WO2010131572A1

WO2010131572A1 - Semiconductor device

Info

Publication number: WO2010131572A1
Application number: PCT/JP2010/057444
Authority: WO
Inventors: 和田　圭司; 原田　真; 増田　健良; 美紗子穂永; 佐々木　信; 太郎西口; 靖生並川; 藤原　伸介
Original assignee: 住友電気工業株式会社
Priority date: 2009-05-11
Filing date: 2010-04-27
Publication date: 2010-11-18
Also published as: US8168515B2; JPWO2010131570A1; CA2735975A1; KR20120014024A; JPWO2010131572A1; EP2432000A1; WO2010131570A1; KR20120011059A; TW201120939A; KR20120014017A; US20110165764A1; EP2432001A4; JP5477380B2; CA2761245A1; CN102160143B; JPWO2010131568A1; KR20120024526A; JP5344037B2; EP2432020A1; CA2761246A1

Abstract

Disclosed is a MOSFET (100) which is a semiconductor device that can be reduced in the on-resistance, while being suppressed in the occurrence of stacking faults due to a heat treatment during the device production process. The MOSFET (100) comprises a silicon carbide substrate (1), an active layer (7) that is formed from single crystal silicon carbide and arranged on one main surface of the silicon carbide substrate (1), a source contact electrode (92) that is arranged on the active layer (7), and a drain electrode (96) that is formed on the other main surface of the silicon carbide substrate (1). The silicon carbide substrate (1) contains a base layer (10) that is formed from silicon carbide and an SiC layer (20) that is formed from single crystal silicon carbide and arranged on the base layer (10). The impurity concentration of the base layer (10) is higher than 2 × 10¹⁹ cm^-3, and the impurity concentration of the SiC layer (20) is higher than 5 × 10¹⁸ cm^-3 but lower than 2 × 10¹⁹ cm^-3.

Description

Semiconductor device

The present invention relates to a semiconductor device, and more particularly to a semiconductor device capable of achieving a reduction in on-resistance while suppressing generation of stacking faults due to heat treatment in a device manufacturing process.

In recent years, silicon carbide (SiC) is being adopted as a material constituting a semiconductor device in order to enable a semiconductor device to have a high breakdown voltage, low loss, and use in a high temperature environment. Silicon carbide is a wide band gap semiconductor having a larger band gap than silicon that has been widely used as a material for forming semiconductor devices. Therefore, by adopting silicon carbide as a material constituting the semiconductor device, it is possible to achieve a high breakdown voltage and a low on-resistance of the semiconductor device. In addition, a semiconductor device that employs silicon carbide as a material has an advantage that a decrease in characteristics when used in a high temperature environment is small as compared with a semiconductor device that employs silicon as a material.

In order to manufacture a high-performance semiconductor device employing silicon carbide as a material, a process of preparing a silicon carbide substrate (silicon carbide substrate) and forming an SiC epitaxial growth layer on the silicon carbide substrate is employed. Is effective. For example, when manufacturing a vertical power device (vertical MOSFET; Metal Oxide Semiconductor Field Effect Transistor, etc.) using a silicon carbide substrate, the on-resistance of the device is reduced by reducing the resistivity in the thickness direction of the substrate as much as possible. Can be reduced. In order to reduce the resistivity in the thickness direction of the substrate, it is possible to adopt a policy of introducing impurities such as nitrogen, which is an n-type dopant, into the substrate at a high concentration (for example, RCGLASS et al. al., “SiC Seed Crystal Growth”, Phys. stat. sol. (b), 1997, 202, p149-162 (Non-patent Document 1)).

However, when the resistivity of the substrate is reduced by simply introducing impurities into the substrate at a high concentration, the following problems occur. That is, when a semiconductor device is manufactured using a silicon carbide substrate, a heat treatment is performed on the silicon carbide substrate, for example, thermal cleaning for cleaning the surface of the silicon carbide substrate. At this time, a stacking fault occurs in a silicon carbide substrate containing a high concentration of impurities. And when the epitaxial growth layer which consists of SiC is formed on the said silicon carbide substrate, the said stacking fault propagates also in the said SiC layer. Here, for example, when SiC constituting the silicon carbide substrate is 4H—SiC, the structure of the stacking fault generated is the 3C type having a smaller band gap than the 4H type. Therefore, the band gap is locally reduced in the region where the stacking fault has occurred. As a result, when a semiconductor device is manufactured using the silicon carbide substrate, problems such as a decrease in breakdown voltage and an increase in leakage current occur.

Therefore, an object of the present invention is to provide a semiconductor device capable of achieving a reduction in on-resistance while suppressing generation of stacking faults due to heat treatment in a device manufacturing process.

A semiconductor device according to the present invention includes a silicon carbide substrate, a single crystal silicon carbide, an active layer disposed on one main surface of the silicon carbide substrate, a first electrode disposed on the active layer, And a second electrode formed on the other main surface of the silicon carbide substrate. The silicon carbide substrate includes a base layer made of silicon carbide and a SiC layer made of single crystal silicon carbide and disposed on the base layer. The impurity concentration of the base layer is larger than 2 × 10 ¹⁹ cm ⁻³ , and the impurity concentration of the SiC layer is larger than 5 × 10 ¹⁸ cm ^{−3 and} smaller than 2 × 10 ¹⁹ cm ⁻³ .

The present inventor has conducted detailed studies on a method for reducing resistivity in the thickness direction while suppressing generation of stacking faults due to heat treatment in a device manufacturing process in a silicon carbide substrate. As a result, if the impurity concentration is less than 2 × 10 ¹⁹ cm ⁻³ , generation of stacking faults due to the heat treatment can be suppressed, whereas if it exceeds 2 × 10 ¹⁹ cm ⁻³ , it is difficult to suppress stacking faults. I found. Thus, greater than the impurity concentration in the silicon carbide substrate 2 × ¹⁰ 19 ^{cm -3,} provided with a small layer resistivity (base layer), small layer (SiC layer than the impurity concentration of 2 × ¹⁰ 19 ^{cm -3} ) On the base layer, it is possible to suppress the occurrence of stacking faults at least in the SiC layer even when the heat treatment in the device manufacturing process is subsequently performed. Then, an epitaxial growth layer (active layer) made of SiC is formed on the SiC layer to fabricate a semiconductor device, thereby reducing the resistivity of the silicon carbide substrate due to the presence of the base layer and generating in the base layer. It is possible to suppress the influence of possible stacking faults on the characteristics of the semiconductor device. On the other hand, when the impurity concentration of the SiC layer is 5 × 10 ¹⁸ cm ⁻³ or less, there may arise a problem that the resistivity of the SiC layer becomes too high.

As described above, according to the semiconductor device of the present invention, it is possible to provide a semiconductor device capable of achieving a reduction in on-resistance while suppressing generation of stacking faults due to heat treatment in the device manufacturing process. Here, “impurity” refers to an impurity introduced to generate majority carriers in the silicon carbide substrate.

Further, the base layer and the SiC layer are bonded, for example. Thereby, a silicon carbide substrate on which an SiC layer is arranged can be easily obtained while suppressing the propagation of defects in the base layer. At this time, the base layer and the SiC layer may be directly bonded or may be bonded via an intermediate layer.

In the semiconductor device, the impurity contained in the base layer may be different from the impurity contained in the SiC layer. Thereby, the semiconductor device provided with the silicon carbide substrate containing the suitable impurity according to the objective can be provided.

In the semiconductor device, the impurity contained in the base layer is nitrogen or phosphorus, and the impurity contained in the SiC layer can also be nitrogen or phosphorus. Nitrogen and phosphorus are suitable as impurities for supplying electrons as majority carriers to SiC.

In the semiconductor device, the base layer is made of single crystal silicon carbide, and the half width of the X-ray rocking curve of the SiC layer may be smaller than the half width of the X-ray rocking curve of the base layer.

SiC does not have a liquid phase at normal pressure. Therefore, normally, in the sublimation recrystallization method used in the case of producing bulk single crystal SiC by growing in the <0001> direction of hexagonal crystal, the crystal growth temperature is very high as 2000 ° C. or more, Its stabilization is difficult. Therefore, it is difficult to increase the diameter of a substrate made of single crystal SiC while maintaining high quality. On the other hand, in order to efficiently manufacture a semiconductor device using a silicon carbide substrate, a substrate having a predetermined shape and size is required. Therefore, even when a high quality silicon carbide single crystal (for example, single crystal silicon carbide having a low dislocation density or a small crystal axis fluctuation and a small half-value width of an X-ray rocking curve) is obtained, a predetermined shape is obtained by cutting or the like. There is a possibility that an area that cannot be processed in a uniform manner may not be used effectively.

On the other hand, in the silicon carbide substrate of the present invention, on the base layer processed into the predetermined shape and size, for example, the half width of the X-ray rocking curve is smaller than that of the base layer. A SiC layer that is high but does not have a desired shape or the like can be disposed. Since such a silicon carbide substrate is unified with a predetermined shape and size of the base layer, the manufacturing of the semiconductor device can be made efficient. Moreover, since it is possible to manufacture a semiconductor device using such a high quality SiC layer of a silicon carbide substrate, high quality single crystal silicon carbide can be used effectively. As a result, the manufacturing cost of the semiconductor device can be reduced.

In the semiconductor device, the active layer is disposed on a silicon carbide substrate and has a first conductivity type drift layer made of single crystal silicon carbide, and a first main surface of the drift layer opposite to the silicon carbide substrate. A first conductivity type well region disposed so as to include a first conductivity type well region including a first main surface in the well region and in contact with the first electrode; An insulating film made of an insulator and a third electrode arranged on the insulating film may be further provided on the main surface so as to be in contact with the well region.

As a result, a MISFET (Metal Insulator Semiconductor Field Effect Transistor) in which the first electrode is the source electrode, the second electrode is the drain electrode, and the third electrode is the gate electrode can be obtained.

In the semiconductor device, the insulating film may be made of silicon dioxide. Thereby, a MOSFET (Metal Oxide Semiconductor Field Effect Transistor) can be obtained.

In the semiconductor device, in the silicon carbide substrate, the main surface of the SiC layer opposite to the base layer may have an off angle of 50 ° or more and 65 ° or less with respect to the {0001} plane.

Hexagonal single crystal silicon carbide can be produced in a <0001> direction to efficiently produce a high quality single crystal. And from the silicon carbide single crystal grown in the <0001> direction, a silicon carbide substrate having a {0001} plane as a main surface can be efficiently collected. On the other hand, there may be a case where a high-performance semiconductor device can be manufactured by using a silicon carbide substrate having a main surface with an off angle with respect to the plane orientation {0001} of 50 ° to 65 °.

Specifically, for example, a silicon carbide substrate used for manufacturing a MOSFET, for example, generally has a main surface with an off angle of about 0.3 ° to 8 ° with respect to the plane orientation {0001}. Then, an epitaxial growth layer (active layer) is formed on the main surface, and an insulating film (oxide film), an electrode, and the like are formed on the active layer to obtain a MOSFET. In this MOSFET, a channel region is formed in a region including the interface between the active layer and the insulating film. However, in the MOSFET having such a structure, an active layer in which a channel region is formed due to an off angle of about 0.3 ° to 8 ° with respect to the plane orientation {0001} of the main surface of the substrate In the vicinity of the interface between the insulating film and the insulating film, many interface states are formed and carriers are trapped, or channel mobility decreases due to scattering by trapped carriers.

On the other hand, in the silicon carbide substrate, the off-angle of the main surface of the SiC layer opposite to the base layer with respect to the {0001} plane is 50 ° or more and 65 ° or less, thereby reducing the formation of the interface state. Thus, a MOSFET with reduced on-resistance can be manufactured.

In the semiconductor device, in the silicon carbide substrate, the angle formed between the off orientation of the main surface of the SiC layer opposite to the base layer and the <1-100> direction may be 5 ° or less.

The <1-100> direction is a typical off orientation in the silicon carbide substrate. Then, by setting the variation in the off orientation due to the variation in slicing in the substrate manufacturing process to 5 ° or less, it is possible to easily form the epitaxial growth layer (active layer) on the silicon carbide substrate.

In the silicon carbide substrate, the off-angle of the main surface of the SiC layer opposite to the base layer with respect to the {03-38} plane in the <1-100> direction is not less than −3 ° and not more than 5 °. Good. Thereby, the channel mobility when a MOSFET is fabricated using a silicon carbide substrate can be further improved. Here, the off angle with respect to the plane orientation {03-38} is set to −3 ° or more and + 5 ° or less. As a result of investigating the relationship between the channel mobility and the off angle, the channel mobility is particularly high within this range. Is based on the obtained.

The “off angle with respect to the {03-38} plane in the <1-100> direction” is an orthogonal projection of the normal of the principal surface to the plane extending in the <1-100> direction and the <0001> direction, This is an angle formed with the normal of the {03-38} plane, and its sign is positive when the orthographic projection approaches parallel to the <1-100> direction, and the orthographic projection is in the <0001> direction. The case of approaching parallel to is negative.

In addition, it is more preferable that the plane orientation of the main surface is substantially {03-38}. Here, the surface orientation of the main surface is substantially {03-38}, taking into account the processing accuracy of the substrate, etc., the substrate is within an off-angle range where the surface orientation can be substantially regarded as {03-38}. In this case, the off angle range is, for example, a range of ± 2 ° with respect to {03-38}. As a result, the above-described channel mobility can be further improved.

In the semiconductor device, in the silicon carbide substrate, the angle formed between the off orientation of the main surface of the SiC layer opposite to the base layer and the <11-20> direction may be 5 ° or less.

<11-20> is a typical off orientation in the silicon carbide substrate, similarly to the above <1-100> direction. Then, by setting the variation in the off orientation due to the variation in the slice processing in the substrate manufacturing process to ± 5 °, it is possible to facilitate the formation of the epitaxial growth layer (active layer) on the SiC substrate.

In the semiconductor device, the base layer may be made of single crystal silicon carbide. In this case, the defect density of the SiC layer is preferably lower than the defect density of the base layer.

For example, in the above semiconductor device, the micropipe density of the SiC layer is preferably smaller than the micropipe density of the base layer.

In the semiconductor device, preferably, the dislocation density of the SiC layer is lower than the dislocation density of the base layer.

In the semiconductor device, preferably, the threading screw dislocation density of the SiC layer is smaller than the threading screw dislocation density of the base layer. In the semiconductor device, preferably, the threading edge dislocation density of the SiC layer is smaller than the threading edge dislocation density of the base layer. In the semiconductor device, preferably, the basal plane dislocation density of the SiC layer is smaller than the basal plane dislocation density of the base layer. In the semiconductor device, preferably, the mixed dislocation density of the SiC layer is smaller than the mixed dislocation density of the base layer. In the semiconductor device, preferably, the stacking fault density of the SiC layer is smaller than the stacking fault density of the base layer. In the semiconductor device, preferably, the point defect density of the SiC layer is smaller than the point defect density of the base layer.

By arranging a SiC layer in which the defect density such as micropipe density, threading screw dislocation density, threading edge dislocation density, basal plane dislocation density, mixed dislocation density, stacking fault density, point defect density is reduced compared to the base layer A high quality active layer can be formed on the SiC layer. The active layer can be formed, for example, by combining epitaxial growth and impurity ion implantation.

In the semiconductor device, a plurality of SiC layers may be stacked. Thereby, the semiconductor device provided with the some SiC layer according to the target function can be obtained.

In the above semiconductor device, the silicon carbide substrate further includes an intermediate layer made of a conductor or a semiconductor, disposed between the base layer and the SiC layer, and the intermediate layer joins the base layer and the SiC layer. May be.

By adopting such a structure in which the base layer and the SiC layer are joined by the intermediate layer, the impurity concentration is 5 × 10 ¹⁸ cm ⁻ on the base layer having an impurity concentration higher than 2 × 10 ¹⁹ cm ^−3. ³ can be easily obtained a semiconductor device having a silicon carbide substrate disposed small SiC layer than 2 × 10 ¹⁹ cm ^-3 greater than. In addition, since the intermediate layer is made of a conductor or a semiconductor, it is possible to ensure electrical connection between the base layer and the SiC layer.

In the semiconductor device, the intermediate layer may be made of metal. A part of the metal constituting the intermediate layer may be silicided. In the semiconductor device, the intermediate layer may be made of carbon. The intermediate layer may be made of amorphous silicon carbide. This makes it possible to easily ensure electrical connection between the base layer and the SiC layer in the thickness direction of the substrate.

In the silicon carbide substrate, the base layer may include a single crystal layer made of single crystal silicon carbide so as to include a main surface on the side facing the SiC layer. Thereby, a difference in physical properties (for example, a difference in linear expansion coefficient) between the base layer and the SiC layer is reduced, and warpage of the silicon carbide substrate can be suppressed. At this time, when the influence of the crystallinity of the base layer on the characteristics of the semiconductor device is small, the region other than the single crystal layer of the base layer is made of polycrystalline silicon carbide, amorphous silicon carbide, or silicon carbide sintered body. It may be a non-single crystal layer. Thereby, the manufacturing cost of the semiconductor device can be reduced.

In the silicon carbide substrate, it is preferable that the half width of the X-ray rocking curve of the SiC layer is smaller than the half width of the X-ray rocking curve of the single crystal layer. Moreover, in the said silicon carbide substrate, it is preferable that the micropipe density of a SiC layer is lower than the micropipe density of a single crystal layer. In the silicon carbide substrate, the dislocation density of the SiC layer is preferably lower than the dislocation density of the single crystal layer. By doing in this way, a high quality active layer can be formed on a SiC layer. The active layer can be formed, for example, by combining epitaxial growth and impurity ion implantation.

As is apparent from the above description, according to the semiconductor device of the present invention, it is possible to provide a semiconductor device capable of achieving a reduction in on-resistance while suppressing generation of stacking faults due to heat treatment in the device manufacturing process.

It is a schematic sectional drawing which shows the structure of MOSFET. It is a schematic sectional drawing which shows the structure of a silicon carbide substrate. It is a flowchart which shows the outline of the manufacturing method of MOSFET. It is a schematic sectional drawing for demonstrating the manufacturing method of MOSFET. It is a schematic sectional drawing for demonstrating the manufacturing method of MOSFET. It is a schematic sectional drawing for demonstrating the manufacturing method of MOSFET. It is a flowchart which shows the outline of the manufacturing method of a silicon carbide substrate. 5 is a flowchart showing an outline of a method for manufacturing a silicon carbide substrate in a second embodiment. FIG. 11 is a schematic cross sectional view for illustrating the method for manufacturing the silicon carbide substrate in the second embodiment. FIG. 11 is a schematic cross sectional view for illustrating the method for manufacturing the silicon carbide substrate in the second embodiment. FIG. 11 is a schematic cross sectional view for illustrating the method for manufacturing the silicon carbide substrate in the second embodiment. FIG. 7 is a schematic cross sectional view showing a structure of a silicon carbide substrate in a third embodiment. FIG. 6 is a schematic cross sectional view showing a structure of a silicon carbide substrate in a fourth embodiment. 6 is a flowchart showing an outline of a method for manufacturing a silicon carbide substrate in a fourth embodiment. FIG. 6 is a schematic cross sectional view showing a structure of a silicon carbide substrate in a fifth embodiment. 10 is a flowchart showing an outline of a method for manufacturing a silicon carbide substrate in a fifth embodiment. FIG. 10 is a schematic cross sectional view showing a structure of a silicon carbide substrate in a sixth embodiment. 17 is a flowchart showing an outline of a method for manufacturing a silicon carbide substrate in a sixth embodiment. FIG. 12 is a schematic cross sectional view for illustrating the method for manufacturing the silicon carbide substrate in the sixth embodiment. It is a figure which shows the relationship between the impurity concentration and mobility in n type 4H-SiC.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, the same or corresponding parts are denoted by the same reference numerals, and description thereof will not be repeated.

(Embodiment 1)
First, Embodiment 1 which is one embodiment of the present invention will be described. Referring to FIG. 1, MOSFET 100, which is a semiconductor device in the present embodiment, includes a silicon carbide substrate 1 having a conductivity type of n type (first conductivity type) and a buffer made of silicon carbide and having a conductivity type of n type. Layer 2 made of silicon carbide and having a conductivity type of n type, a pair of well regions 4 having a conductivity type of p type (second conductivity type), and n ⁺ as a source region having a conductivity type of n type. A region 5 and a p ⁺ region 6 as a high-concentration second conductivity type region having a p-type conductivity are provided.

Buffer layer 2 is formed on one main surface of silicon carbide substrate 1 and has an n-type conductivity by containing an n-type impurity. Drift layer 3 is formed on buffer layer 2 and has an n-type conductivity by including an n-type impurity. The n-type impurity contained in the drift layer 3 is, for example, N (nitrogen), and is contained at a lower concentration (density) than the n-type impurity contained in the buffer layer 2.

The pair of well regions 4 are formed separately from each other so as to include a main surface 3A opposite to the main surface on the silicon carbide substrate 1 side in the drift layer 3, and p-type impurities (conductivity type is p-type). By including an impurity, the conductivity type is p-type (second conductivity type). The p-type impurity contained in the well region 4 is, for example, aluminum (Al), boron (B), or the like.

The n ⁺ region 5 is formed inside each of the pair of well regions 4 so as to include the main surface 3 ^ A} and be surrounded by the well region 4. The n ⁺ region 5 contains an n-type impurity, such as P, at a higher concentration (density) than the n-type impurity contained in the drift layer 3. The p ⁺ region 6 includes the main surface 3 A, is surrounded by the well region 4, and is formed inside each of the pair of well regions 4 so as to be adjacent to the n ⁺ region 5. The p ⁺ region 6 contains a p-type impurity such as Al at a higher concentration (density) than the p-type impurity contained in the well region 4. The buffer layer 2, drift layer 3, well region 4, n ⁺ region 5 and p ⁺ region 6 constitute an active layer 7.

Further, referring to FIG. 1, MOSFET 100 includes a gate oxide film 91 as a gate insulating film, a gate electrode 93, a pair of source contact electrodes 92, an interlayer insulating film 94, a source wiring 95, and a drain electrode 96. And.

Gate oxide film 91 is formed on main surface 3A of drift layer 3 so as to be in contact with main surface 3A and to extend from the upper surface of one n ⁺ region 5 to the upper surface of the other n ⁺ region 5. For example, it is made of silicon dioxide (SiO ₂ ).

Gate electrode 93 is arranged in contact with gate oxide film 91 so as to extend from one n ⁺ region 5 to the other n ⁺ region 5. The gate electrode 93 is made of a conductor such as polysilicon or Al to which impurities are added.

Source contact electrode 92 extends from each of the pair of n ⁺ regions 5 in a direction away from gate oxide film 91 to reach p ⁺ region 6 and is in contact with main surface 3A. . The source contact electrode 92 is made of a material capable of ohmic contact with the n ⁺ region 5 such as Ni _x Si _y (nickel silicide).

Interlayer insulating film 94 is formed on main surface 3A of drift layer 3 so as to surround gate electrode 93 and to extend from one well region 4 to the other well region 4, and is, for example, an insulator. It consists of silicon dioxide (SiO ₂ ).

Source wiring 95 surrounds interlayer insulating film 94 on main surface 3 A of drift layer 3 and extends to the upper surface of source contact electrode 92. The source wiring 95 is made of a conductor such as Al and is electrically connected to the n ⁺ region 5 through the source contact electrode 92.

Drain electrode 96 is formed in contact with the main surface of silicon carbide substrate 1 opposite to the side on which drift layer 3 is formed. Drain electrode 96 is made of a material capable of making ohmic contact with silicon carbide substrate 1 such as Ni _x Si _y , and is electrically connected to silicon carbide substrate 1.

Next, the operation of MOSFET 100 will be described. Referring to FIG. 1, in the state where the voltage of gate electrode 93 is lower than the threshold voltage, that is, in the off state, well region 4 and drift layer 3 located immediately below gate oxide film 91 are applied even when a voltage is applied to the drain electrode. The pn junction between and becomes a reverse bias and becomes non-conductive. On the other hand, when a positive voltage equal to or higher than the threshold voltage is applied to the gate electrode 93, an inversion layer is formed in the channel region in the vicinity of the well region 4 in contact with the gate oxide film 91. As a result, n ⁺ region 5 and drift layer 3 are electrically connected, and a current flows between source line 95 and drain electrode 96.

Further, referring to FIG. 2, silicon carbide substrate 1 constituting MOSFET 100 in the present embodiment includes base layer 10 made of silicon carbide and single crystal silicon carbide, on one main surface 10 A of base layer 10. And SiC layer 20 disposed on the substrate. The impurity concentration of the base layer 10 is larger than 2 × 10 ¹⁹ cm ⁻³ , and the impurity concentration of the SiC layer 20 is larger than 5 × 10 ¹⁸ cm ^{−3 and} smaller than 2 × 10 ¹⁹ cm ⁻³ . Therefore, MOSFET 100 in the present embodiment is a semiconductor device that can achieve a reduction in on-resistance while suppressing generation of stacking faults due to heat treatment in the device manufacturing process. There may be a boundary between base layer 10 and SiC layer 20, and the defect density may be discontinuous at the boundary. Base layer 10 may be made of, for example, single crystal silicon carbide, polycrystalline silicon carbide, amorphous silicon carbide, silicon carbide sintered body, or a combination thereof.

Here, in MOSFET 100, base layer 10 may be made of single crystal silicon carbide. The micropipe density of SiC layer 20 is preferably smaller than the micropipe density of base layer 10. The threading screw dislocation density of the SiC layer 20 is preferably smaller than the threading screw dislocation density of the base layer 10. Further, the threading edge dislocation density of SiC layer 20 is preferably smaller than the threading edge dislocation density of base layer 10. The basal plane dislocation density of SiC layer 20 is preferably smaller than the basal plane dislocation density of base layer 10. The mixed dislocation density of SiC layer 20 is preferably smaller than the mixed dislocation density of base layer 10. Further, the stacking fault density of SiC layer 20 is preferably smaller than the stacking fault density of base layer 10. Further, the point defect density of SiC layer 20 is preferably smaller than the point defect density of base layer 10.

Thus, the SiC layer in which the defect density such as the micropipe density, the threading screw dislocation density, the threading edge dislocation density, the basal plane dislocation density, the mixed dislocation density, the stacking fault density, and the point defect density is reduced as compared with the base layer 10. By disposing 20, the high-quality active layer 7 can be formed on the SiC layer 20.

In MOSFET 100, base layer 10 is made of single-crystal silicon carbide, and the half width of the X-ray rocking curve of SiC layer 20 is smaller than the half width of the X-ray rocking curve of base layer 10. Also good.

As a result, although monolithic silicon carbide having a relatively low crystallinity is used as the base layer 10 of the silicon carbide substrate 1 while being unified in a predetermined shape and size, the SiC layer 20 has high crystallinity. Single crystal silicon carbide in which a desired shape or the like is not realized can be used effectively. As a result, the manufacturing cost of the semiconductor device can be reduced.

In MOSFET 100, main surface 20A of SiC layer 20 opposite to base layer 10 in silicon carbide substrate 1 has an off angle of 50 ° to 65 ° with respect to the {0001} plane. preferable. Thus, when the active layer 7 is formed by epitaxial growth and ion implantation of impurities, the formation of interface states in the vicinity of the interface with the gate oxide film 91 serving as the channel region in the active layer 7 is suppressed, and the on-resistance of the MOSFET 100 is reduced. Can be reduced.

In MOSFET 100, in silicon carbide substrate 1, the angle formed between the off orientation of main surface 20A opposite to base layer 10 in SiC layer 20 and the <1-100> direction is 5 ° or less. Is preferred.

The <1-100> direction is a typical off orientation in the silicon carbide substrate. Then, the variation in the off orientation caused by the variation in the slice processing in the manufacturing process of the substrate is set to 5 ° or less, thereby facilitating the formation of the epitaxial growth layer (active layer 7) on the silicon carbide substrate 1. it can.

Further, in MOSFET 100, in silicon carbide substrate 1, off-angle with respect to {03-38} plane in the <1-100> direction of main surface 20A of SiC layer 20 opposite to base layer 10 is −3 °. The angle is preferably 5 ° or less. Thereby, the channel mobility in the case of manufacturing MOSFET 100 using silicon carbide substrate 1 can be further improved.

On the other hand, in MOSFET 100, in silicon carbide substrate 1, the angle formed between the off orientation of main surface 20 A opposite to base layer 10 in SiC layer 20 and the <11-20> direction is 5 ° or less. Good.

<11-20> is a typical off orientation in the silicon carbide substrate, similarly to the above <1-100> direction. Then, the variation of the off orientation caused by the variation of the slice processing in the manufacturing process of the substrate is set to ± 5 °, whereby the formation of the epitaxial growth layer (active layer 7) on the SiC layer 20 can be facilitated. .

Here, in silicon carbide substrate 1 constituting MOSFET 100, the impurity contained in base layer 10 and the impurity contained in SiC layer 20 may be different. Thereby, MOSFET 100 provided with silicon carbide substrate 1 containing an appropriate impurity according to the purpose of use can be obtained. Moreover, the impurity contained in the base layer 10 can be nitrogen or phosphorus, and the impurity contained in the SiC layer 20 can also be nitrogen or phosphorus.

Next, an example of a method for manufacturing MOSFET 100 in the first embodiment will be described with reference to FIGS. Referring to FIG. 3, in the method of manufacturing MOSFET 100 in the present embodiment, first, a silicon carbide substrate preparation step is performed as a step (S110). In this step (S110), with reference to FIG. 4, base layer 10 including a base layer 10 made of single crystal silicon carbide and SiC layer 20 made of single crystal silicon carbide and disposed on base layer 10 is included. A silicon carbide substrate 1 is prepared in which the impurity concentration of the SiC layer 20 is greater than 2 × 10 ¹⁹ cm ^{−3 and} the impurity concentration of the SiC layer 20 is greater than 5 × 10 ¹⁸ cm ^{−3 and} smaller than 2 × 10 ¹⁹ cm ^−3. . In silicon carbide substrate 1 prepared in this step (S110), single crystal is included so as to include main surface 10A on the side facing SiC layer 20 instead of base layer 10 made entirely of single crystal silicon carbide. Base layer 10 including single crystal layer 10B made of silicon carbide and other region 10C made of polycrystalline silicon carbide, amorphous silicon carbide, or silicon carbide sintered body may be employed. Instead of base layer 10 made entirely of single crystal silicon carbide, base layer 10 made entirely of polycrystalline silicon carbide, amorphous silicon carbide, or silicon carbide sintered body may be employed. A method for manufacturing silicon carbide substrate 1 will be described later.

Next, an epitaxial growth step is performed as a step (S120). In this step (S120), referring to FIG. 4, buffer layer 2 and drift layer 3 made of silicon carbide are sequentially formed on one main surface of silicon carbide substrate 1 by epitaxial growth.

Next, an ion implantation step is performed as a step (S130). In this step (S130), referring to FIGS. 4 and 5, first, ion implantation for forming well region 4 is performed. Specifically, for example, Al (aluminum) ions are implanted into drift layer 3 to form well region 4. Next, ion implantation for forming the n ⁺ region 5 is performed. More specifically, for example, P (phosphorus) ions are implanted into the well region 4 to form an n ⁺ region 5 in the well region 4. Further, ion implantation for forming the p ⁺ region 6 is performed. Specifically, for example, Al ions are implanted into the well region 4, thereby forming a p ⁺ region 6 in the well region 4. The ions can be implemented by, for example, forming a mask layer made of silicon dioxide (SiO ₂ ) on the main surface of the drift layer 3 and having an opening in a desired region where ion implantation is to be performed.

Next, an activation annealing step is performed as a step (S140). In this step (S140), for example, heat treatment is performed by heating to 1700 ° C. in an inert gas atmosphere such as argon and holding for 30 minutes. Thereby, the impurities implanted in the step (S130) are activated.

Next, an oxide film forming step is performed as a step (S150). In this step (S150), referring to FIGS. 5 and 6, for example, an oxide film (gate oxide film) 91 is formed by performing a heat treatment in an oxygen atmosphere by heating to 1300 ° C. and holding for 60 minutes. Is done.

Next, an electrode formation step is performed as a step (S160). Referring to FIG. 1, in this step (S160), first, gate electrode 93 made of polysilicon which is a conductor doped with impurities at a high concentration is formed by, for example, CVD, photolithography and etching. Thereafter, an interlayer insulating film 94 made of SiO _{2 as} an insulator is formed on the main surface 3A so as to surround the gate electrode 93 by, eg, CVD. Next, the interlayer insulating film 94 and the oxide film 91 in the region where the source electrode 92 is formed are removed by photolithography and etching. Next, for example, a nickel (Ni) film formed by vapor deposition is heated and silicided, whereby the source contact electrode 92 and the drain electrode 96 are formed. Then, for example, by vapor deposition, source wiring 95 made of Al as a conductor surrounds interlayer insulating film 94 on main surface 3A and extends to the upper surfaces of n ⁺ region 5 and source contact electrode 92. To be formed. With the above procedure, MOSFET 100 in the present embodiment is completed.

In step (S110), single crystal layer 10B made of single crystal silicon carbide is included so as to include main surface 10A on the side facing SiC layer 20, and other region 10C is polycrystalline silicon carbide, amorphous silicon carbide, or When base layer 10 made of a silicon carbide sintered body is employed, a step of removing other region 10C may be performed. Thereby, MOSFET 100 provided with base layer 10 made of single crystal silicon carbide can be obtained (see FIG. 1). On the other hand, the step of removing the region 10C may not be performed. In this case, polycrystalline silicon carbide, amorphous silicon carbide, or the main surface of MOSFET 1 shown in FIG. 1 on the opposite side of base layer 10 from SiC layer 20 (that is, as the lower layer of base layer 10 in FIG. 1), or A non-single crystal layer (corresponding to the region 10C) made of a silicon carbide sintered body is formed. This non-single crystal layer does not significantly affect the characteristics of the MOSFET 100 as long as its resistivity is low. Therefore, by adopting such a manufacturing process, the manufacturing cost of MOSFET 100 can be reduced without greatly affecting the characteristics.

At this time, the half width of the X-ray rocking curve of the SiC layer 20 may be smaller than the half width of the X-ray rocking curve of the single crystal layer 10B. As described above, the high-quality active layer 7 can be formed by disposing the SiC layer 20 having a small half width of the X-ray rocking curve, that is, high crystallinity, as compared with the single crystal layer 10B of the base layer 10. it can.

Further, the micropipe density of SiC layer 20 may be lower than the micropipe density of single crystal layer 10B. Further, the dislocation density of SiC layer 20 may be lower than the dislocation density of single crystal layer 10B. Further, the threading screw dislocation density of SiC layer 20 may be smaller than the threading screw dislocation density of single crystal layer 10B. Further, the threading edge dislocation density of SiC layer 20 may be smaller than the threading edge dislocation density of single crystal layer 10B. Further, the basal plane dislocation density of SiC layer 20 may be smaller than the basal plane dislocation density of single crystal layer 10B. Further, the mixed dislocation density of SiC layer 20 may be smaller than the mixed dislocation density of single crystal layer 10B. Further, the stacking fault density of SiC layer 20 may be smaller than the stacking fault density of single crystal layer 10B. Further, the point defect density of SiC layer 20 may be smaller than the point defect density of single crystal layer 10B.

Thus, the defect density such as micropipe density, threading screw dislocation density, threading edge dislocation density, basal plane dislocation density, mixed dislocation density, stacking fault density, point defect density, etc. is compared with the single crystal layer 10B of the base layer 10. By disposing the reduced SiC layer 20, the MOSFET 100 including the high-quality active layer 7 can be obtained.

Next, the silicon carbide substrate preparation step performed as the above step (S110) will be described. Referring to FIG. 7, in the manufacture of the silicon carbide substrate in the present embodiment, a substrate preparation step is first performed as a step (S10). In this step (S10), referring to FIG. 2, for example, base substrate 10 made of single crystal silicon carbide and SiC substrate 20 made of single crystal silicon carbide are prepared.

At this time, main surface 20A of SiC substrate 20 is the main surface of silicon carbide substrate 1 obtained by this manufacturing method, and therefore, the plane orientation of main surface 20A of SiC substrate 20 in accordance with the plane orientation of the desired main surface. Select. Here, for example, SiC substrate 20 whose main surface is a {03-38} plane is prepared. The base substrate 10 is a substrate having an impurity concentration higher than 2 × 10 ¹⁹ cm ⁻³ . Then, a substrate having an impurity concentration larger than 5 × 10 ¹⁸ cm ^{−3 and} smaller than 2 × 10 ¹⁹ cm ⁻³ is employed as the SiC substrate 20.

Next, a substrate flattening step is performed as a step (S20). This step (S20) is not an essential step, but can be performed when the flatness of the base substrate 10 or the SiC substrate 20 prepared in the step (S10) is insufficient. Specifically, for example, the main surface of base substrate 10 or SiC substrate 20 is polished.

On the other hand, the step (S20) may be performed without omitting the step (S20) and polishing the main surfaces of the base substrate 10 and the SiC substrate 20 to be in contact with each other. Thereby, the manufacturing cost of silicon carbide substrate 1 can be reduced. Further, from the viewpoint of removing the damaged layer near the surface formed by slicing or the like during the production of the base substrate 10 and the SiC substrate 20, for example, the step of removing the damaged layer by etching is replaced with the step (S20). Or after performing after the said process (S20), the process (S30) mentioned later may be implemented.

Next, as a step (S30), a stacking step is performed. In this step (S30), referring to FIG. 2, base substrate 10 and SiC substrate 20 are stacked so that their

main surfaces

10A and 20B are in contact with each other, and a laminated substrate is manufactured.

Next, a joining step is performed as a step (S40). In this step (S40), base substrate 10 and SiC substrate 20 are joined by heating the laminated substrate to a temperature range equal to or higher than the sublimation temperature of silicon carbide, for example. Thereby, referring to FIG. 2, silicon carbide substrate 1 including base layer 10 and SiC layer 20 is completed. Further, even when the step (S30) is carried out without polishing the main surfaces of the base substrate 10 and the SiC substrate 20 to be in contact with each other by heating to the sublimation temperature or higher, the step (S20) is omitted. The substrate 10 and the SiC substrate 20 can be easily joined. In this step (S40), the laminated substrate may be heated in an atmosphere obtained by reducing the atmospheric pressure. Thereby, the manufacturing cost of silicon carbide substrate 1 can be reduced.

Furthermore, the heating temperature of the multilayer substrate in the step (S40) is preferably 1800 ° C. or higher and 2500 ° C. or lower. When the heating temperature is lower than 1800 ° C., it takes a long time to join base substrate 10 and SiC substrate 20, and the manufacturing efficiency of silicon carbide substrate 1 decreases. On the other hand, when the heating temperature exceeds 2500 ° C., the surfaces of base substrate 10 and SiC substrate 20 are roughened, and there is a risk that the number of crystal defects in silicon carbide substrate 1 to be manufactured increases. In order to improve production efficiency while further suppressing generation of defects in silicon carbide substrate 1, the heating temperature of the laminated substrate in step (S40) is preferably 1900 ° C. or higher and 2100 ° C. or lower. In this step (S40), the laminated substrate may be heated under a pressure higher than 10 ⁻¹ Pa and lower than 10 ⁴ Pa. As a result, it is possible to perform the above-described bonding with a simple device, and it is possible to obtain an atmosphere for performing the bonding in a relatively short time, and the manufacturing cost of silicon carbide substrate 1 can be reduced. . Further, the atmosphere during heating in the step (S40) may be an inert gas atmosphere. And when employ | adopting an inert gas atmosphere as the said atmosphere, it is preferable that the said atmosphere is an inert gas atmosphere containing at least 1 selected from the group which consists of argon, helium, and nitrogen.

And in the manufacturing method of MOSFET 100 in the present embodiment, this silicon carbide substrate 1 is used to manufacture MOSFET 100.

(Embodiment 2)
Next, as a second embodiment, another method for manufacturing a silicon carbide substrate constituting the semiconductor device of the present invention will be described with reference to FIGS. The method for manufacturing the silicon carbide substrate in the second embodiment is basically performed in the same manner as in the first embodiment. However, the method for manufacturing the silicon carbide substrate in the second embodiment is different from that in the first embodiment in the formation process of base layer 10.

Referring to FIG. 8, in the method for manufacturing a silicon carbide substrate in the second embodiment, a substrate preparation step is first performed as a step (S10). In this step (S10), referring to FIG. 9, SiC substrate 20 is prepared in the same manner as in the first embodiment, and raw material substrate 11 made of silicon carbide is prepared. Raw material substrate 11 may be made of single crystal silicon carbide, may be made of polycrystalline silicon carbide, or may be a sintered body of silicon carbide. Moreover, it can replace with the raw material board | substrate 11, and can also employ | adopt the raw material powder which consists of silicon carbide.

Next, a proximity arrangement step is performed as a step (S50). In this step (S50), referring to FIG. 9, SiC substrate 20 and raw material substrate 11 are held by first heater 81 and second heater 82 arranged to face each other. Here, it is considered that the appropriate value of the distance between the SiC substrate 20 and the raw material substrate 11 is related to the average free path of the sublimation gas during heating in the step (S60) described later. Specifically, the average value of the distance between the SiC substrate 20 and the raw material substrate 11 can be set to be smaller than the average free path of the sublimation gas during heating in the step (S60) described later. For example, under a pressure of 1 Pa and a temperature of 2000 ° C., the mean free path of atoms and molecules strictly depends on the atomic radius and molecular radius, but is about several to several tens of centimeters. Is preferably several cm or less. More specifically, SiC substrate 20 and raw material substrate 11 are arranged close to each other with their main surfaces facing each other with an interval of 1 μm to 1 cm. Furthermore, by setting the average value of the intervals to 1 cm or less, the film thickness distribution of the base layer 10 formed in the step (S60) described later can be reduced. Furthermore, by setting the average value of the intervals to 1 mm or less, the film thickness distribution of the base layer 10 formed in the step (S60) described later can be further reduced. In addition, by setting the average value of the intervals to 1 μm or more, a space in which silicon carbide sublimates can be sufficiently secured. The sublimation gas is a gas formed by sublimation of solid silicon carbide, and includes, for example, Si, Si ₂ C, and SiC ₂ .

Next, a sublimation step is performed as a step (S60). In this step (S60), SiC substrate 20 is heated to a predetermined substrate temperature by first heater 81. Further, the raw material substrate 11 is heated to a predetermined raw material temperature by the second heater 82. At this time, SiC is sublimated from the surface of the source substrate by heating source substrate 11 to the source temperature. On the other hand, the substrate temperature is set lower than the raw material temperature. Specifically, for example, the substrate temperature is set to be about 1 ° C. or more and 100 ° C. or less lower than the raw material temperature. The substrate temperature is, for example, 1800 ° C. or higher and 2500 ° C. or lower. As a result, as shown in FIG. 10, SiC that has been sublimated from the raw material substrate 11 into a gas reaches the surface of the SiC substrate 20 and becomes a solid, thereby forming the base layer 10. By maintaining this state, as shown in FIG. 11, all the SiC constituting the raw material substrate 11 is sublimated and moves onto the surface of the SiC substrate 20. Thereby, the step (S60) is completed, and silicon carbide substrate 1 shown in FIG. 2 is completed.

(Embodiment 3)
Next, Embodiment 3 which is still another embodiment of the present invention will be described. The semiconductor device according to the third embodiment basically has the same structure as that of the first embodiment. However, the semiconductor device of the third embodiment is different from that of the first embodiment in its manufacturing method.

Specifically, in the method of manufacturing the semiconductor device (eg, MOSFET) in the third embodiment, the carbonization having a structure different from that in the first embodiment is performed in the silicon carbide substrate preparation step performed as step (S110). A silicon substrate is prepared. Referring to FIG. 12, in silicon carbide substrate 1 prepared in the third embodiment, a plurality of SiC layers 20 are arranged side by side in a plan view. That is, a plurality of SiC layers 20 are arranged side by side along main surface 10 A of base layer 10. More specifically, the plurality of SiC layers 20 are arranged in a matrix so that adjacent SiC layers 20 on base layer 10 are in contact with each other. Thereby, silicon carbide substrate 1 in the present embodiment is silicon carbide substrate 1 that can be handled as a large-diameter substrate having high-quality SiC layer 20. And by using this silicon carbide substrate 1, the manufacturing process of a semiconductor device can be made efficient. Referring to FIG. 12, end surface 20 C of adjacent SiC layer 20 is substantially perpendicular to main surface 20 A of SiC layer 20. Thereby, silicon carbide substrate 1 of the present embodiment can be easily manufactured. Here, for example, if the angle formed by the end surface 20C and the main surface 20A is 85 ° or more and 95 ° or less, the end surface 20C and the main surface 20A can be determined to be substantially perpendicular. Silicon carbide substrate 1 in the third embodiment has a plurality of SiC substrates 20 with end surface 20C substantially perpendicular to main surface 20A being formed on base substrate 10 in step (S30) in the first embodiment. A plurality of SiC substrates in which the end face 20C of the first heater 81 is substantially perpendicular to the main face 20A by arranging them side by side in a plane (see FIG. 2) or in the step (S50) in the second embodiment. By holding 20 in a state of being arranged in a plane (see FIG. 9), it can be manufactured in the same manner as in the first or second embodiment.

In the method for manufacturing the semiconductor device (MOSFET 100) in the present embodiment, this silicon carbide substrate 1 is used to manufacture MOSFET 100. Here, a plurality of MOSFETs 100 are formed in a plan view by forming active layer 7 and the like on SiC layer 20 of silicon carbide substrate 1 shown in FIG. At this time, each MOSFET 100 is fabricated so as not to cross the boundary region between adjacent SiC layers 20.

(Embodiment 4)
Next, a fourth embodiment which is still another embodiment of the present invention will be described. MOSFET 100 (semiconductor device) in the fourth embodiment has basically the same structure as MOSFET 100 in the first embodiment and has the same effects. However, MOSFET 100 of the fourth embodiment is different from that of the first embodiment in the structure of silicon carbide substrate 1.

That is, referring to FIG. 13, in SiC substrate 1 in the fourth embodiment, amorphous SiC layer 40 as an intermediate layer made of amorphous SiC is arranged between base layer 10 and SiC layer 20. ing. Base layer 10 and SiC layer 20 are connected by this amorphous SiC layer 40. Due to the presence of amorphous SiC layer 40, silicon carbide substrate 1 in which base layer 10 and SiC layer 20 having different impurity concentrations are laminated can be easily manufactured.

Next, a method for manufacturing silicon carbide substrate 1 in the fourth embodiment will be described. Referring to FIG. 14, in the method for manufacturing silicon carbide substrate 1 in the fourth embodiment, first, a substrate preparation step is performed as in step (S10) in the same manner as in the first embodiment. 20 are prepared.

Next, a Si layer forming step is performed as a step (S11). In this step (S11), a Si layer having a thickness of, for example, about 100 nm is formed on one main surface of the base substrate 10 prepared in the step (S10). The Si layer can be formed by, for example, a sputtering method.

Next, a lamination step is performed as a step (S30). In this step (S30), the SiC substrate 20 prepared in step (S10) is placed on the Si layer formed in step (S11). Thereby, a laminated substrate in which the SiC substrate 20 is laminated on the base substrate 10 with the Si layer interposed therebetween is obtained.

Next, a heating step is performed as a step (S70). In this step (S70), the laminated substrate produced in the step (S30) is heated to about 1500 ° C. in a mixed gas atmosphere of hydrogen gas and propane gas having a pressure of 1 × 10 ³ Pa, for example, for about 3 hours. Retained. Thereby, carbon is supplied to the Si layer mainly by diffusion from the base substrate 10 and the SiC substrate 20, and an amorphous SiC layer 40 is formed as shown in FIG. Thereby, silicon carbide substrate 1 in the fourth embodiment in which base layer 10 and SiC layer 20 having different impurity concentrations are connected by amorphous SiC layer 40 can be easily manufactured.

(Embodiment 5)
Next, Embodiment 5 which is still another embodiment of the present invention will be described. MOSFET 100 (semiconductor device) in the fifth embodiment has basically the same structure as MOSFET 100 in the first embodiment and has the same effects. However, MOSFET 100 of the fifth embodiment is different from that of the first embodiment in the structure of silicon carbide substrate 1.

That is, referring to FIG. 15, in silicon carbide substrate 1 in the fifth embodiment, as an intermediate layer formed by siliciding at least a part of the metal layer between base layer 10 and SiC layer 20. This is different from the first embodiment in that the ohmic contact layer 50 is formed. Base layer 10 and SiC layer 20 are connected by this ohmic contact layer 50. Due to the presence of the ohmic contact layer 50, silicon carbide substrate 1 in which base layer 10 and SiC layer 20 having different impurity concentrations are laminated can be easily manufactured.

Next, a method for manufacturing silicon carbide substrate 1 in the fifth embodiment will be described. Referring to FIG. 16, in the method for manufacturing silicon carbide substrate 1 in the fifth embodiment, first, a substrate preparation step is performed as in step (S 10) in the same manner as in the first embodiment. 20 are prepared.

Next, a metal film forming step is performed as a step (S12). In this step (S12), a metal film is formed, for example, by vapor-depositing a metal on one main surface of the base substrate 10 prepared in the step (S10). This metal film contains, for example, at least one selected from metals that form silicide when heated, for example, nickel, molybdenum, titanium, aluminum, and tungsten.

Next, a lamination step is performed as a step (S30). In this step (S30), SiC substrate 20 prepared in step (S10) is placed on the metal film formed in step (S12). Thereby, a laminated substrate in which the SiC substrate 20 is laminated on the base substrate 10 with the metal film interposed therebetween is obtained.

Next, a heating step is performed as a step (S70). In this step (S70), the laminated substrate produced in step (S30) is heated to about 1000 ° C. in an inert gas atmosphere such as argon. As a result, at least a part of the metal film (a region in contact with the base substrate 10 and a region in contact with the SiC substrate) is silicided, and an ohmic contact layer 50 in ohmic contact with the base layer 10 and the SiC layer 20 is formed. . Thereby, silicon carbide substrate 1 in the fifth embodiment in which base layer 10 and SiC layer 20 having different impurity concentrations are connected by ohmic contact layer 50 can be easily manufactured.

(Embodiment 6)
Next, Embodiment 6 which is still another embodiment of the present invention will be described. MOSFET 100 (semiconductor device) in the sixth embodiment has basically the same structure as MOSFET 100 in the first embodiment and has the same effects. However, MOSFET 100 of the sixth embodiment is different from that of the first embodiment in the structure of silicon carbide substrate 1.

That is, referring to FIG. 17, in silicon carbide substrate 1 according to the sixth embodiment, a carbon layer 60 as an intermediate layer is formed between base layer 10 and SiC layer 20, and thus the present embodiment. This is different from the case of 1. Base layer 10 and SiC layer 20 are connected by this carbon layer 60. Due to the presence of carbon layer 60, silicon carbide substrate 1 in which base layer 10 and SiC layer 20 having different impurity concentrations are laminated can be easily manufactured.

Next, a method for manufacturing silicon carbide substrate 1 in the sixth embodiment will be described. Referring to FIG. 18, first, step (S10) is performed in the same manner as in the first embodiment, and then step (S20) is performed in the same manner as in the first embodiment as necessary.

Next, an adhesive application process is implemented as process (S25). In this step (S25), referring to FIG. 19, precursor layer 61 is formed, for example, by applying a carbon adhesive on the main surface of base substrate 10. As a carbon adhesive, what consists of resin, graphite fine particles, and a solvent can be employ | adopted, for example. Here, as the resin, a resin that becomes non-graphitizable carbon when heated, such as a phenol resin, can be employed. As the solvent, for example, phenol, formaldehyde, ethanol, or the like can be used. Furthermore, the coating amount of the carbon adhesive is preferably 10 mg / cm ² or more and 40 mg / cm ² or less, and more preferably 20 mg / cm ² or more and 30 mg / cm ² or less. Further, the thickness of the carbon adhesive to be applied is preferably 100 μm or less, and more preferably 50 μm or less.

Next, as a step (S30), a stacking step is performed. In this step (S30), referring to FIG. 19, SiC substrate 20 is placed in contact with precursor layer 61 formed in contact with the main surface of base substrate 10, and the laminated substrate is Produced.

Next, as a step (S80), a pre-baking step is performed. In this step (S80), the solvent component is removed from the carbon adhesive constituting the precursor layer 61 by heating the laminated substrate. Specifically, for example, the multilayer substrate is gradually heated to a temperature range exceeding the boiling point of the solvent component while applying a load to the multilayer substrate in the thickness direction. This heating is preferably performed while the base substrate 10 and the SiC substrate 20 are pressure-bonded using a clamp or the like. Further, by performing pre-baking (heating) as much as possible, degassing from the adhesive proceeds, and the strength of bonding can be improved.

Next, a firing step is performed as a step (S90). In this step (S90), the laminated substrate heated in step (S80) and pre-baked with precursor layer 61 is heated to a high temperature, preferably 900 ° C. to 1100 ° C., for example 1000 ° C., preferably 10 minutes to 10 minutes. The precursor layer 61 is fired by being held for a period of time, for example, 1 hour. As an atmosphere at the time of firing, an inert gas atmosphere such as argon is adopted, and the pressure of the atmosphere can be set to atmospheric pressure, for example. Thereby, the precursor layer 61 becomes the carbon layer 60 made of carbon. As a result, referring to FIG. 17, silicon carbide substrate 1 in the sixth embodiment in which base substrate (base layer) 10 and SiC substrate (SiC layer) 20 are bonded by carbon layer 60 is obtained.

In the above embodiment, the vertical MOSFET has been described as an example of the semiconductor device of the present invention. However, the semiconductor device of the present invention is not limited to this, and the vertical semiconductor device in which current flows in the thickness direction of the silicon carbide substrate. Can be widely applied to.

In silicon carbide substrate 1 described above, the crystal structure of silicon carbide constituting SiC layer 20 is preferably a hexagonal system, and more preferably 4H—SiC. Base layer 10 and SiC layer 20 are preferably composed of silicon carbide single crystals having the same crystal structure (when there are a plurality of SiC layers 20, the adjacent SiC layers 20 are also adjacent to each other). Thus, by adopting the silicon carbide single crystal having the same crystal structure for base layer 10 and SiC layer 20, physical properties such as a thermal expansion coefficient are unified, and silicon carbide substrate 1 and silicon carbide substrate 1 are formed. In the manufacturing process of the semiconductor device used, warpage of silicon carbide substrate 1, separation between base layer 10 and SiC layer 20, or separation between SiC layers 20 can be suppressed.

Further, SiC layer 20 and base layer 10 (when there are a plurality of SiC layers 20, also for adjacent SiC layers 20), the angle formed by the c-axis of the silicon carbide single crystal constituting each is less than 1 °. It is preferable that the angle is less than 0.1 °. Furthermore, it is preferable that the c-plane of the silicon carbide single crystal is not rotated in the plane.

Further, the diameter of the base layer (base substrate) 10 of the silicon carbide substrate 1 used for manufacturing a semiconductor device such as the MOSFET 100 is preferably 2 inches or more, and more preferably 6 inches or more. Furthermore, the thickness of silicon carbide substrate 1 is preferably 200 μm or more and 1000 μm or less, and more preferably 300 μm or more and 700 μm or less. Further, the resistivity of SiC layer 20 is preferably 50 mΩcm or less, and more preferably 20 mΩcm or less.

Example 1
Example 1 will be described below. A calculation for estimating the effect of reducing the on-resistance in the semiconductor device of the present invention was performed. Specifically, in MOSFET100 in the first embodiment, the thickness 200 [mu] m, the base layer 10 of n-type impurity concentration 1 × ¹⁰ 20 ^{cm -3,} thickness 200 [mu] m, SiC of n-type impurity concentration 1 × ¹⁰ 19 ^{cm -3} The on-resistance was calculated on the assumption that the silicon carbide substrate 1 including the layer 20 and the main surface of the SiC layer 20 on the active layer 7 side being the {03-38} plane is employed (Example A). . On the other hand, for comparison, a conventional MOSFET in which a silicon carbide substrate having a thickness of 400 μm, an n-type impurity density of 1 × 10 ¹⁹ cm ⁻³ and a main surface on the active layer side is a {0001} plane is also used. On-resistance was calculated (Comparative Example A). Here, in Example A and Comparative Example A, the channel length was 1.0 μm, the drift layer thickness was 10 μm, and the impurity concentration was 1 × 10 ¹⁶ cm ⁻³ .

Further, the substrate resistance and the drift resistance of the drift layer, that is, the series resistance were calculated as follows. First, when the electron density is n _n0 , the hole density is p _p0 , the electron effective state density is N _c , and the hole effective state density is N _ν , the following relationship is established.

Here, in n-type 4H—SiC, the relationship shown in FIG. 20 is established between the impurity concentration (density) and the mobility. And the resistance R of a board | substrate is computable with the following formula | equation.

The total resistance (ON resistance) can be calculated from the substrate resistance thus obtained and other resistance components. The results of the above calculation are shown in Table 1.

As shown in Table 1, according to the MOSFET of Example A which is a semiconductor device of the present invention, it was confirmed that the on-resistance can be reduced by about 60% as compared with the conventional MOSFET of Comparative Example A.

(Example 2)
Next, Example 2 will be described. The calculation which estimates the reduction effect of the contact resistance of the 2nd electrode (drain electrode) and silicon carbide substrate in the semiconductor device of this invention was implemented. Here, in order to reduce the contact resistance between the electrode that is a metal and the silicon carbide substrate that is an n-type semiconductor and obtain an ohmic contact,
(1) Use a metal with a low work function Φ to lower the Schottky barrier. (2) Increase the impurity density of the semiconductor to reduce the width of the depletion layer, thereby reducing the Schottky barrier. Conceivable. However, in practice, it is not easy to adopt the measure (1), and it is effective to adopt the measure (2) to increase the tunnel current and obtain ohmic contact. Hereinafter, assuming a semiconductor device of the present invention that employs a silicon carbide substrate including a base layer having a high impurity concentration, calculation results regarding contact resistance between the electrode and the base layer will be described.

For the contact resistance _Rc , the following equation is established.

That is, the contact resistance R _c depends exponentially on Φ _bn / (N _d ^1/2 ). Then, by raising the impurity concentration (impurity concentration) N _d, it is possible to reduce the contact resistance R _c. Specifically, for example, a contact resistance (Example B) between a substrate (base layer) and an electrode having an impurity concentration of 1 × 10 ²⁰ cm ⁻³ assuming a semiconductor device of the present invention, and a conventional semiconductor device are assumed. The contact resistance (Comparative Example B) between the substrate and the electrode having an impurity concentration of 1 × 10 ¹⁸ cm ⁻³ was calculated. As the metal constituting the electrode, for example, Ni (nickel) having a work function Φ of 5.5 eV or Al (aluminum) having 4.1 eV can be employed. The calculation results are shown in Table 2.

Referring to Table 2, the contact resistance in Example C assuming the semiconductor device of the present invention is reduced by about 40% with respect to the contact resistance in Comparative Example C assuming a conventional semiconductor device. Thus, according to the semiconductor device of the present invention, the contact resistance between the substrate and the electrode (back electrode) can be greatly reduced. In general, heat treatment is often performed after electrode formation for the purpose of reducing the contact resistance. However, according to the semiconductor device of the present invention, the heat treatment may be omitted.

In the above-described embodiment, the vertical MOSFET has been described as an example of the semiconductor device of the present invention. However, the semiconductor device of the present invention is not limited to this, for example, JFET (Junction Field Effect Transistor), MESFET (Metal Semiconductor Fielder). (Effect Transistor), IGBT (Insulated Gate Bipolar Transistor), a diode, etc. may be sufficient.

It should be considered that the embodiments and examples disclosed this time are examples in all respects and are not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

The semiconductor device of the present invention can be applied particularly advantageously to a vertical semiconductor device that requires a reduction in on-resistance.

1 silicon carbide substrate, 2 buffer layer, 3 drift layer, 3A main surface, 4 well region, 5 n ⁺ region, 6 p ⁺ region, 7 active layer, 10 base layer (base substrate), 10A main surface, 10B single crystal Layer, 11 material substrate, 11A main surface, 20 SiC layer (SiC substrate), 20A, 20B main surface, 20C end surface, 40 amorphous SiC layer, 50 ohmic contact layer, 60 carbon layer, 61 precursor layer, 81 first heater , 82 Second heater, 91 oxide film (gate oxide film), 92 source contact electrode, 93 gate electrode, 94 interlayer insulating film, 95 source wiring, 96 drain electrode, 100 MOSFET.

Claims

A silicon carbide substrate (1);
An active layer (7) made of single-crystal silicon carbide and disposed on one main surface of the silicon carbide substrate (1);
A first electrode (92) disposed on the active layer (7);
A second electrode (96) formed on the other main surface of the silicon carbide substrate (1),
The silicon carbide substrate (1)
A base layer (10) made of silicon carbide;
A SiC layer (20) made of single crystal silicon carbide and disposed on the base layer (10),
The impurity concentration of the base layer (10) is greater than 2 × 10 19 cm −3 ,
The semiconductor device (100), wherein the impurity concentration of the SiC layer (20) is larger than 5 × 10 18 cm −3 and smaller than 2 × 10 19 cm −3 .
The active layer (7)
A first conductivity type drift layer (3) made of single crystal silicon carbide, disposed on the silicon carbide substrate (1);
A second conductivity type well region (4) arranged to include the first main surface (3A) opposite to the silicon carbide substrate (1) in the drift layer (3);
A first conductivity type source region (5) including the first main surface (3A) in the well region (4) and arranged to contact the first electrode (92);
An insulating film (91) made of an insulator and disposed on the first main surface (3A) in contact with the well region (4);
The semiconductor device (100) according to claim 1, further comprising a third electrode (93) disposed on the insulating film (91).
The semiconductor device (100) according to claim 2, wherein the insulating film (91) is made of silicon dioxide.
In the silicon carbide substrate (1), the main surface (20A) of the SiC layer (20) opposite to the base layer (10) has an off angle of 50 ° or more and 65 ° or less with respect to the {0001} plane. The semiconductor device (100) according to claim 2, wherein the semiconductor device (100) is formed.
The angle formed by the off orientation of the main surface (20A) opposite to the base layer (10) in the SiC layer (20) and the <1-100> direction is 5 ° or less. 5. The semiconductor device (100) according to item 4.
The main surface (20A) of the SiC layer (20) opposite to the base layer (10) has an off angle with respect to the {03-38} plane in the <1-100> direction of -3 ° to 5 °. The semiconductor device (100) according to claim 5, wherein the semiconductor device (100) is provided.
The angle between the off orientation of the main surface (20A) opposite to the base layer (10) in the SiC layer (20) and the <11-20> direction is 5 ° or less. 5. The semiconductor device (100) according to item 4.
The silicon carbide substrate (1) is further disposed between the base layer (10) and the SiC layer (20), and further includes an intermediate layer (40, 50, 60) made of a conductor or a semiconductor,
The semiconductor device (100) according to claim 1, wherein the intermediate layer (40, 50, 60) joins the base layer (10) and the SiC layer (20).
The semiconductor device (100) according to claim 8, wherein the intermediate layer (50) is made of metal.
The semiconductor device (100) according to claim 8, wherein the intermediate layer is made of carbon (60).
The semiconductor device (100) according to claim 8, wherein the intermediate layer (40) is made of amorphous silicon carbide.
The base layer (10) is made of single crystal silicon carbide,
The semiconductor device (100) according to claim 1, wherein the half width of the X-ray rocking curve of the SiC layer (20) is smaller than the half width of the X-ray rocking curve of the base layer (10). ).
The base layer (10) is made of single crystal silicon carbide,
The semiconductor device (100) according to claim 1, wherein the micropipe density of the SiC layer (20) is lower than the micropipe density of the base layer (10).
The base layer (10) is made of single crystal silicon carbide,
The semiconductor device (100) according to claim 1, wherein a dislocation density of the SiC layer (20) is lower than a dislocation density of the base layer (10).
The base layer (10) includes a single crystal layer (10B) made of single crystal silicon carbide so as to include a main surface (10A) on the side facing the SiC layer (20). The semiconductor device (100) according to item.