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WO2003014833A8 - Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen - Google Patents

Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen

Info

Publication number
WO2003014833A8
WO2003014833A8 PCT/EP2002/008193 EP0208193W WO03014833A8 WO 2003014833 A8 WO2003014833 A8 WO 2003014833A8 EP 0208193 W EP0208193 W EP 0208193W WO 03014833 A8 WO03014833 A8 WO 03014833A8
Authority
WO
WIPO (PCT)
Prior art keywords
collector
fastening
mirror shells
coordinates
rotationally symmetrical
Prior art date
Application number
PCT/EP2002/008193
Other languages
English (en)
French (fr)
Other versions
WO2003014833A2 (de
WO2003014833A3 (de
Inventor
Wolfgang Singer
Wilhelm Egle
Markus Weiss
Joachim Hainz
Joachim Wietzorrek
Johannes Wangler
Frank Melzer
Original Assignee
Zeiss Carl Semiconductor Mfg
Wolfgang Singer
Wilhelm Egle
Markus Weiss
Joachim Hainz
Joachim Wietzorrek
Johannes Wangler
Frank Melzer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10138313A external-priority patent/DE10138313A1/de
Application filed by Zeiss Carl Semiconductor Mfg, Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer filed Critical Zeiss Carl Semiconductor Mfg
Priority to AU2002325359A priority Critical patent/AU2002325359A1/en
Priority to EP02758381A priority patent/EP1415199A2/de
Publication of WO2003014833A2 publication Critical patent/WO2003014833A2/de
Publication of WO2003014833A8 publication Critical patent/WO2003014833A8/de
Publication of WO2003014833A3 publication Critical patent/WO2003014833A3/de
Priority to US10/775,037 priority patent/US7091505B2/en
Priority to US11/416,447 priority patent/US7321126B2/en
Priority to US11/974,718 priority patent/US20080042079A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/006—Systems in which light light is reflected on a plurality of parallel surfaces, e.g. louvre mirrors, total internal reflection [TIR] lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

Die Erfindung betrifft einen Kollektor für eine Projektionsbelichtungsanlage, die in einem Scan-Modus entlang einer Scanrichtung mit einer Wellenlänge ≤ 193 nm, bevorzugt ≤ 126 nm, besonders bevorzugt EUV-Wellenlängen betrieben wird, wobei der Kollektor Licht einer Lichtquelle objektseitig aufnimmt und einen Bereich in einer bildseitigen Ebene, die von einem lokalen Koordinatensystem aufgespannt wird, wobei die y-Richtung des lokalen Koordinatensystems parallel zur Scanrichtung und die x-Richtung senkrecht zur Scanrichtung ist, ausleuchtet, wobei der Kollektor aufweist: eine Vielzahl von rotationssymmetrischen Spiegelschalen, umfassend jeweils wenigstens ein erstes Spiegelsegment, umfassend eine erste optische Fläche, wobei die Spiegelschalen um eine gemeinsame Rotationsachse ineinander angeordnet sind; Befestigungseinrichtungen zum Befestigen der Vielzahl von rotationssymmetrischen Spiegelschalen, und die Befestigungseinrichtungen Stützspeichen aufweisen, die sich in radialer Richtung der rotationssymmetrischen Spiegelschalen erstrecken. Die Erfindung ist dadurch gekennzeichnet, dass die Stützspeichen derart angeordnet sind, dass, wenn sie in die bildseitige auszuleuchtende Ebene projiziert werden, gegenüber der y-Richtung des lokalen Koordinatensystems in der bildseitigen Ebene geneigt sind.
PCT/EP2002/008193 2001-08-10 2002-07-23 Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen WO2003014833A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AU2002325359A AU2002325359A1 (en) 2001-08-10 2002-07-23 Collector with fastening devices for fastening mirror shells
EP02758381A EP1415199A2 (de) 2001-08-10 2002-07-23 Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen
US10/775,037 US7091505B2 (en) 2001-08-10 2004-02-09 Collector with fastening devices for fastening mirror shells
US11/416,447 US7321126B2 (en) 2001-08-10 2006-05-02 Collector with fastening devices for fastening mirror shells
US11/974,718 US20080042079A1 (en) 2001-08-10 2007-10-16 Collector with fastening devices for fastening mirror shells

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10138313.4 2001-08-10
DE10138313A DE10138313A1 (de) 2001-01-23 2001-08-10 Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
PCT/EP2002/000608 WO2002065482A2 (de) 2001-01-23 2002-01-23 KOLLEKTOR MIT UNGENUTZTEM BEREICH FÜR BELEUCHTUNGSSYSTEME MIT EINER WELLENLÄNGE ≤ 193 nm
EPPCT/EP02/00608 2002-01-23

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/775,037 Continuation-In-Part US7091505B2 (en) 2001-08-10 2004-02-09 Collector with fastening devices for fastening mirror shells

Publications (3)

Publication Number Publication Date
WO2003014833A2 WO2003014833A2 (de) 2003-02-20
WO2003014833A8 true WO2003014833A8 (de) 2003-09-04
WO2003014833A3 WO2003014833A3 (de) 2003-11-13

Family

ID=33393732

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008193 WO2003014833A2 (de) 2001-08-10 2002-07-23 Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen

Country Status (3)

Country Link
US (3) US7091505B2 (de)
AU (1) AU2002325359A1 (de)
WO (1) WO2003014833A2 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7098994B2 (en) * 2004-01-16 2006-08-29 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7405804B2 (en) * 2004-10-06 2008-07-29 Asml Netherlands B.V. Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby
DE502006009171D1 (de) * 2005-10-18 2011-05-05 Zeiss Carl Smt Gmbh Kollektor für beleuchtungssysteme mit einer wellenlänge </= 193 nm
ATE528693T1 (de) * 2006-09-15 2011-10-15 Media Lario Srl Optisches kollektorsystem
EP2155932A2 (de) * 2007-05-31 2010-02-24 Carl Zeiss SMT AG Verfahren zur herstellung eines optischen elementes mit hilfe von abformung, optisches element hergestellt nach diesem verfahren, kollektor und beleuchtungssystem
US9461201B2 (en) 2007-11-14 2016-10-04 Cree, Inc. Light emitting diode dielectric mirror
DE102008054882A1 (de) 2008-01-08 2009-07-16 Carl Zeiss Smt Ag Reparaturverfahren für optische Elemente mit Beschichtung und entsprechende optische Elemente
NL1036768A1 (nl) * 2008-04-29 2009-10-30 Asml Netherlands Bv Radiation source.
US8636653B2 (en) * 2008-06-09 2014-01-28 Capso Vision, Inc. In vivo camera with multiple sources to illuminate tissue at different distances
JP2011528859A (ja) * 2008-07-21 2011-11-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用の光学素子マウント
US8309944B1 (en) * 2008-09-29 2012-11-13 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Grazing incidence neutron optics
CA2742313A1 (en) * 2008-10-30 2010-05-06 Inspired Surgical Technologies, Inc. X-ray beam processor
US8050380B2 (en) 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
US9362459B2 (en) 2009-09-02 2016-06-07 United States Department Of Energy High reflectivity mirrors and method for making same
US9435493B2 (en) * 2009-10-27 2016-09-06 Cree, Inc. Hybrid reflector system for lighting device
DE102009044462A1 (de) 2009-11-06 2011-01-05 Carl Zeiss Smt Ag Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
DE102009047180A1 (de) 2009-11-26 2010-12-16 Carl Zeiss Smt Ag Facettenspiegel, Beleuchtungssystem und Projektionsbelichtungsanlage
JP5670174B2 (ja) * 2010-03-18 2015-02-18 ギガフォトン株式会社 チャンバ装置および極端紫外光生成装置
US9105824B2 (en) 2010-04-09 2015-08-11 Cree, Inc. High reflective board or substrate for LEDs
US9012938B2 (en) 2010-04-09 2015-04-21 Cree, Inc. High reflective substrate of light emitting devices with improved light output
DE102011079933A1 (de) 2010-08-19 2012-02-23 Carl Zeiss Smt Gmbh Optisches Element für die UV- oder EUV-Lithographie
DE102010039965B4 (de) * 2010-08-31 2019-04-25 Carl Zeiss Smt Gmbh EUV-Kollektor
US9728676B2 (en) 2011-06-24 2017-08-08 Cree, Inc. High voltage monolithic LED chip
US10243121B2 (en) 2011-06-24 2019-03-26 Cree, Inc. High voltage monolithic LED chip with improved reliability
EP2814573B1 (de) * 2012-02-13 2018-03-21 Convergent R.N.R Ltd Bildgebungsgeführte abgabe von röntgenstrahlung
DE102013105866A1 (de) * 2013-06-06 2014-12-11 Ushio Denki Kabushiki Kaisha Reflektor eines EUV-Kollektors und Verfahren zu dessen Herstellung
US10658546B2 (en) 2015-01-21 2020-05-19 Cree, Inc. High efficiency LEDs and methods of manufacturing
DE102015220955A1 (de) 2015-10-27 2015-12-17 Carl Zeiss Smt Gmbh Optisches Bauelement
JP6951926B2 (ja) * 2017-06-06 2021-10-20 株式会社オーク製作所 露光装置
US10942456B1 (en) * 2020-01-17 2021-03-09 National Applied Research Laboratories Device of light source with diode array emitting high-uniformity ultraviolet

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1865441A (en) * 1923-08-04 1932-07-05 Wappler Electric Company Inc Method of and apparatus for controlling the direction of x-rays
US4242588A (en) 1979-08-13 1980-12-30 American Science And Engineering, Inc. X-ray lithography system having collimating optics
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US5744813A (en) * 1994-07-08 1998-04-28 Kumakhov; Muradin Abubekirovich Method and device for controlling beams of neutral and charged particles
DE69501705T2 (de) * 1994-11-04 1998-06-25 Yamakawa Chemical Ind Verfahren zur Herstellung von optisch aktiven Piperazinderivaten und Zwischenprodukten für ihre Herstellung
US5745547A (en) * 1995-08-04 1998-04-28 X-Ray Optical Systems, Inc. Multiple channel optic
US5682415A (en) * 1995-10-13 1997-10-28 O'hara; David B. Collimator for x-ray spectroscopy
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
EP1039510A4 (de) * 1997-11-14 2003-11-12 Nikon Corp Belichtungsapparat und herstellungsverfahren, und belichtungsverfahren
US6108397A (en) 1997-11-24 2000-08-22 Focused X-Rays, Llc Collimator for x-ray proximity lithography
EP0955641B1 (de) * 1998-05-05 2004-04-28 Carl Zeiss Beleuchtungssystem insbesondere für die EUV-Lithographie
US6438199B1 (en) * 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
DE19903907A1 (de) 1999-02-01 2000-08-03 Mannesmann Rexroth Ag Verfahren und Einrichtung zum Antreiben eines hydraulischen Verbrauchers
GB9909052D0 (en) * 1999-04-20 1999-06-16 Council Cent Lab Res Councils Neutron lens
US6278764B1 (en) 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method

Also Published As

Publication number Publication date
US7091505B2 (en) 2006-08-15
US7321126B2 (en) 2008-01-22
WO2003014833A2 (de) 2003-02-20
US20080042079A1 (en) 2008-02-21
US20060291062A1 (en) 2006-12-28
AU2002325359A1 (en) 2003-02-24
US20040227103A1 (en) 2004-11-18
WO2003014833A3 (de) 2003-11-13

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