WO2011004862A1 - シリコン精製装置およびシリコン精製方法 - Google Patents
シリコン精製装置およびシリコン精製方法 Download PDFInfo
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- WO2011004862A1 WO2011004862A1 PCT/JP2010/061612 JP2010061612W WO2011004862A1 WO 2011004862 A1 WO2011004862 A1 WO 2011004862A1 JP 2010061612 W JP2010061612 W JP 2010061612W WO 2011004862 A1 WO2011004862 A1 WO 2011004862A1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
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- the present invention relates to a silicon purification apparatus and a silicon purification method.
- High-purity silicon used in semiconductor integrated circuits and the like is made from metal silicon having a purity of about 98% to 99% obtained by carbon reduction of silica, and trichlorosilane (SiHCl 3 ) is obtained by a chemical method. After being synthesized, purified by distillation, and then reduced, high-purity silicon of about 11N (Eleven-Nine) is obtained (Siemens method). However, this high-purity silicon inevitably becomes an expensive material because of the complicated manufacturing plant and the large amount of energy used for reduction.
- the purity required for silicon used in the production of solar cells is about 6N. Therefore, non-standard products of high-purity silicon such as those for semiconductor integrated circuits become excessively high quality for solar cells.
- impurities to be removed from metal silicon impurities such as phosphorus having a vapor pressure higher than that of silicon can be removed by holding in a vacuum in a molten state (hereinafter, sometimes referred to as a vacuum purification method). It is known that there is.
- Patent Document 1 states that “a graphite crucible containing silicon in a vacuum container equipped with a vacuum pump, and a heating device for heating the crucible. There is disclosed a “silicon purification apparatus” installed at a position covering the side and bottom surfaces. Further, Patent Document 1 discloses that a heat retaining member is disposed on the upper surface of the crucible for the purpose of reducing the difference in temperature between the upper and lower sides of the molten silicon, and the material thereof is basically a heat insulating material such as graphite felt. And that it is preferable to have a structure in which the lower and side surfaces are covered with a dense graphite member (see FIG. 5).
- the present inventors are examining a silicon purification (dephosphorization) process by a vacuum purification method using an experimental apparatus for silicon purification comprising a crucible 10, a heat retaining member 50 and a heating device 30 as shown in FIG.
- an experimental apparatus for silicon purification comprising a crucible 10, a heat retaining member 50 and a heating device 30 as shown in FIG.
- heat dissipation from the molten silicon cannot be effectively suppressed, and a temperature difference occurs in the vertical direction of the crucible.
- FIG. 5 is a schematic cross-sectional view showing an example of the silicon purification apparatus 400 having the crucible 10 provided with the conventional heat retaining member 50.
- molten silicon 20 is held in the crucible 10, and a state in which this is heated by the heating device 30 is shown.
- the outer periphery of the side surface of the crucible 10 is covered with the side surface heat insulating material 40.
- the heat retaining member 50 is disposed on the upper surface of the crucible 10.
- the heat retaining member 50 is a flat plate member having a structure in which a part of the carbon felt 551 is covered with a carbon composite material 552.
- the opening 60 penetrating the heat retaining member 50 is an opening provided for discharging silicon vapor containing molten silicon impurities (mainly phosphorus) to the outside of the crucible in the vacuum purification method.
- Silicon vapor containing molten silicon impurities passes through a boundary portion (indicated by reference numeral A in FIG. 5) between the heat retaining member 50 and the crucible 10 and comes into contact with the heat insulating material 40 on the side surface, and agglomerates here to cause a side surface. Since the heat insulating property of the upper end portion of the heat insulating material 40 (near the boundary with the heat retaining member 50) is lowered, a temperature difference occurs in the vertical direction of the crucible.
- the heat insulating material 40 on the side surface is made of carbon felt
- the heat insulating material reacts with silicon vapor, so that the heat insulating property is significantly reduced.
- Problem 2 Since the carbon composite has a higher thermal conductivity than the carbon felt, in the conventional structure in which the upper end surface of the crucible 10 is in contact with the carbon composite material 552, the crucible 10 is transferred by heat transfer from the crucible 10 to the heat retaining member 50. This causes a temperature difference in the vertical direction.
- FIG. 5 the conceptual diagram of the generation
- the heating device 30 is an induction heating device
- the magnetic field generated from the high-frequency coil is weak at both ends of the coil, and the lower end of the crucible 10 is unlikely to become low temperature due to heat conduction from the molten silicon 20,
- the temperature difference in the vertical direction of the crucible 10 becomes significant.
- the present invention has been made in view of the above problems, and an object of the present invention is to provide a silicon refining apparatus and a silicon refining method that can suppress the temperature difference in the vertical direction of the crucible.
- the silicon purification apparatus of the present invention is a silicon purification apparatus comprising a crucible capable of holding molten silicon, a heat insulating lid that can be installed above the crucible, and a heating device for heating the molten silicon in a vacuum container,
- the crucible has a first heat insulating material on the outer peripheral portion of the crucible, and the heat insulating cover is a plate member made of carbon felt, and at least both main surfaces are provided with a carbon composite material, and the heat insulating cover penetrates between both main surfaces.
- the carbon composite material of the main surface on the crucible side of the heat insulating lid is installed so as to cover the upper surface of the first heat insulating material in a state where the opening to be formed is formed and the heat insulating lid is installed on the upper surface of the crucible.
- the silicon purification apparatus of the present invention is a silicon purification apparatus comprising a crucible capable of holding molten silicon, a heat insulating lid that can be installed above the crucible, and a heating device for heating the molten silicon in a vacuum vessel.
- the crucible has a first heat insulating material on the outer peripheral portion of the crucible, the heat insulating lid is a plate member made of carbon felt, and at least both main surfaces are provided with a carbon composite material, and the heat insulating lid is between the two main surfaces.
- the silicon refining apparatus is characterized in that the second heat insulating material is installed on the upper surface of the crucible so that the upper surface of the crucible and the heat insulating lid are not in direct contact with each other.
- the silicon purification apparatus of the present invention includes a crucible that can hold molten silicon, a heat insulating lid that can be installed above the crucible, and a heating device that heats the molten silicon in a vacuum container.
- a silicon refining device having a first heat insulating material on the outer peripheral portion of a side surface of a crucible, and a heat insulating lid being a plate member made of carbon felt, comprising a carbon composite material on at least both main surfaces, and a heat insulating lid Is formed with an opening penetrating between both main surfaces, and the carbon composite material of the main surface on the crucible side of the heat insulating lid is the upper surface of the first heat insulating material when the heat insulating cover is installed on the crucible upper surface. It is installed so that it may cover and the 2nd heat insulating material is installed in the upper surface of the crucible so that the peripheral upper surface of an opening part and a heat insulation lid may not contact directly.
- the silicon purifying apparatus of the present invention in yet another aspect, includes a crucible capable of holding molten silicon, a heat insulating lid capable of being installed above the crucible, and a heating device for heating the molten silicon in a vacuum container.
- a silicon refining device having a first heat insulating material on the outer peripheral portion of the side surface of the crucible, and the heat insulating lid is a plate member made of carbon felt, and at least both main surfaces are provided with a carbon composite material,
- the lid is formed with an opening penetrating between both main surfaces, and the carbon composite material of the main surface on the crucible side of the heat insulating lid is the upper surface of the first heat insulating material when the heat insulating cover is installed on the upper surface of the crucible.
- a second heat insulating material is installed on the upper surface of the crucible so that the upper surface of the peripheral edge of the opening and the heat insulating lid do not directly contact each other.
- the silicon purifying apparatus of the present invention is the silicon purifying apparatus according to any one of the above aspects, that is, an aspect in which the carbon composite material provided on the molten silicon side is installed so as to cover the upper surface of the first heat insulating material. And / or in a mode in which the second heat insulating material is installed on the upper surface of the crucible so that the upper surface of the crucible and the heat insulating lid do not directly contact each other, as a heat insulating lid, Using a heat insulating lid having a protrusion at a position on the inner side of the inner wall, a carbon composite material is provided on the molten silicon side of the protrusion, and in the state where the heat insulating cover is installed on the upper surface of the crucible, the protrusion Is arranged so that the lowermost part of the upper part is located on the molten silicon side with respect to the upper edge of the opening of the crucible.
- the silicon purification method of the present invention is a silicon purification method using any one of the above-described silicon purification apparatuses, and the inside of the crucible is decompressed by depressurizing the inside of the decompression vessel containing the crucible, the heat insulating lid and the heating device.
- a method for purifying silicon comprising a step of purifying molten silicon held in a container.
- the life (continuous usable time) of the crucible in the silicon purification apparatus can be improved.
- FIG. 1 is a schematic cross-sectional view showing an example of a silicon purification apparatus according to a first embodiment. It is a schematic sectional drawing which shows an example of the silicon refinement
- FIG. 6 is a schematic cross-sectional view showing an example of a silicon purification apparatus according to a third embodiment. It is a schematic sectional drawing which shows another example of the silicon refinement
- FIG. 1 is a schematic cross-sectional view showing an example of the silicon purification apparatus of the first embodiment.
- a crucible 1 capable of holding molten silicon
- a heat insulating lid 5 that can be installed above the crucible 1
- the molten silicon are heated in a decompression vessel (not shown).
- a heating device 3 3.
- the crucible 1 only needs to have heat resistance capable of holding molten silicon.
- a crucible made of carbon can be used.
- the crucible 1 is provided with a first heat insulating material 4 covering the outer periphery of the side surface.
- the first heat insulating material 4 can be used without particular limitation as long as it is a material having heat insulating properties.
- a heat insulating lid 5 is disposed above the crucible 1.
- the heat insulating lid 5 includes a carbon composite material 501a and a carbon composite material 501b on at least both main surfaces of a plate member 502 made of carbon felt.
- the carbon composite material 501 a is provided on one main surface of the plate-like member 502
- the carbon composite material 501 b is provided on the other main surface, whereby the plate-like member 502 is sandwiched, and the plate-like member 502.
- the carbon composite material 501c is provided on the side surface of the material, and the carbon composite material and the plate-like member form a structure (heat insulating lid).
- the heat insulating lid 5 has an opening 6 penetrating between both main surfaces, through which the silicon vapor is dissipated out of the crucible.
- the carbon composite material 501a on the lower surface side (the side facing the molten silicon 2) of the plate-like member 502 is placed on the upper surface and the side surface of the crucible when the heat insulating lid 5 is installed above the crucible 1. It installs so that the upper surface of the 1st heat insulating material 4 may be covered.
- the progress of the phenomenon exemplified as the above-described problem 1 is that the silicon vapor contacts the side heat insulating material 4 through the gap between the heat insulating lid 5 and the crucible 1 and aggregates at the contacted location. Can be suppressed. That is, in the first embodiment, the carbon composite material 501a is installed so as to cover the upper surface of the first heat insulating material 4 on the side surface of the crucible, so that the carbon composite material 501a and the first heat insulating material 4 on the side surface are disposed. If the crucible side contact portion (in the vicinity indicated by symbol D in FIG.
- the “main surface” means a surface (lower surface C 2 ) that faces the molten silicon 2 in a state where the heat insulating lid 5 is installed on the upper surface of the crucible 1 and an opposing surface ( It is the upper surface C 1 ).
- the reason why the carbon composite material is arranged not only on the lower surface C 2 but also on the upper surface C 1 is that the silicon vapor coming out of the crucible 1 from the opening 6 through which the heat insulating lid 5 penetrates the upper surface C 1 . The influence cannot be ignored. For example, as such an effect, if the carbon felt plate-like member is not covered with the carbon composite material, the plate-like member may react with the silicon vapor, resulting in a decrease in heat insulation.
- the carbon composite material of the lower surface C 2 is preferably thin in order to reduce the thermal conductivity, whereas the carbon composite material of the upper surface C 1 has a certain thickness (generally 1 mm to 5 mm so that the shape can be easily maintained and handled. This is because, below, preferably about 2 mm or more and 3 mm or less.
- FIG. 2 is a schematic sectional view showing an example of the silicon purification apparatus of the second embodiment. Since the configuration other than the arrangement of the heat insulating lid is the same as that of the silicon purification apparatus 100 shown in FIG. 1, the description of the overlapping parts is omitted.
- the silicon refining device 200 is a silicon refining device in which the second heat insulating material 7 is installed on the upper surface of the crucible 1 so that the upper surface of the crucible 1 and the heat insulating lid 5 are not in direct contact.
- the carbon composite material 501 a on the main surface on the crucible side of the heat insulating lid 5 is installed so as to indirectly cover the upper surface of the first heat insulating material 4.
- the second heat insulating material 7 By installing the second heat insulating material 7 on the upper surface portion of the crucible 1, the temperature difference in the vertical direction of the crucible due to the phenomenon illustrated in the above-mentioned problem 2, that is, the heat transfer from the crucible to the heat retaining lid 5 as the heat retaining member. Can be suppressed.
- the second heat insulating material 7 on the upper surface serves as a barrier against the contact between the first heat insulating material 4 and the silicon vapor, the above-mentioned problem 1 as well as the above-mentioned problem 2 can be solved.
- the second heat insulating material 7 for example, a heat insulating material formed into a desired shape can be used in addition to the carbon felt.
- the shape of the second heat insulating material 7 is not particularly limited, but preferably has a width that can cover the upper surface of the crucible 1, and the thickness corresponds to the distance between the upper surface of the crucible 1 and the heat insulating lid 5. For example, it is preferably 5 mm or more and 10 mm or less. By setting it as such thickness, the influence on the heat resistance by silicon vapor
- 3A and 3B are schematic sectional views showing an example of the silicon purification apparatus of the third embodiment. Since the configuration other than the arrangement of the heat insulating lid is the same as that of the silicon purification apparatus 200 shown in FIG. 2, the description of the overlapping parts is omitted.
- the heat insulating lid 5 in the silicon purification apparatus 300 of the third embodiment has the protruding portion 8 at a position inside the inner wall of the opening 6 of the crucible 1 in the state where it is installed on the upper surface of the crucible 1.
- a carbon composite material 801 is provided at least on the molten silicon side, and the lowermost portion of the protrusion 8 (the molten silicon 2 side of the carbon composite material 801 in FIGS. 3A and 3B) is the opening of the crucible 1 in a state where it is installed on the upper surface of the crucible 1.
- 6 is a silicon refining device, which is arranged so as to be positioned on the molten silicon 2 side with respect to the upper edge.
- the protrusion 8 includes a heat-resistant material fixture 802 provided to connect the heat insulating lid 5 and the carbon composite material 801.
- a fixture 802 for example, a carbon composite product is used. Bolts and nuts are exemplified.
- the above-mentioned problem 1 and problem 2 can be solved, the heat resistance characteristics of the first heat insulating material can be maintained, and variation in heat resistance in the crucible vertical direction can be suppressed.
- the protrusion 8 functions to block the contact of the silicon vapor with the second heat insulating material 7 on the upper surface of the crucible, the solidification of the silicon vapor in the second heat insulating material 7 can be suppressed. The heat insulation property fall of the heat insulating material 7 can be prevented.
- the protrusion 8 has a structure in which a third heat insulating material 803 different from the plate-like member 502 made of carbon felt constituting the heat retaining lid 5 is used as a carbon composite constituting the heat retaining lid 5.
- the structure is formed by sandwiching the material 501a and the carbon composite material 801 provided on the molten silicon 2 side of the protrusion 8 and fixing the side surface with the carbon composite material 804 and the carbon composite material 501d. Also good.
- the present invention relates to a silicon purification method using the silicon purification apparatus according to any one of the above embodiments.
- the silicon purification apparatus is provided with a decompression vessel, and the silicon purification method of the present invention removes impurities from the molten silicon held in the crucible by decompressing the interior of the decompression vessel. And refining the raw material silicon.
- the process include vacuum refining, that is, a method of removing impurities from a molten raw material in a vacuum atmosphere.
- vacuum refining that is, a method of removing impurities from a molten raw material in a vacuum atmosphere.
- the raw material is silicon
- raw material silicon such as metal silicon, P, Al, Ca and the like having a vapor pressure higher than that of silicon
- a vacuum purification method Specifically, raw material silicon is put into a crucible provided in the silicon refining apparatus and melted by heating using a heating apparatus. After that, for example, by setting the degree of vacuum in the decompression vessel to 100 Pa or less and holding it at a temperature of about 1412 ° C. to 1800 ° C. for a predetermined time, steam containing a relatively large amount of impurities relative to the molten silicon (hereinafter referred to as impurity-containing steam) Evaporate.
- impurity-containing steam steam containing a relatively large amount of impurities relative to the molten silicon
- the silicon refining apparatus of the present invention has improved heat resistance in the vertical direction of the crucible, it is thermally stable in such a silicon refining method, and deterioration over time is suppressed. Become. [Example] EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in detail, this invention is not limited to these.
- Example 1 Silicon purification (phosphorus removal) was performed using an apparatus in which a crucible and an induction heating apparatus for heating the crucible were installed in a vacuum container whose inside could be decompressed by a vacuum pump.
- the apparatus configuration was in accordance with FIG. 3A, and the test conditions were as follows.
- the crucible used is a high-purity graphite crucible manufactured by Toyo Tanso Co., Ltd., and has a cylindrical shape with an outer diameter of 820 mm and a storage portion depth of 750 mm.
- the side surface of the crucible was covered with a molded heat insulating material having a thickness of 100 mm as the first heat insulating material 4.
- the heat insulating lid 5 sandwiches a plate-like member 502 made of a carbon felt material having a thickness of 50 mm and a diameter of 920 mm between a carbon composite material 501a and a carbon composite material 501b having a thickness of 1 to 2 mm, and further a carbon composite material 501c is provided on the side surface.
- the disc was provided and used on the crucible 1.
- the shape of the opening in the heat insulating lid 5 is shown in FIG. As shown in FIG. 4, the opening 6 was provided so as to include the central portion of the crucible, and the opening area was about 40% of the total area.
- the carbon composite material 801 of the protruding portion 8 is a disk having an outer diameter of 680 mm and a thickness of 2 mm, and is set so as to enter about 20 mm below the upper surface of the crucible 1 from the heat insulating lid 5 by a graphite bolt and nut fixture 802. did.
- a ring-shaped carbon felt material having an outer diameter of 820 mm, an inner diameter of 680 mm, and a thickness of 10 to 20 mm was prepared as the second heat insulating material 7 to keep the upper surface warm, and placed between the crucible 1 and the heat insulating lid 5.
- the input amount was 400 kg.
- the temperature of the molten silicon 2 was 1650 ° C., and the pressure reduction condition was 1.0 Pa. It was about 480 degreeC when the temperature difference of the upper end part of the crucible 1 and the center part of a height direction was measured in the pressure reduction container.
- silicon purification metal silicon with an initial phosphorus concentration of 20 ppm by weight, purification to a final phosphorus concentration of 0.1 ppm by weight
- silicon purification metal silicon with an initial phosphorus concentration of 20 ppm by weight, purification to a final phosphorus concentration of 0.1 ppm by weight
- the refined molten silicon 2 is discharged from the crucible 1 to form a new metal
- Example 1 Except for using the heat insulating lid having the shape shown in FIG. 5 as the heat insulating lid, the same apparatus as in the example was used and silicon was purified under the same conditions as in Example 1. The upper end of the crucible and the center in the height direction The temperature difference from the part was about 570 ° C., and the crucible was overheated at the point of use for 14 consecutive days, so the experiment was stopped. This is considered to be caused by the deterioration of the crucible (such as generation of fine cracks) due to the temperature difference in the vertical direction of the crucible.
- the silicon purification apparatus and the silicon purification method of the present invention can be applied to silicon purification using a crucible.
- the purification apparatus of the present invention is applicable to the purification of silicon for producing solar cell silicon from metal silicon by a vacuum purification method.
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Abstract
Description
・問題点1:溶融シリコン不純物を含むシリコン蒸気が保温部材50と坩堝10との境界部(図5において符号Aで示す)をつたって側面の断熱材40に接し、ここで凝集することで側面の断熱材40の上端部分(保温部材50との境界付近)の断熱性を低下させるので、坩堝の上下方向において温度差が起こる。特に側面の断熱材40がカーボンフェルト製である場合、該断熱材がシリコン蒸気と反応するので断熱性低下が顕著になる。
・問題点2:カーボンコンポジットはカーボンフェルトに比べて熱伝導率が高いので、坩堝10の上端面とカーボンコンポジット材552が接した従来構造では、坩堝10から保温部材50への熱移動により坩堝10の上下方向の温度差が起こる。図5中に、加熱装置30が誘導加熱装置である場合の磁場の発生範囲Bの概念図を示す。このように、加熱装置30が誘導加熱装置である場合、高周波コイルから発生する磁場はコイル両端部で弱く、また、坩堝10の下端部は溶融シリコン20からの熱伝導により低温になり難いため、坩堝10の上下方向の温度差は顕著になる。
図1は本実施の形態1のシリコン精製装置の一例を示す概略断面図である。本実施の形態1のシリコン精製装置100には、減圧容器(図示せず)内に、溶融シリコンを保持可能な坩堝1と、坩堝1上方に設置可能な保温蓋5と、溶融シリコンを加熱する加熱装置3とを具備する。
図2に本実施の形態2のシリコン精製装置の一例を示す概略断面図を示す。保温蓋の配置以外の構成は、図1に示すシリコン精製装置100と同様であるため、重複する部分の説明は省略する。
図3Aおよび図3Bに本実施の形態3のシリコン精製装置の一例を示す概略断面図を示す。保温蓋の配置以外の構成は、図2に示すシリコン精製装置200と同様であるため、重複する部分の説明は省略する。
本発明は、上記いずれかの実施の形態のシリコン精製装置を用いたシリコン精製方法に関する。
[実施例]
以下、実施例を挙げて本発明をより詳細に説明するが、本発明はこれらに限定されるものではない。
真空ポンプによって内部を減圧可能とした減圧容器中に坩堝と、坩堝加熱用の誘導加熱装置を設置した装置を用い、シリコン精製(リン除去)を行った。装置構成は図3Aに準じ、試験条件は以下の通りとした。
溶融シリコン2の温度を1650℃、減圧条件を1.0Paとした。減圧容器内において坩堝1の上端部と高さ方向の中央部との温度差を測ると、約480℃であった。
保温蓋として図5に示す形状の保温蓋を用いた以外、実施例と同様の装置を用い、実施例1と同様の条件によりシリコン精製を行ったところ、坩堝の上端部と高さ方向の中央部との温度差が約570℃であり、連続14日間使用時点において、坩堝の過熱が発生したため、実験を中断した。坩堝の上下方向の温度差による坩堝の劣化(細かなクラック生成など)が原因であると考えられる。
Claims (6)
- 減圧容器内に、溶融シリコン(2)を保持可能な坩堝(1)と、前記坩堝(1)上方に設置可能な保温蓋(5)と、溶融シリコン(2)を加熱する加熱装置(3)とを具備するシリコン精製装置であって、
前記坩堝(1)の側面外周部に第1の断熱材(4)を有し、
前記保温蓋(5)は、カーボンフェルト製の板状部材(502)であって、少なくとも両主面にカーボンコンポジット材(501a,501b)を備え、
前記保温蓋(5)は両主面間を貫通する開口部(6)が形成されており、
前記保温蓋(5)を前記坩堝(1)上面に設置した状態において、前記保温蓋(5)の坩堝(1)側となる主面の前記カーボンコンポジット材(501a)は、前記第1の断熱材(4)の上面を覆うように設置されるシリコン精製装置。 - 減圧容器内に、溶融シリコン(2)を保持可能な坩堝(1)と、前記坩堝(1)上方に設置可能な保温蓋(5)と、溶融シリコン(2)を加熱する加熱装置(3)とを具備するシリコン精製装置であって、
前記坩堝(1)の側面外周部に第1の断熱材(4)を有し、
前記保温蓋(5)は、カーボンフェルト製の板状部材(502)であって、少なくとも両主面にカーボンコンポジット材(501a,501b)を備え、
前記保温蓋(5)は両主面間を貫通する開口部(6)が形成されており、
前記坩堝(1)の上面と前記保温蓋(5)とが直接接触しないように、前記坩堝(1)の上面に第2の断熱材(7)が設置されるシリコン精製装置。 - 前記保温蓋(5)を前記坩堝(1)上面に設置した状態において、前記保温蓋(5)の坩堝(1)側となる主面の前記カーボンコンポジット材(501a)は、前記第1の断熱材(4)の上面を覆うように設置されている請求の範囲2に記載のシリコン精製装置。
- 減圧容器内に、溶融シリコン(2)を保持可能な坩堝(1)と、前記坩堝(1)上方に設置可能な保温蓋(5)と、溶融シリコン(2)を加熱する加熱装置(3)とを具備するシリコン精製装置であって、
前記坩堝(1)の側面外周部に第1の断熱材(4)を有し、
前記保温蓋(5)は、カーボンフェルト製の板状部材(502)であって、少なくとも両主面にカーボンコンポジット材(501a,501b)を備え、
前記保温蓋(5)は、前記坩堝(1)上面に設置した状態において前記坩堝(1)の開口部の内壁よりも内側となる位置に突出部(8)を有し、
前記突出部(8)の少なくとも溶融シリコン(2)側にはカーボンコンポジット材(801)を備え、
前記坩堝(1)上面に設置した状態において前記突出部(8)の最下部が前記坩堝(1)開口部の上縁よりも溶融シリコン(2)側に位置するように配置されるシリコン精製装置。 - 前記保温蓋(5)は、前記坩堝(1)上面に設置した状態において前記坩堝(1)の開口部の内壁よりも内側となる位置に突出部(8)を有し、
前記突出部(8)の少なくとも溶融シリコン(2)側にはカーボンコンポジット材(801)を備え、
前記坩堝(1)上面に設置した状態において前記突出部(8)の最下部が前記坩堝(1)開口部よりも溶融シリコン(2)側に位置するように配置される、請求の範囲1から3のいずれか記載のシリコン精製装置。 - 請求の範囲1から5のいずれかに記載のシリコン精製装置を用いたシリコン精製方法であって、
前記減圧容器の内部を減圧することにより、前記坩堝(1)内に保持した溶融シリコン(2)を精製する工程を含む、シリコン精製方法。
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