower mounting table 150a.
  • the lower UV irradiation unit 130a is electrically connected to the control unit 102 via a signal line (not shown), and the lower transfer layer 301a of the substrate 300 is applied in accordance with a control signal supplied from the control unit 102.
  • the lower transfer layer 301a of the substrate 300 is irradiated with UV light to be cured through the lower opening 151a and the UV light transmission region of the lower mounting table 150a described later.
  • the lower UV irradiation unit 130a may be configured to be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
  • the lower center pin driving unit 140a moves the lower center pin 120a in the axial direction, that is, in a direction perpendicular to the lower mold holding surface Sa2 of the lower mounting table 150a in accordance with a control signal supplied from the control unit 102. To do.
  • the lower center pin driving unit 140a moves the lower center pin 120a vertically upward when releasing the lower mold 200a and the substrate 300 after a transfer operation described later. In this configuration, the mold is released from the mold 200a.
  • the lower mounting table 150a is the "second mold holding means" of the present invention in the lower mechanism portion A according to the first embodiment of the transfer apparatus, or the “fourth mold holding means” according to the second embodiment of the transfer apparatus. And has a flat lower mold holding surface Sa2 for holding the lower mold 200a, and the lower mold holding surface Sa2 is provided with a center hole at the center, A side mold holding part 152a and a lower mold clamp 153a are provided. Further, the lower mold holding surface Sa2 of the lower mounting table 150a is typically configured wider than the pattern area of the lower mold 200a.
  • the lower mounting table 150a is configured to be movable in two-dimensional directions (X, Y) of the lower mold holding surface Sa2 in order to align the lower mold 200a and the substrate 300.
  • the lower mold holding surface Sa2 is a specific example of the second contact surface in the lower mechanism portion of the present embodiment, and the lower mounting table 150a is used when holding the lower mold 200a as described later.
  • the lower mold holding surface Sa2 comes into contact with the mold
  • the region corresponding to the region where the pattern of the lower mold 200a to be mounted is formed is transparent to UV light such as quartz glass, and has a phenotypic change by irradiation with UV light. This is a UV light transmission region made of a material that is difficult to generate.
  • the opening 151a of the lower base 110a is formed in a region corresponding to the UV light transmission region of the lower mounting table 150a.
  • the lower mold holding part 152a is the "first mold holding means" of the present invention in the lower mechanism part A according to the first embodiment of the transfer device, or the “third mold holding means” according to the second embodiment of the transfer device.
  • a lower suction portion 154a having a lower suction groove 155a for holding the lower mold 200a by vacuum suction or the like, and an elastic member 156a that supports the lower suction portion 154a.
  • FIG. 2B shows the lower mounting table 150a upward (more specifically, vertically upward with respect to the lower mold holding surface Sa2, hereinafter referred to as a vertically upward direction or simply upward). It is a schematic diagram which shows arrangement
  • the lower suction portion 154a is formed in a corresponding region of the lower mold holding surface Sa2 so as to perform suction at the outer peripheral edge portion of the lower mold 200a to be placed. Arranged in the groove.
  • the lower suction portion 154a is preferably configured with, for example, a flexible resin member so as not to damage the lower mold 200a at the contact portion.
  • the tip of the lower suction portion 154a (that is, the portion where the lower suction groove 155a for sucking the lower mold 200a is formed) is the first mechanism of the present invention in the lower mechanism portion A.
  • a lower mold suction surface Sa1 that is in contact with the lower mold 200a is formed.
  • the lower suction groove 155a is configured to be able to suck the lower mold 200a to the lower suction portion 154a by reducing the atmospheric pressure in the groove by the operation of a decompression mechanism (not shown) such as a connected vacuum pump.
  • a decompression mechanism such as a connected vacuum pump.
  • the elastic member 156a is disposed in a groove formed in the lower mold holding surface Sa2, and supports the lower suction portion 154a.
  • the elastic member 156a is configured to be able to bias an elastic force between the lower suction portion 154a and the lower mounting table 150a by a member having elasticity such as a resin or a mechanical structure such as a spring. Due to the presence of the elastic member 156a, the lower suction portion 154a is pressed vertically downward by, for example, a lower mold clamp 153a described later, so that the force for pressing and the elastic force from the elastic member 156a are balanced. Move to position.
  • the lower mold clamp 153a is a clamp mechanism that is provided on the outer peripheral edge portion further than the position on the lower mounting table 150a where the lower mold 200a is mounted.
  • the lower mold clamp 153a is configured to hold the lower mold 200a by pressing the non-pattern area of the lower mold 200a downward with pressure according to a control signal from the control unit 102. Further, the lower mold clamp 153a presses the lower mold 200a with a force stronger than the pressing force required to hold the lower mold 200a in accordance with a control signal from the control unit 102, thereby lowering the lower mold.
  • the lower mold 200a can be elastically deformed together with the elastic member 156a of the holding portion 152a.
  • the pressing force for holding the mold is described as holding force
  • the pressing force for deforming the mold is described as deformation force.
  • FIG. 2C is a schematic view of the lower mold clamp 153a in a state where the lower mold 200a is being pressed as viewed from the vertically upward direction, and further illustrates the arrangement position of the upper mold clamp 153b described later. It is a figure.
  • the lower mold clamp 153a is composed of a plurality of arc-shaped members arranged concentrically with the lower mold 200a in accordance with the disk shape in order to press the lower mold 200a.
  • the upper mold clamp 153b is also composed of a plurality of arc-shaped members arranged on the same circle. Further, as shown in FIG. 2C, the lower mold clamp 153a and the upper mold clamp 153b are configured such that respective arc-shaped fan-shaped members are mutually inserted and are parallel to the lower mold holding surface Sa2. Even when projecting onto a surface, they are arranged so as not to overlap each other.
  • the upper mechanism B is provided on the lower surface of the upper base 110b, and includes an upper center pin 120b, an upper UV irradiation unit 130b, an upper center pin driving unit 140b, an upper mounting table 150b, an upper mold holding unit 152b, And an upper mold clamp 153b.
  • the upper base 110b is a member on the board, and is provided with an upper mounting table 150b and an upper opening 151b, and there is a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut.
  • the upper center pin 120b is a cylindrical member having a tip portion having a diameter similar to that of the substrate support portion 122a of the lower center pin 120a.
  • the upper center pin 120b is connected to an upper center pin driving unit 140b, which will be described later, and penetrates the center hole and the upper opening 151b of the upper mounting table 150b, which will be described later, and the lower mold holding surface Sa2 and the upper side, which will be described later. It is supported so as to be perpendicular to the mold holding surface Sb2.
  • the upper UV irradiation unit 130b is electrically connected to the control unit 102 via a signal line (not shown) and the like, and the upper transfer layer 301b of the substrate 300 is cured in accordance with a control signal supplied from the control unit 102.
  • the upper transfer layer 301b of the substrate 300 is irradiated with UV light through the upper opening 151b and a UV light transmission region of the upper mounting table 150b described later.
  • the upper UV irradiation unit 130b may be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
  • the upper center pin driving unit 140b moves the upper center pin 120b in the axial direction, that is, in a direction perpendicular to the upper mold holding surface Sb of the upper mounting table 150b in accordance with a control signal supplied from the control unit 102.
  • the upper center pin driving unit 140b presses the upper center pin 120b in the vertical downward direction when the upper mold 200b and the substrate 300 after the transfer operation described later are released, thereby causing the vertical position of the substrate 300 to move. Is fixed.
  • the upper mounting table 150b is one of the “second mold holding means” of the present invention in the upper mechanism portion A according to the first embodiment of the transfer apparatus or the “second mold holding means” according to the second embodiment of the transfer apparatus. It is a specific example, and has a flat upper mold holding surface Sb2 for holding the upper mold 200b.
  • the upper mold holding surface Sb2 is provided with a center hole at the center, and an upper mold holding portion 152b.
  • An upper mold clamp 153b is provided.
  • the upper mold holding surface Sb2 of the upper mounting table 150b is typically configured to be wider than the pattern area of the upper mold 200b.
  • the upper mounting table 150b is configured to be movable in two-dimensional directions (X, Y) of the upper mold holding surface Sb2 in order to align the upper mold 200b and the substrate 300.
  • the upper mold holding surface Sb2 is a specific example of the fourth contact surface in the upper mechanism portion B of the present embodiment, and the upper mounting table 150b has an upper side when holding the upper mold 200b, as will be described later.
  • the mold holding surface Sb2 comes into contact with the mold.
  • the upper mounting table 150b At least a region corresponding to a region where the pattern of the upper mold 200b to be mounted is formed transmits UV light such as quartz glass, and changes in characteristics are caused by irradiation of the UV light. This is a UV light transmission region made of a difficult material.
  • the opening 151b of the upper base 110b is formed in a region corresponding to the UV light transmission region of the upper mounting table 150b.
  • the upper mold holding part 152b is a specific example of the “first mold holding unit” according to the first embodiment of the transfer device of the present invention or the “first mold holding unit” according to the second embodiment of the transfer device.
  • an upper suction part 154b having an upper suction groove 155b for holding the upper mold 200b by vacuum suction or the like, and an upper elastic member 156b that supports the upper suction part 154b.
  • Each of the upper suction portion 154b, the upper suction groove 155b, and the upper elastic member 156b has the same configuration as the lower suction portion 154a, the lower suction groove 155a, and the lower elastic member 156a of the upper mechanism portion A.
  • the upper mold clamp 153b is a clamp mechanism that is provided at the outer peripheral edge portion further than the position on the upper mounting table 150b where the upper mold 200b is mounted.
  • the upper mold clamp 153b is configured to hold the upper mold 200b by pressing the non-pattern area of the upper mold 200b upward with pressure according to a control signal from the control unit 102. Further, the upper mold clamp 153b presses the upper mold 200b with a force stronger than the pressing force necessary to hold the upper mold 200b in accordance with a control signal from the control unit 102, so that the upper mold holding unit 152b
  • the upper mold 200b can be elastically deformed together with the upper elastic member 156b.
  • the tip of the upper suction portion 154b (that is, the portion where the upper suction groove 155b that sucks the upper mold 200b is formed) is a specific example of the first contact surface in the upper mechanism portion B of the present embodiment.
  • the upper mold suction surface Sb1 that contacts the upper mold 200b is formed.
  • the control unit 102 is an information processing apparatus such as a CPU (Central Processing Unit), for example, and is a specific example of the “mold holding control unit” in the present embodiment.
  • a CPU Central Processing Unit
  • the control unit 102 determines the lower UV irradiation unit 130a, the lower center pin driving unit 140a, and the lower side of the lower mechanism unit A according to an input signal indicating a user instruction supplied from the operation unit 103.
  • Control signals for controlling the operations of the mold clamp 153 a, the upper UV irradiation unit 130 b of the upper mechanism B, the upper center pin driving unit 140 b and the upper mold clamp 153 b, and the actuator 104 are supplied.
  • the operation unit 103 includes a plurality of buttons or a keyboard that can input an instruction by the user, and supplies an input signal corresponding to the input user instruction to the control unit 102.
  • the control unit 102 reads an operation processing program stored in an internal memory or the like according to the input signal, generates a control signal according to the instruction, and supplies the control signal to each unit.
  • the actuator 104 is a mechanism such as a motor that can move the upper mounting table 150b toward or away from the lower mounting table 150a in accordance with a control signal supplied from the control unit 102. Specifically, the actuator 104 rotates the ball screw 101 in accordance with a control signal supplied from the control unit 102, whereby the upper base 110b engaged with the ball screw 101 is changed to the upper mounting base 150b and the lower mounting base. It moves in the vertical direction while maintaining the parallel positional relationship with 150a. At this time, for example, four ball screws 101 are provided so as to connect the four corners of the lower base 110a and the upper base 110b, and a plurality of actuators 104 are also provided to rotate the corresponding ball screws 101. Yes.
  • the actuator 104 by moving the upper base 110b in the vertical upward direction, the upper mounting base 150b is separated from the lower mounting base 150a, and the upper base 110b is moved in the vertical downward direction.
  • the upper mounting table 150b comes close to the lower mounting table 150a.
  • the actuator 140 moves the upper mounting table 150b vertically downward in a transfer operation described later, thereby pressing the upper mold 200b and the substrate 300 to each other, and further pressing the lower mold 200a and the substrate 300 to each other. To do.
  • the actuator 104 moves the upper mold table 150b vertically upward while holding the upper mold 200b when the upper mold 200b and the substrate 300 after the transfer operation described later are released. Release from the substrate 300.
  • FIG. 3 is a schematic transmission diagram when the lower base 110a, the lower mechanism A, and the surrounding configuration are viewed from the vertically upward direction. Note that FIG. 3 does not show the lower mold holding portion 152a and the lower mold clamp 153a provided on the lower mounting table 150a.
  • a side mounting table 150a is arranged.
  • a circular opening 151a is formed in a central portion of the lower base 110a and at least a portion corresponding to a pattern region of the lower mold 200a placed on the lower placement base 150a.
  • a lower UV irradiation part 130a is formed below the part 151a.
  • the actuator 104 is connected to each of the pole screws 101 arranged at the four corners of the lower base 110a, and the pole screws are rotated based on a control signal from the control unit 102.
  • the upper base 110b and the upper mechanism B are also configured in the same manner as the lower base 110a and the lower mechanism A, and are vertically upward from the lower base 110a at the four corners of the square upper base 110b.
  • Four pole screws 101 extending in the direction are screwed together.
  • FIGS. 4A to 4C are schematic views showing the structures of the lower mounting table 150a and the lower mold holding part 152a in plan, respectively.
  • the front end portion of the lower suction portion 154a held by the lower elastic member 156a is positioned vertically upward with respect to the lower mold holding surface Sa2 of the lower mounting table 150a.
  • the surface formed by the tip of the lower suction portion 154a shown in FIG. 4A (that is, the portion where the lower suction groove 155a for sucking the lower mold 200a is formed) is defined as the lower mold suction surface. Sa1.
  • the surface of the lower mounting table 150a that is in contact with the lower mold 200a, and preferably the surface formed by the region on the lower mold holding surface Sa2, is referred to as the lower mold holding surface Sa2.
  • the lower mold suction surface Sa1 is a specific example of the first contact surface in the present embodiment, and the lower suction portion 154a constitutes a specific example of the first mold holding means in the present embodiment.
  • the lower mold holding surface Sa2 is a specific example of the second contact surface in the present embodiment, and the lower mounting table 150a constitutes a specific example of the second mold holding means in the present embodiment.
  • the lower mold suction surface Sa1 and the lower mold holding surface Sa2 form a lower mold holding surface Sa2 with respect to the lower mold 200a held at least on the lower mold suction surface Sa1.
  • the side mounting tables 150a are separated so as not to contact each other.
  • the distance between the two is preferably 100 micrometers or more.
  • the lower suction portion 154a is connected to the lower mounting table 150a by a lower elastic member 156a. At least the lower elastic member 156a is, for example, pressed so that the tip of the lower suction portion 154a has the same height as the lower mold holding surface Sa2 in the lower mounting table 150a (that is, the lower mold suction surface). It is made of a deformable material (so that Sa1 has the same height as the lower mold holding surface Sa2).
  • the lower elastic member 156a is adjusted with a stripper bolt or shim.
  • the lower elastic member 156a preferably has a structure in which galling is unlikely to occur on the contact surface with the lower mounting table 150a.
  • the lower elastic member 156a is made of a metal material different from that of the lower mounting table 150a,
  • a combination of shafts and a retainer structure are employed.
  • the lower elastic member 156a is not limited to the deformable material shown above, and may be a mechanical mechanism that can be similarly deformed or moved.
  • the control unit 102 operates the lower mold 200a placed on the lower suction part 154a by operating a vacuum pump (not shown) or the like.
  • the inside of 155a is depressurized and adsorbed.
  • the lower mold 200a is held by suction on the lower mold suction surface Sa1.
  • control unit 102 operates the lower mold clamp 153a and presses the lower mold 200a against the lower mounting table 150a in the vertical lower direction, so that the space between the lower mold clamp 153a and the lower mounting table 150a is increased.
  • the lower mold 200a is pressed vertically downward (arrow direction in FIG. 4C) by the lower mold clamp 153a, so that the lower elastic member 156a pressed through the lower mold 200a is pressed. Deformation occurs, and the lower suction part 154a is pushed vertically downward. As shown in FIG.
  • the distal end portion of the lower suction portion 154a that has been pushed in (that is, the portion that forms the lower mold suction surface Sa1) is located at the lower mold holding surface Sa2 of the lower mounting table 150a.
  • the lower mold suction surface Sa1 and the lower mold holding surface Sa2 become the same height.
  • the lower mounting table 150a and the lower mold holding part 152a are not limited to the structure shown in FIG. 4A, and any structure may be used as long as the above-described operation can be performed.
  • the lower mounting table 150a has a predetermined upper surface on the upper surface in a direction perpendicular to the outer peripheral side from the outer diameter of the substrate 300 and toward the peripheral edge. It may be a step structure having a depth. The depth of the step structure may be arbitrarily set according to the distance between the lower mold suction surface Sa1 and the lower mold holding surface Sa2, and at least the lower mold 200a held on the lower mold suction surface Sa1.
  • the lower mounting table 150a is not in contact, for example, 100 micrometers apart.
  • the shape of the step structure is such that the lower mold holding surface 150a is not in contact with the lower mold 200a held on the lower mold suction surface Sa1, and the lower mold clamp surface 153a is operated to operate the lower mold suction surface. Any shape may be used as long as it does not hinder Sa1 and the lower mold holding surface Sa2 from having the same height.
  • the lower mounting table 150a may be formed of different members at the position where the lower elastic member 156a and the lower suction portion 154a are arranged.
  • the hatched portion on the inner peripheral side from the lower elastic member 156a and the lower suction portion 154a is formed of a transparent material such as quartz glass, and the plain portion on the outer peripheral side is a metal material It is good also as a structure which comprises by combining both. With such a structure, the shape processing of the lower mounting table 150a becomes easier, which is effective in terms of cost reduction in the apparatus configuration.
  • Each of the upper mounting table 150b and the upper mold holding unit 152b may have a structure according to the structure of the lower mounting table 150a and the lower mold holding unit 152a.
  • the structures of the upper mounting table 150b, the upper mold holding part 152b, and the upper mold clamp 153b may be the same as those of the lower mechanism part A unless otherwise specified.
  • FIG. 5 is a flowchart showing a series of transfer operations performed by the imprint apparatus 1
  • FIGS. 6 and 7 are diagrams schematically showing the operation of each part of the imprint apparatus 1 in each process during the transfer operation. is there.
  • the operation flow of each process shown in the flowchart of FIG. 5 will be described with reference to the operation of the imprint apparatus 1 shown in FIGS. 6 and 7.
  • the lower elastic member 156a of the lower mold holding portion 152a is not deformed, and the lower suction portion 154a is held on the lower mold in the lower mounting table 150a. It protrudes vertically upward from the surface Sa2 (in other words, the lower mold holding surface Sa2) to form the lower mold suction surface Sa1.
  • the upper elastic member 156b of the upper mold holding portion 152b is not deformed, and the upper suction portion 154b is vertically below the upper mold holding surface Sb2 (in other words, the upper mold holding surface Sb2) of the upper mounting table 150b. Projecting in the direction to form the upper mold suction surface Sb1.
  • step S101 first, the upper mold 200b is moved by the operation of a mold conveying device (not shown) so that the tip 121a of the lower center pin 120a penetrates the center hole of the upper mold 200b. It is installed on the mold support part 123a (FIG. 6 [state 2]).
  • the control unit 102 operates the actuator 104 so that the upper mold suction surface Sb1 of the upper suction unit 154b is in contact with the upper surface of the upper mold 200b (that is, the back surface of the surface on which the pattern is formed).
  • the mounting table 150b is moved vertically downward.
  • the control unit 102 operates a decompression unit (not shown) and the like so that the upper mold 200b is moved by the upper suction part 154b of the upper mounting table 150b. Adsorb and hold.
  • the control unit 102 transmits a control signal to the upper mold clamp 153b and fixes the upper mold 200b to the upper mounting table 150b by pressing the upper mold 200b vertically upward (FIG. 6 [State 3]).
  • the upper elastic member 156b is deformed by being pressed by the upper mold clamp 153b, and the front end portion of the upper suction portion 154b is disposed at the same height as the upper mounting table 150b. That is, the upper mold suction surface Sb1 formed by the upper suction portion 154b and the upper mold holding surface Sb2 formed by the upper mounting table 150b have the same height.
  • step S102 the lower mold 200a is attached to the imprint apparatus 1 (step S102). More specifically, in step S102, first, the lower mold 200a is moved in such a manner that the front end portion 121a of the lower center pin 120a penetrates the center hole of the lower mold 200a by an operation of a not-shown mold conveyance device or the like. Then, the lower center pin 120a is installed on the mold support part 123a (FIG. 6 [state 5]).
  • the control unit 102 operates the lower center pin driving unit 140a so that the lower mold suction surface Sa1 of the lower suction unit 154a is the lower surface of the lower mold 200a (that is, the back surface of the surface on which the pattern is formed). ), The lower center pin 120a is moved vertically downward. After the lower mold suction surface Sa1 of the lower suction part 154a and the lower mold 200a come into contact with each other, the control unit 102 operates a decompression unit (not shown) to lower the lower suction part 154a of the lower mounting table 150a. The upper mold 200a is adsorbed and held.
  • the control unit 102 transmits a control signal to the lower mold clamp 153a and presses the lower mold 200a vertically downward to fix it to the lower mounting table 150a (FIG. 6 [state 6]). .
  • the lower elastic member 156a is deformed by being pressed by the lower mold clamp 153a, and the tip of the lower suction portion 154a is disposed at the same height as the lower mounting table 150a. That is, the lower mold suction surface Sa1 formed by the lower suction portion 154a and the lower mold holding surface Sa2 formed by the lower mounting table 150a have the same height.
  • the substrate 300 is placed on the substrate support portion 122a of the lower center pin 120a so that the tip 121a of the lower center pin 120a penetrates the center hole of the substrate 300. (Step S103, FIG. 6 [State 7]).
  • the control unit 102 may align the lower mold 200a and the upper mold 200b with the substrate 300 as necessary.
  • control unit 102 transmits a control signal to the lower mold clamp 153a, and gradually increases the force pressing the lower mold 200a from the holding force to the deforming force, thereby deforming the lower mold 200a.
  • control unit 102 transmits a control signal to the upper mold clamp 153b, and gradually increases the force pressing the upper mold 200b from the pressing force to the deformation force, thereby deforming the upper mold 200b. (Step S104, FIG. 6 [State 8]).
  • control unit 102 operates the lower center pin driving unit 140a to move the lower center pin 120a vertically downward, and the pattern of the lower transfer layer 301a and the lower mold 200a to be supported is supported. The surface is brought into contact (step S105, FIG. 7 [state 9]). Further, the control unit 102 operates the actuator 104 to move the upper mounting table 150b vertically downward to bring the pattern surface of the upper mold 200b into contact with the upper transfer layer 301b of the substrate 300 (FIG. 7 [state] 10]).
  • each mold and the contact with the substrate 300 may be performed in the above-described order. Also, the deformation of the lower mold 200a, the contact between the lower mold 200a and the substrate 300, the deformation of the upper mold 200b, You may perform from one side in the order of contact with the upper mold 200b and the board
  • control unit 102 After the contact between each mold and the substrate 300, the control unit 102 transmits a control signal to the lower mold clamp 153a and the upper mold clamp 153b, and gradually reduces the pressing force pressing each mold from the deformation force to the holding force. The deformation of each mold is released (step S106, FIG. 7 [state 11]).
  • control unit 102 operates the actuator 104 to move the upper mounting table 150 b vertically downward, and the upper mold 200 b is moved to the upper transfer layer 301 b on the upper surface of the substrate 300, and the lower mold 200 a is moved to the lower surface of the substrate 300.
  • the lower transfer layer 301a is pressed with a predetermined pressing force (step S107).
  • control unit 102 emits UV light from the lower UV irradiation unit 130a and the upper UV irradiation unit 130b in order to cure the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 while maintaining the pressed state.
  • the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 are cured in accordance with the pattern formed on the surface of each mold, and the pattern is transferred (step S108).
  • the pressure and pressing time during pressing, the intensity of UV irradiation, and the irradiation time are appropriately set according to the characteristics of the transfer layer.
  • a mold release process for releasing the lower mold 200a and the upper mold 200b from the substrate 300 is performed.
  • the control unit 102 first stops the operation of the actuator 104 that presses the upper mounting table 150b, and releases the pressing state between each mold and the substrate 300. At the same time or before and after, the control unit 102 operates the upper center pin driving unit 140b so that the tip of the upper center pin presses the substrate 300 vertically downward at a predetermined pressure (Step S109, FIG. 7 [ State 12]).
  • the control unit 102 controls the driving modes of the lower center pin driving unit 140a and the upper center pin driving unit 140b so that excessive pressure is not applied to the sandwiched substrate 300.
  • control unit 102 performs deformation of the lower mold 200a and the upper mold 200b by the same operation as the above-described step S104 (step S110, FIG. 7 [state 13]). At this time, the pressing force of each mold clamp is controlled to gradually increase from the holding force to the deformation force.
  • the control unit 102 operates the upper center pin 120b and the actuator 104 to move the upper mounting table 150b to the initial position in the vertical upward direction.
  • the upper mold 200b moves vertically upward while being held by the upper mounting table 150b, while the substrate 300 is pressed vertically downward (in other words, fixed) by the upper center pin 120b. Therefore, the upper mold 200b and the upper transfer layer 301b of the substrate 300 are released (Step S111, FIG. 7 [State 14]).
  • the control unit 102 fixes the position of the lower center pin 120a and controls the force with which the upper center pin 120b presses the substrate 300 in the vertical downward direction by torque control.
  • control unit 102 holds the upper center pin 120b and the lower center pin 120a holding the substrate 300 up to the initial position of the lower center pin 120a in the vertical upward direction while maintaining the state in which the substrate 300 is held.
  • the lower mold 200a and the substrate 300 are released from each other (step S112, FIG. 7 [state 15]).
  • control unit 102 changes the pressing force of the upper mold clamp 153b and the lower mold clamp 153a to the holding force for holding the mold, and releases the deformation of the lower mold 200a and the upper mold 200b. (Step S113, FIG. 7 [State 16]).
  • step S114 The substrate 300 released from the lower mold 200a and the upper mold 200b is removed from the lower center pin 120a by an operation of a substrate transfer device (not shown) (step S114).
  • step S115: No when performing transfer using the same lower mold 200a and upper mold 200b for another substrate 300 (step S115: No), the steps from step S103 to step S114 for placing the substrate 300 are performed. Run repeatedly. After all the transfer is completed (step S115: Yes), the lower mold 200a is removed (step S116) and the upper mold 200b is removed (step S117) by an operation of a mold conveyance device (not shown).
  • the lower mold 200a and the upper mold 200b are placed on the surfaces of the transfer surfaces 301a and 301b of the substrate 300.
  • the formed pattern is transferred.
  • the upper suction unit 154b is not pressed by the upper mold clamp 153b in the upper mold 200b direction ( That is, it protrudes vertically downward). For this reason, in the [state 3] where the upper suction portion 154b comes into contact with and sucks the upper mold 200b, the upper mold suction surface Sb1 formed by the upper suction portion 154b is the upper mold holding surface Sb2 formed by the upper mounting table 150b. More apart.
  • the lower mold suction surface Sa1 formed by the lower suction unit 154a is the lower side formed by the lower mounting table 150a. It is separated from the mold holding surface Sa2 ([state 7]).
  • the lower mold clamp 153a holds the lower mold 200a
  • the lower elastic member 156a is deformed by the pressing of the lower mold clamp 153a, and the lower suction portion 154a is formed.
  • the lower mold suction surface Sa1 has the same height as the lower mold holding surface Sa2 formed by the lower mounting table 150a. Therefore, in [State 8], the lower mold 200a is sucked and held by the lower suction portion 154a on the lower mold holding surface Sa2, and is held by the lower mounting table 150a.
  • the lower suction part having a relatively small area in the state where the molds 200a and 200b are installed and sucked on any of the mounting tables 150a and 150b.
  • 154a and 154b are in contact with the molds 200a and 200b.
  • suction it is a mold in mounting base 200a, 200b which has this relatively lower area including this lower adsorption
  • the molds 200a and 200b are held by the mounting tables 150a and 150b on the lower mold holding surface Sa2 and the upper mold holding surface Sb2 and receive the pressing force. Distributed. For this reason, the patterns on the surfaces of the molds 200a and 200b are appropriately pressed against the substrate 300, and appropriate transfer can be realized.
  • the mold is further detected by detecting the suction pressure at the lower suction portions 154a and 154b, the positions of the lower suction portions 154a and 154b, the form of the lower elastic members 156a and 156b, and the like. It can be determined whether or not 200a and 200b are appropriately held. For this reason, it is possible to check the holding state appropriately without incorporating a sensor or the like without complicating the structure of the apparatus.
  • FIG. 8 is a schematic view schematically showing a configuration of an imprint apparatus 1 ′ which is a first modification of the transfer apparatus of the present invention.
  • the imprint apparatus 1 shown in FIG. 8 is configured on the lower surface of the substrate 300 ′ that is a transfer target (in other words, the lower mold 200a with respect to the lower transfer layer 301a that is disposed facing downward). 2 is a transfer device for transferring a pattern formed on the substrate.
  • the same number is attached
  • the imprint apparatus 1 includes a lower mechanism part A including a lower base 110a, an upper mechanism part B ′ including an upper base 110b, a lower base 110a and an upper base 110b.
  • a ball screw 101 to be connected an actuator 104 for rotating the ball screw, a control unit 102 for controlling the operation of the lower mechanism unit A and the upper mechanism unit B, and an operation capable of inputting a user instruction to the control unit 102 Unit 103.
  • the imprint apparatus 1 ′ shown in FIG. 8 a state in which the lower mold 200 a and the substrate 300 ′ are installed is illustrated.
  • the lower mold 200a is held on the lower mounting table 150a of the lower mechanism portion A so that the surface on which the pattern is formed faces upward.
  • the upper base 110b has a pressing portion 120b so as to form a convex portion with respect to the lower mold holding surface Sa2 of the lower mounting table 150a.
  • the lower mechanism part A has the same configuration as the lower mechanism part A of the imprint apparatus 1 shown in FIG.
  • the upper mechanism part B 'of the present modification is provided on the lower surface of the upper base 110b, and includes a pressing part 112b, an upper center pin 120b, and an upper center pin driving part 140b.
  • the pressing portion 112b is a portion provided to form a convex portion downward on the lower surface of the upper base 110b. During the transfer operation, the pressing portion 112b presses the substrate 300 ′ downward by the operation of the actuator 104, so that the lower side Adhere to the mold 200a.
  • the pressing part 112b has a center hole for placing the upper center pin 120b.
  • the pressing portion 112b is flat and preferably has a lower surface that is wider than at least a region where the lower transfer layer 301a of the substrate 300 'is formed.
  • the actuator 104 moves the upper base 110b vertically downward, so that the lower surface of the pressing portion 112b presses the substrate 300' vertically downward. Therefore, the lower transfer layer 301a of the substrate 300 'is brought into close contact with the pattern surface of the lower mold 200a, and the pattern is transferred. Further, the actuator 102 moves the upper base 110b vertically upward, so that the pressing force for mutual pressing between the lower mold 200a and the substrate 300 'is released.
  • the lower center pin 120a and the upper center pin 120b are moved vertically upward while holding the substrate 300 ′, so that the substrate 300 ′ is released from the lower mold 200a. To do.
  • the pattern formed on the surface of the lower mold 200a is transferred to the transfer layer 301a of the substrate 300 ′ while enjoying the same effect as the imprint apparatus 1 described above. I can do it.
  • FIG. 9 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 ′′ and a control apparatus 400 which are a second modified example of the transfer apparatus of the present invention. Note that, in this modification and FIG. 9, the same components as those of the imprint apparatus 1 shown in FIG.
  • the imprint apparatus 1 ′′ has a configuration that does not include the control unit 102 and the operation unit 103 in the imprint apparatus 1 illustrated in FIG. 1. Other parts may be equivalent to the imprint apparatus 1.
  • the control device 400 includes a control unit 102 ′ and an operation unit 103 ′ having the same configuration as the control unit 102 and the operation unit 103 of the imprint apparatus 1, and is electrically connected to each unit of the imprint apparatus 1 ′′. Is done. In this configuration, the control unit 102 ′ of the control device 400 controls the operation by supplying a control signal to each unit of the imprint apparatus 1 ′′.
  • the imprinting device 1 ′′ and the control device 400 are arranged at separate positions, and the same effect as that obtained by the imprinting device 1 described above is obtained. You can enjoy it.
  • a third modification there is a device configuration in which one control device 400 is connected to a plurality of imprint devices and controls the operation of each imprint device.
  • one control device 400 is provided for n imprint devices 1 ′′ -1, 2,... Control of the operation of each imprint apparatus is performed by supplying control signals to the imprint apparatuses 1 ′′ -1, 2,... N.
  • a fourth modified example there is an apparatus configuration in which a user's instruction for controlling operations is input by a single operation unit to a plurality of control units respectively connected to a plurality of imprint apparatuses. is there.
  • the individual control units 102′-1, 2,. are connected to control the operation of each imprint apparatus 1 ′′ -1, 2,... N.
  • the operation unit 103 ′ is connected to each of the control units 102 ′-1, 2,... N, and inputs an instruction by a user operation.
  • one control device 400 or operation unit 103 ′ is used for each of the plurality of imprint devices 1 ′′ -1, 2,.
  • User instructions can be input. For this reason, centralized management is possible in a factory where many imprint apparatuses are required to operate simultaneously. Moreover, it is useful also in terms of apparatus configuration and cost.
  • the present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification, and a transfer apparatus accompanying such a change. And methods, computer programs, and the like are also included in the technical scope of the present invention.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

Disclosed is a transfer device (1) for transferring a pattern formed on a mold (200a) to a transfer reception body (300), wherein the transfer device is provided with a first mold holding means (154a) which holds the mold by a first contact surface (Sa1), a second mold holding means (150a) which holds the mold by a second contact surface (Sa2), and a transfer means (104) which transfers the pattern to the transfer reception body, and wherein relative positions of the first mold holding means and the second mold holding means change in the direction perpendicular to the first contact surface.

Description

転写装置及び方法、並びにコンピュータプログラムTransfer apparatus and method, and computer program
 本発明は、表面に凹凸パターンが形成されるモールドを被転写体に押圧することで凹凸パターンを被転写体表面に転写する転写装置及び方法、並びにコンピュータプログラムの技術分野に関する。 The present invention relates to a transfer device and method for transferring a concavo-convex pattern onto a surface of a transfer target by pressing a mold having a concavo-convex pattern formed on the surface of the transfer target, and a computer program technical field.
 この種の転写装置では、モールド表面を被転写体表面に対して均一に押圧するために、モールドに対して均一な圧力分布制御可能な態様でモールドの保持が行なわれる。例えば、特許文献1及び2には、モールドの裏面構造に併せて平坦な保持面を有するモールド保持手段により、モールドを保持するとともに、押圧時の圧力分布を均一とする構成が開示されている。 In this type of transfer apparatus, the mold is held in such a manner that a uniform pressure distribution can be controlled with respect to the mold in order to uniformly press the mold surface against the surface of the transfer target. For example, Patent Documents 1 and 2 disclose a configuration in which a mold is held by a mold holding unit having a flat holding surface in accordance with the back surface structure of the mold and the pressure distribution during pressing is uniform.
特開2006-326927号公報JP 2006-326927 A 国際公開第2007/105474号公報International Publication No. 2007/105474
 モールドを平坦な保持面で保持する場合、モールドと保持部材との材質や特性に応じて、保持面においてモールドが滑る可能性がある。モールドが保持面上で滑る場合、モールドを保持部材上の所望の位置に固定することが困難となるため、モールド表面のパターンを被転写体の所望の位置に合わせる位置合わせ動作が適切に行なえないという技術的な問題に繋がる。また、モールドの滑りによって生じる摩擦などのため、モールドや保持部材が破損する虞もある。 When holding the mold on a flat holding surface, the mold may slide on the holding surface depending on the material and characteristics of the mold and the holding member. When the mold slides on the holding surface, it is difficult to fix the mold at a desired position on the holding member, and therefore, the alignment operation for aligning the pattern on the mold surface with the desired position on the transfer target cannot be performed properly. This leads to technical problems. Further, the mold and the holding member may be damaged due to friction caused by the sliding of the mold.
 本発明は、上述した技術的な問題に鑑みて為されたものであり、モールドの設置及び保持を好適に実行し得る転写装置及び方法、並びにコンピュータプログラムを提供することを課題とする。 The present invention has been made in view of the above-described technical problems, and an object of the present invention is to provide a transfer apparatus and method, and a computer program that can suitably execute installation and holding of a mold.
 上記課題を解決するために、本発明の第1の転写装置は、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記モールドを第1の接触面で保持する第1モールド保持手段と、前記モールドを第2の接触面で保持する第2モールド保持手段と、前記パターンを前記被転写体に転写させる転写手段とを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置が可変である。 In order to solve the above problems, a first transfer device of the present invention is a transfer device that transfers a pattern formed on a mold onto a transfer target, and the first transfer device holds the mold on a first contact surface. A mold holding means; a second mold holding means for holding the mold on a second contact surface; and a transfer means for transferring the pattern to the transfer target, the first mold holding means and the second mold. The relative position with respect to the holding means is variable.
 上記課題を解決するために、本発明の第2の転写装置は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、前記第1モールドを第1の接触面で保持する第1モールド保持手段と、前記第1モールドを第2の接触面で保持する第2モールド保持手段と、前記第2モールドを第3の接触面で保持する第3モールド保持手段と、前記第2モールドを第4の接触面で保持する第4モールド保持手段と、前記パターンを前記被転写体に転写させる転写手段とを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置が可変であり、前記第3モールド保持手段と前記第4モールド保持手段との相対的な位置が可変である。 In order to solve the above problems, the second transfer apparatus of the present invention transfers the pattern formed on the first mold to the first surface of the transfer target, and the pattern formed on the second mold A transfer device for transferring to a second surface of a transfer target, wherein the first mold is held by a first contact surface, and the first mold is held by a second contact surface. Second mold holding means, third mold holding means for holding the second mold on a third contact surface, fourth mold holding means for holding the second mold on a fourth contact surface, and the pattern Transfer means for transferring to the transfer object, the relative positions of the first mold holding means and the second mold holding means are variable, the third mold holding means and the fourth mold holding means. Can be positioned relative to I am.
 上記課題を解決するために、本発明の第3の転写装置は、制御装置からの指示に応じて動作し、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記制御装置の指示に応じて、前記モールドを第1の接触面で保持する第1モールド保持手段と、前記制御装置の指示に応じて、前記モールドを第2の接触面で保持する第2モールド保持手段と、前記制御装置の指示に応じて、前記パターンを前記被転写体に転写させる転写手段とを備え、前記制御装置の指示に応じて、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させる。 In order to solve the above-described problem, a third transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target. First mold holding means for holding the mold on the first contact surface in accordance with an instruction from the apparatus, and second mold holding means for holding the mold on the second contact surface in accordance with an instruction from the control apparatus And transfer means for transferring the pattern onto the transfer target body in accordance with an instruction from the control device, and in accordance with an instruction from the control device, the first mold holding means and the second mold holding means, Change the relative position of.
 上記課題を解決するために、本発明の第1の転写方法は、モールドに形成されたパターンを被転写体に転写する転写装置における転写方法であって、前記モールドを第1の接触面で保持する第1保持工程と、前記モールドを第2の接触面で保持する第2保持工程と、前記パターンを前記被転写体に転写させる転写工程とを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させる。 In order to solve the above problems, a first transfer method of the present invention is a transfer method in a transfer apparatus that transfers a pattern formed on a mold to a transfer target, and the mold is held on the first contact surface. A first holding step, a second holding step for holding the mold on a second contact surface, and a transfer step for transferring the pattern to the transfer target, the first mold holding means and the second The relative position with the mold holding means is changed.
 上記課題を解決するために、本発明の第2の転写方法は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、前記第1モールドを第1の接触面で保持する第1保持工程と、前記第1モールドを第2の接触面で保持する第2保持工程と、前記第2モールドを第3の接触面で保持する第3保持工程と、前記第2モールドを第4の接触面で保持する第4保持工程と、前記パターンを前記被転写体に転写させる転写工程とを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置、及び前記第3モールド保持手段と前記第4モールド保持手段との相対的な位置の少なくとも一方を変化させる。 In order to solve the above-described problems, the second transfer method of the present invention transfers the pattern formed on the first mold to the first surface of the transfer object, and the pattern formed on the second mold A transfer device for transferring to a second surface of a transfer object, wherein a first holding step of holding the first mold on a first contact surface, and a first holding step of holding the first mold on a second contact surface. A second holding step, a third holding step for holding the second mold on a third contact surface, a fourth holding step for holding the second mold on a fourth contact surface, and the pattern to be transferred. A transfer process for transferring the first mold holding means and the second mold holding means, and a relative position between the third mold holding means and the fourth mold holding means. Change at least one.
 上記課題を解決するために、本発明のコンピュータプログラムは、モールドに形成されたパターンを被転写体に転写する転写装置を動作させるためのコンピュータプログラムであって、前記モールドを第1の接触面で保持する第1保持工程と、前記モールドを第2の接触面で保持する第2保持工程と、前記パターンを前記被転写体に転写させる転写工程とを前記転写装置に実行させ、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させる。 In order to solve the above-described problems, a computer program according to the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target, and the mold is moved on the first contact surface. A first holding step for holding; a second holding step for holding the mold on a second contact surface; and a transfer step for transferring the pattern onto the transfer target body. The relative position between the holding means and the second mold holding means is changed.
 本発明の作用及び他の利得について、以下に示す実施の形態とともに説明する。 The operation and other gains of the present invention will be described together with embodiments shown below.
本発明のインプリント装置の基本的な構成例を示す模式図であるIt is a schematic diagram which shows the basic structural example of the imprint apparatus of this invention. モールド保持手段によるモールドの保持の態様を示す模式図である。It is a schematic diagram which shows the aspect of a mold holding | maintenance by a mold holding means. インプリント装置の基台の形状を示す模式図である。It is a schematic diagram which shows the shape of the base of an imprint apparatus. 載置台、モールド保持部及びモールドクランプの形状及び動作の例を示す模式図である。It is a schematic diagram which shows the example of the shape and operation | movement of a mounting base, a mold holding part, and a mold clamp. インプリント装置による転写動作の一連の流れを示すフローチャートである。It is a flowchart which shows a series of flows of the transfer operation by an imprint apparatus. 転写動作におけるインプリント装置の各部の動作を示す模式図である。FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation. 転写動作におけるインプリント装置の各部の動作を示す模式図である。FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation. インプリント装置の第1の変形例の基本的な構成例を示す模式図である。It is a schematic diagram which shows the basic structural example of the 1st modification of an imprint apparatus. インプリント装置の第2の変形例の基本的な構成例を示す模式図である。It is a schematic diagram which shows the basic structural example of the 2nd modification of an imprint apparatus. インプリント装置の第3及び第4の変形例の基本的な構成例を示す模式図である。It is a schematic diagram which shows the basic structural example of the 3rd and 4th modification of an imprint apparatus.
 本発明の転写装置に係る実施形態は、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記モールドを第1の接触面で保持する第1モールド保持手段と、前記モールドを第2の接触面で保持する第2モールド保持手段と、前記パターンを前記被転写体に転写させる転写手段とを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置が可変である。 An embodiment according to the transfer apparatus of the present invention is a transfer apparatus that transfers a pattern formed on a mold to a transfer target, and includes a first mold holding unit that holds the mold on a first contact surface, and the mold. A second mold holding means for holding the pattern on the second contact surface, and a transfer means for transferring the pattern onto the transfer target, and the relative relationship between the first mold holding means and the second mold holding means. The position is variable.
 本発明の転写装置に係る実施形態によれば、転写手段の動作により、第1モールド保持手段と第2モールド保持手段とにより保持されるモールドが被転写体に押圧されることで、モールド表面のパターンが被転写体に転写される。尚、上述のように本実施形態及び後述すつ各態様では、一のモールドに対して、第1モールド保持手段及び第2モールド保持手段を用いて保持を実施している。かかる構成に鑑み、以下、モールドを保持する部材という趣旨について、第1モールド保持手段及び第2モールド保持手段とを包含する「保持部材」との呼称を用いる。 According to the embodiment of the transfer apparatus of the present invention, the mold held by the first mold holding means and the second mold holding means is pressed against the transfer object by the operation of the transfer means, so that the mold surface The pattern is transferred to the transfer target. As described above, in the present embodiment and each aspect described later, the first mold holding means and the second mold holding means are used to hold one mold. In view of such a configuration, hereinafter, the term “holding member” including the first mold holding means and the second mold holding means is used for the purpose of the member that holds the mold.
 本実施形態の第1モールド保持手段は、「第1の接触面」においてモールドと接するとともに、モールドの保持を実現する部材である。ここに、「第1の接触面」とは、第1モールド保持手段を構成する部材のうち、少なくともモールドと接する部位により形成される面であって、典型的には、第1モールド保持手段を構成する部材とモールドとが接触する全ての点を含んで成る面である。例えば、複数の吸着ノズルを備え、該複数の吸着ノズルの先端でモールドの裏面と接触し、且つ吸着することで保持を実現する第1モールド保持手段の場合、該複数の吸着ノズルの先端により形成される面が第1の接触面となる。 The first mold holding means of the present embodiment is a member that makes contact with the mold at the “first contact surface” and realizes holding of the mold. Here, the “first contact surface” is a surface formed by at least a portion in contact with the mold among the members constituting the first mold holding means, and typically the first mold holding means. It is a surface including all points where the component and the mold contact. For example, in the case of the first mold holding means that includes a plurality of suction nozzles, and that is in contact with the back surface of the mold at the front ends of the plurality of suction nozzles and realizes the holding by suction, formed by the front ends of the plurality of suction nozzles The surface to be used becomes the first contact surface.
 他方で、本実施形態の第2モールド保持手段は、「第2の接触面」においてモールドの裏面と接することでモールドの保持を実現する部材である。ここに「第2の接触面」とは、第2モールド保持手段を構成する部材のうち、少なくともモールドと接する部位により形成される面であって、典型的には、第2モールド保持手段を構成する部材とモールドとが接触する全ての点を含んで成る面である。例えば、平坦の表面を有し、該表面においてモールドの裏面と接触する第2モールド保持手段の場合、モールドと接する平坦な表面が第2の接触面となる。 On the other hand, the second mold holding means of the present embodiment is a member that realizes holding of the mold by contacting the back surface of the mold at the “second contact surface”. Here, the “second contact surface” is a surface formed by at least a portion in contact with the mold among the members constituting the second mold holding means, and typically constitutes the second mold holding means. It is a surface comprising all points where the member to be in contact with the mold. For example, in the case of the 2nd mold holding means which has a flat surface and contacts the back surface of a mold in the surface, the flat surface which touches a mold serves as the 2nd contact surface.
 転写手段は、第1モールド保持手段及び第2モールド保持手段により保持されるモールドを被転写体の表面に押圧する動作を行なう。尚、該押圧動作は、好適には、モールド表面に形成されるパターンが被転写体の表面に充分に転写されるよう、適切な押圧力、押圧時間またはその他の諸条件が設定された上で実施される。転写手段は、例えば、第1モールド保持手段及び第2モールド保持手段を動作させることで、上述した押圧動作を実施してもよく、他方で、被転写体を保持し、且つ該被転写体を第1モールド保持手段及び第2モールド保持手段に保持されるモールドに押圧するよう動作させることで、押圧動作を実施してもよい。 The transfer unit performs an operation of pressing the mold held by the first mold holding unit and the second mold holding unit against the surface of the transfer target. The pressing operation is preferably performed after an appropriate pressing force, pressing time, or other conditions are set so that the pattern formed on the mold surface is sufficiently transferred to the surface of the transfer target. To be implemented. The transfer unit may perform the pressing operation described above by operating, for example, the first mold holding unit and the second mold holding unit. On the other hand, the transfer unit holds the transfer target and holds the transfer target. You may implement pressing operation by making it operate | move so that it may press on the mold hold | maintained at a 1st mold holding means and a 2nd mold holding means.
 本実施形態の転写装置は、第1モールド保持手段が形成する第1の接触面と、第2モールド保持手段が形成する第2の接触面との相対的な位置が変化するよう構成されている。例えば、第1モールド保持手段が第2モールド保持手段に対して相対的に移動することで、第1の接触面が第2の接触面に対して移動し、互いの相対的な位置が変化する。 The transfer apparatus according to the present embodiment is configured such that the relative position between the first contact surface formed by the first mold holding unit and the second contact surface formed by the second mold holding unit changes. . For example, when the first mold holding means moves relative to the second mold holding means, the first contact surface moves with respect to the second contact surface, and the relative positions of the first contact surface change. .
 第1の接触面と第2の接触面との相対的な位置とは、典型的には、相互に平行な位置関係を維持した状態で形成される第1の接触面及び第2の接触面の夫々に垂直な方向での位置を示す。つまり、第1の接触面と第2の接触面との相対的な位置が変化するとは、好適には、第1の接触面及び第2の接触面の夫々に垂直な方向(以下、「高さ方向」と記載する)における互いの位置(以下、「高さ」と記載する)が変化することを示す趣旨である。しかしながら、このような高さ方向の位置変化に限られることなく、第1の接触面及び第2の接触面の夫々に平行な方向における位置変化を示す趣旨であってもよい。 The relative positions of the first contact surface and the second contact surface are typically the first contact surface and the second contact surface that are formed in a state of maintaining a mutually parallel positional relationship. The position in the direction perpendicular to each of these is shown. That is, the relative position between the first contact surface and the second contact surface is preferably changed in a direction perpendicular to each of the first contact surface and the second contact surface (hereinafter, “high” This is to indicate that the mutual position (hereinafter referred to as “height”) in the “direction” is changed. However, the present invention is not limited to such a position change in the height direction, and may indicate a position change in a direction parallel to each of the first contact surface and the second contact surface.
 このような構成を有する本実施形態の保持部材によればモールドを保持する際に、先ず第1モールド保持手段が第1の接触面でモールドと接触して第一段階の保持を行い、続いて、第1の接触面の相対的な移動によりモールドが第2の接触面において第2モールド保持手段と接触し、第2モールド保持手段による第二段階の保持が行なわれる。この場合、第一段階の保持においてモールドは、第1モールド保持手段の第1の接触面と接触するのみであり、第二段階の保持においてモールドと接触する部位である、第1モールド保持手段の第1の接触面及び第2モールド保持手段の第2の接触面と比較して、面積が小さい。 According to the holding member of this embodiment having such a configuration, when holding the mold, the first mold holding means first contacts the mold on the first contact surface to hold the first stage, and then By the relative movement of the first contact surface, the mold comes into contact with the second mold holding means on the second contact surface, and the second stage holding by the second mold holding means is performed. In this case, in the first stage holding, the mold only comes into contact with the first contact surface of the first mold holding means, and the first mold holding means is a part that comes into contact with the mold in the second stage holding. The area is small compared to the first contact surface and the second contact surface of the second mold holding means.
 保持部材は、典型的には、モールドのパターンが形成される面の裏面(つまり、非パターン面)においてモールドと接し、吸着などによりモールドの保持を行なう。このとき、モールドの非パターン面は、保持を容易にするためや押圧時の圧力分布の均一化のため、平坦な面として構成されることが多い。同様に、モールドを保持する保持部材のモールドと接触する接触面もまた、モールドの非パターン面の形状に合わせて平坦な面を有するよう構成される。このため、モールドを保持部材に設置する際に、このように平坦な裏面を有するモールドを平坦な面を有する保持部材に接触させる場合、モールドと保持部材との接触面において滑りが生じる可能性がある。このような滑りは、例えば、モールドと保持部材との接触時に、対向する接触面間に生じた空気の流れなどによって生じる場合がある。 The holding member typically contacts the mold on the back surface (that is, the non-pattern surface) of the surface on which the mold pattern is formed, and holds the mold by suction or the like. At this time, the non-pattern surface of the mold is often configured as a flat surface for easy holding and for uniform pressure distribution during pressing. Similarly, the contact surface that contacts the mold of the holding member that holds the mold is also configured to have a flat surface that matches the shape of the non-patterned surface of the mold. For this reason, when the mold having the flat back surface is brought into contact with the holding member having a flat surface when the mold is installed on the holding member, there is a possibility that slip occurs on the contact surface between the mold and the holding member. is there. Such slipping may be caused by, for example, an air flow generated between opposing contact surfaces when the mold and the holding member are in contact with each other.
 モールドと保持部材との接触面で滑りが生じた場合、保持部材上の所望の位置にモールドが固定されず、モールド表面のパターンを被転写体の所望の位置に合わせる位置合わせ動作が適切に行なえなくなるため、保持部材へのモールドの設置の遣り直しなど装置動作上不利益を生じる可能性がある。このため、転写動作の効率の低下や歩留まりの悪化に繋がる可能性がある。 When slip occurs on the contact surface between the mold and the holding member, the mold is not fixed at a desired position on the holding member, and the alignment operation for aligning the pattern on the mold surface with the desired position on the transfer target can be performed appropriately. Therefore, there is a possibility that the operation of the apparatus is disadvantageous such as re-installation of the mold on the holding member. For this reason, there is a possibility that the efficiency of the transfer operation is lowered and the yield is deteriorated.
 本実施形態の転写装置の構成によれば、保持部材におけるモールドの保持のために用意された全部位(つまり、第1の接触面と第2の接触面)と比較して、第一段階の保持においてモールドと接触する部位(つまり、第1の接触面)は、相対的に面積が小さくなる。このため、モールドと保持部材(つまり、第1モールド保持手段)との接触時に、保持部材からモールドに及ぼされる圧力が、接触面の面積の減少に伴って増大する。これにより、モールドと第1モールド保持手段の第1の接触面において生じる摩擦力が増大し、結果として、モールドの第1の接触面に平行な方向における滑りの発生を抑制することが出来る。このようにモールドと第1モールド保持手段との接触面における滑りを抑制することで、モールドの設置時に第1モールド保持手段における所望の位置に好適にモールドを固定した上で保持を実現させることが可能となる。結果として、滑りに起因するモールド及び第1モールド保持手段の損傷やアライメントのズレを抑制することが出来る。 According to the configuration of the transfer device of the present embodiment, the first stage is compared with all the parts (that is, the first contact surface and the second contact surface) prepared for holding the mold in the holding member. The area of the part that comes into contact with the mold during holding (that is, the first contact surface) is relatively small. For this reason, the pressure exerted on the mold from the holding member at the time of contact between the mold and the holding member (that is, the first mold holding means) increases as the area of the contact surface decreases. Thereby, the frictional force generated on the first contact surface of the mold and the first mold holding means increases, and as a result, the occurrence of slipping in the direction parallel to the first contact surface of the mold can be suppressed. In this way, by suppressing the slip on the contact surface between the mold and the first mold holding means, it is possible to realize the holding after suitably fixing the mold at a desired position in the first mold holding means when the mold is installed. It becomes possible. As a result, it is possible to suppress damage to the mold and the first mold holding means and misalignment due to slippage.
 また、第二段階の保持の後に、転写手段によりモールドを被転写体に押圧する際には、第1モールド保持手段の吸着ノズルの先端が第2モールド保持手段上の平坦な表面と同一の高さとなるよう、第1モールド保持手段と第2モールド保持手段との相対的な移動が行なわれる。このため、モールドは、第2の接触面において、設置時における第1モールド保持手段との接触部位よりもより大きい面積を有する部位で第1モールド保持手段及び第2モールド保持手段と接触し、保持される。 Further, after the second stage holding, when the mold is pressed against the transfer object by the transfer means, the tip of the suction nozzle of the first mold holding means has the same height as the flat surface on the second mold holding means. Thus, relative movement between the first mold holding means and the second mold holding means is performed. For this reason, the mold contacts and holds the first mold holding means and the second mold holding means at a portion having a larger area on the second contact surface than the contact portion with the first mold holding means at the time of installation. Is done.
 このような構成によれば、モールドと第1モールド保持手段との接触時と比較して、第1モールド保持手段及び第2モールド保持手段の両方を用いて、より広い面積でモールドを保持した状態でモールドの押圧を実施可能となる。このため、被転写体への押圧時には、モールドの付加される押圧力の分布をより均一なものとすることが出来る。従って、好適なパターンの転写を実現可能となり、転写装置による歩留まりの向上にも繋がる。 According to such a configuration, the mold is held in a wider area using both the first mold holding means and the second mold holding means as compared to when the mold and the first mold holding means are in contact with each other. Thus, the mold can be pressed. For this reason, it is possible to make the distribution of the pressing force applied to the mold more uniform when pressing the transfer target. Therefore, transfer of a suitable pattern can be realized, which leads to an improvement in yield by the transfer device.
 本発明の転写装置に係る第1実施形態の一の態様では、前記第1モールド保持手段と前記第2モールド保持手段との少なくとも一方の位置を制御するモールド保持制御手段を更に備え、前記モールド保持制御手段は、前記第1の接触面に対して垂直な方向において、前記第1の接触面で保持される前記モールドと、前記第2の接触面との距離を変化させる。 In one aspect of the first embodiment of the transfer apparatus according to the present invention, the mold holding unit further includes a mold holding control unit that controls a position of at least one of the first mold holding unit and the second mold holding unit. The control means changes a distance between the mold held by the first contact surface and the second contact surface in a direction perpendicular to the first contact surface.
 この態様によれば、少なくとも第1の接触面と第2の接触面との相対的な移動により、モールドと第2の接触面との位置関係が近接又は離間するよう変化する。このため、上述した二段階のモールドの保持を比較的容易に実現出来る。 According to this aspect, at least relative movement between the first contact surface and the second contact surface causes the positional relationship between the mold and the second contact surface to change so as to approach or separate from each other. For this reason, the above-described two-stage mold holding can be realized relatively easily.
 かかる第1の接触面と第2の接触面との相対的な移動を実現するためにモールド保持制御手段は、第1モールド保持手段と第2モールド保持手段との相対的な位置の変化を行わせる部材である。例えば、モールド保持制御手段は、第1モールド保持手段を第2モールド保持手段の第2の接触面方向に押圧することで第1モールド保持手段と第2モールド保持手段との相対的な位置に変化を生じさせる。 In order to realize the relative movement between the first contact surface and the second contact surface, the mold holding control means changes the relative positions of the first mold holding means and the second mold holding means. It is a member to make. For example, the mold holding control unit changes the relative position between the first mold holding unit and the second mold holding unit by pressing the first mold holding unit in the direction of the second contact surface of the second mold holding unit. Give rise to
 本発明の転写装置に係る第1実施形態の他の態様では、前記第1モールド保持手段は、前記モールドと前記第1の接触面との距離、及び前記モールドと前記第2の接触面との距離が異なる状態において、前記モールドを保持し、前記転写手段は、前記モールドと前記第1の接触面との距離、及び前記モールドと前記第2の接触面との距離が等しい状態において、前記パターンを前記被転写体に転写させる。 In another aspect of the first embodiment according to the transfer device of the present invention, the first mold holding means includes a distance between the mold and the first contact surface, and a distance between the mold and the second contact surface. In a state where the distance is different, the mold is held, and the transfer unit is configured such that the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are equal. Is transferred to the transfer target.
 この態様によれば、第1モールド保持手段がモールドを保持する際と、転写手段がモールドを被転写体に押圧する際とでは、モールドと各接触面との間の距離が異なるよう、各接触面を規定するモールド保持手段の相対的な位置が変化している。 According to this aspect, when the first mold holding means holds the mold and when the transfer means presses the mold against the transfer target, the contact between the mold and each contact surface is different. The relative position of the mold holding means defining the surface has changed.
 ここに、モールドと第1の接触面との距離、及びモールドと第2の接触面との距離とは、各接触面に垂直な方向における、各接触面とモールドとの距離を示す趣旨である。従って、モールドと第1の接触面、及びモールドと第2の接触面との夫々の距離が異なる状態とは、第1の接触面と第2の接触面とが、夫々モールドから相異なる距離に配置される状態である。他方で、モールドと第1の接触面、及びモールドと第2の接触面との夫々の距離が等しい状態とは、第1の接触面と第2の接触面とが、モールドから略同距離に配置される状態であり、第1の接触面と第2の接触面とが同一の平面上に配置される状態である。尚、「距離が等しい」とは、必ずしも距離が完全に一致する状態を示すのみではなく、上述した本実施形態の転写装置の効果を享受可能な範囲であれば、双方の距離が微小量異なっていてもよい。 Here, the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are intended to indicate the distance between each contact surface and the mold in a direction perpendicular to each contact surface. . Therefore, the state where the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are different is that the first contact surface and the second contact surface are different from each other from the mold. It is a state to be arranged. On the other hand, when the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are equal, the first contact surface and the second contact surface are approximately the same distance from the mold. This is a state in which the first contact surface and the second contact surface are disposed on the same plane. Note that “the distances are equal” does not necessarily indicate a state in which the distances are completely coincident with each other, but the distances between the two are slightly different as long as the effects of the transfer device of the present embodiment can be enjoyed. It may be.
 第1モールド保持手段に対してモールドが保持される場合、典型的には、第1の接触面は第2の接触面と比較してモールドに近い位置に配置される。具体的には、第1モールド保持手段がモールドと接して保持するため、第1の接触面とモールドとの間の距離は概ね零となる、他方で、第2の接触面はモールドに対して、第1の接触面とは異なる位置に配置される状態であるから、モールド及び第1の接触面から所定の距離離間した位置にある。 When the mold is held with respect to the first mold holding means, typically, the first contact surface is disposed at a position closer to the mold than the second contact surface. Specifically, since the first mold holding means is held in contact with the mold, the distance between the first contact surface and the mold is substantially zero, while the second contact surface is against the mold. Since it is in a state of being arranged at a position different from the first contact surface, it is located at a predetermined distance from the mold and the first contact surface.
 その後、第1モールド保持手段又は第2モールド保持手段の動作などにより、第1の接触面と第2の接触面との相対的な位置が変化し、転写手段によりモールドが押圧される際には、モールドに対して第1の接触面と第2の接触面とが同距離に配置される。具体的には、モールドの一の面に対して、第1の接触面で第1モールド保持手段が、第2の接触面で第2モールド保持手段が夫々接触して保持している状態で、転写手段がモールドを被転写体に押圧する。 Thereafter, when the relative position between the first contact surface and the second contact surface changes due to the operation of the first mold holding means or the second mold holding means, and the mold is pressed by the transfer means. The first contact surface and the second contact surface are arranged at the same distance with respect to the mold. Specifically, with respect to one surface of the mold, the first mold holding means on the first contact surface and the second mold holding means on the second contact surface are in contact with each other and held, The transfer unit presses the mold against the transfer target.
 本実施形態の転写装置の構成によれば、上述したように、モールドと接触する(言い換えれば、接触時にモールドを受け止める)第1モールド保持手段の部位面積(つまり、第1の接触面の面積)を相対的に小さく出来るため、モールドの第1の接触面に平行な方向に生じる滑りの影響を減少させることが出来る。このようにモールドと第1モールド保持手段との接触面における滑りを抑制することで、モールドの設置時に第1モールド保持手段における所望の位置に好適にモールドを固定した上で保持を実現させることが可能となる。結果として、滑りに起因するモールド及び第1モールド保持手段の損傷を抑制し、更にモールドの第1モールド保持手段上での位置合わせを比較的容易に行なうことが可能となる。 According to the configuration of the transfer apparatus of the present embodiment, as described above, the area of the first mold holding means (that is, the area of the first contact surface) that comes into contact with the mold (in other words, receives the mold at the time of contact). Can be made relatively small, so that it is possible to reduce the influence of the slip that occurs in the direction parallel to the first contact surface of the mold. In this way, by suppressing the slip on the contact surface between the mold and the first mold holding means, it is possible to realize the holding after suitably fixing the mold at a desired position in the first mold holding means when the mold is installed. It becomes possible. As a result, it is possible to suppress damage to the mold and the first mold holding means due to the slip, and relatively easily align the mold on the first mold holding means.
 転写手段によるモールドの押圧時には、制御手段は、第1モールド保持手段の吸着ノズルの先端が第2モールド保持手段上の平坦な表面と同一の高さとなるよう、第1モールド保持手段を移動させる。このため、モールドは、第2の接触面において、設置時における第1モールド保持手段との接触部位よりもより大きい面積を有する部位で第1モールド保持手段及び第2モールド保持手段と接触し、保持される。 When the mold is pressed by the transfer means, the control means moves the first mold holding means so that the tip of the suction nozzle of the first mold holding means is flush with the flat surface on the second mold holding means. For this reason, the mold contacts and holds the first mold holding means and the second mold holding means at a portion having a larger area on the second contact surface than the contact portion with the first mold holding means at the time of installation. Is done.
 このような構成によれば、モールドと第1モールド保持手段との接触時と比較して、第1モールド保持手段及び第2モールド保持手段の両方を用いて、より広い面積でモールドを保持した状態でモールドの押圧を実施可能となる。このため、被転写体への押圧時には、モールドの付加される押圧力の分布をより均一なものとすることが出来る。従って、好適なパターンの転写を実現可能となり、転写装置による歩留まりの向上にも繋がる。 According to such a configuration, the mold is held in a wider area using both the first mold holding means and the second mold holding means as compared to when the mold and the first mold holding means are in contact with each other. Thus, the mold can be pressed. For this reason, it is possible to make the distribution of the pressing force applied to the mold more uniform when pressing the transfer target. Therefore, transfer of a suitable pattern can be realized, which leads to an improvement in yield by the transfer device.
 本発明の転写装置に係る第1実施形態の他の態様では、前記第1の接触面は、前記モールドの前記パターンが形成されていない面における前記パターンが形成されていない領域と接触し、前記第2の接触面は、前記モールドの前記パターンが形成されていない面における前記パターンが形成されている領域を含む領域と接触する。 In another aspect of the first embodiment of the transfer device of the present invention, the first contact surface is in contact with a region where the pattern is not formed on a surface of the mold where the pattern is not formed, The second contact surface is in contact with a region including a region where the pattern is formed on a surface of the mold where the pattern is not formed.
 この態様によれば、第1モールド保持手段は、モールドの非パターン面における、パターン面のパターンが形成されない領域に相当する領域において、モールドと接触し、更に保持を実現するよう構成され、且つ配置されている。また、第2モールド保持手段は、モールドの非パターン面における、少なくともパターン面にパターンが形成される領域を含む領域に相当する領域において、モールドと接触し、更に保持を実現するよう構成され、且つ配置されている。尚、モールドのパターン面の「パターンが形成される領域」とは、被転写体に押圧されることで実際に転写されるべきパターンが形成される領域を示す趣旨である。他方で、パターン面に何らかのパターン構造が形成される領域であっても、該パターン構造が被転写体に対して転写されることを意図して形成されていない場合、このようなパターン構造が形成される領域は「パターンが形成されない領域」として扱ってもよい。 According to this aspect, the first mold holding means is configured and arranged to come into contact with the mold and realize holding in a region corresponding to a region where the pattern of the pattern surface is not formed on the non-pattern surface of the mold. Has been. Further, the second mold holding means is configured to contact the mold and realize holding at least in a region corresponding to a region including a region where a pattern is formed on the pattern surface in the non-pattern surface of the mold, and Has been placed. The “area where the pattern is formed” on the pattern surface of the mold is intended to indicate an area where a pattern to be actually transferred is formed by being pressed against the transfer target. On the other hand, even in a region where some pattern structure is formed on the pattern surface, such a pattern structure is formed if the pattern structure is not intended to be transferred to the transfer target. The region to be processed may be treated as “a region where a pattern is not formed”.
 このように構成することで、モールドを被転写体に押圧する場合には、少なくともパターンが形成される領域に対応する領域を含む領域において第1モールド保持手段がモールドと接触する。このため、該第1モールド保持手段を介してモールドのパターンが形成される面における押圧時の圧力分布が均一となるよう被転写体への押圧を実現出来る。このため、パターン面のパターンを被転写体に適切に転写することが可能となり、転写装置による歩留まりの向上にも繋がる。 With this configuration, when the mold is pressed against the transfer target, the first mold holding means comes into contact with the mold at least in a region including a region corresponding to the region where the pattern is formed. For this reason, it is possible to realize the pressing to the transfer body through the first mold holding means so that the pressure distribution at the time of pressing on the surface on which the pattern of the mold is formed becomes uniform. For this reason, it becomes possible to appropriately transfer the pattern on the pattern surface to the transfer target, leading to an improvement in yield by the transfer device.
 本発明の転写装置に係る第1実施形態の他の態様では、前記第1の接触面は、前記モールドの前記パターンが形成されていない面の外周部において前記モールドと接触し、前記第2の接触面は、前記モールドの前記パターンが形成されていない面の内周部において前記モールドと接触する。 In another aspect of the first embodiment of the transfer device of the present invention, the first contact surface is in contact with the mold at an outer peripheral portion of a surface of the mold where the pattern is not formed, and the second contact surface The contact surface is in contact with the mold at the inner periphery of the surface of the mold where the pattern is not formed.
 この態様によれば、第1モールド保持手段は、モールドの裏面における外周部において、モールドと接触し、更に保持を実現するよう構成され、且つ配置されている。また、第2モールド保持手段は、モールドの裏面における内周部において、モールドと接触し、更に保持を実現するよう構成され、且つ配置されている。 According to this aspect, the first mold holding means is configured and arranged so as to come into contact with the mold at the outer peripheral portion on the back surface of the mold and to further realize the holding. Further, the second mold holding means is configured and arranged so as to come into contact with the mold and realize holding at the inner peripheral portion on the back surface of the mold.
 このように構成することで、第1モールド保持手段によるモールドの第一段階の保持を、モールドの外周部において実施することが可能となり、内周部における保持と比較して、比較的安定した保持を実現出来る。 With this configuration, the first stage holding of the mold by the first mold holding means can be performed at the outer peripheral portion of the mold, and the holding is relatively stable as compared with the holding at the inner peripheral portion. Can be realized.
 また、一般的に、モールドのパターンは、パターン面におけるモールド内周側に設けられることが多く、従ってモールドの外周部において第一段階の保持を行なうことで、上述したように非パターン面におけるパターンが形成されない領域に相当する領域において保持を行なった場合と同等の効果を享受することが出来る。 In general, the pattern of the mold is often provided on the inner peripheral side of the mold on the pattern surface. Therefore, by performing the first stage holding on the outer peripheral portion of the mold, the pattern on the non-pattern surface as described above. An effect equivalent to that in the case where holding is performed in a region corresponding to a region in which no is formed can be obtained.
 本発明の転写装置に係る第1実施形態の他の態様では、前記第1モールド保持手段に保持されたモールドが押圧されることで、前記第1の接触面に対して垂直な方向における前記第1の接触面と前記第2の接触面との相対的な位置が変化する。 In another aspect of the first embodiment relating to the transfer device of the present invention, the mold held by the first mold holding means is pressed so that the first in the direction perpendicular to the first contact surface is obtained. The relative position between the first contact surface and the second contact surface changes.
 この態様での転写装置は、例えばクランプ機構などの押圧用の部材を備え、該クランプ機構によってモールドを押圧することで、該モールドを保持する第1モールド保持手段を移動させる。
このとき、クランプ機構は、第1の接触面において第1モールド保持手段と接するモールドに対し、該第1の接触面から第2の接触面に向かう方向にモールドを押圧する。第1モールド保持手段は、この押圧力により第2の接触面方向に移動し、該第1モールド保持手段が形成する第1の接触面と第2の接触面との相対的な位置が変化する。このとき、公的には、第1の接触面と第2の接触面とが同一の面となる。
The transfer device according to this aspect includes a pressing member such as a clamp mechanism, and moves the first mold holding means for holding the mold by pressing the mold with the clamp mechanism.
At this time, the clamp mechanism presses the mold in the direction from the first contact surface toward the second contact surface against the mold in contact with the first mold holding unit on the first contact surface. The first mold holding means moves in the direction of the second contact surface by this pressing force, and the relative position between the first contact surface and the second contact surface formed by the first mold holding means changes. . At this time, publicly, the first contact surface and the second contact surface are the same surface.
 このように構成することで、比較的容易に上述した効果を享受するための構成を提供することが可能となる。また、上述したクランプ機構は、モールドに対し押圧力を付加する構成であるため、モールドの保持をより強固とする目的でも使用可能である。 It becomes possible to provide the structure for enjoying the effect mentioned above comparatively easily by comprising in this way. Moreover, since the clamp mechanism mentioned above is a structure which adds pressing force with respect to a mold, it can be used also for the purpose of strengthening holding | maintenance of a mold.
 また、本実施形態の転写装置によれば、モールドが第1モールド保持手段に接触しているか否かを第1モールド保持手段の位置などから確認可能となる。つまり、第1モールド保持手段はモールドの接触や保持の態様に応じて移動することから、該第1モールド保持手段の位置や付加される圧力を検出することで、モールドが第1モールド保持手段に接触したか否かを検出出来る。 Further, according to the transfer device of the present embodiment, it is possible to confirm whether or not the mold is in contact with the first mold holding means from the position of the first mold holding means. That is, since the first mold holding means moves in accordance with the mold contact and holding mode, the mold is moved to the first mold holding means by detecting the position of the first mold holding means and the applied pressure. It is possible to detect whether contact has been made.
 このように構成すれば、モールドが各モールド保持手段に接触しているか否かを検出するための圧力センサなどのセンサ類は、好適には第1モールド保持手段の位置や圧力を検出するための構成であってよく、他方で、第1モールド保持手段及び第2モールド保持手段におけるモールドと接触する部位に圧力センサなどの機器を配置する必要がない。このため、被転写体の転写層を硬化するために加熱やUV光の照射を行なう場合であっても、熱やUV光の影響を受けない位置にセンサ類を配置することが可能となり、センサ類に対して熱やUV光の影響を防ぐための特別な構成を必要としない。また、第1モールド保持手段及び第2モールド保持手段におけるモールドと接触する部位以外の位置にセンサ類を配置することにより、各保持手段の構成を比較的簡単なものとすることが可能となる。 If comprised in this way, sensors, such as a pressure sensor for detecting whether a mold is contacting each mold holding means, Preferably it is for detecting the position and pressure of a 1st mold holding means. On the other hand, it is not necessary to arrange a device such as a pressure sensor in a portion of the first mold holding means and the second mold holding means that contacts the mold. For this reason, even when heating or UV light irradiation is performed to cure the transfer layer of the transfer target, it is possible to place sensors in a position that is not affected by heat or UV light. There is no need for a special structure to prevent the effects of heat and UV light on the varieties. Further, by arranging the sensors at a position other than the portion in contact with the mold in the first mold holding means and the second mold holding means, the structure of each holding means can be made relatively simple.
 このとき、前記第1モールド保持手段は、前記第2モールド保持手段との間に設けられる弾性部材によって支持されている構成であってもよい。 At this time, the first mold holding means may be supported by an elastic member provided between the second mold holding means.
 このような構成では、弾性部材の変形に伴って、第1モールド保持手段の第1の接触面と、第2の接触面との垂直方向の位置が変化可能となっている。 In such a configuration, the vertical position between the first contact surface and the second contact surface of the first mold holding means can be changed with the deformation of the elastic member.
 具体的には、クランプ機構がモールドを押圧していない状態は、第1モールド保持手段の先端部は、第2モールド保持手段の表面より突出し、第1の接触面を形成する。 More specifically, when the clamp mechanism is not pressing the mold, the tip of the first mold holding means protrudes from the surface of the second mold holding means to form the first contact surface.
 他方で、クランプ機構がモールドを押圧する場合、モールド及び第1モールド保持手段を介して弾性部材に押圧力が付加される。本構成によれば、このような押圧力に応じて弾性部材に例えば、収縮などの変形が生じ、該変形に応じて弾性部材に支持される第1モールド保持手段が移動する。尚、この態様の弾性部材は、機械的またはその他何らかの要因により、押圧などの外力の付加に応じて所定のバネ係数に応じた弾性力を生じさせる弾性体である。このとき、少なくとも第1モールド保持手段の先端部により形成される第1の接触面が、第2の接触面と同一の高さとなるように、クランプ機構の押圧力及び弾性部材の弾性力などの諸条件が設定されている。言い換えれば、弾性部材の弾性力は、第1モールド保持手段が形成する第1の接触面が第2の接触面と同一の高さとなるよう弾性部材が変形している場合において、クランプ機構の押圧力と釣り合うよう設定されている。 On the other hand, when the clamp mechanism presses the mold, a pressing force is applied to the elastic member via the mold and the first mold holding means. According to this configuration, for example, deformation such as contraction occurs in the elastic member in accordance with such a pressing force, and the first mold holding means supported by the elastic member moves in accordance with the deformation. The elastic member of this aspect is an elastic body that generates an elastic force corresponding to a predetermined spring coefficient in response to an external force such as pressing due to mechanical or some other factor. At this time, the pressing force of the clamp mechanism and the elastic force of the elastic member are set so that at least the first contact surface formed by the tip of the first mold holding means has the same height as the second contact surface. Various conditions are set. In other words, when the elastic member is deformed so that the first contact surface formed by the first mold holding means is at the same height as the second contact surface, the elastic force of the elastic member is It is set to balance with pressure.
 このように構成することで、比較的容易に上述した効果を享受するための構成を提供することが可能となる。また、第1モールド保持手段の第1の接触面と、第2モールド保持手段の第2の接触面を同一の高さとする動作について、専用のアクチュエータ類を備えることなく容易に実現可能となり、装置構成上有益である。 It becomes possible to provide the structure for enjoying the effect mentioned above comparatively easily by comprising in this way. Further, the operation of setting the first contact surface of the first mold holding means and the second contact surface of the second mold holding means to the same height can be easily realized without providing a dedicated actuator. It is beneficial in construction.
 また、前記第2モールド保持手段は、前記第2の接触面に凹部を有し、前記第1モールド保持手段は、前記凹部において前記弾性部材に支持されている構成であってもよい。 Further, the second mold holding means may have a recess in the second contact surface, and the first mold holding means may be supported by the elastic member in the recess.
 このように構成すれば、凹部の深さと弾性部材の弾性係数及びサイズを調整することにより、比較的簡単な構成で第1の接触面と第2の接触面とを同一の面とする構成を実現出来る。 If comprised in this way, the structure which makes a 1st contact surface and a 2nd contact surface the same surface by a comparatively simple structure by adjusting the depth of a recessed part and the elastic coefficient and size of an elastic member. It can be realized.
 本発明の転写装置に係る第1実施形態の他の態様では、前記第1モールド保持手段は、前記モールドを吸着することで保持する。 In another aspect of the first embodiment of the transfer device of the present invention, the first mold holding means holds the mold by suction.
 この態様における第1モールド保持手段は、例えば、真空ポンプなどに接続される吸着溝を有する吸着部材であって、該真空ポンプの動作により吸着溝内が負圧になることで吸着部が接触するモールド面(つまり、モールドにおけるパターンが形成される面の裏面)を吸着する。このような吸着部により、モールドの保持が実現される。 The first mold holding means in this aspect is, for example, an adsorption member having an adsorption groove connected to a vacuum pump or the like, and the adsorption portion comes into contact with the negative pressure in the adsorption groove due to the operation of the vacuum pump. The mold surface (that is, the back surface of the surface on which the pattern in the mold is formed) is adsorbed. By such an adsorbing portion, holding of the mold is realized.
 このように構成することで、比較的簡単にモールドの保持を実現可能であると共に、上述した各種態様に係る効果を享受することが出来る。尚、第1モールド保持手段は、このような吸着による保持を行なう部材に加えて、その他の何らかの保持を行なう部材を用いることでモールドの保持を実現させてもよい。 With such a configuration, it is possible to realize the holding of the mold relatively easily and enjoy the effects according to the various aspects described above. Note that the first mold holding means may realize holding of the mold by using other holding members in addition to such holding members by suction.
 本発明の転写装置に係る第2実施形態は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、前記第1モールドを第1の接触面で保持する第1モールド保持手段と、前記第1モールドを第2の接触面で保持する第2モールド保持手段と、前記第2モールドを第3の接触面で保持する第3モールド保持手段と、前記第2モールドを第4の接触面で保持する第4モールド保持手段と、前記パターンを前記被転写体に転写させる転写手段とを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置が可変であり、前記第3モールド保持手段と前記第4モールド保持手段との相対的な位置が可変である。 In the second embodiment of the transfer apparatus of the present invention, the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object. A transfer device for transferring to a second surface, wherein the first mold holding means for holding the first mold on a first contact surface, and the second mold holding means for holding the first mold on a second contact surface. A third mold holding means for holding the second mold on a third contact surface; a fourth mold holding means for holding the second mold on a fourth contact surface; and the pattern on the transfer object. A transfer means for transferring, the relative positions of the first mold holding means and the second mold holding means being variable, and the relative relationship between the third mold holding means and the fourth mold holding means. The position is variable.
 本発明の転写装置に係る第2実施形態によれば、第1モールドを保持する第1モールド保持手段と、第2モールドを保持する第2モールド保持手段との二つのモールドを保持する手段を有する。これらの二つのモールドのうち第1モールドは被転写体の第1の面に、第2モールドは被転写体の第2の面に密着して押圧されることで、夫々のモールドに形成されたパターンの転写が被転写体の両面に行なわれる。このとき、夫々の押圧は相前後して行なわれてもよく、また同時に行なわれてもよい。例えば、第1の面と第2の面とが互いに反対側に設けられる被転写体を用いる場合、第1モールドと第2モールドとで被転写体を挟み込み、両面から押圧することで同時に転写を行なってもよい。 According to the second embodiment of the transfer apparatus of the present invention, it has means for holding two molds, a first mold holding means for holding the first mold and a second mold holding means for holding the second mold. . Of these two molds, the first mold was pressed against the first surface of the transferred body and the second mold was pressed against the second surface of the transferred body, thereby forming each mold. Pattern transfer is performed on both sides of the transfer object. At this time, each pressing may be performed in succession, or may be performed simultaneously. For example, when using a transfer object in which the first surface and the second surface are provided on opposite sides, the transfer object is sandwiched between the first mold and the second mold, and the transfer is performed simultaneously by pressing from both surfaces. You may do it.
 更に、本発明の転写装置に係る第2実施形態によれば、上述した本発明の転写装置に係る第1実施形態と同様の各種効果を享受することが出来る。 Furthermore, according to the second embodiment of the transfer device of the present invention, various effects similar to those of the first embodiment of the transfer device of the present invention described above can be enjoyed.
 尚、本発明の転写装置に係る第3実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the third embodiment related to the transfer device of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明の転写装置に係る第3実施形態は、制御装置からの指示に応じて動作し、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記制御装置の指示に応じて、前記モールドを第1の接触面で保持する第1モールド保持手段と、前記制御装置の指示に応じて、前記モールドを第2の接触面で保持する第2モールド保持手段と、前記制御装置の指示に応じて、前記パターンを前記被転写体に転写させる転写手段とを備え、前記制御装置の指示に応じて、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させる。 The third embodiment according to the transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target, and in response to an instruction from the control device. A first mold holding means for holding the mold on the first contact surface; a second mold holding means for holding the mold on the second contact surface in response to an instruction from the control device; and the control device. And a transfer unit that transfers the pattern to the transfer target according to the instruction of the control unit, and a relative position between the first mold holding unit and the second mold holding unit according to the instruction of the control device. To change.
 本発明の転写装置に係る第3実施形態によれば、当該転写装置に接続される制御装置からの指示に基づき、上述の本発明の転写装置に係る第1実施形態及びその一の態様における各部と同様の動作が実施可能である。このため、本発明の転写装置に係る第3実施形態によれば、上述した本発明の転写装置に係る第1実施形態及びその一の態様と同様の各種効果を享受することが出来る。 According to the third embodiment of the transfer apparatus of the present invention, each part in the first embodiment of the transfer apparatus of the present invention and one aspect thereof based on an instruction from a control device connected to the transfer apparatus. The same operation can be performed. For this reason, according to 3rd Embodiment which concerns on the transfer apparatus of this invention, the various effects similar to 1st Embodiment and its one aspect | mode which concern on the transfer apparatus of this invention mentioned above can be enjoyed.
 尚、本発明の転写装置に係る第3実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the third embodiment related to the transfer device of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明の転写方法に係る第1実施形態は、モールドに形成されたパターンを被転写体に転写する転写装置における転写方法であって、前記モールドを第1の接触面で保持する第1保持工程と、前記モールドを第2の接触面で保持する第2保持工程と、前記パターンを前記被転写体に転写させる転写工程と、前記第1の接触面で保持される前記モールドとを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させる。 1st Embodiment which concerns on the transfer method of this invention is a transfer method in the transfer apparatus which transfers the pattern formed in the mold to a to-be-transferred body, Comprising: The 1st holding process hold | maintains the said mold on a 1st contact surface A second holding step for holding the mold on a second contact surface, a transfer step for transferring the pattern onto the transfer target, and the mold held on the first contact surface, The relative positions of the first mold holding means and the second mold holding means are changed.
 本発明の転写方法に係る第1実施形態によれば、上述した本発明の転写装置に係る第1実施形態及びその一の態様と同様の各種効果を享受することが出来る。 According to the first embodiment of the transfer method of the present invention, various effects similar to those of the first embodiment and one aspect thereof of the transfer apparatus of the present invention described above can be enjoyed.
 尚、本発明の転写方法に係る第1実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the first embodiment related to the transfer method of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明の転写方法に係る第2実施形態は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、前記第1モールドを第1の接触面で保持する第1保持工程と、前記第1モールドを第2の接触面で保持する第2保持工程と、前記第2モールドを第3の接触面で保持する第3保持工程と、前記第2モールドを第4の接触面で保持する第4保持工程と、前記パターンを前記被転写体に転写させる転写工程とを備え、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置、及び前記第3モールド保持手段と前記第4モールド保持手段との相対的な位置の少なくとも一方を変化させる。 In the second embodiment of the transfer method of the present invention, the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object. A transfer device that transfers to the second surface, a first holding step of holding the first mold on a first contact surface, a second holding step of holding the first mold on a second contact surface, A third holding step for holding the second mold on a third contact surface; a fourth holding step for holding the second mold on a fourth contact surface; and a transfer step for transferring the pattern to the transfer target. And changing at least one of a relative position between the first mold holding means and the second mold holding means and a relative position between the third mold holding means and the fourth mold holding means. .
 本発明の転写方法に係る第2実施形態によれば、上述した本発明の転写装置に係る第2実施形態及び第1の実施形態に係る一の態様と同様の各種効果を享受することが出来る。 According to the second embodiment of the transfer method of the present invention, the same various effects as those of the second embodiment and the first embodiment of the transfer apparatus of the present invention described above can be enjoyed. .
 尚、本発明の転写方法に係る第2実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the second embodiment related to the transfer method of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明のコンピュータプログラムに係る実施形態は、モールドに形成されたパターンを被転写体に転写する転写装置を動作させるためのコンピュータプログラムであって、前記モールドを第1の接触面で保持する第1保持工程と、前記モールドを第2の接触面で保持する第2保持工程と、前記パターンを前記被転写体に転写させる転写工程とを前記転写装置に実行させ、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させる。 An embodiment according to the computer program of the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target, and the first is to hold the mold on a first contact surface. Causing the transfer device to execute a holding step, a second holding step for holding the mold on a second contact surface, and a transfer step for transferring the pattern to the transfer target, and the first mold holding means and the The relative position with respect to the second mold holding means is changed.
 本発明のコンピュータプログラムに係る実施形態によれば、当該コンピュータプログラムを格納するROM、CD-ROM、DVD-ROM、ハードディスク等の記録媒体から、当該コンピュータプログラムをコンピュータに読み込んで実行させれば、或いは、当該コンピュータプログラムを、通信手段を介してコンピュータにダウンロードさせた後に実行させれば、上述した本発明の転写方法に係る第1実施形態における各種動作を転写装置に比較的簡単に実行させることが出来る。 According to the embodiment of the computer program of the present invention, the computer program is read from a recording medium such as a ROM, a CD-ROM, a DVD-ROM, and a hard disk that stores the computer program, and executed. If the computer program is executed after being downloaded to the computer via the communication means, the transfer apparatus can execute the various operations in the first embodiment according to the transfer method of the present invention described above relatively easily. I can do it.
 以上説明したように、本発明の転写装置に係る第1実施形態及び第3実施形態は、第1モールド保持手段と、第2モールド保持手段と、転写手段とを備える。本発明の転写装置に係る第2実施形態は、第1モールド保持手段と、第2モールド保持手段と、第3モールド保持手段と、第4モールド保持手段と、転写手段とを備える。本発明の転写方法に係る第1実施形態は、第1モールド保持工程と、第2モールド保持工程と、転写工程と、モールド保持制御とを備える。本発明の転写方法に係る第2実施形態は、第1モールド保持工程と、第2モールド保持工程と、第3モールド保持工程と、第4モールド保持工程と、転写工程と、第1モールド保持制御工程と、第2モールド保持制御工程とを備える。本発明のコンピュータプログラムに係る実施形態は、第1モールド保持工程と、第2モールド保持工程と、転写工程と、モールド保持制御とを転写装置に実行させる。従って、転写装置におけるモールドを保持する部材とモールドとの接触面においてモールドが滑ることを抑制し、好適な転写動作が可能な転写装置を提供することが出来る。 As described above, the first embodiment and the third embodiment according to the transfer apparatus of the present invention include the first mold holding means, the second mold holding means, and the transfer means. The second embodiment according to the transfer apparatus of the present invention includes a first mold holding means, a second mold holding means, a third mold holding means, a fourth mold holding means, and a transfer means. The first embodiment according to the transfer method of the present invention includes a first mold holding step, a second mold holding step, a transfer step, and mold holding control. The second embodiment according to the transfer method of the present invention includes a first mold holding step, a second mold holding step, a third mold holding step, a fourth mold holding step, a transfer step, and a first mold holding control. A process and a second mold holding control process. The embodiment according to the computer program of the present invention causes the transfer device to execute the first mold holding step, the second mold holding step, the transfer step, and the mold holding control. Therefore, it is possible to provide a transfer device capable of suppressing a slip of the mold on the contact surface between the member holding the mold and the mold in the transfer device and performing a suitable transfer operation.
 本発明の転写装置に係る各種実施形態の作用及び他の利得について、以下に示す実施例を用いてより詳細に説明する。 The operation and other gains of the various embodiments according to the transfer device of the present invention will be described in more detail using the following examples.
 以下、図面を参照して、本発明の実施例について説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
 (1)基本構成例
 先ず、図1を参照して、本発明の転写装置の基本的な構成について説明する。図1は、本発明の転写装置の一実施例であるインプリント装置1の構成を概略的に示す模式図である。
(1) Basic Configuration Example First, the basic configuration of the transfer apparatus of the present invention will be described with reference to FIG. FIG. 1 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 which is an embodiment of a transfer apparatus of the present invention.
 図1に示すインプリント装置1は、UV照射により硬化する転写層を備える被転写体に対してモールド上のパターンを転写するUV式の転写装置である。また、インプリント装置1は、転写する凹凸などのパターンが形成される下側モールド200a及び上側モールド200bを用いて、被転写体である基板300の下面に形成される下側転写層301a及び上面に形成される上側転写層301bの両方に対して転写を行なう構成である。 The imprint apparatus 1 shown in FIG. 1 is a UV-type transfer apparatus that transfers a pattern on a mold to a transfer target having a transfer layer that is cured by UV irradiation. Further, the imprint apparatus 1 uses the lower mold 200a and the upper mold 200b on which patterns such as unevenness to be transferred are formed, and the lower transfer layer 301a and the upper surface formed on the lower surface of the substrate 300 that is a transfer target. In this configuration, transfer is performed on both of the upper transfer layer 301b formed on the substrate.
 尚、図1には、下側モールド200a、上側モールド200b及び基板300の夫々が設置された状態のインプリント装置1が図示されている。 1 shows the imprint apparatus 1 in a state where the lower mold 200a, the upper mold 200b, and the substrate 300 are installed.
 下側モールド200aは、図2(a)に示されるように、中心部にセンターホールを有する円盤状又は円盤に準じた形状であり、パターン面のセンターホール近傍に凹凸などのパターンが形成されるパターン領域が構成される。各モールドの少なくともパターン領域に相当する部位は、例えば石英ガラスなど、UV光を透過し、好適にはUV光の照射による形質変化などの影響が生じ難い材質により構成される。尚、便宜上パターン面のパターン領域外を非パターン領域と記載する。尚、上側モールド200bも下側モールド200aと同様の構成である。また、下側モールド200a及び上側モールド200bのパターン面には、後述する離型時においてモールドと基板の離型性向上を目的とした表面処理、例えば、シランカップリング剤等による表面処理を施し、単分子から数分子程度の厚さを有する離型層が形成されている。 As shown in FIG. 2A, the lower mold 200a has a disk shape having a center hole in the center or a shape similar to the disk, and a pattern such as irregularities is formed near the center hole on the pattern surface. A pattern area is constructed. At least a portion corresponding to the pattern region of each mold is made of a material that transmits UV light, such as quartz glass, and is preferably hardly affected by a change in character due to irradiation with UV light. For convenience, the outside of the pattern area on the pattern surface is referred to as a non-pattern area. The upper mold 200b has the same configuration as the lower mold 200a. Further, the pattern surface of the lower mold 200a and the upper mold 200b is subjected to a surface treatment for the purpose of improving mold releasability of the mold and the substrate at the time of mold release described later, for example, a surface treatment with a silane coupling agent or the like, A release layer having a thickness of a single molecule to several molecules is formed.
 本実施例では、下側モールド200aは、本発明の「モールド」又は「第2モールド」の一具体例であり、上側モールド200bは、本発明の「モールド」又は「第1モールド」の一具体例である。 In this embodiment, the lower mold 200a is a specific example of the “mold” or “second mold” of the present invention, and the upper mold 200b is a specific example of the “mold” or “first mold” of the present invention. It is an example.
 基板300は、中心部にモールドのセンターホールより径の小さいセンターホールを有する円盤状の形状であり、下面及び上面にUV照射により硬化する材質より成る下側転写層301a及び上側転写層301bを有する。 The substrate 300 has a disk-like shape having a center hole whose diameter is smaller than the center hole of the mold at the center, and has a lower transfer layer 301a and an upper transfer layer 301b made of a material that is cured by UV irradiation on the lower surface and the upper surface. .
 インプリント装置1は、図1に示すように下側基台110aを含む下側機構部Aと、上側基台110bを含む上側機構部Bと、下側基台110a及び上側基台110bを連結するボールネジ101と、該ボールネジを回転させるアクチュエータ104と、下側機構部A及び上側機構部Bの動作を制御する制御部102と、該制御部102に対してユーザの指示を入力可能な操作部103とを備えて構成される。 As shown in FIG. 1, the imprint apparatus 1 connects a lower mechanism part A including a lower base 110a, an upper mechanism part B including an upper base 110b, and the lower base 110a and the upper base 110b. A ball screw 101 that rotates, an actuator 104 that rotates the ball screw, a control unit 102 that controls the operation of the lower mechanism unit A and the upper mechanism unit B, and an operation unit that can input user instructions to the control unit 102 103.
 下側機構部Aは、下側基台110aの上面に設けられ、下側センターピン120aと、下側UV照射部130aと、下側センターピン駆動部140aと、下側載置台150aと、下側モールド保持部152aと、下側モールドクランプ153aとを備えて構成される。 The lower mechanism A is provided on the upper surface of the lower base 110a, and includes a lower center pin 120a, a lower UV irradiation unit 130a, a lower center pin driving unit 140a, a lower mounting table 150a, A side mold holding part 152a and a lower mold clamp 153a are provided.
 下側基台110aは、ボード上の部材であって、下側載置台150aと下側開口部151aとが設けられると共に、ボールネジ101がねじ込まれるネジ溝が切られているネジ穴部が存在する。 The lower base 110a is a member on the board. The lower base 110a is provided with a lower mounting table 150a and a lower opening 151a, and has a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut. .
 下側センターピン120aは、夫々径の異なる円柱状の先端部121a、基板支持部122a及びモールド支持部123aを有する部材である。下側センターピン120aは、下端が後述する下側センターピン駆動部140aに連結され、後述する下側載置台150aのセンターホール及び下側開口部151aを貫通する態様で、後述する下側モールド保持面Sa2に対して垂直となるよう支持されている。 The lower center pin 120a is a member having a cylindrical tip portion 121a, a substrate support portion 122a, and a mold support portion 123a having different diameters. The lower center pin 120a is connected to a lower center pin driving unit 140a, which will be described later, and penetrates a center hole and a lower opening 151a of the lower mounting table 150a, which will be described later. It is supported so as to be perpendicular to the surface Sa2.
 下側センターピン120aの先端部121aの径は基板支持部122a及び後述する基板300のセンターホールの夫々の径より小さい。また、基板支持部122aの径は、基板300のセンターホールの径より大きく、モールド支持部123a、後述する下側モールド200a及び上側モールド200bのセンターホールの夫々の径より小さい。また、モールド支持部123aの径は、下側モールド200a及び上側モールド200bのセンターホールの径より大きく、且つ下側載置台150aのセンターホール及び下側開口部151aの夫々の径より小さい。 The diameter of the tip 121a of the lower center pin 120a is smaller than the diameter of the substrate support 122a and the center hole of the substrate 300 described later. The diameter of the substrate support portion 122a is larger than the diameter of the center hole of the substrate 300, and smaller than the diameters of the center holes of the mold support portion 123a, the lower mold 200a and the upper mold 200b described later. Moreover, the diameter of the mold support part 123a is larger than the diameters of the center holes of the lower mold 200a and the upper mold 200b and smaller than the diameters of the center hole and the lower opening 151a of the lower mounting table 150a.
 下側UV照射部130aは、不図示の信号線などを介して制御部102と電気的に接続されており、制御部102から供給される制御信号に応じて基板300の下側転写層301aを硬化させるUV光を下側開口部151a及び後述する下側載置台150aのUV光透過領域を介して、基板300の下側転写層301aに照射する。尚、下側UV照射部130aは、転写動作におけるUV光の照射時など、必要時以外は退避している構成であってもよい。 The lower UV irradiation unit 130a is electrically connected to the control unit 102 via a signal line (not shown), and the lower transfer layer 301a of the substrate 300 is applied in accordance with a control signal supplied from the control unit 102. The lower transfer layer 301a of the substrate 300 is irradiated with UV light to be cured through the lower opening 151a and the UV light transmission region of the lower mounting table 150a described later. The lower UV irradiation unit 130a may be configured to be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
 下側センターピン駆動部140aは、制御部102から供給される制御信号に応じて、下側センターピン120aを軸方向、つまり下側載置台150aの下側モールド保持面Sa2に垂直な方向に移動する。 The lower center pin driving unit 140a moves the lower center pin 120a in the axial direction, that is, in a direction perpendicular to the lower mold holding surface Sa2 of the lower mounting table 150a in accordance with a control signal supplied from the control unit 102. To do.
 また、下側センターピン駆動部140aは、後述する転写動作の後の下側モールド200aと基板300との離型時に、下側センターピン120aを垂直上方向に移動させることで基板300を下側モールド200aから離型させる構成である。 In addition, the lower center pin driving unit 140a moves the lower center pin 120a vertically upward when releasing the lower mold 200a and the substrate 300 after a transfer operation described later. In this configuration, the mold is released from the mold 200a.
 下側載置台150aは、転写装置の第1実施形態に係る下側機構部Aにおける本発明の「第2モールド保持手段」、又は転写装置の第2実施形態に係る「第4モールド保持手段」の一具体例であって、下側モールド200aを保持するための平坦な下側モールド保持面Sa2を有し、該下側モールド保持面Sa2には、中心部にセンターホールが設けられると共に、下側モールド保持部152aと下側モールドクランプ153aとが設けられる。また、下側載置台150aの下側モールド保持面Sa2は、典型的には、下側モールド200aのパターン領域より広く構成されている。下側載置台150aは、下側モールド200aと基板300の位置合わせをするために、下側モールド保持面Sa2の2次元の各方向(X、Y)に移動可能に構成される。下側モールド保持面Sa2は、本実施例の下側機構部における第2の接触面の一具体例であって、下側載置台150aは、後述するように下側モールド200aを保持する際に、下側モールド保持面Sa2において該モールドと接触する。 The lower mounting table 150a is the "second mold holding means" of the present invention in the lower mechanism portion A according to the first embodiment of the transfer apparatus, or the "fourth mold holding means" according to the second embodiment of the transfer apparatus. And has a flat lower mold holding surface Sa2 for holding the lower mold 200a, and the lower mold holding surface Sa2 is provided with a center hole at the center, A side mold holding part 152a and a lower mold clamp 153a are provided. Further, the lower mold holding surface Sa2 of the lower mounting table 150a is typically configured wider than the pattern area of the lower mold 200a. The lower mounting table 150a is configured to be movable in two-dimensional directions (X, Y) of the lower mold holding surface Sa2 in order to align the lower mold 200a and the substrate 300. The lower mold holding surface Sa2 is a specific example of the second contact surface in the lower mechanism portion of the present embodiment, and the lower mounting table 150a is used when holding the lower mold 200a as described later. The lower mold holding surface Sa2 comes into contact with the mold.
 下側載置台150aのうち、少なくとも載置される下側モールド200aのパターンが形成される領域に対応する領域は、例えば石英ガラスなどのUV光を透過し、且つUV光の照射により形質変化などの生じ難い材質により構成されるUV光透過領域である。尚、下側基台110aの開口部151aは、下側載置台150aのUV光透過領域に対応する領域に形成されている。 Of the lower mounting table 150a, at least the region corresponding to the region where the pattern of the lower mold 200a to be mounted is formed is transparent to UV light such as quartz glass, and has a phenotypic change by irradiation with UV light. This is a UV light transmission region made of a material that is difficult to generate. The opening 151a of the lower base 110a is formed in a region corresponding to the UV light transmission region of the lower mounting table 150a.
 下側モールド保持部152aは、転写装置の第1実施形態に係る下側機構部Aにおける本発明の「第1モールド保持手段」、又は転写装置の第2実施形態に係る「第3モールド保持手段」の一具体例であって、真空吸着などにより下側モールド200aを保持するための下側吸着溝155aを有する下側吸着部154aと、該下側吸着部154aを支持する弾性部材156aとを備える。 The lower mold holding part 152a is the "first mold holding means" of the present invention in the lower mechanism part A according to the first embodiment of the transfer device, or the "third mold holding means" according to the second embodiment of the transfer device. A lower suction portion 154a having a lower suction groove 155a for holding the lower mold 200a by vacuum suction or the like, and an elastic member 156a that supports the lower suction portion 154a. Prepare.
 図2(b)は、下側載置台150aを上方(より具体的には、下側モールド保持面Sa2に対して垂直上方。以降、垂直上方向又は単に上方と記載し、垂直下方については、垂直下方向又は下方と記載する)から見た場合の各部の配置を示す模式図である。 FIG. 2B shows the lower mounting table 150a upward (more specifically, vertically upward with respect to the lower mold holding surface Sa2, hereinafter referred to as a vertically upward direction or simply upward). It is a schematic diagram which shows arrangement | positioning of each part at the time of seeing from the perpendicular | vertical downward direction or the downward direction.
 下側吸着部154aは、図2(b)に示されるように、載置される下側モールド200aの外周縁部において吸着を行なうように、下側モールド保持面Sa2の対応する領域に形成される溝内に配置される。下側吸着部154aは、接触部において下側モールド200aを傷つけないように、例えば、柔軟な樹脂製の部材などで構成されることが好ましい。また、後に詳述するように下側吸着部154aの先端部(つまり、下側モールド200aを吸着する下側吸着溝155aが形成される部位)は、下側機構部Aにおける本発明の第1の接触面の一具体例であって、下側モールド200aと接触する下側モールド吸着面Sa1を形成する。 As shown in FIG. 2B, the lower suction portion 154a is formed in a corresponding region of the lower mold holding surface Sa2 so as to perform suction at the outer peripheral edge portion of the lower mold 200a to be placed. Arranged in the groove. The lower suction portion 154a is preferably configured with, for example, a flexible resin member so as not to damage the lower mold 200a at the contact portion. Further, as described in detail later, the tip of the lower suction portion 154a (that is, the portion where the lower suction groove 155a for sucking the lower mold 200a is formed) is the first mechanism of the present invention in the lower mechanism portion A. A lower mold suction surface Sa1 that is in contact with the lower mold 200a is formed.
 下側吸着溝155aは、接続される真空ポンプなどの減圧機構(不図示)の動作により、溝内の気圧が低減されることで下側モールド200aを下側吸着部154aに吸着可能に構成される。 The lower suction groove 155a is configured to be able to suck the lower mold 200a to the lower suction portion 154a by reducing the atmospheric pressure in the groove by the operation of a decompression mechanism (not shown) such as a connected vacuum pump. The
 弾性部材156aは、下側モールド保持面Sa2に形成される溝内に配置され、下側吸着部154aを支持する。弾性部材156aは、樹脂などの弾性を有する部材、又はバネなどの機械的な構造により下側吸着部154aと下側載置台150aとの間に弾性力を付勢可能な構成である。弾性部材156aの存在により、下側吸着部154aは、例えば後述する下側モールドクランプ153aによって垂直下方に押圧されることで、該押圧のための力と、弾性部材156aからの弾性力とが釣り合う位置まで移動する。 The elastic member 156a is disposed in a groove formed in the lower mold holding surface Sa2, and supports the lower suction portion 154a. The elastic member 156a is configured to be able to bias an elastic force between the lower suction portion 154a and the lower mounting table 150a by a member having elasticity such as a resin or a mechanical structure such as a spring. Due to the presence of the elastic member 156a, the lower suction portion 154a is pressed vertically downward by, for example, a lower mold clamp 153a described later, so that the force for pressing and the elastic force from the elastic member 156a are balanced. Move to position.
 下側モールドクランプ153aは、下側載置台150aにおける下側モールド200aが載置される位置より更に外周縁部に設けられるクランプ機構である。下側モールドクランプ153aは、制御部102からの制御信号に応じた圧力で下側モールド200aの非パターン領域を下方に向けて押圧することで下側モールド200aを保持可能な構成である。また、下側モールドクランプ153aは、制御部102からの制御信号に応じて、下側モールド200aを保持するために必要な押圧力より強い力で下側モールド200aを押圧することで、下側モールド保持部152aの弾性部材156aと共に下側モールド200aを弾性変形させることが可能である。以下、モールドを保持するための押圧力を保持力と記載し、モールドを変形させるための押圧力を変形力と記載する。 The lower mold clamp 153a is a clamp mechanism that is provided on the outer peripheral edge portion further than the position on the lower mounting table 150a where the lower mold 200a is mounted. The lower mold clamp 153a is configured to hold the lower mold 200a by pressing the non-pattern area of the lower mold 200a downward with pressure according to a control signal from the control unit 102. Further, the lower mold clamp 153a presses the lower mold 200a with a force stronger than the pressing force required to hold the lower mold 200a in accordance with a control signal from the control unit 102, thereby lowering the lower mold. The lower mold 200a can be elastically deformed together with the elastic member 156a of the holding portion 152a. Hereinafter, the pressing force for holding the mold is described as holding force, and the pressing force for deforming the mold is described as deformation force.
 ここで、図2(c)を参照して下側モールドクランプ153aの構造と配置について説明する。図2(c)は、下側モールド200aを押圧している状態の下側モールドクランプ153aを垂直上方向から見た場合の模式図に、更に後述する上側モールドクランプ153bの配置位置を重ねて示した図である。下側モールドクランプ153aは、下側モールド200aを押圧するために、円盤形状に合わせて下側モールド200aと同心円上に配置される複数の円弧状の部材より構成される。 Here, the structure and arrangement of the lower mold clamp 153a will be described with reference to FIG. FIG. 2C is a schematic view of the lower mold clamp 153a in a state where the lower mold 200a is being pressed as viewed from the vertically upward direction, and further illustrates the arrangement position of the upper mold clamp 153b described later. It is a figure. The lower mold clamp 153a is composed of a plurality of arc-shaped members arranged concentrically with the lower mold 200a in accordance with the disk shape in order to press the lower mold 200a.
 上側モールドクランプ153bも同様の円上に配置される複数の円弧状の部材より構成される。また、図2(c)に示されるように、下側モールドクランプ153aと上側モールドクランプ153bとは、夫々の円弧状の扇形の部材が互いに入れ違いとなり、両者を下側モールド保持面Sa2と平行な面上に投影する場合でも、互いに重ならないように配置されている。 The upper mold clamp 153b is also composed of a plurality of arc-shaped members arranged on the same circle. Further, as shown in FIG. 2C, the lower mold clamp 153a and the upper mold clamp 153b are configured such that respective arc-shaped fan-shaped members are mutually inserted and are parallel to the lower mold holding surface Sa2. Even when projecting onto a surface, they are arranged so as not to overlap each other.
 続いて、図1に戻り、上側機構部Bについて説明する。 Subsequently, returning to FIG. 1, the upper mechanism B will be described.
 上側機構部Bは、上側基台110bの下面に設けられ、上側センターピン120bと、上側UV照射部130bと、上側センターピン駆動部140bと、上側載置台150bと、上側モールド保持部152bと、上側モールドクランプ153bとを備えて構成される。 The upper mechanism B is provided on the lower surface of the upper base 110b, and includes an upper center pin 120b, an upper UV irradiation unit 130b, an upper center pin driving unit 140b, an upper mounting table 150b, an upper mold holding unit 152b, And an upper mold clamp 153b.
 上側基台110bは、ボード上の部材であって、上側載置台150bと上側開口部151bとが設けられると共に、ボールネジ101がねじ込まれるネジ溝が切られているネジ穴部が存在する。 The upper base 110b is a member on the board, and is provided with an upper mounting table 150b and an upper opening 151b, and there is a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut.
 上側センターピン120bは、下側センターピン120aの基板支持部122aと同程度の径の先端部を有する円柱状の部材である。上側センターピン120bは、上端が後述する上側センターピン駆動部140bに連結され、後述する上側載置台150bのセンターホール及び上側開口部151bを貫通する態様で、下側モールド保持面Sa2及び後述する上側モールド保持面Sb2に対して垂直となるよう支持されている。 The upper center pin 120b is a cylindrical member having a tip portion having a diameter similar to that of the substrate support portion 122a of the lower center pin 120a. The upper center pin 120b is connected to an upper center pin driving unit 140b, which will be described later, and penetrates the center hole and the upper opening 151b of the upper mounting table 150b, which will be described later, and the lower mold holding surface Sa2 and the upper side, which will be described later. It is supported so as to be perpendicular to the mold holding surface Sb2.
 上側UV照射部130bは、不図示の信号線などを介して制御部102と電気的に接続されており、制御部102から供給される制御信号に応じて基板300の上側転写層301bを硬化させるUV光を上側開口部151b及び後述する上側載置台150bのUV光透過領域を介して、基板300の上側転写層301bに照射する。尚、上側UV照射部130bは、転写動作におけるUV光の照射時など、必要時以外は退避している構成であってもよい。 The upper UV irradiation unit 130b is electrically connected to the control unit 102 via a signal line (not shown) and the like, and the upper transfer layer 301b of the substrate 300 is cured in accordance with a control signal supplied from the control unit 102. The upper transfer layer 301b of the substrate 300 is irradiated with UV light through the upper opening 151b and a UV light transmission region of the upper mounting table 150b described later. The upper UV irradiation unit 130b may be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
 上側センターピン駆動部140bは、制御部102から供給される制御信号に応じて、上側センターピン120bを軸方向、つまり上側載置台150bの上側モールド保持面Sbに垂直な方向に移動する。 The upper center pin driving unit 140b moves the upper center pin 120b in the axial direction, that is, in a direction perpendicular to the upper mold holding surface Sb of the upper mounting table 150b in accordance with a control signal supplied from the control unit 102.
 また、上側センターピン駆動部140bは、後述する転写動作の後の上側モールド200bと基板300との離型時に、上側センターピン120bを垂直下方向に押圧することで、基板300の垂直方向の位置を固定する構成である。 Further, the upper center pin driving unit 140b presses the upper center pin 120b in the vertical downward direction when the upper mold 200b and the substrate 300 after the transfer operation described later are released, thereby causing the vertical position of the substrate 300 to move. Is fixed.
 上側載置台150bは、転写装置の第1実施形態に係る上側機構部Aにおける本発明の「第2モールド保持手段」、又は転写装置の第2実施形態に係る「第2モールド保持手段」の一具体例であって、上側モールド200bを保持するための平坦な上側モールド保持面Sb2を有し、該上側モールド保持面Sb2には、中心部にセンターホールが設けられると共に、上側モールド保持部152bと上側モールドクランプ153bとが設けられる。また、上側載置台150bの上側モールド保持面Sb2は、典型的には、上側モールド200bのパターン領域より広く構成されている。上側載置台150bは、上側モールド200bと基板300の位置合わせをするために、上側モールド保持面Sb2の2次元の各方向(X、Y)に移動可能に構成される。上側モールド保持面Sb2は、本実施例の上側機構部Bにおける第4の接触面の一具体例であって、上側載置台150bは、後述するように、上側モールド200bを保持する際に、上側モールド保持面Sb2において該モールドと接触する。 The upper mounting table 150b is one of the “second mold holding means” of the present invention in the upper mechanism portion A according to the first embodiment of the transfer apparatus or the “second mold holding means” according to the second embodiment of the transfer apparatus. It is a specific example, and has a flat upper mold holding surface Sb2 for holding the upper mold 200b. The upper mold holding surface Sb2 is provided with a center hole at the center, and an upper mold holding portion 152b. An upper mold clamp 153b is provided. The upper mold holding surface Sb2 of the upper mounting table 150b is typically configured to be wider than the pattern area of the upper mold 200b. The upper mounting table 150b is configured to be movable in two-dimensional directions (X, Y) of the upper mold holding surface Sb2 in order to align the upper mold 200b and the substrate 300. The upper mold holding surface Sb2 is a specific example of the fourth contact surface in the upper mechanism portion B of the present embodiment, and the upper mounting table 150b has an upper side when holding the upper mold 200b, as will be described later. The mold holding surface Sb2 comes into contact with the mold.
 上側載置台150bのうち、少なくとも載置される上側モールド200bのパターンが形成される領域に対応する領域は、例えば石英ガラスなどのUV光を透過し、且つUV光の照射により形質変化などの生じ難い材質により構成されるUV光透過領域である。尚、上側基台110bの開口部151bは、上側載置台150bのUV光透過領域に対応する領域に形成されている。 Of the upper mounting table 150b, at least a region corresponding to a region where the pattern of the upper mold 200b to be mounted is formed transmits UV light such as quartz glass, and changes in characteristics are caused by irradiation of the UV light. This is a UV light transmission region made of a difficult material. The opening 151b of the upper base 110b is formed in a region corresponding to the UV light transmission region of the upper mounting table 150b.
 上側モールド保持部152bは、本発明の転写装置の第1実施形態に係る「第1モールド保持手段」、又は転写装置の第2実施形態に係る「第1モールド保持手段」の一具体例であって、真空吸着などにより上側モールド200bを保持するための上側吸着溝155bを有する上側吸着部154bと、該上側吸着部154bを支持する上側弾性部材156bとを備える。尚、上側吸着部154b、上側吸着溝155b及び上側弾性部材156bの夫々は、上側機構部Aの下側吸着部154a、下側吸着溝155a及び下側弾性部材156aと同様の構成である。 The upper mold holding part 152b is a specific example of the “first mold holding unit” according to the first embodiment of the transfer device of the present invention or the “first mold holding unit” according to the second embodiment of the transfer device. And an upper suction part 154b having an upper suction groove 155b for holding the upper mold 200b by vacuum suction or the like, and an upper elastic member 156b that supports the upper suction part 154b. Each of the upper suction portion 154b, the upper suction groove 155b, and the upper elastic member 156b has the same configuration as the lower suction portion 154a, the lower suction groove 155a, and the lower elastic member 156a of the upper mechanism portion A.
 上側モールドクランプ153bは、上側載置台150bにおける上側モールド200bが載置される位置より更に外周縁部に設けられるクランプ機構である。上側モールドクランプ153bは、制御部102からの制御信号に応じた圧力で上側モールド200bの非パターン領域を上方に向けて押圧することで上側モールド200bを保持可能な構成である。また、上側モールドクランプ153bは、制御部102からの制御信号に応じて、上側モールド200bを保持するために必要な押圧力より強い力で上側モールド200bを押圧することで、上側モールド保持部152bの上側弾性部材156bと共に上側モールド200bを弾性変形させることが可能である。尚、上側吸着部154bの先端部(つまり、上側モールド200bを吸着する上側吸着溝155bが形成される部位)は、本実施例の上側機構部Bにおける第1の接触面の一具体例であって、上側モールド200bと接触する上側モールド吸着面Sb1を形成する。 The upper mold clamp 153b is a clamp mechanism that is provided at the outer peripheral edge portion further than the position on the upper mounting table 150b where the upper mold 200b is mounted. The upper mold clamp 153b is configured to hold the upper mold 200b by pressing the non-pattern area of the upper mold 200b upward with pressure according to a control signal from the control unit 102. Further, the upper mold clamp 153b presses the upper mold 200b with a force stronger than the pressing force necessary to hold the upper mold 200b in accordance with a control signal from the control unit 102, so that the upper mold holding unit 152b The upper mold 200b can be elastically deformed together with the upper elastic member 156b. The tip of the upper suction portion 154b (that is, the portion where the upper suction groove 155b that sucks the upper mold 200b is formed) is a specific example of the first contact surface in the upper mechanism portion B of the present embodiment. Thus, the upper mold suction surface Sb1 that contacts the upper mold 200b is formed.
 制御部102は、例えばCPU(Central Processing Unit)などの情報処理装置であって、本実施形態における「モールド保持制御手段」の一具体例であり、同じくモールド保持制御手段を構成する下側機構部Aの下側モールドクランプ153a及び上側機構部Bの上側モールドクランプ153bに対して制御信号を供給することで、各モールド保持部の位置制御を行い、モールドの保持又はモールドの変形などを制御する。その他にも、制御部102は、操作部103より供給されるユーザの指示を示す入力信号に応じて、下側機構部Aの下側UV照射部130a、下側センターピン駆動部140a及び下側モールドクランプ153a、上側機構部Bの上側UV照射部130b、上側センターピン駆動部140b及び上側モールドクランプ153b、並びにアクチュエータ104の各部の動作を制御する制御信号を供給する。 The control unit 102 is an information processing apparatus such as a CPU (Central Processing Unit), for example, and is a specific example of the “mold holding control unit” in the present embodiment. By supplying control signals to the lower mold clamp 153a of A and the upper mold clamp 153b of the upper mechanism portion B, the position of each mold holding portion is controlled to control the holding of the mold or the deformation of the mold. In addition to this, the control unit 102 determines the lower UV irradiation unit 130a, the lower center pin driving unit 140a, and the lower side of the lower mechanism unit A according to an input signal indicating a user instruction supplied from the operation unit 103. Control signals for controlling the operations of the mold clamp 153 a, the upper UV irradiation unit 130 b of the upper mechanism B, the upper center pin driving unit 140 b and the upper mold clamp 153 b, and the actuator 104 are supplied.
 操作部103は、ユーザにより指示を入力可能な複数のボタン又はキーボードなどにより構成され、入力されたユーザの指示に応じた入力信号を制御部102に供給する。制御部102では、入力信号に応じて、内部メモリなどに格納される動作処理プログラムなどを読み込むことにより、指示に応じた制御信号を生成し、各部に供給する。 The operation unit 103 includes a plurality of buttons or a keyboard that can input an instruction by the user, and supplies an input signal corresponding to the input user instruction to the control unit 102. The control unit 102 reads an operation processing program stored in an internal memory or the like according to the input signal, generates a control signal according to the instruction, and supplies the control signal to each unit.
 アクチュエータ104は、制御部102より供給される制御信号に応じて、上側載置台150bを下側載置台150aに対して接近又は離隔方向に移動可能なモータなどの機構である。具体的には、アクチュエータ104は、制御部102から供給される制御信号に応じてボールネジ101を回転させることにより、該ボールネジ101に契合する上側基台110bを、上側載置台150bと下側載置台150aとの平行な位置関係を維持したまま、垂直方向に移動する。このとき、例えばボールネジ101は、下側基台110aと上側基台110bとの四隅を夫々連結するように4本設けられており、アクチュエータ104も夫々対応するボールネジ101を回転させるべく複数設けられている。 The actuator 104 is a mechanism such as a motor that can move the upper mounting table 150b toward or away from the lower mounting table 150a in accordance with a control signal supplied from the control unit 102. Specifically, the actuator 104 rotates the ball screw 101 in accordance with a control signal supplied from the control unit 102, whereby the upper base 110b engaged with the ball screw 101 is changed to the upper mounting base 150b and the lower mounting base. It moves in the vertical direction while maintaining the parallel positional relationship with 150a. At this time, for example, four ball screws 101 are provided so as to connect the four corners of the lower base 110a and the upper base 110b, and a plurality of actuators 104 are also provided to rotate the corresponding ball screws 101. Yes.
 このようなアクチュエータ104の動作によれば、上側基台110bを垂直上方向に移動することで、上側載置台150bが下側載置台150aから離間し、上側基台110bを垂直下方向に移動することで、上側載置台150bが下側載置台150aに近接する。 According to such an operation of the actuator 104, by moving the upper base 110b in the vertical upward direction, the upper mounting base 150b is separated from the lower mounting base 150a, and the upper base 110b is moved in the vertical downward direction. Thus, the upper mounting table 150b comes close to the lower mounting table 150a.
 アクチュエータ140は、後述する転写動作において、上側載置台150bを垂直下方向に移動させることで、上側モールド200bと基板300とを相互に押圧させ、更に下側モールド200aと基板300とを相互に押圧する。 The actuator 140 moves the upper mounting table 150b vertically downward in a transfer operation described later, thereby pressing the upper mold 200b and the substrate 300 to each other, and further pressing the lower mold 200a and the substrate 300 to each other. To do.
 また、アクチュエータ104は、後述する転写動作の後の上側モールド200bと基板300との離型時に、上側モールド200bを保持した状態で上側載置台150bを垂直上方向に移動させることで上側モールド200bを基板300から離型させる。 The actuator 104 moves the upper mold table 150b vertically upward while holding the upper mold 200b when the upper mold 200b and the substrate 300 after the transfer operation described later are released. Release from the substrate 300.
 図3は、下側基台110a、下側機構部A及び周辺の構成を垂直上方向から見た場合の模式透過図である。尚、図3には、下側載置台150aに設けられる下側モールド保持部152a及び下側モールドクランプ153aについては図示していない。 FIG. 3 is a schematic transmission diagram when the lower base 110a, the lower mechanism A, and the surrounding configuration are viewed from the vertically upward direction. Note that FIG. 3 does not show the lower mold holding portion 152a and the lower mold clamp 153a provided on the lower mounting table 150a.
 図3に示されるように、インプリント装置1では、正方形の下側基台110aの四隅にポールネジ101が4本螺合されており、中心部に正方形且つ下側基台110aより面積の小さい下側載置台150aが配置されている。また、下側基台110aの中心部であり、少なくとも下側載置台150aに載置される下側モールド200aのパターン領域に相当する部分には円形の開口部151aが形成されており、該開口部151aの下方には下側UV照射部130aが形成されている。 As shown in FIG. 3, in the imprint apparatus 1, four pole screws 101 are screwed into the four corners of a square lower base 110a, and the bottom is a square at the center and smaller in area than the lower base 110a. A side mounting table 150a is arranged. In addition, a circular opening 151a is formed in a central portion of the lower base 110a and at least a portion corresponding to a pattern region of the lower mold 200a placed on the lower placement base 150a. A lower UV irradiation part 130a is formed below the part 151a.
 下側基台110aの四隅に配されるポールネジ101の夫々には、アクチュエータ104が夫々接続されており、制御部102からの制御信号に基づいて、ポールネジの回転を行なう。 The actuator 104 is connected to each of the pole screws 101 arranged at the four corners of the lower base 110a, and the pole screws are rotated based on a control signal from the control unit 102.
 尚、上側基台110b及び上側機構部Bについても、下側基台110a及び下側機構部Aと同様の構成であり、正方形の上側基台110bの四隅に、下側基台110aから垂直上方に伸びる4本のポールネジ101が螺合されている。 The upper base 110b and the upper mechanism B are also configured in the same manner as the lower base 110a and the lower mechanism A, and are vertically upward from the lower base 110a at the four corners of the square upper base 110b. Four pole screws 101 extending in the direction are screwed together.
 続いて、図4を参照して、下側載置台150aに設けられる下側モールド保持部152a及び下側モールドクランプ153aの構造について説明する。図4(a)乃至(c)は、夫々下側載置台150a及び下側モールド保持部152aの構造を平面的に示す模式図である。 Subsequently, the structure of the lower mold holding portion 152a and the lower mold clamp 153a provided on the lower mounting table 150a will be described with reference to FIG. FIGS. 4A to 4C are schematic views showing the structures of the lower mounting table 150a and the lower mold holding part 152a in plan, respectively.
 図4(a)に示されるように、下側弾性部材156aに保持される下側吸着部154aの先端部は、下側載置台150aの下側モールド保持面Sa2よりも垂直上方向に位置するように配置されている。ここに、図4(a)に示される下側吸着部154aの先端部(つまり、下側モールド200aを吸着する下側吸着溝155aが形成される部位)が形成する面を下側モールド吸着面Sa1とする。他方で、下側載置台150aにおいて下側モールド200aと接する部位であり、好適には下側モールド保持面Sa2上にある部位が形成する面を下側モールド保持面Sa2とする。下側モールド吸着面Sa1は、本実施例における第1の接触面の具体例であり、下側吸着部154aは、本実施例における第1モールド保持手段の具体例を構成する。また、下側モールド保持面Sa2は、本実施例における第2の接触面の具体例であり、下側載置台150aは、本実施例における第2モールド保持手段の具体例を構成する。尚、このとき、下側モールド吸着面Sa1と下側モールド保持面Sa2とは、少なくとも下側モールド吸着面Sa1において保持される下側モールド200aに対して、下側モールド保持面Sa2を形成する下側載置台150aが接しない程度に離間しており、例えば双方の距離は100マイクロメートル以上離れていることが好ましい。 As shown in FIG. 4A, the front end portion of the lower suction portion 154a held by the lower elastic member 156a is positioned vertically upward with respect to the lower mold holding surface Sa2 of the lower mounting table 150a. Are arranged as follows. Here, the surface formed by the tip of the lower suction portion 154a shown in FIG. 4A (that is, the portion where the lower suction groove 155a for sucking the lower mold 200a is formed) is defined as the lower mold suction surface. Sa1. On the other hand, the surface of the lower mounting table 150a that is in contact with the lower mold 200a, and preferably the surface formed by the region on the lower mold holding surface Sa2, is referred to as the lower mold holding surface Sa2. The lower mold suction surface Sa1 is a specific example of the first contact surface in the present embodiment, and the lower suction portion 154a constitutes a specific example of the first mold holding means in the present embodiment. The lower mold holding surface Sa2 is a specific example of the second contact surface in the present embodiment, and the lower mounting table 150a constitutes a specific example of the second mold holding means in the present embodiment. At this time, the lower mold suction surface Sa1 and the lower mold holding surface Sa2 form a lower mold holding surface Sa2 with respect to the lower mold 200a held at least on the lower mold suction surface Sa1. The side mounting tables 150a are separated so as not to contact each other. For example, the distance between the two is preferably 100 micrometers or more.
 下側吸着部154aは、下側弾性部材156aにより下側載置台150aに接続されている。少なくとも下側弾性部材156aは、例えば、押圧などにより下側吸着部154aの先端部が下側載置台150aにおける下側モールド保持面Sa2と同一の高さとなるように(つまり、下側モールド吸着面Sa1が下側モールド保持面Sa2と同一の高さとなるように)変形可能な材質とする。 The lower suction portion 154a is connected to the lower mounting table 150a by a lower elastic member 156a. At least the lower elastic member 156a is, for example, pressed so that the tip of the lower suction portion 154a has the same height as the lower mold holding surface Sa2 in the lower mounting table 150a (that is, the lower mold suction surface). It is made of a deformable material (so that Sa1 has the same height as the lower mold holding surface Sa2).
 このような変形を高精度に実現するために、下側弾性部材156aは、ストリッパボルトやシムなどで調整されている。また、下側弾性部材156aは、下側載置台150aとの接触面においてカジリが生じ難い構造であることが好ましく、例えば下側載置台150aとは異なる金属材料により構成されるものや、ボールブッシュ及びシャフトの組み合わせや、リテーナ構造などが採用される。尚、下側弾性部材156aは上記に示した変形可能な材質に限定されず、同様の変形又は移動が可能な機械的な機構であってもよい。 In order to realize such deformation with high accuracy, the lower elastic member 156a is adjusted with a stripper bolt or shim. The lower elastic member 156a preferably has a structure in which galling is unlikely to occur on the contact surface with the lower mounting table 150a. For example, the lower elastic member 156a is made of a metal material different from that of the lower mounting table 150a, In addition, a combination of shafts and a retainer structure are employed. The lower elastic member 156a is not limited to the deformable material shown above, and may be a mechanical mechanism that can be similarly deformed or moved.
 このような構造の下側モールド保持部152aにおいて、制御部102は、下側吸着部154a上に載置される下側モールド200aを、不図示の真空ポンプなどを動作させることで下側吸着溝155a内を減圧して吸着する。このとき、下側モールド200aは、図4(b)に示されるように、下側モールド吸着面Sa1において、吸着により保持される。 In the lower mold holding part 152a having such a structure, the control unit 102 operates the lower mold 200a placed on the lower suction part 154a by operating a vacuum pump (not shown) or the like. The inside of 155a is depressurized and adsorbed. At this time, as shown in FIG. 4B, the lower mold 200a is held by suction on the lower mold suction surface Sa1.
 更に、制御部102は、下側モールドクランプ153aを動作させて、下側モールド200aを垂直下方向の下側載置台150aに押しつけることで、下側モールドクランプ153aと下側載置台150aとの間で下側モールド200aを挟持する。このとき、下側モールド200aが下側モールドクランプ153aにより垂直下方向(図4(c)の矢印方向)に押圧されることで、下側モールド200aを介して押圧される下側弾性部材156aに変形が生じ、下側吸着部154aが垂直下方向に押し込まれる。押し込まれた下側吸着部154aの先端部(つまり、下側モールド吸着面Sa1を形成する部位)は、図4(c)に示されるように、下側載置台150aにおける下側モールド保持面Sa2に移動し、下側モールド吸着面Sa1と下側モールド保持面Sa2とが同一の高さとなる。 Further, the control unit 102 operates the lower mold clamp 153a and presses the lower mold 200a against the lower mounting table 150a in the vertical lower direction, so that the space between the lower mold clamp 153a and the lower mounting table 150a is increased. To hold the lower mold 200a. At this time, the lower mold 200a is pressed vertically downward (arrow direction in FIG. 4C) by the lower mold clamp 153a, so that the lower elastic member 156a pressed through the lower mold 200a is pressed. Deformation occurs, and the lower suction part 154a is pushed vertically downward. As shown in FIG. 4C, the distal end portion of the lower suction portion 154a that has been pushed in (that is, the portion that forms the lower mold suction surface Sa1) is located at the lower mold holding surface Sa2 of the lower mounting table 150a. The lower mold suction surface Sa1 and the lower mold holding surface Sa2 become the same height.
 尚、下側載置台150a及び下側モールド保持部152aの構造は、図4(a)に示される構造に限られず、上述した動作が実施可能であるならどのような構造であっても構わない。例えば、図4(d)に示されるように、下側載置台150aは、上面において、基板300外径より外周側の部分より周縁部方向に向けて、他の部分より垂直下方向に所定の深さを有する段差構造であってよい。尚、段差構造の深さは、下側モールド吸着面Sa1と下側モールド保持面Sa2との距離に合わせて任意に設定されて良く、少なくとも下側モールド吸着面Sa1において保持される下側モールド200aに対して、下側載置台150aが接しない程度、例えば、100マイクロメートルは離間していることが好ましい。また、段差構造の形状は、下側モールド吸着面Sa1において保持される下側モールド200aに対して、下側載置台150aが接することなく、且つ下側モールドクランプ153aの動作により下側モールド吸着面Sa1と下側モールド保持面Sa2とが同一の高さとなることを阻害しない限りはいかなる形状であってもよい。 The structures of the lower mounting table 150a and the lower mold holding part 152a are not limited to the structure shown in FIG. 4A, and any structure may be used as long as the above-described operation can be performed. . For example, as shown in FIG. 4D, the lower mounting table 150a has a predetermined upper surface on the upper surface in a direction perpendicular to the outer peripheral side from the outer diameter of the substrate 300 and toward the peripheral edge. It may be a step structure having a depth. The depth of the step structure may be arbitrarily set according to the distance between the lower mold suction surface Sa1 and the lower mold holding surface Sa2, and at least the lower mold 200a held on the lower mold suction surface Sa1. On the other hand, it is preferable that the lower mounting table 150a is not in contact, for example, 100 micrometers apart. The shape of the step structure is such that the lower mold holding surface 150a is not in contact with the lower mold 200a held on the lower mold suction surface Sa1, and the lower mold clamp surface 153a is operated to operate the lower mold suction surface. Any shape may be used as long as it does not hinder Sa1 and the lower mold holding surface Sa2 from having the same height.
 また、図4(e)に示されるように、下側弾性部材156a及び下側吸着部154aが配置される位置を境に下側載置台150aを異なる部材で形成する構造としてもよい。例えば、UV式のインプリント装置1であれば、下側弾性部材156a及び下側吸着部154aより内周側の斜線部分を石英ガラスなどの透明材料で形成し、外周側の無地部分を金属材料などで構成し、両者を組み合わせる構成としてもよい。このような構造とすることで、下側載置台150aの形状加工がより容易となり、装置構成上のコスト低下などの点で有効となる。尚、上側載置台150b及び上側モールド保持部152bの夫々も下側載置台150a及び下側モールド保持部152aの夫々の構造に準じた構造であってよい。 Further, as shown in FIG. 4 (e), the lower mounting table 150a may be formed of different members at the position where the lower elastic member 156a and the lower suction portion 154a are arranged. For example, in the case of the UV-type imprint apparatus 1, the hatched portion on the inner peripheral side from the lower elastic member 156a and the lower suction portion 154a is formed of a transparent material such as quartz glass, and the plain portion on the outer peripheral side is a metal material It is good also as a structure which comprises by combining both. With such a structure, the shape processing of the lower mounting table 150a becomes easier, which is effective in terms of cost reduction in the apparatus configuration. Each of the upper mounting table 150b and the upper mold holding unit 152b may have a structure according to the structure of the lower mounting table 150a and the lower mold holding unit 152a.
 尚、特に記述しない限りにおいて、上側載置台150b、上側モールド保持部152b及び上側モールドクランプ153bの構造も下側機構部Aの各部と同様であってよい。 Note that the structures of the upper mounting table 150b, the upper mold holding part 152b, and the upper mold clamp 153b may be the same as those of the lower mechanism part A unless otherwise specified.
 (2)基本動作例
 続いて、図5から図7を参照してインプリント装置1による転写動作の一連の流れについて説明する。図5は、インプリント装置1による転写動作の一連の流れを示すフローチャートであり、図6及び図7は、転写動作中の各工程におけるインプリント装置1の各部の動作について概略的に示す図である。ここでは、図6及び図7に示されるインプリント装置1の動作を参照しながら、図5のフローチャートに示される各工程の動作の流れを説明する。
下側弾性部材156a下側吸着部154a上側弾性部材156b上側吸着部154b上側吸着部154b上側吸着部154b上側吸着部154b上側弾性部材156b上側吸着部154b上側吸着部154b下側吸着部154a上側吸着部154b上側吸着部154b下側弾性部材156a下側吸着部154a下側吸着部154a 転写動作の流れにおいて、先ず、上側モールド200b、下側モールド200a及び基板300のいずれも設置されていない初期状態のインプリント装置1(図6[状態1])に対して、上側モールド200bが取り付けられる(ステップS101)。ここに、初期状態のインプリント装置1においては、下側モールド保持部152aの下側弾性部材156aには変形が生じておらず、下側吸着部154aが下側載置台150aにおける下側モールド保持面Sa2(言い換えれば、下側モールド保持面Sa2)より垂直上方向に突出し、下側モールド吸着面Sa1を形成する。同様に、上側モールド保持部152bの上側弾性部材156bには変形が生じておらず、上側吸着部154bが上側載置台150bにおける上側モールド保持面Sb2(言い換えれば、上側モールド保持面Sb2)より垂直下方向に突出し、上側モールド吸着面Sb1を形成する。
(2) Basic Operation Example Next, a series of transfer operations by the imprint apparatus 1 will be described with reference to FIGS. FIG. 5 is a flowchart showing a series of transfer operations performed by the imprint apparatus 1, and FIGS. 6 and 7 are diagrams schematically showing the operation of each part of the imprint apparatus 1 in each process during the transfer operation. is there. Here, the operation flow of each process shown in the flowchart of FIG. 5 will be described with reference to the operation of the imprint apparatus 1 shown in FIGS. 6 and 7.
Lower elastic member 156a Lower adsorption portion 154a Upper elastic member 156b Upper adsorption portion 154b Upper adsorption portion 154b Upper adsorption portion 154b Upper adsorption portion 154b Upper elastic member 156b Upper adsorption portion 154b Upper adsorption portion 154b Lower adsorption portion 154a Upper adsorption portion 154b Upper suction part 154b Lower elastic member 156a Lower suction part 154a Lower suction part 154a In the flow of the transfer operation, first, the upper mold 200b, the lower mold 200a and the substrate 300 are not installed. The upper mold 200b is attached to the printing apparatus 1 (FIG. 6 [state 1]) (step S101). Here, in the imprint apparatus 1 in the initial state, the lower elastic member 156a of the lower mold holding portion 152a is not deformed, and the lower suction portion 154a is held on the lower mold in the lower mounting table 150a. It protrudes vertically upward from the surface Sa2 (in other words, the lower mold holding surface Sa2) to form the lower mold suction surface Sa1. Similarly, the upper elastic member 156b of the upper mold holding portion 152b is not deformed, and the upper suction portion 154b is vertically below the upper mold holding surface Sb2 (in other words, the upper mold holding surface Sb2) of the upper mounting table 150b. Projecting in the direction to form the upper mold suction surface Sb1.
 ステップS101において、先ず、不図示のモールド搬送装置などの動作により、上側モールド200bが、下側センターピン120aの先端部121aが上側モールド200bのセンターホールを貫通する形で、下側センターピン120aのモールド支持部123a上に設置される(図6[状態2])。 In step S101, first, the upper mold 200b is moved by the operation of a mold conveying device (not shown) so that the tip 121a of the lower center pin 120a penetrates the center hole of the upper mold 200b. It is installed on the mold support part 123a (FIG. 6 [state 2]).
 続いて、制御部102は、アクチュエータ104を動作させて、上側モールド200bの上面(つまり、パターンが形成される表面の裏面)に上側吸着部154bの上側モールド吸着面Sb1が接するように、上側載置台150bを垂直下方向に移動させる。上側吸着部154bの上側モールド吸着面Sb1と上側モールド200bとが接触した後に、制御部102は、不図示の減圧手段などを動作させて、上側載置台150bの上側吸着部154bで上側モールド200bを吸着させ、保持させる。
そして、制御部102は、上側モールドクランプ153bに対して制御信号を送信し、上側モールド200bを垂直上方向へ押圧することで上側載置台150bに固定させる(図6[状態3])。このとき、上側弾性部材156bは、上側モールドクランプ153bに押圧されることで変形し、上側吸着部154bの先端部が上側載置台150bと同一の高さに配置される。つまり、上側吸着部154bが形成する上側モールド吸着面Sb1と上側載置台150bが形成する上側モールド保持面Sb2とが同一の高さとなる。その後、制御部103による制御のもと、アクチュエータ102の動作により上側載置台150bが初期配置位置まで上昇する下側弾性部材156a下側吸着部154a下側吸着部154a(図6[状態4])。
Subsequently, the control unit 102 operates the actuator 104 so that the upper mold suction surface Sb1 of the upper suction unit 154b is in contact with the upper surface of the upper mold 200b (that is, the back surface of the surface on which the pattern is formed). The mounting table 150b is moved vertically downward. After the upper mold suction surface Sb1 of the upper suction part 154b comes into contact with the upper mold 200b, the control unit 102 operates a decompression unit (not shown) and the like so that the upper mold 200b is moved by the upper suction part 154b of the upper mounting table 150b. Adsorb and hold.
Then, the control unit 102 transmits a control signal to the upper mold clamp 153b and fixes the upper mold 200b to the upper mounting table 150b by pressing the upper mold 200b vertically upward (FIG. 6 [State 3]). At this time, the upper elastic member 156b is deformed by being pressed by the upper mold clamp 153b, and the front end portion of the upper suction portion 154b is disposed at the same height as the upper mounting table 150b. That is, the upper mold suction surface Sb1 formed by the upper suction portion 154b and the upper mold holding surface Sb2 formed by the upper mounting table 150b have the same height. After that, under the control of the control unit 103, the lower mounting member 154a lower adsorbing part 154a lower adsorbing part 154a in which the upper mounting table 150b rises to the initial arrangement position by the operation of the actuator 102 (FIG. 6 [state 4]) .
 続いて、インプリント装置1に対して、下側モールド200aが取り付けられる(ステップS102)。より詳細には、ステップS102において、先ず、不図示のモールド搬送装置などの動作により、下側モールド200aが、下側センターピン120aの先端部121aが下側モールド200aのセンターホールを貫通する形で、下側センターピン120aのモールド支持部123a上に設置される(図6[状態5])。 Subsequently, the lower mold 200a is attached to the imprint apparatus 1 (step S102). More specifically, in step S102, first, the lower mold 200a is moved in such a manner that the front end portion 121a of the lower center pin 120a penetrates the center hole of the lower mold 200a by an operation of a not-shown mold conveyance device or the like. Then, the lower center pin 120a is installed on the mold support part 123a (FIG. 6 [state 5]).
 続いて、制御部102は、下側センターピン駆動部140aを動作させて、下側吸着部154aの下側モールド吸着面Sa1が下側モールド200aの下面(つまり、パターンが形成される表面の裏面)に接するように、下側センターピン120aを垂直下方向に移動させる。下側吸着部154aの下側モールド吸着面Sa1と下側モールド200aとが接触した後に、制御部102は、不図示の減圧手段などを動作させて、下側載置台150aの下側吸着部154aに上側モールド200aを吸着させ、保持させる。 Subsequently, the control unit 102 operates the lower center pin driving unit 140a so that the lower mold suction surface Sa1 of the lower suction unit 154a is the lower surface of the lower mold 200a (that is, the back surface of the surface on which the pattern is formed). ), The lower center pin 120a is moved vertically downward. After the lower mold suction surface Sa1 of the lower suction part 154a and the lower mold 200a come into contact with each other, the control unit 102 operates a decompression unit (not shown) to lower the lower suction part 154a of the lower mounting table 150a. The upper mold 200a is adsorbed and held.
 そして、制御部102は、下側モールドクランプ153aに対して制御信号を送信し、下側モールド200aを垂直下方向へ押圧させることで下側載置台150aに固定させる(図6[状態6])。このとき、下側弾性部材156aは、下側モールドクランプ153aに押圧されることで変形し、下側吸着部154aの先端部が下側載置台150aと同一の高さに配置される。つまり、下側吸着部154aが形成する下側モールド吸着面Sa1と下側載置台150aが形成する下側モールド保持面Sa2とが同一の高さとなる。 Then, the control unit 102 transmits a control signal to the lower mold clamp 153a and presses the lower mold 200a vertically downward to fix it to the lower mounting table 150a (FIG. 6 [state 6]). . At this time, the lower elastic member 156a is deformed by being pressed by the lower mold clamp 153a, and the tip of the lower suction portion 154a is disposed at the same height as the lower mounting table 150a. That is, the lower mold suction surface Sa1 formed by the lower suction portion 154a and the lower mold holding surface Sa2 formed by the lower mounting table 150a have the same height.
 次に、不図示の基板搬送装置などの動作により、基板300が、下側センターピン120aの先端部121aが基板300のセンターホールを貫通する形で、下側センターピン120aの基板支持部122a上に設置される(ステップS103、図6[状態7])。このとき、必要に応じて、制御部102は、下側モールド200a及び上側モールド200bと基板300の位置合わせを行なってもよい。 Next, by the operation of a substrate transfer device (not shown), the substrate 300 is placed on the substrate support portion 122a of the lower center pin 120a so that the tip 121a of the lower center pin 120a penetrates the center hole of the substrate 300. (Step S103, FIG. 6 [State 7]). At this time, the control unit 102 may align the lower mold 200a and the upper mold 200b with the substrate 300 as necessary.
 続いて制御部102は、下側モールドクランプ153aに対して制御信号を送信し、下側モールド200aを押圧する力を保持力から徐々に変形力まで増大させ、下側モールド200aを変形させる。 Subsequently, the control unit 102 transmits a control signal to the lower mold clamp 153a, and gradually increases the force pressing the lower mold 200a from the holding force to the deforming force, thereby deforming the lower mold 200a.
 同時に又は相前後して、制御部102は、上側モールドクランプ153bに対して制御信号を送信し、上側モールド200bを押圧する力を押圧力から徐々に変形力まで増大させ、上側モールド200bを変形させる(ステップS104、図6[状態8])。 At the same time or before and after, the control unit 102 transmits a control signal to the upper mold clamp 153b, and gradually increases the force pressing the upper mold 200b from the pressing force to the deformation force, thereby deforming the upper mold 200b. (Step S104, FIG. 6 [State 8]).
 続いて、制御部102は、下側センターピン駆動部140aを動作させて下側センターピン120aを垂直下方向に移動させ、支持される基板300の下側転写層301aと下側モールド200aのパターン面とを接触させる(ステップS105、図7[状態9])。更に、制御部102は、アクチュエータ104を動作させて、上側載置台150bを垂直下方向に移動し、上側モールド200bのパターン面と、基板300の上側転写層301bとを接触させる(図7[状態10])。 Subsequently, the control unit 102 operates the lower center pin driving unit 140a to move the lower center pin 120a vertically downward, and the pattern of the lower transfer layer 301a and the lower mold 200a to be supported is supported. The surface is brought into contact (step S105, FIG. 7 [state 9]). Further, the control unit 102 operates the actuator 104 to move the upper mounting table 150b vertically downward to bring the pattern surface of the upper mold 200b into contact with the upper transfer layer 301b of the substrate 300 (FIG. 7 [state] 10]).
 上記のように、モールドに撓みなどの変形が生じている場合、モールドが転写層に接触する際には、変形により傾斜が生じているモールドのパターン面のうち、転写層に近い側から順次接触する。例えば、モールドクランプの押圧力によって、モールドのパターン面のうち、中心部が転写層により近づくように撓ませている場合、転写層との接触時にモールドは中心部から周縁部に向けて順次接触する。 As described above, when deformation such as bending occurs in the mold, when the mold comes into contact with the transfer layer, contact is sequentially made from the side closer to the transfer layer on the pattern surface of the mold that is inclined due to deformation. To do. For example, when the central part of the pattern surface of the mold is bent by the pressing force of the mold clamp so as to be closer to the transfer layer, the mold sequentially contacts the peripheral part from the central part when contacting the transfer layer. .
 尚、各モールドの変形及び基板300との接触は、上述した順序で行なわれてもよく、また、下側モールド200aの変形、下側モールド200aと基板300との接触、上側モールド200bの変形、上側モールド200bと基板300との接触の順序で片側から行なってもよい。 The deformation of each mold and the contact with the substrate 300 may be performed in the above-described order. Also, the deformation of the lower mold 200a, the contact between the lower mold 200a and the substrate 300, the deformation of the upper mold 200b, You may perform from one side in the order of contact with the upper mold 200b and the board | substrate 300. FIG.
 各モールドと基板300との接触後に制御部102は、下側モールドクランプ153a及び上側モールドクランプ153bに対して制御信号を送信し、各モールドを押圧する押圧力を変形力から保持力まで徐々に低減させ、各モールドの変形を解除する(ステップS106、図7[状態11])。 After the contact between each mold and the substrate 300, the control unit 102 transmits a control signal to the lower mold clamp 153a and the upper mold clamp 153b, and gradually reduces the pressing force pressing each mold from the deformation force to the holding force. The deformation of each mold is released (step S106, FIG. 7 [state 11]).
 次に、制御部102は、アクチュエータ104を動作させて上側載置台150bを垂直下方向に移動させ、上側モールド200bを基板300の上面の上側転写層301bに、下側モールド200aを基板300の下面の下側転写層301aに夫々所定の押圧力で押圧させる(ステップS107)。更に、制御部102は、押圧状態を維持したまま、基板300の下側転写層301a及び上側転写層301bを硬化させるために、下側UV照射部130a及び上側UV照射部130bよりUV光を照射させる。この動作により、各モールドの表面に形成されたパターンに合わせて基板300の下側転写層301a及び上側転写層301bが硬化し、パターンが転写される(ステップS108)。尚、押圧時の圧力や押圧時間、並びにUV照射の強度及び照射時間は、転写層の特性に応じて適宜設定されることが好ましい。 Next, the control unit 102 operates the actuator 104 to move the upper mounting table 150 b vertically downward, and the upper mold 200 b is moved to the upper transfer layer 301 b on the upper surface of the substrate 300, and the lower mold 200 a is moved to the lower surface of the substrate 300. The lower transfer layer 301a is pressed with a predetermined pressing force (step S107). Further, the control unit 102 emits UV light from the lower UV irradiation unit 130a and the upper UV irradiation unit 130b in order to cure the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 while maintaining the pressed state. Let By this operation, the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 are cured in accordance with the pattern formed on the surface of each mold, and the pattern is transferred (step S108). In addition, it is preferable that the pressure and pressing time during pressing, the intensity of UV irradiation, and the irradiation time are appropriately set according to the characteristics of the transfer layer.
 所定の押圧時間及びUV照射などの転写に係る一連の動作が終了した後、下側モールド200a及び上側モールド200bを基板300から離型させる離型処理が実施される。 After a series of operations related to transfer such as a predetermined pressing time and UV irradiation is completed, a mold release process for releasing the lower mold 200a and the upper mold 200b from the substrate 300 is performed.
 離型動作において、制御部102は、先ず、上側載置台150bを押圧させているアクチュエータ104の動作を停止させて、各モールドと基板300との間の押圧状態を解除する。同時に又は相前後して、制御部102は、所定の圧力で上側センターピンの先端部が基板300を垂直下方向に押圧するように上側センターピン駆動部140bを動作させる(ステップS109、図7[状態12])。 In the mold release operation, the control unit 102 first stops the operation of the actuator 104 that presses the upper mounting table 150b, and releases the pressing state between each mold and the substrate 300. At the same time or before and after, the control unit 102 operates the upper center pin driving unit 140b so that the tip of the upper center pin presses the substrate 300 vertically downward at a predetermined pressure (Step S109, FIG. 7 [ State 12]).
 このとき、基板300は、下側センターピン120aと上側センターピン120bとの間で狭持される態様となる。尚、制御部102は、狭持される基板300に過剰な圧力が付加されることのないよう、下側センターピン駆動部140a及び上側センターピン駆動部140bの夫々の駆動の態様を制御する。 At this time, the substrate 300 is sandwiched between the lower center pin 120a and the upper center pin 120b. The control unit 102 controls the driving modes of the lower center pin driving unit 140a and the upper center pin driving unit 140b so that excessive pressure is not applied to the sandwiched substrate 300.
 続いて、制御部102は、上述のステップS104と同様の動作で、下側モールド200a及び上側モールド200bの変形を行なう(ステップS110、図7[状態13])。このとき、各モールドクランプの押圧力は、保持力から徐々に変形力まで増大するよう制御される。 Subsequently, the control unit 102 performs deformation of the lower mold 200a and the upper mold 200b by the same operation as the above-described step S104 (step S110, FIG. 7 [state 13]). At this time, the pressing force of each mold clamp is controlled to gradually increase from the holding force to the deformation force.
 モールドの変形に応じて、図7[状態13]に示されるように、各モールドと基板300との密着面の一部が剥離し、間隙が生じる。密着面にこのような間隙が存在する場合、該間隙が続く離型における離型開始点となり、モールドと基板の転写層との間に作用する密着力は低減される。 Dependent on the deformation of the mold, as shown in FIG. 7 [State 13], a part of the contact surface between each mold and the substrate 300 is peeled off, resulting in a gap. When such a gap exists on the contact surface, it becomes a mold release start point in the subsequent mold release, and the adhesion force acting between the mold and the transfer layer of the substrate is reduced.
 続いて、制御部102は、上側センターピン120b及びアクチュエータ104を動作させて、上側載置台150bを垂直上方向の初期位置に移動させる。このとき、上側モールド200bは、上側載置台150bに保持された状態で垂直上方向に移動し、一方で基板300は上側センターピン120bにより垂直下方向に押圧される(言い換えれば、固定される)ため、上側モールド200bと基板300の上側転写層301bとが離型する(ステップS111、図7[状態14])。尚、このとき制御部102は、下側センターピン120aの位置を固定するとともに、上側センターピン120bが基板300を垂直下方向に押圧する力をトルク制御により制御している。 Subsequently, the control unit 102 operates the upper center pin 120b and the actuator 104 to move the upper mounting table 150b to the initial position in the vertical upward direction. At this time, the upper mold 200b moves vertically upward while being held by the upper mounting table 150b, while the substrate 300 is pressed vertically downward (in other words, fixed) by the upper center pin 120b. Therefore, the upper mold 200b and the upper transfer layer 301b of the substrate 300 are released (Step S111, FIG. 7 [State 14]). At this time, the control unit 102 fixes the position of the lower center pin 120a and controls the force with which the upper center pin 120b presses the substrate 300 in the vertical downward direction by torque control.
 次に、制御部102は、基板300を狭持する上側センターピン120bと下側センターピン120aとを、基板300を保持した状態を維持したまま垂直上方向の下側センターピン120aの初期位置まで移動させ、下側モールド200aと基板300とを離型させる(ステップS112、図7[状態15])。 Next, the control unit 102 holds the upper center pin 120b and the lower center pin 120a holding the substrate 300 up to the initial position of the lower center pin 120a in the vertical upward direction while maintaining the state in which the substrate 300 is held. The lower mold 200a and the substrate 300 are released from each other (step S112, FIG. 7 [state 15]).
 離型後に、制御部102は、上側モールドクランプ153b及び下側モールドクランプ153aの押圧力を、夫々モールドを保持するための保持力に変更し、下側モールド200a及び上側モールド200bの変形を解除する(ステップS113、図7[状態16])。 After the mold release, the control unit 102 changes the pressing force of the upper mold clamp 153b and the lower mold clamp 153a to the holding force for holding the mold, and releases the deformation of the lower mold 200a and the upper mold 200b. (Step S113, FIG. 7 [State 16]).
 下側モールド200a及び上側モールド200bより離型された基板300は、不図示の基板搬送装置などの動作により、下側センターピン120aから取り外される(ステップS114)。尚、続けて別の基板300に対して同一の下側モールド200a及び上側モールド200bを用いて転写を行なう場合(ステップS115:No)、基板300を配置するステップS103からステップS114までの各工程を繰り返し実行する。全ての転写が終了した後(ステップS115:Yes)、不図示のモールド搬送装置などの動作により、下側モールド200aが取り外され(ステップS116)、上側モールド200bが取り外される(ステップS117)。 The substrate 300 released from the lower mold 200a and the upper mold 200b is removed from the lower center pin 120a by an operation of a substrate transfer device (not shown) (step S114). In addition, when performing transfer using the same lower mold 200a and upper mold 200b for another substrate 300 (step S115: No), the steps from step S103 to step S114 for placing the substrate 300 are performed. Run repeatedly. After all the transfer is completed (step S115: Yes), the lower mold 200a is removed (step S116) and the upper mold 200b is removed (step S117) by an operation of a mold conveyance device (not shown).
 以上に示した一連の動作により、本発明の転写装置に係る実施例であるインプリント装置1によれば、基板300の転写面301a及び301bに対して下側モールド200a及び上側モールド200bの表面に形成されたパターンが転写される。 Through the series of operations described above, according to the imprint apparatus 1 which is an embodiment of the transfer apparatus of the present invention, the lower mold 200a and the upper mold 200b are placed on the surfaces of the transfer surfaces 301a and 301b of the substrate 300. The formed pattern is transferred.
 本実施例のインプリント装置1によれば、上述の通り、上側載置台150bにおいて、上側吸着部154bは、上側モールドクランプ153bによる押圧を受けていない状態では上側載置台150bより上側モールド200b方向(つまり、垂直下方向)に突出している。このため、上側吸着部154bが上側モールド200bに接触し、吸着する[状態3]においては、上側吸着部154bが形成する上側モールド吸着面Sb1は、上側載置台150bが形成する上側モールド保持面Sb2より離間している。他方で、上側モールドクランプ153bが上側モールド200bを把持している[状態4]においては、上側モールドクランプ153bの押圧によって上側弾性部材156bが変形し、上側吸着部154bが形成する上側モールド吸着面Sb1は、上側載置台150bが形成する上側モールド保持面Sb2と同一の高さとなる。このため、[状態4]においては、上側モールド200bは、上側モールド保持面Sb2において、上側吸着部154bにより吸着され、且つ保持されるとともに、上側載置台150bにより保持される。 According to the imprint apparatus 1 of the present embodiment, as described above, in the upper mounting table 150b, the upper suction unit 154b is not pressed by the upper mold clamp 153b in the upper mold 200b direction ( That is, it protrudes vertically downward). For this reason, in the [state 3] where the upper suction portion 154b comes into contact with and sucks the upper mold 200b, the upper mold suction surface Sb1 formed by the upper suction portion 154b is the upper mold holding surface Sb2 formed by the upper mounting table 150b. More apart. On the other hand, in [state 4] in which the upper mold clamp 153b holds the upper mold 200b, the upper elastic member 156b is deformed by the pressing of the upper mold clamp 153b, and the upper mold suction surface Sb1 formed by the upper suction portion 154b. Is the same height as the upper mold holding surface Sb2 formed by the upper mounting table 150b. Therefore, in [State 4], the upper mold 200b is sucked and held by the upper suction portion 154b on the upper mold holding surface Sb2, and is held by the upper mounting table 150b.
 下側載置台150aについても同様に、下側モールドクランプ153aによる押圧を受けていない状態では、下側吸着部154aが形成する下側モールド吸着面Sa1は、下側載置台150aが形成する下側モールド保持面Sa2より離間している([状態7])。他方で、下側モールドクランプ153aが下側モールド200aを把持している[状態8]においては、下側モールドクランプ153aの押圧によって下側弾性部材156aが変形し、下側吸着部154aが形成する下側モールド吸着面Sa1は、下側載置台150aが形成する下側モールド保持面Sa2と同一の高さとなる。このため、[状態8]においては、下側モールド200aは、下側モールド保持面Sa2において、下側吸着部154aにより吸着され、且つ保持されるとともに、下側載置台150aにより保持される。 Similarly, when the lower mounting table 150a is not pressed by the lower mold clamp 153a, the lower mold suction surface Sa1 formed by the lower suction unit 154a is the lower side formed by the lower mounting table 150a. It is separated from the mold holding surface Sa2 ([state 7]). On the other hand, in [state 8] in which the lower mold clamp 153a holds the lower mold 200a, the lower elastic member 156a is deformed by the pressing of the lower mold clamp 153a, and the lower suction portion 154a is formed. The lower mold suction surface Sa1 has the same height as the lower mold holding surface Sa2 formed by the lower mounting table 150a. Therefore, in [State 8], the lower mold 200a is sucked and held by the lower suction portion 154a on the lower mold holding surface Sa2, and is held by the lower mounting table 150a.
 このように、本実施例のインプリント装置1においては、いずれの載置台150a、150bにおいても、モールド200a、200bを設置し、吸着する状態においては、相対的に小さい面積を有する下側吸着部154a、154bにおいてモールド200a、200bと接触している。そして、吸着によりモールド200a、200bが保持された後には、クランプモールド153a、153bの押圧により、該下側吸着部154a、154bを含み、相対的に大きい面積を有する載置台200a、200bにおいてモールドと接触して保持が実現される。 Thus, in the imprint apparatus 1 of the present embodiment, the lower suction part having a relatively small area in the state where the molds 200a and 200b are installed and sucked on any of the mounting tables 150a and 150b. 154a and 154b are in contact with the molds 200a and 200b. And after mold 200a, 200b is hold | maintained by adsorption | suction, it is a mold in mounting base 200a, 200b which has this relatively lower area including this lower adsorption | suction part 154a, 154b by the press of clamp mold 153a, 153b. Holding is realized by contact.
 このため、載置台150a、150bと接する面(つまり、下側モールド保持面Sa2、上側モールド保持面Sb2)においてモールド200a、200bが滑ることを好適に抑制することが出来る。他方で、基板300への押圧時には、モールド200a、200bは、下側モールド保持面Sa2、上側モールド保持面Sb2において載置台150a、150bにより保持され、且つ押圧力を受けるため、押圧力が均一に分布される。このため、モールド200a、200b表面のパターンが適切に基板300に押圧され、適切な転写が実現出来る。 For this reason, it is possible to suitably prevent the molds 200a and 200b from sliding on the surfaces in contact with the mounting tables 150a and 150b (that is, the lower mold holding surface Sa2 and the upper mold holding surface Sb2). On the other hand, when the substrate 300 is pressed, the molds 200a and 200b are held by the mounting tables 150a and 150b on the lower mold holding surface Sa2 and the upper mold holding surface Sb2 and receive the pressing force. Distributed. For this reason, the patterns on the surfaces of the molds 200a and 200b are appropriately pressed against the substrate 300, and appropriate transfer can be realized.
 本実施例のインプリント装置1では更に、下側吸着部154a、154bにおける吸着圧力、下側吸着部154a、154bの位置、及び下側弾性部材156a、156bの形態などを検出することで、モールド200a、200bが適切に保持されているか否かを判断することが出来る。このため、センサ類などを組み込むことで装置構造の複雑化を生じることなく、好適に保持状態の確認を行なうことが出来る。 In the imprint apparatus 1 of the present embodiment, the mold is further detected by detecting the suction pressure at the lower suction portions 154a and 154b, the positions of the lower suction portions 154a and 154b, the form of the lower elastic members 156a and 156b, and the like. It can be determined whether or not 200a and 200b are appropriately held. For this reason, it is possible to check the holding state appropriately without incorporating a sensor or the like without complicating the structure of the apparatus.
 尚、下側吸着部154a、154bまたは下側弾性部材156a、156bに対して、夫々の動作を検出するセンサ類を組み込んだ場合、より詳細にモールド200a、200bの保持状態を監視することが可能となり、転写時の不具合をより好適に防止することが可能となる。 In addition, when sensors for detecting the respective operations are incorporated into the lower suction portions 154a and 154b or the lower elastic members 156a and 156b, the holding state of the molds 200a and 200b can be monitored in more detail. As a result, it is possible to more suitably prevent problems during transfer.
 (3)第1変形例
 続いて、本発明に係る転写装置の第1変形例であるインプリント装置1’の基本的な構成について、図8を参照して説明する。図8は、本発明の転写装置の第1変形例であるインプリント装置1’の構成を概略的に示す模式図である。
(3) First Modification Next, a basic configuration of an imprint apparatus 1 ′, which is a first modification of the transfer apparatus according to the present invention, will be described with reference to FIG. FIG. 8 is a schematic view schematically showing a configuration of an imprint apparatus 1 ′ which is a first modification of the transfer apparatus of the present invention.
 図8に示すインプリント装置1は、被転写体である基板300’の下面に構成される(言い換えれば、下方に面して配置される)下側転写層301aに対して、下側モールド200aに形成されたパターンを転写する転写装置である。尚、本変形例及び図8において、図1に示されるインプリント装置1と同様の構成については、同一の番号を付して説明を省略している。 The imprint apparatus 1 shown in FIG. 8 is configured on the lower surface of the substrate 300 ′ that is a transfer target (in other words, the lower mold 200a with respect to the lower transfer layer 301a that is disposed facing downward). 2 is a transfer device for transferring a pattern formed on the substrate. In addition, in this modification and FIG. 8, about the structure similar to the imprint apparatus 1 shown by FIG. 1, the same number is attached | subjected and description is abbreviate | omitted.
 インプリント装置1は、図1に示すように下側基台110aを含む下側機構部Aと、上側基台110bを含む上側機構部B’と、下側基台110a及び上側基台110bを連結するボールネジ101と、該ボールネジを回転させるアクチュエータ104と、下側機構部A及び上側機構部Bの動作を制御する制御部102と、該制御部102に対してユーザの指示を入力可能な操作部103とを備えて構成される。 As shown in FIG. 1, the imprint apparatus 1 includes a lower mechanism part A including a lower base 110a, an upper mechanism part B ′ including an upper base 110b, a lower base 110a and an upper base 110b. A ball screw 101 to be connected, an actuator 104 for rotating the ball screw, a control unit 102 for controlling the operation of the lower mechanism unit A and the upper mechanism unit B, and an operation capable of inputting a user instruction to the control unit 102 Unit 103.
 尚、図8に示されるインプリント装置1’は、下側モールド200a及び基板300’の夫々が設置された状態が図示されている。下側モールド200aは、パターンが形成される表面が上向きとなるよう下側機構部Aの下側載置台150aに保持されている。また、上側基台110bは、下側載置台150aの下側モールド保持面Sa2に対して凸部を形成するように押圧部120bを有する。 In the imprint apparatus 1 ′ shown in FIG. 8, a state in which the lower mold 200 a and the substrate 300 ′ are installed is illustrated. The lower mold 200a is held on the lower mounting table 150a of the lower mechanism portion A so that the surface on which the pattern is formed faces upward. Further, the upper base 110b has a pressing portion 120b so as to form a convex portion with respect to the lower mold holding surface Sa2 of the lower mounting table 150a.
 下側機構部Aは、図1に示されるインプリント装置1の下側機構部Aと同様の構成を備える。 The lower mechanism part A has the same configuration as the lower mechanism part A of the imprint apparatus 1 shown in FIG.
 他方、本変形例の上側機構部B’は、上側基台110bの下面に設けられ、押圧部112bと、上側センターピン120bと、上側センターピン駆動部140bとを備えて構成される。 On the other hand, the upper mechanism part B 'of the present modification is provided on the lower surface of the upper base 110b, and includes a pressing part 112b, an upper center pin 120b, and an upper center pin driving part 140b.
 押圧部112bは、上側基台110bの下面において下向きに凸部を形成するように設けられる部位であって、転写動作時には、アクチュエータ104の動作により基板300’を下方に押圧することで、下側モールド200aに対して密着させる。押圧部112bは、上側センターピン120bが配置されるためのセンターホールを有する。また、押圧部112bは平坦であり、好適には少なくとも基板300’の下側転写層301aが形成される領域より広い下面を有する。 The pressing portion 112b is a portion provided to form a convex portion downward on the lower surface of the upper base 110b. During the transfer operation, the pressing portion 112b presses the substrate 300 ′ downward by the operation of the actuator 104, so that the lower side Adhere to the mold 200a. The pressing part 112b has a center hole for placing the upper center pin 120b. The pressing portion 112b is flat and preferably has a lower surface that is wider than at least a region where the lower transfer layer 301a of the substrate 300 'is formed.
 このようなインプリント装置1’によれば、アクチュエータ104が上側基台110bを垂直下方向に移動することで、押圧部112bの下面が基板300’を垂直下方に押圧する。このため、基板300’の下側転写層301aが下側モールド200aのパターン面に密着され、パターンの転写が行なわれる。また、アクチュエータ102が上側基台110bを垂直上方向に移動することで、下側モールド200aと基板300’との相互の押圧のための押圧力が解除される。 According to such an imprint apparatus 1 ', the actuator 104 moves the upper base 110b vertically downward, so that the lower surface of the pressing portion 112b presses the substrate 300' vertically downward. Therefore, the lower transfer layer 301a of the substrate 300 'is brought into close contact with the pattern surface of the lower mold 200a, and the pattern is transferred. Further, the actuator 102 moves the upper base 110b vertically upward, so that the pressing force for mutual pressing between the lower mold 200a and the substrate 300 'is released.
 その後、制御部102の制御の下、下側センターピン120aと上側センターピン120bとが基板300’を保持した状態で垂直上方向に移動させることで、基板300’が下側モールド200aより離型する。 Thereafter, under the control of the control unit 102, the lower center pin 120a and the upper center pin 120b are moved vertically upward while holding the substrate 300 ′, so that the substrate 300 ′ is released from the lower mold 200a. To do.
 このため、インプリント装置1’によれば、上述したインプリント装置1と同等の効果を享受しつつ、基板300’の転写層301aに対して下側モールド200a表面に形成されたパターンを転写することが出来る。 For this reason, according to the imprint apparatus 1 ′, the pattern formed on the surface of the lower mold 200a is transferred to the transfer layer 301a of the substrate 300 ′ while enjoying the same effect as the imprint apparatus 1 described above. I can do it.
 (4)その他の変形例
 続いて、本発明に係る転写装置のその他の変形例について、図9及び図10を参照して説明する。
(4) Other Modifications Next, other modifications of the transfer device according to the present invention will be described with reference to FIGS.
 図9は、本発明の転写装置の第2変形例であるインプリント装置1’’及び制御装置400の構成を概略的に示す模式図である。尚、本変形例及び図9において、図1に示されるインプリント装置1と同様の構成については、同一の番号を付して説明を省略している。 FIG. 9 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 ″ and a control apparatus 400 which are a second modified example of the transfer apparatus of the present invention. Note that, in this modification and FIG. 9, the same components as those of the imprint apparatus 1 shown in FIG.
 インプリント装置1’’は、図1に示されるインプリント装置1において、制御部102と操作部103とを備えない構成である。その他の部位については、インプリント装置1と同等であってよい。 The imprint apparatus 1 ″ has a configuration that does not include the control unit 102 and the operation unit 103 in the imprint apparatus 1 illustrated in FIG. 1. Other parts may be equivalent to the imprint apparatus 1.
 制御装置400は、インプリント装置1の制御部102及び操作部103と同等の構成である制御部102’及び操作部103’を備え、インプリント装置1’’の各部に対して電気的に接続される。個の構成では、制御装置400の制御部102’がインプリント装置1’’の各部に対して制御信号を供給することなどにより、動作の制御を行なう。 The control device 400 includes a control unit 102 ′ and an operation unit 103 ′ having the same configuration as the control unit 102 and the operation unit 103 of the imprint apparatus 1, and is electrically connected to each unit of the imprint apparatus 1 ″. Is done. In this configuration, the control unit 102 ′ of the control device 400 controls the operation by supplying a control signal to each unit of the imprint apparatus 1 ″.
 本発明の転写装置の第2変形例によれば、インプリント装置1’’と制御装置400とを離隔した位置に夫々配置しながら、上述したインプリント装置1により得られる効果と同等の効果を享受することが出来る。 According to the second modification of the transfer device of the present invention, the imprinting device 1 ″ and the control device 400 are arranged at separate positions, and the same effect as that obtained by the imprinting device 1 described above is obtained. You can enjoy it.
 また、第3変形例として、1つの制御装置400が複数のインプリント装置に接続され、夫々のインプリント装置の動作の制御を行なう装置構成がある。本変形例では、図10(a)に示されるように、n個のインプリント装置1’’-1、2、…nに対して1つの制御装置400が設けられ、該制御装置400が各インプリント装置1’’-1、2、…nに対して制御信号の供給などを行なうことで、各インプリント装置の動作の制御を行なう。 As a third modification, there is a device configuration in which one control device 400 is connected to a plurality of imprint devices and controls the operation of each imprint device. In this modification, as shown in FIG. 10A, one control device 400 is provided for n imprint devices 1 ″ -1, 2,... Control of the operation of each imprint apparatus is performed by supplying control signals to the imprint apparatuses 1 ″ -1, 2,... N.
 また、第4変形例として、複数のインプリント装置に対して夫々接続される複数の制御部に対して、1つの操作部により、動作を制御するためのユーザの指示の入力を行なう装置構成がある。本変形例では、図10(b)に示されるように、n個のインプリント装置1’’-1、2、…nに対して、夫々個別の制御部102’-1、2、…nが接続され、各インプリント装置1''-1、2、…nの動作の制御が行なわれている。また、操作部103’は、各制御部102’-1、2、…nの夫々に対して接続され、ユーザの操作による指示の入力を行なっている。 Further, as a fourth modified example, there is an apparatus configuration in which a user's instruction for controlling operations is input by a single operation unit to a plurality of control units respectively connected to a plurality of imprint apparatuses. is there. In this modification, as shown in FIG. 10B, for each of the n imprint apparatuses 1 ″ -1, 2,... N, the individual control units 102′-1, 2,. Are connected to control the operation of each imprint apparatus 1 ″ -1, 2,... N. The operation unit 103 ′ is connected to each of the control units 102 ′-1, 2,... N, and inputs an instruction by a user operation.
 本発明の転写装置の第3及び第4の変形例によれば、複数のインプリント装置1''-1、2、…nの夫々に対して1つの制御装置400、又は操作部103’によりユーザの指示を入力可能となる。このため、多くのインプリント装置が同時に稼働することが要求される工場などにおいて、集中的な管理が可能となる。また、装置構成やコストの面でも有益である。 According to the third and fourth modifications of the transfer device of the present invention, one control device 400 or operation unit 103 ′ is used for each of the plurality of imprint devices 1 ″ -1, 2,. User instructions can be input. For this reason, centralized management is possible in a factory where many imprint apparatuses are required to operate simultaneously. Moreover, it is useful also in terms of apparatus configuration and cost.
 本発明は、上述した実施例に限られるものではなく、請求の範囲及び明細書全体から読み取れる発明の要旨又は思想に反しない範囲で適宜変更可能であり、そのような変更を伴なう転写装置及び方法、並びにコンピュータプログラムなどもまた本発明の技術的範囲に含まれるものである。 The present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification, and a transfer apparatus accompanying such a change. And methods, computer programs, and the like are also included in the technical scope of the present invention.
1 インプリント装置、
101 ボールネジ、
102 制御部、
103 操作部、
104 アクチュエータ、
110a 下側基台、
110b 上側基台、
120a 下側センターピン、
120b 上側センターピン、
130a 下側UV照射部、
130b 上側UV照射部、
140a 下側センターピン駆動部、
140b 上側センターピン駆動部、
150a 下側載置台、
150b 上側載置台、
151a 下側開口部、
151b 上側開口部、
152a 下側モールド保持部、
152b 上側モールド保持部、
153a 下側モールドクランプ、
153b 上側モールドクランプ、
154a 下側吸着部、
154b 上側吸着部、
155a 下側吸着溝、
155b 上側吸着溝、
156a 下側弾性部材、
156b 上側弾性部材、
200a 下側モールド、
200b 上側モールド、
300 基板、
301a 転写層、
301b 転写層。
1 imprint device,
101 ball screw,
102 control unit,
103 operation unit,
104 actuator,
110a Lower base,
110b upper base,
120a Lower center pin,
120b upper center pin,
130a Lower UV irradiation part,
130b Upper UV irradiation part,
140a Lower center pin drive unit,
140b upper center pin drive unit,
150a Lower mounting table,
150b upper mounting table,
151a lower opening,
151b upper opening,
152a Lower mold holding part,
152b Upper mold holding part,
153a Lower mold clamp,
153b Upper mold clamp,
154a Lower suction part,
154b upper suction part,
155a Lower suction groove,
155b upper suction groove,
156a lower elastic member,
156b upper elastic member,
200a lower mold,
200b Upper mold,
300 substrates,
301a transfer layer,
301b Transfer layer.

Claims (14)

  1.  モールドに形成されたパターンを被転写体に転写する転写装置であって、
     前記モールドを第1の接触面で保持する第1モールド保持手段と、
     前記モールドを第2の接触面で保持する第2モールド保持手段と、
     前記パターンを前記被転写体に転写させる転写手段と
     を備え、
     前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置が可変であることを特徴とする転写装置。
    A transfer device for transferring a pattern formed on a mold to a transfer target,
    First mold holding means for holding the mold on a first contact surface;
    Second mold holding means for holding the mold on a second contact surface;
    A transfer means for transferring the pattern to the transfer object,
    The transfer apparatus characterized in that a relative position between the first mold holding means and the second mold holding means is variable.
  2.  前記第1モールド保持手段と前記第2モールド保持手段との少なくとも一方の位置を制御するモールド保持制御手段を更に備え、
     前記モールド保持制御手段は、前記第1の接触面に対して垂直な方向において、前記第1の接触面で保持される前記モールドと、前記第2の接触面との距離を変化させることを特徴とする請求項1に記載の転写装置。
    A mold holding control means for controlling the position of at least one of the first mold holding means and the second mold holding means;
    The mold holding control means changes a distance between the mold held by the first contact surface and the second contact surface in a direction perpendicular to the first contact surface. The transfer apparatus according to claim 1.
  3.  前記第1モールド保持手段は、前記モールドと前記第1の接触面との距離、及び前記モールドと前記第2の接触面との距離が異なる状態において、前記モールドを保持し、
     前記転写手段は、前記モールドと前記第1の接触面との距離、及び前記モールドと前記第2の接触面との距離が等しい状態において、前記パターンを前記被転写体に転写させることを特徴とする請求項1又は2に記載の転写装置。
    The first mold holding means holds the mold in a state in which the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are different,
    The transfer means transfers the pattern to the transfer object in a state where the distance between the mold and the first contact surface and the distance between the mold and the second contact surface are equal. The transfer device according to claim 1 or 2.
  4.  前記第1の接触面は、前記モールドの前記パターンが形成されていない面における前記パターンが形成されていない領域と接触し、前記第2の接触面は、前記モールドの前記パターンが形成されていない面における前記パターンが形成されている領域を含む領域と接触することを特徴とする請求項1から請求項3のいずれか一項に記載の転写装置。 The first contact surface is in contact with a region where the pattern is not formed on a surface of the mold where the pattern is not formed, and the second contact surface is not formed with the pattern of the mold. 4. The transfer device according to claim 1, wherein the transfer device is in contact with a region including a region where the pattern is formed on a surface. 5.
  5.  前記第1の接触面は、前記モールドの前記パターンが形成されていない面の外周部において前記モールドと接触し、前記第2の接触面は、前記モールドの前記パターンが形成されていない面の内周部において前記モールドと接触することを特徴とする請求項1から請求項4のいずれか一項に記載の転写装置。 The first contact surface is in contact with the mold at an outer peripheral portion of the surface of the mold where the pattern is not formed, and the second contact surface is an inner surface of the mold where the pattern is not formed. The transfer device according to claim 1, wherein the transfer device is in contact with the mold at a peripheral portion.
  6.  前記第1モールド保持手段に保持されたモールドが押圧されることで、前記第1の接触面に対して垂直な方向における前記第1の接触面と前記第2の接触面との相対的な位置が変化することを特徴とする請求項1から請求項5のいずれか一項に記載の転写装置。 A relative position between the first contact surface and the second contact surface in a direction perpendicular to the first contact surface by pressing the mold held by the first mold holding means. The transfer apparatus according to any one of claims 1 to 5, wherein the change is made.
  7.  前記第1モールド保持手段は、前記第2モールド保持手段との間に設けられる弾性部材によって支持されていることを特徴とする請求項1から請求項6のいずれか一項に記載の転写装置。 The transfer apparatus according to any one of claims 1 to 6, wherein the first mold holding unit is supported by an elastic member provided between the second mold holding unit and the second mold holding unit.
  8.  前記第2モールド保持手段は、前記第2の接触面に凹部を有し、
     前記第1モールド保持手段は、前記凹部において前記弾性部材に支持されていることを特徴とする請求項7に記載の転写装置。
    The second mold holding means has a recess in the second contact surface,
    The transfer device according to claim 7, wherein the first mold holding unit is supported by the elastic member in the concave portion.
  9.  前記第1モールド保持手段は、前記モールドを吸着することで保持することを特徴とする請求項1から請求項8のいずれか一項に記載の転写装置。 The transfer device according to any one of claims 1 to 8, wherein the first mold holding unit holds the mold by suction.
  10.  第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、
     前記第1モールドを第1の接触面で保持する第1モールド保持手段と、
     前記第1モールドを第2の接触面で保持する第2モールド保持手段と、
     前記第2モールドを第3の接触面で保持する第3モールド保持手段と、
     前記第2モールドを第4の接触面で保持する第4モールド保持手段と、
     前記パターンを前記被転写体に転写させる転写手段と
     を備え、
     前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置が可変であり、前記第3モールド保持手段と前記第4モールド保持手段との相対的な位置が可変であることを特徴とする転写装置。
    A transfer device for transferring a pattern formed on a first mold to a first surface of a transfer object and transferring a pattern formed on a second mold to a second surface of the transfer object;
    First mold holding means for holding the first mold on a first contact surface;
    Second mold holding means for holding the first mold on a second contact surface;
    Third mold holding means for holding the second mold on a third contact surface;
    A fourth mold holding means for holding the second mold on a fourth contact surface;
    A transfer means for transferring the pattern to the transfer object,
    The relative position between the first mold holding means and the second mold holding means is variable, and the relative position between the third mold holding means and the fourth mold holding means is variable. The transfer device.
  11.  制御装置からの指示に応じて動作し、モールドに形成されたパターンを被転写体に転写する転写装置であって、
     前記制御装置の指示に応じて、前記モールドを第1の接触面で保持する第1モールド保持手段と、
     前記制御装置の指示に応じて、前記モールドを第2の接触面で保持する第2モールド保持手段と、
     前記制御装置の指示に応じて、前記パターンを前記被転写体に転写させる転写手段と
     を備え、
     前記制御装置の指示に応じて、前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させることを特徴とする転写装置。
    A transfer device that operates according to an instruction from a control device and transfers a pattern formed on a mold to a transfer target,
    First mold holding means for holding the mold on the first contact surface in accordance with an instruction from the control device;
    A second mold holding means for holding the mold on the second contact surface in accordance with an instruction from the control device;
    Transfer means for transferring the pattern to the transfer object in accordance with an instruction from the control device;
    A transfer apparatus that changes a relative position between the first mold holding means and the second mold holding means in accordance with an instruction from the control device.
  12.  モールドに形成されたパターンを被転写体に転写する転写装置における転写方法であって、
     前記モールドを第1の接触面で保持する第1保持工程と、
     前記モールドを第2の接触面で保持する第2保持工程と、
     前記パターンを前記被転写体に転写させる転写工程と
     を備え、
     前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させることを特徴とする転写方法。
    A transfer method in a transfer device for transferring a pattern formed on a mold to a transfer target,
    A first holding step of holding the mold on a first contact surface;
    A second holding step of holding the mold on a second contact surface;
    A transfer step of transferring the pattern onto the transfer object,
    A transfer method, wherein a relative position between the first mold holding means and the second mold holding means is changed.
  13.  第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、
     前記第1モールドを第1の接触面で保持する第1保持工程と、
     前記第1モールドを第2の接触面で保持する第2保持工程と、
     前記第2モールドを第3の接触面で保持する第3保持工程と、
     前記第2モールドを第4の接触面で保持する第4保持工程と、
     前記パターンを前記被転写体に転写させる転写工程と
     を備え、
     前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置、及び前記第3モールド保持手段と前記第4モールド保持手段との相対的な位置の少なくとも一方を変化させることを特徴とする転写方法。
    A transfer device for transferring a pattern formed on a first mold to a first surface of a transfer object and transferring a pattern formed on a second mold to a second surface of the transfer object;
    A first holding step of holding the first mold on a first contact surface;
    A second holding step of holding the first mold on a second contact surface;
    A third holding step for holding the second mold on a third contact surface;
    A fourth holding step of holding the second mold on a fourth contact surface;
    A transfer step of transferring the pattern onto the transfer object,
    At least one of a relative position between the first mold holding unit and the second mold holding unit and a relative position between the third mold holding unit and the fourth mold holding unit is changed. Transfer method.
  14.  モールドに形成されたパターンを被転写体に転写する転写装置を動作させるためのコンピュータプログラムであって、
     前記モールドを第1の接触面で保持する第1保持工程と、
     前記モールドを第2の接触面で保持する第2保持工程と、
     前記パターンを前記被転写体に転写させる転写工程と
     を前記転写装置に実行させ、
     前記第1モールド保持手段と前記第2モールド保持手段との相対的な位置を変化させることを特徴とするコンピュータプログラム。
    A computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target,
    A first holding step of holding the mold on a first contact surface;
    A second holding step of holding the mold on a second contact surface;
    A transfer step of transferring the pattern onto the transfer object,
    A computer program for changing a relative position between the first mold holding means and the second mold holding means.
PCT/JP2010/057953 2010-05-11 2010-05-11 Transfer device and method, and computer program WO2011141996A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2010/057953 WO2011141996A1 (en) 2010-05-11 2010-05-11 Transfer device and method, and computer program

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2010/057953 WO2011141996A1 (en) 2010-05-11 2010-05-11 Transfer device and method, and computer program

Publications (1)

Publication Number Publication Date
WO2011141996A1 true WO2011141996A1 (en) 2011-11-17

Family

ID=44914065

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2010/057953 WO2011141996A1 (en) 2010-05-11 2010-05-11 Transfer device and method, and computer program

Country Status (1)

Country Link
WO (1) WO2011141996A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000246810A (en) * 1999-03-03 2000-09-12 Sharp Corp Device and method for producing optical element
JP2007165812A (en) * 2005-12-09 2007-06-28 Obducat Ab Pattern duplicating device using intermediate stamp
JP2008524854A (en) * 2004-12-16 2008-07-10 エーエスエムエル ホールディング エヌ.ブイ. System and method for forming nanodisks used in imprint lithography and nanodisks and memory disks formed thereby
JP2009123318A (en) * 2007-10-23 2009-06-04 Tdk Corp Imprinting method, method of manufacturing information recording medium, and imprinting system
JP2009141328A (en) * 2007-10-11 2009-06-25 Asml Netherlands Bv Imprint lithography
JP2010089327A (en) * 2008-10-07 2010-04-22 Japan Steel Works Ltd:The Molding device and method of manufacturing molding using the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000246810A (en) * 1999-03-03 2000-09-12 Sharp Corp Device and method for producing optical element
JP2008524854A (en) * 2004-12-16 2008-07-10 エーエスエムエル ホールディング エヌ.ブイ. System and method for forming nanodisks used in imprint lithography and nanodisks and memory disks formed thereby
JP2007165812A (en) * 2005-12-09 2007-06-28 Obducat Ab Pattern duplicating device using intermediate stamp
JP2009141328A (en) * 2007-10-11 2009-06-25 Asml Netherlands Bv Imprint lithography
JP2009123318A (en) * 2007-10-23 2009-06-04 Tdk Corp Imprinting method, method of manufacturing information recording medium, and imprinting system
JP2010089327A (en) * 2008-10-07 2010-04-22 Japan Steel Works Ltd:The Molding device and method of manufacturing molding using the same

Similar Documents

Publication Publication Date Title
KR101437215B1 (en) Imprint apparatus and article manufacturing method
JP6047439B2 (en) Peeling apparatus and peeling method
JP2017175087A (en) Manufacturing method for electronic device using device chip and manufacturing apparatus thereof
JP5744548B2 (en) Holding device, imprint apparatus using the same, and article manufacturing method
JPWO2011010408A1 (en) Liquid crystal display device manufacturing apparatus and liquid crystal display device manufacturing method
US20230094653A1 (en) Minimal contact gripping of thin optical devices
JP2016086051A (en) Imprint method, imprint device, and manufacturing method of article using them
JP6450238B2 (en) Peeling device
JP2019029467A (en) Wafer transfer mechanism, wafer prober and transfer position adjusting method for wafer transfer mechanism
WO2011155035A1 (en) Transfer device
JP2019010691A (en) Hand of industrial robot and industrial robot
WO2011118006A1 (en) Transfer apparatus and method, and computer program
JP2017112230A (en) Imprint device and article manufacturing method
WO2011141996A1 (en) Transfer device and method, and computer program
JP2013098497A (en) Imprint apparatus and manufacturing method of article
JP2006041302A5 (en)
JP4761026B2 (en) Element transfer device, element transfer method, and display device manufacturing method
JP2019010692A (en) Hand for industrial robot and industrial robot
CN109834731A (en) The calibration system and calibration method of horizontal articulated robot
JP5865475B2 (en) Substrate holding device, pattern transfer device, and pattern transfer method
JP6207857B2 (en) Peeling apparatus and peeling method
JP6047438B2 (en) Peeling apparatus and peeling method
WO2011141995A1 (en) Transfer device and method, and computer program
JP2013243203A (en) Support device
WO2011118005A1 (en) Transfer apparatus and method, and computer program

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10851379

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10851379

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP