WO2002082555A2 - Dispositifs a matrice d'elements munis de substrats souples - Google Patents
Dispositifs a matrice d'elements munis de substrats souples Download PDFInfo
- Publication number
- WO2002082555A2 WO2002082555A2 PCT/IB2002/001173 IB0201173W WO02082555A2 WO 2002082555 A2 WO2002082555 A2 WO 2002082555A2 IB 0201173 W IB0201173 W IB 0201173W WO 02082555 A2 WO02082555 A2 WO 02082555A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- areas
- semiconductor devices
- weakness
- regions
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 150
- 239000011159 matrix material Substances 0.000 title claims abstract description 64
- 239000004065 semiconductor Substances 0.000 claims abstract description 57
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000010409 thin film Substances 0.000 claims description 33
- 239000002861 polymer material Substances 0.000 claims description 17
- 239000004973 liquid crystal related substance Substances 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 claims description 4
- 238000005452 bending Methods 0.000 abstract description 25
- 239000004020 conductor Substances 0.000 description 33
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 229920000307 polymer substrate Polymers 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000059 patterning Methods 0.000 description 5
- 206010073306 Exposure to radiation Diseases 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 229920005570 flexible polymer Polymers 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 206010040844 Skin exfoliation Diseases 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- -1 polyethersulphone Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000001931 thermography Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133305—Flexible substrates, e.g. plastics, organic film
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1306—Sensors therefor non-optical, e.g. ultrasonic or capacitive sensing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78603—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support
Definitions
- the weakened regions may comprise lines of weakness extending over the areas of the substrate between the semiconductor devices. Where the semiconductor devices are arranged for example in a row and column array, these lines may extend between, and spaced from, rows and/or columns of the semiconductor devices. Lines extending in one direction, for example between rows, would facilitate cylindrical rolling of the device. Lines extending in orthogonal directions between rows and columns would facilitate more complex bending, as required for example for spherical moulding.
- the areas of the substrate underlying of the semiconductor islands may be formed with a comparatively greater stiffness, for example by making the thickness of the substrate at areas underlying these islands greater than thickness of the remainder of the substrate.
- this further substrate can similarly be provided with lines of weakness. These links of weakness preferably extend overlying regions between rows and/or columns of pixel electrodes on the first - mentioned substrate.
- the row conductors 14 are not visible.
- a metal is used for the address conductors 14 and 16 and the electrodes 18 may be of metal or a transparent conducting material such as ITO or PEDOT polymer depending on whether the pixels are reflective or transmissive respectively.
- the polymer material at regions where flexing is to be encouraged may be treated so as to render them softer, and thus more flexible, than portions underlying the active devices.
- the portions treated in this way then will tend to flex and distort more readily.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Human Computer Interaction (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Multimedia (AREA)
- Theoretical Computer Science (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002580413A JP2004519866A (ja) | 2001-04-03 | 2002-04-02 | フレキシブルな基板を有するマトリクスアレイデバイス |
AT02718454T ATE449423T1 (de) | 2001-04-03 | 2002-04-02 | Vorrichtungen mit aktiver matrixanordnung mit flexiblen substraten |
DE60234434T DE60234434D1 (de) | 2001-04-03 | 2002-04-02 | Vorrichtungen mit aktiver matrixanordnung mit flexiblen substraten |
EP02718454A EP1384270B1 (fr) | 2001-04-03 | 2002-04-02 | Dispositifs a matrice d'elements munis de substrats souples |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0108309.6 | 2001-04-03 | ||
GBGB0108309.6A GB0108309D0 (en) | 2001-04-03 | 2001-04-03 | Matrix array devices with flexible substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002082555A2 true WO2002082555A2 (fr) | 2002-10-17 |
WO2002082555A3 WO2002082555A3 (fr) | 2003-01-03 |
Family
ID=9912139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2002/001173 WO2002082555A2 (fr) | 2001-04-03 | 2002-04-02 | Dispositifs a matrice d'elements munis de substrats souples |
Country Status (10)
Country | Link |
---|---|
US (1) | US6974971B2 (fr) |
EP (1) | EP1384270B1 (fr) |
JP (1) | JP2004519866A (fr) |
KR (1) | KR20030007756A (fr) |
CN (1) | CN1279622C (fr) |
AT (1) | ATE449423T1 (fr) |
DE (1) | DE60234434D1 (fr) |
GB (1) | GB0108309D0 (fr) |
TW (1) | TWI278990B (fr) |
WO (1) | WO2002082555A2 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005150146A (ja) * | 2003-11-11 | 2005-06-09 | Univ Of Tokyo | フレキシブル検知装置 |
WO2010128614A1 (fr) * | 2009-05-02 | 2010-11-11 | Semiconductor Energy Laboratory Co., Ltd. | Dispositif d'affichage |
US8427420B2 (en) | 2009-05-02 | 2013-04-23 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
Families Citing this family (90)
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KR100703140B1 (ko) | 1998-04-08 | 2007-04-05 | 이리다임 디스플레이 코포레이션 | 간섭 변조기 및 그 제조 방법 |
WO2003007049A1 (fr) | 1999-10-05 | 2003-01-23 | Iridigm Display Corporation | Mems et structures photoniques |
US6936855B1 (en) * | 2002-01-16 | 2005-08-30 | Shane Harrah | Bendable high flux LED array |
US6574033B1 (en) | 2002-02-27 | 2003-06-03 | Iridigm Display Corporation | Microelectromechanical systems device and method for fabricating same |
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US6847050B2 (en) * | 2002-03-15 | 2005-01-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor element and semiconductor device comprising the same |
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US7297040B2 (en) * | 2003-10-30 | 2007-11-20 | Industrial Technology Research Institute | Method for manufacturing a flexible panel for a flat panel display |
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US8427420B2 (en) | 2009-05-02 | 2013-04-23 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
US8810508B2 (en) | 2009-05-02 | 2014-08-19 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US9024863B2 (en) | 2009-05-02 | 2015-05-05 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US9047799B2 (en) | 2009-05-02 | 2015-06-02 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
US9361853B2 (en) | 2009-05-02 | 2016-06-07 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
US9397117B2 (en) | 2009-05-02 | 2016-07-19 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
TWI587256B (zh) * | 2009-05-02 | 2017-06-11 | 半導體能源研究所股份有限公司 | 顯示裝置 |
US9980389B2 (en) | 2009-05-02 | 2018-05-22 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US9996115B2 (en) | 2009-05-02 | 2018-06-12 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
US10580796B2 (en) | 2009-05-02 | 2020-03-03 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US10915145B2 (en) | 2009-05-02 | 2021-02-09 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
US11215858B2 (en) | 2009-05-02 | 2022-01-04 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US11513562B2 (en) | 2009-05-02 | 2022-11-29 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
US11598982B2 (en) | 2009-05-02 | 2023-03-07 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
US11803213B2 (en) | 2009-05-02 | 2023-10-31 | Semiconductor Energy Laboratory Co., Ltd. | Electronic book |
US11809030B2 (en) | 2009-05-02 | 2023-11-07 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
Also Published As
Publication number | Publication date |
---|---|
US20020139981A1 (en) | 2002-10-03 |
WO2002082555A3 (fr) | 2003-01-03 |
EP1384270B1 (fr) | 2009-11-18 |
EP1384270A2 (fr) | 2004-01-28 |
CN1460299A (zh) | 2003-12-03 |
US6974971B2 (en) | 2005-12-13 |
DE60234434D1 (de) | 2009-12-31 |
GB0108309D0 (en) | 2001-05-23 |
TWI278990B (en) | 2007-04-11 |
ATE449423T1 (de) | 2009-12-15 |
KR20030007756A (ko) | 2003-01-23 |
JP2004519866A (ja) | 2004-07-02 |
CN1279622C (zh) | 2006-10-11 |
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