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WO2010151078A3 - Photopolymerizable resin composition - Google Patents

Photopolymerizable resin composition Download PDF

Info

Publication number
WO2010151078A3
WO2010151078A3 PCT/KR2010/004146 KR2010004146W WO2010151078A3 WO 2010151078 A3 WO2010151078 A3 WO 2010151078A3 KR 2010004146 W KR2010004146 W KR 2010004146W WO 2010151078 A3 WO2010151078 A3 WO 2010151078A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photopolymerizable resin
ink
color ink
film
Prior art date
Application number
PCT/KR2010/004146
Other languages
French (fr)
Other versions
WO2010151078A2 (en
WO2010151078A9 (en
Inventor
Jae Gook Han
Young Sung Suh
Kyung Keun Yoon
Original Assignee
Kolon Industries, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kolon Industries, Inc. filed Critical Kolon Industries, Inc.
Priority to CN2010800286070A priority Critical patent/CN102460300B/en
Priority to JP2012517395A priority patent/JP2012531619A/en
Publication of WO2010151078A2 publication Critical patent/WO2010151078A2/en
Publication of WO2010151078A9 publication Critical patent/WO2010151078A9/en
Publication of WO2010151078A3 publication Critical patent/WO2010151078A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

This invention relates to a photopolymerizable resin composition which exhibits appropriate optical density and adequate hydrophobicity upon formation of a film and is thus useful in preventing color mixing or position deviation of color ink upon injection of color ink through a jetting method using an ink-jet print into regions defined by barrier ribs (a light shielding film) formed using the photopolymerizable resin composition.
PCT/KR2010/004146 2009-06-26 2010-06-25 Photopolymerizable resin composition WO2010151078A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2010800286070A CN102460300B (en) 2009-06-26 2010-06-25 Photopolymerizable resin composition
JP2012517395A JP2012531619A (en) 2009-06-26 2010-06-25 Photosensitive resin composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0057378 2009-06-26
KR1020090057378A KR101368539B1 (en) 2009-06-26 2009-06-26 Photopolymerizable resin composition

Publications (3)

Publication Number Publication Date
WO2010151078A2 WO2010151078A2 (en) 2010-12-29
WO2010151078A9 WO2010151078A9 (en) 2011-03-03
WO2010151078A3 true WO2010151078A3 (en) 2011-06-03

Family

ID=43387069

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/004146 WO2010151078A2 (en) 2009-06-26 2010-06-25 Photopolymerizable resin composition

Country Status (5)

Country Link
JP (1) JP2012531619A (en)
KR (1) KR101368539B1 (en)
CN (1) CN102460300B (en)
TW (1) TW201100959A (en)
WO (1) WO2010151078A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1881948B1 (en) * 2005-02-22 2016-04-13 EVL Inc. Method for producing enhanced fertilizer
JP5771944B2 (en) * 2010-10-18 2015-09-02 Jsr株式会社 Manufacturing method of color filter
TWI472877B (en) * 2012-11-20 2015-02-11 Chi Mei Corp Photosensitive resin composition, color filter and liquid crystal display device
JP6123620B2 (en) * 2013-09-30 2017-05-10 Jsr株式会社 Radiation-sensitive resin composition, display element insulating film, method for forming the same, and display element
JP2015194583A (en) * 2014-03-31 2015-11-05 Jsr株式会社 Resin composition for forming cured film, cured film and method for forming the same, and display element
KR101872995B1 (en) * 2016-12-06 2018-07-02 (주)옵토레인 Wide-angle emission filter, optical sensor assembly having the same, pcr system having the same, and method of manufactring the same
CN110073253B (en) * 2016-12-14 2021-10-29 昭和电工株式会社 Resin composition for color filter, method for producing resin composition for color filter, and color filter
KR102036684B1 (en) * 2017-04-20 2019-10-25 삼성에스디아이 주식회사 Photosensitive resin composition, photosensitive resin layer using the same and color filter
US10921709B2 (en) 2018-02-06 2021-02-16 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same, and color filter
KR102154680B1 (en) 2018-07-02 2020-09-10 삼성에스디아이 주식회사 Curable composition including quantum dot, resin layer using the same and display device
KR102782512B1 (en) * 2019-12-10 2025-03-14 주식회사 엘지화학 Photosensitive composition for black insulator, black insulator and display device
KR20220091736A (en) * 2020-12-24 2022-07-01 롬엔드하스전자재료코리아유한회사 Fluorinated acrylate-based copolymer and photosensitive resin composition comprising same
CN113637442B (en) * 2021-08-12 2023-09-22 太仓申威新材料科技有限公司 Ultraviolet light curing transfer printing adhesive composition for microprism reflective film and preparation method and application thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030057090A (en) * 2001-12-28 2003-07-04 제일모직주식회사 Photosensitive resin composition for color filter
KR20050061224A (en) * 2003-12-18 2005-06-22 주식회사 코오롱 Photoresist composition for column spacer of liquid crystal display
KR20060096882A (en) * 2005-03-04 2006-09-13 제일모직주식회사 Photosensitive resin composition for producing high color reproduction color filter
KR20080061191A (en) * 2006-12-28 2008-07-02 제일모직주식회사 Photosensitive resin composition and color filter manufactured therefrom

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100574321B1 (en) * 1999-02-04 2006-04-26 제일모직주식회사 Photosensitive Resin Composition and Black Matrix
AU2003280695A1 (en) * 2002-11-06 2004-06-07 Asahi Glass Company, Limited Negative type photosensitive resin composition
JP2006133338A (en) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for forming light shielding film and black matrix formed of the photosensitive composition for forming light shielding film
JP4745093B2 (en) * 2006-03-17 2011-08-10 東京応化工業株式会社 Black photosensitive composition
JP4745110B2 (en) * 2006-04-19 2011-08-10 東京応化工業株式会社 Photosensitive composition and color filter formed with the photosensitive composition
JP2008298859A (en) * 2007-05-29 2008-12-11 Asahi Glass Co Ltd Photosensitive composition, partition using the same, method for manufacturing partition, method for manufacturing color filter, method for manufacturing organic EL display element, and method for manufacturing organic TFT array
JP5346509B2 (en) * 2007-07-10 2013-11-20 新日鉄住金化学株式会社 Photosensitive resin composition for forming color filter partition walls, light-shielding color filter partition walls and color filters formed using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030057090A (en) * 2001-12-28 2003-07-04 제일모직주식회사 Photosensitive resin composition for color filter
KR20050061224A (en) * 2003-12-18 2005-06-22 주식회사 코오롱 Photoresist composition for column spacer of liquid crystal display
KR20060096882A (en) * 2005-03-04 2006-09-13 제일모직주식회사 Photosensitive resin composition for producing high color reproduction color filter
KR20080061191A (en) * 2006-12-28 2008-07-02 제일모직주식회사 Photosensitive resin composition and color filter manufactured therefrom

Also Published As

Publication number Publication date
WO2010151078A2 (en) 2010-12-29
KR101368539B1 (en) 2014-02-27
CN102460300B (en) 2013-11-06
KR20110000042A (en) 2011-01-03
CN102460300A (en) 2012-05-16
TW201100959A (en) 2011-01-01
JP2012531619A (en) 2012-12-10
WO2010151078A9 (en) 2011-03-03

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