WO2005044828A1 - 環状有機ケイ素化合物の製造方法及びアルコール性水酸基を有するケイ素系樹脂及びその製造方法 - Google Patents
環状有機ケイ素化合物の製造方法及びアルコール性水酸基を有するケイ素系樹脂及びその製造方法 Download PDFInfo
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- WO2005044828A1 WO2005044828A1 PCT/JP2004/016445 JP2004016445W WO2005044828A1 WO 2005044828 A1 WO2005044828 A1 WO 2005044828A1 JP 2004016445 W JP2004016445 W JP 2004016445W WO 2005044828 A1 WO2005044828 A1 WO 2005044828A1
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- Prior art keywords
- group
- organic silicon
- organic
- carbon atoms
- resin
- Prior art date
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- 239000011347 resin Substances 0.000 title claims abstract description 61
- 229920005989 resin Polymers 0.000 title claims abstract description 61
- 125000002887 hydroxy group Chemical group [H]O* 0.000 title claims abstract description 50
- 230000001476 alcoholic effect Effects 0.000 title claims abstract description 37
- 125000004122 cyclic group Chemical group 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 6
- 150000003377 silicon compounds Chemical class 0.000 title abstract description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 4
- 239000010703 silicon Substances 0.000 title abstract 4
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 22
- 239000000203 mixture Substances 0.000 claims abstract description 18
- 150000001336 alkenes Chemical class 0.000 claims abstract description 17
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 13
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 10
- 239000003054 catalyst Substances 0.000 claims abstract description 10
- 229910052739 hydrogen Chemical group 0.000 claims abstract description 6
- 239000001257 hydrogen Chemical group 0.000 claims abstract description 6
- 230000003301 hydrolyzing effect Effects 0.000 claims abstract description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 5
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 5
- 150000003624 transition metals Chemical class 0.000 claims abstract description 5
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 42
- 229920000642 polymer Polymers 0.000 claims description 9
- 150000001721 carbon Chemical group 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000003960 organic solvent Substances 0.000 claims description 8
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 claims description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 5
- 125000004429 atom Chemical group 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 19
- GHFHFNDKTYBBNZ-UHFFFAOYSA-N oxasilolane Chemical class C1CO[SiH2]C1 GHFHFNDKTYBBNZ-UHFFFAOYSA-N 0.000 abstract description 10
- 238000003786 synthesis reaction Methods 0.000 abstract description 8
- 230000015572 biosynthetic process Effects 0.000 abstract description 6
- 230000007774 longterm Effects 0.000 abstract 1
- -1 cyclic organosilicon compound Chemical class 0.000 description 16
- 239000002994 raw material Substances 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- 238000006460 hydrolysis reaction Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 230000007062 hydrolysis Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000012024 dehydrating agents Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 238000007142 ring opening reaction Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 3
- 238000006459 hydrosilylation reaction Methods 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 3
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- HNVRRHSXBLFLIG-UHFFFAOYSA-N 3-hydroxy-3-methylbut-1-ene Chemical compound CC(C)(O)C=C HNVRRHSXBLFLIG-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 238000005580 one pot reaction Methods 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
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- 125000005372 silanol group Chemical group 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- WGGNJZRNHUJNEM-UHFFFAOYSA-N 2,2,4,4,6,6-hexamethyl-1,3,5,2,4,6-triazatrisilinane Chemical compound C[Si]1(C)N[Si](C)(C)N[Si](C)(C)N1 WGGNJZRNHUJNEM-UHFFFAOYSA-N 0.000 description 1
- BZAZNULYLRVMSW-UHFFFAOYSA-N 2-Methyl-2-buten-3-ol Natural products CC(C)=C(C)O BZAZNULYLRVMSW-UHFFFAOYSA-N 0.000 description 1
- HRWFFDJQZODCGS-UHFFFAOYSA-N 2-methoxyethoxy(methyl)silane Chemical compound COCCO[SiH2]C HRWFFDJQZODCGS-UHFFFAOYSA-N 0.000 description 1
- GVHIREZHTRULPT-UHFFFAOYSA-N 2-methyl-n-trimethylsilylpropan-2-amine Chemical compound CC(C)(C)N[Si](C)(C)C GVHIREZHTRULPT-UHFFFAOYSA-N 0.000 description 1
- VKIHJUUXHCZCAG-UHFFFAOYSA-N 3-methoxypropoxy(methyl)silane Chemical compound COCCCO[SiH2]C VKIHJUUXHCZCAG-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KWFZAAGYIJTNNS-UHFFFAOYSA-N CCCO[Si](C)OCCC Chemical compound CCCO[Si](C)OCCC KWFZAAGYIJTNNS-UHFFFAOYSA-N 0.000 description 1
- OKUQBXZMLWZZPX-UHFFFAOYSA-N C[Si]1(OCCC1(C)C)C Chemical compound C[Si]1(OCCC1(C)C)C OKUQBXZMLWZZPX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
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- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
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- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 description 1
- PEGHITPVRNZWSI-UHFFFAOYSA-N [[bis(trimethylsilyl)amino]-dimethylsilyl]methane Chemical compound C[Si](C)(C)N([Si](C)(C)C)[Si](C)(C)C PEGHITPVRNZWSI-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
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- 244000245420 ail Species 0.000 description 1
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
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- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
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- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
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- 238000001816 cooling Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- AWQTZFCYSLRFJO-UHFFFAOYSA-N diethoxy(methoxy)silane Chemical compound CCO[SiH](OC)OCC AWQTZFCYSLRFJO-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- OKONWUJRLPUUJT-UHFFFAOYSA-N dimethyl-phenyl-triphenylsilyloxysilane Chemical compound C=1C=CC=CC=1[Si](C)(C)O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 OKONWUJRLPUUJT-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- DMSVKKSBEJFTSD-UHFFFAOYSA-N ethoxy(dipropoxy)silane Chemical compound CCCO[SiH](OCC)OCCC DMSVKKSBEJFTSD-UHFFFAOYSA-N 0.000 description 1
- ZZRGHKUNLAYDTC-UHFFFAOYSA-N ethoxy(methyl)silane Chemical compound CCO[SiH2]C ZZRGHKUNLAYDTC-UHFFFAOYSA-N 0.000 description 1
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- 238000001914 filtration Methods 0.000 description 1
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- 150000004687 hexahydrates Chemical class 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000007040 multi-step synthesis reaction Methods 0.000 description 1
- ZSMNRKGGHXLZEC-UHFFFAOYSA-N n,n-bis(trimethylsilyl)methanamine Chemical compound C[Si](C)(C)N(C)[Si](C)(C)C ZSMNRKGGHXLZEC-UHFFFAOYSA-N 0.000 description 1
- BDSUYTOTVCEJPO-UHFFFAOYSA-N n-(dimethylamino-methyl-phenylsilyl)-n-methylmethanamine Chemical compound CN(C)[Si](C)(N(C)C)C1=CC=CC=C1 BDSUYTOTVCEJPO-UHFFFAOYSA-N 0.000 description 1
- FTURFVPIEOKJBC-UHFFFAOYSA-N n-[dimethylamino(diphenyl)silyl]-n-methylmethanamine Chemical compound C=1C=CC=CC=1[Si](N(C)C)(N(C)C)C1=CC=CC=C1 FTURFVPIEOKJBC-UHFFFAOYSA-N 0.000 description 1
- NGAVXENYOVMGDJ-UHFFFAOYSA-N n-[ethylamino(dimethyl)silyl]ethanamine Chemical compound CCN[Si](C)(C)NCC NGAVXENYOVMGDJ-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000002524 organometallic group Chemical class 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
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- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
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- 238000013112 stability test Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- IVZTVZJLMIHPEY-UHFFFAOYSA-N triphenyl(triphenylsilyloxy)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 IVZTVZJLMIHPEY-UHFFFAOYSA-N 0.000 description 1
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 1
- IGJPWUZGPMLVDT-UHFFFAOYSA-N tris(ethenyl)-tris(ethenyl)silyloxysilane Chemical compound C=C[Si](C=C)(C=C)O[Si](C=C)(C=C)C=C IGJPWUZGPMLVDT-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
Definitions
- the present invention relates to a method for producing a cyclic organic silicon compound, and more particularly, to a method for producing an alkoxysilane having a hydroxyl group protected by an organic substituent.
- the present invention also relates to a novel organic gay resin having an alcoholic hydroxyl group and a method for producing the same.
- the organic gay resin of the present invention is useful as a raw material such as a material for lithography and an organic-inorganic hybrid material.
- Halogenosilanes and alkoxysilanes having a soluble group are useful as raw materials for lithography materials and organic-inorganic hybrid materials.
- Patent Document 1 Japanese Patent Application Laid-Open No. 2002-224949
- Patent Document 2 Japanese Unexamined Patent Application Publication No. 200 2-3 3 8583
- the method known so far as a method for producing a halogenosilane or an alkoxysilane having a soluble group is a method utilizing a multi-step synthesis reaction. Not suitable.
- Non-Patent Document 1 J. Org. Chem. 1997, 62, 4206-4207
- Non-Patent Document 2 J. Org. Chem. 2002, 67, 2056-2064
- Non-Patent Document 3 Non-Patent Document 4
- Non-Patent Document 3 MakromolekulareChemie 1964, 73, 85
- Non-Patent Document 4 MakromolekulareChemie 1966, 97, 241
- Patent Document 1 Japanese Patent Laid-Open No. 8- No. 231 924
- Patent Document 2 JP-A-9-176321
- Patent Document 3 JP 2001-213963 A
- Patent Document 4 JP 2003-146832A
- an organic gay resin having an alicyclic epoxide is synthesized, and then an oxidation reaction (polymer reaction) is used to convert the organic gay resin having a diol into an organic gay resin having a diol. Conversion methods have also been reported (eg,
- Patent Document 5
- Patent Document 5 JP-A-10-87834 Further, polymethylsilsesquioxane-based fine particles having an alcoholic hydroxyl group have been reported (for example, Patent Document 6).
- Patent Document 6 Japanese Patent Application Laid-Open No. Hei 1-11-1681
- An organic gay resin having an alcoholic hydroxyl group is useful as a raw material for a lithography material, an organic-inorganic hybrid material, etc. because it exhibits an alkali-soluble group.
- Patent Document 7 Japanese Patent Application Laid-Open No. 2003-149822
- these resins can easily react with a silylating agent, and thus can be used as raw materials for various functional materials.
- Non-Patent Document 1 J.0rg. Chem. 1997, 62, 4206
- Non-Patent Document 2 J. Org. Chem. 2002, 67, 2056
- Non-Patent Document 3 MakromolekulareChemie 1964, 73, 85
- Non-Patent Document 4 MakromolekulareChemie 1966, 97, 241
- Oxa-silacyclopentanes are useful as various organic synthetic intermediates, reactants, and resin raw materials because they generate an alcoholic hydroxyl group by performing a ring opening reaction.
- synthesis of oxa-silacyclopentanes usually requires at least two steps of 1) hydrosilation of olefins with hydrosilane and 2) ring-closure reaction. Requires two or more reaction steps.
- the present invention provides a process for synthesizing a cyclic organosilicon compound having a structure similar to that of oxa-silacyclopentanes by completing the reaction in a one-step reaction to obtain a target compound with high purity and high yield.
- the task is to provide a law.
- the alcoholic hydroxyl group easily reacts with silanol remaining in the resin, and the organic gay resin having the alcoholic hydroxyl group easily gels.
- Another object of the present invention is to construct an organic gay resin having an alcoholic hydroxyl group which is easy to control the composition and does not change with time, and a method for producing the same. Means for solving the problem
- the present invention relates to Invention 1 (hereinafter abbreviated as Invention 1) relating to a method for producing a cyclic organic gayne compound and Invention 2 (hereinafter referred to as Invention 2) relating to an organic gay resin containing an alcoholic hydroxyl group. Abbreviated).
- the production method of the present invention 1 is characterized by reacting an olefin represented by the following general formula (1) and an alkoxysilane represented by the following general formula (2) in the presence of a transition metal catalyst.
- This is a method for producing a cyclic organic gay compound represented by the following general formula (3).
- Z represents an alkenyl group having 25 carbon atoms in which a terminal carbon atom C remote from the carbon atom to which the hydroxyl group is bonded forms a carbon-carbon unsaturated bond, and R is a methyl group or Me represents hydrogen, and Me represents a methyl group.
- R represents an alkyl group or an alkoxyl group having 13 carbon atoms
- R represents
- Z ′ represents an alkylene group having 25 carbon atoms in which the carbon-carbon unsaturated bond of z is a saturated bond, the terminal carbon atom C of Z is bonded to a Si atom, and R is a methyl group or Represents hydrogen, R represents an alkyl group having 13 carbon atoms or an alkoxyl group, and R represents an alkyl group having 13 carbon atoms.
- the use of a cyclic organic gayne compound such as oxa-silacyclopentane as a resin raw material allows easy control of the composition and stable alcoholic hydroxyl groups with no change over time.
- the organic gay resin of the present invention 2 comprises a cyclic organic gay compound represented by the above general formula (3) (hereinafter, abbreviated as a cyclic organic gay compound [3]), or a polyfunctional alkoxysilane Is an organic gay resin having an alcoholic hydroxyl group obtained by hydrolyzing and condensing a mixture of the above.
- a desirable raw material compound is a cyclic organic gayne compound (hereinafter abbreviated as DESMBO) in the above general formula (3) in which each substituent is as follows. It is.
- a preferred production method for obtaining the organic gay resin of the present invention 2 is to prepare a cyclic organosilicon compound [3] or a mixture thereof with a polyfunctional alkoxysilane at a polymer concentration of 30%. This is a method in which hydrolysis and condensation are performed in an organic solvent while maintaining the concentration at not more than mass%.
- a preferred production method comprises the following four steps.
- Step (1) In an organic solvent, the cyclic organic gayne compound [3] or a mixture of the cyclic organic gayne compound and the polyfunctional alkoxysilane is hydrolyzed, and after adding an organic solvent, a dehydrating agent is added to dehydrate.
- Step (2) After filtering the dehydrating agent, the silanol at the terminal of the resin is sealed with a silylating agent.
- Step (3) After distilling off the solvent, an organic solvent and water are added to form an alcoholic hydroxyl group.
- the organic gay resin to be washed with water.
- Step (4) After adding a dehydrating agent and dehydrating the resin, the solvent is distilled off to obtain an organic gay resin having an alcoholic hydroxyl group.
- a cyclic organic gayne compound having an alcoholic hydroxyl group and an alkoxyl group protected by an organic substituent can be synthesized by a one-step reaction.
- a side reaction can be suppressed, and a target cyclic organosilicon compound can be obtained with high purity and high yield.
- the cyclic organosilicon compound obtained by the present invention 1 has an alkoxysilyl group, it reacts with another organic gay compound (including a polymer) to form a lithiloxane bond, Coupling reaction with the silanol group in it is possible.
- the cyclic organosilicon compound obtained according to the present invention 1 easily undergoes ring opening by a hydrolysis reaction to generate an alcoholic hydroxyl group, and the alcoholic hydroxyl group functions as an alkali-soluble group and a crosslinkable group. That is, it functions as a multi-reactive gay compound having a gay functional and a protected carbon functional group. Therefore, the cyclic organic gayne compound obtained by this production method is useful as an intermediate for organic synthesis, a raw material for resin synthesis, a modifier for resin, and a surface treatment agent for inorganic compounds.
- a stable organic gay resin having an alcoholic hydroxyl group whose composition can be easily controlled and which does not change with time, can be obtained.
- the present invention 1 relates to a method for producing a cyclic organic gay compound represented by the above general formula (3).
- the present invention 1 will be described in detail.
- the cyclic organic silicon compound represented by the general formula (3) is obtained by subjecting a hydroxyl-containing olefin (1) and an alkoxysilane (2) to a hydrosilation reaction in the presence of a transition metal catalyst. It is synthesized by performing a ring-closing condensation reaction (dealcoholization reaction).
- these reactions can be performed instantaneously, so that side reactions hardly occur, and the target compound can be obtained in extremely high purity and high yield.
- Olefins having a hydroxyl group are represented by the following general formula (1).
- Z represents an alkenyl group having 25 carbon atoms in which a terminal carbon atom C far from the carbon atom to which the hydroxyl group is bonded forms a carbon-carbon unsaturated bond
- R is a methyl group Or, it represents hydrogen, preferably a methyl group, and Me represents a methyl group.
- olefins include 1-propene-3-methyl-3-ol, 1-butene-4-methyl-4-ol, 1-pentene-5-methyl-5-ol, 1-hexene- 6-methyl-6-ol, 1-butene-3-methyl-3 There are -ol, 1-penten-4-methyl-4-ol, 1-hexene-5-methyl-5-ol and 1-heptene-6-methyl-6-ol.
- 1-butene-3-methyl-3-ol is most preferable because the raw material is easily obtained.
- the alkoxysilanes are represented by the following general formula (2).
- R represents an alkyl group or an alkoxyl group having 13 carbon atoms
- R represents
- alkoxysilanes include trimethoxy silane, triethoxy silane, tripropoxy silane, methyl dimethoxy silane, methyl ethoxy silane, methyl dipropoxy silane, methoxy diethoxy silane, methoxy dipropoxy.
- Examples include silane, ethoxydipropoxysilane, methylmethoxyethoxysilane, and methylmethoxypropoxysilane.
- R is an ethoxy group and R is an ethyl group.
- the olefins of the above general formula (1) and the alkoxysilane of the above general formula (2) are subjected to a hydrosilylation reaction and a ring-closing condensation reaction in the presence of a transition metal catalyst. (Dealcoholization reaction).
- the catalyst used in the present invention 1 is not particularly limited as long as it is known to promote the hydrolysis reaction.
- Preferred catalysts include cobalt, nickel, ruthenium, rhodium, palladium, and iridium. And metals such as platinum, platinum, and other metals belonging to Groups 8 to 10; organometallic complexes; metal salts; and metal oxides.
- platinum-based catalysts are used.
- Preferred platinum-based catalysts include chloroplatinic acid hexahydrate (HPtCI-6H0), cis-PtCI (PhCN), platinum carbon, and divinyl chloride.
- Platinum complexes (Pt-dvds) coordinated with loxane are exemplified.
- Ph represents a phenyl group.
- the amount of the catalyst to be used is preferably 0.1 ppm to 1,000 ppm with respect to the olefins represented by the general formula (1).
- the preferred charge ratio of the olefins (1) and the alkoxysilane (2) is such that, based on 100 moles of the compound having a high boiling point, 110 mol The ratio is 20 moles.
- the alkoxysilane (2) is a compound having a lower boiling point than the olefins (1), so that the alkoxysilane (2) is used in excess of the olefins (1).
- reaction temperature since the control operation of the reaction temperature depends on external heating and the supply rate of the alkoxysilane, it cannot be determined unconditionally. However, usually, the reaction temperature is maintained in the range of 40 ° C to 120 ° C. The silylation reaction and the ring closure condensation reaction (dealcoholization reaction) can be smoothly continued.
- the product obtained by the above reaction can be further purified by appropriately removing unreacted raw materials by a purification step such as distillation, so that the purity can be easily increased to 90% or more.
- the cyclic organic gayne compound [3] synthesized as described above can be hydrolyzed under acid or basic conditions to form an organic gayne resin skeleton, and at the same time, introduce a hydroxyl group into the resin skeleton. it can.
- the product of the hydrolysis-condensation is a polymer having the following repeating units.
- R in the general formula (3) is an alkyl group having 13 carbon atoms
- the repeating unit is [A] below,
- Each of the repeating units [A] and [B] is characterized in that it has a hydroxyl group generated by opening the ring of the cyclic organic gay compound [3].
- the organic gayne resin of the present invention can be obtained by, in addition to hydrolyzing and condensing a cyclic organic gayne compound [3] alone, a mixture of a cyclic organic gayne compound [3] and a polyfunctional alkoxysilane. Including those obtained by hydrolysis and co-condensation.
- Preferable polyfunctional alkoxysilanes include 34-functional alkoxysilanes, preferably those comprising an alkyl group having 13 carbon atoms and Z or an alkoxy group having 13 carbon atoms.
- Preferred trifunctional alkoxysilanes include, for example, triethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane and the like.
- a preferable ratio of the polyfunctional alkoxysilane is a ratio of not more than 10 mol per 1 mol of the cyclic organic gayne compound [3].
- the preferred number average molecular weight of the organic gay resin of the present invention is 1 000 ⁇ 100
- the preferred average molecular weight measured by GPC is 1,000,000.
- Preferred acids include hydrochloric acid, nitric acid, sulfuric acid, acetic acid, formic acid and the like.
- Preferred bases include sodium hydroxide, potassium hydroxide, lithium hydroxide, tetramethylammonium hydroxide, triethylamine, pyridine and the like.
- the preferred amount of water used for the hydrolysis is greater than or equal to the stoichiometric amount, preferably 1.52 times the stoichiometric amount.
- Preferred organic solvents used in the hydrolysis include acetone, methanol, ethanol, isopropyl alcohol, methyl ethyl ketone, methyl isobutyl ketone, propylene glycol monomethyl ether acetate, toluene, hexane, and the like. You may use it.
- Preferred examples of the molecular weight modifier include hexamethyldisiloxane, tetramethyldisiloxane, hexaphenyldisiloxane, hexavinyldisiloxane, tetraphenyldimethyldisiloxane, and tetraisopropyldisiloxane.
- Examples of the dehydrating agent after hydrolysis include anhydrous sodium sulfate and anhydrous magnesium sulfate.
- the type of the dehydrating agent is not limited as long as it has a dehydrating effect and does not contaminate the resin.
- the resin-terminated silanol is sealed with a silylating agent.
- a silylating agent By sealing the silanol at the terminal of the resin, an organic gay resin having an alcoholic hydroxyl group which is stable over time can be constructed.
- Preferred silylating agents include 1,1,1,3,3,3-hexamethyldisilazane, 1,1,3,3-tetramethyldisilazane, heptamethyldisilazane, 1,3-divinyl-1 1,1,3,3-tetramethyldisilazane, 1,1,3,3,5,5-hexamethylcyclotrisilazane, tris (trimethylsilyl) amine, bis (ethylamino) dimethylsilane, bis (dimethylamino) ) Dimethylsilane, bis (dimethylamino) diphenylsilane, bis (dimethylamino) methylphenylsilane, trimethylsi
- aminosilanes such as lanol and t-butylaminotrimethylsilane
- chlorosilanes such as silanols, trimethylchlorosilane, dimethylchlorosilane and phenylmethylchlorosi
- the solvent is distilled off under reduced pressure, an organic solvent is added, and the organic garlic resin is washed with water.
- organic solvent used for washing with water include acetone, methanol, ethanol, isopropyl alcohol, methyl ethyl ketone, methyl isobutyl ketone, propylene glycol monomethyl ether acetate, toluene, and hexane. You may use it.
- Ultrapure water is generally used for water washing, but an acidic aqueous solution such as a hydrochloric acid aqueous solution, an alkaline aqueous solution such as a sodium hydroxide aqueous solution, or a saturated sodium chloride aqueous solution may be used. Washing with water is preferably performed until the aqueous layer becomes neutral.
- an acidic aqueous solution such as a hydrochloric acid aqueous solution
- an alkaline aqueous solution such as a sodium hydroxide aqueous solution
- a saturated sodium chloride aqueous solution may be used. Washing with water is preferably performed until the aqueous layer becomes neutral.
- the dehydrating agent to be used after washing with water include anhydrous sodium sulfate and anhydrous magnesium sulfate.
- the type of the dehydrating agent is not particularly limited as long as it has a dehydrating effect and does not contaminate the resin.
- a reactor (flask) provided with a cooling tube, a dropping funnel, and a magnetic stirrer was placed in an oil bath, and 1-butene-3-methyl-3-ol (30 g, 348 mmol) was charged and stirred.
- Triethoxysilane (62.9 g, 383 mmol) was charged into the dropping funnel.
- the triethoxysilane (11.2 mL) charged in the dropping funnel is poured into the flask, and the oil bath is set at 80 ° C.
- Add 0.1 MPt-dvds xylene solution (13 to 0.0013 mmol) to the flask to start the reaction.
- the colorless transparent liquid was subjected to 1 HN MR measurement at 270 MHz.
- a reactor equipped with a dropping funnel and a magnetic stirrer was charged with DESMBO (49 g, 240 mmol), methyltriethoxysilane (78.6 g, 441 mmol), hexamethyldisiloxane (19.5 g, 120 mmol), and acetone (91 g). Stirred. A 1.5 wt% hydrochloric acid aqueous solution (37.4 g) was charged into the dropping funnel, and the solution was slowly dropped. After completion of the dropwise addition, the mixture was stirred at room temperature for 1.5 hours. Subsequently, diisopropyl ether (200 g) was added, and anhydrous magnesium sulfate was added, followed by dehydration for 2 hours.
- DESMBO 49 g, 240 mmol
- methyltriethoxysilane 78.6 g, 441 mmol
- hexamethyldisiloxane (19.5 g, 120 mmol
- acetone
- the anhydrous magnesium sulfate is filtered off, hexamethyldisilazane (38.7 g, 240 mmol) is slowly added with stirring, and the mixture is stirred at room temperature for 2 hours, and the solvent is distilled off under reduced pressure.
- Methyl ethyl ketone (200 g) and a 1N-hydrochloric acid aqueous solution are added, and the mixture is washed. The washing is repeated until the aqueous layer becomes neutral. After dehydration with anhydrous magnesium sulfate, the solvent was distilled off under reduced pressure to obtain an organic gay resin (73.3 g, 89%).
- the organic gay resin was measured for 1 HN MR at 270 MHz, and the spectrum shown in FIG. 3 was obtained.
- Table 3 shows the S values and their attributions. The compound thus obtained was confirmed to have the following structure.
- Propylene glycol methyl ether acetate containing 0.5 wt% of water was prepared as a solvent.
- the organic gay resin prepared in Example 1 was dissolved in a solvent at a concentration of 10 wt% to prepare a sample. This sample was left at 60 ° C for 3 days, and the change in molecular weight was monitored. Table 5 shows the results.
- the production method of the present invention 1 is useful as a technique for inexpensively producing a cyclic organic gay compound having an alcoholic hydroxyl group and an alkoxyl group protected by an organic substituent.
- the cyclic organosilicon compound obtained by the present invention 1 is useful as a resist raw material used in lithography.
- the organic gay resin having an alcoholic hydroxyl group of the present invention 2 is useful as a raw material for lithography materials and organic-inorganic hybrid materials.
- FIG. 1 is a 1 H-NMR spectrum of the compound obtained in Example 1.
- FIG. 2 is a 13 C-NMR spectrum of the compound obtained in Example 1.
- FIG. 3 shows a 1 H-NMR spectrum of the organic gay resin obtained in Example 1.
- FIG. 4 shows a 1 -NMR spectrum of the organic gay resin obtained in Example 1.
- Figure 5 shows the IR scan Bae spectrum of organic Gay fluororesin obtained in Example 1 c
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- Silicon Polymers (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
Claims
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KR1020067008701A KR101097570B1 (ko) | 2003-11-07 | 2004-11-05 | 환상 유기 규소 화합물의 제조 방법 |
US10/577,948 US7402648B2 (en) | 2004-11-05 | 2004-11-05 | Method for producing cyclic organic silicon compound and organic silicon resin having alcoholic hydroxyl group |
KR1020117013078A KR101064063B1 (ko) | 2003-11-07 | 2004-11-05 | 알코올성 수산기를 갖는 규소계 수지 및 그의 제조 방법 |
JP2005515324A JP4470886B2 (ja) | 2003-11-07 | 2004-11-05 | 環状有機ケイ素化合物の製造方法 |
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WO2007007598A1 (ja) * | 2005-07-12 | 2007-01-18 | Toagosei Co., Ltd. | アルコ-ル性水酸基を有する有機ケイ素樹脂及びその製造方法 |
WO2014009204A1 (de) * | 2012-07-11 | 2014-01-16 | Wacker Chemie Ag | Oxasilacyclen und verfahren zu deren herstellung |
US9309358B2 (en) | 2012-07-11 | 2016-04-12 | Wacker Chemie Ag | Crosslinkable siloxanes by acid-catalyzed polymerization of oxasilacycles |
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- 2004-11-05 KR KR1020117013078A patent/KR101064063B1/ko active IP Right Grant
- 2004-11-08 TW TW093134008A patent/TW200519120A/zh not_active IP Right Cessation
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JPH07149901A (ja) * | 1993-12-01 | 1995-06-13 | Shin Etsu Chem Co Ltd | 有機けい素化合物とその製造方法、および有機けい素化合物重合体 |
JP2003098670A (ja) * | 2001-09-20 | 2003-04-04 | Fujitsu Ltd | レジスト組成物及びこれを用いたパターン形成方法 |
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WALKUP R.D. ET AL.: "Silicon functionalized silyl enol ethers. 4. Effects of fariations of aloxy substituents upon cyclizations of dialkoxy-2-chloroethylsilyl enol ethers to form 2,2-dialkoxy-1-oxa-2-silacyclohexanes", CHEMISTRY LETTERS, no. 7, 1990, pages 1055 - 1058, XP002986954 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007007598A1 (ja) * | 2005-07-12 | 2007-01-18 | Toagosei Co., Ltd. | アルコ-ル性水酸基を有する有機ケイ素樹脂及びその製造方法 |
WO2014009204A1 (de) * | 2012-07-11 | 2014-01-16 | Wacker Chemie Ag | Oxasilacyclen und verfahren zu deren herstellung |
JP2015527312A (ja) * | 2012-07-11 | 2015-09-17 | ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG | オキサシラサイクルおよびこれらの製造方法 |
US9284340B2 (en) | 2012-07-11 | 2016-03-15 | Wacker Chemie Ag | Oxasilacycles and method for the production thereof |
US9309358B2 (en) | 2012-07-11 | 2016-04-12 | Wacker Chemie Ag | Crosslinkable siloxanes by acid-catalyzed polymerization of oxasilacycles |
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JP2010013653A (ja) | 2010-01-21 |
TW200519120A (en) | 2005-06-16 |
TWI341842B (ja) | 2011-05-11 |
KR20110070928A (ko) | 2011-06-24 |
JPWO2005044828A1 (ja) | 2007-05-17 |
JP4470886B2 (ja) | 2010-06-02 |
JP5062231B2 (ja) | 2012-10-31 |
KR101097570B1 (ko) | 2011-12-22 |
KR20060111489A (ko) | 2006-10-27 |
KR101064063B1 (ko) | 2011-09-08 |
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