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USD997894S1 - Shadow ring lift assembly - Google Patents

Shadow ring lift assembly Download PDF

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Publication number
USD997894S1
USD997894S1 US29/809,534 US202129809534F USD997894S US D997894 S1 USD997894 S1 US D997894S1 US 202129809534 F US202129809534 F US 202129809534F US D997894 S USD997894 S US D997894S
Authority
US
United States
Prior art keywords
lift assembly
shadow ring
ring lift
view
shadow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/809,534
Inventor
Zubin HUANG
Srinivas Tokur Mohana
Shreyas PATIL SHANTHAVEERASWAMY
Sandesh Yadamane
Jallepally Ravi
Harpreet Singh
Manjunatha KOPPA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/809,534 priority Critical patent/USD997894S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: PATIL SHANTHAVEERASWAMY, SHREYAS, TOKUR MOHANA, SRINIVAS, HUANG, ZUBIN, JALLEPALLY, RAVI, KOPPA, Manjunatha, SINGH, HARPREET, YADAMANE, SANDESH
Priority to TW111301131F priority patent/TWD223247S/en
Priority to JP2022006447F priority patent/JP1729851S/en
Application granted granted Critical
Publication of USD997894S1 publication Critical patent/USD997894S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a back isometric top left-side view of a shadow ring lift assembly.
FIG. 2 is a back isometric bottom left-side view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a back-side view thereof.
FIG. 6 is a front-side view thereof.
FIG. 7 is a left-side view thereof; and,
FIG. 8 is a right-side view thereof.
The broken lines in the drawings illustrate portions of the shadow ring lift assembly that form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a shadow ring lift assembly, as shown and described.
US29/809,534 2021-09-28 2021-09-28 Shadow ring lift assembly Active USD997894S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/809,534 USD997894S1 (en) 2021-09-28 2021-09-28 Shadow ring lift assembly
TW111301131F TWD223247S (en) 2021-09-28 2022-03-09 Shadow ring lift assembly
JP2022006447F JP1729851S (en) 2021-09-28 2022-03-28 Substrate processing system shadow ring lifting assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/809,534 USD997894S1 (en) 2021-09-28 2021-09-28 Shadow ring lift assembly

Publications (1)

Publication Number Publication Date
USD997894S1 true USD997894S1 (en) 2023-09-05

Family

ID=84027355

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/809,534 Active USD997894S1 (en) 2021-09-28 2021-09-28 Shadow ring lift assembly

Country Status (3)

Country Link
US (1) USD997894S1 (en)
JP (1) JP1729851S (en)
TW (1) TWD223247S (en)

Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5922133A (en) 1997-09-12 1999-07-13 Applied Materials, Inc. Multiple edge deposition exclusion rings
EP1106715A1 (en) * 1999-12-10 2001-06-13 Applied Materials, Inc. Self aligning non contact shadow ring process kit
US20030000647A1 (en) 2001-06-29 2003-01-02 Applied Materials, Inc. Substrate processing chamber
US20060260749A1 (en) 2005-05-20 2006-11-23 Satoshi Ueda Substrate processing apparatus and substrate processing method
US20100107973A1 (en) * 2008-10-31 2010-05-06 Asm America, Inc. Self-centering susceptor ring assembly
US9236284B2 (en) 2014-01-31 2016-01-12 Applied Materials, Inc. Cooled tape frame lift and low contact shadow ring for plasma heat isolation
US20160068996A1 (en) * 2014-09-05 2016-03-10 Applied Materials, Inc. Susceptor and pre-heat ring for thermal processing of substrates
US20180138074A1 (en) * 2016-11-11 2018-05-17 Samsung Electronics Co., Ltd. Carrier ring and chemical vapor deposition apparatus including the same
WO2019204754A1 (en) 2018-04-20 2019-10-24 Lam Research Corporation Edge exclusion control
US20210040616A1 (en) 2019-08-06 2021-02-11 Samsung Electronics Co., Ltd. Shower head and substrate treating apparatus having the same
WO2021146352A1 (en) * 2020-01-17 2021-07-22 Lam Research Corporation Exclusion ring with flow paths for exhausting wafer edge gas
WO2021167958A1 (en) 2020-02-21 2021-08-26 Lam Research Corporation Backside reactive inhibition gas
US20220108908A1 (en) * 2020-10-06 2022-04-07 Applied Materials, Inc. Shadow ring kit for plasma etch wafer singulation process
US20220172980A1 (en) * 2008-10-31 2022-06-02 Asm Ip Holding B.V. Self-centering susceptor ring assembly
US11512393B2 (en) * 2018-11-29 2022-11-29 Lam Research Corporation Dynamic sheath control with edge ring lift

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1678330S (en) 2020-05-27 2021-02-01

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5922133A (en) 1997-09-12 1999-07-13 Applied Materials, Inc. Multiple edge deposition exclusion rings
EP1106715A1 (en) * 1999-12-10 2001-06-13 Applied Materials, Inc. Self aligning non contact shadow ring process kit
US20030000647A1 (en) 2001-06-29 2003-01-02 Applied Materials, Inc. Substrate processing chamber
US20060260749A1 (en) 2005-05-20 2006-11-23 Satoshi Ueda Substrate processing apparatus and substrate processing method
US20220172980A1 (en) * 2008-10-31 2022-06-02 Asm Ip Holding B.V. Self-centering susceptor ring assembly
US20100107973A1 (en) * 2008-10-31 2010-05-06 Asm America, Inc. Self-centering susceptor ring assembly
US9236284B2 (en) 2014-01-31 2016-01-12 Applied Materials, Inc. Cooled tape frame lift and low contact shadow ring for plasma heat isolation
US20160068996A1 (en) * 2014-09-05 2016-03-10 Applied Materials, Inc. Susceptor and pre-heat ring for thermal processing of substrates
US20180138074A1 (en) * 2016-11-11 2018-05-17 Samsung Electronics Co., Ltd. Carrier ring and chemical vapor deposition apparatus including the same
WO2019204754A1 (en) 2018-04-20 2019-10-24 Lam Research Corporation Edge exclusion control
US11512393B2 (en) * 2018-11-29 2022-11-29 Lam Research Corporation Dynamic sheath control with edge ring lift
US20210040616A1 (en) 2019-08-06 2021-02-11 Samsung Electronics Co., Ltd. Shower head and substrate treating apparatus having the same
WO2021146352A1 (en) * 2020-01-17 2021-07-22 Lam Research Corporation Exclusion ring with flow paths for exhausting wafer edge gas
WO2021167958A1 (en) 2020-02-21 2021-08-26 Lam Research Corporation Backside reactive inhibition gas
US20220108908A1 (en) * 2020-10-06 2022-04-07 Applied Materials, Inc. Shadow ring kit for plasma etch wafer singulation process

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Semiconductor Equipment Spare Parts OEM Shadow Ring, posted date unknown [retrieved 12/12/2022] from internet, URL: http://www.systa.kr/index.html?div=part&menu_1st=1S&menu_2nd=AM4&maker=&cont=view&sys_code=PRUS1S0290 (Year: 2022) *
Semiconductor Equipment Spare Parts OEM Shadow Ring, posted date unknown [retrieved Dec. 12, 2022] from internet, URL: http://www.systa.kr/index.html?div=part&menu_1st=1S&menu_2nd=AM4&maker=&cont=view&sys_code=PRUS1S0290 (Year: 2022). *

Also Published As

Publication number Publication date
JP1729851S (en) 2022-11-15
TWD223247S (en) 2023-01-21

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