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WO2008032675A1 - Composition à base de résine photosensible colorée en noir, procédé de formation d'une matrice noire, procédé de production d'un filtre de couleur et filtre de couleur ainsi obtenu - Google Patents

Composition à base de résine photosensible colorée en noir, procédé de formation d'une matrice noire, procédé de production d'un filtre de couleur et filtre de couleur ainsi obtenu Download PDF

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Publication number
WO2008032675A1
WO2008032675A1 PCT/JP2007/067592 JP2007067592W WO2008032675A1 WO 2008032675 A1 WO2008032675 A1 WO 2008032675A1 JP 2007067592 W JP2007067592 W JP 2007067592W WO 2008032675 A1 WO2008032675 A1 WO 2008032675A1
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WO
WIPO (PCT)
Prior art keywords
black
resin composition
photosensitive resin
meth
group
Prior art date
Application number
PCT/JP2007/067592
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English (en)
Japanese (ja)
Inventor
Yukio Kamiya
Toshizumi Yoshino
Kuniaki Sato
Original Assignee
Hitachi Chemical Company, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Company, Ltd. filed Critical Hitachi Chemical Company, Ltd.
Priority to JP2008534329A priority Critical patent/JP4640505B2/ja
Publication of WO2008032675A1 publication Critical patent/WO2008032675A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C07D241/40—Benzopyrazines
    • C07D241/42—Benzopyrazines with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Definitions

  • Black photosensitive resin composition black matrix forming method, color filter manufacturing method, and color filter
  • the present invention relates to a black photosensitive resin composition, a black matrix forming method, a color filter manufacturing method, and a color filter.
  • color filters have been used in liquid crystal display devices, sensors, color separation devices, and the like. These color filters shield the boundaries of each color pixel with a black matrix in order to improve contrast and prevent color purity degradation.
  • a black matrix is formed by depositing a metal film of chromium, nickel, aluminum or the like on a glass substrate by vacuum film formation such as vapor deposition or sputtering, and then forming the metal film in a matrix form by photolithography technology. It is formed by applying a pattern. Specifically, a photosensitive resist is applied onto the metal film, irradiated with ultraviolet rays through a photomask, a non-exposed portion is removed to form a resist pattern, and a pattern is formed on the metal film by etching treatment. The black matrix is formed by peeling the resist.
  • Patent Document 1 Japanese Patent Laid-Open No. 6-1938
  • the present invention provides a black photosensitive resin composition, a black matrix forming method using the same, a color filter manufacturing method, and a color filter that sufficiently satisfy the optical density and electric resistance value and have a sufficiently high resolution. Objective.
  • the present invention comprises a binder polymer, a photopolymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, and a black pigment
  • the binder polymer has the following general formula:
  • a black photosensitive resin composition comprising an acrylic resin having the repeating units represented by (1), (II) and (III).
  • R 2 , R 4 and R 5 each independently represent a hydrogen atom or a methyl group
  • R 3 represents a monovalent group having a dicyclo ring or a tricyclo ring represented by the following formula ⁇ , ( ⁇ ) or (iii).
  • X 1 represents a single bond, an alkylene group having 1 to 10 carbon atoms, or an oxyalkylene group having 1 to 10 carbon atoms
  • Y represents a single bond or a divalent organic group.
  • the black photosensitive resin composition of the present invention comprises the above-described configuration
  • optical density and the electrical resistance value are sufficiently satisfied, and the resolution S is sufficiently high.
  • the inventors have By including an acrylic resin having a group, the black photosensitive resin composition of the present invention has high photosensitivity and excellent alkali developability, and can reduce the occurrence of burrs during development and sufficiently improve resolution. I guess.
  • the black pigment preferably contains titanium black.
  • the black matrix formed from such a black photosensitive resin composition can further increase the optical density and electric resistance, and has excellent light shielding properties.
  • the acrylic resin is an acrylic resin having the repeating units represented by the general formulas (1), (II) and (III) and the repeating units represented by the following general formula (IV): I like it.
  • R 6 represents a hydrogen atom or a methyl group
  • X 2 represents a single bond or a divalent organic group
  • Z has a hydroxyl group or a substituent! /, Carbon number;!
  • To 10 represents an alkyl group
  • h represents an integer of 0 to 5.
  • the plurality of Z may be the same or different from each other.
  • Z represents a hydrogen atom or a monovalent organic group.
  • Y is preferably a divalent group represented by the following general formula (vi).
  • n and n each independently represent an integer of 1 to 20.
  • the present invention provides a black matrix forming photosensitive solution comprising the above black photosensitive resin composition.
  • a sensitizing solution is excellent in handleability and can be used with the force S to form a black matrix.
  • the present invention also provides a black matrix forming method in which a photosensitive layer made of the above-described black photosensitive resin composition is irradiated with actinic rays and then a part of the photosensitive layer is removed to form a black matrix. provide.
  • the present invention provides a color filter manufacturing method including a step of forming a black matrix by the black matrix forming method and a color filter obtained by the manufacturing method.
  • a black photosensitive resin composition having a sufficiently high optical density and electrical resistance value as a black matrix and having a sufficiently high resolution, a method for forming black bear tritus using the same, and a color Providing filter manufacturing methods and color filters.
  • FIG. 1 is an SEM photograph comparing the shapes of pattern edges in a black matrix.
  • (meth) atalylate in the present specification means “atalylate” and its corresponding “metatalylate”.
  • (meth) acryl means “acryl” and its corresponding “methacryl”, and “(meth) atalyloyl” means “atallyroyl” and its corresponding “methacryloyl”.
  • the black photosensitive resin composition of the present invention contains a binder polymer, a photopolymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, and a black pigment.
  • the binder polymer includes an acrylic resin having a repeating unit represented by the general formulas (1), (II) and (III). .
  • R 1 represents a hydrogen atom or a methyl group.
  • R 2 represents a hydrogen atom or a methyl group
  • R 3 represents a dicyclo ring represented by the above formula (i), (ii) or (iii)
  • X 1 represents a single bond, a carbon number;! -10 alkylene group or a C 1-10 oxyalkylene group, a C 1-5 alkylene group or a C 1-5 oxyalkylene group. It is preferable to show.
  • R 4 and R 5 each independently represents a hydrogen atom or a methyl group.
  • Y represents a single bond or a divalent organic group, and is an oxyalkylene group having 1 to 10 carbon atoms, preferably S. When the number of carbon atoms is 2 or more, an oxygen atom between main chain carbon atoms and / Or it may have a urethane bond and may be substituted with a hydroxyl group. From the viewpoint of further improving the resolution, Y is more preferably a divalent group represented by the general formula (iv). In the formula (iv), m and n each independently represent an integer of 1 to 20, preferably!
  • the method of synthesizing the acrylic resin having the repeating units represented by the general formulas (I), (II), and (III) is not particularly limited.
  • the acrylic resin is obtained by the methods A, B, or C shown below. be able to.
  • a (meth) acrylic compound (hereinafter referred to as “monomer a” and! /, U) for forming the repeating unit represented by the general formula (I), and the repeating unit represented by the general formula (II) (Meth) aryl compounds (hereinafter referred to as “monomer b” and! /, U) and di (meth) acrylic compounds (hereinafter referred to as “monomer c”) for forming the repeating unit represented by the general formula (III) And! /, U) are copolymerized.
  • the main monomer skeleton is constructed by copolymerizing the monomer a, the monomer b, and a (meth) acrylic compound having a hydroxyl group represented by the following general formula (V) (hereinafter referred to as “monomer d”).
  • the (meth) acrylic compound hereinafter referred to as “monomer e” and! /, U
  • V hydroxyl group represented by the following general formula (V)
  • V hydroxyl group represented by the following general formula (V)
  • (meth) acrylic compound hereinafter referred to as “monomer e” and! /, U) having an isocyanate group represented by the following general formula (VI) in the same number of moles as the monomer d and the hydroxyl radical of the polymer main skeleton
  • the group is reacted with each other to form a repeating unit represented by the above general formula (III).
  • R 4 represents a hydrogen atom or a methyl group
  • L 1 represents a linear alkylene group having 1 to 8 carbon atoms or an alicyclic alkylene group.
  • R 5 represents a hydrogen atom or a methyl group
  • L 2 represents a linear alkylene group having 1 to 8 carbon atoms or an alicyclic alkylene group.
  • the main monomer skeleton is constructed by copolymerizing the monomer a, the monomer b, and the (meth) acrylic compound (hereinafter referred to as “monomer f”) having an epoxy group represented by the following general formula (VII). Next, the monomer f is reacted with the same number of moles of (meth) acrylic acid and the epoxy group of the polymer main skeleton to form the repeating unit represented by the general formula (III).
  • R 4 represents a hydrogen atom or a methyl group
  • L 3 represents a linear alkylene group having 1 to 8 carbon atoms or an alicyclic alkylene group.
  • Examples of the monomer a include (meth) acrylic acid.
  • the content ratio of the monomer a is 5 to 50% by mass based on the total amount of monomers used in the synthesis of the acrylic resin having repeating units represented by the general formulas (I), ( ⁇ ) and (III). it forces Ri preferably is preferably fixture 10 to 45 wt%, more preferably 10 to 30 mass 0/0. If the monomer a content is less than 5% by mass, the alkali developability deteriorates and it becomes difficult to obtain a fine pixel pattern. When the monomer a content exceeds 50% by mass, the viscosity of the black photosensitive resin composition becomes high and handling becomes difficult, and the black matrix becomes exfoliated during alkali development.
  • Examples of the monomer b include (meth) acrylic acid esters having a dicyclo ring or a tricyclo ring represented by the above formula (i), (ii) or (iii). This monomer may have either a dicyclo ring or a tricyclo ring, or both.
  • di Shikuropenteyuru (meth) Atari rate, dicyclopentenyl O key Chez chill (meth) Atarire over preparative has a tricyclo [5 ⁇ 2 1.0 2 '6] decyl group (meth) acrylic
  • Examples include acid esters.
  • the content ratio of the monomer b is 3 to 70 masses based on the total amount of monomers used in the synthesis of the acrylic resin having the repeating units represented by the general formulas (I), (II), and (III). It is more preferable that it is 5-60 mass%, and it is still more preferable that it is 40-60 mass%.
  • the content ratio of the monomer b is less than 3% by mass, the transparency of the binder polymer is lowered and the photosensitivity tends to be lowered.
  • the monomer b content exceeds 70% by mass the black photosensitive resin composition becomes too viscous and difficult to handle.
  • Examples of the monomer c include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, polyethylene glycol.
  • Examples include di (meth) acrylate compounds such as di (meth) acrylate.
  • the monomer d used in Method B is not particularly limited as long as it is a (meth) acrylic compound having a hydroxyl group, and examples thereof include 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl ( Mention of (meth) acrylate, 4-hydroxybutyl (meth) acrylate.
  • the monomer e is not particularly limited as long as it is a (meth) acrylic compound having an isocyanate group.
  • 2-isocyanatoethyl (meth) acrylate is cited as a force S.
  • the monomer f used in Method C is not particularly limited as long as it is a (meth) acryl compound having an epoxy group, and examples thereof include glycidyl (meth) acrylate.
  • the content ratio of monomer c, monomer d and / or monomer f is 5 based on the total amount of monomers used in the synthesis of the acrylic resin having repeating units represented by the general formulas (1), (II) and (III). It is more preferably 10 to 45% by mass, and even more preferably 10 to 30% by mass. If it is less than 5% by mass, the pattern formation time is delayed, and it is difficult to achieve the effects of the present invention.
  • the solubility of the acrylic resin having the repeating units represented by (II) and (III) tends to decrease.
  • the content ratio of the monomer e is preferably 0.8 ⁇ 1 to 1 mol with respect to the monomer dl mol.
  • the binder polymer comprises a repeating unit represented by the above general formulas (I), (II) and (I II) and a repeating unit represented by the above general formula (IV). Having les, preferably containing acrylic resin.
  • the method for synthesizing the acrylic resin having the repeating units represented by the general formulas (I), (II), (III) and (IV) is not particularly limited, but the repeating method represented by the general formula (IV) is used. It is obtained by further copolymerizing a (meth) acrylic compound (hereinafter referred to as “monomer g” and! /, U) for forming units.
  • the synthesis method can be performed according to the above methods A, B and C.
  • Examples of the monomer g include benzyl (meth) acrylate, nourphenoxypolyethylene. Glycol (meth) acrylate, a- (meth) attaroyl- ⁇ -tolyloxypolyoxyethylene, 2-tert-butyl-6- (3-tert-butyl-2-hydroxy-5-methylbenzyl) -4 methylphenyl attalylate, 2 — Tert-butyl-6- [1 (3-tert-butyl-2-hydroxy-5-methylphenol) ethyl-4-methylphenyl acrylate. These monomers can be used alone or in combination of two or more.
  • the content ratio of the monomer (g) is 5 to 50% by mass based on the total amount of monomer components used in the synthesis of the acrylic resin having repeating units represented by the general formulas (1), (II) and (III). 10 to 45% by mass is more preferable, and 10 to 30% by mass is even more preferable. If the monomer g content is less than 5% by mass, the resolution of the black matrix to be formed tends to be low. When the content ratio of the monomer g exceeds 50% by mass, the adhesion of the black matrix to be formed tends to decrease.
  • the acrylic resin having the repeating unit represented by the general formulas (1), (II) and (III) is, as necessary, the monomers a, b, c, d, f or g described above.
  • other (meth) acrylic compounds may be copolymerized as monomer components.
  • examples of other (meth) acrylic compounds include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, 2-ethylhexyl (meth) acrylate.
  • (meth) acrylic acid alkyl esters such as (meth) acrylic acid cyclohexyl or (meth) acrylic acid cycloalkyl esters.
  • the acrylic resin having a repeating unit represented by the general formulas (1), (II) and (III) may contain other carboxyl groups as needed in addition to the (meth) acrylic acid. It is possible to copolymerize a polymerizable compound as a monomer component. Examples of such polymerizable compounds include itaconic acid, maleic acid, fumaric acid, crotonic acid, citraconic acid, mesaconic acid, and ⁇ -chloroacrylic acid.
  • the acrylic resin having the repeating units represented by the general formulas (1), (II) and (III) is a random copolymer, block copolymer or alternating copolymer of the respective repeating units. ! /, Even if it ’s a deviation! /.
  • the weight average of the acrylic resin having repeating units represented by the general formulas (I), (II) and (III) Uniform molecule! (Between 3000 and 200,000 preferred ⁇ , 3000 and above; more preferred than 100000 ⁇ , 5000—50,000 more preferred ⁇ , 10,000 to 40,000 and especially preferred! /, With a weight average molecular weight of less than 3000, Alkali resistance tends to decrease, and when the weight average molecular weight exceeds 200,000, the viscosity of the black photosensitive resin composition increases, so that the coating property particularly when spin-coating the black photosensitive resin composition decreases. Tend.
  • the weight average molecular weight in the present specification is determined by gel permeation chromatography (GPC) analysis according to the following conditions and is converted using a standard polystyrene calibration curve.
  • the binder polymer may be other acrylic resin, styrene resin, epoxy resin, polyamide resin, amide epoxy resin, alkyd resin, phenol resin, epoxy (meth) acrylate resin, etc.
  • One or more resins can be included.
  • the content ratio of the acrylic resin having the repeating units represented by the general formulas (I), (II), and (III) includes a binder polymer, a photopolymerizable compound having an ethylenically unsaturated bond, and a photopolymerization.
  • the amount is preferably 5 to 50% by weight, more preferably 10 to 30% by weight, even more preferably 10 to 20% by weight, based on the total amount of the initiator and the black pigment.
  • the content ratio of the acrylic resin having the repeating units represented by the general formulas (I), (II) and (III) is less than the mass%, the black matrix formed at the time of development is easily peeled off.
  • Examples of the photopolymerizable compound having an ethylenically unsaturated bond include methyl (meth) acrylate, benzyl (meth) acrylate, butoxychetyl (meth) acrylate, butoxytriethylene glycol (meth) acrylate, ester Picrohydrin (hereinafter referred to as “ECH”) Modified butyl (meth) acrylate, dicyclopentanyl (meth) acrylate, ethylene oxide (hereinafter referred to as “EO”) Modified dicyclopentyl ( (Meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, ethyl diethylene glycol (meth) acrylate, 2-ethyl hexyl (meth) acrylate, glycerol (meth) acrylate, heptadecuff mouth decyl (Meth) Atarylate, 2-Hydroxyethyl (ECH”)
  • the content of the photopolymerizable compound having an ethylenically unsaturated bond depends on the binder polymer. First, it is preferably 2 to 15% by mass based on the total amount of the photopolymerizable compound having an ethylenically unsaturated bond, the photopolymerization initiator and the black pigment. 5 to 10% by mass More preferred is 5 to 8% by mass.
  • the mass ratio of the binder polymer to the photopolymerizable compound having an ethylenically unsaturated bond (hereinafter sometimes referred to as "polymer / monomer ratio”) is 2. It is preferably ⁇ 5, more preferably 2.5 to 3.5, and even more preferably 2.8 to 3.4.
  • Examples of the photopolymerization initiator include benzophenone, 4,4 'bis (jetylamino) benzophenone, N, N'-tetraethynole 4,4'-diaminobenzophenone, 4-methoxy 4'-dimethylaminobenzophenone, benzyl , 2, 2-diethoxyacetophenone, benzoin, benzoin methinoleethenole, benzoin isop, chinoreethenole, benzinoresimethinoleketal, ⁇ -hydroxyisobutylphenone, 2 benzilux 2 dimethylamino 4 'morphol Nobtylophenone, thixanthone, 2-chlorodioxanthone, 1-hydroxycyclohexylphenylketone, 2-methyl-1 [4 (methylthio) phenyl] 2-monorephorino 1 propanone, t-butylanthraquinone,
  • the content of the photopolymerization initiator is 2 to 30% by mass based on the total amount of the binder polymer, the photopolymerizable compound having an ethylenically unsaturated bond, the photopolymerization initiator, and the black pigment. Is more preferably 5 to 15% by mass, and more preferably 5 to 10% by mass.
  • the content of the photopolymerization initiator is less than 2% by mass, the photosensitivity of the black photosensitive resin composition tends to be low, and when it exceeds 30% by mass, the strength of the black photosensitive resin composition is increased. Tend to decrease.
  • the black pigment either an inorganic pigment or an organic pigment may be used alone, or a mixture of two or more pigments may be used.
  • an inorganic pigment for example, carbon examples thereof include black, graphite, iron black, titanium carbon, titanium black, diacid-valent manganese, and copper chromium manganese oxide. From the viewpoint of improving coloring power, carbon black or titanium black is preferable. Furthermore, titanium black is more preferable from the viewpoint of increasing the optical density and the electrical resistance value. Also, carbon black or titanium plaque whose surface is coated with resin or the like can be used.
  • the content ratio of the black pigment is preferably 20 to 80% by mass based on the total amount of the binder polymer, the photopolymerizable compound having an ethylenically unsaturated bond, the photopolymerization initiator, and the black pigment. More preferably, it is 30 to 70% by mass, and further preferably 50 to 70% by mass.
  • the black pigment content is less than 20% by mass, the optical density tends to be low, and when it exceeds 80% by mass, the photosensitivity tends to decrease.
  • the type and content of the black pigment are preferably adjusted so that the optical density of the black matrix is 2-5. Furthermore, it is more preferable that the optical density is adjusted to 3 to 5 from the viewpoint of light shielding properties.
  • the optical density of the black matrix is less than 2, the light-shielding property tends to be lowered.
  • the optical density exceeds 5, the developability and adhesion of the black photosensitive resin composition are lowered, and the black matrix formed during development is easily peeled off.
  • the optical density can be measured, for example, with a densitometer “PDA-65” (trade name, manufactured by Koni Riki Co., Ltd.).
  • the black photosensitive resin composition preferably contains an organic solvent.
  • the organic solvent include ketone compounds, alkylene glycol ether compounds, alcohol compounds, and aromatic compounds.
  • the ketone compound include acetone, methyl ethyl ketone, and cyclohexanone.
  • alkylene glycol ether compounds include methinoreserosonoleb, ethinorecellosonoleb, butinorecellosonoleb, methinorecellosonolebacetomonopropinoreethenole, ethyleneglycolenohexenoreethenore, ethyleneglycol Nore Dimethinoreatenore, Diethylene Glyconore Ethinoreateore, Diethylene Glyconolege Chinoreatere, Propylene Glycole Monomethinorete Nore, Propylene Glyconore Monoe Chinoreetenore, Propylene Glyconore Monopropinorete Nore Noreite Nore, Propylene Glycol Nole Monomethinoleate Nole Acetate, Diethylene Glycol Cornole methinoate etherate acetate, diethylene glycolate ethinoreate ester acetate, diethylene glycolenopropenoateateateate
  • Examples of the alcohol compound include methyl alcohol, ethino-leanolone, isopropyl alcohol, n-butyl alcohol, 3-methyl-3-methoxybutanol and the like.
  • Aromatic compounds include benzene, toluene, and xylene.
  • Other examples include organic solvents such as 3-methyl-3-methoxybutyl acetate, ethyl acetate, tetrahydrofuran, and dioxane, such as N-methyl-2-pyrrolidone and N-hydroxymethyl-12-pyrrolidone. These organic solvents can be used alone or in combination of two or more.
  • the organic solvent is preferably used so that the total solid content in the black photosensitive resin composition according to the present invention is 5 to 50% by mass.
  • the total solid content exceeds 50% by mass, the viscosity tends to increase and the coating property tends to deteriorate. If the total solid content is less than 5% by mass, the viscosity tends to be low and the applicability tends to be poor.
  • the black photosensitive resin composition of the present invention comprises a thermal polymerization inhibitor (hydroquinone, hydroquinone monomethyl ether, pyrogallol, t-butylcatechol, etc.) for suppressing wrinkle reaction.
  • a thermal polymerization inhibitor hydroquinone, hydroquinone monomethyl ether, pyrogallol, t-butylcatechol, etc.
  • Titanate coupling agents for improving adhesion to the substrate silane coupling agents having a bur group, epoxy group, amino group, mercapto group, etc., isopropyl trimethacryloyl titanate, diisopropyl isostearoyl 4-a Minobenzoyl titanate
  • surfactants for improving film smoothness fluorine-based, silicon-based, hydrocarbon-based, etc.
  • various additives such as UV absorbers or antioxidants should be used as appropriate. Can do.
  • the black photosensitive resin composition can be prepared by a dispersion process in which a binder polymer, a photopolymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, and a black pigment are mixed / dispersed in an organic solvent. It can.
  • Examples of the dispersion method include known methods using a dispersion / kneading apparatus such as an ultrasonic disperser, three rolls, a ball mill, a sand mill, a bead minole, a homogenizer, and a kneader.
  • the dispersing step first, it is preferable that the binder polymer, the black pigment and the organic solvent are mixed / dispersed using the above-mentioned apparatus to uniformly disperse the black pigment in the binder polymer solution.
  • the photopolymerizable compound having an ethylenically unsaturated bond and the photopolymerization initiator may be added together with the non-polymer or after the black pigment is dispersed. Good.
  • the entire amount of the binder polymer may be mixed with the black pigment, or a part of the binder polymer may be mixed with the black pigment and the rest may be added after the black pigment is dispersed.
  • the amount of the binder polymer added when dispersing the black pigment is preferably 20 parts by mass or more with respect to 100 parts by mass of the black pigment. When the added amount of the binder polymer is less than 20 parts by mass, the dispersion stability of the black pigment tends to be lowered.
  • the organic solvent may be added in its entirety when the black pigment is dispersed. A part of the organic solvent may be added when the black pigment is dispersed, and the rest may be added after the black pigment is dispersed.
  • the addition ratio of the organic solvent added at the time of dispersing the black pigment is preferably at least 100 parts by mass with respect to 100 parts by mass of the black pigment and the binder polymer at the time of dispersion. When the addition ratio of the organic solvent is less than 100 parts by mass, the viscosity at the time of dispersion becomes high. Therefore, particularly when dispersing with a ball mill, sand mill, or bead mill, it is difficult to disperse the black pigment.
  • a dispersant When dispersing the black pigment, a dispersant may be added! /.
  • the dispersant include an anionic pigment dispersing agent such as a polycarboxylic acid type polymer activator and a polysulfone type polymer activator; a pigment dispersing agent such as a polyoxyethylene polypropylene block polymer; an anthraquinone type, perylene type, Organic pigment derivatives having a functional group such as a carboxyl group, a sulfo group, a sulfonate group, a carboxylic acid amide group, a sulfonic acid amide group, and a hydroxyl group can be added to phthalocyanine-based and quinacridone-based organic pigments. This improves the dispersibility and dispersion stability of the black pigment.
  • the addition ratio of the dispersant is preferably 50 parts by mass or less with respect to 100 parts by mass of the black pigment.
  • a photosensitive layer made of the above-mentioned black photosensitive resin composition is irradiated with actinic rays, and then a part of the photosensitive layer is removed to obtain a black matrix.
  • this black matrix forming method includes a lamination step of laminating a photosensitive layer made of a black photosensitive resin composition on a substrate, and an actinic ray on a predetermined portion of the laminated photosensitive layer. It is preferable to include an exposure step of irradiating and a development step of developing the photosensitive layer irradiated with actinic rays to form a black matrix.
  • the photosensitive layer is formed by coating or printing the black photosensitive resin composition directly on the substrate.
  • the black photosensitive resin composition is once applied or printed on another support to form a photosensitive layer, and then the photosensitive layer is transferred onto the substrate, and the photosensitive layer is laminated on the substrate.
  • the black photosensitive resin composition When the black photosensitive resin composition has fluidity, the black photosensitive resin composition can be used as it is to form the photosensitive layer. However, from the viewpoint of handleability, it is preferable to add an organic solvent to the black photosensitive resin composition to lower the viscosity and use it as a photosensitive solution. In this case, even when the black photosensitive resin composition contains an organic solvent, it can be used after further adding an organic solvent to adjust to a predetermined viscosity. As the organic solvent to be added, the same organic solvents as described above can be used.
  • Examples of methods for applying the black photosensitive resin composition include a doctor blade coating method, a die coating method, a roll coating method, a comma coating method, a spin coating method, a spray coating method, a whaler coating method, Examples include dip coating, curtain-coating, wire bar coating, gravure coating, and air knife coating.
  • the black photosensitive resin composition contains an organic solvent, the organic solvent can be removed by heating, for example.
  • the preferred heating time is 50 to 130 ° C, and the preferred heating time is 1 to 30 minutes.
  • the photosensitive layer can also be formed by printing methods such as clean printing and inkjet printing.
  • a method of laminating the photosensitive layer on the substrate after forming the photosensitive layer on the support a method of laminating by laminating the surface of the photosensitive layer on the substrate and press-bonding the photosensitive layer to the substrate while heating. Is mentioned. Further, from the viewpoint of improving adhesion and followability, it is preferable to laminate the layers under reduced pressure.
  • the support is preferably peeled off after the photosensitive layer is transferred to the substrate.
  • the thickness of the photosensitive layer can be appropriately set depending on the application, and is, for example, a force S of preferably 0. m, and more preferably a force S of 0.2 to 5 mm. If the thickness of the photosensitive layer is less than 0.1 l ⁇ m, it tends to be difficult to apply the desired thickness. On the other hand, if it exceeds lO ⁇ m, the adhesion and resolution of the black matrix tend to decrease. There is.
  • a polyethylene film, a polypropylene film, an acrylic resin film, or a polyester film can be used as the support.
  • the substrate is appropriately selected depending on the application, for example, a transparent glass plate such as white plate glass, blue plate glass, silica-coated blue plate glass; a sheet made of a synthetic resin such as polyester resin, polycarbonate resin, acrylic resin, chlorinated resin, film Or a metal plate such as an aluminum plate, a copper plate, a nickel plate, or a stainless steel plate; other ceramic plate; a semiconductor substrate having a photoelectric conversion element.
  • a transparent glass plate such as white plate glass, blue plate glass, silica-coated blue plate glass
  • a sheet made of a synthetic resin such as polyester resin, polycarbonate resin, acrylic resin, chlorinated resin, film
  • a metal plate such as an aluminum plate, a copper plate, a nickel plate, or a stainless steel plate
  • other ceramic plate other ceramic plate
  • a semiconductor substrate having a photoelectric conversion element for example, a transparent glass plate such as white plate glass, blue plate glass, silica-coated blue plate glass
  • a sheet made of a synthetic resin such
  • a predetermined portion of the photosensitive layer on the substrate is irradiated with actinic rays, and the irradiated portion is hardened to form an exposed portion.
  • the method of irradiating the predetermined portion with the actinic ray include a method of irradiating the actinic ray in an image form through a negative or positive mask pattern called an art cake and photocuring the exposed portion.
  • the photosensitive layer is irradiated with actinic rays.
  • actinic rays can be irradiated from above.
  • the light source of actinic rays conventionally known light sources such as carbon arc lamps, mercury vapor Arc lamps, ultra high pressure mercury lamps, high pressure mercury lamps, xenon lamps, metal halide lamps, fluorescent lamps, tungsten lamps, and visible light lasers are used.
  • a predetermined portion of the photosensitive layer is irradiated with actinic rays by a direct drawing exposure method such as a laser direct drawing exposure method and a DLP exposure method, thereby exposing the exposed portion. It can be photocured.
  • unexposed portions of the photosensitive layer are removed by the force of spraying the developer directly on the photosensitive layer, or by immersing the photosensitive layer in the developer.
  • an alkaline aqueous solution an aqueous developer and an organic solvent can be used.
  • aqueous alkaline solutions are particularly preferred because they are safe and stable and have good operability.
  • Examples of the base in the developer of the alkaline aqueous solution include alkali hydroxides such as lithium, sodium, or potassium hydroxide; carbonates such as lithium, sodium, potassium, or ammonium carbonate or bicarbonate.
  • alkali hydroxides such as lithium, sodium, or potassium hydroxide
  • carbonates such as lithium, sodium, potassium, or ammonium carbonate or bicarbonate.
  • Alkali alkali metal phosphates such as potassium phosphate and sodium phosphate
  • alkali metal pyrophosphates such as sodium pyrophosphate and potassium pyrophosphate.
  • the pH of the alkaline aqueous solution is preferably in the range of 9 to 11; the temperature can be adjusted according to the developability of the photosensitive layer.
  • a surfactant, an antifoaming agent, a small amount of an organic solvent for accelerating development, and the like may be added.
  • Examples of the aqueous developer include those composed of water or an alkaline aqueous solution and one or more organic solvents.
  • the base of the alkaline aqueous solution in addition to the above-mentioned bases, for example, borax sodium metasilicate, tetramethylammonium hydroxide, ethanolamine, ethylenediamine, diethylenetriamine, 2-amino-2-hydroxy
  • examples include methyl-1,3-propanediol, 1,3-diaminopropanol-2, and morpholine.
  • organic solvent examples include triacetone alcohol, acetone, ethyl acetate, alkoxyethanol having an alkoxy group having 1 to 4 carbon atoms, ethyl alcohol, isopropyl alcohol, butyl alcohol, diethylene glycol monomethyl ether, diethylene glycol mono And ethyl ether and diethylene glycol monobutyl ether. These are used singly or in combination of two or more.
  • the temperature of the aqueous developer is preferably 2 to 90% by mass of the organic solvent, and the temperature can be adjusted according to the developability of the photosensitive layer.
  • the pH of the aqueous developer is as low as possible, as long as black matrix development is possible.
  • the pH of the aqueous developer is preferably from pH 8 to 12; preferably from pH 9 to 10; Further, a small amount of a surfactant, an antifoaming agent or the like may be added to the aqueous developer.
  • Examples of the organic solvent-based developer include 1,1,1,1-trichloroethane, N-methylolpyrrolidone, N, N-dimethylformamide, cyclohexanone, methyl isobutyl ketone, ⁇ -butyrolatatone, and the like. It is done.
  • organic solvents it is preferable to add water in the range of 1-20% by mass to prevent ignition!
  • the heating temperature is preferably 60 to 280 ° C, and the heating time is preferably 1 to 60 minutes.
  • the manufacturing method of the color filter of the present invention includes a step of forming a black matrix by the above-described black matrix forming method.
  • the color filter may be manufactured by a method similar to a known method except that the step of forming the black matrix is the above-described step.
  • the color filter according to the present invention is obtained.
  • Such a color filter can sufficiently improve the contrast because the black matrix has a high light shielding property.
  • Solution a Into a 1 L four-necked flask, 210 g of propylene glycol monomethyl ether acetate was added, and the temperature of the solution was kept at 120 ° C. while publishing nitrogen to obtain Solution a. Next, 170 g of dicyclopentanyl acrylate, 50 g of 2-hydroxyethyl methacrylate and 30 g of methacrylic acid are placed in a 1 L beaker, dissolved while publishing nitrogen, and after dissolution, 2, 2'-azobisisobutyrate is dissolved. 3 g of ronitrile was added to make solution b. Next, the solution b was added dropwise to the solution a maintained at 120 ° C. over 2 hours, and after completion of the addition, the reaction was performed at 120 ° C. for 2 hours.
  • Bisphenol F / cresol nopolac copolymer type epoxy resin product name “YDPF-1000”, manufactured by Tohto Kasei Co., Ltd.
  • 280g acrylic acid 55g, methylhydride quinone 0.5g and carbitol acetate 120 g was mixed and stirred at 90 ° C. to dissolve the mixture.
  • the solution of the above mixture was cooled to 60 ° C., triphenylphosphine lg was added, and the reaction was performed at 100 ° C. until the acid value became 1 mgKOH / g.
  • the ⁇ polymer / monomer ratio is a value obtained by dividing the solid content in the acrylic resin as the binder polymer by the blending amount of the photopolymerizable compound as the monomer.
  • the black photosensitive resin compositions obtained in the examples and comparative examples were each spin-coated on a glass substrate (trade name “1737” manufactured by Cowing Co., Ltd.) and dried at 90 ° C. for 3 minutes to obtain a film thickness of 1 A 25 m photosensitive layer was formed.
  • the photosensitive layer was exposed to 100 mj / cm 2 with an ultra high pressure mercury lamp through a photomask having a predetermined pattern.
  • a black matrix was formed in the same manner as above except that a comb copper wiring board for HAST test was used instead of the glass substrate.
  • an insulation resistance measuring device (trade name “TR8601” manufactured by Advantest Corporation) was used to apply a voltage of 10 V, and the electric resistance ( ⁇ ) of the formed black matrix was measured.
  • a quartz negative mask having a pattern with a total line width and space width of 100 m was used as a resolution evaluation negative, and the same operation as “(3) Formation of black matrix” was performed to form a black matrix.
  • the black matrix formed by the development after exposure the smallest value (unit: m) of the line width (pattern width) in the portion where the unexposed portion was removed cleanly was used as an index of resolution.
  • the evaluation of resolution is better as the numerical value is smaller.
  • the pattern edge portion of the formed black matrix was observed with a scanning electron microscope (SEM), and the appearance degree of the nose was evaluated in 1 to 5 stages.
  • the degree of appearance of the burrs was evaluated by the width of burrs grown from the pattern edge to the pattern periphery.
  • the evaluation when the occurrence of glue is observed and the width of the burr is less than 1/3 times that shown in the evaluation “1” in FIG. 1, the evaluation is “4”, more than 1/3 times and less than 2/3 times.
  • the rating is “3”, and the rating is “2” when it is 2/3 times or more and less than 1 time.
  • the photosensitive layer was exposed to lOOmj / cm 2 with an ultra-high pressure mercury lamp and then sprayed with a 0.5 mass% potassium carbonate aqueous solution at a pressure of 0.1274 MPa (l.3 kgf / cm 2 ) to form.
  • the time (seconds) that the black matrix pattern with a line width of 18 m peeled off and flowed was measured. This time is longer! /, The better the adhesion.
  • the black matrix formed from the black photosensitive resin compositions obtained in Examples 1 to 4 has an optical density of 4 or more, has excellent resolution, and has a sufficiently high electrical resistance value. Furthermore, the black matrix formed from the black photosensitive resin composition obtained in Examples 1 to 5 is sufficiently excellent in adhesion.
  • Example 2 when Examples 2 to 4 in which the polymer / monomer ratio was changed were compared, the polymer / monomer ratio was less than 2.5. 2.1 In Example 3 having a small ratio of 1, line burr was likely to appear. . On the other hand, in Example 4 where the polymer / monomer ratio exceeds 3.5, which is 4.85, which is large, the formed black matrix tends to flow easily. These results, in particular a polymer / monomer ratio as in Example 2 from 2.5 to 3. If it is 5, burrs and further reduced, further it forces s Wakakaru to improve adhesion.
  • a black photosensitive resin composition having a sufficiently high optical density and electrical resistance value as a black matrix and having a sufficiently high resolution, a method for forming a black bear tritus using the same, and a color Filter manufacturing method and color filter That's the power S.

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Abstract

L'invention concerne une composition à base de résine noire comprenant un liant polymère, un composé pouvant être photopolymérisé présentant une liaison non saturée par éthylène, un amorceur de photopolymérisation, et un pigment noir, le liant polymère comprenant une résine acrylique présentant des unités de répétition de formules (I), (II), et (III) respectivement.
PCT/JP2007/067592 2006-09-12 2007-09-10 Composition à base de résine photosensible colorée en noir, procédé de formation d'une matrice noire, procédé de production d'un filtre de couleur et filtre de couleur ainsi obtenu WO2008032675A1 (fr)

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JP2013092798A (ja) * 2013-01-15 2013-05-16 Fujifilm Corp 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ、固体撮像素子用反射防止膜、固体撮像素子用遮光性カラーフィルタの製造方法、および固体撮像素子
JP2013122602A (ja) * 2013-01-11 2013-06-20 Fujifilm Corp 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子。
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JP2009265372A (ja) * 2008-04-25 2009-11-12 Fujifilm Corp 重合性組成物、遮光性カラーフィルタ、および固体撮像素子
KR101441998B1 (ko) * 2008-04-25 2014-09-18 후지필름 가부시키가이샤 중합성 조성물, 차광성 컬러필터, 흑색 경화성 조성물, 고체촬상소자용 차광성 컬러필터와 그 제조 방법, 및 고체촬상소자
JP2010008655A (ja) * 2008-06-26 2010-01-14 Fujifilm Corp 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子。
JP2010008656A (ja) * 2008-06-26 2010-01-14 Fujifilm Corp 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ、その製造方法、および固体撮像素子
JP2011501816A (ja) * 2008-07-01 2011-01-13 エルジー・ケム・リミテッド 複数の光開始剤を含む感光性樹脂組成物、これを用いた透明薄膜層及び液晶表示装置
JP2010122381A (ja) * 2008-11-18 2010-06-03 Hitachi Chem Co Ltd 黒色感光性樹脂組成物、ブラックマトリクスの製造方法、カラーフィルタの製造方法及びカラーフィルタ
JP2011225701A (ja) * 2010-04-19 2011-11-10 Toray Coatex Co Ltd 低吸湿性とアルカリ水溶解性を併せ持つポリマー
CN102736411A (zh) * 2011-04-08 2012-10-17 奇美实业股份有限公司 感光性树脂组成物及使用其的彩色滤光片与液晶显示装置
JP2013122602A (ja) * 2013-01-11 2013-06-20 Fujifilm Corp 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子。
JP2013092798A (ja) * 2013-01-15 2013-05-16 Fujifilm Corp 黒色硬化性組成物、固体撮像素子用遮光性カラーフィルタ、固体撮像素子用反射防止膜、固体撮像素子用遮光性カラーフィルタの製造方法、および固体撮像素子
KR20180063055A (ko) 2015-09-30 2018-06-11 도레이 카부시키가이샤 네거티브형 착색 감광성 수지 조성물, 경화막, 소자 및 표시 장치
KR20190125983A (ko) 2017-03-28 2019-11-07 도레이 카부시키가이샤 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자, 경화막을 구비하는 유기 el 표시 장치, 경화막의 제조 방법, 및 유기 el 표시 장치의 제조 방법

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