JP2011501816A - 複数の光開始剤を含む感光性樹脂組成物、これを用いた透明薄膜層及び液晶表示装置 - Google Patents
複数の光開始剤を含む感光性樹脂組成物、これを用いた透明薄膜層及び液晶表示装置 Download PDFInfo
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- JP2011501816A JP2011501816A JP2010526836A JP2010526836A JP2011501816A JP 2011501816 A JP2011501816 A JP 2011501816A JP 2010526836 A JP2010526836 A JP 2010526836A JP 2010526836 A JP2010526836 A JP 2010526836A JP 2011501816 A JP2011501816 A JP 2011501816A
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- photosensitive resin
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- 239000010409 thin film Substances 0.000 title claims abstract description 25
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- 150000001875 compounds Chemical class 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 12
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- 239000003112 inhibitor Substances 0.000 claims description 5
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- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 claims description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 4
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- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 16
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 60
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- 125000006179 2-methyl benzyl group Chemical group [H]C1=C([H])C(=C(C([H])=C1[H])C([H])([H])*)C([H])([H])[H] 0.000 description 14
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- 239000000178 monomer Substances 0.000 description 4
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 3
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 description 3
- KGKOHEXZKDOATO-UHFFFAOYSA-N [[6-methyl-1-(4-methylsulfanylphenyl)cyclohexa-2,4-dien-1-yl]-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound C1=CC(SC)=CC=C1C1(P(=O)(C(=O)C=2C(=CC(C)=CC=2C)C)C(=O)C=2C(=CC(C)=CC=2C)C)C(C)C=CC=C1 KGKOHEXZKDOATO-UHFFFAOYSA-N 0.000 description 3
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
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- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- SZCWBURCISJFEZ-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) 3-hydroxy-2,2-dimethylpropanoate Chemical compound OCC(C)(C)COC(=O)C(C)(C)CO SZCWBURCISJFEZ-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/28—Oxygen or compounds releasing free oxygen
- C08F4/32—Organic compounds
- C08F4/38—Mixtures of peroxy-compounds
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
【選択図】なし
Description
Claims (15)
- 活性化波長の差が20nm以上である二種の光開始剤を含む感光性樹脂組成物。
- 前記組成物は二種の光開始剤を含み、前記二種の光開始剤の含量比は1:3〜3:1であることを特徴とする、請求項1に記載の感光性樹脂組成物。
- 前記光開始剤の活性化波長の差は20〜100nmであることを特徴とする、請求項1に記載の感光性樹脂組成物。
- 前記光開始剤の活性化波長は250〜450nmであることを特徴とする、請求項1に記載の感光性樹脂組成物。
- 前記感光性樹脂組成物は、アルカリ可溶性樹脂、エチレン性不飽和化合物、光開始剤及び溶媒を含むことを特徴とする、請求項1に記載の感光性樹脂組成物。
- 前記感光性樹脂組成物は、アルカリ可溶性樹脂1〜20重量%、エチレン性不飽和化合物1〜20重量%、光開始剤0.05〜10重量%及び溶媒50〜95重量%を含むことを特徴とする、請求項5に記載の感光性樹脂組成物。
- 前記溶媒は、メチルエチルケトン、メチルセロソルブ、エチルセロソルブ、プロピルセロソルブ、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、エチレングリコールメチルエチルエーテル、プロピレングリコールジメチルエーテル、プロピルグリコールジエチルエーテル、プロピレングリコールメチルエチルエーテル、2―エトキシプロパノール、2―メトキシプロパノール、3―メトキシブタノール、シクロペンタノン、シクロヘキサノン、プロピレングリコールメチルエーテルアセテート、プロピレングリコールエチルエーテルアセテート、3―メトキシブチルアセテート、エチル3―エトキシプロピオネート、エチルセロソルブアセテート、メチルセロソルブアセテート、ブチルアセテート、又はジプロピレングリコールモノメチルエーテルであることを特徴とする、請求項5に記載の感光性樹脂組成物。
- 前記感光性樹脂組成物は、硬化促進剤、熱重合抑制剤、可塑剤、接着促進剤、充填剤又は界面活性剤をさらに含むことを特徴とする、請求項5に記載の感光性樹脂組成物。
- 前記硬化促進剤は、2―メルカプトベンゾイミダゾール、2―メルカプトベンゾチアゾール、2―メルカプトベンゾオキサゾール、2,5―ジメルカプト―1,3,4―チアジアゾール、又は2―メルカプト―4,6―ジメチルアミノピリジンであることを特徴とする、請求項9に記載の感光性樹脂組成物。
- 前記熱重合抑制剤は、P―アナソル又はヒドロキノンであることを特徴とする、請求項9に記載の感光性樹脂組成物。
- 請求項1による感光性樹脂組成物を用いて製造された透明薄膜層。
- 前記透明薄膜層のパターン飽和厚さ―スリットパターン厚さは3500Å以上であることを特徴とする、請求項12に記載の透明薄膜層。
- 前記透明薄膜層のパターン飽和厚さ―半透過パターン厚さは4000Å以上であることを特徴とする、請求項12に記載の透明薄膜層。
- 請求項12による透明薄膜層を用いて製造された液晶表示装置。
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KR20080063313 | 2008-07-01 | ||
KR1020090054850A KR101121038B1 (ko) | 2008-07-01 | 2009-06-19 | 복수의 광개시제를 포함한 감광성 수지 조성물, 이를 이용한 투명 박막층 및 액정 표시 장치 |
PCT/KR2009/003324 WO2010002129A2 (ko) | 2008-07-01 | 2009-06-22 | 복수의 광개시제를 포함한 감광성 수지 조성물, 이를 이용한 투명 박막층 및 액정 표시 장치 |
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JP2012172367A Pending JP2012247794A (ja) | 2008-07-01 | 2012-08-02 | 複数の光開始剤を含む感光性樹脂組成物、これを用いた透明薄膜層及び液晶表示装置 |
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JP (2) | JP2011501816A (ja) |
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JP2014139668A (ja) * | 2012-12-20 | 2014-07-31 | Mitsubishi Chemicals Corp | 着色硬化物体及びその製造方法と、カラーフィルター、及び液晶表示装置 |
WO2014132928A1 (ja) * | 2013-02-28 | 2014-09-04 | 富士フイルム株式会社 | 透明樹脂層形成用組成物、透明樹脂層、固体撮像素子およびオプトエレクトロニクスデバイス |
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CN102681343A (zh) * | 2011-03-08 | 2012-09-19 | 住友化学株式会社 | 着色感光性树脂组合物 |
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JP2014115545A (ja) * | 2012-12-12 | 2014-06-26 | Toyo Ink Sc Holdings Co Ltd | 感光性着色組成物、およびカラーフィルタ |
JP2014139668A (ja) * | 2012-12-20 | 2014-07-31 | Mitsubishi Chemicals Corp | 着色硬化物体及びその製造方法と、カラーフィルター、及び液晶表示装置 |
WO2014132928A1 (ja) * | 2013-02-28 | 2014-09-04 | 富士フイルム株式会社 | 透明樹脂層形成用組成物、透明樹脂層、固体撮像素子およびオプトエレクトロニクスデバイス |
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TW201013315A (en) | 2010-04-01 |
TWI428695B (zh) | 2014-03-01 |
KR20100003695A (ko) | 2010-01-11 |
US20110287366A1 (en) | 2011-11-24 |
US8409782B2 (en) | 2013-04-02 |
KR101121038B1 (ko) | 2012-03-15 |
JP2012247794A (ja) | 2012-12-13 |
CN101965541A (zh) | 2011-02-02 |
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