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WO2008007134A3 - Method of controlling contamination of a surface - Google Patents

Method of controlling contamination of a surface Download PDF

Info

Publication number
WO2008007134A3
WO2008007134A3 PCT/GB2007/050350 GB2007050350W WO2008007134A3 WO 2008007134 A3 WO2008007134 A3 WO 2008007134A3 GB 2007050350 W GB2007050350 W GB 2007050350W WO 2008007134 A3 WO2008007134 A3 WO 2008007134A3
Authority
WO
WIPO (PCT)
Prior art keywords
chamber
euv
optical element
tin
controlling contamination
Prior art date
Application number
PCT/GB2007/050350
Other languages
French (fr)
Other versions
WO2008007134A2 (en
Inventor
Robert Bruce Grant
Original Assignee
Edwards Ltd
Robert Bruce Grant
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd, Robert Bruce Grant filed Critical Edwards Ltd
Publication of WO2008007134A2 publication Critical patent/WO2008007134A2/en
Publication of WO2008007134A3 publication Critical patent/WO2008007134A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Apparatus for generating extreme ultra violet (EUV) radialson comprises a tin EUV source, a chamber housing at least one optical element for directing EUV radiation generated by the EUV source towards a radiation outlet from the chamber, at least one vacuum pump for evacuating the chamber, and means for supplying to the chamber an organic halide for reacting with the deposited on said at least one optical element to form an organo-tin halide.
PCT/GB2007/050350 2006-07-14 2007-06-22 Method of controlling contamination of a surface WO2008007134A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0614028A GB0614028D0 (en) 2006-07-14 2006-07-14 Method of controlling contamination of a surface
GB0614028.9 2006-07-14

Publications (2)

Publication Number Publication Date
WO2008007134A2 WO2008007134A2 (en) 2008-01-17
WO2008007134A3 true WO2008007134A3 (en) 2008-03-27

Family

ID=36955676

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2007/050350 WO2008007134A2 (en) 2006-07-14 2007-06-22 Method of controlling contamination of a surface

Country Status (3)

Country Link
GB (1) GB0614028D0 (en)
TW (1) TW200821762A (en)
WO (1) WO2008007134A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051150A (en) * 1995-08-07 2000-04-18 Seiko Epson Corporation Plasma etching method and method of manufacturing liquid crystal display panel
WO2006020080A2 (en) * 2004-07-27 2006-02-23 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source
WO2006056730A2 (en) * 2004-11-26 2006-06-01 The Boc Group Plc Protection of surfaces exposed to charged particles
EP1671711A1 (en) * 2003-10-09 2006-06-21 Ebara Corporation Method of purifying matter contaminated by heavy metal and apparatus therefor
WO2007107783A1 (en) * 2006-03-23 2007-09-27 Edwards Limited Spectral filter repair

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051150A (en) * 1995-08-07 2000-04-18 Seiko Epson Corporation Plasma etching method and method of manufacturing liquid crystal display panel
EP1671711A1 (en) * 2003-10-09 2006-06-21 Ebara Corporation Method of purifying matter contaminated by heavy metal and apparatus therefor
WO2006020080A2 (en) * 2004-07-27 2006-02-23 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source
WO2006056730A2 (en) * 2004-11-26 2006-06-01 The Boc Group Plc Protection of surfaces exposed to charged particles
WO2007107783A1 (en) * 2006-03-23 2007-09-27 Edwards Limited Spectral filter repair

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
KLUNDER D J W ET AL: "Debris mitigation and cleaning strategies for Sn-based sources for EUV lithography", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 5751, no. II, 1 May 2005 (2005-05-01), pages 943 - 951, XP002421952, ISSN: 0277-786X *

Also Published As

Publication number Publication date
WO2008007134A2 (en) 2008-01-17
GB0614028D0 (en) 2006-08-23
TW200821762A (en) 2008-05-16

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